GB1406394A - Method for forming pure metal or non-metal deposits - Google Patents
Method for forming pure metal or non-metal depositsInfo
- Publication number
- GB1406394A GB1406394A GB5099773A GB5099773A GB1406394A GB 1406394 A GB1406394 A GB 1406394A GB 5099773 A GB5099773 A GB 5099773A GB 5099773 A GB5099773 A GB 5099773A GB 1406394 A GB1406394 A GB 1406394A
- Authority
- GB
- United Kingdom
- Prior art keywords
- metal
- fluoride
- source
- substrate
- nov
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 title abstract 8
- 239000002184 metal Substances 0.000 title abstract 8
- 229910052755 nonmetal Inorganic materials 0.000 title abstract 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 229910052802 copper Inorganic materials 0.000 abstract 2
- 229910052759 nickel Inorganic materials 0.000 abstract 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 abstract 1
- NJQFCQXFOHVYQJ-PMACEKPBSA-N BF 4 Chemical compound C1([C@@H]2CC(=O)C=3C(O)=C(C)C4=C(C=3O2)[C@H](C(C)C)C2=C(O4)C(C)=C(C(C2=O)(C)C)OC)=CC=CC=C1 NJQFCQXFOHVYQJ-PMACEKPBSA-N 0.000 abstract 1
- 229910015892 BF 4 Inorganic materials 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 229910002482 Cu–Ni Inorganic materials 0.000 abstract 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 229910015275 MoF 6 Inorganic materials 0.000 abstract 1
- 229910019800 NbF 5 Inorganic materials 0.000 abstract 1
- 229910003271 Ni-Fe Inorganic materials 0.000 abstract 1
- -1 PtF 6 Inorganic materials 0.000 abstract 1
- 229910019595 ReF 6 Inorganic materials 0.000 abstract 1
- 229910004014 SiF4 Inorganic materials 0.000 abstract 1
- 229910004529 TaF 5 Inorganic materials 0.000 abstract 1
- 229910010342 TiF4 Inorganic materials 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229910052793 cadmium Inorganic materials 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 150000002222 fluorine compounds Chemical class 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 229910002804 graphite Inorganic materials 0.000 abstract 1
- 239000010439 graphite Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 150000002843 nonmetals Chemical class 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 abstract 1
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1406394 Chemical vapour deposition from fluorides COMMISSARIAT A L'ENERGIE ATOMIQUE 2 Nov 1973 [7 Nov 1972] 50997/73 Heading C7F Metals or non-metals are deposited by introducing in the vapour state at least one higher valency metal or non-metal fluoride into an enclosure containing a substrate, and a source of metal or non-metal to be deposited, heating said source so that it reacts with the fluoride to form a sub-fluoride of the source metal or non-metal, which sub-fluoride evaporates, condenses on the substrate, and produces fluorine and a deposit of the desired source metal or non-metal. The metal or non-metal of the higher valency fluoride and the metal or non-metal of the source may be the same or different. The higher fluoride may be WF 6 , MoF 6 , ReF 6 , PtF 6 , TaF 5 , NbF 5 , BF 4 , TiF4, CF4, or SiF4, the source may be Fe; Co, Zn, Ag, Au, Cd, Al, Cu, Ni, Zr, Ta, or W and the substrate may be W, Mo, Cu, Ni, Fe, graphite, Si, Al 2 O 3 , Cu-Ni, Cr-Ni-Fe, or glass.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7239334A FR2205583B1 (en) | 1972-11-07 | 1972-11-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1406394A true GB1406394A (en) | 1975-09-17 |
Family
ID=9106742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5099773A Expired GB1406394A (en) | 1972-11-07 | 1973-11-02 | Method for forming pure metal or non-metal deposits |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3911194A (en) |
| JP (1) | JPS4995832A (en) |
| DE (1) | DE2355531A1 (en) |
| FR (1) | FR2205583B1 (en) |
| GB (1) | GB1406394A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5437933A (en) * | 1992-02-18 | 1995-08-01 | Johnson Matthey Public Limited Company | Coated ceramic article |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2737532C2 (en) * | 1977-08-19 | 1979-05-10 | Kraftwerk Union Ag, 4330 Muelheim | Process for protecting the cladding tubes of nuclear reactor fuel rods |
| US4196230A (en) * | 1978-09-15 | 1980-04-01 | Gibson James O | Production of carbon fiber-tantalum carbide composites |
| US4343963A (en) * | 1979-03-02 | 1982-08-10 | Westinghouse Electric Corp. | Substrate for silicon solar cells |
| US4402771A (en) * | 1979-03-02 | 1983-09-06 | Westinghouse Electric Corp. | Substrate for silicon solar cells |
| JPS55134170A (en) * | 1979-04-04 | 1980-10-18 | Oyo Kagaku Kenkyusho | Manufacture of deformed tungusten structure |
| JPS5948873B2 (en) * | 1980-05-14 | 1984-11-29 | ペルメレック電極株式会社 | Method for manufacturing electrode substrate or electrode provided with corrosion-resistant coating |
| US4681652A (en) * | 1980-06-05 | 1987-07-21 | Rogers Leo C | Manufacture of polycrystalline silicon |
| DE3025680A1 (en) * | 1980-07-07 | 1982-02-04 | Siemens AG, 1000 Berlin und 8000 München | High-temp. furnace heating element - is graphite cylinder heated by high-frequency induction and platinum or iridium coated |
| US4386137A (en) * | 1981-09-10 | 1983-05-31 | Nobuatsu Watanabe | Process for producing a graphite fluoride type film on the surface of an aluminum substrate |
| US4387962A (en) * | 1981-10-06 | 1983-06-14 | The United States Of America As Represented By The Secretary Of The Air Force | Corrosion resistant laser mirror heat exchanger |
| FR2527226B1 (en) * | 1982-05-19 | 1986-02-21 | Creusot Loire | METHOD FOR COATING IN THE GASEOUS PHASE OF SMALL HOLE HOUSINGS IN STEEL PARTS |
| DE3300449A1 (en) * | 1983-01-08 | 1984-07-12 | Philips Patentverwaltung Gmbh, 2000 Hamburg | METHOD FOR PRODUCING AN ELECTRODE FOR A HIGH PRESSURE GAS DISCHARGE LAMP |
| US4540607A (en) * | 1983-08-08 | 1985-09-10 | Gould, Inc. | Selective LPCVD tungsten deposition by the silicon reduction method |
| US4751044A (en) * | 1985-08-15 | 1988-06-14 | Westinghouse Electric Corp. | Composite nuclear fuel cladding tubing and other core internal structures with improved corrosion resistance |
| US4741928A (en) * | 1985-12-27 | 1988-05-03 | General Electric Company | Method for selective deposition of tungsten by chemical vapor deposition onto metal and semiconductor surfaces |
| JPS63203772A (en) * | 1987-02-20 | 1988-08-23 | Hitachi Ltd | Vapor growth method for thin copper film |
| FR2629839B1 (en) * | 1988-04-07 | 1991-03-22 | Pauleau Yves | PROCESS FOR DEPOSITING REFRACTORY METALS |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2856312A (en) * | 1953-07-03 | 1958-10-14 | Nowak Rudolf | Treating metal surfaces |
| US2887407A (en) * | 1957-08-05 | 1959-05-19 | Manufacturers Chemical Corp | Preparation of diffusion coatings on metals |
| US3414428A (en) * | 1964-10-20 | 1968-12-03 | Allied Chem | Chromizing compositions and methods and continuous production of chromium halides for chromizing |
| US3373018A (en) * | 1965-02-17 | 1968-03-12 | Allied Chem | Production of rigid shapes of refractory metals by decomposition of the metal hexafluoride in the interstices of a green compact |
| US3516850A (en) * | 1966-09-16 | 1970-06-23 | Texas Instruments Inc | Process for metal coating a hydrogen permeable material |
| US3658577A (en) * | 1969-10-01 | 1972-04-25 | Gene F Wakefield | Vapor phase deposition of silicide refractory coatings |
-
1972
- 1972-11-07 FR FR7239334A patent/FR2205583B1/fr not_active Expired
-
1973
- 1973-11-01 US US41201673 patent/US3911194A/en not_active Expired - Lifetime
- 1973-11-02 GB GB5099773A patent/GB1406394A/en not_active Expired
- 1973-11-07 DE DE19732355531 patent/DE2355531A1/en active Pending
- 1973-11-07 JP JP12525373A patent/JPS4995832A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5437933A (en) * | 1992-02-18 | 1995-08-01 | Johnson Matthey Public Limited Company | Coated ceramic article |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2205583A1 (en) | 1974-05-31 |
| JPS4995832A (en) | 1974-09-11 |
| FR2205583B1 (en) | 1975-09-12 |
| US3911194A (en) | 1975-10-07 |
| DE2355531A1 (en) | 1974-05-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |