WO2013168352A1 - 実装構造体とその製造方法 - Google Patents
実装構造体とその製造方法 Download PDFInfo
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- WO2013168352A1 WO2013168352A1 PCT/JP2013/002354 JP2013002354W WO2013168352A1 WO 2013168352 A1 WO2013168352 A1 WO 2013168352A1 JP 2013002354 W JP2013002354 W JP 2013002354W WO 2013168352 A1 WO2013168352 A1 WO 2013168352A1
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- resin
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- electrode
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- H05K3/3457—Solder materials or compositions; Methods of application thereof
- H05K3/3485—Applying solder paste, slurry or powder
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Definitions
- the present invention relates to a mounting structure in which a semiconductor package component is surface-mounted on a circuit board, and a manufacturing method thereof.
- the SnAgCu solder paste 601 is printed on the second electrode 104 of the circuit board 105. Then, as shown in FIG. 6B, the bump 103 formed on the first electrode 102 of the semiconductor package 101 is mounted so as to hit the second electrode 104 via the SnAgCu solder paste 601.
- the semiconductor package 101 having bumps formed on the lower surface thereof is used in mobile devices typified by mobile phone devices, and can withstand a drop impact as a function required for these products. Is required.
- a countermeasure for example, when the BGA and the circuit board 105 are soldered together, an underfill 603 is provided between the semiconductor package 101 and the circuit board 105 after soldering with the SnAgCu solder 602 as shown in FIG. A method of filling and improving the drop resistance of the joint is used (Patent Document 1).
- FIG. 7 shows a mounting structure described in Patent Document 2.
- This mounting structure includes a semiconductor package 101 having a first electrode 102, a circuit board 105 having a second electrode 104, a bump 103 formed on the first electrode 102, and between the bump 103 and the second electrode 104.
- a bonding member 106 that is disposed and electrically connects the first electrode 102 and the second electrode 104 through the bump 103, and a bonding portion between the bump 103 and the bonding material 106 and the periphery of each bonding member so as to cover the bonding member
- the reinforcing resins 107 are arranged apart from each other so that the adjacent reinforcing resins 107 do not come into contact with each other.
- the present invention solves the above-described conventional problems, and in a mounting structure in which a semiconductor package is electrically connected to a circuit board, the drop resistance characteristics of the joint can be improved, and curing when an underfill material is used.
- An object is to provide an environment-friendly mounting structure that does not require a furnace and a method for manufacturing the same.
- the mounting structure of the present invention is disposed between a semiconductor package having a first electrode, a circuit board having a second electrode, and a bump formed on the second electrode and the first electrode.
- a paste in which a solder material and an uncured thermosetting resin are mixed is applied onto the second electrode on the circuit board, and the paste is mixed via the mixed paste.
- a semiconductor package is mounted on the second electrode of the circuit board via bumps, a reinforcing resin is applied between the outer periphery of the semiconductor package and the circuit board, and the circuit board and the semiconductor package are heated.
- a paste in which a solder material and an uncured thermosetting resin are mixed is applied onto the second electrode on the circuit board, and the semiconductor package on the circuit board is formed.
- a reinforcing resin to the peripheral area to be mounted, mounting the semiconductor package on the second electrode of the circuit board via the bumps in the mixed paste, and heating the circuit board and the semiconductor package.
- the solder material is separated from the thermosetting resin, and the solder material having a melting point lower than the melting point of the bump is used, so that the solder material melts and wets the bump, and then the thermosetting
- the adhesive resin wets around the solder material and the bump, and then cures the thermosetting resin and the reinforcing resin.
- the periphery of the bonding material is covered with the first reinforcing resin, and the outer peripheral portion of the semiconductor package and the circuit board are covered with the second reinforcing resin, whereby the drop resistance of the bonded portion is reduced.
- the characteristics can be enhanced.
- FIG. 1 Sectional view and (b) plan view of mounting structure in embodiment 1 of the present invention
- FIG. 1 Sectional view and (b) plan view of mounting structure in embodiment 1 of the present invention
- FIG. 1 Micrograph of cross section of mounting structure created under conditions of Example 1 of the same embodiment
- Micrograph of cross section of mounting structure created under conditions of Comparative Example 2 is a manufacturing process diagram in Embodiment 2 of the present invention.
- Sectional drawing of the mounting structure of Embodiment 3 of this invention The enlarged view of the principal part of the mounting structure of Embodiment 3 of this invention (A)-(d) is sectional drawing of the mounting structure in patent document 1
- FIGS. 1A and 1B show a mounting structure 100 according to the first embodiment in which a semiconductor package 101 is mounted on a circuit board 105.
- the first electrode 102 of the semiconductor package 101, the bump 103, the second electrode 104 of the circuit board 105, etc. are shown enlarged compared to the size of the semiconductor package 101.
- the specific size of the semiconductor package 101 is, for example, ⁇ 11 mm, and the bump 103 is provided with 441 bumps at a pitch of 0.5 mm.
- the circuit board 105 is made in accordance with the standard of JEDEC Semiconductor Technology Association (EJEDEC Solid Technology Association ⁇ ), has a length of 132mm, a width of 77mm, a thickness of 1.0mm, and the electrode material is copper.
- the substrate material is a glass epoxy material.
- FIG. 2A to 2D are views for explaining the manufacturing process of the mounting structure 100.
- the mixed paste 301 is printed on the second electrode 104 of the circuit board 105.
- the mixed paste 301 is composed of a solder material having an alloy composition composed of a combination of two or more elements selected from the group consisting of Sn and Bi, In, Ag, and Cu (which later becomes the bonding material 106) It is made of a cured thermosetting resin (which will later become the reinforcing resin 107).
- the bump 103 formed on the first electrode 102 of the semiconductor package 101 and the mixed paste 301 printed on the circuit board 105 are brought into contact with the semiconductor package 101 on the circuit board 105. Mount.
- a reinforcing resin 108 as a second reinforcing resin is applied by a dispenser 302 between the outer periphery of the semiconductor package 101 and the surface of the circuit board 105.
- the mixed paste 301 and the reinforcing resin 108 are heated by using a reflow apparatus to melt the mixed paste 301, and from the mixed paste 301, the bonding material 106 and the first reinforcing resin are used.
- the reinforcing resin 107 is separated.
- the first electrode 102 and the second electrode 104 are coupled with the bump 103 and the bonding material 106, and the boundary between the bonding material 106 and the bump 103 is covered with the reinforcing resin 107.
- the reinforcing resin 108 covers the outer peripheral portion of the semiconductor package 101 and forms a fillet with the circuit board 105.
- FIG. 1A is an enlarged view of FIG.
- the bump 103 formed on the first electrode 102 of the semiconductor package 101 and the second electrode 104 of the circuit board 105 are soldered by the melted and solidified bonding material 106 to be electrically conductive. is doing.
- the bonding material 106 has an alloy composition having a melting point lower than that of the bump 103.
- the periphery of the second electrode 104 of the circuit board 105 and the bump 103 are covered and joined with a reinforcing resin 107.
- the outer peripheral portion of the semiconductor package 101 and the circuit board 105 are also joined by the reinforcing resin 108.
- the reinforcing resin 108 connects between the semiconductor package 101 and the circuit board 105 and forms a fillet around the semiconductor package 101.
- the reinforcing resin 108 is disposed so as to cover the outer peripheral portion of the semiconductor package 101 and the circuit board 105, but is formed on the reinforcing resin 108 and the first electrode of the semiconductor package 101.
- the bumps 103 and the reinforcing resin 107 are arranged so as not to come into contact with each other.
- the bonding material 106 that electrically connects the first electrode 102 and the second electrode 104 through the bump 103 is reinforced with both the reinforcing resin 107 and the reinforcing resin 108, and more specifically, the semiconductor package. 101 and the circuit board 105 are connected, and the fillet is formed of the reinforcing resin 107 around the semiconductor package, so that deformation of the circuit board 105 is suppressed even when subjected to a mechanical impact such as dropping.
- the drop resistance of the joint can be improved as compared with the case where the joining material 106 is reinforced only with the reinforcing resin 107.
- the bump 103 is preferably formed from a Sn-based alloy.
- SnBi series, SnIn series, SnBiIn series, SnAg series, SnCu series, SnAgCu series, SnAgBi series, SnCuBi series, SnAgCuBi series, SnAgIn series, SnCuIn series, SnAgCuIn series, and an alloy consisting of SnAgCuBiIn series Can be used.
- Sn-based is preferable.
- Sn-based alloys have a low melting point of 231 ° C., are easily wetted with Cu electrodes, and are easy to make compounds with other alloys. It is also inexpensive and has low toxicity.
- the bonding material 106 an alloy composition having a melting point lower than that of the bump 103 can be used.
- both the bump 103 and the bonding material 106 are preferably the same system or the Sn system having the same main component.
- the reinforcing resins 107 and 108 include a resin component as a main component and a curing agent, and optionally include a viscosity adjusting / thixotropic additive.
- the reinforcing resin 107 is a thermosetting resin and includes various resins such as an epoxy resin, a urethane resin, an acrylic resin, a polyimide resin, a polyamide resin, a bismaleimide resin, a phenol resin, a polyester resin, a silicone resin, and an oxetane resin. be able to. These may be used alone or in combination of two or more. Of these, epoxy resins are preferred.
- the reinforcing resin 108 is a thermosetting resin and includes various resins such as an epoxy resin, a urethane resin, an acrylic resin, a polyimide resin, a polyamide resin, a bismaleimide resin, a phenol resin, a polyester resin, a silicone resin, and an oxetane resin. be able to. These may be used alone or in combination of two or more. Of these, epoxy resins are preferred.
- the reinforcing resin 107 and the reinforcing resin 108 are preferably the same type of resin such as an epoxy resin. Furthermore, it is preferable to change only the reaction start temperature between the two resins by changing only the curing agent to be contained with the same resin component.
- an epoxy resin selected from the group of bisphenol type epoxy resin, polyfunctional epoxy resin, flexible epoxy resin, brominated epoxy resin, glycidyl ester type epoxy resin and polymer type epoxy resin can be used.
- bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, naphthalene type epoxy resin, phenol novolac type epoxy resin, cresol novolak type epoxy resin, etc. are used. Epoxy resins obtained by modifying these are also used. These may be used alone or in combination of two or more.
- thermosetting resin As a curing agent used in combination with the thermosetting resin as described above, a compound selected from the group of thiol compounds, amine compounds, polyfunctional phenol compounds, imidazole compounds, and acid anhydride compounds is used. Can do. These may be used alone or in combination of two or more.
- inorganic or organic additives can be used as the viscosity adjusting / thixotropy imparting additive.
- silica or alumina is used if it is inorganic, and if it is organic, Derivatives such as amide, polyester and castor oil are used. These may be used alone or in combination of two or more.
- Example 2 As an example of the present invention, the type of the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed, the reinforcing resin 108, the reflow temperature is changed, and the effect of the pass / fail of the conduction and the drop resistance characteristics are examined. The results are shown in Table 1 below.
- the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed is a bisphenol F type epoxy which is a thermosetting resin as the uncured thermosetting resin with respect to 88 parts by weight of the Sn58Bi solder. Resin (trade name “YDF-7510” manufactured by Nippon Steel Chemical Co., Ltd.) was used.
- the viscosity modifier / thixotropic agent includes castor oil thixotropic agent (trade name “THIXCIN R” manufactured by Elementis Specialties, Inc.), an imidazole curing agent as a curing agent, and an organic acid having a flux action (“A mixture of 18 parts by weight of kneaded adipic acid (manufactured by Kanto Chemical Co., Ltd.) was used.
- the imidazole curing agent as a curing agent was adjusted based on the following idea. In the case of preparing an uncured thermosetting resin in which the reaction start temperatures of the epoxy resin and the curing agent are 130 ° C., 140 ° C., and 155 ° C.
- SnAgCu mixed paste 301 Sn3.0Ag0.5Cu (trade name “M705-GRN360-L60A” manufactured by Senju Metal Industry Co., Ltd.) was used.
- semiconductor package 101 a semiconductor package mounted with Sn3.0Ag0.5Cu balls was used as the bumps 103 formed on the first electrode.
- the melting point of Sn58Bi solder is 138 ° C.
- the melting point of Sn3.0Ag0.5Cu solder is 217 ° C.
- the reinforcing resin 108 is a bisphenol F type epoxy resin (trade name “YDF-7510” manufactured by Nippon Steel Chemical Co., Ltd.) for a thermosetting resin, and an imidazole curing agent capable of curing at 130 ° C. (Trade name “2MA-OK” manufactured by Shikoku Kasei Kogyo Co., Ltd.), imidazole curing agent capable of curing at 140 ° C.
- Viscosity adjusting / thixotropy imparting additive is commonly used silica-based thixotropic agent (trade name “AEROSIL RY200” manufactured by Nippon Aerosil Co., Ltd.) did.
- Each mounting structure was evaluated as follows. As the success or failure of conduction, the presence or absence of conduction was confirmed by a tester after the mounting structure was created. The success / failure of the continuity was indicated as “good” when the resistance value was in the range of 9.8 to 10 ⁇ , and indicated as “x” when the resistance value was out of the range.
- the drop resistance life was evaluated. Specifically, according to the JEDEC standard, the mounting structure is dropped under the conditions of acceleration, 1500G, drop time, 0.5 seconds, and when the electrical connection is interrupted, the drop life is determined. The number of drops until occurrence was defined as the drop life. As for the judgment of pass / fail of instantaneous interruption, a voltage of 2.0 V was applied to the semiconductor package at the time of dropping, and the case where the voltage dropped by 10% or more was judged as unacceptable. The maximum number of drops at this time was 30.
- the size of the semiconductor package used here is ⁇ 11 mm
- the bump 103 formed on the first electrode is 0.5 mm pitch
- the number of bumps is 441
- the circuit board 105 is The length is 132 mm
- the width is 77 mm
- the thickness is 1.0 mm
- the electrode material is copper
- the substrate material is a glass epoxy material.
- (Evaluation result 1: continuity test) 2 shows the results of evaluating the pass / fail of the mounting structure produced by the mounting method 1 shown in FIG. 2 under the conditions of Examples 1 to 3 and Comparative Examples 1 and 2 in Table 1.
- Table 1 shows a mixed paste 301 in which the solder composition of the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed is Sn58Bi (melting point: 138 ° C.), and the solder material and the uncured thermosetting resin are mixed. Study the material characteristics required when creating the mounting structure of the present invention by changing the reaction start temperature of the curing agent of the uncured thermosetting resin included in 301 and the curing agent included in the reinforcing resin 108. Shows the results.
- the mounting structure 100 was created using the mixed paste 301 in which the solder material and the uncured thermosetting resin were mixed.
- the solder composition of the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed is Sn58Bi (solder melting point 138 ° C.), an imidazole curing agent capable of curing at 140 ° C. (trade name “2P4MHZ-PW” Shikoku Kasei Kogyo Co.
- the mounting structure is made using the same curing agent for the reinforcing resin 108, the resistance value is 9.9 ⁇ , and electrical conductivity can be obtained with a tester. Was confirmed.
- FIG. 3A is a photomicrograph of a cross section of the mounting structure created under the conditions of Example 1.
- the semiconductor package 101 includes a first electrode 102, a bump 103 formed on the first electrode, a second electrode 104 formed on the circuit board 105, a bonding material 106, and a reinforcing resin 107.
- the composition of the bump 103 formed on the first electrode at this time was Sn3.0Ag0.5Cu solder bump having a melting point of 217 ° C. Moreover, the reflow attainment temperature at the time of producing a mounting structure was 160 degreeC.
- the reaction start temperature of the curing agent of the uncured thermosetting resin and the reinforcing resin is 140 ° C. with respect to the solder melting point of 138 ° C. of the mixed paste 301. High was found to be effective.
- Example 2 an imidazole-based curing agent (trade name “2P4MHZ-PW” manufactured by Shikoku Kasei Kogyo Co., Ltd.) having a reaction initiation temperature higher than the melting point of Sn58Bi solder of 138 ° C. 155 ° C curing imidazole curing agent (trade name “2PHZ-PW” manufactured by Shikoku Kasei Kogyo Co., Ltd.) Solder material made with uncured thermosetting resin mixed with paste 301 or for reinforcement Even when a mounting structure was prepared using the resin 108, the same result as in Example 1 could be obtained.
- an imidazole-based curing agent trade name “2P4MHZ-PW” manufactured by Shikoku Kasei Kogyo Co., Ltd.
- reaction start temperature of the curing agent of the uncured thermosetting resin and the reinforcing resin 108 is higher than the solder melting point of the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed, This is important in creating the mounting structure of the present invention.
- the reaction start temperature of the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed is imidazole capable of curing at 130 ° C. with respect to the conditions of Comparative Example 1 and the melting point 138 ° C. of the solder of the mixed paste 301.
- Type curing agent (trade name “2MA-OK” manufactured by Shikoku Kasei Kogyo Co., Ltd.)
- reinforcing resin 108 is an imidazole type curing agent (trade name “2P4MHZ-PW” manufactured by Shikoku Kasei Kogyo Co., Ltd.) capable of curing at 140 ° C.
- a resistance value of 18 ⁇ was not confirmed to be conductive.
- the difference from Example 1 is that the reaction start temperature of the curing agent of the uncured thermosetting resin is 130 ° C. and the reaction start temperature of the reinforcing resin 108 is 140 ° C. with respect to the melting point 138 ° C. of the solder. It is.
- FIG. 3B shows a micrograph of a cross section of the mounting structure created under the conditions of Comparative Example 1.
- the solder material included in the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed is around the bump 103 formed on the first electrode.
- the uncured thermosetting resin wets around the bumps 103 formed on the first electrode and completes curing, so that it is found that conduction cannot be confirmed.
- the reaction start temperature of the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed is imidazole based on the conditions of Comparative Example 2 and the melting point 138 ° C. of the solder of the mixed paste 301 corresponding to the curing at 140 ° C.
- Curing agent (trade name “2P4MHZ-PW” manufactured by Shikoku Kasei Kogyo Co., Ltd.) with reinforcing resin 108 imidazole curing agent (trade name “2MA-OK” manufactured by Shikoku Kasei Kogyo Co., Ltd.) capable of curing at 130 ° C.
- the difference from Example 1 is that the reaction start temperature of the curing agent of the uncured thermosetting resin is 140 ° C. and the reaction start temperature of the reinforcing resin 107 is 130 ° C. with respect to the melting point 138 ° C. of the solder. It is.
- FIG. 3C shows a micrograph of a cross section of the mounting structure created under the conditions of Comparative Example 2.
- an imidazole curing agent (trade name “2MA-OK”) capable of curing at 130 ° C. before the melting point (138 ° C.) of the solder material of the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed.
- the reinforcing resin 108 made by Shikoku Kasei Kogyo Co., Ltd. was cured, and the semiconductor package 101 did not sink when the solder was melted. Therefore, the distance between the melted solder and the bump 103 formed on the first electrode is increased, and the melted solder cannot wet the bump 103 formed on the first electrode.
- the reaction initiation temperature of the uncured thermosetting resin and the reinforcing resin is higher than the melting point of the solder material applied to the circuit board 105. Is preferable.
- the solder material contained in the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed was melted and formed on the first electrode of the semiconductor package 101. After the solder material wets the bump 103, the uncured thermosetting resin wets around the bump 103, and the curing of the uncured thermosetting resin and the reinforcing resin starts and is completed.
- the fact that it is useful as a process for creating a mounting structure can also be seen from the success or failure of conduction.
- the points for creating the mounting structure of the present invention include the melting point of the bump 103 formed on the first electrode of the semiconductor package 101, the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed.
- the relationship between the melting point of the contained solder material and the reaction start temperature of the thermosetting resin and the reinforcing resin 108 contained in the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed is as follows. desirable.
- the reaction start temperature of the reinforcing resin 108 and the reaction start temperature of the thermosetting reinforcing resin 107) in the mixed paste 301 should be different from 5 ° C to 15 ° C. The reason is that the reinforcing resin 107 gains time for the solder bumps to wet up the bumps and a time for the reinforcing resin 107 to wet up to cover the periphery thereof. If there is too much temperature difference, heat treatment is required up to a high temperature.
- the difference between the melting point of the solder material in the mixed paste 301 and the reaction start temperature of the two resins is, for example, 2 ° C. to 17 ° C., preferably 10 ° C. or more.
- the reason why the temperature difference is necessary is that the solder material is melted and the self-alignment time between the semiconductor package 101 and the circuit board 105 is required.
- the overall heat treatment temperature will be high as described above.
- Example 1 is the mounting structure 100 shown in FIG. 1
- Comparative Example 4 is the mounting structure shown in FIG. 6D
- Comparative Example 3 is the mounting structure in the state shown in FIG. 6C.
- the drop resistance test was evaluated based on the drop life. Specifically, according to the JEDEC standard, the mounting structure is dropped under the conditions of acceleration, 1500G, drop time, 0.5 seconds, and when the electrical connection is interrupted, the drop life is determined. The number of drops until occurrence was defined as the drop life. As for the judgment of pass / fail of instantaneous interruption, a voltage of 2.0 V was applied to the semiconductor package at the time of dropping, and the case where the voltage dropped by 10% or more was judged as unacceptable. The maximum number of drops at this time was 30.
- the size of the semiconductor package used here is ⁇ 11 mm
- the bump 103 formed on the first electrode is 0.5 mm pitch
- the number of bumps is 441
- the circuit board 105 is The length is 132 mm
- the width is 77 mm
- the thickness is 1.0 mm
- the electrode material is copper
- the substrate material is a glass epoxy material.
- a mounting structure was created under the conditions of Example 1 and its drop life was evaluated.
- the reflow attainment temperature at this time is 160 degreeC.
- the composition of the bump 103 at this time was Sn3.0Ag0.5Cu solder bump having a melting point of 217 ° C.
- the soldering temperature was 160 ° C. when the mounting structure was prepared, and the solder was prepared using an imidazole curing agent (trade name “2P4MHZ-PW” manufactured by Shikoku Kasei Kogyo Co., Ltd.) capable of curing at 140 ° C.
- the mixed paste 301 in which the material and the uncured thermosetting resin were mixed was used, and the solder material was SnBi having a melting point of 138 ° C.
- FIG. 6C includes a semiconductor package 101, a first electrode 102, a circuit board 105, a second electrode 104, and a SnAgCu solder paste 601.
- the method for creating the mounting structure is as shown in FIG.
- SnAgCu solder paste 601 is printed on the second electrode 104 of the circuit board 105 (FIG. 6A), and the bumps 103 formed on the first electrode of the semiconductor package 101 are mounted so as to hit ( FIG. 6 (b)).
- Example 1 the mounting structure (mounting structure shown in FIG. 1) created under the conditions of Example 1 has the same connection reliability as the mounting structure created by soldering and joining the conventional semiconductor package component and the circuit board. It turns out that it is what you give.
- the present invention provides a circuit between the semiconductor package 101 having the first electrode 102, the circuit board 105 having the second electrode 104, and the bump 103 formed on the second electrode 104 and the first electrode 102.
- the bonding material 106 for electrically bonding the first electrode 102 and the second electrode 104 through the bump 103, the outer peripheral portion of the semiconductor package 101 disposed on the circuit board 105, and the circuit board 105 are used for reinforcement. It can be said that the mounting structure is expected to be improved in drop-proof characteristics by covering the periphery of each bonding material with a reinforcing resin so as to cover the bonding portion between the bump 103 and the bonding material 106, particularly with the resin.
- this mounting structure can be used for mobile devices typified by mobile phone devices. Moreover, since the reflow reached temperature at the time of manufacture of this mounting structure is lower than the conventional one, it can be said that it is useful as a countermeasure against environmental problems, particularly global warming.
- the points for creating the mounting structure of the present invention include the bump 103 formed on the first electrode 102 of the semiconductor package 101 and the mixed paste 301 in which the solder material and the uncured thermosetting resin are mixed.
- the relationship between the reaction start temperature of the thermosetting resin and the reinforcing resin 108 is preferably the following relationship.
- the relationship of the melting point of the bump 103 formed on the first electrode 102> the reaction starting temperature of the reinforcing resin 108> the reaction starting temperature of the thermosetting resin contained in the mixed paste 301> the melting point of the solder material is required.
- the drop-proof property of the mounting structure created under these conditions is the conventional soldering method, that is, the BGA and the circuit board are fixed by filling the reinforcing resin material between the BGA and the circuit board after soldering.
- the conventional soldering method that is, the BGA and the circuit board are fixed by filling the reinforcing resin material between the BGA and the circuit board after soldering.
- the mounting structure and the manufacturing method thereof according to the present invention can improve the drop-proof property of the joint portion between the semiconductor package and the circuit board, which is conventionally applied to mobile devices such as mobile phone devices.
- An SnBi solder material having a lower melting point than the SnAgCu solder that has been used can be used.
- FIG. 2 In the manufacturing process of the first embodiment shown in FIG. 2, after the semiconductor package 101 is mounted on the circuit board 105 and before the reflow is performed, the reinforcing resin 108 is applied by the dispenser 302.
- the second embodiment is different in that a reinforcing resin 108 is applied to the circuit board 105 before the semiconductor package 101 is mounted on the circuit board 105. The rest is the same as in the first embodiment.
- the mixed paste 301 mixed is printed on the second electrode 104 of the circuit board 105. Thereafter, in FIG. 4B, the reinforcing resin 108 is applied to the peripheral region of the circuit board 105 where the semiconductor package 101 is mounted with the dispenser 302.
- a semiconductor is formed on the circuit board 105 so that the bump 103 formed on the first electrode 102 of the semiconductor package 101 and the mixed paste 301 printed on the circuit board 105 are brought into contact with each other.
- the package 101 is mounted.
- the mixed paste 301 and the reinforcing resin 108 are heated using a reflow apparatus to melt the mixed paste 301, and the bonding material 106 and the reinforcing resin 107 are separated from the mixed paste 301. .
- the first electrode 102 and the second electrode 104 are bonded with the bump 103 and the bonding material 106, and the boundary between the bonding material 106 and the bonding material 106 and the bump 103 is covered with the reinforcing resin 107.
- the reinforcing resin 108 covers the outer peripheral portion of the semiconductor package 101 and forms a fillet with the circuit board 105.
- the mounting structure 100 shown in FIG. 1 can also be manufactured by the manufacturing method shown in FIG. (Embodiment 3) 5A and 5B show a mounting structure according to Embodiment 3 of the present invention.
- FIG. 5A is a cross-sectional view of the semiconductor package 101 of the mounting structure 100 obtained by the mounting method according to Embodiment 2 of the present invention
- FIG. 5B is an enlarged view of the left end of FIG. 5A.
- the inner periphery 110 of the reinforcing resin 108 is not in contact with the reinforcing resin 107 or the bump 103.
- the reinforcing resin 108 is used as a semiconductor package. 101, a bump 103 formed on the first electrode, a reinforcing resin 107 that reinforces a bonding material 106 that electrically bonds the first electrode and the second electrode through the bump, and the circuit board 105.
- the components of the reinforcing resin 108 and the reinforcing resin 107 are preferably the same.
- the reinforcing resin 108 an epoxy resin is suitable.
- the components of the reinforcing resin 108 and the reinforcing resin 107 are same, it is easy to adjust the reaction start temperature of the resin due to the action of heat during reflow, and at the time of curing, the reinforcing resin 108 and the bump Even if the component of the reinforcing resin 107 that reinforces the bonding material 106 that electrically bonds the first electrode and the second electrode is mixed, the physical properties of the cured resin can be easily maintained.
- the mounting structure 100 according to the third embodiment can be manufactured by increasing the amount of the reinforcing resin 108 in the step shown in FIG. 2C or the step shown in FIG. 4B.
- the drop resistance characteristics of the mounting structure according to the third embodiment are better than those according to the first embodiment.
- the present invention it contributes to improving the reliability of mobile devices such as mobile phone devices.
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Abstract
Description
にバンプを有する半導体パッケージ部品は、図6(a)~(d)で説明する工程によって実装されている。
例えば、図7は特許文献2に記載された実装構造体である。
この実装構造体は、第1電極102を有する半導体パッケージ101と第2電極104を有する回路基板105と、第1電極102上に形成されたバンプ103と、バンプ103と第2電極104の間に配置され、バンプ103を通じて第1電極102と第2電極104とを電気的に接続する接合部材106と、バンプ103と接合材料106との接合部分および接合部材を覆うように個々の接合部材の周囲に配置された補強用樹脂107とを備え、それぞれの補強用樹脂107が、隣接する補強用樹脂同士が接触しないように、互いに離間して配置されている。
しかしながら、SnAgCu系はんだでのはんだ接合後、半導体パッケージ101と回路基板の間にアンダーフィル材603などを固着させた場合と比較すると、十分な耐落下特性を得ることができない。つまり、携帯電話装置に代表されるモバイル機器などに対して、従来用いられてきたSnAgCu系のはんだよりも融点の低いSnBi系はんだ材料を使用できないことを示している。
(実施の形態1)
図1(a)(b)は、回路基板105に半導体パッケージ101を実装した実施の形態1の実装構造体100を示す。
図2(a)では、回路基板105の第2電極104上にそれぞれ混合ペースト301を印刷する。混合ペースト301は、SnとBi、In、Ag、およびCuの群から選ばれる2種類もしくは、それ以上の元素との組み合わせからなる合金組成のはんだ材料(後に接合材料106となるもの)と、未硬化状態の熱硬化性樹脂(後に補強用樹脂107となるもの)とからなる。
バンプ103は、Sn系合金から形成されていることが望ましい。例えば、SnBi系、SnIn系、SnBiIn系、SnAg系、SnCu系、SnAgCu系、SnAgBi系、SnCuBi系、SnAgCuBi系、SnAgIn系、SnCuIn系、SnAgCuIn系、およびSnAgCuBiIn系からなる群から選ばれる合金組成を用いることができる。
特に、Sn系がよい。Sn系合金は融点が231℃と低くく、Cu電極に濡れ易く、他の合金と化合物を作りやすい。また安価で、毒性も低いためである。
補強用樹脂107、108は、主成分の樹脂成分と、硬化剤とを含み、必要に応じて、粘度調整/チクソ性付与添加剤を含む。
補強用樹脂107は、熱硬化性樹脂であり、エポキシ樹脂、ウレタン樹脂、アクリル樹脂、ポリイミド樹脂、ポリアミド樹脂、ビスマレイミド樹脂、フェノール樹脂、ポリエステル樹脂、シリコーン樹脂、オキセタン樹脂など、さまざまな樹脂を含むことができる。これらは、単独で用いてもよく、2種類以上を組み合わせても良い。これらのうちでは、エポキシ樹脂が好適である。
補強用樹脂107と、補強用樹脂108とは、樹脂成分がともにエポキシ系などの同じ系の樹脂がよい。さらに、樹脂成分を同じにして、含有させる硬化剤のみを変えることで反応開始温度のみを2つの樹脂で変えるのが好ましい。
本発明の実施例として、はんだ材料と未硬化状態の熱硬化性樹脂が混和した混合ペースト301の種類と補強用樹脂108、リフロー到達温度を変化させ、導通の合否、耐落下特性の影響を調べ、下記の表1にその結果を示した。
はんだ材料と未硬化状態の熱硬化性樹脂が混和した混合ペースト301は、はんだ材料にSn58Biはんだ88重量部に対し、未硬化状態の熱硬化性樹脂として、熱硬化性樹脂であるビスフェノールF型エポキシ樹脂(商品名「YDF-7510」新日鐵化学株式会社製)を用いた。
半導体パッケージ101には、第1電極上に形成されたバンプ103として、Sn3.0Ag0.5Cuボール搭載の半導体パッケージを用いた。
補強用樹脂108には、熱硬化性樹脂には、ビスフェノールF型エポキシ樹脂(商品名「YDF-7510」新日鐵化学株式会社製)、硬化剤には、130℃硬化対応のイミダゾール系硬化剤(商品名「2MA-OK」四国化成工業株式会社製)、140℃硬化対応のイミダゾール系硬化剤(商品名「2P4MHZ-PW」四国化成工業株式会社製)、または、155℃硬化対応のイミダゾール系硬化剤(商品名「2PHZ-PW」四国化成工業株式会社製)粘度調整/チクソ性付与添加剤には、シリカ系チクソ剤(商品名「AEROSIL RY200」日本アエロジル株式会社製)を共通して使用した。
それぞれの実装構造体の評価は、以下のように行った。
導通の合否として、実装構造体作成後、テスターにて、導通の有無を確認した。導通の合否は、抵抗値が9.8~10Ωの範囲である場合を合格として、○で表記し、範囲外である場合を、×と表記した。
表1の実施例1~3、比較例1~2の条件で、図2に示した実装方法1で作成した実装構造体の導通の合否について評価した結果を示す。
はんだ材と未硬化状態の熱硬化性樹脂が混和した混合ペースト301のはんだ組成がSn58Bi(はんだ融点138℃)、140℃硬化対応のイミダゾール系硬化剤(商品名「2P4MHZ-PW」四国化成工業株式会社製)を用いて作成されたもので、補強用樹脂108の硬化剤にも同様のものを用いて実装構造体を作成したところ、抵抗値が、9.9Ωとテスターにて導通がとれることが確認された。
これらの結果より、本発明の実装構造体を作成する場合において、回路基板105に塗布されるはんだ材料の融点に対し、未硬化状態の熱硬化性樹脂および補強用樹脂の反応開始温度が高いことが好ましいことがわかる。
補強用樹脂108の反応開始温度と混合ペースト301中の熱硬化性の補強用樹脂107)の反応開始温度は、5℃から15℃の差があった方がよい。
その理由は、補強用樹脂107が、はんだのバンプへの濡れ上がるための時間と、その周囲を覆うための補強用樹脂107の濡れ上がりのための時間を稼ぐためである。温度差がありすぎると、高い温度まで熱処理が必要となる。
混合ペースト301中のはんだ材料の融点と、2つの樹脂の反応開始温度との差は、例えば、2℃から17℃で、好ましくは、10℃以上がよい。
温度差が必要な理由は、はんだ材料が溶けて、半導体パッケージ101と前記回路基板105とのセルフアライメントの時間が必要であることです。
一方、温度差がありすぎると、上記同様全体の熱処理温度が高くなってしまうことである。
実施例1と下記の表2に示す比較例3~4について、実装構造体の耐落下特性の合否を評価した。
このときのバンプ103の組成は、融点が217℃のSn3.0Ag0.5Cuはんだバンプとした。また、実装構造体を作成する際のリフロー到達温度は、160℃とし、140℃硬化対応のイミダゾール系硬化剤(商品名「2P4MHZ-PW」四国化成工業株式会社製)を用いて作成されたはんだ材と未硬化状態の熱硬化性樹脂とが混和した混合ペースト301を用い、はんだ材は、融点が138℃のSnBiとした。
図6(c)は、半導体パッケージ101、第1電極102、回路基板105、第2電極104、SnAgCuはんだペースト601から構成されている。
比較例4の条件で作成した図6(d)のアンダーフィル603を用いた実装構造体を作成し、耐落下特性を評価した。この実装構造体(図6(d))は、比較例3の方法にて作成した実装構造体(図6(c))に、ディスペンサーにて、アンダーフィル603を塗布後、加熱にて硬化させたものである。
つまり、実施例1の条件で作成した実装構造体(図1に示す実装構造体)が、従来の半導体パッケージ部品と回路基板をはんだ付け接合して作成した実装構造体と同等の接続信頼性を与えるものであることがわかる。
図4(a)~(d)は、実装構造体100の別の製造方法を示す。
図2に示した実施の形態1の製造工程では、回路基板105上に半導体パッケージ101をマウントした後で、リフローを実施する前のタイミングに、ディスペンサー302によって補強用樹脂108を塗布したが、この実施の形態2では、半導体パッケージ101を回路基板105上にマウントする前に、補強用樹脂108を回路基板105に塗布している点が異なっている。その他は実施の形態1と同じである。
その後、図4(b)では、回路基板105における半導体パッケージ101がマウントされる周辺領域に補強用樹脂108をディスペンサー302で塗布する。
(実施の形態3)
図5Aと図5Bは本発明の実施の形態3の実装構造体を示す。
この実施の形態3の実装構造体の耐落下特性は実施の形態1の場合よりも良好である。
101 半導体パッケージ
102 第1電極
103 バンプ
104 第2電極
105 回路基板
106 接合材料
107 補強用樹脂(第1補強用樹脂)
108 補強用樹脂(第2補強用樹脂)
301 混合ペースト
302 ディスペンサー
Claims (11)
- 第1電極を有する半導体パッケージと、
第2電極を有する回路基板と、
前記第2電極と前記第1電極上に形成されたバンプとの間に配置され、前記バンプと第2電極とを電気的に接合するはんだを含む接合材料と、
前記接合材料の周囲を覆う第1補強用樹脂と、
前記回路基板に配置された半導体パッケージの外周部分と前記回路基板との間を覆う第2補強用樹脂とを含む
実装構造体。 - 前記第1補強用樹脂と前記第2補強用樹脂とが接触していることを特徴とする
請求項1の実装構造体。 - 前記第1補強用樹脂と第2補強用樹脂との樹脂成分が同じ組成で、含まれる硬化剤が異なることを特徴とする
請求項1記載の実装構造体。 - 前記バンプの合金組成と、前記接合材料とが、Sn系材料であることを特徴とする
請求項1記載の実装構造体。 - 前記バンプの合金組成がSnAgCu系のはんだで形成され、前記接合材料が、SnBi系であることを特徴とする
請求項1記載の実装構造体。 - 前記バンプの融点 > 前記第2補強用樹脂の反応開始温度 ≧ 前記第1補強用樹脂の反応開始温度 > 前記接合材料の融点
である
請求項1記載の実装構造体。 - 前記第1補強用樹脂の反応開始温度と前記第2補強用樹脂の反応開始温度とは、5℃から15℃の差がある
請求項1記載の実装構造体。 - 前記第1補強用樹脂の反応開始温度と前記第2補強用樹脂の反応開始温度は、前記接合材料の融点との温度差が2℃から17℃である
請求項1記載の実装構造体。 - 回路基板上の第2電極上に、はんだ材料と未硬化状態の熱硬化性樹脂が混和したペーストを塗布し、
前記混和したペーストを介して前記回路基板の第2電極上に、半導体パッケージをバンプを介してマウントし、
前記半導体パッケージの外周部と前記回路基板との間にわたって補強用樹脂を塗布し、
前記回路基板と前記半導体パッケージとを加熱することにより、前記接合材料と前記熱硬化性樹脂とを分離させ、
前記バンプの融点より低い融点を有する前記接合材料を用いることで、前記接合材料が溶融し、前記バンプに濡れ上がり、その後、前記熱硬化性樹脂が前記接合材料と前記バンプの周囲に濡れ上がり、その後、前記熱硬化性樹脂と前記補強用樹脂が硬化する
実装構造体の製造方法。 - 回路基板上の第2電極上に、接合材料と未硬化状態の熱硬化性樹脂が混和したペーストを塗布し、
前記回路基板における前記半導体パッケージがマウントされる周辺領域に補強用樹脂を塗布し、
前記混和したペーストに前記半導体パッケージをバンプを介して回路基板の第2電極上にマウントし、
前記回路基板と前記半導体パッケージとを加熱することにより、前記接合材料と前記熱硬化性樹脂とを分離させ、
前記バンプの融点より低い融点を有する前記接合材料を用いることで、前記接合材料が溶融し、前記バンプに濡れ上がり、その後、前記熱硬化性樹脂が前記接合材料と前記バンプの周囲に濡れ上がり、その後、前記熱硬化性樹脂と前記補強用樹脂を硬化させる
実装構造体の製造方法。 - 前記熱硬化性樹脂と前記補強用樹脂の反応開始温度が、前記接合材料の融点以上、かつ、前記バンプの融点以下であることを特徴とする
請求項9または請求項10記載の実装構造体の製造方法。
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