WO2014207975A1 - めっき材の製造方法及びめっき材 - Google Patents
めっき材の製造方法及びめっき材 Download PDFInfo
- Publication number
- WO2014207975A1 WO2014207975A1 PCT/JP2014/002169 JP2014002169W WO2014207975A1 WO 2014207975 A1 WO2014207975 A1 WO 2014207975A1 JP 2014002169 W JP2014002169 W JP 2014002169W WO 2014207975 A1 WO2014207975 A1 WO 2014207975A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plating
- plating layer
- silver
- layer
- nickel
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
- C25D3/40—Electroplating: Baths therefor from solutions of copper from cyanide baths, e.g. with Cu+
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
- C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12896—Ag-base component
Definitions
- the present invention relates to a plating material manufacturing method and a plating material obtained by the manufacturing method, and more specifically, has excellent wear resistance, electrical conductivity, slidability, and low friction properties, and the plating layer
- the present invention relates to a plating material suitable for suppressing embrittlement and a method for producing the same.
- Silver plating has excellent properties such as electrical conductivity, low contact resistance, and heat resistance, and is widely used for electrical and electronic parts such as various contacts, terminals, connectors, and switches (for example, Patent Document 1 No. 2001-3194)).
- the terminals of the electric / electronic parts described above a material obtained by performing tin plating or reflow tin plating on a copper substrate is often used, and if the surface of the material can be subjected to good silver plating, It seems that the terminal can be provided with excellent wear resistance and electrical conductivity.
- Patent Document 2 Japanese Patent Laid-Open No. 8-17683
- an Sn plating layer is provided on at least a part of the surface of a base material made of copper or a copper alloy, and Cu, In , Ag, Zn, and Sb
- a method for producing a plating material including a step of multilayer plating one or more of them is disclosed.
- Patent Document 2 the production method described in Patent Document 2 is intended to produce an Sn alloy plating material, and by heating the multilayer plating obtained in the above-described process in a non-oxidizing atmosphere, at least the surface of the base material is obtained. In part, a Sn alloy plating layer containing Sn 80 to 99% (however, the total amount of Cu, Zn, and Sb in the plating layer is 10% or less) is formed.
- the method involves alloying tin and silver by heating, and the poor adhesion between tin plating and silver plating is not a serious problem (ie, a technique for laminating good silver plating on tin plating). is not.).
- the object of the present invention is to have excellent wear resistance, electrical conductivity, slidability and low friction and to suppress embrittlement of the silver plating layer.
- An object of the present invention is to provide a plating material and a method for manufacturing the same.
- the present inventor has conducted extensive research on a method for producing a plating material.
- the inventor has excellent wear resistance, electrical conductivity, slidability, and low friction, and the silver plating layer
- a nickel plating layer is formed in a region where the reflow tin plating layer is peeled off, and the nickel plating layer is subjected to silver strike plating treatment and silver plating treatment.
- the inventors have found that the present invention is extremely effective, and have reached the present invention.
- a first step of peeling A second step of performing nickel plating treatment on at least a part of the region where the reflow tin plating layer is peeled off, A third step of applying a silver strike plating process to at least a part of the nickel plating layer formed by the nickel plating process; Including a fourth step of performing silver plating on at least a part of the region subjected to the silver strike plating, The manufacturing method of the plating material characterized by these is provided.
- a silver strike plating or gold strike is applied to any region of the region where the reflow tin plating layer for forming the nickel plating layer is peeled off. It is preferable to apply 1 or 2 or more strike plating chosen from the group of plating, palladium strike plating, nickel strike plating, and copper strike plating.
- the tin plating layer of the metal base material including at least a part of the tin plating layer is subjected to reflow treatment, and the tin plating layer is reflowed.
- the reflow process in the previous step is a process in which the electrodeposited tin plating layer is heated, melted once, and rapidly cooled.
- the stress (strain) at the time of plating is removed, and a reaction layer is formed at the interface between the metal substrate and the tin plating layer, thereby reducing changes over time of the tin plating layer. be able to.
- a reaction layer is formed at the interface between the tin plating layer and the metal substrate by the reflow treatment.
- the composition and shape of the reaction layer are not particularly limited as long as they are effective in suppressing atomic diffusion and / or reaction between the metal substrate and each plating layer, but the reaction layer preferably contains Cu 3 Sn.
- a tin plating layer applied to a part or the whole of the surface of the metal substrate may be heated and melted to a temperature equal to or higher than the melting point of tin.
- a preferable treatment temperature is 250 to 600 ° C., more preferably 300 to 500 ° C., and further preferably 350 to 450 ° C.
- the preferable treatment time is 3 to 40 seconds, more preferably 5 to 30 seconds, and still more preferably 5 to 20 seconds.
- the heat treatment is preferably performed in a reducing atmosphere or an inert atmosphere.
- the method for producing a plating material of the present invention at least a part of the reflow tin plating layer is peeled off from the metal substrate in the first step.
- various conventionally known peeling methods can be used as long as the effects of the present invention are not impaired.
- the portion to be peeled off of the reflow tin plating layer is immersed in an appropriate peeling solution.
- a method of peeling or electrolytic peeling can be used.
- the stripping solution used in the first step can be exemplified by a solution in which sulfuric acid, nitric acid, and sodium hydroxide are dissolved in water, and an oxidizing agent is added.
- the reaction layer Cu 3 Sn is left, and only the surface tin is removed.
- an aqueous sulfuric acid solution it is more preferable to use an aqueous nitric acid solution because S (sulfur) of sulfuric acid remains after peeling and may cause discoloration or alteration by reacting with silver plating.
- the reaction layer is formed in the interface of a reflow tin plating layer and a metal base material, the metal substrate outermost surface of the area
- the nickel plating layer formed by the nickel plating treatment in the second step is preferably a continuous film shape, and the thickness of the nickel plating layer is preferably 0.05 ⁇ m to 10 ⁇ m.
- a more preferable nickel plating layer thickness is 0.5 ⁇ m to 2 ⁇ m. If it is less than 0.05 ⁇ m, the barrier effect is poor, and if it is 10 ⁇ m or more, cracks are likely to occur during bending.
- the nickel plating layer may have a granular or island-like discontinuous film shape as long as the effects of the present invention are not impaired. In the latter case, the granular and island portions may be partially continuous.
- silver strike plating is performed on at least a part of the nickel plating layer obtained in the second step in the third step.
- the silver strike plating layer formed by the silver strike plating process in the third step is a continuous film shape, it is a granular or island-like discontinuous film shape as long as the effect of the present invention is not impaired. It may be. In the latter case, the granular and island portions may be partially continuous.
- the thickness of the silver strike plating layer is preferably 0.01 to 0.5 ⁇ m.
- a silver plating layer is formed on a silver strike plating layer by the silver plating process of a 4th process, and a single silver plating layer is obtained roughly.
- the thickness of the single silver plating layer obtained through the silver plating treatment in the fourth step is 0.1 ⁇ m to 50 ⁇ m.
- the thickness is a value obtained by combining the silver strike plating layer and the silver plating layer.
- the single silver plating layer obtained through the silver plating treatment in the fourth step basically has a constant thickness, but is partially thinned or thick as long as the effects of the present invention are not impaired. Or you may.
