GB1488559A - Method of plating a substrate - Google Patents

Method of plating a substrate

Info

Publication number
GB1488559A
GB1488559A GB29888/75A GB2988875A GB1488559A GB 1488559 A GB1488559 A GB 1488559A GB 29888/75 A GB29888/75 A GB 29888/75A GB 2988875 A GB2988875 A GB 2988875A GB 1488559 A GB1488559 A GB 1488559A
Authority
GB
United Kingdom
Prior art keywords
plating
alloy
electro
ion
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB29888/75A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Publication of GB1488559A publication Critical patent/GB1488559A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1488559 Electro-plating DAINI SEIKOSHA K K 16 July 1975 [17 July 1974] 29888/75 Heading C7B A metal or alloy substrate which developes a stable oxide film, such as stainless steel or Ti, Ta, Nb, Zr, Al or alloy thereof, is plated by dry plating e.g. ion plating thereon a first metallic layer, e.g. Au, Pd, Pt or Cu by an ion plating process, then wet plating e.g. electro-plating a second metallic layer of Au, Ag, Pt, Pd or Rh or alloy thereof such as Pd-Ni or Au-Ag on to the first; a third metallic layer (preferably of the same metal as that of the second) may be deposited e.g. by electro-plating on to the second, e.g. Au-Ni-In alloy on to Au-Ag alloy. The substrate may be an alumite treated watch case of Al alloy containing 2% Mg or a watch band of Al alloy containing 4% Cu. In an Example Ti plates may be buffed and cleaned with trichloroethylene, prior to ion plating in a bell jar under argon at 5 x 10<SP>-3</SP> Torr pressure wherein D.C. of 2,000 volts is applied between the plates as cathode and an evaporating device (e.g. with Au thereon) as anode. The ion plated plates may be degreased cathodically in a bath containing Na 3 PO 4 solution, soaked in H 2 SO 4 solution and washed with water prior to electro-plating e.g. with Au.
GB29888/75A 1974-07-17 1975-07-16 Method of plating a substrate Expired GB1488559A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49081152A JPS5110132A (en) 1974-07-17 1974-07-17

Publications (1)

Publication Number Publication Date
GB1488559A true GB1488559A (en) 1977-10-12

Family

ID=13738449

Family Applications (1)

Application Number Title Priority Date Filing Date
GB29888/75A Expired GB1488559A (en) 1974-07-17 1975-07-16 Method of plating a substrate

Country Status (3)

Country Link
JP (1) JPS5110132A (en)
GB (1) GB1488559A (en)
HK (1) HK14282A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111334753A (en) * 2020-04-10 2020-06-26 扬州工业职业技术学院 Method for plating rhodium on surface of steel strip

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55109521U (en) * 1979-01-26 1980-07-31
JPS5894525U (en) * 1982-09-30 1983-06-27 住友ベークライト株式会社 plastic type
FR2599052B1 (en) * 1986-05-26 1988-07-22 Alcatel Espace METHOD AND METAL DEPOSIT ON TITANIUM ELECTROLYTICALLY

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5017254A (en) * 1973-06-12 1975-02-24

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111334753A (en) * 2020-04-10 2020-06-26 扬州工业职业技术学院 Method for plating rhodium on surface of steel strip

Also Published As

Publication number Publication date
JPS5110132A (en) 1976-01-27
HK14282A (en) 1982-04-02

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee