Classifications

• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/22—Organic compounds
  • C11D7/32—Organic compounds containing nitrogen
  • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B08—CLEANING
  • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
  • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
  • B08B3/04—Cleaning involving contact with liquid
  • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B08—CLEANING
  • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
  • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
  • B08B3/04—Cleaning involving contact with liquid
  • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
  • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
  • C11D1/66—Non-ionic compounds
  • C11D1/72—Ethers of polyoxyalkylene glycols
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
  • C11D1/66—Non-ionic compounds
  • C11D1/722—Ethers of polyoxyalkylene glycols having mixed oxyalkylene groups; Polyalkoxylated fatty alcohols or polyalkoxylated alkylaryl alcohols with mixed oxyalkylele groups
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
  • C11D17/08—Liquid soap, e.g. for dispensers; capsuled
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
  • C11D3/16—Organic compounds
  • C11D3/20—Organic compounds containing oxygen
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/22—Organic compounds
  • C11D7/32—Organic compounds containing nitrogen
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/50—Solvents
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/50—Solvents
  • C11D7/5036—Azeotropic mixtures containing halogenated solvents
  • C11D7/5068—Mixtures of halogenated and non-halogenated solvents
  • C11D7/5077—Mixtures of only oxygen-containing solvents
  • C11D7/5086—Mixtures of only oxygen-containing solvents the oxygen-containing solvents being different from alcohols, e.g. mixtures of water and ethers
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
  • C11D2111/10—Objects to be cleaned
  • C11D2111/14—Hard surfaces
  • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
  • C11D3/16—Organic compounds
  • C11D3/26—Organic compounds containing nitrogen
  • C11D3/30—Amines; Substituted amines ; Quaternized amines
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
  • C11D3/43—Solvents

Definitions

• the present disclosure relates to a cleaning composition for a screen plate and a method for cleaning the screen plate.
• Soldering is generally performed when electronic components are mounted on a printed circuit board or a ceramic substrate.
• flux is used for soldering in order to remove the oxide film on the surface of the solder and the base material or prevent re-oxidation of the surface of the solder and the base material to obtain a sufficient solder connection.
• various cleaning compositions for cleaning and removing the flux residue have been proposed.
• Patent Document 1 discloses an organic amine having a specific water-soluble glycol ether 75 to 94.99 wt% and a boiling point of 170 to 270 ° C. for cleaning various contaminants such as flux residues and metalworking oils.
• An industrial detergent composition comprising 0.01 to 5% by weight of water and 5 to 20% by weight of water and substantially free of other components is disclosed.
• Patent Document 2 discloses a cleaning composition comprising a glycol-based solvent, an amine and / or a surfactant for cleaning a flux and a remelted solution remaining on a substrate in an arbitrary process at the time of manufacturing a printed circuit board. It is disclosed.
• Patent Document 3 discloses that one or two or more glycol ether compounds having a constant boiling point and having water solubility are 25 to 45% by weight, one or two having a constant boiling point and a certain amount of water solubility.
• a metal mask cleaning agent containing 5 to 25% by weight of at least one glycol ether compound, 0.005 to 1.0% by weight of an amine compound and water (remaining amount) is disclosed.
• Patent Document 4 discloses a cleaning agent for cleaning an object to be cleaned to which an organic EL material is adhered, and includes 5 to 80% by mass of a specific propylene glycol such as propylpropylene diglycol and N-methyl-2-pyrrolidone.
• a cleaning agent comprising a composition comprising 20 to 95% by mass of a specific pyrrolidone as described above is disclosed.
• Patent Document 5 discloses a screen plate cleaning composition containing a low-boiling hydrophilic glycol ether monoalkyl ether, a high-boiling hydrophilic glycol ether monoalkyl ether, and water.
• JP-A-9-87668 Japanese Patent Laid-Open No. 5-125395 JP-A-9-59688 JP 2006-265300 A JP 2000-267293 A
• the cleaning agent has higher detergency in order to prevent product defects caused by residue of various pastes such as flux and solder paste on the screen plate surface due to repeated use of the screen plate. It has been demanded. Furthermore, in order to obtain high productivity, it is preferable that it can be dried quickly after washing, and the cleaning agent is required to have quick liquid drainage.
• none of the methods described in the above-mentioned patent documents can achieve both high detergency and quick liquid drainage.
• the present disclosure provides a cleaning composition for a screen plate and a cleaning method that are excellent in cleaning properties and liquid cutting properties.
• the present disclosure is an amine (component A) or a salt thereof having a solubility in 100 g of water at 25 ° C. of less than 10 g, or a solvent having a solubility in 100 g of water at 25 ° C. of 0.02 g or more and less than 10 g (component B).
• component A is at least one selected from primary amines, secondary amines, and tertiary amines having 6 to 26 carbon atoms.
• the present disclosure includes a step of cleaning an object to be cleaned using the cleaning composition according to the present disclosure, and the object to be cleaned is a screen plate after screen printing. .
• the present disclosure in one aspect, relates to the use of the cleaning composition according to the present disclosure for cleaning a screen plate after screen printing.
• the present disclosure in one aspect, relates to the use of the cleaning composition according to the present disclosure for removing at least one of a flux and a solder paste from a screen plate.
• the present disclosure it is possible to provide a cleaning composition for a screen plate having excellent cleaning properties and liquid cutting properties. Then, by using the cleaning composition of the present disclosure, the time required for cleaning and drying the screen plate can be shortened, and a screen plate excellent in cleanliness can be efficiently obtained. The production efficiency of electronic parts such as ceramic substrates can be improved.
• the present disclosure relates to a cleaning composition used for cleaning a screen plate, a solubility of less than 10 g in 100 g of water at 25 ° C., a primary to tertiary amine having 6 to 26 carbon atoms (component A), and 100 g of water at 25 ° C.
• a solvent component B having a solubility in the range of 0.02 g or more and less than 10 g, it is based on the knowledge that the detergency can be improved and the liquid breakage is accelerated.
• a cleaning composition according to the present disclosure it is possible to provide a cleaning composition for a screen plate having excellent cleaning properties and liquid cutting properties.
• the cleaning composition according to the present disclosure When the cleaning composition according to the present disclosure is used for cleaning a screen plate after screen printing, the amine of component A in the cleaning composition has low water solubility and low hydrophilicity, that is, hydrophobicity. Adsorb to the screen plate surface to make the screen plate surface hydrophobic. Component A adsorbs or permeates oily components such as flux at the same time as making the screen plate surface hydrophobic, increasing fluidity of the oily component and causing charge repulsion with the screen plate surface.
• component A acts on the screen plate surface and oily components such as flux, thereby peeling (removing) the oily component from the screen plate and further preventing the removed oily component from reattaching to the screen plate.
• oily components such as flux
• the oily component can be easily removed from the screen plate with the assistance of physical force by spraying or ultrasonic waves.
• the solvent of component B in the cleaning composition has a certain degree of solubility in water, it can be compatible with component A, and can be uniformly stabilized in water, resulting in oily components such as flux. In order to facilitate adsorption or permeation, the detergency is estimated to be improved.
• component A forms a salt with an acid
• the cleaning composition according to the present disclosure further contains an acid (component C)
• the amine of component A and the acid of component C form a salt.
• the presence of a salt of an amine and an acid in the cleaning composition increases the permeability to oily components such as flux, and it is estimated that the above effects can be expressed in a shorter time.
• the present disclosure is not limited to this mechanism.
• the cleaning composition according to the present disclosure includes an amine (component A) or a salt thereof having a solubility in 100 g of water at 25 ° C. of less than 10 g.
• Component A can be used alone or in combination of two or more.
• the solubility of Component A in 100 g of water at 25 ° C. is less than 10 g, and is preferably 8 g or less, more preferably 5 g or less, still more preferably 2 g or less, and even more preferably 1 g or less, from the viewpoints of detergency and liquid breakage.
• 0.5 g or less is still more preferable, 0.2 g or less is more preferable, 0.1 g or less is more preferable, and from the same viewpoint, 0.0001 g or more is preferable, and 0.001 g or more is more preferable 0.01 g or more is more preferable.
• the amine of component A is at least one selected from primary amines, secondary amines, and tertiary amines having 6 to 26 carbon atoms from the viewpoints of detergency and liquid drainage.
• the number of carbon atoms of component A is 6 or more, preferably 7 or more, more preferably 8 or more, and more preferably 26 or less and 18 or less from the same viewpoint from the viewpoints of detergency and liquid breakage.
• 12 or less is more preferable, and 10 or less is still more preferable.
• the counter ion for forming the salt is not particularly limited, and examples thereof include the acid of component C.
• Component A is preferably at least one selected from the compounds represented by formula (I) from the viewpoints of detergency and liquid drainage.