- the Vickers hardness of the silver plating layer is preferably 10 HV to 250 HV.
- the present invention also provides a plating material obtained by the method for producing a plating material, the plating material, On the surface of the metal substrate, a plating material having a region where a reflow tin plating layer is formed and a region where a silver plating layer is formed, The silver plating layer is formed on the surface of the metal substrate through a nickel plating layer, The reflow tin plating layer and the nickel plating layer are each formed on the surface of the metal substrate via a reaction layer, The silver plating layer is metallurgically bonded to the nickel plating layer, The nickel plating layer is metallurgically bonded to the reaction layer; It is characterized by.
- Metallurgical bonding means that each layer is not bonded via mechanical bonding such as an anchor effect or different bonding layers such as an adhesive, but the metals are directly bonded to each other.
- Metallurgical bonding is a concept that naturally includes bonding by crystallographic matching (epitaxy).
- the reflow tin plating layer and the silver plating layer achieve bonding by crystallographic matching (epitaxy). It is preferable that
- the outermost surface of the fitting portion where wear resistance is required is a reflow tin plating layer
- the outermost surface of the contact portion where conductivity is required is a silver plating layer, preferable.
- a plating material having excellent wear resistance, electrical conductivity, slidability and low friction, and suitable for suppressing embrittlement of the plating layer, and its A manufacturing method can be provided.
- the plating material of the present invention can be suitably used as a material for a connection terminal that requires excellent wear resistance and conductivity, and has excellent wear resistance, conductivity, and fitting properties. Connection terminals can be provided.
- FIG. 1 is a process diagram of a method for producing a plating material of the present invention.
- the method for producing a plating material according to the present invention is a method for producing a plating material having a metal base material, a reflow tin plating layer, a nickel plating layer, and a silver plating layer, from the metal base material to the reflow tin plating layer.
- the tin plating layer of the metal base material including at least a part of the tin plating layer is subjected to a reflow treatment, and the tin plating is performed.
- a step of converting the layer into a reflow tin plating layer and forming a reaction layer at the interface between the reflow tin plating layer and the metal substrate may be included (S00).
- the metal used for the metal substrate is not particularly limited as long as it has electrical conductivity, and examples thereof include aluminum and aluminum alloys, iron and iron alloys, titanium and titanium alloys, stainless steel, copper, and copper alloys. However, among these, copper and copper alloys are preferably used because they are excellent in electrical conductivity, thermal conductivity, and spreadability.
- the plating material having a tin plating layer on the surface of the metal base material is subjected to a reflow process in the previous step (S00), and the cleaning process is performed after the reflow process.
- the first step (S01) and the second step (S02) A plating material can be obtained through the third step (S03) and the fourth step (S04).
- Tin plating treatment Commercially available materials can be used for materials obtained by performing tin plating on a metal substrate and materials obtained by performing reflow treatment on a metal substrate having a tin plating layer. Moreover, conventionally well-known various tin plating methods can be used for tin plating in the range which does not impair the effect of this invention.
- the above whiskers are said to be caused by the formation of Cu 6 Sn 5 having a large crystal lattice generated at the interface between them due to the diffusion of copper and tin plating, and the reflow process is performed to suppress this whisker formation.
- the reflow process is performed to suppress this whisker formation.
- a tin plating layer applied to a part or the whole of the surface of the metal substrate may be heated and melted to a melting point of tin or higher.
- a preferable treatment temperature is 250 to 600 ° C., more preferably 300 to 500 ° C., and further preferably 350 to 450 ° C.
- the preferable treatment time is 3 to 40 seconds, more preferably 5 to 30 seconds, and still more preferably 5 to 20 seconds.
- the heat treatment is preferably performed in a reducing atmosphere or an inert atmosphere.
- the plating material which gave the reflow process to the metal base material which has a tin plating layer may be purchased, and a previous process (S00) may be abbreviate
- the cleaning step is an optional step, and although not shown in FIG. 1, is a step of cleaning at least the surface of the reflow tin plating layer of the metal substrate having the reflow tin plating layer.
- various conventionally known cleaning processing solutions and processing conditions can be used within a range not impairing the effects of the present invention.
- cathode electrolytic degreasing may be performed at a cathode current density of 2 to 5 A / dm 2 using an insoluble anode such as stainless steel, a titanium platinum plate, and iridium oxide as the anode.
- the peeling treatment is a treatment for peeling the reflow tin plating layer from an arbitrary region of the plating material and using the outermost surface of the plating material as a reaction layer.
- masking is performed by various conventionally known methods such as tape, sparger mask, resist, and ink jet printing method, and peeling treatment is performed only on the area where the silver plating layer is to be finally formed. Can be applied.
- the method for peeling off the reflow tin plating layer various conventionally known peeling methods can be used as long as the effects of the present invention are not impaired.
- the portion to be peeled off of the reflow tin plating layer is immersed in an appropriate peeling solution.
- a method of peeling or electrolytic peeling can be used.
- the stripping solution used in the first step can be exemplified by a solution obtained by adding sulfuric acid, nitric acid, and sodium hydroxide in water to an oxidizing agent, but as described above, the reaction layer Cu 3 Sn is left, In order to peel only the tin, it is preferable to use an acidic stripping solution. In addition, when an aqueous sulfuric acid solution is used, it is more preferable to use an aqueous nitric acid solution because S (sulfur) of sulfuric acid remains after peeling and may cause discoloration or alteration by reacting with silver plating. In addition, since the reaction layer is formed in the interface of a reflow tin plating layer and a metal base material, the metal substrate outermost surface of the area
- Strike plating treatment as a preliminary treatment of nickel plating treatment is an optional step, and although not shown in FIG. 1, silver strike plating, gold strike plating, palladium
- strike platings selected from the group of strike plating, nickel strike plating, and copper strike plating the adhesion of nickel plating can be improved more reliably.
- Silver strike plating As a silver strike plating bath, what contains silver salts, such as silver cyanide and silver cyanide potassium, and electrically conductive salts, such as potassium cyanide and potassium pyrophosphate, can be used, for example.
- silver salts such as silver cyanide and silver cyanide potassium
- electrically conductive salts such as potassium cyanide and potassium pyrophosphate
- the concentration of silver salt in the plating bath is lower than that of ordinary silver plating. It is preferable to increase the concentration of the conductive salt.
- the silver strike plating bath that can be suitably used for the silver strike plating treatment is composed of a silver salt, an alkali cyanide salt, and a conductive salt, and a brightener may be added as necessary.
- Preferred amounts of each component are silver salt: 1 to 10 g / L, alkali cyanide salt: 80 to 200 g / L, conductive salt: 0 to 100 g / L, brightener: ⁇ 1000 ppm.
- Examples of the silver salt include silver cyanide, silver iodide, silver oxide, silver sulfate, silver nitrate, and silver chloride.
- Examples of the conductive salt include potassium cyanide, sodium cyanide, potassium pyrophosphate, and potassium iodide. And sodium thiosulfate.
- a metal brightener and / or an organic brightener can be used.
- the metallic brightener include antimony (Sb), selenium (Se), tellurium (Te), and the like
- examples of the organic brightener include aromatic sulfonic acid compounds such as benzenesulfonic acid, mercaptans, and the like. be able to.
- Silver strike plating conditions such as the bath temperature, anode material, and current density of the silver strike plating bath can be appropriately set according to the plating bath used, the required plating thickness, and the like.
- the anode material is preferably an insoluble anode such as stainless steel, a titanium platinum plate, and iridium oxide.
- Suitable plating conditions include bath temperature: 15 to 50 ° C., current density: 0.5 to 5 A / dm 2 , and processing time: 5 to 60 seconds.
- the silver strike plating may be performed on the entire surface of the reflow tin plating peeling layer, or may be performed only on the region where nickel plating is to be formed in the second step (S02).
- a gold strike plating bath what contains a gold salt, a conductive salt, a chelating agent, and a crystal growth agent can be used, for example. Further, a brightener may be added to the gold strike plating bath.
- the gold salt examples include gold cyanide, potassium gold cyanide, potassium gold cyanide, sodium gold sulfite, and sodium gold thiosulfate.
- the conductive salt for example, potassium citrate, potassium phosphate, potassium pyrophosphate, potassium thiosulfate, or the like can be used.
- ethylenediaminetetraacetic acid and methylenephosphonic acid can be used as the chelating agent.
- the crystal growth agent examples include cobalt, nickel, thallium, silver, palladium, tin, zinc, copper, bismuth, indium, arsenic, and cadmium.
- the preferred amount of each component of the nickel strike plating bath that can be suitably used for the nickel strike plating treatment is nickel salt: 100 to 300 g / L, anodic dissolution accelerator: 0 to 300 g / L, pH buffer: 0 to 50 g / L, additive: 0 to 20 g / L.
- the nickel strike plating may be performed on the entire surface of the metal substrate, or may be performed only on the region where the nickel plating is to be formed in the second step (S02).
- the copper strike plating bath for example, a copper cyanide bath can be used.
- the copper cyanide bath is composed of a copper salt, an alkali cyanide salt and a conductive salt, and an additive may be added thereto.
- copper cyanide can be used as the copper salt.
- potassium cyanide and sodium cyanide can be used as the alkali cyanide salt.
- potassium carbonate and sodium carbonate can be used as the conductive salt.
- Rochelle salt, potassium selenite, sodium selenite, potassium thiocyanate, lead acetate, lead tartrate and the like can be used.
- Suitable amounts of each component of the cyan bath that can be suitably used for the copper strike plating treatment are: copper salt: 10 to 80 g / L, alkali cyanide acid: 20 to 50 g / L, conductive salt: 10 to 50 g / L, additive: 0 to 60 g / L.
- the copper strike plating may be performed on the entire surface of the metal substrate, or may be performed only on the region where nickel plating is to be formed in the second step (S02).
- the above-described various strike plating may be performed only one kind, or a plurality of strike plating may be laminated. Moreover, when the adhesion state of nickel plating becomes favorable without the strike plating process due to the surface state of the metal substrate, the strike plating process can be omitted.
- Nickel plating treatment (second step (S02))
- the nickel plating treatment is performed to form a nickel plating layer that functions as a barrier layer that prevents diffusion and reaction between tin and silver between the tin plating layer and the silver plating layer.
- the presence of the nickel plating layer between the tin plating layer and the silver plating layer allows the tin plating layer and / or the formation of an intermetallic compound (for example, Ag 3 Sn) accompanying the diffusion and reaction of tin and silver.
- an intermetallic compound for example, Ag 3 Sn
- the nickel plating bath for example, a watt bath or a sulfamic acid bath can be used, but a sulfamic acid bath having a low electrodeposition stress is preferably used. It is preferable to avoid a strongly acidic wood strike bath.
- the nickel plating treatment various conventionally known nickel plating techniques can be used as long as the effects of the present invention are not impaired.
- the nickel plating bath is a liquid composed of nickel salts such as nickel sulfate, nickel sulfamate and nickel chloride, an anodic dissolving agent such as nickel chloride, and a pH buffer such as boric acid, acetic acid and citric acid.
- An additive with a small amount of brightener, leveling agent, pit inhibitor and the like can be used.
- the preferred amount of each component is nickel salt: 100 to 600 g / L, anodic dissolving agent: 0 to 50 g / L, pH buffering agent: 20 to 50 g / L, additive: ⁇ 5000 ppm.
- the nickel plating layer formed by the nickel plating treatment in the second step (S02) preferably has a continuous film shape, and the thickness of the nickel plating layer is 0.05 ⁇ m to 10 ⁇ m. It is preferable. If it is less than 0.05 ⁇ m, the barrier effect is poor, and if it is 10 ⁇ m or more, cracks are likely to occur during bending.
- the nickel plating layer may have a granular or island-like discontinuous film shape as long as the effects of the present invention are not impaired. In the latter case, the granular and island portions may be partially continuous.
- a silver strike plating process is a process performed in order to improve the adhesiveness of the said reaction layer and a silver plating layer.
- the silver strike plating bath for example, a bath containing a silver salt such as silver cyanide and potassium silver cyanide and a conductive salt such as potassium cyanide and potassium pyrophosphate can be used.
- the concentration of silver salt in the plating bath is lower than that of ordinary silver plating. It is preferable to increase the concentration of the conductive salt.
- the silver strike plating bath that can be suitably used for the silver strike plating treatment is composed of a silver salt, an alkali cyanide salt, and a conductive salt, and a brightener may be added as necessary.
- Preferred amounts of each component are silver salt: 1 to 10 g / L, alkali cyanide salt: 80 to 200 g / L, conductive salt: 0 to 100 g / L, brightener: ⁇ 1000 ppm.
- Examples of the silver salt include silver cyanide, silver iodide, silver oxide, silver sulfate, silver nitrate, and silver chloride.
- Examples of the conductive salt include potassium cyanide, sodium cyanide, potassium pyrophosphate, and potassium iodide. And sodium thiosulfate.
- a metal brightener and / or an organic brightener can be used.
- the metallic brightener include antimony (Sb), selenium (Se), and tellurium (Te).
- the organic brightener include aromatic sulfonic acid compounds such as benzenesulfonic acid and mercaptans. can do.
- Silver strike plating conditions such as the bath temperature, anode material, and current density of the silver strike plating bath can be appropriately set according to the plating bath used, the required plating thickness, and the like.
- the anode material is preferably an insoluble anode such as stainless steel, a titanium platinum plate, and iridium oxide.
- Suitable plating conditions include bath temperature: 15 to 50 ° C., current density: 0.5 to 5 A / dm 2 , and processing time: 5 to 60 seconds.
- the silver strike plating may be performed on the entire surface of the metal substrate, or may be performed only on the region where silver plating is to be formed in the fourth step (S04).
- Silver plating treatment (fourth step (S04))
- the silver plating treatment is roughly a treatment for forming a single thicker silver plating layer in at least a part of the region subjected to silver strike plating in the third step (S03).
- a silver plating bath that can be suitably used for silver plating treatment is composed of a silver salt, an alkali cyanide salt, and a conductive salt, and a brightener may be added as necessary.
- the preferred amount of each component is silver salt: 30 to 150 g / L, alkali cyanide salt: 15 to 160 g / L, conductive salt: 50 to 200 g / L, brightener: up to 1000 ppm.
- Examples of the silver salt include silver cyanide, silver iodide, silver oxide, silver sulfate, silver nitrate, and silver chloride.
- Examples of the conductive salt include potassium cyanide, sodium cyanide, potassium pyrophosphate, and potassium iodide. And sodium thiosulfate.
- the plating conditions such as the bath temperature of the plating bath, the anode material, and the current density can be appropriately set according to the plating bath used, the required plating thickness, and the like.
- the anode material is preferably a soluble anode, or an insoluble anode such as stainless steel, a titanium platinum plate, or iridium oxide.
- Suitable plating conditions include bath temperature: 20 to 60 ° C., current density: 0.5 to 15 A / dm 2 , and processing time: 0.5 to 10,000 seconds.
- Silver plating may be performed on the entire surface of the metal substrate and the tin plating layer, or may be performed only on the region where silver strike plating is formed in the third step (S03).
- FIG. 2 is a schematic cross-sectional view of an example of an embodiment of the plating material of the present invention.
- the plating material 1 has a reflow tin plating layer 4 and a silver plating layer 6 formed on the surface of a metal substrate 2.
- the silver plating layer 6 is formed on the surface of the metal substrate 2 through the nickel plating layer 8, and the nickel plating layer 8 is connected to the metal substrate 2 through the reaction layer 10.
- the silver strike plating layer similar to the silver strike plating layer 12 mentioned later is formed between the metal base material 2 and the nickel plating layer 8 as needed (not shown).
- the reaction layer 10 is formed by atomic diffusion and reaction between the metal substrate 2 and the tin plating layer in the step of forming the reflow tin plating layer 4 by reflowing the tin plating layer.
- the reaction layer 10 existing at the interface between the reflow tin plating layer 4 and the metal substrate 2 and the reaction layer 10 existing at the interface between the nickel plating layer 8 and the metal substrate 2 are basically the same reaction layer.
- the composition and / or structure may be slightly different depending on the silver plating treatment and / or subsequent changes over time.
- the metal of the metal substrate 2 is not particularly limited as long as it has electrical conductivity, and examples thereof include aluminum and aluminum alloys, iron and iron alloys, titanium and titanium alloys, stainless steel, copper, and copper alloys. However, among these, copper and copper alloys are preferably used because they are excellent in electrical conductivity, thermal conductivity, and spreadability.
- the silver strike plating layer 12 is formed between the nickel plating layer 8 and the silver plating layer 6, even if the silver strike plating layer 12 has a continuous film shape, the effect of the present invention is not impaired. Further, it may be a discontinuous film shape such as a granular shape or an island shape. In the latter case, the granular and island portions may be partially continuous. Depending on the silver strike plating conditions, it may be difficult to identify the silver strike plating layer 12.
- the thickness of the silver strike plating layer 12 is preferably 0.01 to 0.5 ⁇ m.
- a silver plating layer 6 is formed on the surface of the silver strike plating layer 12.
- the thickness of the silver plating layer 6 is preferably 0.1 ⁇ m to 50 ⁇ m, and the Vickers hardness is preferably 10 HV to 250 HV. If the thickness is less than 0.1 ⁇ m, the wear resistance of the silver plating layer 6 cannot be used, and if it is thicker than 50 ⁇ m, the amount of silver used increases, which is not economical.
- the plating material of the present invention can be suitably used for various connection terminals.
- the reflow tin plating layer 4 is the outermost surface of the fitting portion that requires wear resistance
- the silver plating layer 6 is the outermost surface of the contact portion that requires electrical conductivity.
- a high-performance connection terminal can be manufactured.
- a fitting part here is a part connected with other members, such as pinching other members by bending, caulking, etc.
- FIG. 3 is a schematic view showing an example of the connection terminal of the present invention.
- the connection terminal 14 shown in FIG. 3 is a high-voltage terminal
- the outermost surface of the contact portion 16 that requires electrical conductivity in the connection terminal 14 is the silver plating layer 6, and wear resistance is required.
- the outermost surface of the connection portion 18 with the harness is the reflow tin plating layer 4.
- the silver plating layer 6 the outermost surface in the area where sliding wear is remarkable, it prevents serious accidents such as ignition and electric shock caused by fragments of the reflow tin plating layer 4 scattered by the sliding wear. can do.
- Example 1 A 1 ⁇ m silver plating layer was formed on a commercially available reflow tin-plated material (tin plated to a 0.6 mm thick copper alloy material and subjected to reflow treatment (first step)) by the following steps.
- the surface of the tin plating layer was cleaned by immersing the tin plating material in a cleaning solution at 50 ° C. containing 40 g / L of Mac Screen NG-30 manufactured by Kizai Co., Ltd. for 60 seconds.
- the tin-plated material after the cleaning treatment was immersed for 60 seconds in a 25 ° C. stripping solution containing 300 ml / L and 100 ml / L of Ebastrip ST-40A and ST-401NC manufactured by JCU Corporation, respectively.
- a peeling treatment was performed.
- masking is given by sticking a masking tape (insulating tape).
- the anode material was Sulfur nickel plate and cathode material as tin-plated material after cleaning treatment, nickel plating treatment is performed for 10 seconds under the conditions of bath temperature: 50 ° C. and current density: 2 A / dm 2 to form a nickel plating layer of 0.05 ⁇ m (Second step).
- the anode material is a titanium platinum plate
- the cathode material is a tin plating material after stripping treatment.
- a silver strike plating treatment was performed for 10 seconds under the conditions of bath temperature: room temperature and current density: 2 A / dm 2 (third step).
- Adhesion evaluation Adhesion was evaluated about the plating material produced as mentioned above. If the cellophane tape (# 405 manufactured by Nichiban Co., Ltd.) is pressed against the silver plating layer with finger pressure and the cellophane tape is peeled off, no peeling or swelling of the silver plating layer occurs. The results obtained are shown in Table 1.
- Example 2 A plating material was prepared in the same manner as in Example 1 except that the nickel plating treatment time was 20 seconds and a nickel plating layer having a thickness of 0.1 ⁇ m was formed, and various evaluations were performed. The obtained results are shown in Table 1.
- Example 3 A plating material was produced in the same manner as in Example 2 except that the silver plating treatment time was 130 seconds and a silver plating layer having a thickness of 5 ⁇ m was formed, and various evaluations were performed. The obtained results are shown in Table 1.
- Example 4 A plating material was prepared in the same manner as in Example 2 except that the silver plating treatment time was 260 seconds and a silver plating layer having a thickness of 10 ⁇ m was formed, and various evaluations were performed. The obtained results are shown in Table 1.
- Example 5 Commercially available reflow tin-plated material (A tin-plated copper alloy material with a thickness of 0.6 mm and subjected to reflow treatment is washed at 50 ° C. containing 40 g / L of Mac Screen NG-30 manufactured by Kizai Co., Ltd.) The surface of the tin plating layer was washed by being immersed in the liquid for 60 seconds.
