UA97584C2 - СПОСОБ ТРАНСПОРТИРОВКИ Вакуумно-дуговой Катодной ПЛАЗМЫ С фильтрованием От макрочастиц И УСТРОЙСТВО ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ - Google Patents

СПОСОБ ТРАНСПОРТИРОВКИ Вакуумно-дуговой Катодной ПЛАЗМЫ С фильтрованием От макрочастиц И УСТРОЙСТВО ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ

Info

Publication number
UA97584C2
UA97584C2 UAA201013230A UAA201013230A UA97584C2 UA 97584 C2 UA97584 C2 UA 97584C2 UA A201013230 A UAA201013230 A UA A201013230A UA A201013230 A UAA201013230 A UA A201013230A UA 97584 C2 UA97584 C2 UA 97584C2
Authority
UA
Ukraine
Prior art keywords
plasma
magnetic field
anode
realization
winding
Prior art date
Application number
UAA201013230A
Other languages
English (en)
Ukrainian (uk)
Inventor
Владимир Васильевич Васильев
Владимир Евгеньевич Стрельницкий
Original Assignee
Национальный Научный Центр "Харьковский Физико-Технический Институт"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Национальный Научный Центр "Харьковский Физико-Технический Институт" filed Critical Национальный Научный Центр "Харьковский Физико-Технический Институт"
Priority to UAA201013230A priority Critical patent/UA97584C2/ru
Priority to US13/877,708 priority patent/US9035552B2/en
Priority to PCT/UA2011/000105 priority patent/WO2012064311A1/ru
Priority to KR1020137014734A priority patent/KR101575145B1/ko
Priority to EP11839748.8A priority patent/EP2639330B1/en
Priority to JP2013537644A priority patent/JP5833662B2/ja
Priority to CN201180053875.2A priority patent/CN103298969B/zh
Publication of UA97584C2 publication Critical patent/UA97584C2/ru
Priority to JP2015038333A priority patent/JP6305950B2/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Combustion & Propulsion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
UAA201013230A 2010-11-08 2010-11-08 СПОСОБ ТРАНСПОРТИРОВКИ Вакуумно-дуговой Катодной ПЛАЗМЫ С фильтрованием От макрочастиц И УСТРОЙСТВО ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ UA97584C2 (ru)

Priority Applications (8)

Application Number Priority Date Filing Date Title
UAA201013230A UA97584C2 (ru) 2010-11-08 2010-11-08 СПОСОБ ТРАНСПОРТИРОВКИ Вакуумно-дуговой Катодной ПЛАЗМЫ С фильтрованием От макрочастиц И УСТРОЙСТВО ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ
US13/877,708 US9035552B2 (en) 2010-11-08 2011-10-31 Method and device for transporting vacuum arc plasma
PCT/UA2011/000105 WO2012064311A1 (ru) 2010-11-08 2011-10-31 Способ транспортировки вакуумно- дуговой плазмы и устройство для его осуществления
KR1020137014734A KR101575145B1 (ko) 2010-11-08 2011-10-31 진공 아크 플라즈마 이송 방법 및 장치
EP11839748.8A EP2639330B1 (en) 2010-11-08 2011-10-31 Method and device for transporting vacuum arc plasma
JP2013537644A JP5833662B2 (ja) 2010-11-08 2011-10-31 線形プラズマ−光学システム
CN201180053875.2A CN103298969B (zh) 2010-11-08 2011-10-31 用于传输真空电弧等离子体的方法和装置
JP2015038333A JP6305950B2 (ja) 2010-11-08 2015-02-27 真空アークプラズマを輸送するための方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
UAA201013230A UA97584C2 (ru) 2010-11-08 2010-11-08 СПОСОБ ТРАНСПОРТИРОВКИ Вакуумно-дуговой Катодной ПЛАЗМЫ С фильтрованием От макрочастиц И УСТРОЙСТВО ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ

Publications (1)

Publication Number Publication Date
UA97584C2 true UA97584C2 (ru) 2012-02-27

Family

ID=46051213

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA201013230A UA97584C2 (ru) 2010-11-08 2010-11-08 СПОСОБ ТРАНСПОРТИРОВКИ Вакуумно-дуговой Катодной ПЛАЗМЫ С фильтрованием От макрочастиц И УСТРОЙСТВО ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ

Country Status (7)

Country Link
US (1) US9035552B2 (ru)
EP (1) EP2639330B1 (ru)
JP (2) JP5833662B2 (ru)
KR (1) KR101575145B1 (ru)
CN (1) CN103298969B (ru)
UA (1) UA97584C2 (ru)
WO (1) WO2012064311A1 (ru)

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KR20120042748A (ko) 2009-05-13 2012-05-03 씨브이 홀딩스 엘엘씨 코팅된 표면 검사를 위한 가스제거 방법
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
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WO2014085346A1 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Hollow body with inside coating
CN103227090B (zh) * 2013-02-04 2016-04-06 深圳市劲拓自动化设备股份有限公司 一种线性等离子体源
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CA2904611C (en) 2013-03-11 2021-11-23 Sio2 Medical Products, Inc. Coated packaging
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
CN104775096B (zh) * 2015-04-16 2017-05-10 安徽纯源镀膜科技有限公司 纯离子真空镀膜设备中用于延长绝缘材料维护周期的装置
CA2995225C (en) 2015-08-18 2023-08-29 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
CN106702328B (zh) * 2017-02-17 2019-08-30 大连交通大学 磁偏转电子束蒸发源
CN109267018B (zh) * 2017-07-18 2021-12-17 平高集团有限公司 一种快速等离子体镀膜方法及装置
JP7390396B2 (ja) * 2019-03-15 2023-12-01 ナノフィルム テクノロジーズ インターナショナル リミテッド 改良されたカソードアーク源
US11672074B2 (en) * 2019-07-11 2023-06-06 Lockheed Martin Corporation Shielding structures in plasma environment
CN111074215B (zh) * 2019-12-27 2021-07-02 季华实验室 一种新型阴极电弧的颗粒过滤器
EP3849282A1 (en) * 2020-01-09 2021-07-14 terraplasma emission control GmbH Plasma discharge system and method of using the same
CN111916326A (zh) * 2020-06-09 2020-11-10 哈尔滨工业大学 一种具有防护功能的离子源的导磁套筒结构
WO2021255242A1 (en) 2020-06-19 2021-12-23 Nanofilm Technologies International Limited Improved cathode arc source, filters thereof and method of filtering macroparticles
CN113573454B (zh) * 2021-08-05 2022-03-29 富时精工(南京)有限公司 一种可变磁场约束的等离子体射流装置及其方法
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Also Published As

Publication number Publication date
US20130214684A1 (en) 2013-08-22
WO2012064311A1 (ru) 2012-05-18
JP5833662B2 (ja) 2015-12-16
EP2639330A1 (en) 2013-09-18
CN103298969A (zh) 2013-09-11
JP2014503935A (ja) 2014-02-13
CN103298969B (zh) 2015-09-16
KR101575145B1 (ko) 2015-12-07
JP6305950B2 (ja) 2018-04-04
EP2639330A4 (en) 2015-07-08
US9035552B2 (en) 2015-05-19
EP2639330B1 (en) 2017-09-20
KR20130132469A (ko) 2013-12-04
JP2015159113A (ja) 2015-09-03

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