• R 1 represents at least one selected from a linear or branched alkyl group having 5 to 18 carbon atoms and a linear or branched alkenyl group having 5 to 18 carbon atoms.
• R 2 and R 3 are the same or different and represent at least one selected from a linear or branched alkyl group having 1 to 5 carbon atoms and a hydrogen atom, and the carbon number of R 1 , R 2 and R 3 Is 6 or more and 26 or less.
• the carbon number of R 1 is 5 or more, preferably 6 or more, more preferably 7 or more, from the viewpoint of detergency and liquid breakage, and suppresses foaming (hereinafter referred to as “suppression”). From the viewpoint of “foamability”, it is 18 or less, preferably 12 or less, more preferably 10 or less, and still more preferably 8 or less.
• R 2 and R 3 are each independently at least selected from a straight-chain or branched alkyl group having 1 to 5 carbon atoms and a hydrogen atom from the viewpoints of detergency and liquid drainage. Preferably, it is at least one selected from a linear alkyl group having 1 or 2 carbon atoms and a hydrogen atom, more preferably a methyl group or a hydrogen atom, and still more preferably a hydrogen atom.
• the total number of carbon atoms of R 1 , R 2 and R 3 is 6 or more, preferably 7 or more, more preferably 8 or more, from the viewpoint of detergency and severability. From the viewpoint of foamability, it is 26 or less, preferably 18 or less, more preferably 12 or less, and still more preferably 10 or less.
• Examples of the salt of component A include a salt of at least one compound selected from the compounds represented by the formula (I) and an acid from the viewpoints of detergency and liquid drainage.
• the acid is not particularly limited as long as it forms a water-soluble salt with component A, and examples thereof include the acid of component C described later.
• the content of Component A during the cleaning of the cleaning composition according to the present disclosure is preferably 0.001% by mass or more, more preferably 0.01% by mass or more, from the viewpoints of detergency and liquid drainage.
• 02% by mass or more is more preferable, and from the viewpoints of detergency, liquid drainage and foam suppression, 2.0% by mass or less is preferable, 1.0% by mass or less is more preferable, and 0.7% by mass or less is preferable. More preferably, 0.2 mass% or less is still more preferable, 0.15 mass% or less is further more preferable, and 0.1 mass% or less is still more preferable.
• component A is a combination of two or more amines
• the content of component A refers to the total content thereof.
• the “content of each component during cleaning of the cleaning composition” refers to the content of each component of the cleaning composition used in the cleaning step in one or more embodiments.
• the cleaning composition according to the present disclosure includes a solvent (component B) having a solubility in 100 g of water at 25 ° C. of 0.02 g or more and less than 10 g.
• Component B can be used alone or in combination of two or more.
• the solubility of component B in water at 25 ° C. is 0.02 g or more, preferably 0.05 g or more, more preferably 0.1 g or more, and more preferably 0.2 g or more, from the viewpoints of detergency and liquid breakage. Preferably, from the same viewpoint, it is less than 10 g, preferably 5 g or less, more preferably 3 g or less, and even more preferably 2 g or less.
• component B examples include solvents other than component A having solubility within the above range from the viewpoint of detergency and liquid breakage.
• solvents other than component A having solubility within the above range from the viewpoint of detergency and liquid breakage.
• glycol ether solvents and alcohol solvents having solubility within the above range There may be mentioned at least one selected.
• the glycol ether solvent is preferably at least one selected from compounds represented by the following formula (II) from the viewpoints of detergency and severability.
• R 4 represents a hydrocarbon group having 3 to 12 carbon atoms
• EO represents an ethylene oxide group
• m is an added mole number of EO, and is a number from 0 to 5
• PO represents a propylene oxide group
• n is the number of moles of PO added and is a number from 0 to 2
• m + n ⁇ 1 the addition form of EO and PO may be block or random. The order of addition does not matter.
• R 4 is a hydrocarbon group having 3 to 12 carbon atoms, preferably a hydrocarbon group having 6 to 10 carbon atoms, from the viewpoint of improving detergency and liquid drainage.
• a hydrocarbon group having a number of 6 or more and 8 or less is more preferable.
• (EO) m (PO) n may be composed of an ethylene oxide group alone, but may be composed of an ethylene oxide group and a propylene oxide group.
• (EO) m (PO) When n is composed of an ethylene oxide group and a propylene oxide group, the arrangement of EO and PO may be random or block. When the arrangement of EO and PO is a block, the number of EO blocks and the number of PO blocks may be one or more as long as each average added mole number is within the above range. When the number of EO blocks is two or more, the number of EO repetitions in each block may be the same or different.
