GB1207946A - Gold deposition - Google Patents
Gold depositionInfo
- Publication number
- GB1207946A GB1207946A GB3310469A GB3310469A GB1207946A GB 1207946 A GB1207946 A GB 1207946A GB 3310469 A GB3310469 A GB 3310469A GB 3310469 A GB3310469 A GB 3310469A GB 1207946 A GB1207946 A GB 1207946A
- Authority
- GB
- United Kingdom
- Prior art keywords
- gold
- substrate
- layer
- metal
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1,207,946. Gold deposition. PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd. July 1, 1969 [July 4, 1968], No.33104/69. Heading C7F. Gold is sputtered on a substrate of metal or an insulating material, the target cathode being electrolytically coated with an alloy consisting of gold and a small amount of a metal which is capable of forming a compound by reaction with molecular oxygen. The metal alloyed with the gold may be Co or Ni, the substrate may be Ti, Ta, Cr, Mo, a ceramic, quartz, ferrite, or glass and the target may be of steel coated electrolytically with the gold alloy. Two methods of sputtering are disclosed. Where the substrate permits diffusion of metal thereinto, the deposition apparatus is evacuated to 10<-6> Torr, flushed with argon, reevacuated, and sputtering is started so that an intercrystalline adhering layer is formed on the substrate which layer becomes subsequently coated with the gold alloy layer. Where the substrate does not permit of diffusion the vessel is evacuated to 10<-3> to 10<-4> Torr, and the procedure described above is followed, except that a little oxygen may be added to the Ar. This gives rise on subsequent sputtering to a substrate coated with, in order, a cobalt oxide layer, a cobalt oxidecobalt-gold layer, and a final thicker coating of Au-Co.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR157807 | 1968-07-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1207946A true GB1207946A (en) | 1970-10-07 |
Family
ID=8652065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3310469A Expired GB1207946A (en) | 1968-07-04 | 1969-07-01 | Gold deposition |
Country Status (6)
| Country | Link |
|---|---|
| CH (1) | CH496816A (en) |
| DE (1) | DE1933583A1 (en) |
| ES (1) | ES369064A1 (en) |
| FR (1) | FR1588506A (en) |
| GB (1) | GB1207946A (en) |
| NL (1) | NL6910113A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2299729A1 (en) * | 1975-01-30 | 1976-08-27 | Radiotechnique Compelec | Light-emitting diode - having metal oxide insulating layer and gold conductive layer |
| DE3142541C2 (en) * | 1981-10-27 | 1986-07-31 | Demetron Gesellschaft für Elektronik-Werkstoffe mbH, 6540 Hanau | Multi-component alloy for targets in cathode sputtering systems |
| GB2138027B (en) * | 1983-04-12 | 1986-09-10 | Citizen Watch Co Ltd | A process for plating an article with a gold-based alloy and an alloy therefor |
-
1968
- 1968-07-04 FR FR1588506D patent/FR1588506A/fr not_active Expired
-
1969
- 1969-06-30 CH CH997169A patent/CH496816A/en not_active IP Right Cessation
- 1969-07-01 GB GB3310469A patent/GB1207946A/en not_active Expired
- 1969-07-02 ES ES369064A patent/ES369064A1/en not_active Expired
- 1969-07-02 NL NL6910113A patent/NL6910113A/xx unknown
- 1969-07-02 DE DE19691933583 patent/DE1933583A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR1588506A (en) | 1970-04-17 |
| DE1933583A1 (en) | 1970-02-05 |
| NL6910113A (en) | 1970-01-06 |
| CH496816A (en) | 1970-09-30 |
| ES369064A1 (en) | 1971-05-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |