GB1257015A - - Google Patents

Info

Publication number
GB1257015A
GB1257015A GB1257015DA GB1257015A GB 1257015 A GB1257015 A GB 1257015A GB 1257015D A GB1257015D A GB 1257015DA GB 1257015 A GB1257015 A GB 1257015A
Authority
GB
United Kingdom
Prior art keywords
evaporant
discharge
plasma
electrode
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1257015A publication Critical patent/GB1257015A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Abstract

1,257,015. Plasma discharge apparatus. G. V. PLANER Ltd. 31 Jan., 1969 [3 Nov., 1967; 14 Feb., 1968], Nos. 50051/67 and 7163/68. Heading H5H. [Also in Division C7] A vacuum evaporation coating process in which a conductive, semi-conductive or insulating evaporant enclosed by an electrode having at least one hole for directing the evaporant towards the substrate is initially heated at a pressure not lower than 10<SP>-3</SP> torr and an electric discharge generated in the evaporant plasma is then the sole heating source for maintaining the evaporation. The evaporant may be initially heated by electron beam, resistance, R.F. or an ionizable gas may be introduced between the discharge electrodes to provide an initial plasma. This initial heating source is removed once the evaporant plasma discharge is generated. The substrate may be a metal plate or strip such as steel on a plastics film. Al or Zn may be evaporated and coated on the steel strip moving past the evaporant source. The evaporant 2 in a hearth 1 is connected to an electrode 5 and connected to a D.C. source 10 and surrounded by a spherical Ta electrode 3 with an aperture 4 opposite the substrate 9. The chamber is pumped down to a pressure not less than 10<SP>-3</SP> torr and initial heating is effected by electrons generated from a heated cathode 8. The high P.D. between electrodes 5 and 3 generates a discharge in the evaporant plasma and evaporation is continued without the electron beam. Alternative arrangements disclose an electron gun outside the chamber instead of cathode 8; an elongated trough for the evaporant supported within a cylindrical electrode; two electrodes of the evaporant with an adjustable gap between them for generating the discharge; a central anode coated with the evaporant and surrounded by an electron filament and a cylindrical cathode.
GB1257015D 1967-11-03 1967-11-03 Expired GB1257015A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5005167 1967-11-03

Publications (1)

Publication Number Publication Date
GB1257015A true GB1257015A (en) 1971-12-15

Family

ID=10454465

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1257015D Expired GB1257015A (en) 1967-11-03 1967-11-03

Country Status (1)

Country Link
GB (1) GB1257015A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
GB2139648A (en) * 1983-05-13 1984-11-14 Wedtech Corp Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase
GB2159540A (en) * 1984-05-25 1985-12-04 Wedtech Corp Apparatus and methods for coating substrates
GB2202237A (en) * 1987-03-12 1988-09-21 Vac Tec Syst Cathodic arc plasma deposition of hard coatings
GB2223032A (en) * 1988-09-27 1990-03-28 Leybold Ag Apparatus for applying dielectric or metallic materials to a substrate
GB2261226A (en) * 1991-11-08 1993-05-12 Univ Hull Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD
US5216690A (en) * 1992-03-11 1993-06-01 Hanks Charles W Electron beam gun with grounded shield to prevent arc down
EP1372897A2 (en) * 2001-03-28 2004-01-02 CPFilms, Inc. Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
US20140216343A1 (en) 2008-08-04 2014-08-07 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10586685B2 (en) 2014-12-05 2020-03-10 Agc Glass Europe Hollow cathode plasma source
US10755901B2 (en) 2014-12-05 2020-08-25 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

Cited By (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609564A (en) * 1981-02-24 1986-09-02 Wedtech Corp. Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
GB2156384A (en) * 1981-02-24 1985-10-09 Wedtech Corp Apparatus for vapour deposition by arc discharge
FR2545839A1 (en) * 1983-05-13 1984-11-16 Wedtech Corp METHOD AND APPARATUS FOR COATING A SUBSTRATE WITH MATERIAL ELECTRICALLY TRANSFORMED INTO THE GASEOUS PHASE
GB2139648A (en) * 1983-05-13 1984-11-14 Wedtech Corp Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase
GB2159540A (en) * 1984-05-25 1985-12-04 Wedtech Corp Apparatus and methods for coating substrates
GB2167774A (en) * 1984-05-25 1986-06-04 Wedtech Corp Apparatus and methods for coating substrates with metal coatings
GB2202237A (en) * 1987-03-12 1988-09-21 Vac Tec Syst Cathodic arc plasma deposition of hard coatings
GB2223032A (en) * 1988-09-27 1990-03-28 Leybold Ag Apparatus for applying dielectric or metallic materials to a substrate
US5070811A (en) * 1988-09-27 1991-12-10 Albert Feuerstein Apparatus for applying dielectric or metallic materials
GB2261226A (en) * 1991-11-08 1993-05-12 Univ Hull Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD
GB2261226B (en) * 1991-11-08 1994-10-26 Univ Hull Deposition of non-conductive material
US5216690A (en) * 1992-03-11 1993-06-01 Hanks Charles W Electron beam gun with grounded shield to prevent arc down
USRE35024E (en) * 1992-03-11 1995-08-22 Hanks; Charles W. Electron beam gun with grounded shield to prevent arc down
DE4391006C2 (en) * 1992-03-11 2002-10-17 Charles W Hanks electron beam gun
EP1372897A4 (en) * 2001-03-28 2007-04-25 Cpfilms Inc Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
EP1372897A2 (en) * 2001-03-28 2004-01-02 CPFilms, Inc. Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
US10580624B2 (en) 2008-08-04 2020-03-03 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20140216343A1 (en) 2008-08-04 2014-08-07 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20150004330A1 (en) 2008-08-04 2015-01-01 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US9478401B2 (en) 2008-08-04 2016-10-25 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US10438778B2 (en) 2008-08-04 2019-10-08 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20150002021A1 (en) 2008-08-04 2015-01-01 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US10580625B2 (en) 2008-08-04 2020-03-03 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US11875976B2 (en) 2014-12-05 2024-01-16 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US10755901B2 (en) 2014-12-05 2020-08-25 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US10586685B2 (en) 2014-12-05 2020-03-10 Agc Glass Europe Hollow cathode plasma source
US20170309458A1 (en) 2015-11-16 2017-10-26 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10559452B2 (en) 2015-11-16 2020-02-11 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees