JPS55134170A - Manufacture of deformed tungusten structure - Google Patents
Manufacture of deformed tungusten structureInfo
- Publication number
- JPS55134170A JPS55134170A JP4052379A JP4052379A JPS55134170A JP S55134170 A JPS55134170 A JP S55134170A JP 4052379 A JP4052379 A JP 4052379A JP 4052379 A JP4052379 A JP 4052379A JP S55134170 A JPS55134170 A JP S55134170A
- Authority
- JP
- Japan
- Prior art keywords
- deformed
- manufacture
- layer
- forming
- prescribed shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
- C23C16/14—Deposition of only one other metal element
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
- F16L9/00—Rigid pipes
- F16L9/02—Rigid pipes of metal
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Vapour Deposition (AREA)
- Rigid Pipes And Flexible Pipes (AREA)
Abstract
PURPOSE:To manufacture deformed W structure having a uniform, dense W layer formed on the surface of base material, by forming W layer, which is deposited by the reduction of WF6 with hydrogen, on the surface of base material made of material easily fabricable, having a prescribed shape and structure. CONSTITUTION:A form having a prescribed shape and structure, e.g., a straight pipe, a nozzle, is made of an easily fabricable material, such as Al, Cu, which is hardly corroded by a by-product HF. At least one surface of the form is brought into ontact with a mixed gas of WF6 with H2 at a temp. 250-1,000 deg.C to form a uniform coating having required excellent adhesive property, denseness, crystallizability, and having no pin holes, thereby forming deformed W structure of required construction. The W layer manufactured hereby is 1mu-1mm in thickness. The structure is excellent in corrosion resistance and is utilized profitably as material for parts of chemical apparatus, or as material of apparatus for measuring physical properties of strongly corrosive substance.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4052379A JPS55134170A (en) | 1979-04-04 | 1979-04-04 | Manufacture of deformed tungusten structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4052379A JPS55134170A (en) | 1979-04-04 | 1979-04-04 | Manufacture of deformed tungusten structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55134170A true JPS55134170A (en) | 1980-10-18 |
Family
ID=12582854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4052379A Pending JPS55134170A (en) | 1979-04-04 | 1979-04-04 | Manufacture of deformed tungusten structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55134170A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58161766A (en) * | 1982-03-17 | 1983-09-26 | Nippon Telegr & Teleph Corp <Ntt> | Method for vacuum deposition of tungsten |
EP0472876A2 (en) * | 1990-08-17 | 1992-03-04 | Hoechst Aktiengesellschaft | Process for the preparation of shaped bodies from high-temperature superconductor precursors |
JPH07118851A (en) * | 1993-10-26 | 1995-05-09 | Tokyo Tungsten Co Ltd | High melting point metallic foil and its production |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4995832A (en) * | 1972-11-07 | 1974-09-11 |
-
1979
- 1979-04-04 JP JP4052379A patent/JPS55134170A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4995832A (en) * | 1972-11-07 | 1974-09-11 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58161766A (en) * | 1982-03-17 | 1983-09-26 | Nippon Telegr & Teleph Corp <Ntt> | Method for vacuum deposition of tungsten |
EP0472876A2 (en) * | 1990-08-17 | 1992-03-04 | Hoechst Aktiengesellschaft | Process for the preparation of shaped bodies from high-temperature superconductor precursors |
JPH07118851A (en) * | 1993-10-26 | 1995-05-09 | Tokyo Tungsten Co Ltd | High melting point metallic foil and its production |
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