FR2194105A1 - Plasma generator for thin film deposition - in which anode and cathode bodies are fixed rigidly together and magnet is fixed to anode - Google Patents

Plasma generator for thin film deposition - in which anode and cathode bodies are fixed rigidly together and magnet is fixed to anode

Info

Publication number
FR2194105A1
FR2194105A1 FR7227612A FR7227612A FR2194105A1 FR 2194105 A1 FR2194105 A1 FR 2194105A1 FR 7227612 A FR7227612 A FR 7227612A FR 7227612 A FR7227612 A FR 7227612A FR 2194105 A1 FR2194105 A1 FR 2194105A1
Authority
FR
France
Prior art keywords
anode
cathode
fixed
block
plasma generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7227612A
Other languages
French (fr)
Other versions
FR2194105B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Original Assignee
Alcatel CIT SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel CIT SA filed Critical Alcatel CIT SA
Priority to FR7227612A priority Critical patent/FR2194105A1/en
Publication of FR2194105A1 publication Critical patent/FR2194105A1/en
Application granted granted Critical
Publication of FR2194105B1 publication Critical patent/FR2194105B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

A plasma generator has a cathode block and >=1 anode block. The cathode block supports a cathode and supply tube for discharge gas and comprises a cylindrical metallic envelope in which is laterally inserted >=1 anode block, the axis of which is perpendicular to that of the cathode block. The cathode and anode blocks are rigidly fixed together and the magnetic field in the anode interior and the electric field of the anode are produced by means rigidly fixed to the anode block. The cathode potential w.r.t. the body may be fixed by an adjustable resistance. The potential of the metal envelope of the generator may be maintained at that of the generator body or may be left floating.
FR7227612A 1972-07-31 1972-07-31 Plasma generator for thin film deposition - in which anode and cathode bodies are fixed rigidly together and magnet is fixed to anode Granted FR2194105A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7227612A FR2194105A1 (en) 1972-07-31 1972-07-31 Plasma generator for thin film deposition - in which anode and cathode bodies are fixed rigidly together and magnet is fixed to anode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7227612A FR2194105A1 (en) 1972-07-31 1972-07-31 Plasma generator for thin film deposition - in which anode and cathode bodies are fixed rigidly together and magnet is fixed to anode

Publications (2)

Publication Number Publication Date
FR2194105A1 true FR2194105A1 (en) 1974-02-22
FR2194105B1 FR2194105B1 (en) 1976-01-23

Family

ID=9102640

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7227612A Granted FR2194105A1 (en) 1972-07-31 1972-07-31 Plasma generator for thin film deposition - in which anode and cathode bodies are fixed rigidly together and magnet is fixed to anode

Country Status (1)

Country Link
FR (1) FR2194105A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3303677A1 (en) * 1982-03-06 1983-09-15 Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn PLASMA CANNON

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2082217A5 (en) * 1970-03-06 1971-12-10 Cit Alcatel Substrate coating by cathodic sputtering andevaporation

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2082217A5 (en) * 1970-03-06 1971-12-10 Cit Alcatel Substrate coating by cathodic sputtering andevaporation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3303677A1 (en) * 1982-03-06 1983-09-15 Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn PLASMA CANNON
US4540868A (en) * 1982-03-06 1985-09-10 Deutsche Forschungs- Und Versuchsanstalt Fur Luft- Und Raumfahrt E.V. Plasma gun that reduces cathode contamination

Also Published As

Publication number Publication date
FR2194105B1 (en) 1976-01-23

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Legal Events

Date Code Title Description
ST Notification of lapse