SE8205250D0 - Plasmabagapparat for paleggning av overdrag - Google Patents

Plasmabagapparat for paleggning av overdrag

Info

Publication number
SE8205250D0
SE8205250D0 SE8205250A SE8205250A SE8205250D0 SE 8205250 D0 SE8205250 D0 SE 8205250D0 SE 8205250 A SE8205250 A SE 8205250A SE 8205250 A SE8205250 A SE 8205250A SE 8205250 D0 SE8205250 D0 SE 8205250D0
Authority
SE
Sweden
Prior art keywords
anode
cathode
plasma
arc
working
Prior art date
Application number
SE8205250A
Other languages
English (en)
Other versions
SE450539B (sv
SE8205250L (sv
Inventor
Gennady Vasilievich Kljuchko
Valentin Glebovich Padalka
Leonid Pavlovich Sablev
Rimma Ivanovna Stupak
Original Assignee
Kljuchko Gennady V
Padalka Valentin G
Sablev Leonid P
Rimma Ivanovna Stupak
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kljuchko Gennady V, Padalka Valentin G, Sablev Leonid P, Rimma Ivanovna Stupak filed Critical Kljuchko Gennady V
Publication of SE8205250D0 publication Critical patent/SE8205250D0/sv
Publication of SE8205250L publication Critical patent/SE8205250L/sv
Publication of SE450539B publication Critical patent/SE450539B/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
SE8205250A 1982-09-17 1982-09-14 Plasmabagapparat for paleggning av overdrag SE450539B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08226496A GB2127043B (en) 1982-09-17 1982-09-17 Plasma arc apparatus for applying coatings

Publications (3)

Publication Number Publication Date
SE8205250D0 true SE8205250D0 (sv) 1982-09-14
SE8205250L SE8205250L (sv) 1984-03-15
SE450539B SE450539B (sv) 1987-06-29

Family

ID=10532967

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8205250A SE450539B (sv) 1982-09-17 1982-09-14 Plasmabagapparat for paleggning av overdrag

Country Status (7)

Country Link
US (1) US4492845A (sv)
AT (1) AT376460B (sv)
CH (1) CH656400A5 (sv)
DE (1) DE3234100C2 (sv)
FR (1) FR2533398A1 (sv)
GB (1) GB2127043B (sv)
SE (1) SE450539B (sv)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
US4627904A (en) * 1984-05-17 1986-12-09 Varian Associates, Inc. Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias
IL74360A (en) * 1984-05-25 1989-01-31 Wedtech Corp Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
DE3580953D1 (de) * 1984-08-31 1991-01-31 Anelva Corp Entladungsvorrichtung.
US4873605A (en) * 1986-03-03 1989-10-10 Innovex, Inc. Magnetic treatment of ferromagnetic materials
US4683148A (en) * 1986-05-05 1987-07-28 General Electric Company Method of producing high quality plasma spray deposits of complex geometry
US4681772A (en) * 1986-05-05 1987-07-21 General Electric Company Method of producing extended area high quality plasma spray deposits
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
NL8700620A (nl) * 1987-03-16 1988-10-17 Hauzer Holding Kathode boogverdampingsinrichting alsmede werkwijze voor het bedrijven daarvan.
EP0298157B1 (en) * 1987-06-29 1992-09-02 Hauzer Holding B.V. Method and device for coating cavities of objects
EP0306612B2 (de) * 1987-08-26 1996-02-28 Balzers Aktiengesellschaft Verfahren zur Aufbringung von Schichten auf Substraten
US4957058A (en) * 1987-11-16 1990-09-18 Nauchno-Proizvodstvennoe Objedinenie Po Vypusku Mekhanicheskogo Svarochnog Oborudovanija Machine for applying gas-thermal coatings
FI79351C (sv) * 1988-01-18 1989-12-11 Asko Anttila Förfarande och anordning för ytbeläggning av material.
DE58909180D1 (de) * 1988-03-23 1995-05-24 Balzers Hochvakuum Verfahren und Anlage zur Beschichtung von Werkstücken.
US5194128A (en) * 1989-07-12 1993-03-16 Thermo Electron Technologies Corporation Method for manufacturing ultrafine particles
US5062936A (en) * 1989-07-12 1991-11-05 Thermo Electron Technologies Corporation Method and apparatus for manufacturing ultrafine particles
US4990876A (en) * 1989-09-15 1991-02-05 Eastman Kodak Company Magnetic brush, inner core therefor, and method for making such core
DE4006456C1 (en) * 1990-03-01 1991-05-29 Balzers Ag, Balzers, Li Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
US5037522B1 (en) * 1990-07-24 1996-07-02 Vergason Technology Inc Electric arc vapor deposition device
EP0468110B1 (en) * 1990-07-24 1995-06-28 Institut Elektroniki Imeni U.A. Arifova Akademii Nauk Uzbexkoi Ssr Electric arc treatment of parts
DE4042337C1 (en) * 1990-08-22 1991-09-12 Plasco Dr. Ehrich Plasma-Coating Gmbh, 6501 Heidesheim, De Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
JPH07502136A (ja) * 1991-11-29 1995-03-02 ロッシスコ−シュヴェイトサルスコエ・アクトシオネルノエ・オブシェストヴォ・ザクリトゴ・ティパ“ノヴァ“（ロッシスコ−シュヴェイトサルスコエ・アオズィト“ノヴァ“） 放電獲得方法及びこれを行う装置
US5393575A (en) * 1992-03-03 1995-02-28 Esterlis; Moisei Method for carrying out surface processes
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
US5435900A (en) * 1992-11-04 1995-07-25 Gorokhovsky; Vladimir I. Apparatus for application of coatings in vacuum
ATE263005T1 (de) * 1994-04-25 2004-04-15 Gillette Co Verfahren zum amorphen diamantbeschichten von klingen
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
US6144544A (en) * 1996-10-01 2000-11-07 Milov; Vladimir N. Apparatus and method for material treatment using a magnetic field
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
US6009829A (en) * 1997-08-30 2000-01-04 United Technologies Corporation Apparatus for driving the arc in a cathodic arc coater
DE69824356T2 (de) * 1997-08-30 2005-02-17 United Technologies Corp. (N.D.Ges.D. Staates Delaware), Hartford Kathodisches Bogen-Beschichtungsgerät mit einer Vorrichtung zur Bogenführung
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US5972185A (en) * 1997-08-30 1999-10-26 United Technologies Corporation Cathodic arc vapor deposition apparatus (annular cathode)
DE19853943B4 (de) * 1997-11-26 2006-04-20 Vapor Technologies, Inc. (Delaware Corporation), Longmont Katode zur Zerstäubung oder Bogenaufdampfung sowie Vorrichtung zur Beschichtung oder Ionenimplantation mit einer solchen Katode
US6666865B2 (en) * 1998-09-29 2003-12-23 Sherwood Services Ag Swirling system for ionizable gas coagulator
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
JP4806146B2 (ja) * 1999-07-13 2011-11-02 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 真空処理ないしは粉末製造のための装置および方法
US6475217B1 (en) * 1999-10-05 2002-11-05 Sherwood Services Ag Articulating ionizable gas coagulator
US6616660B1 (en) * 1999-10-05 2003-09-09 Sherwood Services Ag Multi-port side-fire coagulator
US6436252B1 (en) 2000-04-07 2002-08-20 Surface Engineered Products Corp. Method and apparatus for magnetron sputtering
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US7300559B2 (en) * 2000-04-10 2007-11-27 G & H Technologies Llc Filtered cathodic arc deposition method and apparatus
CZ296094B6 (cs) * 2000-12-18 2006-01-11 Shm, S. R. O. Zarízení pro odparování materiálu k povlakování predmetu
KR20050044500A (ko) * 2001-11-15 2005-05-12 이오닉 퓨즌 코포레이션 이온 플라즈마 증착 장치
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
US8555921B2 (en) 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
US7866343B2 (en) * 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US7866342B2 (en) * 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
AU2003299685A1 (en) * 2002-12-18 2004-07-22 Ionic Fusion Corporation Ionic plasma deposition of anti-microbial surfaces and the anti-microbial surfaces resulting therefrom
US8066854B2 (en) * 2002-12-18 2011-11-29 Metascape Llc Antimicrobial coating methods
US8157795B2 (en) * 2004-02-03 2012-04-17 Covidien Ag Portable argon system
US7628787B2 (en) * 2004-02-03 2009-12-08 Covidien Ag Self contained, gas-enhanced surgical instrument
US8226643B2 (en) 2004-02-03 2012-07-24 Covidien Ag Gas-enhanced surgical instrument with pressure safety feature
US7833222B2 (en) 2004-02-03 2010-11-16 Covidien Ag Gas-enhanced surgical instrument with pressure safety feature
US7572255B2 (en) * 2004-02-03 2009-08-11 Covidien Ag Gas-enhanced surgical instrument
US8038858B1 (en) 2004-04-28 2011-10-18 Alameda Applied Sciences Corp Coaxial plasma arc vapor deposition apparatus and method
US7867366B1 (en) 2004-04-28 2011-01-11 Alameda Applied Sciences Corp. Coaxial plasma arc vapor deposition apparatus and method
US7691102B2 (en) * 2006-03-03 2010-04-06 Covidien Ag Manifold for gas enhanced surgical instruments
US7648503B2 (en) * 2006-03-08 2010-01-19 Covidien Ag Tissue coagulation method and device using inert gas
US7498587B2 (en) * 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
US8123744B2 (en) 2006-08-29 2012-02-28 Covidien Ag Wound mediating device
US8443519B2 (en) * 2006-09-15 2013-05-21 The Gillette Company Blade supports for use in shaving systems
US20090076505A1 (en) * 2007-09-13 2009-03-19 Arts Gene H Electrosurgical instrument
US20100042088A1 (en) * 2008-08-14 2010-02-18 Arts Gene H Surgical Gas Plasma Ignition Apparatus and Method
US8226642B2 (en) * 2008-08-14 2012-07-24 Tyco Healthcare Group Lp Surgical gas plasma ignition apparatus and method
CN101698934B (zh) * 2009-10-23 2011-06-15 武汉大学 一种中空阴极电弧离子镀涂层系统
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
CN103695861B (zh) * 2013-12-20 2015-12-09 安徽省蚌埠华益导电膜玻璃有限公司 基片装载架与磁导轨的连接结构
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
CN105483633B (zh) * 2016-02-01 2017-12-08 京东方科技集团股份有限公司 一种磁控溅射装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644191A (en) * 1968-03-15 1972-02-22 Tokyo Shibaura Electric Co Sputtering apparatus
SU307666A1 (ru) * 1968-09-09 1979-01-08 Sablev L P Электродуговой испаритель металлов
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
FR2154293A1 (en) * 1971-09-27 1973-05-11 Inst Fiz Akad Nauk Sputtering thin films - to produce homogeneous coatings on cylindrical articles
JPS51117933A (en) * 1975-04-10 1976-10-16 Tokuda Seisakusho Spattering apparatus
US4090941A (en) * 1977-03-18 1978-05-23 United Technologies Corporation Cathode sputtering apparatus
JPS5532317A (en) * 1978-08-28 1980-03-07 Asahi Chemical Ind High frequency magnetic field coupling arc plasma reactor
US4219397A (en) * 1978-11-24 1980-08-26 Clarke Peter J Magnetron sputter apparatus
US4243505A (en) * 1979-06-18 1981-01-06 Telic Corporation Magnetic field generator for use in sputtering apparatus
US4252626A (en) * 1980-03-10 1981-02-24 United Technologies Corporation Cathode sputtering with multiple targets
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
ATE13561T1 (de) * 1980-08-08 1985-06-15 Battelle Development Corp Zylindrische magnetron-zerstaeuberkathode.
US4370539A (en) * 1980-10-07 1983-01-25 Npk Za Kontrolno Zavarachni Raboti Device for the manual start-up of a plasma torch

Also Published As

Publication number Publication date
DE3234100A1 (de) 1984-03-15
CH656400A5 (de) 1986-06-30
US4492845A (en) 1985-01-08
ATA330782A (de) 1984-04-15
SE450539B (sv) 1987-06-29
GB2127043B (en) 1985-10-23
DE3234100C2 (de) 1985-04-11
GB2127043A (en) 1984-04-04
FR2533398A1 (fr) 1984-03-23
SE8205250L (sv) 1984-03-15
FR2533398B1 (sv) 1985-02-08
AT376460B (de) 1984-11-26

Similar Documents

Publication Publication Date Title
SE8205250L (sv) Plasmabagapparat for paleggning av overdrag
DE3663689D1 (en) Improved electric arc vapor deposition method
SU682150A3 (ru) Ионный двигатель
DE3377037D1 (en) Cylindrical cathode for magnetically-enhanced sputtering
ES296059U (es) Un quemador de plasma
JPS55161341A (en) Microwave ion source
GB1464490A (en) Beam-plasma type ion source
ES453781A1 (es) Perfeccionamientos introducidos en un soplete de trabajo conarcos electricos.
TW373244B (en) Ion source block filament with labyrinth conductive path
JPS5740845A (en) Ion beam generator
JPS5457859A (en) Ion source
KR890003728B1 (ko) 칼라 수상관용 전자총의 내부방전 억제장치
GB1465177A (en) Ion source
JPS5478198A (en) Electrode
JPH0228598Y2 (sv)
KR950007921Y1 (ko) 이온 소오스 제조장치
SU370891A1 (ru) Всесою
JPS5775136A (en) Ion generator
CS244507B1 (cs) Zdroj iontů
GB992666A (sv)
JPS57196520A (en) Rinsing method for epitaxial growing apparatus
GB1507087A (en) Extractor ion source
UA5774A1 (uk) Джерело іонів
DK399682A (da) Plasma-bueapparat til paafoering af beklaedninger
JPS5879853U (ja) 二次イオン質量分析計

Legal Events

Date Code Title Description
NUG Patent has lapsed

Ref document number: 8205250-7

Effective date: 19930406

Format of ref document f/p: F