WO2014065027A1 - 紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法 - Google Patents
紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法 Download PDFInfo
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- WO2014065027A1 WO2014065027A1 PCT/JP2013/074127 JP2013074127W WO2014065027A1 WO 2014065027 A1 WO2014065027 A1 WO 2014065027A1 JP 2013074127 W JP2013074127 W JP 2013074127W WO 2014065027 A1 WO2014065027 A1 WO 2014065027A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J63/00—Cathode-ray or electron-stream lamps
- H01J63/06—Lamps with luminescent screen excited by the ray or stream
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/061—Special surface effect
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7766—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing two or more rare earth metals
- C09K11/7774—Aluminates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/22—Applying luminescent coatings
- H01J9/221—Applying luminescent coatings in continuous layers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1408—Carbocyclic compounds
- C09K2211/1416—Condensed systems
Definitions
- One aspect of the present invention relates to an ultraviolet light generation target, an electron beam excited ultraviolet light source, and a method for manufacturing the ultraviolet light generation target.
- Patent Document 1 describes that a single crystal containing praseodymium (Pr) is used as a material for a scintillator used in a PET apparatus.
- Patent Document 2 describes a technique related to an illumination system that realizes white light by converting the wavelength of light emitted from a light emitting diode by a phosphor.
- ultraviolet light sources such as mercury xenon lamps and deuterium lamps have been used as ultraviolet light sources.
- these ultraviolet light sources have low luminous efficiency, are large, and have problems in terms of stability and life.
- mercury xenon lamp there is concern about the environmental impact of mercury.
- an electron beam excitation ultraviolet light source having a structure that excites ultraviolet light by irradiating an electron beam to a target.
- Electron-excited ultraviolet light sources are expected to be used in the field of optical measurement that makes use of high stability, sterilization and disinfection that make use of low power consumption, or medical light sources and biochemical light sources that make use of high wavelength selectivity. Yes.
- the electron beam excitation ultraviolet light source has an advantage that power consumption is smaller than that of a mercury lamp or the like.
- the electron beam excitation ultraviolet light source can generate sufficiently intense ultraviolet light, and has a large area and uniform intensity by increasing the diameter of the electron beam irradiated to the target. Ultraviolet light can be output.
- An object of one aspect of the present invention is to provide a target for generating ultraviolet light, an electron beam-excited ultraviolet light source, and a method for manufacturing the target for generating ultraviolet light capable of increasing the efficiency of generating ultraviolet light.
- an ultraviolet light generation target includes a substrate that transmits ultraviolet light, a light-emitting layer that is provided on the substrate and generates ultraviolet light by receiving an electron beam.
- the light emitting layer includes a rare earth-containing aluminum garnet crystal that is powdery or granular and to which an activator is added, and the light emitting layer has an ultraviolet emission peak wavelength of 300 nm or less.
- the present inventor considered using a rare earth-containing aluminum garnet crystal to which an activator was added as a target for generating ultraviolet light.
- the rare earth-containing aluminum garnet crystal to which the activator was added was made into a powder form or a granular form, and this was formed into a film form, thereby significantly increasing the ultraviolet light generation efficiency. It has been found that it can be enhanced. That is, according to the ultraviolet light generation target according to one aspect of the present invention, the light emitting layer includes a rare earth-containing aluminum garnet crystal that is powdery or granular and to which an activator is added. Can be enhanced.
- the surface of the rare earth-containing aluminum garnet crystal may be covered with a crystal melted layer melted by heat treatment and solidified again.
- the activator may be a rare earth element.
- the target for generating ultraviolet light may be a rare earth-containing aluminum garnet crystal made of LuAG, and the activator may be at least one of scandium (Sc), lanthanum (La), and bismuth (Bi).
- the rare earth-containing aluminum garnet crystal may be YAG, and the activator may be at least one of Sc and La.
- the ultraviolet light generation target may have a light emitting layer thickness of 0.5 ⁇ m to 30 ⁇ m. According to the test and research by the present inventors, when the light emitting layer has such a thickness, the ultraviolet light generation efficiency can be increased more effectively.
- the ultraviolet light generation target may have a median diameter of the rare earth-containing aluminum garnet crystal of 0.5 ⁇ m or more and 30 ⁇ m or less. According to the test and research by the present inventors, when the light emitting layer has such a particle size, the ultraviolet light generation efficiency can be more effectively increased.
- the rare earth-containing aluminum garnet crystals and the rare earth-containing aluminum garnet crystals and the substrate may be fused to each other by the crystal melting layer.
- the substrate may be made of sapphire, quartz or quartz.
- transmits a board
- an electron beam excitation ultraviolet light source includes any one of the above ultraviolet light generation targets and an electron source that applies an electron beam to the ultraviolet light generation target. According to this electron beam excitation ultraviolet light source, the ultraviolet light generation efficiency can be increased by providing any one of the above ultraviolet light generation targets.
- a method for producing a target for generating ultraviolet light includes a rare earth-containing aluminum garnet crystal that is powdery or granular and has an ultraviolet light emission peak wavelength of 300 nm or less added with an activator.
- the surface of the rare earth-containing aluminum garnet crystal is melted and solidified again to form a crystal melt layer.
- the rare earth-containing aluminum garnet crystals and the rare earth-containing aluminum garnet crystal and the substrate are fused to each other by the crystal melting layer. Mechanical strength can be obtained, and the bond strength between the light emitting layer and the substrate can be increased to prevent the light emitting layer from peeling off.
- the heat treatment temperature may be 1400 ° C. or more and 2000 ° C. or less.
- the ultraviolet light generation efficiency can be increased.
- FIG. 1 is a schematic diagram showing an internal configuration of an electron beam excitation ultraviolet light source 10 according to the present embodiment.
- an electron source 12 and an extraction electrode 13 are disposed on the upper end side inside a vacuum evacuated glass container (electron tube) 11.