- the tin-plated material after the cleaning treatment was immersed for 60 seconds in a 25 ° C. stripping solution containing 300 ml / L and 100 ml / L of Ebastrip ST-40A and ST-401NC manufactured by JCU Corporation, respectively. A peeling treatment was performed. In addition, about the area
- a silver strike plating bath containing 3 g / L of silver cyanide, 150 g / L of potassium cyanide, and 15 g / L of potassium carbonate is used.
- the anode material is a titanium platinum plate, and the cathode material is a tin plating material after the release treatment.
- the silver strike plating treatment was performed for 10 seconds under the conditions of bath temperature: room temperature and current density: 2 A / dm 2 .
- a silver strike plating bath containing 3 g / L of silver cyanide, 150 g / L of potassium cyanide, and 15 g / L of potassium carbonate was used.
- the anode material was a titanium platinum plate, and the cathode material was tin-plated after nickel plating.
- the material was subjected to a silver strike plating treatment for 10 seconds under the conditions of bath temperature: room temperature and current density: 2 A / dm 2 .
- the anode material is a titanium platinum plate, and the cathode material is tin plated after silver strike plating.
- the material was treated for 130 seconds under conditions of bath temperature: 30 ° C. and current density: 4 A / dm 2 to form a single silver plating layer of 5 ⁇ m.
- Example 6 As a preliminary treatment for forming a nickel plating layer, a plating laminate was prepared in the same manner as in Example 5 except that a gold strike plating treatment was performed instead of a silver strike plating treatment, and adhesion evaluation was performed. . The obtained results are shown in Table 2.
- a gold strike plating solution containing potassium gold cyanide 2 g / L, potassium citrate 100 g / L, chelating agent 5 g / L, and cobalt sulfate 2 g / L is used, and the anode material is a titanium platinum plate,
- the treatment conditions were a bath temperature of 40 ° C., a current density of 1 A / dm 2 and a treatment time of 10 seconds.
- Example 7 As a preliminary treatment for forming a nickel plating layer, a plating laminate was prepared in the same manner as in Example 5 except that a palladium strike plating treatment was performed instead of a silver strike plating treatment, and adhesion evaluation was performed. . The obtained results are shown in Table 2.
- a palladium strike plating bath containing 3 g / L of dichlorodiammine palladium and 100 g / L of potassium phosphate is used, the anode material is a titanium platinum plate, and the cathode material is used as a tin plating material after the release treatment.
- the treatment conditions were a temperature of 40 ° C., a current density of 1 A / dm 2 , and a treatment time of 10 seconds.
- Example 8 As a preliminary treatment for forming a nickel plating layer, a plating laminate was prepared in the same manner as in Example 5 except that the nickel strike plating treatment was performed instead of the silver strike plating treatment, and adhesion evaluation was performed. . The obtained results are shown in Table 2.
- a nickel strike plating solution containing nickel chloride 100 g / L and hydrochloric acid 50 ml / L is used.
- the anode material is a nickel plate
- the cathode material is a tin plating material after the peeling treatment.
- the treatment conditions were a current density of 2 A / dm 2 and a treatment time of 10 seconds.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electroplating Methods And Accessories (AREA)
- ing And Chemical Polishing (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
Description
少なくとも一部にリフロー錫めっき層を有する金属基材であって、前記リフロー錫めっき層と前記金属基材との界面に反応層を有する金属基材から、前記リフロー錫めっき層の少なくとも一部を剥離させる第一工程と、
前記リフロー錫めっき層を剥離させた領域の少なくとも一部にニッケルめっき処理を施す第二工程と、
前記ニッケルめっき処理によって形成させたニッケルめっき層の少なくとも一部に銀ストライクめっき処理を施す第三工程と、
前記銀ストライクめっき処理を施した領域の少なくとも一部に銀めっき処理を施す第四工程と、を含むこと、
を特徴とするめっき材の製造方法を提供する。
金属基材の表面に、リフロー錫めっき層が形成された領域と、銀めっき層が形成された領域と、をそれぞれ有するめっき材であって、
前記銀めっき層はニッケルめっき層を介して前記金属基材の表面に形成され、
前記リフロー錫めっき層と前記ニッケルめっき層とは、それぞれ反応層を介して前記金属基材の表面に形成され、
前記銀めっき層は前記ニッケルめっき層に対して冶金的に接合され、
前記ニッケルめっき層は前記反応層に対して冶金的に接合されていること、
を特徴とする。
図1は、本発明のめっき材の製造方法の工程図である。本発明のめっき材の製造方法は、金属基材と、リフロー錫めっき層と、ニッケルめっき層と、銀めっき層と、を有するめっき材の製造方法であって、金属基材からリフロー錫めっき層の少なくとも一部を剥離させる第一工程(S01)と、リフロー錫めっき層を剥離させた領域の少なくとも一部にニッケルめっき層を形成させる第二工程(S02)と、ニッケルめっき層の少なくとも一部に銀ストライクめっき処理を施す第三工程(S03)と、銀ストライクめっき処理を施した領域の少なくとも一部に銀めっき処理を施す第四工程(S04)と、を含んでいる。
金属基材に錫めっきを施した材料、及び錫めっき層を有する金属基材にリフロー処理を施した材料については、市販のものを使用することができる。また、錫めっきには、本発明の効果を損なわない範囲で従来公知の種々の錫めっき手法を用いることができる。
一般的には、錫めっきへのリフローは時間の経過に伴うウィスカー(針状金属結晶)の成長を抑制するための処理であり、電着した錫めっき層を加熱して一旦溶融し、急冷する方法が用いられている。錫めっき層を溶融することによって、めっき時の応力(歪み)を除去し、金属基材との反応層を形成することで経時的な変化を低減することができる。なお、本発明のめっき材の製造方法においては、錫めっき層と金属基材との界面に反応層を形成させることがリフロー処理の主たる目的である。上記のウィスカーは、銅と錫めっきの拡散により、それらの界面に発生する結晶格子の大きいCu6Sn5の生成が原因と言われているところ、リフロー処理はこのウィスカー生成抑制のために行われるものであり、緻密なCu3Snを形成してバリア層とすることにより、銅の拡散を抑え、ウィスカー発生を抑制している。
洗浄工程は、任意の工程であり、図1には示していないが、リフロー錫めっき層を有する金属基材のうちの少なくともリフロー錫めっき層の表面を洗浄する工程である。ここでは、本発明の効果を損なわない範囲で従来公知の種々の洗浄処理液及び処理条件を用いることができる。
剥離処理はめっき材の任意の領域からリフロー錫めっき層を剥離させ、めっき材の最表面を反応層とするための処理である。剥離処理が不要な領域については、テープ、スパージャーマスク、レジスト、及びインクジェット印刷方式等の従来公知の種々の方法でマスキングを施し、最終的に銀めっき層を形成させたい領域のみに剥離処理を施すことができる。
ニッケルめっき処理(第二工程(S02))の予備処理としてのストライクめっき処理は任意の工程であり、図1には示していないが、銀ストライクめっき、金ストライクめっき、パラジウムストライクめっき、ニッケルストライクめっき、銅ストライクめっきの群から選ばれる1または2以上のストライクめっきを施すことで、ニッケルめっきの密着性をより確実に向上させることができる。
銀ストライクめっき浴としては、例えば、シアン化銀及びシアン化銀カリウム等の銀塩と、シアン化カリウム及びピロリン酸カリウム等の電導塩と、を含むものを用いることができる。
金ストライクめっき浴としては、例えば、金塩、電導塩、キレート剤及び結晶成長剤を含むものを用いることができる。また、金ストライクめっき浴には光沢剤が添加されていてもよい。
パラジウムストライクめっき浴としては、例えば、パラジウム塩及び電導塩を含むものを用いることができる。また、パラジウムストライクめっき浴には光沢剤が添加されていてもよい。
ニッケルストライクめっき浴としては、例えば、ニッケル塩、陽極溶解促進剤及びpH緩衝剤を含むものを用いることができる。また、ニッケルストライクめっき浴には添加剤が添加されていてもよい。
銅ストライクめっき浴としては、例えば、シアン化銅浴を用いることができる。シアン化銅浴は、銅塩、シアン化アルカリ塩及び電導塩により構成され、添加剤が添加されてもよい。
ニッケルめっき処理は、錫めっき層と銀めっき層との間において、錫と銀との拡散及び反応を防止するバリア層として機能するニッケルめっき層を形成させるために施される処理である。錫めっき層と銀めっき層との間にニッケルめっき層が存在することで、錫と銀との拡散及び反応に伴う金属間化合物(例えば、Ag3Sn)の形成による、錫めっき層及び/又は銀めっき層の脆化を抑制することができる。
銀ストライクめっき処理は、上記反応層と銀めっき層との密着性を改善するために施される処理である。銀ストライクめっき浴としては、例えば、シアン化銀及びシアン化銀カリウム等の銀塩と、シアン化カリウム及びピロリン酸カリウム等の電導塩と、を含むものを用いることができる。
銀めっき処理は第三工程(S03)において銀ストライクめっきされた領域のうちの少なくとも一部に、概略的には単一のより厚い銀めっき層を形成させるための処理である。
図2は、本発明のめっき材の実施形態の一例における概略断面図である。めっき材1は、金属基材2の表面にリフロー錫めっき層4及び銀めっき層6が形成されている。銀めっき層6はニッケルめっき層8を介して金属基材2の表面に形成され、ニッケルめっき層8は反応層10を介して金属基材2に接続されている。なお、必要に応じて、金属基材2とニッケルめっき層8の間には後述の銀ストライクめっき層12と同様の銀ストライクめっき層が形成されている(図示せず)。
本発明のめっき材は、各種接続端子に好適に用いることができる。具体的には、耐摩耗性が要求される嵌合部の最表面をリフロー錫めっき層4とし、電導性が要求される接点部の最表面を銀めっき層6とすることで、安価で高性能な接続端子を製造することができる。ここでいう嵌合部とは、屈曲やカシメ等により他の部材を挟む等して、他の部材と接続される部分のことである。
市販のリフロー錫めっき材(厚さ0.6mmの銅合金材へ錫めっきを施し、リフロー処理(第一工程)を施したもの)に以下の工程で1μmの銀めっき層を形成させた。キザイ株式会社製のマックスクリーンNG-30を40g/L含有する50℃の洗浄処理液に、上記錫めっき材を60秒間浸漬させることで、錫めっき層の表面に洗浄処理を施した。
(1)密着性評価
上記のようにして作製しためっき材について密着性の評価を行った。セロハンテープ(ニチバン株式会社製の#405)を指圧にて銀めっき層に押し付け、当該セロハンテープを引き剥がした後に銀めっき層の剥がれや膨れが発生しなかった場合は○、発生した場合は×とし、得られた結果を表1に示した。
上記のようにして作製しためっき材について金属間化合物(Ag3Sn)相が形成しているか否かを確認した。具体的には、室温で50時間放置しためっき材に対するX線回折結果により、金属間化合物(Ag3Sn)相に由来する回折ピークの有無を確認した。用いた装置は株式会社リガク製のUltima IV(検出器D/teX Ultra、CuKα線使用)であり、40kV-40mA、ステップ角0.1°、スキャン角度範囲20°~100°の条件で測定した。金属間化合物(Ag3Sn)相に由来する回折ピークが確認された場合は×、確認されなかった場合は○とし、得られた結果を表1に示した。
ニッケルめっき処理の時間を20秒間とし、厚さ0.1μmのニッケルめっき層を形成させた以外は、実施例1と同様にしてめっき材を作製し、各種評価を行った。得られた結果を表1に示す。
銀めっき処理の時間を130秒間とし、厚さ5μmの銀めっき層を形成させた以外は、実施例2と同様にしてめっき材を作製し、各種評価を行った。得られた結果を表1に示す。
銀めっき処理の時間を260秒間とし、厚さ10μmの銀めっき層を形成させた以外は、実施例2と同様にしてめっき材を作製し、各種評価を行った。得られた結果を表1に示す。
市販のリフロー錫めっき材(厚さ0.6mmの銅合金材へ錫めっきを施し、リフロー処理を施したものをキザイ株式会社製のマックスクリーンNG-30を40g/L含有する50℃の洗浄処理液に、60秒間浸漬させることで、錫めっき層の表面に洗浄処理を施した。
(1)密着性評価
1mmのカット間隔で碁盤目状にカット(クロスカット試験)を行った後、セロハンテープ(ニチバン株式会社製の#405)を指圧にて銀めっき層に押し付け、当該セロハンテープを引き剥がした後に銀めっき層の剥がれや膨れが発生しなかった場合は○、発生した場合は×とし、得られた結果を表2に示した。
ニッケルめっき層を形成させるための予備処理として、銀ストライクめっき処理の代わりに金ストライクめっき処理を施したこと以外は、実施例5と同様にしてめっき積層体を作製し、密着性評価を行った。得られた結果を表2に示す。
ニッケルめっき層を形成させるための予備処理として、銀ストライクめっき処理の代わりにパラジウムストライクめっき処理を施したこと以外は、実施例5と同様にしてめっき積層体を作製し、密着性評価を行った。得られた結果を表2に示す。
ニッケルめっき層を形成させるための予備処理として、銀ストライクめっき処理の代わりにニッケルストライクめっき処理を施したこと以外は、実施例5と同様にしてめっき積層体を作製し、密着性評価を行った。得られた結果を表2に示す。
ニッケルめっき層を形成させるための予備処理として、銀ストライクめっき処理の代わりに銅ストライクめっき処理を施したこと以外は、実施例5と同様にしてめっき積層体を作製し、密着性評価を行った。得られた結果を表2に示す。
銀ストライクめっき処理を施さず、ニッケルめっき層及び銀めっき層の厚さをそれぞれ0.1μm及び1μmとした以外は、実施例1と同様にして銀めっき層を有するめっき材を作製し、各種評価を行った。得られた結果を表1に示す。
リフロー錫めっきの剥離処理を施さず、リフロー錫めっき層に対して銀めっき処理を施した以外は、比較例1と同様にして銀めっき層を有するめっき材を作製し、各種評価を行った。得られた結果を表1に示す。
ニッケルめっき処理の予備処理として、銀ストライクめっき処理を施さなかったこと以外は、実施例5と同様にしてめっき積層体を作製し、実施例5と同様の密着性評価を行った。得られた結果を表2に示す。
2・・・金属基材、
4・・・リフロー錫めっき層、
6・・・銀めっき層、
8・・・ニッケルめっき層、
10・・・反応層、
12・・・銀ストライクめっき層、
14・・・接続端子、
16・・・接点部分、
18・・・接続部分。
Claims (10)
- 少なくとも一部にリフロー錫めっき層を有する金属基材であって、前記リフロー錫めっき層と前記金属基材との界面に反応層を有する金属基材から、前記リフロー錫めっき層の少なくとも一部を剥離させる第一工程と、
前記リフロー錫めっき層を剥離させた領域の少なくとも一部にニッケルめっき処理を施す第二工程と、
前記ニッケルめっき処理によって形成させたニッケルめっき層の少なくとも一部に銀ストライクめっき処理を施す第三工程と、
前記銀ストライクめっき処理を施した領域の少なくとも一部に銀めっき処理を施す第四工程と、を含むこと、
を特徴とするめっき材の製造方法。 - 前記第二工程の前処理として、前記ニッケルめっき層を形成させる前記リフロー錫めっき層を剥離させた領域の任意の領域に、銀ストライクめっき、金ストライクめっき、パラジウムストライクめっき、ニッケルストライクめっき、銅ストライクめっきの群から選ばれる1または2以上のストライクめっきを施すこと、
を特徴とする請求項1に記載のめっき積層体の製造方法。 - 前記第一工程の前に、少なくとも一部に錫めっき層を含む金属基材のうちの前記錫めっき層にリフロー処理を施し、前記錫めっき層をリフロー錫めっき層に変換させるとともに前記リフロー錫めっき層と前記金属基材との界面に反応層を形成する前工程を含むこと、
を特徴とする請求項1又は2のいずれかに記載のめっき材の製造方法。 - 前記反応層がCu3Snを含むこと、
を特徴とする請求項1~3のいずれかに記載のめっき材の製造方法。 - 前記ニッケルめっき層の厚さが0.05μm~10μmであること、
を特徴とする請求項1~4のいずれかに記載のめっき材の製造方法。 - 前記銀めっき層の厚さが0.1μm~50μmであり、
前記銀めっき層のビッカース硬度が10HV~250HVであること、
を特徴とする請求項1~5のいずれかに記載のめっき材の製造方法。 - 金属基材の表面に、リフロー錫めっき層が形成された領域と、銀めっき層が形成された領域と、をそれぞれ有するめっき材であって、
前記銀めっき層はニッケルめっき層を介して前記金属基材の表面に形成され、
前記リフロー錫めっき層と前記ニッケルめっき層とは、それぞれ反応層を介して前記金属基材の表面に形成され、
前記銀めっき層は前記ニッケルめっき層に対して冶金的に接合され、
前記ニッケルめっき層は前記反応層に対して冶金的に接合されていること、
を特徴とするめっき材。 - 前記反応層がCu3Snを含むこと、
を特徴とする請求項7に記載のめっき材。 - 請求項7又は8のいずれかに記載のめっき材を有すること、
を特徴とする接続端子。 - 耐摩耗性が要求される嵌合部の最表面をリフロー錫めっき層とし、
電導性が要求される接点部の最表面を銀めっき層とすること、
を特徴とする請求項9に記載の接続端子。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015523827A JP6466837B2 (ja) | 2013-06-24 | 2014-04-16 | めっき材の製造方法及びめっき材 |
CN201480036126.2A CN105339530B (zh) | 2013-06-24 | 2014-04-16 | 镀材的制造方法及镀材 |
KR1020157037126A KR20160023727A (ko) | 2013-06-24 | 2014-04-16 | 도금재의 제조방법 및 도금재 |
US15/028,051 US10351965B2 (en) | 2013-06-24 | 2014-04-16 | Method for producing plated material, and plated material |
PH12015502834A PH12015502834A1 (en) | 2013-06-24 | 2015-12-18 | Method for producing plated material, and plated material |
US15/837,769 US10640880B2 (en) | 2013-06-24 | 2017-12-11 | Plated material and connecting terminal using same |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-131317 | 2013-06-24 | ||
JP2013131317 | 2013-06-24 | ||
JP2013238010 | 2013-11-18 | ||
JP2013-238010 | 2013-11-18 | ||
JP2014-051824 | 2014-03-14 | ||
JP2014051824 | 2014-03-14 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/028,051 A-371-Of-International US10351965B2 (en) | 2013-06-24 | 2014-04-16 | Method for producing plated material, and plated material |
US15/837,769 Division US10640880B2 (en) | 2013-06-24 | 2017-12-11 | Plated material and connecting terminal using same |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014207975A1 true WO2014207975A1 (ja) | 2014-12-31 |
Family
ID=52141355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2014/002169 WO2014207975A1 (ja) | 2013-06-24 | 2014-04-16 | めっき材の製造方法及びめっき材 |
Country Status (6)
Country | Link |
---|---|
US (2) | US10351965B2 (ja) |
JP (1) | JP6466837B2 (ja) |
KR (1) | KR20160023727A (ja) |
CN (1) | CN105339530B (ja) |
PH (1) | PH12015502834A1 (ja) |
WO (1) | WO2014207975A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2015092978A1 (ja) * | 2013-12-20 | 2017-03-16 | オリエンタル鍍金株式会社 | 銀めっき部材及びその製造方法 |
JPWO2015092979A1 (ja) * | 2013-12-20 | 2017-03-16 | オリエンタル鍍金株式会社 | 銀めっき部材及びその製造方法 |
JP2017059519A (ja) * | 2015-09-18 | 2017-03-23 | アイシン精機株式会社 | プレスフィット端子 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101786346B1 (ko) | 2016-05-20 | 2017-10-17 | 현대자동차주식회사 | 클래드강 코팅 방법 및 코팅액 |
US10290594B2 (en) * | 2016-07-28 | 2019-05-14 | International Business Machines Corporation | Fragmenting computer chips |
JP2018120698A (ja) * | 2017-01-24 | 2018-08-02 | 矢崎総業株式会社 | 端子用めっき材並びにそれを用いた端子、端子付き電線及びワイヤーハーネス |
CN106906499A (zh) * | 2017-03-28 | 2017-06-30 | 佛山市宇光电气有限公司 | 银基多元合金复合溶液及使用其制备功能性镀层的方法 |
CN108315780B (zh) * | 2018-03-07 | 2020-08-14 | 大连理工大学 | 一种高反射率锡银复合镀层的制备方法 |
US11674235B2 (en) * | 2018-04-11 | 2023-06-13 | Hutchinson Technology Incorporated | Plating method to reduce or eliminate voids in solder applied without flux |
JP6592140B1 (ja) * | 2018-05-28 | 2019-10-16 | Jx金属株式会社 | 表面処理金属材料、表面処理金属材料の製造方法、及び、電子部品 |
CN108950627A (zh) * | 2018-07-11 | 2018-12-07 | 深圳市美之高科技股份有限公司 | 一种氯化物镀锌+锡钴锌三元合金代铬工艺方法 |
DE112018008122T5 (de) * | 2018-11-08 | 2021-07-22 | Mitsubishi Electric Corporation | Verbindungsstruktur, halbleitereinheit sowie verfahren zur herstellung derselben |
JP7195201B2 (ja) * | 2019-03-29 | 2022-12-23 | Dowaメタルテック株式会社 | めっき材およびその製造方法 |
JP2020187971A (ja) * | 2019-05-16 | 2020-11-19 | 株式会社オートネットワーク技術研究所 | コネクタ端子、端子付き電線、及び端子対 |
CN110629250B (zh) * | 2019-10-14 | 2020-07-10 | 东北大学秦皇岛分校 | 一种Ag支撑准三维结构嵌入式柔性电极材料的制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60228695A (ja) * | 1984-04-26 | 1985-11-13 | Furukawa Electric Co Ltd:The | 耐熱性AgメツキCu系基材の製造法 |
JP2009057630A (ja) * | 2007-08-07 | 2009-03-19 | Mitsubishi Shindoh Co Ltd | Snメッキ導電材料及びその製造方法並びに通電部品 |
JP2010198780A (ja) * | 2009-02-23 | 2010-09-09 | Sumitomo Wiring Syst Ltd | 端子金具 |
JP2010232681A (ja) * | 2003-10-14 | 2010-10-14 | Olin Corp | 耐フレッチング性及び耐ウィスカー性の被覆装置及び方法 |
JP2011202266A (ja) * | 2010-03-26 | 2011-10-13 | Kobe Steel Ltd | 嵌合型接続部品及びその製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61266597A (ja) * | 1985-05-22 | 1986-11-26 | Mitsubishi Electric Corp | 接触子用銅合金条の被膜処理方法 |
JP3108302B2 (ja) | 1994-12-28 | 2000-11-13 | 古河電気工業株式会社 | 電気接触特性および半田付性に優れたSn合金めっき材の製造方法 |
US5780172A (en) * | 1995-12-18 | 1998-07-14 | Olin Corporation | Tin coated electrical connector |
JP2001003194A (ja) | 1999-06-21 | 2001-01-09 | Nippon Mining & Metals Co Ltd | 耐熱,耐食性銀めっき材 |
JP2004006065A (ja) * | 2002-03-25 | 2004-01-08 | Mitsubishi Shindoh Co Ltd | 電気接続用嵌合型接続端子 |
JP5319101B2 (ja) * | 2007-10-31 | 2013-10-16 | Jx日鉱日石金属株式会社 | 電子部品用Snめっき材 |
US8956735B2 (en) * | 2010-03-26 | 2015-02-17 | Kabushiki Kaisha Kobe Seiko Sho | Copper alloy and electrically conductive material for connecting parts, and mating-type connecting part and method for producing the same |
JP5854726B2 (ja) * | 2010-09-21 | 2016-02-09 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | ニッケル上に銀ストライクを電気めっきする方法 |
-
2014
- 2014-04-16 US US15/028,051 patent/US10351965B2/en not_active Expired - Fee Related
- 2014-04-16 CN CN201480036126.2A patent/CN105339530B/zh not_active Expired - Fee Related
- 2014-04-16 KR KR1020157037126A patent/KR20160023727A/ko not_active Application Discontinuation
- 2014-04-16 JP JP2015523827A patent/JP6466837B2/ja active Active
- 2014-04-16 WO PCT/JP2014/002169 patent/WO2014207975A1/ja active Application Filing
-
2015
- 2015-12-18 PH PH12015502834A patent/PH12015502834A1/en unknown
-
2017
- 2017-12-11 US US15/837,769 patent/US10640880B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60228695A (ja) * | 1984-04-26 | 1985-11-13 | Furukawa Electric Co Ltd:The | 耐熱性AgメツキCu系基材の製造法 |
JP2010232681A (ja) * | 2003-10-14 | 2010-10-14 | Olin Corp | 耐フレッチング性及び耐ウィスカー性の被覆装置及び方法 |
JP2009057630A (ja) * | 2007-08-07 | 2009-03-19 | Mitsubishi Shindoh Co Ltd | Snメッキ導電材料及びその製造方法並びに通電部品 |
JP2010198780A (ja) * | 2009-02-23 | 2010-09-09 | Sumitomo Wiring Syst Ltd | 端子金具 |
JP2011202266A (ja) * | 2010-03-26 | 2011-10-13 | Kobe Steel Ltd | 嵌合型接続部品及びその製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2015092978A1 (ja) * | 2013-12-20 | 2017-03-16 | オリエンタル鍍金株式会社 | 銀めっき部材及びその製造方法 |
JPWO2015092979A1 (ja) * | 2013-12-20 | 2017-03-16 | オリエンタル鍍金株式会社 | 銀めっき部材及びその製造方法 |
JP2017059519A (ja) * | 2015-09-18 | 2017-03-23 | アイシン精機株式会社 | プレスフィット端子 |
Also Published As
Publication number | Publication date |
---|---|
KR20160023727A (ko) | 2016-03-03 |
JP6466837B2 (ja) | 2019-02-06 |
US10640880B2 (en) | 2020-05-05 |
JPWO2014207975A1 (ja) | 2017-02-23 |
US20180112322A1 (en) | 2018-04-26 |
PH12015502834A1 (en) | 2016-03-21 |
CN105339530B (zh) | 2017-08-25 |
US10351965B2 (en) | 2019-07-16 |
US20160348260A1 (en) | 2016-12-01 |
CN105339530A (zh) | 2016-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6259437B2 (ja) | めっき積層体 | |
JP6466837B2 (ja) | めっき材の製造方法及びめっき材 | |
JP6665387B2 (ja) | 銀めっき部材及びその製造方法 | |
JP6484844B2 (ja) | 銀めっき材及びその製造方法 | |
KR20070026832A (ko) | 주석계 도금 피막 및 그 형성 방법 | |
JP6651852B2 (ja) | 銀めっき部材及びその製造方法 | |
JP2015187303A (ja) | 接続部品用導電部材及びその製造方法 | |
JP2620151B2 (ja) | 印刷回路用銅箔 | |
JP6182757B2 (ja) | めっき材の製造方法及びめっき材 | |
JP6268408B2 (ja) | めっき材の製造方法及びめっき材 | |
CN113166964A (zh) | 防腐蚀端子材及端子和电线末端部结构 | |
JP2017218663A (ja) | めっき積層体の製造方法及びめっき積層体 | |
JP7162341B2 (ja) | めっき積層体の製造方法及びめっき積層体 | |
JP2008196010A (ja) | コネクタ端子用めっき材料 | |
JP2014237883A (ja) | めっき積層体の製造方法及びめっき積層体 | |
EP4174218A1 (en) | Corrosion-resistant terminal material for aluminum core wire, method for manufacturing same, corrosion-resistant terminal, and electric wire terminal structure | |
KR20100055095A (ko) | 태양전지용 전극선재 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201480036126.2 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 14818388 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2015523827 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 12015502834 Country of ref document: PH |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20157037126 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 15028051 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 14818388 Country of ref document: EP Kind code of ref document: A1 |