WO2014185518A1 - 赤外線遮蔽シート及びその製造方法並びにその用途 - Google Patents
赤外線遮蔽シート及びその製造方法並びにその用途 Download PDFInfo
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- WO2014185518A1 WO2014185518A1 PCT/JP2014/063064 JP2014063064W WO2014185518A1 WO 2014185518 A1 WO2014185518 A1 WO 2014185518A1 JP 2014063064 W JP2014063064 W JP 2014063064W WO 2014185518 A1 WO2014185518 A1 WO 2014185518A1
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- 238000004519 manufacturing process Methods 0.000 title claims description 57
- 238000000034 method Methods 0.000 title claims description 36
- 229920005989 resin Polymers 0.000 claims abstract description 577
- 239000011347 resin Substances 0.000 claims abstract description 577
- 239000010410 layer Substances 0.000 claims description 605
- 239000010419 fine particle Substances 0.000 claims description 265
- 239000005340 laminated glass Substances 0.000 claims description 74
- 239000011521 glass Substances 0.000 claims description 65
- 238000000576 coating method Methods 0.000 claims description 61
- 239000011229 interlayer Substances 0.000 claims description 58
- 239000011248 coating agent Substances 0.000 claims description 57
- 239000004986 Cholesteric liquid crystals (ChLC) Substances 0.000 claims description 48
- 230000003287 optical effect Effects 0.000 claims description 47
- 238000002834 transmittance Methods 0.000 claims description 44
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 30
- 229910003437 indium oxide Inorganic materials 0.000 claims description 23
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 23
- 239000011787 zinc oxide Substances 0.000 claims description 20
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 19
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 19
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 16
- 229910001887 tin oxide Inorganic materials 0.000 claims description 16
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 13
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 8
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 8
- 230000002950 deficient Effects 0.000 claims description 5
- 229910003460 diamond Inorganic materials 0.000 claims description 5
- 239000010432 diamond Substances 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 3
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 3
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 3
- 229910000464 lead oxide Inorganic materials 0.000 claims description 3
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 3
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 claims description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 3
- 239000011859 microparticle Substances 0.000 abstract description 10
- 239000010408 film Substances 0.000 description 284
- 150000001875 compounds Chemical class 0.000 description 84
- -1 polyethylene Polymers 0.000 description 55
- 229920000139 polyethylene terephthalate Polymers 0.000 description 43
- 239000005020 polyethylene terephthalate Substances 0.000 description 43
- 238000002360 preparation method Methods 0.000 description 37
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- 239000004973 liquid crystal related substance Substances 0.000 description 36
- 239000000243 solution Substances 0.000 description 36
- 239000000975 dye Substances 0.000 description 33
- 239000003822 epoxy resin Substances 0.000 description 33
- 229920000647 polyepoxide Polymers 0.000 description 33
- 239000000758 substrate Substances 0.000 description 31
- 239000000463 material Substances 0.000 description 25
- 239000002904 solvent Substances 0.000 description 24
- 239000005268 rod-like liquid crystal Substances 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 22
- 238000005259 measurement Methods 0.000 description 22
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 20
- 229910044991 metal oxide Inorganic materials 0.000 description 19
- 150000004706 metal oxides Chemical class 0.000 description 19
- 239000000203 mixture Substances 0.000 description 19
- 239000000843 powder Substances 0.000 description 19
- 239000006185 dispersion Substances 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 18
- 239000002245 particle Substances 0.000 description 18
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 17
- 239000011324 bead Substances 0.000 description 16
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 15
- 239000007788 liquid Substances 0.000 description 15
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 14
- 239000011230 binding agent Substances 0.000 description 14
- 239000002270 dispersing agent Substances 0.000 description 14
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- 239000003999 initiator Substances 0.000 description 12
- 229920003986 novolac Polymers 0.000 description 12
- 239000011164 primary particle Substances 0.000 description 12
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 12
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
- 238000001035 drying Methods 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- UWCWUCKPEYNDNV-LBPRGKRZSA-N 2,6-dimethyl-n-[[(2s)-pyrrolidin-2-yl]methyl]aniline Chemical compound CC1=CC=CC(C)=C1NC[C@H]1NCCC1 UWCWUCKPEYNDNV-LBPRGKRZSA-N 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 239000005357 flat glass Substances 0.000 description 8
- 238000010030 laminating Methods 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- 239000004014 plasticizer Substances 0.000 description 8
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 7
- 125000002723 alicyclic group Chemical group 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 7
- 229920006026 co-polymeric resin Polymers 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 6
- 125000003700 epoxy group Chemical group 0.000 description 6
- 239000003112 inhibitor Substances 0.000 description 6
- 229910052746 lanthanum Inorganic materials 0.000 description 6
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000000049 pigment Substances 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 239000011354 acetal resin Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 229920003144 amino alkyl methacrylate copolymer Polymers 0.000 description 5
- 239000002518 antifoaming agent Substances 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 5
- 239000011112 polyethylene naphthalate Substances 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 229920006324 polyoxymethylene Polymers 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000003963 antioxidant agent Substances 0.000 description 4
- 230000003078 antioxidant effect Effects 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000004611 light stabiliser Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 4
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 150000008051 alkyl sulfates Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 150000004292 cyclic ethers Chemical group 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- PODOEQVNFJSWIK-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethoxyphenyl)methanone Chemical compound COC1=CC(OC)=CC(OC)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 PODOEQVNFJSWIK-UHFFFAOYSA-N 0.000 description 3
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 3
- 238000004049 embossing Methods 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- MLKIVXXYTZKNMI-UHFFFAOYSA-N 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one Chemical compound CCCCCCCCCCCCC1=CC=C(C(=O)C(C)(C)O)C=C1 MLKIVXXYTZKNMI-UHFFFAOYSA-N 0.000 description 2
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 2
- AGXAFZNONAXBOS-UHFFFAOYSA-N 2-[[3-(oxiran-2-ylmethyl)phenyl]methyl]oxirane Chemical compound C=1C=CC(CC2OC2)=CC=1CC1CO1 AGXAFZNONAXBOS-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004988 Nematic liquid crystal Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229920002292 Nylon 6 Polymers 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- CSNCPNFITVRIBQ-DQMOOEMRSA-N [(3s,3as,6r,6as)-6-[4-[4-(4-prop-2-enoyloxybutoxycarbonyloxy)benzoyl]oxybenzoyl]oxy-2,3,3a,5,6,6a-hexahydrofuro[3,2-b]furan-3-yl] 4-[4-(4-prop-2-enoyloxybutoxycarbonyloxy)benzoyl]oxybenzoate Chemical compound C1=CC(OC(=O)OCCCCOC(=O)C=C)=CC=C1C(=O)OC1=CC=C(C(=O)O[C@H]2[C@@H]3OC[C@@H]([C@@H]3OC2)OC(=O)C=2C=CC(OC(=O)C=3C=CC(OC(=O)OCCCCOC(=O)C=C)=CC=3)=CC=2)C=C1 CSNCPNFITVRIBQ-DQMOOEMRSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000001000 anthraquinone dye Substances 0.000 description 2
- 125000004069 aziridinyl group Chemical group 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 239000011362 coarse particle Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920001296 polysiloxane Chemical class 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- SOLUNJPVPZJLOM-UHFFFAOYSA-N trizinc;distiborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-][Sb]([O-])([O-])=O.[O-][Sb]([O-])([O-])=O SOLUNJPVPZJLOM-UHFFFAOYSA-N 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- SZCWBURCISJFEZ-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) 3-hydroxy-2,2-dimethylpropanoate Chemical compound OCC(C)(C)COC(=O)C(C)(C)CO SZCWBURCISJFEZ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- AUXIEQKHXAYAHG-UHFFFAOYSA-N 1-phenylcyclohexane-1-carbonitrile Chemical class C=1C=CC=CC=1C1(C#N)CCCCC1 AUXIEQKHXAYAHG-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- OOLUVSIJOMLOCB-UHFFFAOYSA-N 1633-22-3 Chemical compound C1CC(C=C2)=CC=C2CCC2=CC=C1C=C2 OOLUVSIJOMLOCB-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SPSPIUSUWPLVKD-UHFFFAOYSA-N 2,3-dibutyl-6-methylphenol Chemical compound CCCCC1=CC=C(C)C(O)=C1CCCC SPSPIUSUWPLVKD-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- UXCIJKOCUAQMKD-UHFFFAOYSA-N 2,4-dichlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC(Cl)=C3SC2=C1 UXCIJKOCUAQMKD-UHFFFAOYSA-N 0.000 description 1
- LZHUBCULTHIFNO-UHFFFAOYSA-N 2,4-dihydroxy-1,5-bis[4-(2-hydroxyethoxy)phenyl]-2,4-dimethylpentan-3-one Chemical compound C=1C=C(OCCO)C=CC=1CC(C)(O)C(=O)C(O)(C)CC1=CC=C(OCCO)C=C1 LZHUBCULTHIFNO-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- GCDUWJFWXVRGSM-UHFFFAOYSA-N 2-[2-(2-heptanoyloxyethoxy)ethoxy]ethyl heptanoate Chemical compound CCCCCCC(=O)OCCOCCOCCOC(=O)CCCCCC GCDUWJFWXVRGSM-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- JEYLQCXBYFQJRO-UHFFFAOYSA-N 2-[2-[2-(2-ethylbutanoyloxy)ethoxy]ethoxy]ethyl 2-ethylbutanoate Chemical compound CCC(CC)C(=O)OCCOCCOCCOC(=O)C(CC)CC JEYLQCXBYFQJRO-UHFFFAOYSA-N 0.000 description 1
- SSKNCQWPZQCABD-UHFFFAOYSA-N 2-[2-[2-(2-heptanoyloxyethoxy)ethoxy]ethoxy]ethyl heptanoate Chemical compound CCCCCCC(=O)OCCOCCOCCOCCOC(=O)CCCCCC SSKNCQWPZQCABD-UHFFFAOYSA-N 0.000 description 1
- RUVNKAUVVBCURD-UHFFFAOYSA-N 2-[[4-[2-[4-(oxiran-2-ylmethoxy)-3-prop-2-enylphenyl]propan-2-yl]-2-prop-2-enylphenoxy]methyl]oxirane Chemical compound C=1C=C(OCC2OC2)C(CC=C)=CC=1C(C)(C)C(C=C1CC=C)=CC=C1OCC1CO1 RUVNKAUVVBCURD-UHFFFAOYSA-N 0.000 description 1
- FGTYTUFKXYPTML-UHFFFAOYSA-N 2-benzoylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 FGTYTUFKXYPTML-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- IUKSYUOJRHDWRR-UHFFFAOYSA-N 2-diazonio-4,6-dinitrophenolate Chemical compound [O-]C1=C([N+]#N)C=C([N+]([O-])=O)C=C1[N+]([O-])=O IUKSYUOJRHDWRR-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- WOYWLLHHWAMFCB-UHFFFAOYSA-N 2-ethylhexyl acetate Chemical compound CCCCC(CC)COC(C)=O WOYWLLHHWAMFCB-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- XBGNYAOLZNHWDC-UHFFFAOYSA-N 2-sulfanylnaphthalen-1-ol Chemical compound C1=CC=C2C(O)=C(S)C=CC2=C1 XBGNYAOLZNHWDC-UHFFFAOYSA-N 0.000 description 1
- PFANXOISJYKQRP-UHFFFAOYSA-N 2-tert-butyl-4-[1-(5-tert-butyl-4-hydroxy-2-methylphenyl)butyl]-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(CCC)C1=CC(C(C)(C)C)=C(O)C=C1C PFANXOISJYKQRP-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 1
- ZFEQSERZJMLTHK-UHFFFAOYSA-N 4-(4-hydroxyphenyl)-2,3,5,6-tetramethylphenol Chemical compound CC1=C(O)C(C)=C(C)C(C=2C=CC(O)=CC=2)=C1C ZFEQSERZJMLTHK-UHFFFAOYSA-N 0.000 description 1
- PPODUESPZXFNMJ-UHFFFAOYSA-N 4-(4-hydroxyphenyl)-2,3-dimethylphenol Chemical compound C1=C(O)C(C)=C(C)C(C=2C=CC(O)=CC=2)=C1 PPODUESPZXFNMJ-UHFFFAOYSA-N 0.000 description 1
- VESRBMGDECAMNH-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]-2,3,5,6-tetramethylphenol Chemical compound CC1=C(C(=C(C(=C1O)C)C)C(C)(C)C1=CC=C(C=C1)O)C VESRBMGDECAMNH-UHFFFAOYSA-N 0.000 description 1
- RPJFWRZEEKJTGN-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C)(C)C=2C=CC(O)=CC=2)=C1 RPJFWRZEEKJTGN-UHFFFAOYSA-N 0.000 description 1
- GCKIRZYWQROFEJ-UHFFFAOYSA-N 4-[2-[4-[1,1-bis(4-hydroxyphenyl)ethyl]phenyl]propyl]phenol Chemical compound C=1C=C(C(C)(C=2C=CC(O)=CC=2)C=2C=CC(O)=CC=2)C=CC=1C(C)CC1=CC=C(O)C=C1 GCKIRZYWQROFEJ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- 239000002028 Biomass Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 239000007848 Bronsted acid Chemical class 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- 229920001634 Copolyester Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- XTJFFFGAUHQWII-UHFFFAOYSA-N Dibutyl adipate Chemical compound CCCCOC(=O)CCCCC(=O)OCCCC XTJFFFGAUHQWII-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- UDSFAEKRVUSQDD-UHFFFAOYSA-N Dimethyl adipate Chemical compound COC(=O)CCCCC(=O)OC UDSFAEKRVUSQDD-UHFFFAOYSA-N 0.000 description 1
- 102100023274 Dual specificity mitogen-activated protein kinase kinase 4 Human genes 0.000 description 1
- 101710146518 Dual specificity mitogen-activated protein kinase kinase 4 Proteins 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- BWPYBAJTDILQPY-UHFFFAOYSA-N Methoxyphenone Chemical compound C1=C(C)C(OC)=CC=C1C(=O)C1=CC=CC(C)=C1 BWPYBAJTDILQPY-UHFFFAOYSA-N 0.000 description 1
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GRSMWKLPSNHDHA-UHFFFAOYSA-N Naphthalic anhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=CC3=C1 GRSMWKLPSNHDHA-UHFFFAOYSA-N 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920003189 Nylon 4,6 Polymers 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- OFSAUHSCHWRZKM-UHFFFAOYSA-N Padimate A Chemical compound CC(C)CCOC(=O)C1=CC=C(N(C)C)C=C1 OFSAUHSCHWRZKM-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- KRADHMIOFJQKEZ-UHFFFAOYSA-N Tri-2-ethylhexyl trimellitate Chemical compound CCCCC(CC)COC(=O)C1=CC=C(C(=O)OCC(CC)CCCC)C(C(=O)OCC(CC)CCCC)=C1 KRADHMIOFJQKEZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- FRQDZJMEHSJOPU-UHFFFAOYSA-N Triethylene glycol bis(2-ethylhexanoate) Chemical compound CCCCC(CC)C(=O)OCCOCCOCCOC(=O)C(CC)CCCC FRQDZJMEHSJOPU-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000004699 Ultra-high molecular weight polyethylene Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- HTMMMSIQFWMMIJ-UHFFFAOYSA-N [3-[2,2-dimethyl-3-(6-prop-2-enoyloxyhexanoyloxy)propanoyl]oxy-2,2-dimethylpropyl] 6-prop-2-enoyloxyhexanoate Chemical compound C=CC(=O)OCCCCCC(=O)OCC(C)(C)COC(=O)C(C)(C)COC(=O)CCCCCOC(=O)C=C HTMMMSIQFWMMIJ-UHFFFAOYSA-N 0.000 description 1
- AFCITVNGOYKNAF-UHFFFAOYSA-N [4-(4-methylbenzoyl)-2,3-diphenylphenyl]-phenylmethanone Chemical class C1=CC(C)=CC=C1C(=O)C(C(=C1C=2C=CC=CC=2)C=2C=CC=CC=2)=CC=C1C(=O)C1=CC=CC=C1 AFCITVNGOYKNAF-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000005157 alkyl carboxy group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 1
- 239000011609 ammonium molybdate Substances 0.000 description 1
- 229940010552 ammonium molybdate Drugs 0.000 description 1
- 235000018660 ammonium molybdate Nutrition 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229920003233 aromatic nylon Polymers 0.000 description 1
- 125000005337 azoxy group Chemical group [N+]([O-])(=N*)* 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- ZDZHCHYQNPQSGG-UHFFFAOYSA-N binaphthyl group Chemical group C1(=CC=CC2=CC=CC=C12)C1=CC=CC2=CC=CC=C12 ZDZHCHYQNPQSGG-UHFFFAOYSA-N 0.000 description 1
- 229920006167 biodegradable resin Polymers 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001896 cresols Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004802 cyanophenyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 229940100539 dibutyl adipate Drugs 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- 150000002012 dioxanes Chemical class 0.000 description 1
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000004662 dithiols Chemical class 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 229920001038 ethylene copolymer Polymers 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000010433 feldspar Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000007849 furan resin Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 235000013773 glyceryl triacetate Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- UOYPNWSDSPYOSN-UHFFFAOYSA-N hexahelicene Chemical compound C1=CC=CC2=C(C=3C(=CC=C4C=CC=5C(C=34)=CC=CC=5)C=C3)C3=CC=C21 UOYPNWSDSPYOSN-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229960004337 hydroquinone Drugs 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000000787 lecithin Substances 0.000 description 1
- 235000010445 lecithin Nutrition 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229920000092 linear low density polyethylene Polymers 0.000 description 1
- 239000004707 linear low-density polyethylene Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000002113 nanodiamond Substances 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 229940105570 ornex Drugs 0.000 description 1
- RZFODFPMOHAYIR-UHFFFAOYSA-N oxepan-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.O=C1CCCCCO1 RZFODFPMOHAYIR-UHFFFAOYSA-N 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- OPYYWWIJPHKUDZ-UHFFFAOYSA-N phenyl cyclohexanecarboxylate Chemical class C1CCCCC1C(=O)OC1=CC=CC=C1 OPYYWWIJPHKUDZ-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical class [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical class OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920000785 ultra high molecular weight polyethylene Polymers 0.000 description 1
- 229920001862 ultra low molecular weight polyethylene Polymers 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/1055—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/1055—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
- B32B17/10614—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer comprising particles for purposes other than dyeing
- B32B17/10633—Infrared radiation absorbing or reflecting agents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/287—Interference filters comprising deposited thin solid films comprising at least one layer of organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/10—Inorganic particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/10—Inorganic particles
- B32B2264/102—Oxide or hydroxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2305/00—Condition, form or state of the layers or laminate
- B32B2305/02—Cellular or porous
- B32B2305/028—Hollow fillers; Syntactic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2605/00—Vehicles
- B32B2605/006—Transparent parts other than made from inorganic glass, e.g. polycarbonate glazings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/445—Organic continuous phases
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
Definitions
- the present invention relates to a new infrared shielding sheet that efficiently absorbs and reflects infrared rays and has excellent transparency and low haze, a method for producing the same, and uses thereof (intermediate film for glass, laminated glass, and window member). Is.
- Patent Document 1 a high refractive index layer and a low refractive index layer are provided between at least two glass substrates facing each other in order to reflect light having a specific wavelength in the infrared region.
- an infrared reflective film composed of multilayer films (dielectric multilayer films) laminated alternately and a functionally matched intermediate film in which conductive ultrafine particles that shield infrared rays such as antimony-doped tin oxide are uniformly dispersed ( A highly heat insulating laminated glass laminated with a fine particle film) is disclosed.
- This highly heat-insulated laminated glass has a problem of manufacturing cost because it is necessary to form a dielectric multilayer film and a fine particle film separately.
- Patent Document 2 a high refractive index inorganic material layer and a low refractive index inorganic material layer are alternately disposed between a first glass plate and a second glass plate in order to reflect light having a specific wavelength in the infrared region.
- a laminated glass for a vehicle window is disclosed in which a laminated film (dielectric multilayer film) laminated on and an intermediate film (fine particle film) in which infrared shielding fine particles such as ITO (tin-doped indium oxide) are dispersed and laminated are laminated.
- This vehicle window laminated glass has a problem of manufacturing cost because it is necessary to form a dielectric multilayer film and a fine particle film separately.
- Patent Document 3 discloses a heat insulating glass in which transparent conductive layers and high refractive index layers whose refractive index in the infrared region is relatively higher than the refractive index of the transparent conductive layer are alternately laminated on a glass substrate.
- this insulating glass uses a layer made of only a conductor as a low refractive index layer in the infrared region, it can transmit and receive radio waves such as mobile phone radio waves, TV radio waves, and GPS (global positioning system) radio waves indoors. There is a problem that it cannot be used for a system that requires radio wave transmission performance to be performed outside.
- this heat insulating glass requires vacuum equipment such as sputtering in order to form a layer made only of a conductor, there is a problem of manufacturing cost.
- JP 2002-220262 A International Publication No. 2007/020791 Pamphlet JP 2010-202465 A
- An object of the present invention is to provide a new infrared shielding sheet having greatly improved transparency, radio wave transparency, infrared shielding properties, and manufacturing cost in the visible light region.
- the inventors of the present application have obtained a laminated film in which a high refractive index resin layer containing fine particles and a low refractive index resin layer containing fine particles are alternately laminated.
- At least one layer of the low refractive index resin layer has a value obtained by subtracting a refractive index at an arbitrary wavelength of 780 to 2500 nm from a refractive index at a wavelength of 550 nm is 0.1 or more,
- the refractive index resin layer has a refractive index lower than that of the high refractive index resin layer at an arbitrary wavelength of 550 nm or more and the arbitrary wavelength or less, it has transparency, radio wave transparency, manufacturing cost, infrared
- the present inventors have found that a new infrared shielding sheet with significantly improved shielding properties can be realized, and have completed the present invention.
- the infrared shielding sheet of the present invention is an infrared shielding sheet comprising a laminated film in which a high refractive index resin layer containing fine particles and a low refractive index resin layer containing fine particles are alternately laminated,
- the value obtained by subtracting the refractive index at an arbitrary wavelength of 780 nm to 2500 nm from the refractive index at a wavelength of 550 nm of at least one of the low refractive index resin layers is 0.1 or more
- the low refractive index resin layer is characterized by exhibiting a refractive index lower than that of the high refractive index resin layer at an arbitrary wavelength of 550 nm or more and the arbitrary wavelength or less.
- the infrared shielding sheet of the present invention has reflection characteristics in addition to good absorption characteristics for a wide infrared region, is excellent in radio wave transmission, transparency, manufacturing cost, low haze, and has infrared shielding performance. It can be greatly improved effectively.
- the infrared shielding sheet of the present invention is laid on the window glass of a house or automobile, both the winter heating cost reduction effect and the summer temperature reduction effect of the house or automobile can be improved.
- the infrared shielding sheet of the present invention is an infrared shielding sheet comprising a laminated film in which a high refractive index resin layer containing fine particles and a low refractive index resin layer containing fine particles are alternately laminated.
- the value obtained by subtracting the refractive index at an arbitrary wavelength of 780 nm to 2500 nm from the refractive index at a wavelength of 550 nm is 0.1 or more
- the low refractive index resin layer is an arbitrary wavelength of 550 nm or more and the arbitrary wavelength or less. In this wavelength, the refractive index is lower than that of the high refractive index resin layer.
- At least one of the low refractive index resin layers has a value obtained by subtracting the refractive index at an arbitrary wavelength of 780 nm to 2500 nm from the refractive index at a wavelength of 550 nm, which is 0.1 or more, Adjacent to at least one low refractive index resin layer at an arbitrary wavelength of 780 nm to 2500 nm while reducing a difference in refractive index between at least one low refractive index resin layer at a wavelength and an adjacent high refractive index resin layer The difference in refractive index with the high refractive index resin layer can be increased.
- an infrared shielding sheet having both good visible light transmittance and good infrared shielding properties can be realized.
- the high refractive index layer containing fine particles and the low refractive index layer containing fine particles are both resin layers, they can be easily manufactured by coating or the like, and the manufacturing cost can be reduced. Can be achieved.
- fine-particles are both resin layers, the infrared rays shielding sheet which has a radio wave transmittance is realizable.
- “infrared region” refers to a region having a wavelength of 780 nm to 2500 nm.
- the value obtained by subtracting the refractive index at an arbitrary wavelength from 780 nm to 1500 nm from the refractive index at a wavelength of 550 nm may be 0.1 or more.
- the high refractive index resin layer has a value obtained by subtracting a refractive index at an arbitrary wavelength of 780 nm to 1500 nm from a refractive index at a wavelength of 550 nm, which is 0.1 or less.
- the refractive index resin layer may have a value obtained by subtracting the refractive index at an arbitrary wavelength from 780 nm to 1500 nm from the refractive index at a wavelength of 550 nm. Accordingly, the refractive index difference between the low refractive index resin layer and the high refractive index resin layer at an arbitrary wavelength of 780 nm to 1500 nm while reducing the refractive index difference between the low refractive index resin layer and the high refractive index resin layer at a wavelength of 550 nm. The difference can be further increased. As a result, it is possible to realize an infrared shielding sheet having better infrared shielding properties while maintaining good visible light transmittance.
- the infrared shielding sheet preferably further includes a transparent support, and the laminated film is formed on the transparent support.
- a high refractive index resin layer 21 containing fine particles and a low refractive index resin layer 22 containing fine particles are alternately arranged on a transparent support 20.
- the laminated film 23 is laminated.
- the total number of layers of the high refractive index resin layer 21 and the low refractive index resin layer 22 is an even number (8), and the layer on the end of the laminated film 23 on the transparent support 20 side is low.
- the total number of layers of the high refractive index resin layer 21 and the low refractive index resin layer 22 is an odd number (for example, 7), and the layer on the transparent support 20 side end in the laminated film 23. May be the high refractive index resin layer 21.
- the transparent support various resin films, glass and the like can be used.
- the resin film include polyolefin films such as polyethylene film and polypropylene film; polyethylene terephthalate (hereinafter abbreviated as “PET”) film, polybutylene terephthalate film, polyethylene naphthalate (hereinafter abbreviated as “PEN”) film, and the like.
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- Polyester film, polycarbonate film, polyvinyl chloride film, cellulose triacetate film, polyamide film, polyimide film, and the like can be used.
- An infrared shielding sheet comprising a laminated film formed by alternately laminating a high refractive index resin layer and a low refractive index resin layer, the refractive index difference between the two in the infrared region, and the absolute value of the refractive index of the high refractive index resin layer Is important in determining the infrared reflection function. That is, the greater the difference in refractive index and the absolute value of the refractive index, the greater the infrared reflection function.
- the refractive index difference between at least two adjacent layers is an infrared wavelength reflected by the laminated film (a wavelength arbitrarily set from an infrared region of 780 nm to 2500 nm).
- it is preferably 0.1 or more, more preferably 0.2 or more, further preferably 0.3 or more, and particularly preferably 0.35 or more.
- the number of laminated layers is increased to reduce the visible light transmittance in order to obtain a desired infrared reflectance.
- this is not preferable because the manufacturing cost increases.
- the infrared region of sunlight that reaches the earth's surface has several energy peaks, and when it is desired to shield the infrared region of sunlight, these energy peaks can be efficiently shielded. It becomes important. Therefore, as a result of intensive studies by the present inventors, the QWOT coefficient at an arbitrary wavelength of 780 nm to 2500 nm of the optical film thickness of at least one of the high refractive index resin layer and the low refractive index resin layer is set to 1.5 or more. Thus, it was found that the infrared region of sunlight can be effectively blocked.
- n the refractive index of the high refractive index resin layer or the low refractive index resin layer
- d the geometric thickness of the high refractive index resin layer or the low refractive index resin layer
- ⁇ reflects the laminated film.
- Infrared wavelength (wavelength arbitrarily set from the infrared region of 780 nm to 2500 nm).
- the low refractive index resin layer has a lower refractive index than the high refractive index resin layer at an arbitrary wavelength of 780 nm to 2500 nm.
- the low refractive index resin layer exhibits a lower refractive index than the high refractive index resin layer at an arbitrary wavelength of 780 nm to 2500 nm, and is at least one of the high refractive index resin layers.
- An infrared shielding sheet having a structure in which the QWOT coefficient of the optical thickness at an arbitrary wavelength of 780 nm to 2500 nm of at least one of the layers and / or the low refractive index resin layer is 1.5 or more is preferable. Thereby, the mountain of energy of the infrared region of sunlight can be reflected effectively, and infrared rays can be shielded more efficiently.
- the infrared shielding sheet having the above configuration at least one of the high refractive index resin layer or the low refractive index resin layer adjacent to the layer having a QWOT coefficient of the optical thickness at the arbitrary wavelength of 1.5 or more is at the arbitrary wavelength.
- the QWOT coefficient of the optical thickness is preferably 1 or more.
- infrared rays in the infrared region shorter than the arbitrary wavelength for example, 780 nm or more and less than 1000 nm
- the infrared shielding sheet having the above-described configuration includes at least one high refractive index resin layer having a QWOT coefficient of 1 at the optical wavelength, and has a QWOT coefficient of 1 at the optical wavelength.
- the infrared rays having a wavelength near the arbitrary wavelength can be efficiently shielded.
- the arbitrary wavelength is preferably an arbitrary wavelength of 780 nm to 1500 nm. Thereby, infrared rays can be shielded more efficiently.
- the infrared wavelength ⁇ reflected by the laminated film is generally expressed by the following formula: It is given by (1).
- n H d H + n L d L ⁇ / 2 ...
- n H and d H represent the refractive index and geometric thickness of the high refractive index resin layer, respectively
- n L and d L represent the refractive index and geometric thickness of the low refractive index resin layer, respectively.
- the optical thickness (refractive index n H and geometrical thickness d H and the product) and a low refractive index resin layer optical thickness of (refractive index n L and geometrical thickness d L of the high-refractive index resin layer May be the same so that each is an integer multiple of ⁇ / 4. That is, the optical thickness at an arbitrary wavelength of 780 nm to 1500 nm (for example, the optical thickness at a wavelength of 1200 nm) of each of the high refractive index resin layer and the low refractive index resin layer may be 195 nm to 375 nm.
- an infrared shielding sheet having both a good visible light transmittance and a good infrared shielding property can be realized.
- the infrared wavelength ⁇ reflected by the laminated film may be 780 nm to 2500 nm, but more preferably 780 nm to 1500 nm.
- the infrared wavelength ⁇ reflected by the laminated film becomes a wavelength in the visible light region.
- the infrared wavelength ⁇ reflected by the laminated film exceeds 1500 nm, it is not preferable because there is absorption by fine particles contained in the low refractive index resin layer, and the infrared shielding effect is reduced.
- the total number of high refractive index resin layers and low refractive index resin layers is preferably 3 or more, and more preferably 4 or more.
- the total number of layers of the high refractive index resin layer and the low refractive index resin layer is less than 3, the infrared reflection function is insufficient.
- the total number of the high refractive index resin layer and the low refractive index resin layer is 3 or more, the total number of the high refractive index resin layer and the low refractive index resin layer is 3 to 30. More preferably, it is 3-20, more preferably 3-15.
- the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 4 or more, the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 4 to 30. More preferably, it is 4 to 20, more preferably 4 to 15. If the total number of layers of the high refractive index resin layer and the low refractive index resin layer exceeds 30, the manufacturing cost increases, the visible light transmittance decreases, the durability decreases, and the high refractive index resin layer and the low refractive index resin. Since curling of the infrared shielding sheet due to an increase in stress of the multilayer film composed of layers becomes a problem, it is not preferable.
- the ideal optical performance of the infrared shielding sheet is that it has a high visible light transmittance and a low total solar transmittance, but in general, the two are in a proportional relationship, depending on which performance is important. The performance will be determined.
- the visible light transmittance of the infrared shielding sheet is preferably 50% or more, and more preferably 70% or more.
- the total solar transmittance of the infrared shielding sheet is preferably 80% or less, and more preferably 75% or less in order to shield infrared rays more effectively. Furthermore, the haze of the infrared shielding sheet needs to be such that transparency is not impaired, is preferably 8% or less, more preferably 3% or less, and even more preferably 1% or less.
- the conventional technique uses a high refractive index resin layer.
- Dielectric fine particles e.g., titanium oxide fine particles
- dielectric fine particles e.g., silica fine particles
- the refractive index of the dielectric fine particles is substantially constant from the visible light region to the infrared region
- the refractive index of the low refractive index resin layer is also substantially constant from the visible light region to the infrared region.
- the inventors of the present application have obtained a value obtained by subtracting the refractive index at an arbitrary wavelength of 780 nm to 2500 nm (especially an arbitrary wavelength of 780 nm to 1500 nm) in the infrared region from the refractive index at a wavelength of 550 nm in the visible light region.
- a low-refractive index resin layer containing fine particles that is 0.1 or more was discovered, and the low-refractive index resin layer containing fine particles also has an infrared absorption capability.
- the refractive index resin layer is a high refractive index resin layer containing fine particles (particularly a high refractive index resin in which a value obtained by subtracting the refractive index at an arbitrary wavelength from 780 nm to 1500 nm from the refractive index at a wavelength of 550 nm is 0.1 or less.
- Layer for example, a high refractive index resin layer containing dielectric fine particles such as titanium oxide, which is used in the prior art, is more efficient than the prior art. It found that it is possible to shield the light of the line regions.
- the fine particles contained in the high refractive index resin layer satisfying the above conditions are preferably fine particles that absorb less light in the visible light region and exhibit a high refractive index in the infrared region.
- Examples of such fine particles include dielectric fine particles made of a dielectric material such as titanium oxide, zirconium oxide, hafnium oxide, tantalum oxide, tungsten oxide, niobium oxide, cerium oxide, lead oxide, zinc oxide, and diamond. .
- dielectric fine particles made of a dielectric material such as titanium oxide, zirconium oxide, hafnium oxide, tantalum oxide, tungsten oxide, niobium oxide, cerium oxide, lead oxide, zinc oxide, and diamond. .
- at least one kind of dielectric fine particles of titanium oxide, zirconium oxide, zinc oxide, and diamond is preferable.
- boride fine particles, nitride fine particles having high refractive index in the infrared region and having infrared absorption ability are also used as electrically conductive metal oxide fine particles.
- Fine particles can be exemplified.
- the boride fine particles and nitride fine particles specifically, lanthanum hexaboride fine particles and titanium nitride fine particles are preferable.
- At least one of the high refractive index resin layers is made of titanium oxide, zirconium oxide, hafnium oxide, tantalum oxide, tungsten oxide, niobium oxide, cerium oxide, lead oxide, zinc oxide, diamond, boride, and nitride. It is preferable to include at least one kind of fine particles selected.
- fine particles showing a high refractive index in the infrared region may be used singly or in combination of two or more types, and furthermore, separate fine particles may be used in each high refractive index resin layer in the laminated film. I do not care.
- the fine particles contained in at least one low refractive index resin layer have little light absorption in the visible light region, have good light absorption in the infrared region, and have a refractive index contained in the high refractive index resin layer. Those having a relatively lower refractive index than the fine particles are suitable.
- Examples of such fine particles include electrically conductive metal oxide fine particles having a plasma wavelength in the infrared region. Specific examples of such metal oxide fine particles include fine particles of metal oxides such as tin oxide, indium oxide, zinc oxide, tungsten oxide, chromium oxide, and molybdenum oxide.
- At least one fine particle selected from the group consisting of at least one of tin oxide, indium oxide, zinc oxide, and tungsten oxide having low light absorption in the visible light region is preferable, and among these, indium oxide fine particles Is more preferable.
- the metal oxide fine particles in order to improve the electrical conductivity of these metal oxide fine particles, it is preferable to dope the metal oxide fine particles with a third component (third element; dopant).
- a third component third element
- Antimony (Sb), vanadium (V), niobium (Nb), tantalum (Ta), and the like can be cited as dopants doped into tin oxide fine particles.
- dopants doped into indium oxide fine particles examples thereof include zinc (Zn), aluminum (Al), tin (Sn), antimony, gallium (Ga), germanium (Ge), and the like.
- Indium (In), tin, antimony, niobium, and the like, and dopants doped into tungsten oxide fine particles include cesium (Cs), rubidium (Rb), potassium (K), thallium (Tl), Indium, barium (Ba), lithium (Li), calcium (Ca), stron Um (Sr), iron (Fe), tin, aluminum, copper (Cu) and the like.
- the third component is an oxygen defect. That is, these metal oxide fine particles may have oxygen defects.
- oxygen-deficient tungsten oxide represented by a composition formula such as WO x (however, 2.45 ⁇ x ⁇ 2.999), etc. Particles of tungsten oxide).
- metal oxide fine particles doped with a third component or having oxygen defects antimony-doped tin oxide (ATO), tin-doped indium oxide (hereinafter abbreviated as “ITO” where appropriate), gallium-doped zinc oxide ( GZO), oxygen-deficient tungsten oxide, and at least one fine particle selected from the group consisting of cesium-doped tungsten oxide is preferred, and tin-doped indium oxide is more preferred.
- ATO antimony-doped tin oxide
- ITO tin-doped indium oxide
- GZO gallium-doped zinc oxide
- oxygen-deficient tungsten oxide and at least one fine particle selected from the group consisting of cesium-doped tungsten oxide is preferred, and tin-doped indium oxide is more preferred.
- the metal oxide fine particles preferably have a powder resistance of 100 ⁇ ⁇ cm or less, more preferably 10 ⁇ ⁇ cm or less, more preferably 1 ⁇ ⁇ cm or less when compressed at 60 MPa. preferable.
- a powder resistance measurement system MCP-PD51 manufactured by Mitsubishi Chemical Analytech Co., Ltd.
- MCP-PD51 manufactured by Mitsubishi Chemical Analytech Co., Ltd.
- At least one of the low refractive index resin layers is made of non-hollow fine particles (solid fine particles), particularly at least one non-hollow fine particle selected from the group consisting of tin oxide, indium oxide, zinc oxide, and tungsten oxide.
- at least one layer of the low refractive index resin layer (which may be the same as or different from the layer containing non-hollow fine particles) contains hollow fine particles, and hollow fine particles having a low refractive index (particularly the non-hollow fine particles). It is more preferable to include hollow fine particles) having a lower refractive index than hollow fine particles.
- hollow fine particles known hollow fine particles such as hollow silica fine particles and hollow acrylic beads (hollow acrylic resin fine particles) can be used.
- the non-hollow fine particles are preferably at least one non-hollow fine particle selected from the group consisting of at least one of tin oxide, indium oxide, zinc oxide, and tungsten oxide.
- Antimony-doped tin oxide, ITO, gallium-doped zinc oxide More preferred is at least one non-hollow microparticle selected from the group consisting of oxygen-deficient tungsten oxide and cesium-doped tungsten oxide.
- the porosity of the hollow fine particles is preferably 10% to 90% by volume.
- the porosity of the hollow fine particles is less than 10% by volume, the effect of reducing the refractive index of the fine particles due to the voids in the hollow fine particles is reduced, and the effect of using the hollow fine particles in the low refractive index resin layer is reduced. Get smaller.
- the porosity of the hollow fine particles is higher than 90% by volume, the mechanical strength of the hollow fine particles is lowered, and the hollow fine particles cannot be kept in a hollow state, which is not preferable.
- the proportion of non-hollow fine particles among the fine particles contained in the low refractive index resin layer is: It is preferably 10% by weight to 90% by weight, and more preferably 20% by weight to 90% by weight.
- the ratio of the non-hollow fine particles is less than 10% by weight, the infrared absorption ability of the non-hollow fine particles is insufficient, which is not preferable.
- the ratio of non-hollow microparticles is more than 90% by weight, the ratio of hollow microparticles decreases, which is not preferable.
- At least one of the low refractive index resin layers includes the above-described electrically conductive metal oxide fine particles (hereinafter referred to as “electrically conductive fine particles”) (in particular, tin oxide, indium oxide, zinc oxide, and oxide). At least one kind of fine particles selected from the group consisting of tungsten), at least one layer of the low refractive index resin layer (which may be the same as or different from the layer containing electrically conductive metal oxide fine particles), Low refractive index dielectric particles can be included.
- the dielectric fine particles silica fine particles, magnesium fluoride fine particles and the like can be used.
- hollow dielectric fine particles can also be used as the dielectric fine particles.
- hollow dielectric fine particles examples include hollow dielectric fine particles such as hollow silica fine particles and hollow acrylic beads.
- electrically conductive metal oxide fine particles in particular, at least one fine particle selected from the group consisting of tin oxide, indium oxide, zinc oxide, and tungsten oxide.
- at least one layer of the low refractive index resin layer (which may be the same as or different from the layer containing electrically conductive metal oxide fine particles) contains silica fine particles, particularly hollow silica fine particles, so that the low refractive index resin Infrared rays can be shielded more effectively by lowering the refractive index of the layer.
- the proportion of the electrically conductive fine particles in the fine particles contained in the entire low refractive index resin layer Is preferably 10% by weight to 90% by weight, and more preferably 20% by weight to 90% by weight.
- the ratio of the electrically conductive fine particles is less than 10% by weight, the infrared absorbing ability by the metal oxide is insufficient, which is not preferable.
- the proportion of electrically conductive fine particles is more than 90% by weight, the proportion of dielectric fine particles (particularly hollow dielectric fine particles) decreases, which is not preferable.
- the fine particles (electrically conductive fine particles, dielectric fine particles, hollow fine particles, etc.) used for the low refractive index resin layer may be used alone or in combination of two or more.
- different kinds of fine particles may be contained in another low refractive index resin layer, or different kinds of fine particles may be contained in the same low refractive index resin layer. Good.
- the fine particles contained in the high refractive index resin layer and the low refractive index resin layer of the infrared shielding sheet of the present invention preferably have an average primary particle diameter or an average dispersed particle diameter of 300 nm or less. More preferably, it is 200 nm.
- the average primary particle diameter or average dispersed particle diameter of the fine particles is larger than 300 nm, the haze of the infrared shielding sheet is increased, and the visibility through the infrared shielding sheet is deteriorated.
- “average primary particle size of fine particles” means the average particle size of fine particles before dispersion
- average dispersed particle size of fine particles means the average particle size of fine particles being dispersed after the dispersion step.
- the average primary particle diameter is calculated from the specific surface area measured by the BET (Brunauer-Emmett-Teller) method.
- the particle size distribution measuring device for measuring the average dispersed particle size is not particularly limited, but “Nanotrack UPA-EX150” (manufactured by Nikkiso Co., Ltd.) is preferable.
- the infrared shielding sheet In order to satisfy the infrared shielding performance, smoothness, low haze, and radio wave permeability of the infrared shielding sheet, it is important to appropriately disperse the fine particles contained in the high refractive index resin layer and the low refractive index resin layer. .
- a method for dispersing the fine particles a method using a sand mill, attritor, ball mill, homogenizer, roll mill, bead mill or the like is preferable. Among these, a method using a bead mill is particularly preferable.
- the peripheral speed of the bead mill is preferably 3 m / s to 10 m / s.
- the peripheral speed of the bead mill is lower than 3 m / s, the fine particles cannot be sufficiently dispersed, and when the peripheral speed of the bead mill is higher than 10 m / s, particularly the fine particles contained in the low refractive index resin layer (particularly electrically conductive fine particles). As a result, the infrared absorption performance is degraded.
- the appropriate range of dispersion energy varies slightly depending on the apparatus used for dispersion, the resin binder contained in the high refractive index resin layer and the low refractive index resin layer, the fine particle concentration at the time of dispersion, etc., but with a relatively low dispersion energy. It is better to disperse the fine particles. Further, when coarse particles remain after the treatment for dispersing the fine particles, it is preferable to remove the coarse particles by further treatment such as filtration and centrifugation.
- the high refractive index resin layer and the low high refractive index resin layer are prepared by applying a dispersion liquid in which a resin binder is dissolved in a solvent and fine particles are dispersed on the surface of an object such as a transparent support, and then evaporating the solvent. It can be formed by a method.
- the solvent used for dispersing the fine particles in the dispersion is not particularly limited, but water, an organic solvent, or a mixture of water and an organic solvent can be used.
- organic solvent examples include hydrocarbon solvents (toluene, xylene, n-hexane, cyclohexane, n-heptane, etc.), alcohol solvents (methanol, ethanol, isopropyl alcohol, butanol, t-butanol, benzyl alcohol, etc.) , Ketone solvents (acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, acetylacetone, etc.), ester solvents (ethyl acetate, methyl acetate, butyl acetate, cellosolve acetate, amyl acetate, etc.), ether solvents (isopropyl ether, 1,4-dioxane, etc.), glycol solvents (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, etc.), glycol ether solvents (methyl cell
- the solvent used for dispersion is preferably at least one solvent selected from the group consisting of water, ketone solvents, alcohol solvents, amide solvents, and hydrocarbon solvents, and more preferably toluene, methyl ethyl ketone. , Methyl isobutyl ketone, and at least one solvent selected from the group consisting of acetylacetone.
- a dispersant When dispersing the fine particles in the solvent, a dispersant may be added to the solvent.
- the dispersant include fatty acid salt (soap), ⁇ -sulfo fatty acid ester salt (MES), alkylbenzene sulfonate (ABS), linear alkylbenzene sulfonate (LAS), alkyl sulfate (AS), and alkyl ether sulfate.
- Low molecular weight anionic (anionic) compounds such as ester salts (AES) and alkyl sulfate triethanol; fatty acid ethanolamide, polyoxyethylene alkyl ether (AE), polyoxyethylene alkyl phenyl ether (APE), sorbitol, sorbitan, etc.
- Low molecular weight nonionic compounds such as alkyltrimethylammonium salts, dialkyldimethylammonium chlorides, alkylpyridinium chlorides; alkylcarboxyl betaines, sulfobetaines, lecithins
- Low molecular amphoteric compounds such as naphthalene sulfonate formalin condensate, polystyrene sulfonate, polyacrylate, copolymer salt of vinyl compound and carboxylic acid monomer, carboxymethyl cellulose, polyvinyl alcohol, etc.
- polymer aqueous dispersants include polymer non-aqueous dispersants such as polyacrylic acid partial alkyl esters and polyalkylene polyamines; Polymeric cationic dispersants such as polyethyleneimine and aminoalkyl methacrylate copolymers
- Polymer non-aqueous dispersants such as polyacrylic acid partial alkyl esters and polyalkylene polyamines
- Polymeric cationic dispersants such as polyethyleneimine and aminoalkyl methacrylate copolymers
- the dispersant added to the solvent the following are known as specific product names. That is, as the dispersant, Floren DOPA-15B, Floren DOPA-17 (all of which are manufactured by Kyoeisha Chemical Co., Ltd.), Solplus AX5, Solplus TX5, Solsperse 9000, Solsperse 12000, Solsperse 17000, Solsperse 20000, Solsperse 21000, Solsperse 24000, Sol Sparse 26000, Sol Sparse 27000, Sol Sparse 28000, Sol Sparse 32000, Sol Sparse 35100, Sol Sparse 54000, Sol Six 250 (all of which are manufactured by Nihon Lubrizol Corporation), EFKA4008, EFKA4009, EFKA4010, EFKA4015, EFKA4046, EFKA4046, EFKA4046, EFKA4046 EFKA4080, EFKA746 EFKA4020, EFKA4050, EFKA4055, EFKA4400, EFKA4401,
- the high refractive index resin layer and the low refractive index resin layer are obtained by dispersing fine particles in a resin binder.
- the resin binder is not particularly limited as long as it is a resin capable of maintaining the dispersion of fine particles, and examples thereof include thermoplastic resins, thermosetting resins, and photocurable resins.
- thermoplastic resin examples include high-density polyethylene resin, low-density polyethylene resin (not linear), linear low-density polyethylene resin, ultra-low-density polyethylene resin, polypropylene resin, polybutadiene resin, cyclic olefin resin, and polymethylpentene.
- polystyrene resin ethylene / vinyl acetate copolymer, ionomer resin, ethylene vinyl alcohol copolymer resin, ethylene / ethyl acrylate copolymer, acrylonitrile / styrene resin, acrylonitrile / chlorinated polystyrene / styrene copolymer resin, acrylonitrile / Acrylic rubber / styrene copolymer resin, acrylonitrile / butadiene / styrene copolymer resin, acrylonitrile / EPDM (ethylene / propylene / diene monomer) / styrene copolymer resin, silicone rubber / Acrylonitrile / styrene copolymer resin, cellulose / acetate / butyrate resin, cellulose acetate resin, acrylic resin (methacrylic resin), ethylene / methyl methacrylate copoly
- thermosetting resin is not particularly limited as long as it is a compound having a functional group curable by heating, and examples thereof include a curable compound having a cyclic ether group such as an epoxy group or an oxetanyl group.
- the photocurable resin is not particularly limited as long as it is a compound having a functional group that can be cured by light irradiation. Examples thereof include resins having an unsaturated double bond-containing group.
- the curable compound having a cyclic ether group is not particularly limited, and examples thereof include epoxy resins other than alicyclic epoxy resins, alicyclic epoxy resins, oxetane resins, and furan resins. Among these, epoxy resins other than alicyclic epoxy resins, alicyclic epoxy resins, and oxetane resins are preferable from the viewpoint of reaction rate and versatility.
- the epoxy resin other than the alicyclic epoxy resin is not particularly limited.
- a phenol novolac type epoxy resin for example, a cresol novolac type epoxy resin, a biphenyl novolac type epoxy resin, a trisphenol novolak type epoxy resin, a dicyclopentadiene novolak type Novolak type epoxy resins such as epoxy resins; bisphenol A type epoxy resins, bisphenol F type epoxy resins, 2,2'-diallyl bisphenol A type epoxy resins, hydrogenated bisphenol type epoxy resins, polyoxypropylene bisphenol A type epoxy resins, etc. Examples thereof include bisphenol type epoxy resins.
- Other examples of the epoxy resin other than the alicyclic epoxy resin include a glycidylamine type epoxy resin.
- epoxy resins include, for example, Epicron N-740, Epicron N-770, Epicron N-775 (all are manufactured by DIC Corporation), Epicoat 152, Epicoat 154 (all are Mitsubishi Chemical Corporation).
- Phenol novolac type epoxy resins such as Epicron N-660, Epicron N-665, Epicron N-670, Epicron N-673, Epicron N-680, Epicron N-695, Epicron N-665 EXP, Epicron N- 672-EXP (all of which are manufactured by DIC Corporation) and other cresol novolac type epoxy resins; NC-3000P (manufactured by Nippon Kayaku Co., Ltd.) and other biphenyl novolak type epoxy resins; EP1032S50, EP1032H60 (all of which are Mitsubishi Chemical Corporation ), Etc .; dicyclopentadiene novolac type epoxy resins such as XD-1000-L (manufactured by Nippon Kayaku Co., Ltd.), Epicron HP-7200 (manu
- the alicyclic epoxy resin is not particularly limited, and examples thereof include Celoxide 2021, Celoxide 2080, Celoxide 3000 (all are manufactured by Daicel Ornex Co., Ltd.) and the like.
- examples thereof include Celoxide 2021, Celoxide 2080, Celoxide 3000 (all are manufactured by Daicel Ornex Co., Ltd.) and the like.
- oxetane resin for example, Etanacol EHO, Etanacol OXBP, Etanacol OXTP, Etanacol OXMA (all of which are manufactured by Ube Industries, Ltd.) and the like can be mentioned.
- These curable compounds having a cyclic ether group may be used alone or in combination of two or more.
- the photocurable resin having an unsaturated double bond-containing group is not particularly limited, and examples thereof include resins having groups such as a vinyl group, a vinyl ether group, an allyl group, a maleimide group, and a (meth) acryl group. Of these resins having a group, a resin having a (meth) acryl group is preferable from the viewpoint of reactivity and versatility. In addition, in this specification, a (meth) acryl group means an acryl group or a methacryl group.
- Examples of the resin having a (meth) acryl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 1,4-butanediol mono (meth) acrylate, and carbitol (meth).
- Acrylate for example, KAYARAD HX-220, KAYARAD HX-620, etc., manufactured by Nippon Kayaku Co., Ltd.
- pentaerythritol tetra (meth) acrylate poly (meth) as a reaction product of dipentaerythritol and ⁇ -
- glycidyl compound used in the epoxy (meth) acrylate which is a reaction product of the monoglycidyl compound or polyglycidyl compound and (meth) acrylic acid
- bisphenol A Bisphenol F, bisphenol S, 4,4′-biphenol tetramethyl bisphenol A, dimethyl bisphenol A, tetramethyl bisphenol F, dimethyl bisphenol F, tetramethyl bisphenol S, dimethyl bisphenol S, tetramethyl-4,4′-biphenol , Dimethyl-4,4′-biphenol, 1- (4-hydroxyphenyl) -2- [4- (1,1-bis (4-hydroxyphenyl) ethyl) phenyl] propane, 2,2′-methylene (4-methyl-6-tert-butylphenol), 4,4'-butylidene-bis (3-methyl-6-tert-butylphenol), trishydroxyphenyl
- Epoxy (meth) acrylate which is a reaction product of these monoglycidyl compounds or polyglycidyl compounds and (meth) acrylic acid, adds an equivalent amount of (meth) acrylic acid to the epoxy group (glycidyl group) of the monoglycidyl compound or polyglycidyl compound. It can be obtained by esterification reaction. This synthesis reaction can be performed by a generally known method.
- a catalyst eg, benzyldimethylamine, triethylamine, benzyltrimethylammonium chloride, triphenylphosphine, triphenylstibine, etc.
- a polymerization inhibitor eg, methoquinone, Hydroquinone, methylhydroquinone, phenothiazine, dibutylhydroxytolu
- the (meth) acrylated resorcin diglycidyl ether thus obtained is a resin having a radically polymerizable (meth) acryloyl group.
- (meth) acrylation means acrylation or methacrylation
- (meth) acryloyl group means an acryloyl group or a methacryloyl group.
- a photopolymerization initiator can be added to the resin binder contained in the infrared shielding sheet of the present invention as necessary, and the resin binder is heated.
- a thermosetting agent can be added as necessary.
- the photopolymerization initiator is not particularly limited as long as it is for causing a polymerization reaction of an unsaturated double bond, an epoxy group or the like in the photocurable resin by light irradiation. And a radical polymerization type photopolymerization initiator.
- thermosetting agent is not particularly limited as long as it is for reacting an unsaturated double bond or an epoxy group in the thermosetting resin by heating to cause crosslinking, and examples thereof include acid anhydrides and amines. Phenols, imidazoles, dihydrazines, Lewis acids, Bronsted acid salts, polymercaptons, isocyanates, blocked isocyanates and the like.
- the content of the fine particles contained in the high refractive index resin layer is preferably 40% by weight or more, more preferably 50% by weight or more, and 60% by weight with respect to the entire high refractive index resin layer. % Or more, more preferably 70% by weight or more, and most preferably 90% by weight or more.
- the content of the fine particles contained in the high refractive index resin layer is less than 40% by weight, the refractive index of the resin binder becomes dominant in the high refractive index resin layer and effectively reflects light in the infrared region. I can't.
- fine-particles contained in the said high refractive index resin layer is 95 weight% or less with respect to the said whole high refractive index resin layer.
- the content of the fine particles contained in the high refractive index resin layer is more than 95% by weight, the ratio of the resin binder in the high refractive index resin layer is reduced, so that it is difficult to produce a sheet.
- the content of the fine particles contained in the low refractive index resin layer is preferably 40% by weight or more, more preferably 50% by weight or more, and 60% by weight with respect to the entire low refractive index resin layer. % Or more, more preferably 70% by weight or more, and most preferably 90% by weight or more.
- the content of the fine particles contained in the low refractive index resin layer is less than 40% by weight, the refractive index of the resin binder becomes dominant in the low refractive index resin layer, and the infrared reflection performance of the infrared shielding sheet is low. Become.
- fine-particles contained in the said low refractive index resin layer is 95 weight% or less with respect to the said whole low refractive index resin layer.
- the content of the fine particles contained in the low refractive index resin layer is more than 95% by weight, the resin binder in the low refractive index resin layer is reduced in proportion, so that it is difficult to produce a sheet.
- the content of the fine particles contained in the low refractive index resin layer is more than 95% by weight, when the fine particles contained in the low refractive index resin layer are electrically conductive fine particles, the fine particles are connected to each other. The radio wave transmission performance of the infrared shielding sheet is lowered.
- the surface resistance of the high refractive index resin layer and the low refractive index resin layer is preferably 1 k ⁇ / ⁇ (10 3 ⁇ / ⁇ ) or more, and preferably 10 k ⁇ / ⁇ (10 4 ⁇ / ⁇ ) or more. More preferably, it is more preferably 1000 k ⁇ / ⁇ (10 6 ⁇ / ⁇ ) or more.
- the surface resistance of the high refractive index resin layer and the low refractive index resin layer is lower than 1 k ⁇ / ⁇ , the infrared shielding sheet is difficult to transmit radio waves, which is not preferable.
- the maximum height difference (surface roughness) of the surfaces of the high refractive index resin layer and the low refractive index resin layer is preferably 70 nm or less, more preferably 60 nm or less, and 50 nm or less. More preferably it is. Dispersing the fine particles in the dispersion until the aggregated fine particles disappear, and then applying (coating) the dispersion to form the high refractive index resin layer and the low refractive index resin layer, the high refractive index resin layer and the The maximum height difference of each surface of the low refractive index resin layer can be set to a preferable maximum height difference.
- the high refractive index resin layer and the low refractive index resin layer have a surface roughness (maximum height difference of the surface) exceeding 70 nm, on the surfaces of the high refractive index resin layer and the low refractive index resin layer, The incident infrared light is scattered, and good reflection performance cannot be imparted to the infrared shielding sheet.
- the method for producing the infrared shielding sheet of the present invention preferably includes a step of forming the high refractive index resin layer and the low refractive index resin layer by coating.
- a coating liquid for forming a high refractive index resin layer and a low refractive index resin layer is coated on a support such as a transparent support by a coating method appropriately selected from known coating methods. It is preferable to manufacture by the method including the process of drying.
- the coating method of the coating solution is not particularly limited, and a coating apparatus such as a bar coater such as a wire bar coater, a spin coater, a die coater, a micro gravure coater, a comma coater, a spray coater, a roll coater, or a knife coater is used.
- a coating apparatus such as a bar coater such as a wire bar coater, a spin coater, a die coater, a micro gravure coater, a comma coater, a spray coater, a roll coater, or a knife coater is used.
- a coating suitable for thin film production such as a bar coater, a spin coater, a die coater, or a micro gravure coater is preferable. A method of using the device is preferred.
- a cholesteric liquid crystal film a birefringent multilayer film may be formed on the laminated film composed of the high refractive index resin layer and the low refractive index resin layer (or the sheet composed of the laminated film and the transparent support).
- functional layers such as an adhesive layer and a hard coat layer may be laminated to form an infrared shielding sheet.
- infrared absorbing dye, ultraviolet absorber, antioxidant Various additives such as a light stabilizer can be added.
- the laminated film includes an infrared absorbing dye, a cholesteric liquid crystal film, a birefringent multilayer film, etc. It is good also as an infrared shielding sheet combining a well-known material.
- the infrared absorbing dye preferably absorbs light having a wavelength of 780 nm to 2000 nm.
- the cholesteric liquid crystal film selectively reflects light having a wavelength of 780 nm to 2000 nm.
- the infrared absorbing dye is not particularly limited, and specifically, an infrared absorbing dye having an absorption maximum at a wavelength of 750 nm to 1100 nm, for example, a phthalocyanine dye, an anthraquinone dye, a dithiol dye, diimonium -Based dyes, anthraquinone-based dyes, squarylium-based dyes, naphthalocyanine-based dyes, aminium-based dyes, dithiol-metal complex-based dyes, etc. System dyes, triphenylmethane dyes, mercaptonaphthol dyes, and the like can be used.
- At least one of phthalocyanine dyes, naphthalocyanine dyes, and anthraquinone dyes is preferably used as the infrared absorbing dye.
- the molecular axes are aligned in a certain direction on one plane, but the direction of the molecular axis is slightly shifted on the next plane, and the angle is shifted on the next plane.
- This is a structure in which the angle of the molecular axis is successively shifted in the normal direction of the plane.
- Such a structure in which the direction of the molecular axis is twisted is called a chiral structure.
- the normal line (chiral axis) of the plane is preferably substantially parallel to the thickness direction of the cholesteric liquid crystal film (cholesteric liquid crystal layer).
- ⁇ c n ⁇ p ⁇ cos ⁇ (2) n 0 ⁇ p ⁇ cos ⁇ ⁇ ⁇ ⁇ n e ⁇ p ⁇ cos ⁇ (3) Equation (2) and (3), lambda c is the center wavelength of the wavelength range of light CLC layer for reflecting, n o is the minor axis direction of the refractive index of the molecules of the liquid crystal compound constituting the cholesteric liquid crystal film, n e represents the refractive index of the liquid crystal compound in the major axis direction, n represents (n o + n e ) / 2, and ⁇ represents the incident angle of light (angle from the surface normal).
- the center wavelength of the wavelength region of light reflected by the cholesteric liquid crystal film depends on the pitch length of the chiral structure in the cholesteric liquid crystal film.
- the pitch length of this chiral structure By changing the pitch length of this chiral structure, the center wavelength of the wavelength region of light reflected by the cholesteric liquid crystal film can be changed.
- the number of layers of the cholesteric liquid crystal film may be one or two or more. It is preferable that the number of cholesteric liquid crystal films is two or more because the infrared wavelength band that can be reflected by the cholesteric liquid crystal film can be expanded.
- the cholesteric liquid crystal film can reflect both the right circularly polarized light and the left circularly polarized light, and an effective reflectance can be realized.
- the cholesteric liquid crystal film has two or more layers, it is preferable to combine the cholesteric liquid crystal films having different pitch lengths and to further widen the wavelength range of the light reflected by the cholesteric liquid crystal film. By combining the films, light in a wider range of infrared wavelengths can be reflected with high efficiency.
- the combination of the number of layers, the right circularly polarized cholesteric liquid crystal film, the left circularly polarized cholesteric liquid crystal film, etc. an appropriate combination can be used in view of manufacturing cost, visible light transmittance, and the like.
- the cholesteric liquid crystal material for forming the cholesteric liquid crystal film it is preferable to use a curable liquid crystal composition.
- An example of the liquid crystal composition contains at least a rod-like liquid crystal compound, an optically active compound (chiral compound), and a polymerization initiator. Two or more of each component may be included.
- a polymerizable rod-like liquid crystal compound and a non-polymerizable rod-like liquid crystal compound can be used in combination.
- a low molecular rod-like liquid crystal compound and a polymer rod-like liquid crystal compound can be used in combination.
- the liquid crystal composition has a horizontal alignment agent, a non-uniformity inhibitor, a repellency inhibitor, and a polymerizability (which is neither a rod-like liquid crystal compound nor an optically active compound) in order to improve alignment uniformity, coating suitability, and film strength.
- You may contain at least 1 type chosen from various additives, such as a monomer (for example, monomer which has a (meth) acryl group).
- a polymerization inhibitor, an antioxidant, an ultraviolet absorber, a light stabilizer, a colorant, metal oxide fine particles, and the like are further added as necessary so as not to deteriorate the optical performance. can do.
- Rod-like liquid crystal compound is preferably a rod-like nematic liquid crystal compound.
- Preferred examples of the rod-like nematic liquid crystal compound include azomethines, azoxys, cyanobiphenyls, cyanophenyl esters, benzoic acid esters, cyclohexanecarboxylic acid phenyl esters, cyanophenylcyclohexanes, cyano-substituted phenylpyrimidines, phenyl Low molecular liquid crystal compounds and high molecular liquid crystal compounds such as dioxanes, tolanes, and alkenylcyclohexylbenzonitriles are included.
- the rod-like liquid crystal compound may be polymerizable or non-polymerizable.
- various documents for example, Y. Goto, et al., Mol. Cryst. Liq. Cryst., 1995, Vol. 260, pp. 23-28).
- the polymerizable rod-like liquid crystal compound can be obtained by introducing a polymerizable group into the rod-like liquid crystal compound.
- the polymerizable group include an unsaturated polymerizable group, an epoxy group, and an aziridinyl group.
- an unsaturated polymerizable group is preferable, and an ethylenically unsaturated polymerizable group is particularly preferable.
- the polymerizable group can be introduced into the molecule of the rod-like liquid crystal compound by various methods.
- the number of polymerizable groups possessed by the polymerizable rod-like liquid crystal compound is preferably 1 to 6, more preferably 1 to 3.
- Examples of the polymerizable rod-like liquid crystal compound include Makromol. Chem.
- the liquid crystal composition exhibits a cholesteric liquid crystal phase, and for that purpose, it preferably contains an optically active compound.
- the rod-like liquid crystal compound is a molecule having an asymmetric carbon atom
- a cholesteric liquid crystal film may be stably formed without adding an optically active compound.
- the optically active compound includes various known chiral agents (for example, Liquid Crystal Device Handbook, Chapter 3-4-3, TN, chiral agent for STN, 199 pages, edited by Japan Society for the Promotion of Science, 142nd Committee, 1989). ) Can be selected.
- the optically active compound generally contains an asymmetric carbon atom, but an axially asymmetric compound or a planar asymmetric compound that does not contain an asymmetric carbon atom can also be used as a chiral agent.
- the axial asymmetric compound or the planar asymmetric compound include binaphthyl, helicene, paracyclophane, and derivatives thereof.
- the optically active compound (chiral agent) may have a polymerizable group.
- the optically active compound is an optically active compound having a polymerizable group (polymerizable optically active compound) and the rod-shaped liquid crystal compound used in combination is also a rod-shaped liquid crystal compound having a polymerizable group (polymerizable rod-shaped liquid crystal compound)
- a polymer having a repeating unit derived from the rod-like liquid crystal compound and a repeating unit derived from the optically active compound can be formed by a polymerization reaction between the polymerizable optically active compound and the polymerizable rod-like liquid crystal compound.
- the polymerizable group possessed by the polymerizable optically active compound is preferably the same group as the polymerizable group possessed by the polymerizable rod-like liquid crystal compound.
- the polymerizable group of the optically active compound is also preferably an unsaturated polymerizable group, an epoxy group, or an aziridinyl group, more preferably an unsaturated polymerizable group, and an ethylenically unsaturated polymerizable group. It is particularly preferred.
- the optically active compound may be a liquid crystal compound.
- the amount of the optically active compound used in the liquid crystal composition is preferably 0.1 to 30 mole parts relative to 100 mole parts of the liquid crystal compound used in combination. A smaller amount of the optically active compound is preferable because it often does not affect the liquid crystal properties of the liquid crystal composition. Therefore, the optically active compound used as the chiral agent is preferably a compound having a strong twisting force so that a twisted orientation with a desired helical pitch can be achieved even with a small amount. Examples of such a chiral agent exhibiting a strong twisting force include the chiral agents described in JP-A No. 2003-287623, and such a chiral agent can be preferably used.
- the liquid crystal composition used for forming the cholesteric liquid crystal film (light reflecting layer) is preferably a polymerizable liquid crystal composition, and for that purpose, it preferably contains a polymerization initiator.
- the polymerization initiator used is preferably a photopolymerization initiator that can start the polymerization reaction by ultraviolet irradiation.
- the photopolymerization initiator is not particularly limited.
- the content of the photopolymerization initiator in the polymerizable liquid crystal composition is not particularly limited, but with respect to 100 parts by weight of the total amount of the polymerizable liquid crystal compound and the polymerizable monomer used as necessary.
- the amount is preferably 0.5 parts by weight or more, more preferably 10 parts by weight or less, more preferably 2 parts by weight or more, and more preferably 8 parts by weight or less.
- reaction aid is not particularly limited, and for example, triethanolamine, methyldiethanolamine, triisopropanolamine, n-butylamine, N-methyldiethanolamine, diethylaminoethyl methacrylate, Michler's ketone, 4,4′-bis (diethylamino) benzophenone.
- amine compounds such as ethyl 4-dimethylaminobenzoate, (2-n-butoxy) ethyl 4-dimethylaminobenzoate, and isoamyl 4-dimethylaminobenzoate.
- the content of the reaction aid in the polymerizable liquid crystal composition is not particularly limited, but is preferably in a range that does not affect the liquid crystal properties of the polymerizable liquid crystal composition, and the polymerizable liquid crystal compound, It is preferably 0.5 parts by weight or more, preferably 10 parts by weight or less, and preferably 2 parts by weight or more, based on 100 parts by weight of the total amount of the polymerizable monomers used as necessary. More preferably, it is more preferably 8 parts by weight or less.
- the content of the reaction aid is preferably 0.5 to 2 times based on the weight of the photopolymerization initiator.
- the polymerizable liquid crystal composition includes a leveling agent, an antifoaming agent, an ultraviolet absorber, a light stabilizer, an antioxidant, a polymerization inhibitor, a crosslinking agent, a plasticizer, an inorganic fine particle, and a filler as necessary. It is also possible to add desired functionality.
- Examples of the leveling agent include fluorine compounds, silicone compounds, acrylic compounds, and the like.
- Examples of the antifoaming agent include silicone-based antifoaming agents, fluorine-based antifoaming agents, and polymer-based antifoaming agents.
- Examples of the ultraviolet absorber include benzotriazole compounds, benzophenone compounds, and triazine compounds.
- Examples of the light stabilizer include hindered amine compounds and benzoate compounds.
- Examples of the antioxidant include phenolic compounds.
- polymerization inhibitor examples include methoquinone, methylhydroquinone, hydroquinone and the like.
- examples of the crosslinking agent include polyisocyanates and melamine compounds.
- plasticizer examples include phthalic acid esters such as dimethyl phthalate and diethyl phthalate; trimellitic acid esters such as tris (2-ethylhexyl) trimellitate; and aliphatic dibasic acid esters such as dimethyl adipate and dibutyl adipate; Examples thereof include orthophosphate esters such as tributyl phosphate and triphenyl phosphate; acetate esters such as glycerol triacetate and 2-ethylhexyl acetate.
- examples of the inorganic fine particles include zinc antimonate fine particles, gallium-doped zinc oxide fine particles, aluminum-doped zinc oxide fine particles, tin oxide fine particles, antimony-doped tin oxide fine particles, phosphorus-doped tin oxide fine particles, and tin-doped indium oxide fine particles.
- metal oxide fine particles for adjusting the refractive index such as titanium oxide fine particles and zirconium oxide fine particles.
- examples of the filler include silica particles, acrylic beads, urethane beads and the like having an average particle size on the order of microns.
- the coating method for forming the cholesteric liquid crystal film is not particularly limited, and is a bar coater such as a wire bar coater, spin coater, die coater, micro gravure coater, comma coater, spray coater, roll coater, knife coater, etc.
- a bar coater such as a wire bar coater, spin coater, die coater, micro gravure coater, comma coater, spray coater, roll coater, knife coater, etc.
- a method using a coating apparatus suitable for thin film production such as a bar coater, a spin coater, a die coater, or a micro gravure coater is preferable. .
- the surface of the substrate (multilayer film, transparent support, etc.) on which the cholesteric liquid crystal film is formed may be aligned.
- the birefringent multilayer film includes a layer having birefringence (preferably positive birefringence) (hereinafter referred to as “birefringent layer”) and a layer having isotropic refraction or negative birefringence (hereinafter referred to as “isotropic refraction”).
- Birefringent layer a layer having birefringence (preferably positive birefringence)
- isotropic refraction preferably negative birefringence
- the birefringent multilayer film is based on the refractive index difference between the birefringent layer and the isotropic refractive layer and the coherent interference caused by the respective geometric thickness.
- the in-plane refractive index is different between the birefringent layer and the isotropic refractive layer, the boundary surface between the two layers forms a reflective surface.
- Birefringence means that at least two of the refractive indexes in the x-axis direction, the y-axis direction, and the z-axis direction orthogonal to each other are different from each other.
- the x-axis and y-axis are in the plane of the birefringent layer, the z-axis is perpendicular to the plane of the birefringent layer, and the birefringent layer is composed of an oriented polymer, the x-axis direction has the maximum refractive index. Is selected to be an in-plane direction having a direction that corresponds to one of the directions in which the oriented polymer is oriented (eg, stretched).
- the in-plane refractive indices of both the birefringent and isotropic refractive layers are different between layers (ie, n 1x ⁇ n 2x and n 1y ⁇ n 2y ; where n 1x and n 1y are x In-plane refractive indexes in the axial direction and the y-axis direction, and n 2x and n 2y represent in-plane refractive indexes in the x-axis direction and the y-axis direction of the isotropic refractive layer).
- the reflection of p-polarized light does not depend on the incident angle of light, and thus the reflectance is uniform over the range of viewing angles, which is preferable. .
- a birefringent polymer (preferably a birefringent polymer having positive birefringence) that is at least uniaxially or preferably biaxially oriented is used as the birefringent layer.
- the difference in refractive index between the birefringent layer and the isotropic refractive layer can be increased.
- Each of the optical thickness of the birefringent layer and the isotropic refractive layer if these layers and a central wavelength lambda c of the wavelength region of light to be reflected, and is controlled such that the lambda c / 4.
- the total optical thickness of the birefringent layer and the isotropic refractive layer is ⁇ c / 2 (or a multiple of ⁇ c )
- the birefringent layer and the isotropic refractive layer have different optical thicknesses. You may have.
- the birefringent layer As a material constituting the birefringent layer, a material that is oriented by stretching (positive birefringence) is used, and for example, PEN (polyethylene naphthalate), PET, or the like is used. As a material constituting the isotropic refracting layer, a material that is not oriented even by stretching (or a material that is negatively birefringent by stretching) is used. For example, PMMA (polymethyl methacrylate) or the like is used.
- the birefringent multilayer structure material can be produced by forming a multilayer film by, for example, a co-extrusion method described in JP-T-2008-528313 and stretching it.
- the number of laminated layers (total number of layers) of the birefringent layer and the isotropic refractive layer is preferably 3 layers or more and 1000 layers or less in view of the wavelength region to be reflected, the manufacturing cost, and the like.
- the interlayer film for laminated glass of the present invention comprises the infrared shielding sheet of the present invention and an interlayer film formed on at least one outermost layer of the infrared shielding sheet.
- the intermediate film for laminated glass of the present invention includes first and second intermediate films respectively formed on both outermost layers of the infrared shielding sheet of the present invention. preferable.
- the interlayer film for laminated glass of the present invention preferably contains a second interlayer film in addition to the first interlayer film.
- the first and second interlayer films on both sides of the infrared shielding sheet have the same film thickness, but the present invention is limited to such an interlayer film for laminated glass.
- an interlayer film for laminated glass in which the thicknesses of the first and second interlayer films are different can be used.
- the compositions of the first and second intermediate films may be the same or different.
- the heat shrinkage ratio before and after the step of pressure bonding the interlayer film for laminated glass including the first and second interlayer films is preferably 1 to 20% in the range of the heating temperature at that time. It is more preferably 15%, particularly preferably 2 to 10%.
- the thickness of the first and second interlayer films is preferably 100 to 1000 ⁇ m, more preferably 200 to 800 ⁇ m, and particularly preferably 300 to 500 ⁇ m. Further, the first and second intermediate films may be thickened by overlapping a plurality of sheets.
- the elongation at break by a tensile test is preferably 100 to 800%, more preferably 100 to 600%, and more preferably 200 to 500%. It is particularly preferred.
- the intermediate film preferably contains polyvinyl butyral.
- the first and second intermediate films are preferably resin intermediate films.
- the resin intermediate film is preferably a polyvinyl acetal resin film containing a polyvinyl acetal resin as a main component.
- the polyvinyl acetal resin film is not particularly limited, and those described in, for example, JP-A-6-000926 and JP-A-2007-008797 can be preferably used.
- a polyvinyl butyral resin film (polyvinyl butyral film) is preferably used.
- the polyvinyl butyral resin film is not particularly defined as long as it is a resin film mainly composed of polyvinyl butyral, and a polyvinyl butyral resin film that is widely used for an interlayer film for laminated glass can be employed.
- the intermediate film is preferably a resin intermediate film mainly composed of polyvinyl butyral or a resin intermediate film mainly composed of ethylene vinyl acetate, and a resin intermediate film mainly composed of polyvinyl butyral.
- resin which is a main component means resin which occupies the ratio of 50 mass% or more of the said resin intermediate film.
- the first and second intermediate films may contain an additive within a range not departing from the gist of the present invention.
- the additive include fine particles for heat ray shielding, fine particles for sound insulation, and a plasticizer.
- the heat ray shielding fine particles and the sound insulation fine particles include inorganic fine particles and metal fine particles.
- the fine particles are preferably dispersed in an intermediate film, preferably an intermediate film made of polyvinyl butyral (hereinafter abbreviated as “PVB”).
- the fine particles may be added to an intermediate film in an appropriate capsule, or may be added to the intermediate film together with a dispersant.
- the amount of fine particles added when the first and second interlayer films contain a resin component is not particularly limited, but is preferably 0.1 to 10 parts by weight with respect to 100 parts by weight of the resin component.
- inorganic fine particles examples include calcium carbonate fine particles, alumina fine particles, kaolin clay, calcium silicate fine particles, magnesium oxide fine particles, magnesium hydroxide fine particles, aluminum hydroxide fine particles, magnesium carbonate fine particles, talc powder, feldspar powder, mica powder, barite powder, Examples thereof include barium carbonate fine particles, titanium oxide fine particles, silica fine particles, and glass beads. These may be used alone or in combination.
- the heat ray shielding fine particles include tin-doped indium oxide (ITO) fine particles, antimony-doped tin oxide (ATO) fine particles, aluminum-doped zinc oxide (AZO) fine particles, indium-doped zinc oxide (IZO) fine particles, tin-doped zinc oxide fine particles, silicon.
- Examples of the light shielding agent include carbon black and red iron oxide.
- As the pigment four kinds of black pigment carbon black, red pigment (CI Pigment Red), blue pigment (CI Pigment Blue), and yellow pigment (CI Pigment Yellow) are mixed. And dark reddish-brown mixed pigments.
- the plasticizer is not particularly limited, and a known plasticizer generally used as a plasticizer for this kind of intermediate film can be used.
- the plasticizer include triethylene glycol-di-2-ethylbutyrate (3GH), triethylene glycol-di-2-ethylhexanoate (3GO), triethylene glycol-di-n-heptanoate (3G7). ), Tetraethylene glycol-di-2-ethylhexanoate (4GO), tetraethylene glycol-di-n-heptanoate (4G7), oligoethylene glycol-di-2-ethylhexanoate (NGO), etc. Used.
- these plasticizers are generally in the range of 25 to 70 parts by mass with respect to 100 parts by mass of the resin (preferably polyvinyl acetal resin) as the main component of the resin intermediate film. Used in
- the method for producing the interlayer film for laminated glass of the present invention preferably includes a step of thermally bonding the interlayer film and the infrared shielding sheet after sequentially laminating the infrared shielding sheet of the present invention and the interlayer film.
- thermal bonding There are no particular restrictions on the method of thermal bonding, and it is possible to apply heat-pressing to a laminated body of an infrared shielding sheet / intermediate film (in which an intermediate film is laminated on an infrared shielding sheet) or heating by laser irradiation. Thermal fusion or the like can be employed.
- the step of thermally bonding the infrared shielding sheet to the interlayer film is a step of thermocompression bonding the infrared shielding sheet to the interlayer film (thermocompression bonding process). It is preferable that
- the method of thermocompression bonding is not particularly limited, but for example, a method of pressing a heating body at 80 to 140 ° C. against the infrared shielding sheet / interlayer laminate is preferable.
- the heating body may be a flat heating body, a curved heating body, or a roller.
- a plurality of heating rollers, a heatable flat pressing surface, or the like can be used, and these may be used in combination.
- the thermocompression bonding may be performed on both surfaces of the infrared shielding sheet / intermediate film laminate or only on one surface, in which case one of the rollers used for thermocompression bonding is heated. There may be no roller, pinching surface or the like.
- thermocompression bonding step it is preferable to use a heating roller in the thermocompression bonding step, and it is more preferable to use a combination of a heating roller and a non-heating roller.
- the surface of the intermediate film is roughened by embossing or the like so that air can easily escape during sticking.
- the bonded surface becomes smooth following the adherend surface and the optical performance is improved.
- the other surface needs to maintain a rough surface state for bonding to a glass plate or the like. Therefore, it is preferable that the surface of the roller on the side in contact with the intermediate film in the thermocompression-bonding roller is roughened to maintain the roughened state of the intermediate film. That is, it is preferable to laminate so that at least one surface of the intermediate film is embossed and the embossed surface is in contact with the infrared shielding sheet of the present invention. Further, after thermocompression bonding, the surface of the intermediate film that is not in contact with the infrared shielding sheet may be actively embossed.
- the transparent support used at the time of producing the infrared shielding sheet may be peeled before and after the thermal bonding step, or may be part of the interlayer film for laminated glass without being peeled off.
- the method for producing the interlayer film for laminated glass of the present invention preferably includes a step of laminating the second interlayer film on the opposite surface of the infrared shielding sheet on which the first interlayer film is laminated. That is, the interlayer film for laminated glass of the present invention preferably has a second interlayer film in addition to the first interlayer film.
- the intermediate film for glass according to an example of the present invention as shown in FIG. 5, the infrared shielding sheet 2 according to the present invention, the first intermediate film 3 formed on one surface of the infrared shielding sheet 2, And a second intermediate film 3 ′ formed on the other surface of the infrared shielding sheet 2.
- the infrared shielding sheet 2 and the second intermediate film 3 ′ may be adjacent to each other and may include other constituent layers therebetween, but the infrared shielding sheet 2 and the second intermediate film 3 ′ may be included. Are preferably adjacent to each other.
- These second intermediate film and other constituent layers are preferably thermocompression bonded to the infrared shielding sheet by the same method as the thermocompression bonding process between the first intermediate film and the infrared shielding sheet.
- the intermediate film for laminated glass including the infrared shielding sheet and the intermediate film may be cut with a blade, or may be cut with a laser, a water jet, or heat.
- the laminated glass of the present invention has the interlayer film for laminated glass of the present invention and a plurality of glass plates (two glass plates), and the laminated glass is between the plurality of glass plates (at least two glass plates). An interlayer film for glass is inserted. Moreover, the laminated glass of this invention can be preferably cut
- the window member of the present invention includes the laminated glass of the present invention.
- the method for laminating the interlayer film for laminated glass with the first glass plate and the second glass plate is not particularly limited, and can be laminated by inserting between two glass plates by a known method.
- the laminated glass of the laminated body in which the interlayer film for laminated glass is sandwiched between the two glass sheets has a configuration in which glass sheet / first interlayer film / infrared shielding sheet / second interlayer film / glass sheet are laminated in this order. Become.
- FIG. 6 is a schematic view showing an example of the structure of a laminated glass including an interlayer film for laminated glass sandwiched between glass plates according to the present invention.
- a laminated glass according to an example of the present invention includes a laminated glass intermediate film (first intermediate film 3, infrared shielding sheet 2, and second intermediate film 3 ′) shown in FIG. 5 and a plurality of glass plates 5 and 5. ', The laminated glass between the glass plates 5 and 5' so that the glass plate 5 is adjacent to the first intermediate film 3 and the glass plate 5 'is adjacent to the first intermediate film 3. An intermediate film is inserted.
- the end of the infrared shielding sheet 2 may be inside the ends of the glass plates 5 and 5 ′ and the ends of the first intermediate film 3 and the second intermediate film 3 ′. Further, the end portions of the glass plates 5 and 5 ′ and the end portions of the first intermediate film 3 and the second intermediate film 3 ′ may be at the same position, or one of them may protrude.
- the laminated glass in which the glass intermediate films (laminated body of the first intermediate film 3, the infrared shielding sheet 2, and the second intermediate film 3 ′) are sandwiched between the glass plates 5 and 5 ′ is shown in FIG.
- the edge part of the infrared shielding sheet 2 may exist in the same position as the edge part of the glass plates 5 and 5 ', and the edge part of intermediate film 3 and 3'.
- the laminated glass may have a configuration in which the end of the infrared shielding sheet 2 protrudes beyond the ends of the glass plates 5 and 5 ′ and the ends of the first intermediate film 3 and the second intermediate film 3 ′. Good.
- the infrared shielding sheet 2 and the first intermediate may be adjacent to each other, or may have other constituent layers between them.
- the glass plate may be a glass having no curvature or a curved glass.
- the two glass plates that sandwich the interlayer film for laminated glass may have different thicknesses or may be colored.
- a colored component such as metal is contained in the glass plate so that the visible light transmittance of the laminated glass does not fall below 70% defined in JIS R 3211.
- heat shielding properties can be effectively improved by using green glass for the glass plate.
- concentration suitable for the objective by adjusting the quantity of the metal component to add or adjusting thickness.
- the method for producing the laminated glass of the present invention preferably includes a step of pressure bonding while heating the interlayer film for laminated glass of the present invention sandwiched between glass plates.
- the glass interlayer of the present invention sandwiched between glass plates is bonded to the glass plate by, for example, pre-pressing with a vacuum bag or the like under reduced pressure at a temperature of 80 to 120 ° C. for 30 to 60 minutes, and then autoclave.
- the laminated glass is laminated at a temperature of 120 to 150 ° C. under a pressure of 1.0 to 1.5 MPa, and a glass intermediate film is sandwiched between two glass plates.
- thermocompression bonding there is no particular limitation on the method of cooling, and it may be cooled while releasing the pressure as appropriate to obtain laminated glass.
- the method for producing a laminated glass of the present invention preferably includes a step of releasing the pressure after the temperature is lowered while the pressure is maintained. Specifically, it is preferable to lower the temperature by releasing the pressure after the temperature in the autoclave becomes 40 ° C. or lower after the temperature is lowered while maintaining the pressure.
- Example 1 (Preparation of high refractive index resin layer A) Dipentaerythritol hexaacrylate (trade name “KAYARAD DPHA”, manufactured by Nippon Kayaku Co., Ltd .; hereinafter simply referred to as “KAYARAD DPHA”) as a resin binder and 1-hydroxycyclohexyl phenyl ketone (trade name “ "Irgacure 184", photopolymerization initiator, manufactured by BASF Japan Ltd .; hereinafter 0.05 part is simply dissolved in 4 parts of methyl ethyl ketone (hereinafter abbreviated as "MEK”) as a solvent.
- MEK methyl ethyl ketone
- Zirconium oxide fine particles (trade name “NANON5 ZR-010”, average primary particle size 7-8 nm, average dispersed particle size 15 nm, solid content concentration 30% by weight, manufactured by Solar Co., Ltd., dispersion medium: MEK) 4 .7 parts are dispersed, and a high refractive index for forming the high refractive index resin layer A Fat coating solution A (dispersion obtained by dispersing fine particles with dissolving the resin binder in the solvent) was prepared.
- the high refractive index resin coating solution A was applied to a PET substrate with a wire bar coater, and the MEK was evaporated by drying at 100 ° C. for 2 minutes, followed by irradiation with ultraviolet rays (hereinafter abbreviated as “UV”).
- UV ultraviolet rays
- the refractive index of the prepared high refractive index resin layer A at a wavelength of 550 nm and a wavelength of 1200 nm was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.). A value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced high refractive index resin layer A was measured using a surface resistance meter (trade name “HIRESTA UP” and trade name “LORESTA GP” manufactured by Mitsubishi Chemical Analytech Co., Ltd.).
- Tin-doped indium oxide fine particles (trade name “ITO-R”, manufactured by CIK Nanotech Co., Ltd.), which are non-hollow fine particles having an average primary particle diameter of 25.6 nm and a powder resistance of 0.8 ⁇ ⁇ cm when compressed at 60 MPa.
- the low refractive index resin coating solution A was applied to a PET substrate with a wire bar coater, and the toluene was evaporated by drying at 100 ° C. for 2 minutes, and then a low refractive index resin layer A was produced by UV irradiation. .
- the content of the fine particles contained in the low refractive index resin layer A is 65% by weight with respect to the entire low refractive index resin layer A.
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced low refractive index resin layer A was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.).
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced low refractive index resin layer A was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A.
- the wavelength of light reflected by the laminated film is set to 1200 nm, the optical thickness of each high refractive index resin layer A at a wavelength of 1200 nm is 300 nm, and the optical thickness of each low refractive index resin layer A at a wavelength of 1200 nm is 300 nm.
- the low refractive index resin on a 100 ⁇ m-thick PET base material (trade name “Cosmo Shine A4100” manufactured by Toyobo Co., Ltd .; hereinafter simply referred to as “PET base material” as appropriate)
- PET base material used as appropriate
- the low refractive index resin layer A and the high refractive index resin layer A are alternately laminated in the order of layer A-high refractive index resin layer A (that is, the order in which the low refractive index resin layer A contacts the PET substrate).
- An infrared shielding sheet according to an example of the present invention in which the total number of layers of the refractive index resin layer and the low refractive index resin layer was 8 was produced.
- Each low refractive index resin layer A is prepared by the method described in “Preparation of low refractive index resin layer A”, and each high refractive index resin layer A is prepared by the method described in “Preparation of high refractive index resin layer A”. did.
- Example 2 (Preparation of high refractive index resin layer B) Titanium oxide fine particles having an average primary particle diameter of 35 nm (trade name “TTO-51A”, manufactured by Ishihara Sangyo Co., Ltd.) 1.4 parts, KAYARAD DPHA 0.4 parts, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one ("Irgacure 907" manufactured by BASF Japan Ltd.) 0.05 part and a dispersant (trade name "DISPERBYK-2001” manufactured by Big Chemie Japan Co., Ltd.) 0.3 part In addition to 7 parts of toluene, it was dispersed at a peripheral speed of 10 m / s using a bead mill to prepare a high refractive index resin coating solution B for forming a high refractive index resin layer B. The average dispersed particle size of the titanium oxide fine particles was 45 nm.
- the high refractive index resin coating solution B was applied to a PET base material with a wire bar coater and dried at 100 ° C. for 2 minutes to evaporate toluene, and then a high refractive index resin layer B was produced by UV irradiation. .
- the content of the fine particles contained in the high refractive index resin layer B is 65% by weight with respect to the entire high refractive index resin layer B.
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced high refractive index resin layer B was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.).
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced high refractive index resin layer B was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A in Example 1.
- the wavelength of light reflected by the laminated film is set to 1200 nm
- the optical thickness of each high refractive index resin layer B at a wavelength of 1200 nm is 300 nm
- the optical thickness of each low refractive index resin layer A at a wavelength of 1200 nm is 300 nm.
- the order of high refractive index resin layer B-low refractive index resin layer A (that is, the high refractive index resin layer B is a PET group) on the same PET substrate used for the production of the laminated film of Example 1
- the high refractive index resin layer B and the low refractive index resin layer A are alternately stacked in the order of contact with the material, and the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 7.
- the infrared shielding sheet which concerns on an Example was produced.
- Each high refractive index resin layer B is prepared in the same manner as in “Preparation of high refractive index resin layer B” in this example, and each low refractive index resin layer A is prepared in “Preparation of low refractive index resin layer A” in Example 1. It was produced in the same manner as above.
- Example 3 (Preparation of high refractive index resin layer C) Lanthanum hexaboride fine particles (manufactured by Wako Pure Chemical Industries, Ltd., average primary particle size of 1 to 2 ⁇ m) 1.4 parts, KAYARAD DPHA 0.4 parts, Irgacure 184 0.05 parts, and aminoalkyl methacrylate copolymer dispersant 0 3 parts were added to 7 parts of toluene and dispersed using a bead mill at a peripheral speed of 10 m / s.
- Lanthanum hexaboride fine particles manufactured by Wako Pure Chemical Industries, Ltd., average primary particle size of 1 to 2 ⁇ m
- KAYARAD DPHA KAYARAD DPHA
- Irgacure 184 0.05 parts Irgacure 184 0.05 parts
- aminoalkyl methacrylate copolymer dispersant 0 3 parts were added to 7 parts of toluene and dispersed using a
- a coating solution C was prepared.
- the average dispersed particle size of the lanthanum hexaboride fine particles was 35 nm.
- the high refractive index resin coating solution C was applied to a PET substrate with a wire bar coater, and the toluene was evaporated by drying at 100 ° C. for 2 minutes, and then a high refractive index resin layer C was produced by UV irradiation. .
- the content of the fine particles contained in the high refractive index resin layer C is 65% by weight with respect to the entire high refractive index resin layer C.
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced high refractive index resin layer C was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.).
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced high refractive index resin layer C was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A in Example 1.
- the wavelength of light reflected by the laminated film is set to 1200 nm
- the optical thickness of the high refractive index resin layer C at a wavelength of 1200 nm is 300 nm
- the optical thickness of each high refractive index resin layer A at a wavelength of 1200 nm is 300 nm
- High refractive index resin layer C in the order of resin layer A-high refractive index resin layer A-low refractive index resin layer A-high refractive index resin layer A (the order in which high refractive index resin layer C contacts the PET substrate).
- Infrared shielding according to an embodiment of the present invention in which the low refractive index resin layer A and the high refractive index resin layer A are laminated, and the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 5. A sheet was produced.
- the high refractive index resin layer C is prepared in the same manner as “Preparation of the high refractive index resin layer C” in this example, and each low refractive index resin layer A is “Preparation of the low refractive index resin layer A” in Example 1.
- Each high-refractive index resin layer A was prepared in the same manner as in “Preparation of high-refractive index resin layer A” in Example 1.
- Example 4 Preparation of high refractive index resin layer D
- “Preparation of high refractive index resin layer B” in Example 2 except that nanodiamonds (diamond fine particles having an average primary particle size of 3.5 nm and an average dispersed particle size of 4.5 nm) were used instead of titanium oxide fine particles as fine particles.
- a high refractive index resin layer D was produced.
- the content of the fine particles contained in the high refractive index resin layer D is 65% by weight with respect to the entire high refractive index resin layer D.
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced high refractive index resin layer D was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.). A value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced high refractive index resin layer D was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A in Example 1.
- the wavelength of light reflected by the laminated film is set to 1200 nm
- the optical thickness of each high refractive index resin layer D at a wavelength of 1200 nm is 300 nm
- the optical thickness of each low refractive index resin layer A at a wavelength of 1200 nm is 300 nm.
- the order of low refractive index resin layer A-high refractive index resin layer D (that is, low refractive index resin layer A is a PET group) on the same PET substrate used for the production of the laminated film of Example 1
- the low refractive index resin layer A and the high refractive index resin layer D are alternately laminated in the order of contact with the material, and the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 8.
- the infrared shielding sheet which concerns on an Example was produced.
- Each low refractive index resin layer A is prepared in the same manner as “Preparation of low refractive index resin layer A” in Example 1, and each high refractive index resin layer D is “Preparation of high refractive index resin layer D” in this example. It was produced in the same manner as above.
- Example 5 (Preparation of low refractive index resin layer B) To the low refractive index resin coating liquid A prepared by the method described in “Preparation of Low Refractive Index Resin Layer A” in Example 1, hollow silica fine particles (trade name “Thruria 1110”, average primary particle size 50 nm, solid concentration) A low refractive index resin coating solution B for forming the low refractive index resin layer A was prepared by adding 3 parts by weight of 20% by weight, manufactured by JGC Catalysts & Chemicals, Inc., dispersion medium: methyl isobutyl ketone).
- the low refractive index resin coating solution B is applied to a PET substrate with a wire bar coater and dried at 100 ° C. for 2 minutes to evaporate toluene and methyl isobutyl ketone. B was produced.
- the content of the fine particles contained in the low refractive index resin layer B is 73% by weight with respect to the entire low refractive index resin layer B.
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced high refractive index resin layer B was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.).
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced low refractive index resin layer B was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A in Example 1.
- the wavelength of light reflected by the laminated film is set to 1200 nm
- the optical thickness of each high refractive index resin layer A at a wavelength of 1200 nm is 300 nm
- the optical thickness of each low refractive index resin layer B at a wavelength of 1200 nm is 300 nm.
- the order of low refractive index resin layer B-high refractive index resin layer A (that is, low refractive index resin layer B is a PET group) on the same PET substrate used for the production of the laminated film of Example 1
- the low refractive index resin layer B and the high refractive index resin layer A are alternately stacked in the order of contact with the material, and the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 8.
- the infrared shielding sheet which concerns on an Example was produced.
- Each low refractive index resin layer B is prepared in the same manner as “Preparation of low refractive index resin layer B” in this example, and each high refractive index resin layer A is “Preparation of high refractive index resin layer A” in Example 1. It was produced in the same manner as above.
- Example 6 Infrared absorbing dye synthesis example, To 120 parts of sulfolane, 15.9 parts of naphthalic anhydride, 29 parts of urea, 0.40 part of ammonium molybdate, and 3.5 parts of vanadyl chloride (V) are added, and the mixture is heated to 200 ° C. The reaction was carried out at the same temperature for 11 hours. After completion of the reaction, the reaction mixture was cooled to 65 ° C., 100 parts of N, N-dimethylformamide (hereinafter abbreviated as “DMF”) was added, and the precipitated solid was separated by filtration. The obtained solid was washed with 50 parts of DMF to obtain 20.3 parts of a wet cake.
- DMF N, N-dimethylformamide
- the obtained wet cake was added to 100 parts of DMF, heated to 80 ° C., and stirred at the same temperature for 2 hours.
- the precipitated solid was separated by filtration and washed with 200 parts of water to obtain 18.9 parts of a wet cake.
- the obtained wet cake was added to 150 parts of water, heated to 90 ° C., and stirred at the same temperature for 2 hours.
- the precipitated solid was separated by filtration and washed with 200 parts of water to obtain 16.1 parts of a wet cake.
- the obtained wet cake was dried at 80 ° C. to obtain 12.3 parts of an infrared absorbing dye.
- the high refractive index resin coating solution E was applied to a PET substrate with a wire bar coater, and the toluene was evaporated by drying at 100 ° C. for 2 minutes, and then a high refractive index resin layer E was produced by UV irradiation. .
- the content of the fine particles contained in the high refractive index resin layer E is 76% by weight with respect to the entire high refractive index resin layer E.
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced high refractive index resin layer E was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.).
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced high refractive index resin layer E was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A in Example 1.
- the low refractive index resin coating liquid C was applied to a PET base material with a wire bar coater, and the toluene was evaporated by drying at 100 ° C. for 2 minutes, and then a low refractive index resin layer C was produced by UV irradiation. .
- the content of the fine particles contained in the low refractive index resin layer C is 66% by weight with respect to the entire low refractive index resin layer C.
- the refractive index of the produced low refractive index resin layer C at a wavelength of 550 nm and a wavelength of 1200 nm was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.).
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced low refractive index resin layer C was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A in Example 1.
- the wavelength of light reflected by the laminated film is set to 1200 nm
- the optical thickness of each high refractive index resin layer E at a wavelength of 1200 nm is 300 nm
- the optical thickness of each low refractive index resin layer C at a wavelength of 1200 nm is 300 nm.
- the order of low refractive index resin layer C-high refractive index resin layer E (that is, low refractive index resin layer C is a PET group) on the same PET substrate used for the production of the laminated film of Example 1
- the low refractive index resin layer C and the high refractive index resin layer E are alternately laminated in the order of contact with the material, and the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 8.
- the infrared shielding sheet which concerns on an Example was produced.
- Each low refractive index resin layer C is prepared in the same manner as “Preparation of low refractive index resin layer C” in this example, and each high refractive index resin layer E is “Preparation of high refractive index resin layer E” in this example. It was produced in the same manner as above.
- Example 7 (Cholesteric liquid crystal film production) LC-242 (rod-like liquid crystal compound, manufactured by BASF Japan Ltd.) 10 parts, LC-756 (chiral agent, manufactured by BASF Japan Ltd.) 0.25 parts, and 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide 0.5 part (trade name “Lucirin TPO”, polymerization initiator, manufactured by BASF Japan Ltd.) was added to 26 parts of cyclopentanone to prepare liquid crystal coating liquid A.
- a liquid crystal coating liquid B was prepared in the same manner as the liquid crystal coating liquid A except that the amount of LC-756 in the liquid crystal film coating liquid A was changed to 0.3 part.
- liquid crystal coating liquid A By applying the liquid crystal coating liquid A to the same PET base material used in the production of the laminated film of Example 1 with a wire bar coater so that the geometric thickness is 4 ⁇ m, and drying at 130 ° C. for 2 minutes. After evaporating cyclopentanone, a first cholesteric liquid crystal film was produced by UV irradiation. Further, after the liquid crystal coating liquid B was applied to the first cholesteric liquid crystal film with a wire bar coater so as to have a geometric thickness of 4 ⁇ m, and dried at 130 ° C. for 2 minutes to evaporate cyclopentanone. A second cholesteric liquid crystal film was prepared by UV irradiation.
- the wavelength of light reflected by the laminated film is set to 1200 nm
- the optical thickness of each high refractive index resin layer A at a wavelength of 1200 nm is 300 nm
- the optical thickness of each low refractive index resin layer A at a wavelength of 1200 nm is 300 nm.
- the low refractive index resin in the order of the low refractive index resin layer A-the high refractive index resin layer A (that is, the order in which the low refractive index resin layer A comes into contact with the PET base material) is formed on the cholesteric liquid crystal film.
- Each low refractive index resin layer A is prepared by the method described in “Preparation of Low Refractive Index Resin Layer A” in Example 1, and each high refractive index resin layer A is formed of “High Refractive Index Resin Layer A” in Example 1. It was produced by the method described in “Production”.
- Example 8 Infrared shielding sheet according to one embodiment of the present invention, except that a birefringent multilayer film (trade name “Nano90S”, manufactured by Sumitomo 3M Limited) is used in place of the two-layer cholesteric liquid crystal film.
- a birefringent multilayer film (trade name “Nano90S”, manufactured by Sumitomo 3M Limited) is used in place of the two-layer cholesteric liquid crystal film.
- Example 9 Tin-doped indium oxide fine particles (trade name “ITO-R”, manufactured by CIK Nanotech Co., Ltd.) 1 which is a non-hollow fine particle having an average primary dispersion particle diameter of 25.6 nm and a powder resistance of 0.8 ⁇ ⁇ cm when compressed at 60 MPa.
- ITO-R Tin-doped indium oxide fine particles
- KAYARAD DPHA 0.04 parts 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide (trade name “Lucirin TPO”, photopolymerization initiator, manufactured by BASF Japan Ltd.) 0.01 parts, amino Alkyl methacrylate copolymer dispersant (trade name “DISPERBYK-167”, manufactured by Big Chemie Japan Co., Ltd.) 0.06 part, 1-methoxy-2-propanol (hereinafter referred to as “PGM”) as a solvent
- PGM 1-methoxy-2-propanol
- it is dispersed at a peripheral speed of 10 m / s using a bead mill to form a low refractive index resin layer D.
- a low refractive index resin coating solution D was prepared.
- the average dispersed particle diameter of the tin-doped indium oxide fine particles was 40 nm.
- the low refractive index resin coating solution D was applied to a PET substrate with a wire bar coater, and PGM was evaporated by drying at 100 ° C. for 2 minutes, and then a low refractive index resin layer D was produced by UV irradiation. .
- the content of the fine particles contained in the low refractive index resin layer D is 93% by weight with respect to the entire low refractive index resin layer D.
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced low refractive index resin layer D was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.).
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced low refractive index resin layer D was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A.
- the wavelength of light reflected by the laminated film is set to 1200 nm
- the optical thickness of each high refractive index resin layer B at a wavelength of 1200 nm is 300 nm
- the optical thickness of each low refractive index resin layer D at a wavelength of 1200 nm is 300 nm.
- the order of the low refractive index resin layer D and the high refractive index resin layer B on a PET substrate (trade name “Cosmo Shine A4100”, manufactured by Toyobo Co., Ltd.) having a thickness of 100 ⁇ m as a transparent support (that is, The low refractive index resin layer D and the high refractive index resin layer B are alternately laminated in the order in which the low refractive index resin layer D comes into contact with the PET substrate, and the number of layers of the high refractive index resin layer and the low refractive index resin layer is An infrared shielding sheet according to an example of the present invention having a total of 6 was produced.
- Each low refractive index resin layer D is prepared by the method described in “Preparation of low refractive index resin layer D”
- each high refractive index resin layer B is described in “Preparation of high refractive index resin layer B” in Example 2. It was produced by the method.
- the low refractive index resin coating solution E was applied to a PET substrate with a wire bar coater, and the MEK was evaporated by drying at 100 ° C. for 2 minutes, and then a low refractive index resin layer E was produced by UV irradiation. .
- the refractive index at a wavelength of 550 nm and a wavelength of 1200 nm of the produced low refractive index resin layer E was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.). A value ⁇ n obtained by subtracting the refractive index at a wavelength of 1200 nm from the refractive index at a wavelength was obtained. Further, the surface resistance of the produced low refractive index resin layer E was measured in the same manner as the measurement of the surface resistance of the high refractive index resin layer A.
- the wavelength of light reflected by the laminated film is set to 1200 nm, the optical thickness of each high refractive index resin layer A at a wavelength of 1200 nm is 300 nm, and the optical thickness of each low refractive index resin layer at a wavelength of 1200 nm is 300 nm.
- the order of high refractive index resin layer A-low refractive index resin layer E (that is, high refractive index resin layer A is the PET base material) on the same PET base material used for the production of the laminated film of Example 1
- the high refractive index resin layer A and the low refractive index resin layer E are alternately laminated in the order of contact with each other), and the total number of layers of the high refractive index resin layer A and the low refractive index resin layer E is 7.
- An infrared shielding sheet was produced.
- Each high refractive index resin layer A was prepared in the same manner as “Preparation of high refractive index resin layer A” in Example 1.
- the visible light transmittance, haze, and total solar transmittance (Tts) of the infrared shielding sheets of Examples 1 to 9 and Comparative Example 1 were measured by the following methods.
- Total solar transmittance (Tts) is a measure of how much of the thermal energy from the sun (total solar energy) is transmitted through the material to be measured.
- the total solar transmittance (Tts) of the infrared shielding sheet was calculated by the measurement method and calculation formula defined in ISO13837. It shows that the total solar radiation energy which permeate
- the spectral transmittance and spectral reflectance at wavelengths of 300 nm to 2500 nm of the infrared shielding sheets of Example 1 and Comparative Example 1 were measured using a spectrophotometer (Shimadzu Corporation, trade name “UV-3100”) using JIS R 3106. Measured according to The measurement results are shown in FIGS.
- the infrared shielding sheet according to Example 1 of the present invention has a refractive index at an arbitrary wavelength of 780 nm to 2500 nm (specifically, a wavelength of 1200 nm) from a refractive index at a wavelength of 550 nm.
- a refractive index at an arbitrary wavelength of 780 nm to 2500 nm specifically, a wavelength of 1200 nm
- the refractive index at a wavelength of 550 nm of all the low refractive index resin layers is 780 nm to 2500 nm.
- the wavelength of 780 nm to 1500 nm In addition to efficiently reflecting the infrared rays in the region, absorbing the infrared rays in the wavelength range of 1500 nm to 2500 nm greatly improves the total solar transmittance (Tts). It had.
- the layer containing the titanium oxide fine particles (high refractive index resin layer B) used as each high refractive index resin layer is the high refractive index resin in the infrared shielding sheet of Example 1.
- the refractive index in the infrared region (wavelength of 1200 nm) is high, and the low refractive index resin layer at the wavelength in the infrared region Because of the large difference in refractive index, the infrared rays were shielded more efficiently than the infrared shielding sheet of Example 1 (the total solar transmittance was improved).
- infrared shielding sheet of Example 3 in addition to the infrared absorption of lanthanum hexaboride fine particles, a layer containing lanthanum hexaboride fine particles arranged so as to contact the PET substrate (high refractive index resin layer C), Refraction at the wavelength in the infrared region (wavelength of 1200 nm) as compared with the layer containing the zirconium oxide fine particles (high refractive index resin layer A) arranged so as to contact the PET substrate in the infrared shielding sheet of Example 1
- the infrared rays were shielded more efficiently than the infrared shielding sheet of Example 1 because the refractive index was high and the refractive index difference with the low refractive index resin layer at the wavelength in the infrared region was large (the total solar transmittance was improved). did).
- tin-doped indium oxide fine particles ITO were added without substantially changing the infrared refractive index of the low refractive index resin layer by adding the hollow fine particles in the infrared shielding sheet of Example 1. Since the absorption wavelength by the low-refractive index resin layer containing sucrose could be lowered, the total solar transmittance (Tts) was improved as compared with the infrared shielding sheet of Example 1.
- the infrared shielding sheets of Examples 6 to 8 are obtained by combining the laminated film used in the infrared shielding sheet of Example 1 with an infrared absorbing dye, a cholesteric liquid crystal film, or a birefringent multilayer film. Compared with the infrared shielding sheet, the infrared rays could be shielded more effectively while maintaining the visible light transmittance (total solar transmittance was improved).
- the infrared shielding sheet of Example 9 is obtained by setting the content of fine particles contained in the low refractive index resin layer in the range of 90 to 95% by weight (specifically, 93% by weight). Compared with, infrared rays could be shielded more effectively while maintaining visible light transmittance (total solar transmittance was improved).
- the infrared shielding sheet of Comparative Example 1 does not absorb infrared rays (infrared rays in the wavelength range of 1500 nm to 2500 nm) due to fine particles, so that the total solar transmittance (Tts) is insufficient, and humans feel irritated. Because infrared rays (heat rays) in the region of 1500 nm or more that feels light is not shielded, when the infrared shielding sheet of Comparative Example 1 is laid on the window glass of a house or car, people in the house or car feel uncomfortable There is a concern that
- each layer is produced on a PET substrate alone for measurement. A sample was obtained. And the surface resistance of the produced layer was measured using the surface resistance meter (The Mitsubishi Chemical Analytech Co., Ltd. make, brand name "Hiresta UP" and brand name "Loresta GP"). (Measurement of refractive index and ⁇ n of each layer) In the same manner as the production of each layer (high refractive index resin layer, low refractive index resin layer) in Examples 10 to 15 and Comparative Example 2 below, each layer is produced on a PET substrate alone for measurement.
- the refractive index of the prepared layer at a wavelength of 550 nm and a wavelength of 1000 nm was measured with a spectroscopic ellipsometer (trade name “M-2000”, manufactured by JA Woollam Japan Co., Ltd.), and at a wavelength of 550 nm.
- a value ⁇ n obtained by subtracting the refractive index at a wavelength of 1000 nm from the refractive index was obtained.
- Example 10 (Preparation of low refractive index resin coating solution F) Hollow silica fine particles (trade name “Suriria 1110”, average primary particle size 50 nm, solid content concentration 20% by weight, JGC Catalysts & Chemicals Co., Ltd.) in a solution of 0.4 part of KAYARAD DPHA and 0.05 part of Irgacure 184 in MEK 4 parts
- a low refractive index resin layer coating solution F for forming a low refractive index resin layer F was prepared by dispersing 3 parts of a company-made dispersion medium (methyl isobutyl ketone).
- the wavelength of light reflected by the laminated film is set to 1000 nm, and the optical thickness and the QWOT coefficient of each layer at the wavelength of 1000 nm are displayed on the same PET substrate used for the production of the laminated film of Example 1.
- an infrared shielding sheet in which the total number of layers of the high refractive index resin layer and the low refractive index resin layer is 8.
- the refractive index of each layer at a wavelength of 550 nm in the table, expressed as “refractive index n (550 nm”)
- the refractive index at a wavelength of 1000 nm in the table, “refractive index n ( 1000 nm) ”
- the value ⁇ n obtained by subtracting the refractive index at a wavelength of 1000 nm from the refractive index at a wavelength of 550 nm are also shown.
- Example 11 The wavelength of the light reflected by the laminated film was set to 1000 nm, and each layer was laminated so that the optical thickness of each layer at the wavelength of 1000 nm and the QWOT coefficient thereof were the values shown in Table 3.
- Example 12 The wavelength of light reflected by the laminated film is set to 1000 nm, and the high refractive index resin layer B using the high refractive index resin coating liquid B and the low refractive index resin layer F using the low refractive index resin coating liquid F;
- the total number of layers in which the layers are alternately stacked is changed from 4 layers to 6 layers, and a low refractive index resin coating A and a low refractive index resin coating A are used.
- the total number of layers where the refractive index resin layers are alternately laminated is changed from 4 layers to 6 layers so that the optical thickness of each layer at a wavelength of 1000 nm and its QWOT coefficient become the values shown in Table 4.
- An infrared shielding sheet according to an example of the present invention in which the total number of high refractive index resin layers and low refractive index resin layers was 12 was produced in the same manner as in Example 10 except that each layer was laminated.
- Example 13 (Preparation of low refractive index resin layer G) First, except that the amount of tin-doped indium oxide fine particles was changed to 1.1 parts, tin doping was performed in the same manner as in the preparation of the low refractive index resin coating liquid A in “Preparation of low refractive index resin layer A” in Example 1. An indium oxide fine particle dispersion was prepared.
- hollow silica fine particles (trade name “Thruria 1110”, average primary particle size 50 nm, solid content concentration 20% by weight, manufactured by JGC Catalysts & Chemicals, dispersion medium: methyl isobutyl ketone) 1 5 parts were dispersed to prepare a low refractive index resin coating solution G for forming the low refractive index resin layer G.
- the wavelength of the light reflected by the laminated film is set to 1000 nm, and the coating solution used for the production of the layer “4” in Table 2 is changed to the low refractive index resin coating solution G, and “7” and “8” in Table 2.
- the high refractive index resin layer and the low refractive index were removed in the same manner as in Example 10 except that each layer was laminated so that the optical thickness of each layer at a wavelength of 1000 nm and the QWOT coefficient thereof were the values shown in Table 5.
- An infrared shielding sheet according to an example of the present invention in which the total number of the rate resin layers was 6 was produced.
- the layer “4” was prepared by applying a low refractive index resin coating solution G with a wire bar coater and evaporating the solvent by drying at 100 ° C. for 2 minutes, followed by UV irradiation.
- Example 14 Infrared absorbing dye synthesis example
- 2.3 parts of an infrared absorbing dye was obtained.
- infrared absorbing dye layer 0.02 part of the synthesized infrared absorbing dye, 1 part of KAYARAD DPHA, 0.05 part of Irgacure 184 and 0.01 part of aminoalkyl methacrylate copolymer dispersant are added to 7 parts of toluene, and the peripheral speed is measured using a bead mill.
- An infrared absorbing dye-containing coating solution for forming an infrared absorbing dye layer was prepared by dispersing at 10 m / s.
- the infrared absorbing dye-containing coating solution is applied to the same PET base material used in the production of the laminated film of Example 1 with a wire bar coater so that the geometric thickness is 4 ⁇ m, and dried at 100 ° C. for 2 minutes. After evaporating the solvent, an infrared absorbing dye layer was prepared by UV irradiation.
- Example 15 (Cholesteric liquid crystal film production) First, in the same manner as in Example 7, first and second cholesteric liquid crystal layers were produced on the same PET substrate used for producing the laminated film of Example 1.
- the wavelength of the light reflected by the laminated film is set to 1000 nm, the arrangement order of the layers in the laminated film is reversed, and on the surface of the PET substrate opposite to the surface on the cholesteric liquid crystal layer side,
- the number of layers of the high-refractive index resin layer and the low-refractive index resin layer is the same as in Example 13 except that each layer is laminated so that the optical thickness at a wavelength of 1000 nm and its QWOT coefficient are the values shown in Table 6.
- An infrared shielding sheet according to an example of the present invention having a total of 6 was produced.
- the wavelength of the light reflected by the laminated film is set to 1000 nm, and the coating solution used for producing the layers “2”, “4”, “6”, and “8” in Table 2 is changed to the low refractive index resin coating solution E,
- the layers of the high-refractive index resin layer and the low-refractive index resin layer were the same as in Example 10 except that each layer was laminated such that the optical thickness at a wavelength of 1000 nm and its QWOT coefficient were the values shown in Table 7.
- a comparative infrared shielding sheet having a total number of 8 was prepared.
- the visible light transmittance, haze, and total solar transmittance (Tts) of the infrared shielding sheets of Examples 10 to 15 and Comparative Example 2 were measured by the following methods.
- the visible light transmittance, haze, and total solar energy of the infrared shielding sheets of Examples 10 to 15 and Comparative Example 2 and the visible light transmittance of the infrared shielding sheets of Examples 1 to 9 and Comparative Example 1, It measured similarly to the measurement of haze and a total solar transmittance (Tts).
- Table 8 shows the measurement results.
- the infrared shielding sheet according to Example 10 of the present invention has a refractive index at an arbitrary wavelength of 780 nm to 2500 nm (specifically, a wavelength of 1000 nm) from a refractive index at a wavelength of 550 nm.
- a refractive index at an arbitrary wavelength of 780 nm to 2500 nm specifically, a wavelength of 1000 nm
- the refractive index at a wavelength of 550 nm of all the low refractive index resin layers is 780 nm to 2500 nm.
- the infrared shielding sheet according to Example 10 of the present invention has a QWOT coefficient of optical thickness at an arbitrary wavelength of 780 nm to 2500 nm (specifically, a wavelength of 1000 nm) of 1.
- the QWOT coefficient of optical thickness is less than 1.5 for all layers at an arbitrary wavelength of 780 nm to 2500 nm (specifically, a wavelength of 1000 nm)
- Infrared shielding sheets of Example 14 and Example 15 combine the laminated film used in the infrared shielding sheet of Example 1 with an infrared absorbing dye or a cholesteric liquid crystal film, while maintaining visible light transmittance, Infrared rays could be shielded more effectively (total solar transmittance improved).
- the infrared shielding sheet of Comparative Example 2 does not absorb infrared rays (infrared rays having a wavelength of 1500 nm to 2500 nm) due to fine particles, so that the total solar transmittance (Tts) is insufficient. Because infrared rays (heat rays) in the region of 1500 nm or more that feels light is not shielded, when the infrared shielding sheet of Comparative Example 1 is laid on the window glass of a house or car, people in the house or car feel uncomfortable There is a concern that
- Example 16 (Preparation of interlayer film for laminated glass) A PVB film as the first intermediate film was superposed on the infrared shielding sheet of Example 10 thus produced to obtain a laminate.
- the laminated body at a position of 1 mm or less from the edge of the infrared shielding sheet on the entire circumference (four sides) is sandwiched between two heating rollers for laminating disposed on the front side and the back side of the obtained laminated body, and infrared shielding is performed.
- the sheet and the first intermediate film were bonded together by thermocompression bonding.
- the laminating heating roller sets the temperature of the laminating roller on the intermediate film side to 25 ° C.
- the temperature of the heating roller for laminating on the transparent support (PET substrate) side was set to 120 ° C. so that the embossing was sufficiently crushed to improve the adhesion between the first intermediate film and the infrared shielding sheet.
- a PVB film as a second intermediate film is laminated on the back surface of the surface of the infrared shielding sheet on which the first intermediate film is bonded, and an interlayer film for laminated glass including the infrared shielding sheet of Example 10 is produced. did.
- the laminated interlayer film for laminated glass using the infrared shielding sheet of Example 10 prepared above was superposed in the order of glass plate / first interlayer film / infrared shielding sheet / second interlayer film / glass plate.
- a laminated body in which an interlayer film for laminated glass was sandwiched between two glass plates was produced.
- the edge part of two glass plates and the edge part of the 1st and 2nd intermediate film were the same positions.
- a glass plate having a thickness of 2 mm was used as the glass plate.
- the obtained laminated body in which the interlayer film for glass was sandwiched between the two glass plates was pre-pressed for 30 minutes at 95 ° C. under vacuum.
- the laminate sandwiched between the glass plates was pressure-bonded while being heated in an autoclave under the conditions of 1.3 MPa and 120 ° C. to produce a laminated glass.
- the interlayer film for laminated glass including the infrared shielding sheet of Example 10 five types of interlayer films for laminated glass including the infrared shielding sheets of Examples 11 to 15 were used, respectively.
- five types of laminated glasses each including the infrared shielding sheets of Examples 11 to 15 were produced.
- Example 16 When the performance of the laminated glass including the infrared shielding sheets of Examples 10 to 15 prepared in Example 16 was evaluated, the laminated glass including the infrared shielding sheets of Examples 10 to 15 was remarkable. It was confirmed that the glass was good without defects and streaks, and it worked as a transparent heat-shielding glass having a haze of 0.5% or less.
- the present invention it has been found that, by providing infrared reflectivity utilizing a difference in refractive index in addition to the infrared absorption capability of fine particles, temperature rise due to infrared rays is suppressed as compared with conventional infrared shielding sheets.
- the infrared shielding sheet of the present invention is laid on the window glass of a house or car, the temperature rise of the space of the house or car is suppressed, the load on the air conditioner of the house or car is reduced, and energy saving or global environmental problems Can contribute.
- the infrared shielding sheet of the present invention can selectively shield light in the infrared region, a window member for a building, a window member for a vehicle, a refrigerator, a window glass for a frozen showcase, an IR cut filter, It can be used to prevent forgery.
- Infrared shielding sheet may include transparent support
- 5 ′ glass plate 20
- transparent support 21 high refractive index resin layer 22
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Abstract
Description
前記低屈折率樹脂層の少なくとも1層が、550nmの波長での屈折率から780nm~2500nmの任意波長における屈折率を差し引いた値が0.1以上であり、
前記低屈折率樹脂層が、550nm以上前記任意波長以下の任意の波長において前記高屈折率樹脂層よりも低い屈折率を示すことを特徴としている。
ここで、nは高屈折率樹脂層又は低屈折率樹脂層の屈折率を表し、dは高屈折率樹脂層又は低屈折率樹脂層の幾何学厚さを表し、λは積層膜が反射させる赤外線波長(780nm~2500nmの赤外線領域から任意に設定される波長)を表す。
nHdH+nLdL=λ/2 …(1)
ここで、nH及びdHは高屈折率樹脂層の屈折率及び幾何学厚さをそれぞれ表し、nL及びdLは低屈折率樹脂層の屈折率及び幾何学厚さそれぞれ表す。
前記赤外線吸収色素としては、特に限定されるものではないが、具体的には、750nm~1100nmの波長に吸収極大をもつ赤外線吸収色素、例えば、フタロシアニン系色素、アントラキノン系色素、ジチオール系色素、ジイモニウム系色素、アンスラキノン系色素、スクアリリウム系色素、ナフタロシアニン系色素、アミニウム系色素、ジチオール金属錯体系色素等の有機金属錯体系色素、シアニン系色素、アゾ色素、ポリメチン系色素、キノン系色素、ジフェニルメタン系色素、トリフェニルメタン系色素、メルカプトナフトール系色素等を用いることができる。
前記コレステリック液晶膜は、一平面上では分子軸が一定の方向に並んでいるが、次の平面では分子軸の方向が少し角度をなしてずれ、さらに次の平面では角度がずれるという具合に、該平面の法線方向に分子軸の角度が次々にずれていく構造である。このような分子軸の方向がねじれていく構造は、キラル(カイラル)構造と呼ばれる。該平面の法線(キラル軸)は、コレステリック液晶膜(コレステリック液晶層)の厚み方向に略平行になっていることが好ましい。
λc=n×p×cosθ …(2)
n0×p×cosθ≦λ≦ne×p×cosθ …(3)
式(2)及び式(3)中、λcはコレステリック液晶膜が反射させる光の波長領域の中心波長、noはコレステリック液晶膜を構成する液晶化合物の分子の短軸方向の屈折率、neは液晶化合物の分子の長軸方向の屈折率、nは(no+ne)/2、θは光の入射角(面法線からの角度)を表す。
前記棒状液晶化合物としては、棒状ネマチック液晶化合物が好ましい。前記棒状ネマチック液晶化合物の好ましい例には、アゾメチン類、アゾキシ類、シアノビフェニル類、シアノフェニルエステル類、安息香酸エステル類、シクロヘキサンカルボン酸フェニルエステル類、シアノフェニルシクロヘキサン類、シアノ置換フェニルピリミジン類、フェニルジオキサン類、トラン類、及びアルケニルシクロヘキシルベンゾニトリル類等の低分子液晶化合物及び高分子液晶化合物が含まれる。
前記液晶組成物は、コレステリック液晶相を示すものであり、そのためには、光学活性化合物を含有しているのが好ましい。ただし、上記棒状液晶化合物が不斉炭素原子を有する分子である場合には、光学活性化合物を添加しなくても、コレステリック液晶膜を安定的に形成可能である場合もある。前記光学活性化合物は、公知の種々のキラル剤(例えば、液晶デバイスハンドブック、第3章4-3項、TN、STN用カイラル剤、199頁、日本学術振興会第142委員会編、1989に記載)から選択することができる。光学活性化合物は、一般に不斉炭素原子を含むが、不斉炭素原子を含まない軸性不斉化合物あるいは面性不斉化合物もキラル剤として用いることができる。軸性不斉化合物または面性不斉化合物の例には、ビナフチル、ヘリセン、パラシクロファン及びこれらの誘導体が含まれる。光学活性化合物(キラル剤)は、重合性基を有していてもよい。光学活性化合物が重合性基を有する光学活性化合物(重合性の光学活性化合物)であるとともに、併用する棒状液晶化合物も重合性基を有する棒状液晶化合物(重合性の棒状液晶化合物)である場合は、重合性の光学活性化合物と重合性の棒状液晶化合物との重合反応により、棒状液晶化合物から誘導される繰り返し単位と、光学活性化合物から誘導される繰り返し単位とを有するポリマーを形成することができる。この態様では、重合性の光学活性化合物が有する重合性基は、重合性の棒状液晶化合物が有する重合性基と同種の基であることが好ましい。したがって、光学活性化合物の重合性基も、不飽和重合性基、エポキシ基、又はアジリジニル基であることが好ましく、不飽和重合性基であることがさらに好ましく、エチレン性不飽和重合性基であることが特に好ましい。また、光学活性化合物は、液晶化合物であってもよい。
前記コレステリック液晶膜(光反射層)の形成に用いる液晶組成物は、重合性液晶組成物であるのが好ましく、そのためには、重合開始剤を含有しているのが好ましい。紫外線照射により前記重合性液晶組成物の硬化反応を進行させる場合には、使用する重合開始剤は、紫外線照射によって重合反応を開始可能な光重合開始剤であるのが好ましい。上記光重合開始剤は、特に限定されず、例えば、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン(BASFジャパン株式会社製「イルガキュア907」)、1-ヒドロキシシクロヘキシルフェニルケトン(BASFジャパン株式会社製「イルガキュア184」)、4-(2-ヒドロキシエトキシ)-フェニル(2-ヒドロキシ-2-プロピル)ケトン(BASFジャパン株式会社製「イルガキュア2959」)、1-(4-ドデシルフェニル)-2-ヒドロキシ-2-メチルプロパン-1-オン(メルク社(Merck KGaA)製「ダロキュア953」)、1-(4-イソプロピルフェニル)-2-ヒドロキシ-2-メチルプロパン-1-オン(メルク社製「ダロキュア1116」)、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン(BASFジャパン株式会社製「イルガキュア1173」)、ジエトキシアセトフェノン等のアセトフェノン化合物、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル、2、2-ジメトキシ-2-フェニルアセトフェノン(BASFジャパン株式会社製「イルガキュア651」)等のベンゾイン化合物、ベンゾイル安息香酸、ベンゾイル安息香酸メチル、4-フェニルベンゾフェノン、ヒドロキシベンゾフェノン、4-ベンゾイル-4’-メチルジフェニルサルファイド、3、3’-ジメチル-4-メトキシベンゾフェノン(日本化薬株式会社製「カヤキュアーMBP」)等のベンゾフェノン化合物;チオキサントン、2-クロルチオキサントン(日本化薬株式会社製「カヤキュアーCTX」)、2-メチルチオキサントン、2,4-ジメチルチオキサントン(日本化薬株式会社製「カヤキュアーRTX」)、イソプロピルチオキサントン、2,4-ジクロロチオキサントン(日本化薬株式会社製「カヤキュアーCTX」)、2,4-ジエチルチオキサントン(日本化薬株式会社製「カヤキュアーDETX」)、2,4-ジイソプロピルチオキサントン(日本化薬株式会社製「カヤキュアーDITX」)等のチオキサントン化合物;2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド(BASFジャパン株式会社製「ルシリンTPO」)等が挙げられる。これらの光重合開始剤は、単独で用いられてもよいし、2種以上が併用されてもよい。
前記紫外線吸収剤としては、ベンゾトリアゾール系化合物、ベンゾフェノン系化合物、トリアジン系化合物等が挙げられる。前記光安定化剤としては、ヒンダードアミン系化合物、ベンゾエート系化合物等が挙げられる。前記酸化防止剤としては、フェノール系化合物等が挙げられる。
前記複屈折多層膜は、複屈折(好ましくは正の複屈折)を有する層(以下、「複屈折層」と称する)と等方屈折または負の複屈折を有する層(以下、「等方屈折層」と称する)とを交互に積層して構成されている。前記複屈折多層膜は、複屈折層と等方屈折層との間の屈折率差およびそれぞれの幾何学厚さによって引き起こされるコヒーレント干渉に基づいている。平面内屈折率が複屈折層と等方屈折層との間で異なるとき、前記2層の間の境界面は反射面を形成する。
本発明の合わせガラス用中間膜は、本発明の赤外線遮蔽シートと、前記赤外線遮蔽シートの少なくとも一方の最外層の上に形成された中間膜とを備えることを特徴とする。本発明の合わせガラス用中間膜は、本発明の赤外線遮蔽シートの両方の最外層の上にそれぞれ形成された第一及び第二の中間膜を含むことが、合わせガラス化の容易化の観点から好ましい。
本発明の合わせガラスは、本発明の合わせガラス用中間膜と、複数のガラス板(2枚のガラス板)を有し、前記複数のガラス板(少なくとも2枚のガラス板)の間に前記合わせガラス用中間膜が挿入されていることを特徴とする。また、本発明の合わせガラスは、任意のサイズに好ましく裁断することができる。
(高屈折率樹脂層Aの作製)
樹脂バインダーとしてのジペンタエリスリトールヘキサアクリレート(商品名「KAYARAD DPHA」、日本化薬株式会社製;以下、単に「KAYARAD DPHA」と表記する)0.4部及び1-ヒドロキシシクロヘキシルフェニルケトン(商品名「イルガキュア184」、光重合開始剤、BASFジャパン株式会社製;以下、単に「イルガキュア184」と表記する)0.05部を、溶媒としてのメチルエチルケトン(以下、「MEK」と略記する)4部に溶解した溶液中に、酸化ジルコニウム微粒子(商品名「NANON5 ZR-010」、平均一次粒子径7~8nm、平均分散粒子径15nm、固形分濃度30重量%、株式会社ソーラー製、分散媒:MEK)4.7部を分散させ、高屈折率樹脂層Aを形成するための高屈折率樹脂塗布液A(溶媒中に樹脂バインダーを溶解させると共に微粒子を分散させてなる分散液)を調製した。
非中空微粒子である平均一次粒子径25.6nm、60MPaで圧縮した際の粉体抵抗0.8Ω・cmであるスズドープ酸化インジウム微粒子(商品名「ITO-R」、CIKナノテック株式会社製)1.4部、KAYARAD DPHA0.4部、イルガキュア184 0.05部、及びアミノアルキルメタクリレート共重合体分散剤(商品名「DISPERBYK-167」、ビック・ケミージャパン株式会社製;以下、適宜、単に「アミノアルキルメタクリレート共重合体分散剤」と表記する)0.3部を、溶媒としてのトルエン7部中に加え、ビーズミルを用いて周速10m/sにて分散させ、低屈折率樹脂層Aを形成するための低屈折率樹脂塗布液A(溶媒中に樹脂バインダーを溶解させると共に微粒子を分散させてなる分散液)を作製した。スズドープ酸化インジウム微粒子の平均分散粒子径は、40nmであった。
積層膜が反射させる光の波長を1200nmに設定し、各高屈折率樹脂層Aの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層Aの1200nmの波長における光学厚さが300nmとなる条件で、透明支持体としての厚さ100μmのPET基材(商品名「コスモシャインA4100」、東洋紡株式会社製;以下、適宜、単に「PET基材」と表記する)上に低屈折率樹脂層A-高屈折率樹脂層Aの順番(すなわち、低屈折率樹脂層AがPET基材に当接する順番)で低屈折率樹脂層A及び高屈折率樹脂層Aを交互に積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が8である本発明の一実施例に係る赤外線遮蔽シートを作製した。各低屈折率樹脂層Aは「低屈折率樹脂層Aの作製」に記載の方法で作製し、各高屈折率樹脂層Aは「高屈折率樹脂層Aの作製」に記載の方法で作製した。
(高屈折率樹脂層Bの作製)
平均一次粒子径35nmである酸化チタン微粒子(商品名「TTO-51A」、石原産業株式会社製)1.4部、KAYARAD DPHA0.4部、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン(BASFジャパン株式会社製「イルガキュア907」)0.05部、及び分散剤(商品名「DISPERBYK-2001」、ビック・ケミージャパン株式会社製)0.3部をトルエン7部中に加え、ビーズミルを用いて周速10m/sにて分散させ、高屈折率樹脂層Bを形成するための高屈折率樹脂塗布液Bを作製した。酸化チタン微粒子の平均分散粒子径は、45nmであった。
積層膜が反射させる光の波長を1200nmに設定し、各高屈折率樹脂層Bの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層Aの1200nmの波長における光学厚さが300nmとなる条件で、実施例1の積層膜の作製に使用したのと同じPET基材上に高屈折率樹脂層B-低屈折率樹脂層Aの順番(すなわち、高屈折率樹脂層BがPET基材に当接する順番)で高屈折率樹脂層B及び低屈折率樹脂層Aを交互に積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が7である本発明の一実施例に係る赤外線遮蔽シートを作製した。各高屈折率樹脂層Bは本実施例の「高屈折率樹脂層Bの作製」と同様にして作製し、各低屈折率樹脂層Aは実施例1の「低屈折率樹脂層Aの作製」と同様にして作製した。
(高屈折率樹脂層Cの作製)
六ホウ化ランタン微粒子(和光純薬工業株式会社製、平均一次粒子径1~2μm)1.4部、KAYARAD DPHA0.4部、イルガキュア184 0.05部、及びアミノアルキルメタクリレート共重合体分散剤0.3部をトルエン7部中に加え、ビーズミルを用いて周速10m/sにて分散させた。得られた分散体を遠心分離機(日立工機株式会社製「Himac CR18」)を用いて回転数5000rpmで15分間遠心処理を行い、高屈折率樹脂層Cを形成するための高屈折率樹脂塗布液Cを作製した。六ホウ化ランタン微粒子の平均分散粒子径は、35nmであった。
積層膜が反射させる光の波長を1200nmに設定し、高屈折率樹脂層Cの1200nmの波長における光学厚さが300nm、各高屈折率樹脂層Aの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層Aの1200nmの波長における光学厚さが300nmとなる条件で、実施例1の積層膜の作製に使用したのと同じPET基材上に高屈折率樹脂層C-低屈折率樹脂子層A-高屈折率樹脂層A-低屈折率樹脂層A-高屈折率樹脂層Aの順番(高屈折率樹脂層CがPET基材に当接する順番)で高屈折率樹脂層C、低屈折率樹脂子層A、及び高屈折率樹脂層Aを積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が5である本発明の一実施例に係る赤外線遮蔽シートを作製した。高屈折率樹脂層Cは本実施例の「高屈折率樹脂層Cの作製」と同様にして作製し、各低屈折率樹脂層Aは実施例1の「低屈折率樹脂層Aの作製」と同様にして作製し、各高屈折率樹脂層Aは実施例1の「高屈折率樹脂層Aの作製」と同様にして作製した。
(高屈折率樹脂層Dの作製)
微粒子として酸化チタン微粒子に代えてナノダイヤモンド(平均一次粒子径3.5nm、平均分散粒子径4.5nmのダイヤモンド微粒子)を用いた以外は実施例2の「高屈折率樹脂層Bの作製」と同様にして高屈折率樹脂層Dを作製した。高屈折率樹脂層Dに含有される微粒子の含有率は、高屈折率樹脂層D全体に対して65重量%である。作製した高屈折率樹脂層Dの550nmの波長及び1200nmの波長での屈折率を分光エリプソメータ(商品名「M-2000」、ジェー・エー・ウーラム・ジャパン株式会社製)にて測定し、550nmの波長での屈折率から1200nmの波長での屈折率を差し引いた値Δnを求めた。また、作製した高屈折率樹脂層Dの表面抵抗を、実施例1における高屈折率樹脂層Aの表面抵抗の測定と同様にして測定した。
積層膜が反射させる光の波長を1200nmに設定し、各高屈折率樹脂層Dの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層Aの1200nmの波長における光学厚さが300nmとなる条件で、実施例1の積層膜の作製に使用したのと同じPET基材上に低屈折率樹脂層A-高屈折率樹脂層Dの順番(すなわち、低屈折率樹脂層AがPET基材に当接する順番)で低屈折率樹脂層A及び高屈折率樹脂層Dを交互に積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が8である本発明の一実施例に係る赤外線遮蔽シートを作製した。各低屈折率樹脂層Aは実施例1の「低屈折率樹脂層Aの作製」と同様にして作製し、各高屈折率樹脂層Dは本実施例の「高屈折率樹脂層Dの作製」と同様にして作製した。
(低屈折率樹脂層Bの作製)
実施例1の「低屈折率樹脂層Aの作製」に記載の方法で作製した低屈折率樹脂塗布液Aに、中空シリカ微粒子(商品名「スルーリア1110」、平均一次粒子径50nm、固形分濃度20重量%、日揮触媒化成株式会社製、分散媒:メチルイソブチルケトン)3部を加えて、低屈折率樹脂層Aを形成するための低屈折率樹脂塗布液Bを作製した。
積層膜が反射させる光の波長を1200nmに設定し、各高屈折率樹脂層Aの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層Bの1200nmの波長における光学厚さが300nmとなる条件で、実施例1の積層膜の作製に使用したのと同じPET基材上に低屈折率樹脂層B-高屈折率樹脂層Aの順番(すなわち、低屈折率樹脂層BがPET基材に当接する順番)で低屈折率樹脂層B及び高屈折率樹脂層Aを交互に積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が8である本発明の一実施例に係る赤外線遮蔽シートを作製した。各低屈折率樹脂層Bは本実施例の「低屈折率樹脂層Bの作製」と同様にして作製し、各高屈折率樹脂層Aは実施例1の「高屈折率樹脂層Aの作製」と同様にして作製した。
(赤外吸収色素合成例)
スルホラン120部に、ナフタル酸無水物15.9部、尿素29部、モリブデン酸アンモニウム0.40部、及び塩化バナジル(V)3.5部を加え、これらの混合物を200℃まで昇温し、同温度で11時間反応させた。反応終了後、反応後の混合物を65℃まで冷却し、N,N-ジメチルホルムアミド(以下、「DMF」と略記する)100部を加え、析出固体をろ過分離した。得られた固体をDMF50部で洗浄し、ウェットケーキ20.3部を得た。得られたウェットケーキをDMF100部に加え、80℃に昇温し、同温度で2時間撹拌した。析出固体をろ過分離し、水200部で洗浄し、ウェットケーキを18.9部得た。得られたウェットケーキを水150部に加え、90℃に昇温し、同温度で2時間撹拌した。析出固体をろ過分離し、水200部で洗浄してウェットケーキ16.1部を得た。得られたウェットケーキを80℃で乾燥し、赤外吸収色素を12.3部得た。
実施例1の「高屈折率樹脂層Aの作製」に記載の方法で作製した高屈折率樹脂塗布液Aに、前記合成した赤外吸収色素を0.03部分散させ、高屈折率樹脂層Eを形成するための高屈折率樹脂塗布液Eを作製した。
実施例1の「低屈折率樹脂層Aの作製」に記載の方法で作製した低屈折率樹脂塗布液Aに、前記合成した赤外吸収色素を0.03部分散させ、低屈折率樹脂層Cを形成するための低屈折率樹脂塗布液Cを作製した。
積層膜が反射させる光の波長を1200nmに設定し、各高屈折率樹脂層Eの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層Cの1200nmの波長における光学厚さが300nmとなる条件で、実施例1の積層膜の作製に使用したのと同じPET基材上に低屈折率樹脂層C-高屈折率樹脂層Eの順番(すなわち、低屈折率樹脂層CがPET基材に当接する順番)で低屈折率樹脂層C及び高屈折率樹脂層Eを交互に積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が8である本発明の一実施例に係る赤外線遮蔽シートを作製した。各低屈折率樹脂層Cは本実施例の「低屈折率樹脂層Cの作製」と同様にして作製し、各高屈折率樹脂層Eは本実施例の「高屈折率樹脂層Eの作製」と同様にして作製した。
(コレステリック液晶膜作製)
LC-242(棒状液晶化合物、BASFジャパン株式会社製)10部、LC-756(キラル剤、BASFジャパン株式会社製)0.25部、及び2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド(商品名「ルシリンTPO」、重合開始剤、BASFジャパン株式会社製)0.5部をシクロペンタノン26部中に加え、液晶塗布液Aを作製した。
2層のコレステリック液晶膜に代えて複屈折多層膜(商品名「Nano90S」、住友スリーエム株式会社製)を用いた以外は実施例8と同様にして、本発明の一実施例に係る赤外線遮蔽シートを作製した。
非中空微粒子である平均一次分散粒子径25.6nm、60MPaで圧縮した際の粉体抵抗0.8Ω・cmであるスズドープ酸化インジウム微粒子(商品名「ITO-R」、CIKナノテック株式会社製)1.4部、KAYARAD DPHA 0.04部、2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド(商品名「ルシリンTPO」、光重合開始剤、BASFジャパン株式会社製)0.01部、アミノアルキルメタクリレート共重合体分散剤(商品名「DISPERBYK-167」、ビック・ケミージャパン株式会社製)0.06部を、溶媒としての1-メトキシ-2-プロパノール(以下、「PGM」と表記する)7部中に加え、ビーズミルを用いて周速10m/sにて分散させ、低屈折率樹脂層Dを形成する為の低屈折率樹脂塗布液Dを作製した。スズドープ酸化インジウム微粒子の平均分散粒子径は、40nmであった。
積層膜が反射させる光の波長を1200nmに設定し、各高屈折率樹脂層Bの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層Dの1200nmの波長における光学厚さが300nmとなる条件で、透明支持体としての厚さ100μmのPET基材(商品名「コスモシャインA4100」、東洋紡株式会社製)上に低屈折率樹脂層D-高屈折率樹脂層Bの順番(すなわち、低屈折率樹脂層DがPET基材に当接する順番)で低屈折率樹脂層D及び高屈折率樹脂層Bを交互に積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が6である本発明の一実施例に係る赤外線遮蔽シートを作製した。各低屈折率樹脂層Dは「低屈折率樹脂層Dの作製」に記載の方法で作製し、各高屈折率樹脂層Bは実施例2の「高屈折率樹脂層Bの作製」に記載の方法で作製した。
(低屈折率樹脂層Eの作製)
KAYARAD DPHA1部及びイルガキュア184 0.01部をMEK10部に溶解した溶液中に、酸化ケイ素微粒子(商品名「MEK-ST」、平均分散粒子径15nm、日産化学製)3.8部を分散させ、低屈折率樹脂層Eを形成するための低屈折率樹脂塗布液Eを調製した。
積層膜が反射させる光の波長を1200nmに設定し、各高屈折率樹脂層Aの1200nmの波長における光学厚さが300nm、各低屈折率樹脂層の1200nmの波長における光学厚さが300nmとなる条件で、実施例1の積層膜の作製に使用したのと同じPET基材上に高屈折率樹脂層A-低屈折率樹脂層Eの順番(すなわち、高屈折率樹脂層AがPET基材に当接する順番)で高屈折率樹脂層A及び低屈折率樹脂層Eを交互に積層し、高屈折率樹脂層A及び低屈折率樹脂層Eの層数の合計が7である比較用の赤外線遮蔽シートを作製した。各高屈折率樹脂層Aは実施例1の「高屈折率樹脂層Aの作製」と同様にして作製した。
分光光度計(株式会社島津製作所、商品名「UV-3100」)を用いて、JIS R 3106に準拠して、得られた赤外線遮蔽シートの波長380nm~780nmにおける可視光透過率を測定した。
全日射透過率(Tts;Total Solar Transmittance)は太陽からの熱的エネルギー(全日射エネルギー)のうち、どの程度の熱的エネルギーが測定対象となる材料を透過するかという尺度である。赤外線遮蔽シートの全日射透過率(Tts)は、ISO13837に定義されている測定方法及び計算式にて算出した。算出された赤外線遮蔽シートの全日射透過率の数値が小さいほど、赤外線遮蔽シートを透過する全日射エネルギーが小さいことを示し、赤外線遮蔽シートの熱線遮蔽性が高いことを示す。
ヘーズメーター(有限会社東京電色製、商品名「TC-HIIIDPK」)を用いて、JIS K 6714に準拠して、得られた赤外線遮蔽シートのヘイズを測定した。
以下の実施例10~実施例15及び比較例2における各層(高屈折率樹脂層、低屈折率樹脂層)の作製と同様にして、各層を単独でPET基材上に作製することによって測定用サンプルを得た。そして、作製した層の表面抵抗を表面抵抗計(株式会社三菱化学アナリテック製、商品名「ハイレスタUP」及び商品名「ロレスタGP」)を用いて測定した。
(各層の屈折率及びΔnの測定)
以下の実施例10~実施例15及び比較例2における各層(高屈折率樹脂層、低屈折率樹脂層)の作製と同様にして、各層を単独でPET基材上に作製することによって測定用サンプルを得た。そして、作製した層の550nmの波長及び1000nmの波長での屈折率を分光エリプソメータ(商品名「M-2000」、ジェー・エー・ウーラム・ジャパン株式会社製)にて測定し、550nmの波長での屈折率から1000nmの波長での屈折率を差し引いた値Δnを求めた。
(低屈折率樹脂塗布液Fの作製)
KAYARAD DPHA0.4部及びイルガキュア184 0.05部をMEK4部に溶解した溶液中に、中空シリカ微粒子(商品名「スルーリア1110」、平均一次粒子径50nm、固形分濃度20重量%、日揮触媒化成株式会社製、分散媒:メチルイソブチルケトン)3部を分散させ、低屈折率樹脂層Fを形成するための低屈折率樹脂層塗布液Fを調製した。
積層膜が反射させる光の波長を1000nmに設定し、実施例1の積層膜の作製に使用したのと同じPET基材上に、各層の、1000nmの波長における光学厚さ及びそのQWOT係数が表2の値になるように、実施例2と同様にして作製した高屈折率樹脂塗布液B、実施例1と同様にして作製した低屈折率樹脂塗布液A、前述のようにして作製した低屈折率樹脂塗布液Fを適宜希釈して塗布することにより各層を表2の順番(表2~7における「層」の数値は、その層がPET基材から遠い方から数えて何番目の層であるかを示す)で積層し、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が8である本発明の一実施例に係る赤外線遮蔽シートを作製した。なお、各層は、表2の「樹脂層」の欄に記載の樹脂層を形成するための塗布液をワイヤーバーコーターにて塗布し、100℃で2分間乾燥させることによって溶媒を蒸発させた後、UV照射によって作製した。
積層膜が反射させる光の波長を1000nmに設定し、各層の、1000nmの波長における光学厚さ及びそのQWOT係数が表3の値になるように各層を積層した以外は実施例10と同様にして、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が8である本発明の一実施例に係る赤外線遮蔽シートを作製した。
積層膜が反射させる光の波長を1000nmに設定し、高屈折率樹脂塗布液Bを用いてなる高屈折率樹脂層Bと低屈折率樹脂塗布液Fを用いてなる低屈折率樹脂層Fとが交互に積層されている部分の合計層数を4層から6層に変更し、高屈折率樹脂塗布液Bを用いてなる高屈折率樹脂層と低屈折率樹脂塗布Aを用いてなる低屈折率樹脂層とが交互に積層されている部分の合計層数を4層から6層に変更し、各層の、1000nmの波長における光学厚さ及びそのQWOT係数が表4の値になるように各層を積層した以外は実施例10と同様にして、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が12である本発明の一実施例に係る赤外線遮蔽シートを作製した。
(低屈折率樹脂層Gの作製)
まず、スズドープ酸化インジウム微粒子の量を1.1部に変更したことを以外は実施例1の「低屈折率樹脂層Aの作製」における低屈折率樹脂塗布液Aの作製と同様にして、スズドープ酸化インジウム微粒子分散液を作製した。前記作製したスズドープ酸化インジウム微粒子分散液に、中空シリカ微粒子(商品名「スルーリア1110」、平均一次粒子径50nm、固形分濃度20重量%、日揮触媒化成株式会社製、分散媒:メチルイソブチルケトン)1.5部を分散させ、低屈折率樹脂層Gを形成するための低屈折率樹脂塗布液Gを作製した。
積層膜が反射させる光の波長を1000nmに設定し、表2の「4」の層の作製に使用する塗布液を低屈折率樹脂塗布液Gに変更し、表2の「7」「8」の層を取り除き、各層の、1000nmの波長における光学厚さ及びそのQWOT係数が表5の値になるように各層を積層した以外は実施例10と同様にして、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が6である本発明の一実施例に係る赤外線遮蔽シートを作製した。なお、「4」の層は、低屈折率樹脂塗布液Gをワイヤーバーコーターにて塗布し、100℃で2分間乾燥させることによって溶媒を蒸発させた後、UV照射によって作製した。
(赤外吸収色素合成例)
実施例6と同様にして、赤外吸収色素を2.3部得た。
前記合成した赤外吸収色素0.02部、KAYARAD DPHA1部、イルガキュア184 0.05部、及びアミノアルキルメタクリレート共重合体分散剤0.01部をトルエン7部中に加え、ビーズミルを用いて周速10m/sにて分散させ、赤外吸収色素層を形成するための赤外吸収色素含有塗布液を作製した。
前記作製した赤外吸収色素層上に実施例10と同様にして積層膜を積層し、本発明の一実施例に係る赤外線遮蔽シートを作製した。
(コレステリック液晶膜作製)
まず、実施例7と同様にして、実施例1の積層膜の作製に使用したのと同じPET基材上に第1及び第2のコレステリック液晶層を作製した。
積層膜が反射させる光の波長を1000nmに設定し、積層膜中における各層の並び順を反転させ、PET基材における、前記作製したコレステリック液晶層側の面とは反対の面上に、各層の、1000nmの波長における光学厚さ及びそのQWOT係数が表6の値になるように各層を積層した以外は実施例13と同様にして、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が6である本発明の一実施例に係る赤外線遮蔽シートを作製した。
(低屈折率層の作製)
まず、比較例1と同様にして、低屈折率層塗布液Eを調製した。
積層膜が反射させる光の波長を1000nmに設定し、表2の「2」「4」「6」「8」の層の作製に使用する塗布液を低屈折率樹脂塗布液Eに変更し、各層の、1000nmの波長における光学厚さ及びそのQWOT係数が表7の値になるように各層を積層した以外は実施例10と同様にして、高屈折率樹脂層及び低屈折率樹脂層の層数の合計が8である比較用の赤外線遮蔽シートを作製した。
実施例10~実施例15および比較例2の赤外線遮蔽シートの可視光透過率、ヘイズ、及び全日射エネルギーを、実施例1~実施例9および比較例1の赤外線遮蔽シートの可視光透過率、ヘイズ、及び全日射透過率(Tts)の測定と同様にして測定した。これらの測定結果を表8に示す。
(合わせガラス用中間膜の作製)
作製した実施例10の赤外線遮蔽シート上に第一の中間膜であるPVBフィルムを重ね合わせて積層体を得た。得られた積層体の表面側及び裏面側に配置された2つのラミネート用加熱ローラーで、全周(4辺)の赤外線遮蔽シートの端部から1mm以下の位置の積層体を挟圧し、赤外線遮蔽シートと第一の中間膜とを熱圧着して貼り合わせた。このとき、ラミネート用加熱ローラーは、第一の中間膜の裏面のエンボスをつぶさないように中間膜側のラミネートローラーの温度を25℃とし、逆に第一の中間膜の赤外線遮蔽シート側表面のエンボスを十分につぶして第一の中間膜と赤外線遮蔽シートとの接着性を高めるように透明支持体(PET基材)側のラミネート用加熱ローラーの温度を120℃とした。その後、赤外線遮蔽シートにおける第一の中間膜が貼り合わされた面の裏面上に、第二の中間膜であるPVBフィルムを積層し、実施例10の赤外線遮蔽シートを含む合わせガラス用中間膜を作製した。また、実施例10の赤外線遮蔽シートに代えて実施例11~実施例15の赤外線遮蔽シートをそれぞれ用いる以外は上記の合わせガラス用中間膜の作製と同様にして、実施例11~実施例15の赤外線遮蔽シートをそれぞれ含む5種類の合わせガラス用中間膜を作製した。
前記作製した実施例10の赤外線遮蔽シートを用いた合わせガラス用中間膜を、ガラス板/第一の中間膜/赤外線遮蔽シート/第二の中間膜/ガラス板の順序となるように重ね合わせて、2枚のガラス板に合わせガラス用中間膜が挟持された(2枚のガラス板間に合わせガラス用中間膜が挿入された)積層体を製造した。ここで、2枚のガラス板の端部と第一及び第2の中間膜の端部とは同じ位置であった。また、前記ガラス板として、厚さが2mmのガラス板を用いた。得られた、2枚のガラス板に合わせガラス用中間膜が挟持された積層体を、真空下、95℃で30分予備圧着を行った。予備圧着後、ガラス板に挟持された積層体をオートクレーブ内で1.3MPa、120℃の条件で加熱しながら圧着処理し、合わせガラスを作製した。また、実施例10の赤外線遮蔽シートを含む合わせガラス用中間膜に代えて実施例11~実施例15の赤外線遮蔽シートを含む5種類の合わせガラス用中間膜をそれぞれ用いる以外は上記の合わせガラスの作製と同様にして、実施例11~実施例15の赤外線遮蔽シートをそれぞれ含む5種類の合わせガラスを作製した。
2 赤外線遮蔽シート(透明支持体を含んでもよい)
3、3’ 中間膜
4 合わせガラス
5、5’ ガラス板
20 透明支持体
21 高屈折率樹脂層
22 低屈折率樹脂層
23 積層膜
Claims (21)
- 微粒子を含有した高屈折率樹脂層と、微粒子を含有した低屈折率樹脂層とが交互に積層した積層膜を備える赤外線遮蔽シートにおいて、
前記低屈折率樹脂層の少なくとも1層が、550nmの波長での屈折率から780nm~2500nmの任意波長における屈折率を差し引いた値が0.1以上であり、
前記低屈折率樹脂層が、550nm以上前記任意波長以下の任意の波長において前記高屈折率樹脂層よりも低い屈折率を示すことを特徴とする赤外線遮蔽シート。 - 前記高屈折率樹脂層が、550nmの波長での屈折率から780nm~1500nmの任意波長における屈折率を差し引いた値が0.1以下であり、
前記低屈折率樹脂層が、550nmの波長での屈折率から780nm~1500nmの任意波長における屈折率を差し引いた値が0.1以上である請求項1に記載の赤外線遮蔽シート。 - 前記低屈折率樹脂層が、780nm~2500nmの任意波長において前記高屈折率樹脂層よりも低い屈折率を示し、
前記高屈折率樹脂層の少なくとも1層、及び/または前記低屈折率樹脂層の少なくとも1層の、780nm~2500nmの任意波長における光学厚さのQWOT係数が、1.5以上である請求項1に記載の赤外線遮蔽シート。 - 前記高屈折率樹脂層及び前記低屈折率樹脂層の各々の表面抵抗が、1kΩ/□以上であり、
前記高屈折率樹脂層及び前記低屈折率樹脂層の層数の合計が、3以上であり、
前記高屈折率樹脂層及び前記低屈折率樹脂層の各々の780nm~1500nmの任意波長における光学厚さが195nm~375nmである請求項2に記載の赤外線遮蔽シート。 - 前記高屈折率樹脂層及び前記低屈折率樹脂層の各々の表面抵抗が、1kΩ/□以上であり、
前記高屈折率樹脂層及び前記低屈折率樹脂層の層数の合計が、4以上である請求項1乃至4の何れか一項に記載の赤外線遮蔽シート。 - 可視光透過率が50%以上であり、
ヘイズが8%以下である請求項1乃至5の何れか一項に記載の赤外線遮蔽シート。 - 前記高屈折率樹脂層の少なくとも1層が、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステン、酸化ニオブ、酸化セリウム、酸化鉛、酸化亜鉛、ダイヤモンド、ホウ化物、及び窒化物からなる群より選択される少なくとも一種の微粒子を含む請求項1乃至6の何れか一項に記載の赤外線遮蔽シート。
- 前記低屈折率樹脂層の少なくとも1層が、酸化スズ、酸化インジウム、酸化亜鉛、及び酸化タングステンからなる群より選択される少なくとも一種の微粒子を含む請求項1乃至7の何れか一項に記載の赤外線遮蔽シート。
- 前記低屈折率樹脂層の少なくとも1層が、アンチモンドープ酸化スズ、スズドープ酸化インジウム、ガリウムドープ酸化亜鉛、酸素欠乏酸化タングステン、及びセシウムドープ酸化タングステンからなる群より選択される少なくとも一種の微粒子を含む請求項8に記載の赤外線遮蔽シート。
- 前記低屈折率樹脂層の少なくとも1層が、シリカ微粒子を含む請求項8又は9に記載の赤外線遮蔽シート。
- 前記シリカ微粒子が、中空シリカ微粒子である請求項10に記載の赤外線遮蔽シート。
- 前記低屈折率樹脂層の少なくとも1層が、前記群より選択される少なくとも一種の非中空微粒子を含み、
前記低屈折率樹脂層の少なくとも1層が、中空微粒子を含む請求項8又は10に記載の赤外線遮蔽シート。 - 前記高屈折率樹脂層に含有される微粒子の含有率が、前記高屈折率樹脂層全体に対して95重量%以下である請求項1及至12の何れか一項に記載の赤外線遮蔽シート。
- 前記低屈折率樹脂層に含有される微粒子の含有率が、前記低屈折率樹脂層全体に対して95重量%以下である請求項1及至13の何れか一項に記載の赤外線遮蔽シート。
- コレステリック液晶膜、複屈折多層膜、及び赤外線吸収色素からなる群より選択される少なくとも1種をさらに備える請求項1及至14の何れか一項に記載の赤外線遮蔽シート。
- 透明支持体をさらに備え、
前記透明支持体上に前記積層膜が形成されている請求項1及至15の何れか一項に記載の赤外線遮蔽シート。 - 請求項1及至16の何れか一項に記載の赤外線遮蔽シートの製造方法であって、
前記高屈折率樹脂層及び前記低屈折率樹脂層を塗布により形成する工程を含むことを特徴とする赤外線遮蔽シートの製造方法。 - 請求項1乃至16の何れか一項に記載の赤外線遮蔽シートと、
前記赤外線遮蔽シートの少なくとも一方の最外層の上に形成された中間膜とを備える合わせガラス用中間膜。 - 前記中間膜が、ポリビニルブチラールを含む請求項18に記載の合わせガラス用中間膜。
- 請求項18または請求項19に記載の合わせガラス用中間膜と、複数のガラス板とを備え、
前記複数のガラス板間に前記合わせガラス用中間膜が挿入されている合わせガラス。 - 請求項20に記載の合わせガラスを含む窓用部材。
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- 2014-05-16 WO PCT/JP2014/063064 patent/WO2014185518A1/ja active Application Filing
- 2014-05-16 EP EP14797935.5A patent/EP2998769A4/en not_active Withdrawn
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Also Published As
Publication number | Publication date |
---|---|
CN105324689A (zh) | 2016-02-10 |
KR20160011197A (ko) | 2016-01-29 |
TW201502601A (zh) | 2015-01-16 |
RU2648022C2 (ru) | 2018-03-21 |
TWI614540B (zh) | 2018-02-11 |
EP2998769A4 (en) | 2016-12-21 |
US9908306B2 (en) | 2018-03-06 |
RU2015153543A (ru) | 2017-06-19 |
EP2998769A1 (en) | 2016-03-23 |
KR101918571B1 (ko) | 2018-11-14 |
US20160082697A1 (en) | 2016-03-24 |
CN105324689B (zh) | 2018-10-30 |
AU2014266268A2 (en) | 2016-04-21 |
AU2014266268A1 (en) | 2016-01-21 |
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