WO2015129682A9 - ポリイミド樹脂、これを用いた樹脂組成物および積層フィルム - Google Patents

ポリイミド樹脂、これを用いた樹脂組成物および積層フィルム Download PDF

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WO2015129682A9
WO2015129682A9 PCT/JP2015/055222 JP2015055222W WO2015129682A9 WO 2015129682 A9 WO2015129682 A9 WO 2015129682A9 JP 2015055222 W JP2015055222 W JP 2015055222W WO 2015129682 A9 WO2015129682 A9 WO 2015129682A9
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polyimide resin
laminated film
same
resin
resin composition
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PCT/JP2015/055222
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English (en)
French (fr)
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WO2015129682A1 (ja
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富川真佐夫
渡邉拓生
李忠善
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東レ株式会社
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Priority to EP15754960.1A priority Critical patent/EP3112394A4/en
Priority to CN201580010593.2A priority patent/CN106029744B/zh
Priority to KR1020167025224A priority patent/KR102122278B1/ko
Priority to JP2015524565A priority patent/JP6555126B2/ja
Priority to SG11201606994XA priority patent/SG11201606994XA/en
Priority to US15/121,446 priority patent/US10026637B2/en
Publication of WO2015129682A1 publication Critical patent/WO2015129682A1/ja
Publication of WO2015129682A9 publication Critical patent/WO2015129682A9/ja

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    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
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Abstract

高い耐熱性を有し、大面積でもボイド等がなく均一に仮接着することが可能であるポリイミド樹脂、これを用いた樹脂組成物および積層フィルムを提供する。 本発明は、少なくとも酸無水物残基とジアミン残基を有するポリイミド樹脂であり、全ジアミン残基中、ポリシロキサン系ジアミンの残基を60モル%以上含むポリイミド樹脂である。
PCT/JP2015/055222 2014-02-26 2015-02-24 ポリイミド樹脂、これを用いた樹脂組成物および積層フィルム WO2015129682A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP15754960.1A EP3112394A4 (en) 2014-02-26 2015-02-24 Polyimide resin, resin composition using same, and laminated film
CN201580010593.2A CN106029744B (zh) 2014-02-26 2015-02-24 聚酰亚胺树脂、使用其的树脂组合物及层叠膜
KR1020167025224A KR102122278B1 (ko) 2014-02-26 2015-02-24 폴리이미드 수지, 이것을 이용한 수지 조성물 및 적층 필름
JP2015524565A JP6555126B2 (ja) 2014-02-26 2015-02-24 ポリイミド樹脂、これを用いた樹脂組成物および積層フィルム
SG11201606994XA SG11201606994XA (en) 2014-02-26 2015-02-24 Polyimide resin, resin composition using same, and laminated film
US15/121,446 US10026637B2 (en) 2014-02-26 2015-02-24 Polyimide resin, resin composition using same, and laminated film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014034900 2014-02-26
JP2014-034900 2014-02-26

Publications (2)

Publication Number Publication Date
WO2015129682A1 WO2015129682A1 (ja) 2015-09-03
WO2015129682A9 true WO2015129682A9 (ja) 2016-10-20

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US (1) US10026637B2 (ja)
EP (1) EP3112394A4 (ja)
JP (1) JP6555126B2 (ja)
KR (1) KR102122278B1 (ja)
CN (1) CN106029744B (ja)
SG (1) SG11201606994XA (ja)
TW (1) TWI652286B (ja)
WO (1) WO2015129682A1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102133559B1 (ko) * 2015-09-24 2020-07-13 아사히 가세이 가부시키가이샤 폴리이미드 전구체, 수지 조성물 및 수지 필름의 제조 방법
KR20180077185A (ko) * 2015-10-29 2018-07-06 도레이 카부시키가이샤 가부착용 적층체 필름, 가부착용 적층체 필름을 사용한 기판 가공체 및 적층 기판 가공체의 제조 방법, 및 이것들을 사용한 반도체 장치의 제조 방법
KR20180104311A (ko) * 2016-02-08 2018-09-20 도레이 카부시키가이샤 수지 조성물, 수지층, 영구 접착제, 임시 점착 접착제, 적층 필름, 웨이퍼 가공체 및 전자 부품 또는 반도체 장치의 제조 방법
KR102574758B1 (ko) * 2017-03-30 2023-09-06 닛산 가가쿠 가부시키가이샤 박리층 형성용 조성물 및 박리층
JP7107311B2 (ja) * 2017-06-16 2022-07-27 大日本印刷株式会社 積層体、ディスプレイ用表面材、タッチパネル部材、液晶表示装置、及び有機エレクトロルミネッセンス表示装置
JP7281887B2 (ja) * 2017-10-19 2023-05-26 日鉄ケミカル&マテリアル株式会社 ポリイミド前駆体及びポリイミド
GB2570510A (en) * 2018-01-30 2019-07-31 Pragmatic Printing Ltd System and method for manufacturing plurality of integrated circuits
TWI675899B (zh) * 2018-04-25 2019-11-01 達興材料股份有限公司 暫時黏著被加工物之方法及黏著劑
KR102279081B1 (ko) * 2018-08-20 2021-07-19 주식회사 엘지화학 폴리이미드 필름 및 이를 이용하는 플렉서블 디바이스
CN114957660A (zh) * 2021-02-26 2022-08-30 新应材股份有限公司 聚酰亚胺树脂组合物、聚酰亚胺树脂黏着层、积层体、以及电子组件的制造方法
JP2022156876A (ja) * 2021-03-31 2022-10-14 Tdk株式会社 樹脂複合積層体、樹脂複合積層体の製造方法および伸縮性デバイス

