CA941781A - Metal deposition by liquid phase sputtering - Google Patents

Metal deposition by liquid phase sputtering

Info

Publication number
CA941781A
CA941781A CA107,418A CA107418A CA941781A CA 941781 A CA941781 A CA 941781A CA 107418 A CA107418 A CA 107418A CA 941781 A CA941781 A CA 941781A
Authority
CA
Canada
Prior art keywords
liquid phase
metal deposition
phase sputtering
sputtering
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA107,418A
Inventor
Richard C. Krutenat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Technologies Corp
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
Application granted granted Critical
Publication of CA941781A publication Critical patent/CA941781A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3428—Cathode assembly for sputtering apparatus, e.g. Target using liquid targets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
CA107,418A 1970-05-13 1971-03-10 Metal deposition by liquid phase sputtering Expired CA941781A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3679870A 1970-05-13 1970-05-13

Publications (1)

Publication Number Publication Date
CA941781A true CA941781A (en) 1974-02-12

Family

ID=21890717

Family Applications (1)

Application Number Title Priority Date Filing Date
CA107,418A Expired CA941781A (en) 1970-05-13 1971-03-10 Metal deposition by liquid phase sputtering

Country Status (8)

Country Link
BE (1) BE766959A (en)
CA (1) CA941781A (en)
CH (1) CH562327A5 (en)
DE (1) DE2122336A1 (en)
FR (1) FR2088554B1 (en)
GB (1) GB1339910A (en)
IL (1) IL36711A (en)
SE (1) SE368841B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3615361C2 (en) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Device for the surface treatment of workpieces
DE4105014A1 (en) * 1991-02-19 1992-08-20 Leybold Ag Vapour deposition - has closed tunnels of magnetic field lines over molten material in crucible with electron beam guns for ionisation
US7147759B2 (en) 2002-09-30 2006-12-12 Zond, Inc. High-power pulsed magnetron sputtering
US6896773B2 (en) 2002-11-14 2005-05-24 Zond, Inc. High deposition rate sputtering
US7095179B2 (en) 2004-02-22 2006-08-22 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB505135A (en) * 1937-03-25 1939-05-05 Bernhard Berghaus Improvements in and relating to the coating of articles by cathode disintegration
US2305758A (en) * 1937-05-25 1942-12-22 Berghaus Bernhard Coating of articles by cathode disintegration

Also Published As

Publication number Publication date
CH562327A5 (en) 1975-05-30
FR2088554A1 (en) 1972-01-07
GB1339910A (en) 1973-12-05
IL36711A0 (en) 1971-11-29
SE368841B (en) 1974-07-22
FR2088554B1 (en) 1975-07-04
BE766959A (en) 1971-10-01
DE2122336A1 (en) 1971-12-02
IL36711A (en) 1974-05-16

Similar Documents

Publication Publication Date Title
CA1025521A (en) Phase jitter compensation
CA927220A (en) Electroless metal deposition
CA923252A (en) Electroless metal deposition
CA941781A (en) Metal deposition by liquid phase sputtering
AU466325B2 (en) Alloy deposition by liquid phase sputtering
AU2822171A (en) Alloy deposition by liquid phase sputtering
CA935254A (en) Retro-reflective liquid coating composition
CA937199A (en) Technique for the preparation of iron oxide films by cathodic sputtering
CA1021761A (en) Sensitizers for electroless metal deposition
CA927317A (en) Technique for the preparation of iron oxide films by cathodic sputtering
AU459408B2 (en) Metal deposition process
CA964134A (en) Metal deposition process
CA799995A (en) .pi.-ALLYL COMPOUNDS OF METALS
AU2212570A (en) Metal deposition process
AU3393471A (en) Metal coating
CA830354A (en) Metal film deposition process
CA848982A (en) Metal salt complex
CA843430A (en) Sputtering process
CA987209A (en) Metal depositing consumables
CA784701A (en) Deposition of thin films by cathodic sputtering
CA913331A (en) Metal oxides by vapor phase process
CA902885A (en) Metal oxides by vapor phase process
CA957005A (en) Conduction pump for liquid metal
CA818330A (en) Vapor phase process for metal oxides
CA833496A (en) Hot-dip metal coating product