• component B examples include, for example, ethylene glycol mono-2-ethylhexyl ether (solubility: 0.20 g), diethylene glycol mono-2-ethylhexyl ether (solubility: 0.20 g), ethylene glycol monohexyl ether (solubility: 1.00 g).
• Diethylene glycol monohexyl ether (solubility: 1.40 g), propylene glycol monophenyl ether (phenoxypropanol, solubility: 0.20 g), dipropylene glycol monopropyl ether (solubility: 5.60 g), propylene glycol monobutyl ether (solubility) : 6.60 g) or a combination of two or more.
• ethylene glycol mono-2-ethylhexyl ether (solubility: 0.20 g), ethylene glycol monohexyl ether (solubility: 1.00 g), diethylene glycol monohexyl ether (solubility: 1.40 g) and propylene
• glycol monophenyl ether (solubility: 0.20 g) is preferable.
• Ethylene glycol mono 2-ethylhexyl ether (solubility: 0.20 g), diethylene glycol monohexyl ether (solubility: 1.40 g) And a combination of two or more selected from propylene glycol monophenyl ether (solubility: 0.20 g), ethylene glycol mono 2-ethylhexyl ether (solubility: 0.20 g) and Ethylene glycol monohexyl ether (solubility: 1.40 g) is more preferably either ethylene glycol mono-2-ethylhexyl ether (solubility: 0.20 g) is more preferably more.
• the solubility in parentheses indicates the solubility in 100 g of water at 25 ° C.
• the content of Component B during cleaning of the cleaning composition according to the present disclosure is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, from the viewpoint of detergency and liquid breakage, and 1% by mass. % Or more, more preferably 2% by weight or more, and from the same viewpoint, 20% by weight or less is preferable, 15% by weight or less is more preferable, 12% by weight or less is further preferable, and 10% by weight or less is preferable. Even more preferred.
• component B is a combination of two or more solvents
• the content of component B refers to the total content thereof.
• the ratio A / B of the content of the component A to the content of the component B in the cleaning composition according to the present disclosure is preferably 0.001 or more, and preferably 0.002 or more from the viewpoint of detergency and liquid drainage. More preferably, 0.003 or more is further preferable, and from the same viewpoint, 0.1 or less is preferable, 0.09 or less is more preferable, and 0.08 or less is still more preferable.
• the cleaning composition according to the present disclosure may further contain an acid (component C).
• the cleaning composition according to the present disclosure may further contain an acid (component C).
• Component C can be used alone or in combination of two or more.
• Component C is preferably an acid that forms a salt with Component A from the viewpoints of detergency and severability, and 1 to at least one group selected from a carboxy group, a sulfonic acid group, a sulfuric acid group, and a phosphoric acid group.
• One or two or more acids selected from three compounds having 2 to 12 carbon atoms and formic acid are more preferable.
• component C include, for example, formic acid, acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, caprylic acid, 2-ethylhexanoic acid, pelargonic acid, and capric acid.
• Acetic acid, caprylic acid, 2-e One or a combination of two or more selected from ruhexanoic acid, lactic acid, citric acid, p-toluenesulfonic acid and 1-hydroxyethylidene-1,1-diphosphonic acid is more preferable.
• acetic acid, 2-ethylhexanoic acid More preferred is one or a combination of two or more selected from citric acid, p-toluenesulfonic acid and 1-hydroxyethylidene-1,1-diphosphonic acid.
• Formic acid acetic acid, p-toluenesulfonic acid and 1-hydroxyethylidene- One or a combination of two or more selected from 1,1-diphosphonic acid is still more preferred, one of acetic acid and p-toluenesulfonic acid is still more preferred, and acetic acid is still more preferred.
• the content (or blending amount) of Component C during cleaning of the cleaning composition according to the present disclosure is preferably 0.001% by mass or more, and 0.005% by mass or more from the viewpoints of detergency and liquid drainage. More preferably, the content is more preferably 0.01% by mass or more, and from the viewpoint of keeping the washability, liquid breakage and foaming low, it is preferably 2.0% by mass or less, more preferably 1.0% by mass or less, and 7 mass% or less is still more preferable, 0.2 mass% or less is still more preferable, 0.15 mass% or less is further more preferable, and 0.1 mass% or less is still more preferable.
• the content (or blending amount) of component C refers to the total content (or total blending amount) thereof.
• the ratio A / C of the content of component A to the content (or blending amount) of component C in the cleaning composition according to the present disclosure is preferably 0.1 or more from the viewpoint of detergency and liquidity. 0.2 or more is more preferable, 0.4 or more is more preferable, and from the same viewpoint, 10 or less is preferable, 7 or less is more preferable, and 5 or less is still more preferable.
• the cleaning composition according to the present disclosure contains water (component D).
• water of component D ion exchange water, RO water, distilled water, pure water, or ultrapure water can be used. What is necessary is just to set content of water suitably according to the usage condition of the cleaning composition which concerns on this indication.
• the content of Component D during cleaning of the cleaning composition according to the present disclosure is preferably 70% by mass or more, more preferably 80% by mass or more, still more preferably 85% by mass or more, from the viewpoint of detergency. From the same viewpoint, 99 mass% or less is preferable, 97 mass% or less is more preferable, and 95 mass% or less is still more preferable.
• the cleaning composition according to the present disclosure may contain an optional component as necessary in addition to the components A to D described above, as long as the effects of the present disclosure are not impaired.
• optional components include nonionic surfactants; compounds having chelating power such as aminocarboxylates such as hydroxyethylaminoacetic acid, hydroxyethyliminodiacetic acid, and ethylenediaminetetraacetic acid; antiseptics; rustproofing agents; Antibacterial agents; defoaming agents such as silicone; antioxidants; esters such as palm fatty acid methyl and benzyl acetate; hydrocarbon solvents; alcohols;
• the content of the optional component during cleaning of the cleaning composition according to the present disclosure is preferably 0% by mass or more and 2.0% by mass or less, and preferably 0% by mass or more and 1.5% by mass from the viewpoint of not hindering the effects of the present disclosure. % Or less is more preferable, 0 mass% or more and 1.3 mass% or less is still more preferable, and 0 mass% or more and 1.0 mass% or less is still more preferable.
• the cleaning composition according to the present disclosure includes two or more optional components, the content of the optional components refers to the total content thereof.
• the pH during cleaning of the cleaning composition according to the present disclosure is preferably 12 or less, more preferably 9 or less, still more preferably 8 or less, still more preferably 7 or less, from the viewpoints of detergency and liquid drainage. From the viewpoints of cleaning properties, liquid drainage and corrosion prevention of cleaning equipment, 4 or more is preferable, 4.5 or more is more preferable, 5 or more is further preferable, and 5.5 or more is even more preferable.
• pH at the time of cleaning is a pH at the time of use (after dilution) of the cleaning composition at 25 ° C., and can be measured using a pH meter. Specifically, it can be measured by the method described in the examples.
• Adjustment of the pH of the cleaning composition according to the present disclosure includes, for example, inorganic acids such as nitric acid and sulfuric acid; organic acids such as oxycarboxylic acid, polyvalent carboxylic acid, aminopolycarboxylic acid, and amino acid; and metal salts thereof.
• Basic substances such as ammonium salts, ammonia, sodium hydroxide, potassium hydroxide, amines, etc. can be used.
• the cleaning composition according to the present disclosure can be produced by blending the component A, the component B and the component D, and optionally the component C and an optional component by a known method.
• the cleaning composition according to the present disclosure may be formed by blending at least the component A, the component B, and the component D. Therefore, this indication is related with a manufacturing method of a detergent constituent including a process of blending at least the above-mentioned ingredient A, ingredient B, and ingredient D in one mode.
• “mixing” includes mixing Component A, Component B and Component D, and optionally mixing Component C and optional components simultaneously or in any order.
• the blending amount of each component may be the same as the content of each component of the cleaning composition according to the present disclosure described above.
• the cleaning composition according to the present disclosure may be prepared as a concentrate with a reduced amount of component D water from the viewpoint of storage and transportation.
• the concentrate of the cleaning composition is preferably a concentrate having a dilution ratio of 3 times or more from the viewpoint of storage and transportation, and is preferably a concentrate having a dilution ratio of 200 times or less from the viewpoint of storage stability. .
• the concentrate of the cleaning composition can be used after being diluted with water so that the content of each component at the time of use becomes the above-described content (that is, the content at the time of cleaning).
• the concentrate of a cleaning composition can also be used by adding each component separately at the time of use.
• “when using” or “when cleaning” the concentrate of the cleaning composition refers to a state in which the concentrate of the cleaning composition is diluted.
• the cleaning composition according to the present disclosure includes a cleaning of a screen plate after screen printing, a flux; a conductive paste such as a solder paste, a silver paste, and a copper paste; Can be used for cleaning.
• the screen plate include a metal mask, a resin mask, an electroformed mask, and an emulsion mask. Accordingly, the present disclosure, in one aspect, relates to the use of a cleaning composition according to the present disclosure for cleaning a screen plate after screen printing. Furthermore, in another aspect, the present disclosure relates to the use of the cleaning composition according to the present disclosure for removing at least one of flux and solder paste from a screen plate.
• the present disclosure provides a method for cleaning a screen plate (hereinafter referred to as “this disclosure”) including a step of cleaning an object to be cleaned using the cleaning composition according to the present disclosure (hereinafter also referred to as “cleaning step”). Also referred to as “cleaning method”.
• the cleaning composition according to the present disclosure is a concentrate
• the cleaning method according to the present disclosure may further include a step of diluting the concentrate of the cleaning composition.
• the object to be cleaned include the objects to be cleaned described above.
• the cleaning step may include bringing the cleaning composition according to the present disclosure into contact with an object to be cleaned.
• Examples of a method for cleaning an object to be cleaned using the cleaning composition according to the present disclosure include, for example, a method of immersing an object to be cleaned in a cleaning tank and bringing the cleaning composition into contact with the object to be cleaned, an ultrasonic cleaning device And a method of bringing the cleaning composition portion into contact with the object to be cleaned in the bathtub, a method of injecting the cleaning composition in a spray form and bringing it into contact with the object to be cleaned.
• the cleaning method according to the present disclosure may further include a step of drying the rinsed screen plate without rinsing.
• a step of drying the rinsed screen plate without rinsing As a result, the time required for cleaning and drying of the screen plate can be shortened, and a screen plate excellent in cleanliness can be obtained efficiently, and the productivity of electronic components such as high-quality printed boards and ceramic substrates can be improved.
• the cleaning method according to the present disclosure it is preferable to irradiate ultrasonic waves when the cleaning composition according to the present disclosure and the object to be cleaned are in contact with each other because the cleaning power of the cleaning composition according to the present disclosure is easily exhibited.
• the ultrasonic irradiation condition can be set to 20 to 2000 kHz, for example.
• the present disclosure is a kit for producing the cleaning composition according to the present disclosure, and includes the component A, the component B, and the component D that constitute the cleaning composition according to the present disclosure.
• the present invention relates to a kit (hereinafter also referred to as “kit according to the present disclosure”) in which at least one of the components is stored in a state where it is not mixed with other components. According to the present disclosure, it is possible to provide a kit capable of obtaining a cleaning composition having excellent cleaning properties and liquid drainage properties.
• a solution containing component B (first liquid) and a solution containing one or more of components A, C and D (second liquid) are mixed with each other.
• a kit (two-component detergent composition) in which these are stored at the time of use.
• the above-described optional components may be mixed as necessary.
• the present disclosure further relates to the following cleaning composition, cleaning method, production method and kit.
• ⁇ 2> The cleaning composition for screen plates according to ⁇ 1>, wherein the pH is 5 or more and 12 or less.
• the pH is preferably 4 or more, more preferably 4.5 or more, still more preferably 5 or more, and even more preferably 5.5 or more, for the screen plate according to any one of ⁇ 1> to ⁇ 3> Cleaning composition.
• ⁇ 5> The solubility of Component A in 100 g of water at 25 ° C.
• the cleaning composition for screen plates is less than 10 g, preferably 8 g or less, more preferably 5 g or less, still more preferably 2 g or less, still more preferably 1 g or less, and 0.5 g or less.
• the cleaning composition for screen plates according to any one of ⁇ 1> to ⁇ 4>, further more preferably 0.2 g or less, still more preferably 0.1 g or less.
• the solubility of Component A in 100 g of water at 25 ° C. is preferably 0.0001 g or more, more preferably 0.001 g or more, and further preferably 0.01 g or more, ⁇ 1> to ⁇ 5> A cleaning composition for screen plates.
• ⁇ 7> The cleaning composition for screen plates according to any one of ⁇ 1> to ⁇ 6>, wherein component A has 6 or more carbon atoms, preferably 7 or more, and more preferably 8 or more.
• component A has 6 or more carbon atoms, preferably 7 or more, and more preferably 8 or more.
• the number of carbon atoms of component A is 26 or less, preferably 18 or less, more preferably 12 or less, and still more preferably 10 or less, cleaning for a screen plate according to any one of ⁇ 1> to ⁇ 7> Agent composition.
• ⁇ 9> The cleaning composition for screen plates according to any one of ⁇ 1> to ⁇ 8>, wherein Component A is at least one selected from compounds represented by the following formula (I).
• R 1 is at least one selected from a linear or branched alkyl group having 5 to 18 carbon atoms and a linear or branched alkenyl group having 5 to 18 carbon atoms.
• R 2 and R 3 are the same or different and represent at least one selected from a linear or branched alkyl group having 1 to 5 carbon atoms and a hydrogen atom, and the total of R 1 , R 2 and R 3 The number of carbon atoms is 6 or more and 26 or less.
• the salt of component A is at least one compound selected from the compounds represented by formula (I), and at least one group selected from a carboxy group, a sulfonic acid group, a sulfuric acid group, and a phosphoric acid group.
• the cleaning composition for screen plates according to ⁇ 9> which is a salt with 1 to 3 compounds having 2 to 12 carbon atoms and at least one compound selected from formic acid.
• the content of the component A at the time of cleaning the cleaning composition is preferably 0.001% by mass or more, more preferably 0.01% by mass or more, and further preferably 0.02% by mass or more.
• the content of Component A during cleaning of the cleaning composition is preferably 2.0% by mass or less, more preferably 1.0% by mass or less, still more preferably 0.7% by mass or less, and 0.2% by mass.
• the solubility of component B in water at 25 ° C. is 0.02 g or more, preferably 0.05 g or more, more preferably 0.1 g or more, and further preferably 0.2 g or more, from ⁇ 1> to ⁇ 12>
• the cleaning composition for screen plates according to any one of the above. ⁇ 14> The solubility of component B in water at 25 ° C.
• Cleaning composition for screen plate is less than 10 g, preferably 5 g or less, more preferably 3 g or less, and even more preferably 2 g or less, according to any one of ⁇ 1> to ⁇ 13>
• Cleaning composition for screen plate is less than 10 g, preferably 5 g or less, more preferably 3 g or less, and even more preferably 2 g or less, according to any one of ⁇ 1> to ⁇ 13>
• Cleaning composition for screen plate ⁇ 15>
• Component B is at least one compound selected from compounds represented by the following formula (II).
• R 4 O— (EO) m (PO) n —H (II)
• R 4 represents a hydrocarbon group having 3 to 12 carbon atoms
• EO represents an ethylene oxide group
• m is an added mole number of EO, and is a number from 0 to 5 Yes
• PO represents a propylene oxide group
• n is the number of moles of PO added and is a number from 0 to 2
• the addition form of EO and PO may be block or random, and EO and The order of adding PO is not limited.
• R 4 in the formula (II) is a hydrocarbon group having 3 to 12 carbon atoms, preferably a hydrocarbon group having 6 to 10 carbon atoms, and a hydrocarbon group having 6 to 8 carbon atoms. More preferably, the cleaning composition for a screen plate according to ⁇ 15>. ⁇ 17>
• the content of component B at the time of cleaning the cleaning composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, further preferably 1% by mass or more, and 2% by mass or more.
• the content of Component B at the time of cleaning the cleaning composition is preferably 20% by mass or less, more preferably 15% by mass or less, further preferably 12% by mass or less, and still more preferably 10% by mass or less.
• the ratio A / B of the content of component A to the content of component B in the cleaning composition is preferably 0.001 or more, more preferably 0.002 or more, and even more preferably 0.003 or more.
• the ratio A / B of the content of component A to the content of component B in the cleaning composition is preferably 0.1 or less, more preferably 0.09 or less, and even more preferably 0.08 or less.
• ⁇ 21> A compound having 2 to 12 carbon atoms and having at least one group selected from carboxy group, sulfonic acid group, sulfuric acid group and phosphoric acid group, and at least one acid selected from formic acid (components)
• the content (or blending amount) of Component C during cleaning of the cleaning composition is preferably 0.001% by mass or more, more preferably 0.005% by mass or more, and further 0.01% by mass or more.
• the content (or blending amount) of Component C at the time of cleaning the cleaning composition is preferably 2.0% by mass or less, more preferably 1.0% by mass or less, and further 0.7% by mass or less.
• 0.2% by mass or less is more preferable, 0.15% by mass or less is further preferable, and 0.1% by mass or less is more preferable, and the cleaning agent for a screen plate according to ⁇ 21> or ⁇ 22> Composition.
• the ratio A / C of the content of component A to the content (or blending amount) of component C in the cleaning composition is preferably 0.1 or more, more preferably 0.2 or more, and 0.4. The above is more preferable, and the cleaning composition for screen plates according to any one of ⁇ 21> to ⁇ 23>.
• the ratio A / C of the content of component A to the content (or blending amount) of component C in the cleaning composition is preferably 10 or less, more preferably 7 or less, and even more preferably 5 or less, ⁇
• the content of the component D at the time of cleaning the cleaning composition is preferably 70% by mass or more, more preferably 80% by mass or more, and further preferably 85% by mass or more, any one of ⁇ 1> to ⁇ 25> A cleaning composition for a screen plate according to claim 1.
• the content of component D during cleaning of the cleaning composition is preferably 99% by mass or less, more preferably 97% by mass or less, and still more preferably 95% by mass or less, any one of ⁇ 1> to ⁇ 26> A cleaning composition for a screen plate according to claim 1.
• a screen plate comprising a step of cleaning an object to be cleaned using the cleaning composition according to any one of ⁇ 1> to ⁇ 27>, wherein the object to be cleaned is a screen plate after screen printing.
• Cleaning method ⁇ 29> The method for cleaning a screen plate according to ⁇ 28>, including a step of drying the rinsed screen plate without rinsing.
• ⁇ 30> A kit for producing the cleaning composition according to any one of ⁇ 1> to ⁇ 27>, wherein at least one of component A, component B and component D is mixed with other components Kit that has been stored in a state that is not.
• cleaning composition (Examples 1 to 26 and Comparative Examples 1 to 4) Each component was blended so as to have the composition and content (mass%, effective content) shown in Table 1 below, and cleaning compositions of Examples 1 to 26 and Comparative Examples 1 to 4 were obtained.
• the pH is the pH of the cleaning composition at 25 ° C., measured with a pH meter (Toa Denpa Kogyo Co., Ltd., HM-30G), and the value after 40 minutes after the electrode is immersed in the cleaning composition. is there.
• ⁇ Component A Amine> ⁇ N-Hexylamine (Wako Pure Chemical Industries, Ltd.) ⁇ N-Octylamine (manufactured by Tokyo Chemical Industry Co., Ltd.) ⁇ N-dodecylamine (manufactured by Tokyo Chemical Industry Co., Ltd., dodecylamine) ⁇ N-stearylamine (Tokyo Chemical Industry Co., Ltd., stearylamine) ⁇ N-methylhexylamine (Wako Pure Chemical Industries, Ltd.) ⁇ N, N-dimethylhexylamine (Wako Pure Chemical Industries, Ltd.) ⁇ Non-component A: Amine> ⁇ N-Butylamine (Wako Pure Chemical Industries, Ltd.) ⁇ Polyoxyethylene (2 mol) laurylamine (Aoki Yushi Kogyo Co., Ltd., BLAUNON L-202) ⁇ Component B: Solvent (Glycol ether)>
• the solubility in 100 g of water at 25 ° C. is determined to be 10 g or more.
• the solubility in 100 g of water at 25 ° C. is judged to be less than 0.02 g.
• Flux (MB-T100, manufactured by Senju Metal Industry Co., Ltd.) is applied to a stainless steel wire mesh (twill woven, 500 mesh), the opening of the stainless steel wire mesh is filled with flux, and excess flux is removed with a squeegee.
• the test piece for evaluation is produced by leaving it to stand at room temperature for a period of time and cutting it into 20 mm ⁇ 20 mm. Using this test piece, the cleaning property of the cleaning composition is evaluated by the following procedure. 50 g of each cleaning composition is added to a 100 mL glass beaker and kept in a 25 ° C. water bath.
• test piece is held with tweezers, immersed in the cleaning composition, and irradiated with ultrasonic waves (104 kHz, 50 W) for 15 minutes. After washing, the test piece is dried with hot air at 60 ° C. for 15 minutes without rinsing.
• the cleaning compositions of Examples 1 to 26 containing the predetermined amine (component A), the predetermined solvent (component B), and water (component D) are the cleaning compositions of Comparative Examples 1 to 4. Compared to the agent composition, it was excellent in cleanability and liquid drainage.
• the cleaning composition of the present disclosure is useful as a cleaning composition for a screen plate after screen printing, and can reduce the time required for cleaning and drying and efficiently obtain a screen plate with high cleanliness. Furthermore, the production efficiency of electronic parts such as high-quality printed boards and ceramic boards can be improved.

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• 2016
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