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3325450A (en) * 1965-05-12 1967-06-13 Gen Electric Polysiloxaneimides and their production
US4558110A (en) * 1985-02-01 1985-12-10 General Electric Company Crystalline silicone-imide copolymers
JPH0788426B2 (ja) * 1986-07-30 1995-09-27 住友ベークライト株式会社 耐熱性樹脂の製造方法
JP2898674B2 (ja) * 1989-12-25 1999-06-02 日立化成工業株式会社 シロキサン変性ポリイミド及びその前駆体の製造法
JP3057872B2 (ja) * 1992-01-24 2000-07-04 東レ株式会社 耐熱性接着材料
JP3227217B2 (ja) * 1992-08-18 2001-11-12 新日鐵化学株式会社 耐熱性複合材料及びその製造方法
JP3550913B2 (ja) 1995-10-31 2004-08-04 宇部興産株式会社 ポリイミドシロキサンおよびその製法
JPH09328546A (ja) * 1996-06-11 1997-12-22 Mitsui Petrochem Ind Ltd 樹脂組成物
JP3721768B2 (ja) 1997-01-24 2005-11-30 宇部興産株式会社 感光性ポリイミドシロキサン組成物および絶縁膜
JPH11126855A (ja) * 1997-10-22 1999-05-11 Shin Etsu Chem Co Ltd 半導体装置およびその製造方法
JP3968885B2 (ja) * 1998-05-14 2007-08-29 日本メクトロン株式会社 感光性組成物
EP1266926B1 (en) 2000-02-01 2007-05-23 Nippon Steel Chemical Co., Ltd. Adhesive polyimide resin and adhesive laminate
JP3865046B2 (ja) * 2001-05-08 2007-01-10 信越化学工業株式会社 無溶剤型ポリイミドシリコーン系樹脂組成物
US6872457B2 (en) * 2001-07-31 2005-03-29 Ube Industries, Ltd. Atomic oxygen-resistant film
JP2004277619A (ja) 2003-03-18 2004-10-07 Sumitomo Bakelite Co Ltd ポリイミド樹脂及び半導体接着テープ
ATE417881T1 (de) * 2004-05-20 2009-01-15 Toray Industries Polyimidharz, mehrschichtfolie, mehrschichtfolie mit metallschicht und halbleiterelement
JP4997690B2 (ja) * 2004-08-10 2012-08-08 日立化成工業株式会社 樹脂組成物、樹脂付き基材及び導体層張り積層板
JP4577895B2 (ja) * 2005-06-10 2010-11-10 信越化学工業株式会社 接着剤組成物及び接着性フィルム
JP2007031647A (ja) * 2005-07-29 2007-02-08 Japan Health Science Foundation 固相合成を利用した超短半減期核種を含む化合物の製造方法およびそれに用いる化合物
JP2007063331A (ja) * 2005-08-29 2007-03-15 Hitachi Chem Co Ltd 樹脂組成物
JP2007211204A (ja) * 2006-02-13 2007-08-23 Hitachi Chem Co Ltd 耐熱性樹脂ワニス、耐熱性樹脂ワニスを添加した耐熱性コーティング剤及び耐熱性コーティング剤を用いた絶縁膜又は半導体装置
JP2007314647A (ja) 2006-05-25 2007-12-06 Toray Ind Inc インクジェット用熱硬化性樹脂組成物、耐熱性樹脂膜の形成方法およびそれを用いた電子部品
JP2008281597A (ja) * 2007-05-08 2008-11-20 Toray Ind Inc 感光性樹脂組成物シート
JP2008292799A (ja) * 2007-05-25 2008-12-04 Toray Ind Inc 感光性ポリイミド用現像液およびこれを用いたパターン形成方法
JP2009292979A (ja) * 2008-06-06 2009-12-17 Nippon Shokubai Co Ltd シロキサン化合物、及び、これを含有する硬化性組成物
JP4771100B2 (ja) * 2008-08-27 2011-09-14 信越化学工業株式会社 無溶剤型ポリイミドシリコーン系樹脂組成物及びその硬化物
JP5648275B2 (ja) 2009-04-14 2015-01-07 住友ベークライト株式会社 天然繊維成形品の抄造素材およびその製造方法
KR20110040302A (ko) 2009-10-14 2011-04-20 주식회사 멕트론 열경화성 폴리이미드 조성물
JP2012019079A (ja) * 2010-07-08 2012-01-26 Kyocera Chemical Corp マスキング用樹脂組成物
CN101914357A (zh) * 2010-08-06 2010-12-15 东华大学 环氧-有机硅聚酰亚胺粘合剂及其制备方法
JP5649219B2 (ja) * 2011-01-24 2015-01-07 Nttエレクトロニクス株式会社 半導体装置
MY171368A (en) 2011-09-12 2019-10-10 Toray Industries Polyimide resin, and resin composition and laminated film that use same
KR101946092B1 (ko) 2011-09-29 2019-02-08 제이에스알 가부시끼가이샤 수지 조성물 및 그것을 이용한 막 형성 방법
KR101950260B1 (ko) * 2012-09-25 2019-02-21 도레이 카부시키가이샤 수지 조성물, 경화막, 적층 필름, 및 반도체 장치의 제조 방법
JP6020129B2 (ja) * 2012-12-19 2016-11-02 Jnc株式会社 ポリアミド酸組成物
KR102116229B1 (ko) * 2012-12-21 2020-05-28 아사히 가세이 이-매터리얼즈 가부시키가이샤 폴리이미드 전구체 및 그것을 함유하는 수지 조성물

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CN106029744B (zh) 2018-08-28
JP6555126B2 (ja) 2019-08-07
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CN106029744A (zh) 2016-10-12
KR102122278B1 (ko) 2020-06-15
KR20160127032A (ko) 2016-11-02
EP3112394A1 (en) 2017-01-04
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