ES390345A1 - Process for the deposition of metals or oxides on a metallic support by cathodic sputtering and applications thereof - Google Patents

Process for the deposition of metals or oxides on a metallic support by cathodic sputtering and applications thereof

Info

Publication number
ES390345A1
ES390345A1 ES390345A ES390345A ES390345A1 ES 390345 A1 ES390345 A1 ES 390345A1 ES 390345 A ES390345 A ES 390345A ES 390345 A ES390345 A ES 390345A ES 390345 A1 ES390345 A1 ES 390345A1
Authority
ES
Spain
Prior art keywords
metal
oxides
metals
deposition
applications
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES390345A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Progil SARL
Original Assignee
Progil SARL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Progil SARL filed Critical Progil SARL
Publication of ES390345A1 publication Critical patent/ES390345A1/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/488—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with retarding grids
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inert Electrodes (AREA)

Abstract

Procedure for depositing on a metal support, by sputtering, a precious metal, or an oxide of this metal, characterized by first subjecting the metal support to an ion bombardment in a residual atmosphere of pure argon or other rare gas and then, without waiting At the drop in the resulting high temperature, apply the deposit of precious metal or an oxide of this metal, by sputtering carried out at first in a residual atmosphere of pure argon and then in a mixed residual atmosphere of argon and oxygen. (Machine-translation by Google Translate, not legally binding)
ES390345A 1970-04-21 1971-04-19 Process for the deposition of metals or oxides on a metallic support by cathodic sputtering and applications thereof Expired ES390345A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7014327A FR2088659A5 (en) 1970-04-21 1970-04-21

Publications (1)

Publication Number Publication Date
ES390345A1 true ES390345A1 (en) 1973-06-01

Family

ID=9054289

Family Applications (1)

Application Number Title Priority Date Filing Date
ES390345A Expired ES390345A1 (en) 1970-04-21 1971-04-19 Process for the deposition of metals or oxides on a metallic support by cathodic sputtering and applications thereof

Country Status (17)

Country Link
US (1) US3773639A (en)
JP (1) JPS5324914B1 (en)
AT (1) AT304990B (en)
BE (1) BE766023A (en)
BR (1) BR7102391D0 (en)
CA (1) CA933881A (en)
CH (1) CH524690A (en)
DE (1) DE2119066A1 (en)
ES (1) ES390345A1 (en)
FR (1) FR2088659A5 (en)
GB (1) GB1307956A (en)
IL (1) IL36656A (en)
LU (1) LU63024A1 (en)
NL (1) NL7105157A (en)
PL (1) PL83268B1 (en)
RO (1) RO61059A (en)
SE (1) SE366345B (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2320565A1 (en) * 1973-04-12 1977-03-04 Radiotechnique Compelec SELECTIVE TRANSPARENCY PLATE AND ITS MANUFACTURING PROCESS
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
DE2630883C2 (en) * 1976-07-09 1985-02-07 Basf Ag, 6700 Ludwigshafen Use of a layer containing porous inorganic oxides applied to a metallic support by the plasma or flame spraying process as a diaphragm in an electrolysis cell
AU5889880A (en) * 1979-07-02 1981-01-15 Olin Corporation Manufacture of low overvoltage electrodes by cathodic sputtering
US4400255A (en) * 1981-06-29 1983-08-23 General Motors Corporation Control of electron bombardment of the exhaust oxygen sensor during electrode sputtering
US4420385A (en) * 1983-04-15 1983-12-13 Gryphon Products Apparatus and process for sputter deposition of reacted thin films
EP0446657B1 (en) * 1990-03-02 1995-07-26 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5391275A (en) * 1990-03-02 1995-02-21 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5202008A (en) * 1990-03-02 1993-04-13 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5429843A (en) * 1991-11-21 1995-07-04 Nisshin Steel Co., Ltd. Vapor deposition for formation of plating layer
EP0593372B1 (en) * 1992-10-14 2001-09-19 Daiki Engineering Co., Ltd. Highly durable electrodes for eletrolysis and a method for preparation thereof
CA2154428C (en) * 1995-07-21 2005-03-22 Robert Schulz Ti, ru, fe and o alloys; use thereof for producing cathodes used for electrochemically synthesizing sodium chlorate
FR2861219B1 (en) * 2003-10-15 2006-04-07 Commissariat Energie Atomique ALKALINE FUEL CELL COMPRISING AN ANODE COMPRISING ALUMINUM AND ZINC AND METHOD OF MANUFACTURING THE ANODE
US20050205415A1 (en) * 2004-03-19 2005-09-22 Belousov Igor V Multi-component deposition
ITMI20091621A1 (en) * 2009-09-23 2011-03-24 Industrie De Nora Spa ELECTRODE FOR ELECTROLYTIC PROCESSES WITH CONTROLLED CRYSTALLINE STRUCTURE
JP4734664B1 (en) * 2010-09-17 2011-07-27 田中貴金属工業株式会社 Electrode for electrolysis, anode for electrolysis of ozone, anode for electrolysis of persulfate, and anode for chromium electrooxidation
WO2015183128A1 (en) * 2014-05-30 2015-12-03 Общество С Ограниченной Ответственностью "Эй Ти Энерджи" Method of preparing platinum-based catalyst and platinum-based catalyst
RU2562462C1 (en) * 2014-05-30 2015-09-10 Общество с ограниченной ответственностью "Эй Ти Энерджи", ООО "Эй Ти Энерджи" Method of producing platinum-based catalyst and platinum-based catalyst

Also Published As

Publication number Publication date
RO61059A (en) 1976-10-15
IL36656A0 (en) 1971-06-23
IL36656A (en) 1974-01-14
SE366345B (en) 1974-04-22
CA933881A (en) 1973-09-18
AT304990B (en) 1973-02-12
NL7105157A (en) 1971-10-25
CH524690A (en) 1972-06-30
FR2088659A5 (en) 1972-01-07
US3773639A (en) 1973-11-20
JPS5324914B1 (en) 1978-07-24
GB1307956A (en) 1973-02-21
LU63024A1 (en) 1972-12-11
BE766023A (en) 1971-10-20
PL83268B1 (en) 1975-12-31
BR7102391D0 (en) 1973-05-03
DE2119066A1 (en) 1971-11-04

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