- an appropriate extraction voltage is applied between the electron source 12 and the extraction electrode 13 from the power supply unit 16
- the electron beam EB accelerated by the high voltage is emitted from the electron source 12.
- an electron source that emits a large area electron beam for example, a cold cathode such as a carbon nanotube or a hot cathode
- a cold cathode such as a carbon nanotube or a hot cathode
- an ultraviolet light generation target 20 is disposed on the lower end side inside the container 11.
- the ultraviolet light generation target 20 is set to a ground potential, for example, and a negative high voltage is applied to the electron source 12 from the power supply unit 16. Thereby, the electron beam EB emitted from the electron source 12 is irradiated to the ultraviolet light generation target 20.
- the ultraviolet light generation target 20 is excited by receiving this electron beam EB, and generates ultraviolet light UV having an ultraviolet emission peak wavelength of 300 nm or less.
- FIG. 2 is a side view showing the configuration of the ultraviolet light generation target 20.
- the ultraviolet light generation target 20 includes a substrate 21, a light emitting layer 22 provided on the substrate 21, and an aluminum film 23 provided on the light emitting layer 22.
- the substrate 21 is a plate-shaped member made of a material that transmits ultraviolet light (particularly, having a wavelength of 300 nm or less).
- the substrate 21 is sapphire (Al 2 O 3 ), quartz (SiO 2 ), or quartz (crystal of silicon oxide). , Rock crystal).
- the substrate 21 has a main surface 21a and a back surface 21b.
- a suitable thickness of the substrate 21 is 0.1 mm or more and 10 mm or less.
- the light emitting layer 22 is excited by receiving the electron beam EB shown in FIG. 1, and generates ultraviolet light UV having an ultraviolet emission peak wavelength of 300 nm or less.
- the light emitting layer 22 includes a rare earth-containing aluminum garnet crystal that is powdery or granular and to which an activator is added.
- the rare earth-containing aluminum garnet crystal for example, Lu 3 Al 5 O 12 (LuAG) and Y 3 Al 5 O 12 (YAG) are suitable.
- the activator is preferably a rare earth element.
- the rare earth-containing aluminum garnet crystal is LuAG, the activator is preferably at least one of scandium (Sc), lanthanum (La), and bismuth (Bi).
- the rare earth-containing aluminum garnet crystal is YAG, the activator is preferably at least one of Sc and La.
- FIG. 3 is a chart showing specific examples of rare earth-containing aluminum garnet crystals to which an activator is added, which can be used for the light emitting layer 22 of the present embodiment.
- FIG. 3 shows the ultraviolet emission peak wavelength (unit: nm) corresponding to the combination of each activator and each base material.
- examples of rare earth-containing aluminum garnet crystals to which an activator is added include La: LuAG, Sc: LuAG, Bi: LuAG, La: YAG, and Sc: YAG. Note that these ultraviolet emission peak wavelengths vary depending on the concentration of the activator.
- the rare earth-containing aluminum garnet crystal contained in the light emitting layer 22 may be either single crystal or polycrystalline, and both may be mixed. Further, different kinds of rare earth-containing aluminum garnet crystals (for example, LuAG and YAG) may be mixed, and different kinds of activators (for example, at least two of La, Sc, and Bi) may be mixed.
- different kinds of rare earth-containing aluminum garnet crystals for example, LuAG and YAG
- different kinds of activators for example, at least two of La, Sc, and Bi
- the surface of the rare earth-containing aluminum garnet crystal is covered with a crystal molten layer that has been melted and solidified again by heat treatment.
- the suitable thickness of the light emitting layer 22 is 0.5 micrometer or more and 30 micrometers or less.
- the suitable median diameter of the light emitting layer 22 is 0.5 micrometer or more and 30 micrometers or less.
- the concentration of the activator contained in the rare earth-containing aluminum garnet crystal is preferably 0.05 atomic percent or more and 2.0 atomic percent or less, and if it is 0.1 atomic percent or more and 1.0 atomic percent or less. Further preferred.
- the ultraviolet light generation efficiency can be remarkably increased as compared with the case.
- the light emitting layer 22 includes a rare earth-containing aluminum garnet crystal that is powdery or granular and to which an activator is added, so that the ultraviolet light generation efficiency can be effectively increased. it can.
- the surface of the rare earth-containing aluminum garnet crystal is preferably covered with a crystal melt layer melted by heat treatment and solidified again.
- the rare earth-containing aluminum garnet crystals and the rare earth-containing aluminum garnet crystals and the substrate 21 are fused together, so that sufficient mechanical properties of the light emitting layer 22 can be obtained without using a binder.
- the strength can be obtained, and the bonding strength between the light emitting layer 22 and the substrate 21 can be increased to prevent the light emitting layer 22 from peeling off.
- the light emitting layer 22 of the present embodiment can be formed by a method such as depositing powdery or granular rare earth-containing aluminum garnet crystals on the substrate 21, the ultraviolet light generating target 20 having a large area can be easily formed. Can be produced.
- the substrate 22 is preferably made of sapphire, quartz or quartz. Thereby, the ultraviolet light is transmitted through the substrate 21 and the substrate 21 can withstand the temperature at the time of heat treatment of the light emitting layer 22.
- the rare earth-containing aluminum garnet crystal may be LuAG, and the activator may be at least one of Sc, La, and Bi.
- the rare earth-containing aluminum garnet crystal may be YAG, and the activator may be at least one of Sc and La.
- Another light emitting layer was formed by depositing a powdery or granular Sc: LuAG single crystal on the other sapphire substrate by a precipitation method. Thereafter, an organic film (nitrocellulose) was formed on these light emitting layers, and an aluminum film was deposited on the organic film. Finally, by baking, the organic film was decomposed and vaporized, so that the aluminum film was in contact with the light emitting layer.
- the thickness of each light emitting layer after firing was 10 ⁇ m.
- FIG. 4 is a graph showing a spectrum of ultraviolet light obtained by irradiating an electron beam to a target for generating ultraviolet light having a light emitting layer containing a powdery or granular La: LuAG single crystal produced according to this example. It is.
- FIG. 5 shows the spectrum of the ultraviolet light obtained by irradiating the target for generating ultraviolet light with the light emitting layer containing the powdery or granular Sc: LuAG single crystal produced in this example with an electron beam. It is a graph to show. In these graphs, the electron beam acceleration voltage was 10 kV, the electron beam intensity (current amount) was 50 ⁇ A, and the electron beam diameter was 2 mm.
- the intensity at the ultraviolet emission peak wavelength is about 0.2 (the unit is the same as in FIGS. 4 and 5). It becomes.
- the light emitting layer containing the powdery or granular La: LuAG single crystal and the light emitting layer containing the powdery or granular Sc: LuAG single crystal according to the present embodiment have a plate-like shape.
- the peak intensity of ultraviolet light generated by electron beam irradiation is remarkably increased (that is, the luminous efficiency is remarkably increased).
- FIG. 6 is a graph showing the emission spectrum (graph G11) of the light emitting layer containing the powdered or granular Sc: LuAG single crystal and the bactericidal effect curve (graph G12) of the light emitting layer. Further, FIG. 6 also shows a sterilization line (wavelength 253.7 nm) G13 using an existing mercury lamp. As shown in the figure, the Sc: LuAG single crystal has an effective bactericidal effect in a wide wavelength range from 200 nm to 300 nm. In addition, since the sterilization line of the existing mercury lamp is not the best wavelength for sterilization, the luminescent layer containing powdered or granular Sc: LuAG single crystal is more effectively sterilized compared to the existing mercury lamp. Can be performed.
- a sapphire substrate having a diameter of 12 mm and a thickness of 2 mm was prepared.
- a Pr: LuAG single crystal substrate which is a rare earth-containing aluminum garnet crystal to which Pr is added as an activator, is prepared, and this Pr: LuAG single crystal substrate is pulverized using a mortar to obtain a powdery or granular form Pr: LuAG single crystals were prepared.
- a powdered or granular Pr: LuAG single crystal, pure water, a potassium silicate (K 2 SiO 3 ) aqueous solution and a barium acetate aqueous solution as a binder material are mixed, the mixed solution is applied onto a sapphire substrate, and settled.
- a Pr: LuAG single crystal and a binder material were deposited on a sapphire substrate by the method to form a light emitting layer.
- an organic film (nitrocellulose) was formed on the light emitting layer, and an aluminum film was formed on the organic film by vacuum deposition.
- the organic film was decomposed and vaporized by baking the light emitting layer at 350 ° C. in the atmosphere, so that the aluminum film was in contact with the light emitting layer.
- a sapphire substrate having a diameter of 12 mm and a thickness of 2 mm was prepared.
- four LuAG single crystal substrates to which Pr, Sc, La, and Bi were added as activators were prepared, and these single crystal substrates were pulverized using a mortar to obtain powder or granules. .
- Each powdery or granular LuAG single crystal containing Pr, Sc, La, and Bi as an activator is mixed with a solvent (ethanol), the mixture is applied onto a sapphire substrate, and then the solvent is dried. It was. In this way, a powdery or granular single crystal was deposited on the sapphire substrate to form a light emitting layer. Subsequently, heat treatment (1600 ° C.) of the light emitting layer was performed in a reduced pressure atmosphere. This heat treatment is to increase the adhesion of the light emitting layer by melting the surface of the powdery or granular single crystal and fusing the crystal particles and the crystal particles to the surface of the sapphire substrate. Was done.
- an organic film (nitrocellulose) was formed on the light emitting layer, and an aluminum film was formed on the organic film by vacuum deposition. Finally, the organic film was decomposed and vaporized by baking the light emitting layer at 350 ° C. in the atmosphere, so that the aluminum film was in contact with the light emitting layer.
- FIG. 7 is a graph showing changes over time in the light emission intensity of the light emitting layer formed using the binder and the light emission intensity of the light emitting layer (Pr: LuAG) formed by the heat treatment.
- the vertical axis represents the normalized emission intensity (initial value is 1.0), and the horizontal axis represents the electron beam irradiation time (unit: time) on a logarithmic scale.
- a graph G81 shows a graph of a light emitting layer formed using a binder, and a graph G82 shows a graph of a light emitting layer (Pr: LuAG) formed by heat treatment.
- the acceleration voltage of the electron beam was 10 kV
- the intensity (current amount) of the electron beam was 200 ⁇ A.
- the light emitting layer contains a binder material in addition to the Pr: LuAG crystal.
- this light emitting layer is irradiated with a strong energy electron beam, the temperature rises and X-rays are generated, and the binder material is altered and decomposed due to the influence of the high temperature and X-rays.
- the altered binder material adhering to the crystal surface absorbs ultraviolet light from the crystal, so that the amount of light emitted to the outside is considered to decrease.
- the binder material is not included in the light emitting layer, the binder material is not altered or decomposed, and the transmittance of ultraviolet light is maintained for a relatively long time. It is done. Therefore, it is desirable to form the light emitting layer by heat treatment.
- FIG. 8 is a graph showing a change with time of emission intensity when a light emitting layer containing a powdered or granular Sc: LuAG single crystal is heat-treated in the same manner as described above.
- the electron beam acceleration voltage was 10 kV
- the electron beam intensity (current amount) was 200 ⁇ A
- the electron beam diameter was 2 mm.
- the change over time in the emission intensity is markedly compared with the graph G81 of FIG. It has become smaller.
- the binder layer is not included in the light emitting layer, the generation of energy rays different from ultraviolet light is suppressed, and the binder material is not deteriorated, so that damage to the substrate is reduced and the transmittance of ultraviolet light is compared. It is thought that it was maintained for a long time. Further, as shown in FIG. 8, in this embodiment, a lifetime of 200 hours or more can be realized, and a lifetime of 1000 hours or more is expected.
- Such an effect is obtained by adding the same activator-containing rare earth-containing aluminum garnet crystal as Pr: LuAG single crystal and Sc: LuAG single crystal, for example, La: LuAG single crystal, Bi: LuAG single crystal, La: YAG single crystal, and It is considered that it can be obtained similarly in the case of Sc: YAG single crystal.
- FIG. 9 to FIG. 12 are electron microscope (SEM) photographs taken of the state of the crystal particles (Sc: LaAG crystal particles) in the active layer after heat treatment when the activator is Sc.
- FIG. 13 to FIG. 16 are SEM photographs taken of the state of the crystal particles (La: LaAG crystal particles) in the active layer after heat treatment when the activator is La.
- FIGS. 17 to 20 are SEM photographs of the state of the crystal particles (Bi: LaAG crystal particles) in the active layer after heat treatment when the activator is Bi.
- (a) shows the state before heat treatment
- (b) shows the state after heat treatment at the same location as (a).
- the enlargement magnification in FIGS. 9 to 20 is 5000 times.
- the crystal grains after the heat treatment are melted and solidified again as compared with those before the heat treatment.
- the crystal melt layer melted and solidified again by the heat treatment covers the surface of the crystal particles. Since the crystal melt layers of adjacent crystal particles are fused to each other, the crystal particles are firmly bonded to each other, so that the mechanical strength of the light emitting layer can be increased without using the binder described above. .
- FIG.21 and FIG.22 is the SEM photograph which image
- (a) shows a case where a light emitting layer formed by heat treatment is peeled off
- (b) shows a case where a light emitting layer formed using a binder (not heat treated) is peeled off. Is shown. In this example, the light emitting layer was removed by strongly rubbing the light emitting layer using Bencott (registered trademark).
- the Pr: LuAG crystal cannot be completely removed, and the Pr: LuAG is formed on the surface of the sapphire substrate. A crystal melt layer of crystals remains.
- the Pr: LuAG crystal can be completely removed when the light emitting layer formed using the binder (not heat-treated) is peeled off. Yes, only the surface of the sapphire substrate is shown.
- the heat treatment temperature for the light emitting layer is 1600 ° C., but the heat treatment temperature is preferably 1400 ° C. or more, and preferably 2000 ° C. or less.
- the temperature of the heat treatment is 1400 ° C. or more, the crystal melt layer on the surface of the crystal particles is formed to a sufficient thickness, the adhesion between the crystal particles and between the crystal particles and the substrate is increased, and the electron beam irradiation Peeling of the light emitting layer can be effectively prevented.
- the temperature of heat processing is 2000 degrees C or less, the change of a crystal structure can be suppressed and the fall of luminous efficiency can be prevented.
- deformation of the substrate particularly the sapphire substrate
- the effect on the mechanical strength as described above is that the same activator-added rare earth-containing aluminum garnet crystal as in the Pr: LuAG single crystal, for example, La: LuAG single crystal, Sc: LuAG single crystal, Bi: LuAG single crystal, It is considered that a La: YAG single crystal and a Sc: YAG single crystal can be obtained similarly.
- a synthetic quartz substrate and a sapphire substrate were prepared in order to investigate the influence of the substrate material of the ultraviolet light generation target.
- a substrate having a diameter of 18.6 mm and a thickness of 1.2 mm was prepared as a synthetic quartz substrate.
- a substrate having a diameter of 18 mm and a thickness of 0.43 mm was prepared. Then, on these substrates, a light emitting layer containing a powdered or granular Pr: LuAG single crystal and an aluminum film were produced by the same method as in the first example.
- FIG. 23 is a graph showing the relationship between the amount of current and the peak intensity of ultraviolet light when an electron beam is irradiated to the light emitting layer produced on each substrate.
- a graph G21 is a graph relating to a light emitting layer manufactured on a synthetic quartz substrate.
- Graph G22 is a graph relating to the light emitting layer fabricated on the sapphire substrate.
- the increase rate of the light emission intensity decreased as the amount of current increased.
- the light emitting layer produced on the sapphire substrate showed good linearity without decreasing the increase rate even when the amount of current increased. Such a result is considered to be due to the fact that the sapphire substrate has better thermal conductivity than the synthetic quartz substrate.
- the above-mentioned result in this example is that the same activator-added rare earth-containing aluminum garnet crystal as that of Pr: LuAG single crystal, for example, La: LuAG single crystal, Sc: LuAG single crystal, Bi: LuAG single crystal, La: YAG The same is considered for the single crystal and the Sc: YAG single crystal.
- FIG. 24 is a graph showing the relationship between the light-emitting layer thickness and the peak intensity of ultraviolet light as a result.
- a curve G31 in the figure is an approximate curve.
- the electron beam acceleration voltage was 10 kV
- the electron beam intensity (current amount) was 50 ⁇ A
- the electron beam diameter was 2 mm.
- the thickness of the light emitting layer is below a certain value (about 12 ⁇ m), the thicker the light emitting layer, the higher the peak intensity of ultraviolet light, and the higher the light emission efficiency. However, when the thickness of the light emitting layer exceeds the value, the peak intensity of the ultraviolet light is decreased. Further, from this graph, in order to obtain a sufficiently practical ultraviolet light intensity (light emission efficiency), the thickness of the light emitting layer is preferably 0.5 ⁇ m or more and 30 ⁇ m or less, and more preferably 6 ⁇ m or more and 20 ⁇ m or less. It turns out that it is preferable.
- the above-mentioned result in this example is that the same activator-added rare earth-containing aluminum garnet crystal as that of Pr: LuAG single crystal, for example, La: LuAG single crystal, Sc: LuAG single crystal, Bi: LuAG single crystal, La: YAG The same is considered for the single crystal and the Sc: YAG single crystal.
- FIG. 25 is a graph showing the relationship between the median diameter of the Pr: LuAG crystal and the peak intensity of ultraviolet light as the result.
- a curve G41 in the figure is an approximate curve.
- the acceleration voltage of the electron beam was 10 kV
- the electron beam intensity (current amount) was 70 ⁇ A
- the electron beam diameter was 2 mm.
- the median diameter of the Pr: LuAG crystal exceeds 1.6 ⁇ m, the increase rate of the peak intensity of the ultraviolet light can be kept small.
- the median diameter of the Pr: LuAG crystal is 0.5 ⁇ m or more, sufficiently practical ultraviolet light intensity (luminous efficiency) can be obtained. If the median diameter of the Pr: LuAG crystal is smaller than 0.5 ⁇ m, it is considered that the luminous efficiency is lowered due to the following reasons (1) to (3).
- the light emitted from the light emitting layer is scattered by the Pr: LuAG crystal particles, but if the median diameter of the Pr: LuAG crystal is smaller than 0.5 ⁇ m, the scattering by the crystal particles increases, so that the light passes through the light emitting layer. The ratio of light output will decrease.
- the defect density is higher near the surface of the Pr: LuAG crystal particle than inside the particle, the luminous efficiency near the particle surface is lower than the luminous efficiency inside the particle. If the total volume of the Pr: LuAG crystal is constant, the surface area of the Pr: LuAG crystal increases as the particle size of the Pr: LuAG crystal particle decreases.
- the median diameter of the Pr: LuAG crystal is smaller than 0.5 ⁇ m, the ratio of the portion having a high defect density and a low light emission efficiency increases, and the light emission efficiency decreases. (3) If the median diameter of the Pr: LuAG crystal is smaller than 0.5 ⁇ m, the heat dissipation efficiency at the time of electron beam irradiation is lowered, so that the temperature of the Pr: LuAG crystal is increased and the luminous efficiency is lowered.
- the median diameter of the Pr: LuAG crystal is preferably 30 ⁇ m or less.
- the median diameter of the Pr: LuAG crystal is 30 ⁇ m or less, peeling of the Pr: LuAG crystal from the substrate can be suppressed when the Pr: LuAG crystal is deposited on the substrate.
- the above results in this example are the same activator-added rare earth-containing aluminum garnet crystals as Pr: LuAG single crystals, for example, La: LuAG single crystals, Sc: LuAG single crystals, Bi: LuAG single crystals, La: YAG The same is considered for the single crystal and the Sc: YAG single crystal.
- a graph G51 in FIG. 26 is a graph showing a spectrum of ultraviolet light obtained by irradiating an ultraviolet light generation target manufactured according to this example with an electron beam.
- a graph G52 is also shown for comparison.
- Graph G52 is a spectrum of ultraviolet light obtained by irradiating an electron beam onto a Pr: LuAG polycrystalline plate having an aluminum film deposited on the surface.
- the peak intensity of ultraviolet light generated by electron beam irradiation is higher than that of the Pr: LuAG polycrystal plate. It can be seen that it is significantly increased (that is, the luminous efficiency is significantly increased).
- the above-mentioned result in this example is that the same activator-added rare earth-containing aluminum garnet crystal as that of Pr: LuAG single crystal, for example, La: LuAG single crystal, Sc: LuAG single crystal, Bi: LuAG single crystal, La: YAG The same is considered for the single crystal and the Sc: YAG single crystal.
- FIG. 27 plots the results on a graph in which the vertical axis indicates the peak intensity and the horizontal axis indicates the light emitting layer thickness (logarithmic scale).
- FIG. 28 is a graph in which the value obtained by dividing the film thickness by the median diameter (that is, the number of layers of Pr: LuAG crystal particles) is represented on the horizontal axis (logarithmic scale), and curves G61, G62, and G63 is an approximate curve for median diameters of 0.5 ⁇ m, 1.0 ⁇ m, and 6.5 ⁇ m, respectively.
- FIGS. 29A to 29C are diagrams schematically showing the Pr: LuAG crystal particles 22a deposited on the substrate 21.
- the thickness at which the peak intensity increases (that is, the luminous efficiency increases) varies depending on the median diameter of the Pr: LuAG crystal. That is, when the median diameter of the Pr: LuAG crystal is 0.5 ⁇ m, the thickness at which the peak intensity of the ultraviolet light is highest is 3 ⁇ m, and the number of layers at that time is 6 (FIG. 29A). .
- the thickness range in which a sufficiently practical peak intensity can be obtained is 0.5 ⁇ m or more and 5 ⁇ m or less.
- the median diameter of the Pr: LuAG crystal is 1.0 ⁇ m
- the thickness at which the peak intensity of the ultraviolet light is highest is 3 ⁇ m, and the number of layers at that time is 3 (FIG. 29B). .
- the thickness range in which sufficiently practical peak intensity can be obtained is 1 ⁇ m or more and 10 ⁇ m or less.
- the thickness at which the peak intensity of the ultraviolet light is highest is 10 ⁇ m, and the number of layers at that time is about 1.5 (see FIG. 29 ( c)).
- the thickness range in which sufficiently practical peak intensity can be obtained is 3 ⁇ m or more and 30 ⁇ m or less.
- FIG. 30 is a graph showing the relationship between the median diameter of the Pr: LuAG crystal and the peak intensity of ultraviolet light in this example.
- the median diameter of the Pr: LuAG crystal when the median diameter of the Pr: LuAG crystal is less than 6.5 ⁇ m, the peak intensity of ultraviolet light increases as the median diameter increases, and the luminous efficiency increases. However, when the median diameter exceeds 6.5 ⁇ m, the peak intensity of the ultraviolet light is decreased. From this graph, it can be seen that the preferred range of the median diameter of the Pr: LuAG crystal for increasing the luminous efficiency of ultraviolet light is 0.5 ⁇ m or more and 100 ⁇ m or less. However, if the median diameter exceeds 30 ⁇ m, the adhesion between the Pr: LuAG crystal particles and the substrate is weakly peeled off, and therefore, the preferred range of practical median diameter is 0.5 ⁇ m or more and 30 ⁇ m or less.
- the above-mentioned result in this example is that the same activator-added rare earth-containing aluminum garnet crystal as that of Pr: LuAG single crystal, for example, La: LuAG single crystal, Sc: LuAG single crystal, Bi: LuAG single crystal, La: YAG The same is considered for the single crystal and the Sc: YAG single crystal.
- the production method of the ultraviolet light generation target, the electron beam excitation ultraviolet light source, and the ultraviolet light generation target according to one aspect of the present invention is not limited to the above-described embodiment, and various other modifications are possible.
- the aluminum film is vapor-deposited on the light emitting layer in the embodiment and each example, the aluminum film may be omitted in the embodiment and each example.
- the aluminum film functions as an antistatic conductive film, and may be a conductive film other than aluminum.
- the ultraviolet light generation efficiency can be increased.
- Electron beam excitation ultraviolet light source 11 ... Container, 12 ... Electron source, 13 ... Extraction electrode, 16 ... Power supply part, 20 ... Target for ultraviolet light generation, 21 ... Substrate, 21a ... Main surface, 21b ... Back surface, 22 ... Light emitting layer, 23 ... aluminum film, EB ... electron beam, UV ... ultraviolet light.
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Abstract
Description
続いて、上記実施形態の第1実施例について説明する。本実施例では、まず、直径12mm、厚さ2mmのサファイア基板を2枚準備した。次に、La:LuAG単結晶基板およびSc:LuAG単結晶基板を準備し、乳鉢を用いてこれらの単結晶基板を粉砕することにより、La:LuAG単結晶及びSc:LuAG単結晶を粉末状又は粒状とした。続いて、粉末状又は粒状のLa:LuAG単結晶を沈降法により一方のサファイア基板上に堆積させることにより、発光層を形成した。また、粉末状又は粒状のSc:LuAG単結晶を沈降法により他方のサファイア基板上に堆積させることにより、別の発光層を形成した。その後、これらの発光層の上に有機膜(ニトロセルロース)を形成し、その有機膜上にアルミニウム膜を蒸着した。最後に、焼成することにより、有機膜を分解し気化させて、発光層にアルミニウム膜が接する構造とした。焼成後における各発光層の厚さは、10μmであった。
続いて、上記実施形態の第2実施例について説明する。本実施例では、バインダを利用した発光層の形成と、バインダを利用しない、熱処理による発光層の形成とを説明する。
先ず、直径12mm、厚さ2mmのサファイア基板を準備した。次に、付活剤としてPrが添加された希土類含有アルミニウムガーネット結晶であるPr:LuAG単結晶基板を準備し、乳鉢を用いてこのPr:LuAG単結晶基板を粉砕することにより、粉末状又は粒状のPr:LuAG単結晶を作製した。
先ず、直径12mm、厚さ2mmのサファイア基板を準備した。次に、付活剤としてPr、Sc、La、及びBiがそれぞれ添加された4つのLuAG単結晶基板を準備し、乳鉢を用いてこれらの単結晶基板を粉砕することにより粉末状又は粒状とした。
続いて、上記実施形態の第3実施例について説明する。本実施例では、紫外光発生用ターゲットの基板材料による影響について調べるために、合成石英基板と、サファイア基板とを準備した。合成石英基板としては、直径18.6mm、厚さ1.2mmの基板を準備した。また、サファイア基板としては、直径18mm、厚さ0.43mmの基板を準備した。そして、これらの基板上に、粉末状又は粒状のPr:LuAG単結晶を含む発光層とアルミニウム膜とを、第1実施例と同様の方法により作製した。
続いて、上記実施形態の第4実施例について説明する。本実施例では、第1実施例と同様の方法によって紫外光発生用ターゲットを作製し、発光層の厚さと紫外光のピーク強度との関係について実験を行った。すなわち、様々な厚さでもって粉末状又は粒状のPr:LuAG結晶を堆積させて発光層を作製し、それらの発光層に電子線を照射して発生する紫外光のピーク強度を計測したのち、それらの発光層の断面をSEMを用いて観察することによって厚さを測定した。図24は、その結果である発光層の厚さと紫外光のピーク強度との関係を示すグラフである。なお、図中の曲線G31は、近似曲線である。また、図24では、電子線の加速電圧を10kVとし、電子線の強さ(電流量)を50μAとし、電子線の径を2mmとした。
続いて、上記実施形態の第5実施例について説明する。本実施例では、発光層に含まれる粉末状又は粒状のPr:LuAG結晶のメディアン径と紫外光のピーク強度との関係について実験を行った。すなわち、粉末状又は粒状のPr:LuAG結晶を堆積させて複数の基板上に発光層を作製し、それらの発光層に電子線を照射して発生する紫外光のピーク強度を計測した。なお、発光層に含まれるPr:LuAG結晶のメディアン径は、基板上に堆積させる前に粒度分布計を用いて測定した。図25は、その結果であるPr:LuAG結晶のメディアン径と紫外光のピーク強度との関係を示すグラフである。なお、図中の曲線G41は、近似曲線である。また、図25では、電子線の加速電圧を10kVとし、電子線の強さ(電流量)を70μAとし、電子線の径を2mmとした。
続いて、上記実施形態の第6実施例について説明する。本実施例では、まず、Prを0.7原子パーセント含有する多結晶板を作製した。次に、この多結晶板を乳鉢を用いて粉砕することにより、粉末状又は粒状のPr:LuAG多結晶を作製した。続いて、この粉末状又は粒状のPr:LuAG多結晶を、沈降法により合成石英基板上に堆積させることにより、発光層を形成した。その後、この発光層の上に有機膜(ニトロセルロース)を形成し、その有機膜上にアルミニウム膜を蒸着した。最後に、焼成することにより、有機膜を分解し気化させて、発光層にアルミニウム膜が接する構造とした。焼成後における発光層の厚さは、10μmであった。
続いて、上記実施形態の第7実施例について説明する。本実施例では、発光層に含まれる粉末状又は粒状のPr:LuAG結晶のメディアン径が様々な値を有する場合に、発光層の厚さと紫外光のピーク強度との関係について実験を行った。すなわち、メディアン径が0.5μm、1.0μm、6.5μm、及び30μmであるPr:LuAG結晶をそれぞれ堆積させ、各メディアン径において厚さが異なる複数の発光層を作製し、それらの発光層に電子線を照射して発生する紫外光のピーク強度を計測した。なお、発光層に含まれるPr:LuAG結晶のメディアン径は、基板上に堆積させる前に粒度分布計を用いて測定した。
Claims (12)
- 紫外光を透過する基板と、
前記基板上に設けられ、電子線を受けて紫外光を発生する発光層と、
を備え、
前記発光層が、粉末状または粒状であり付活剤が添加された希土類含有アルミニウムガーネット結晶を含み、該発光層の紫外発光ピーク波長が300nm以下である、紫外光発生用ターゲット。 - 前記希土類含有アルミニウムガーネット結晶の表面が、熱処理によって溶融し再び固化した結晶溶融層に覆われている、請求項1に記載の紫外光発生用ターゲット。
- 前記結晶溶融層によって、前記希土類含有アルミニウムガーネット結晶同士、および前記希土類含有アルミニウムガーネット結晶と前記基板とが互いに融着している、請求項2に記載の紫外光発生用ターゲット。
- 前記付活剤が希土類元素である、請求項1~3のいずれか一項に記載の紫外光発生用ターゲット。
- 前記希土類含有アルミニウムガーネット結晶がLuAGであり、前記付活剤がSc、La、及びBiのうち少なくとも一つである、請求項1~3のいずれか一項に記載の紫外光発生用ターゲット。
- 前記希土類含有アルミニウムガーネット結晶がYAGであり、前記付活剤がSc及びLaのうち少なくとも一つである、請求項1~3のいずれか一項に記載の紫外光発生用ターゲット。
- 前記発光層の厚さが0.5μm以上30μm以下である、請求項1~6のいずれか一項に記載の紫外光発生用ターゲット。
- 前記希土類含有アルミニウムガーネット結晶のメディアン径が0.5μm以上30μm以下である、請求項1~7のいずれか一項に記載の紫外光発生用ターゲット。
- 前記基板が、サファイア、石英または水晶から成る、請求項1~8のいずれか一項に記載の紫外光発生用ターゲット。
- 請求項1~9のいずれか一項に記載された紫外光発生用ターゲットと、
前記紫外光発生用ターゲットに電子線を与える電子源と、
を備える、電子線励起紫外光源。 - 粉末状または粒状であり、付活剤が添加されて紫外発光ピーク波長が300nm以下である希土類含有アルミニウムガーネット結晶を、紫外光を透過する基板上に堆積させ、前記希土類含有アルミニウムガーネット結晶に対して熱処理を行うことにより、前記希土類含有アルミニウムガーネット結晶の表面を溶融し、再び固化させて結晶溶融層を形成する、紫外光発生用ターゲットの製造方法。
- 前記熱処理の温度が1400℃以上2000℃以下である、請求項11に記載の紫外光発生用ターゲットの製造方法。
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US14/437,236 US9728393B2 (en) | 2012-10-23 | 2013-09-06 | Target for ultraviolet light generation, electron beam-excited ultraviolet light source, and production method for target for ultraviolet light generation |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017094532A1 (ja) * | 2015-11-30 | 2017-06-08 | 大電株式会社 | 紫外線発光蛍光体、発光素子、及び発光装置 |
WO2018079661A1 (ja) * | 2016-10-28 | 2018-05-03 | 大電株式会社 | 紫外線発光蛍光体、発光素子、及び発光装置 |
CN108603956A (zh) * | 2016-03-10 | 2018-09-28 | 松下知识产权经营株式会社 | 发光装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102394051B1 (ko) * | 2015-06-04 | 2022-05-06 | 엘지이노텍 주식회사 | 형광체 플레이트 제조용 조성물, 형광체 플레이트 및 조명장치 |
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JP6955656B2 (ja) * | 2016-02-15 | 2021-10-27 | 国立大学法人神戸大学 | 紫外発光蛍光体と紫外発光デバイス及び紫外発光蛍光体の作製方法 |
JP2019102456A (ja) * | 2017-11-30 | 2019-06-24 | ガタン インコーポレイテッドGatan Inc. | 電子顕微鏡法のための高密度高速発光体 |
CN108194844B (zh) * | 2017-12-31 | 2022-02-25 | 上海极优威光电科技有限公司 | 一种电子束激发荧光粉的深紫外光源 |
CN108231532A (zh) * | 2017-12-31 | 2018-06-29 | 上海极优威光电科技有限公司 | 一种电子束激发荧光粉的深紫外光源 |
JP7236859B2 (ja) * | 2018-12-17 | 2023-03-10 | 浜松ホトニクス株式会社 | 紫外光発生用ターゲット及びその製造方法、並びに電子線励起紫外光源 |
US11964062B2 (en) * | 2019-09-03 | 2024-04-23 | Luxhygenix Inc. | Antimicrobial device using ultraviolet light |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006049284A (ja) | 2004-06-29 | 2006-02-16 | Suga Test Instr Co Ltd | 耐候光試験用ランプ |
JP2006520836A (ja) | 2003-03-17 | 2006-09-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 放射源及び蛍光物質を有する照明システム |
JP2009227794A (ja) * | 2008-03-21 | 2009-10-08 | Hitachi Metals Ltd | 蛍光材料及びその製造方法、シンチレータ |
WO2012006774A1 (zh) * | 2010-07-14 | 2012-01-19 | 海洋王照明科技股份有限公司 | 荧光粉层的制备方法 |
WO2012147744A1 (ja) * | 2011-04-25 | 2012-11-01 | 浜松ホトニクス株式会社 | 紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法 |
JP2013053257A (ja) * | 2011-09-06 | 2013-03-21 | Shogen Koden Kofun Yugenkoshi | 波長変換構造及びその製造方法並びに該波長変換構造を含む発光装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4809293A (en) * | 1985-09-03 | 1989-02-28 | Spectra-Physics, Inc. | Optical component of a laser |
US5399499A (en) * | 1994-05-13 | 1995-03-21 | Eastman Kodak Company | Method of using multiwavelength upconversion for sample element interrogation in medical diagnostic equipment |
JP2002033080A (ja) * | 2000-07-14 | 2002-01-31 | Futaba Corp | 紫外線光源 |
DE10129630A1 (de) * | 2001-06-20 | 2003-01-02 | Philips Corp Intellectual Pty | Niederdruckgasentladungslampe mit Leuchtstoffbeschichtung |
JP4235748B2 (ja) * | 2002-03-18 | 2009-03-11 | 株式会社日立プラズマパテントライセンシング | 表示装置 |
RU2389835C2 (ru) | 2004-11-08 | 2010-05-20 | Тохоку Текно Арч Ко., Лтд. | Pr-СОДЕРЖАЩИЙ СЦИНТИЛЛЯЦИОННЫЙ МОНОКРИСТАЛЛ, СПОСОБ ЕГО ПОЛУЧЕНИЯ, ДЕТЕКТОР ИЗЛУЧЕНИЯ И УСТРОЙСТВО ОБСЛЕДОВАНИЯ |
JP4931175B2 (ja) | 2005-09-14 | 2012-05-16 | 株式会社アルバック | 電子線励起発光素子用蛍光体、その作製方法、及び電子線励起発光素子 |
KR101478391B1 (ko) * | 2007-09-03 | 2014-12-31 | 고쿠리츠다이가쿠호진 고베다이가쿠 | 심자외(深紫外) 반도체 광디바이스 |
CN101409963B (zh) * | 2007-10-09 | 2012-01-25 | 中国科学院物理研究所 | 一种用电子束泵浦晶体材料产生紫外光的装置和方法 |
FR2930673A1 (fr) * | 2008-04-28 | 2009-10-30 | Saint Gobain | Lampe plane a emission par effet de champ et sa fabrication |
JP5580865B2 (ja) * | 2012-10-23 | 2014-08-27 | 浜松ホトニクス株式会社 | 紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法 |
-
2012
- 2012-10-23 JP JP2012233976A patent/JP5580866B2/ja not_active Expired - Fee Related
-
2013
- 2013-09-06 KR KR1020157010429A patent/KR20150079629A/ko not_active Application Discontinuation
- 2013-09-06 CN CN201380055584.6A patent/CN104755584B/zh not_active Expired - Fee Related
- 2013-09-06 WO PCT/JP2013/074127 patent/WO2014065027A1/ja active Application Filing
- 2013-09-06 US US14/437,236 patent/US9728393B2/en not_active Expired - Fee Related
- 2013-09-06 EP EP13848529.7A patent/EP2913376B1/en not_active Not-in-force
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006520836A (ja) | 2003-03-17 | 2006-09-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 放射源及び蛍光物質を有する照明システム |
JP2006049284A (ja) | 2004-06-29 | 2006-02-16 | Suga Test Instr Co Ltd | 耐候光試験用ランプ |
JP2009227794A (ja) * | 2008-03-21 | 2009-10-08 | Hitachi Metals Ltd | 蛍光材料及びその製造方法、シンチレータ |
WO2012006774A1 (zh) * | 2010-07-14 | 2012-01-19 | 海洋王照明科技股份有限公司 | 荧光粉层的制备方法 |
WO2012147744A1 (ja) * | 2011-04-25 | 2012-11-01 | 浜松ホトニクス株式会社 | 紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法 |
JP2013053257A (ja) * | 2011-09-06 | 2013-03-21 | Shogen Koden Kofun Yugenkoshi | 波長変換構造及びその製造方法並びに該波長変換構造を含む発光装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2913376A4 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017094532A1 (ja) * | 2015-11-30 | 2017-06-08 | 大電株式会社 | 紫外線発光蛍光体、発光素子、及び発光装置 |
JP2017101122A (ja) * | 2015-11-30 | 2017-06-08 | 大電株式会社 | 紫外線発光蛍光体、発光素子、及び発光装置 |
KR20180050379A (ko) * | 2015-11-30 | 2018-05-14 | 다이덴 가부시키가이샤 | 자외선 발광 형광체, 발광 소자, 및 발광 장치 |
KR102066900B1 (ko) | 2015-11-30 | 2020-01-16 | 다이덴 가부시키가이샤 | 자외선 발광 형광체, 발광 소자, 및 발광 장치 |
CN108603956A (zh) * | 2016-03-10 | 2018-09-28 | 松下知识产权经营株式会社 | 发光装置 |
WO2018079661A1 (ja) * | 2016-10-28 | 2018-05-03 | 大電株式会社 | 紫外線発光蛍光体、発光素子、及び発光装置 |
JPWO2018079661A1 (ja) * | 2016-10-28 | 2019-09-19 | 大電株式会社 | 紫外線発光蛍光体、発光素子、及び発光装置 |
JP7033540B2 (ja) | 2016-10-28 | 2022-03-10 | 大電株式会社 | 紫外線発光蛍光体、発光素子、及び発光装置 |
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US20150287587A1 (en) | 2015-10-08 |
KR20150079629A (ko) | 2015-07-08 |
US9728393B2 (en) | 2017-08-08 |
EP2913376B1 (en) | 2017-10-04 |
CN104755584B (zh) | 2017-03-08 |
JP2014084402A (ja) | 2014-05-12 |
JP5580866B2 (ja) | 2014-08-27 |
EP2913376A4 (en) | 2016-08-03 |
EP2913376A1 (en) | 2015-09-02 |
CN104755584A (zh) | 2015-07-01 |
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