ES369064A1 - Gold deposition - Google Patents

Gold deposition

Info

Publication number
ES369064A1
ES369064A1 ES369064A ES369064A ES369064A1 ES 369064 A1 ES369064 A1 ES 369064A1 ES 369064 A ES369064 A ES 369064A ES 369064 A ES369064 A ES 369064A ES 369064 A1 ES369064 A1 ES 369064A1
Authority
ES
Spain
Prior art keywords
substrate
gold
layer
metal
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES369064A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of ES369064A1 publication Critical patent/ES369064A1/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Gold is sputtered on a substrate of metal or an insulating material, the target cathode being electrolytically coated with an alloy consisting of gold and a small amount of a metal which is capable of forming a compound by reaction with molecular oxygen. The metal alloyed with the gold may be Co or Ni, the substrate may be Ti, Ta, Cr, Mo, a ceramic, quartz, ferrite, or glass and the target may be of steel coated electrolytically with the gold alloy. Two methods of sputtering are disclosed. Where the substrate permits diffusion of metal thereinto, the deposition apparatus is evacuated to 10<-6> Torr, flushed with argon, reevacuated, and sputtering is started so that an intercrystalline adhering layer is formed on the substrate which layer becomes subsequently coated with the gold alloy layer. Where the substrate does not permit of diffusion the vessel is evacuated to 10<-3> to 10<-4> Torr, and the procedure described above is followed, except that a little oxygen may be added to the Ar. This gives rise on subsequent sputtering to a substrate coated with, in order, a cobalt oxide layer, a cobalt oxidecobalt-gold layer, and a final thicker coating of Au-Co.
ES369064A 1968-07-04 1969-07-02 Gold deposition Expired ES369064A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR157807 1968-07-04

Publications (1)

Publication Number Publication Date
ES369064A1 true ES369064A1 (en) 1971-05-16

Family

ID=8652065

Family Applications (1)

Application Number Title Priority Date Filing Date
ES369064A Expired ES369064A1 (en) 1968-07-04 1969-07-02 Gold deposition

Country Status (6)

Country Link
CH (1) CH496816A (en)
DE (1) DE1933583A1 (en)
ES (1) ES369064A1 (en)
FR (1) FR1588506A (en)
GB (1) GB1207946A (en)
NL (1) NL6910113A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2299729A1 (en) * 1975-01-30 1976-08-27 Radiotechnique Compelec Light-emitting diode - having metal oxide insulating layer and gold conductive layer
DE3142541C2 (en) * 1981-10-27 1986-07-31 Demetron Gesellschaft für Elektronik-Werkstoffe mbH, 6540 Hanau Multi-component alloy for targets in cathode sputtering systems
GB2138027B (en) * 1983-04-12 1986-09-10 Citizen Watch Co Ltd A process for plating an article with a gold-based alloy and an alloy therefor

Also Published As

Publication number Publication date
CH496816A (en) 1970-09-30
DE1933583A1 (en) 1970-02-05
GB1207946A (en) 1970-10-07
FR1588506A (en) 1970-04-17
NL6910113A (en) 1970-01-06

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