GB1447754A - Apparatus for and process of metal coating - Google Patents
Apparatus for and process of metal coatingInfo
- Publication number
- GB1447754A GB1447754A GB2806572A GB2806572A GB1447754A GB 1447754 A GB1447754 A GB 1447754A GB 2806572 A GB2806572 A GB 2806572A GB 2806572 A GB2806572 A GB 2806572A GB 1447754 A GB1447754 A GB 1447754A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- coating
- source
- glow discharge
- metal coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32422—Arrangement for selecting ions or species in the plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1447754 Coating by evaporation DEFENCE SECRETARY OF STATE FOR 14 Sept 1973 [15 June 1972] 28065/72 Heading C7F In the coating of a substrate 15 with metal which may be evaporated from a source 23 by an electron beam 31, the substrate is cleaned by a glow discharge formed in an argon atmosphere between a filament electrode 36 and an anode 37, and the glow discharge is concentrated by an electromagnetic field provided by coils 40, 41. A movable shutter 33 is provided between source and substrate. The substrate temperature, e.g. for a superalloy, may be 300 to 1200‹C. The substrate may be rotated during deposition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2806572A GB1447754A (en) | 1972-06-15 | 1972-06-15 | Apparatus for and process of metal coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2806572A GB1447754A (en) | 1972-06-15 | 1972-06-15 | Apparatus for and process of metal coating |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1447754A true GB1447754A (en) | 1976-09-02 |
Family
ID=10269715
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2806572A Expired GB1447754A (en) | 1972-06-15 | 1972-06-15 | Apparatus for and process of metal coating |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1447754A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2141442A (en) * | 1983-05-26 | 1984-12-19 | Secr Defence | Apparatus and method for the production of metallic coatings by ion-plating |
WO1996015544A1 (en) * | 1994-11-12 | 1996-05-23 | ROWO Coating Gesellschaft für Beschichtung mbH | Device for coating substrates using a vapour phase material in a reduced pressure or vacuum environment |
WO2000023634A1 (en) * | 1998-10-21 | 2000-04-27 | Siemens Aktiengesellschaft | Method and device for cleaning a product |
EP1006211B2 (en) † | 1998-12-02 | 2011-03-16 | Sulzer Metco AG | Method and apparatus for plasma treatment of substrates |
-
1972
- 1972-06-15 GB GB2806572A patent/GB1447754A/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2141442A (en) * | 1983-05-26 | 1984-12-19 | Secr Defence | Apparatus and method for the production of metallic coatings by ion-plating |
WO1996015544A1 (en) * | 1994-11-12 | 1996-05-23 | ROWO Coating Gesellschaft für Beschichtung mbH | Device for coating substrates using a vapour phase material in a reduced pressure or vacuum environment |
US6302056B1 (en) * | 1994-11-12 | 2001-10-16 | Rowo Coating Gesellschaft Fur Beschichtung Mbh | Device for coating substrates with a material vapor in negative pressure or vacuum |
WO2000023634A1 (en) * | 1998-10-21 | 2000-04-27 | Siemens Aktiengesellschaft | Method and device for cleaning a product |
US6602542B2 (en) | 1998-10-21 | 2003-08-05 | Siemens Aktiengesellschaft | Device for cleaning an article |
EP1006211B2 (en) † | 1998-12-02 | 2011-03-16 | Sulzer Metco AG | Method and apparatus for plasma treatment of substrates |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |