CH496816A - Process for applying a layer of gold to a substrate - Google Patents

Process for applying a layer of gold to a substrate

Info

Publication number
CH496816A
CH496816A CH997169A CH997169A CH496816A CH 496816 A CH496816 A CH 496816A CH 997169 A CH997169 A CH 997169A CH 997169 A CH997169 A CH 997169A CH 496816 A CH496816 A CH 496816A
Authority
CH
Switzerland
Prior art keywords
gold
applying
substrate
layer
Prior art date
Application number
CH997169A
Other languages
German (de)
Inventor
Pompei Jean
Depierre Jacques
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH496816A publication Critical patent/CH496816A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH997169A 1968-07-04 1969-06-30 Process for applying a layer of gold to a substrate CH496816A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR157807 1968-07-04

Publications (1)

Publication Number Publication Date
CH496816A true CH496816A (en) 1970-09-30

Family

ID=8652065

Family Applications (1)

Application Number Title Priority Date Filing Date
CH997169A CH496816A (en) 1968-07-04 1969-06-30 Process for applying a layer of gold to a substrate

Country Status (6)

Country Link
CH (1) CH496816A (en)
DE (1) DE1933583A1 (en)
ES (1) ES369064A1 (en)
FR (1) FR1588506A (en)
GB (1) GB1207946A (en)
NL (1) NL6910113A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2299729A1 (en) * 1975-01-30 1976-08-27 Radiotechnique Compelec Light-emitting diode - having metal oxide insulating layer and gold conductive layer
DE3142541C2 (en) * 1981-10-27 1986-07-31 Demetron Gesellschaft für Elektronik-Werkstoffe mbH, 6540 Hanau Multi-component alloy for targets in cathode sputtering systems
GB2138027B (en) * 1983-04-12 1986-09-10 Citizen Watch Co Ltd A process for plating an article with a gold-based alloy and an alloy therefor

Also Published As

Publication number Publication date
DE1933583A1 (en) 1970-02-05
GB1207946A (en) 1970-10-07
FR1588506A (en) 1970-04-17
ES369064A1 (en) 1971-05-16
NL6910113A (en) 1970-01-06

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Legal Events

Date Code Title Description
PL Patent ceased