GB1339910A - Alloy deposition by liquid phase sputtering - Google Patents
Alloy deposition by liquid phase sputteringInfo
- Publication number
- GB1339910A GB1339910A GB1095771*[A GB1095771A GB1339910A GB 1339910 A GB1339910 A GB 1339910A GB 1095771 A GB1095771 A GB 1095771A GB 1339910 A GB1339910 A GB 1339910A
- Authority
- GB
- United Kingdom
- Prior art keywords
- liquid phase
- port
- substrate
- alloy deposition
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3428—Cathode assembly for sputtering apparatus, e.g. Target using liquid targets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1339910 Sputtering metals UNITED AIRCRAFT CORP 23 April 1971 [13 May 1970] 10957/71 Heading C7F A metal, e.g. Sn, or an alloy is sputtered and evaporated from a liquid cathode maintained in a copper hearth 4, having a shield 8, on to a substrate 14. A glow discharge is provided by a filament 9. An adjustable magnetic field is provided by solenoid 12. The vacuum chamber is exhausted through a port 2 against a controlled argon leak through a port 3. The electron emission preheats the substrate. The alloys may be Fe-Cr-Al-Yt or Fe-V.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3679870A | 1970-05-13 | 1970-05-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1339910A true GB1339910A (en) | 1973-12-05 |
Family
ID=21890717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1095771*[A Expired GB1339910A (en) | 1970-05-13 | 1971-04-23 | Alloy deposition by liquid phase sputtering |
Country Status (8)
Country | Link |
---|---|
BE (1) | BE766959A (en) |
CA (1) | CA941781A (en) |
CH (1) | CH562327A5 (en) |
DE (1) | DE2122336A1 (en) |
FR (1) | FR2088554B1 (en) |
GB (1) | GB1339910A (en) |
IL (1) | IL36711A (en) |
SE (1) | SE368841B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4105014A1 (en) * | 1991-02-19 | 1992-08-20 | Leybold Ag | Vapour deposition - has closed tunnels of magnetic field lines over molten material in crucible with electron beam guns for ionisation |
WO2004044261A3 (en) * | 2002-11-14 | 2004-08-26 | Zond Inc | High deposition rate sputtering |
US7147759B2 (en) | 2002-09-30 | 2006-12-12 | Zond, Inc. | High-power pulsed magnetron sputtering |
US8125155B2 (en) | 2004-02-22 | 2012-02-28 | Zond, Inc. | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3615361C2 (en) * | 1986-05-06 | 1994-09-01 | Santos Pereira Ribeiro Car Dos | Device for the surface treatment of workpieces |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB505135A (en) * | 1937-03-25 | 1939-05-05 | Bernhard Berghaus | Improvements in and relating to the coating of articles by cathode disintegration |
US2305758A (en) * | 1937-05-25 | 1942-12-22 | Berghaus Bernhard | Coating of articles by cathode disintegration |
-
1971
- 1971-03-10 CA CA107,418A patent/CA941781A/en not_active Expired
- 1971-04-23 GB GB1095771*[A patent/GB1339910A/en not_active Expired
- 1971-04-26 IL IL36711A patent/IL36711A/en unknown
- 1971-05-05 CH CH667471A patent/CH562327A5/xx not_active IP Right Cessation
- 1971-05-06 DE DE19712122336 patent/DE2122336A1/en active Pending
- 1971-05-10 BE BE766959A patent/BE766959A/en unknown
- 1971-05-10 FR FR7117443A patent/FR2088554B1/fr not_active Expired
- 1971-05-11 SE SE06072/71A patent/SE368841B/xx unknown
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4105014A1 (en) * | 1991-02-19 | 1992-08-20 | Leybold Ag | Vapour deposition - has closed tunnels of magnetic field lines over molten material in crucible with electron beam guns for ionisation |
US7147759B2 (en) | 2002-09-30 | 2006-12-12 | Zond, Inc. | High-power pulsed magnetron sputtering |
WO2004044261A3 (en) * | 2002-11-14 | 2004-08-26 | Zond Inc | High deposition rate sputtering |
US6896773B2 (en) | 2002-11-14 | 2005-05-24 | Zond, Inc. | High deposition rate sputtering |
US7811421B2 (en) | 2002-11-14 | 2010-10-12 | Zond, Inc. | High deposition rate sputtering |
US8125155B2 (en) | 2004-02-22 | 2012-02-28 | Zond, Inc. | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities |
Also Published As
Publication number | Publication date |
---|---|
DE2122336A1 (en) | 1971-12-02 |
BE766959A (en) | 1971-10-01 |
CH562327A5 (en) | 1975-05-30 |
FR2088554A1 (en) | 1972-01-07 |
CA941781A (en) | 1974-02-12 |
IL36711A0 (en) | 1971-11-29 |
SE368841B (en) | 1974-07-22 |
FR2088554B1 (en) | 1975-07-04 |
IL36711A (en) | 1974-05-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |