WO2013118796A1 - 有機薄膜太陽電池 - Google Patents
有機薄膜太陽電池 Download PDFInfo
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- WO2013118796A1 WO2013118796A1 PCT/JP2013/052796 JP2013052796W WO2013118796A1 WO 2013118796 A1 WO2013118796 A1 WO 2013118796A1 JP 2013052796 W JP2013052796 W JP 2013052796W WO 2013118796 A1 WO2013118796 A1 WO 2013118796A1
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- WIPO (PCT)
- Prior art keywords
- sulfide
- photoelectric conversion
- layer
- solar cell
- molecular weight
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- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- 125000005582 pentacene group Chemical group 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- GKCNVZWZCYIBPR-UHFFFAOYSA-N sulfanylideneindium Chemical compound [In]=S GKCNVZWZCYIBPR-UHFFFAOYSA-N 0.000 description 1
- WSANLGASBHUYGD-UHFFFAOYSA-N sulfidophosphanium Chemical class S=[PH3] WSANLGASBHUYGD-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- ITRNXVSDJBHYNJ-UHFFFAOYSA-N tungsten disulfide Chemical compound S=[W]=S ITRNXVSDJBHYNJ-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
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- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/20—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising organic-organic junctions, e.g. donor-acceptor junctions
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- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
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- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
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- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
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- H10K85/381—Metal complexes comprising a group IIB metal element, e.g. comprising cadmium, mercury or zinc
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
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- Y02E10/549—Organic PV cells
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- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to an organic thin film solar cell having high photoelectric conversion efficiency, small variation in photoelectric conversion efficiency in the surface of the photoelectric conversion layer, and excellent durability.
- each semiconductor functions as a P-type semiconductor or an N-type semiconductor
- photocarriers electron-hole pairs
- electrons form the N-type semiconductor.
- an electric field is generated.
- inorganic solar cells manufactured using an inorganic semiconductor such as silicon.
- inorganic solar cells are expensive to manufacture and difficult to increase in size, and the range of use is limited, organic solar cells manufactured using organic semiconductors instead of inorganic semiconductors are attracting attention. .
- Fullerene In organic solar cells, fullerene is almost always used. Fullerenes are known to work mainly as N-type semiconductors.
- Patent Document 1 describes a semiconductor heterojunction film formed using an organic compound that becomes a P-type semiconductor and fullerenes.
- the cause of deterioration is fullerenes (for example, see Non-Patent Document 1), and a material having higher durability than fullerenes should be selected. Is required.
- Patent Document 2 describes an organic solar cell in which an active layer containing an organic electron donor and a compound semiconductor crystal is provided between two electrodes.
- zinc oxide, titanium oxide or the like is used, sufficient durability cannot be obtained, and there is also a problem that the photoelectric conversion efficiency is lowered as compared with the case of using fullerene.
- JP 2006-344794 A Japanese Patent No. 4120362
- An object of the present invention is to provide an organic thin film solar cell having high photoelectric conversion efficiency, small variation in photoelectric conversion efficiency in the surface of the photoelectric conversion layer, and excellent durability.
- This invention is an organic thin-film solar cell which has a photoelectric converting layer, Comprising:
- the said photoelectric converting layer contains the site
- the organic thin film solar cell includes a portion containing a sulfide of the Group 15 element of the periodic table and a portion containing an organic semiconductor having a molecular weight of less than 10,000.
- the present inventor shall include, in an organic thin-film solar cell having a photoelectric conversion layer, the photoelectric conversion layer including a site containing a sulfide of a group 15 element of the periodic table and a site containing an organic semiconductor having a molecular weight of less than 10,000.
- the organic thin film solar cell of the present invention has a photoelectric conversion layer, and the photoelectric conversion layer has a site containing a sulfide of a group 15 element of the periodic table (hereinafter also referred to as a sulfide site) and a molecular weight of 10,000. And a portion containing less organic semiconductor (hereinafter also referred to as an organic semiconductor portion). Further, in the photoelectric conversion layer, the sulfide site and the organic semiconductor site are in contact with each other.
- the sulfide site mainly functions as an N-type semiconductor and the organic semiconductor site mainly functions as a P-type semiconductor, and a photocarrier ( An electron-hole pair is generated, and electrons move in the N-type semiconductor and holes move in the P-type semiconductor, thereby generating an electric field.
- the sulfide site may partially work as a P-type semiconductor
- the organic semiconductor site may partially work as an N-type semiconductor.
- the organic thin film solar cell of the present invention is excellent in durability by using the sulfide of the group 15 element of the periodic table. Further, by using an organic semiconductor, the organic thin film solar cell of the present invention is excellent in impact resistance, flexibility, and the like. Furthermore, when the molecular weight of the organic semiconductor is less than 10,000, the organic semiconductor can enter a fine gap in the sulfide site, and can easily become familiar with the sulfide site. For this reason, the organic thin film solar cell of this invention becomes small [dispersion
- the organic thin film solar cell of the present invention has extremely high charge separation efficiency and high photoelectric conversion efficiency. Further, when both the N-type semiconductor and the P-type semiconductor are inorganic semiconductors, these solid solutions may be precipitated at the interface, whereas in the organic thin film solar cell of the present invention, there is no precipitation of the solid solution, High stability can be obtained even at high temperatures.
- the sulfide portion and the organic semiconductor portion may be in contact with each other, and the layer including the sulfide portion (the layer containing the sulfide of the group 15 element of the periodic table) and the layer including the organic semiconductor portion.
- the layer including the sulfide portion the layer containing the sulfide of the group 15 element of the periodic table
- the layer including the organic semiconductor portion may be in contact with each other, and the layer including the sulfide portion (the layer containing the sulfide of the group 15 element of the periodic table) and the layer including the organic semiconductor portion.
- a layer containing an organic semiconductor having a molecular weight of less than 10,000 or a composite film in which a sulfide portion and an organic semiconductor portion are mixed to form a composite film.
- a composite film is more preferable because the charge separation efficiency of the semiconductor portion can be improved.
- the sulfide of the Group 15 element of the periodic table is preferably antimony sulfide or bismuth sulfide, and more preferably antimony sulfide.
- Antimony sulfide has a good energy level compatibility with an organic semiconductor having a molecular weight of less than 10,000, and absorbs more visible light than conventional zinc oxide, titanium oxide, and the like. For this reason, when the sulfide of the group 15 element of the periodic table is antimony sulfide, the organic thin film solar cell has high photoelectric conversion efficiency.
- These group 15 element sulfides may be used alone or in combination of two or more.
- the sulfide of the group 15 element of the periodic table may be a composite sulfide containing two or more elements of the group 15 element of the periodic table in the same molecule.
- the sulfide site may contain other elements in addition to the sulfides of the group 15 element of the periodic table as long as the effect of the present invention is not impaired.
- the other elements are not particularly limited, elements belonging to the fourth period, the fifth period, and the sixth period of the periodic table are preferable.
- indium, gallium, tin, cadmium, copper, zinc, aluminum examples thereof include nickel, silver, titanium, vanadium, niobium, molybdenum, tantalum, iron, and cobalt.
- These other elements may be used independently and 2 or more types may be used together.
- indium, gallium, tin, cadmium, zinc, and copper are preferable because of high electron mobility.
- the preferable upper limit of the content of the other elements in the sulfide site is 50% by weight.
- the content is 50% by weight or less, a decrease in compatibility between the sulfide moiety and the organic semiconductor having a molecular weight of less than 10,000 can be suppressed, and the photoelectric conversion efficiency is increased.
- the sulfide site is preferably a crystalline semiconductor.
- the sulfide site is a crystalline semiconductor, electron mobility is increased and photoelectric conversion efficiency is increased.
- a crystalline semiconductor means a semiconductor that can be measured by X-ray diffraction measurement or the like and from which a scattering peak can be detected.
- the crystallinity can also be used as an index of the crystallinity of the sulfide site.
- the preferable lower limit of the crystallinity of the sulfide moiety is 30%. When the crystallinity is 30% or more, the mobility of electrons increases and the photoelectric conversion efficiency increases. A more preferred lower limit of the crystallinity is 50%, and a more preferred lower limit is 70%.
- the crystallinity is determined by separating the scattering peak derived from the crystalline substance detected by X-ray diffraction measurement and the like from the halo derived from the amorphous part by fitting, and obtaining the intensity integral of each, It can be determined by calculating the ratio of the crystalline part.
- Examples of the method for increasing the degree of crystallinity of the sulfide site include a method in which the sulfide site is irradiated with intense light such as thermal annealing, laser or flash lamp, excimer light irradiation, plasma irradiation, or the like. It is done. Among them, a method of performing irradiation with strong light, plasma irradiation, or the like is preferable because oxidation of the sulfide of the group 15 element of the periodic table can be reduced.
- the organic semiconductor having a molecular weight of less than 10,000 can penetrate into the fine gaps of the sulfide site, and is easily adapted to the sulfide site. For this reason, the organic thin film solar cell of this invention becomes small [dispersion
- the organic semiconductor having a molecular weight of less than 10,000 preferably has a molecular weight of 8100 or less, more preferably 5400 or less, and even more preferably 1500 or less.
- the lower limit of the molecular weight of the organic semiconductor having a molecular weight of less than 10,000 is not particularly limited, but the molecular weight is preferably 200 or more, and more preferably 400 or more.
- the organic semiconductor having a molecular weight of less than 10,000 may be a low molecular compound, an oligomer or a polymer.
- the molecular weight means a weight average molecular weight.
- the organic semiconductor having a molecular weight of less than 10,000 is not particularly limited, and examples thereof include compounds having a porphyrin skeleton such as a thiophene skeleton, a phthalocyanine skeleton, a naphthalocyanine skeleton, a pentacene skeleton, and a benzoporphyrin skeleton.
- the organic semiconductor having a molecular weight of less than 10,000 is more preferably a donor-acceptor type because it can absorb light in a long wavelength region.
- a donor-acceptor type compound having a thiophene skeleton and a donor-acceptor type compound having a naphthalocyanine skeleton are more preferable.
- the donor-acceptor type compounds having a thiophene skeleton from the viewpoint of light absorption wavelength, A donor-acceptor type compound having a thiophene skeleton and a diketopyrrolopyrrole skeleton is particularly preferred.
- the organic thin film solar cell of the present invention preferably has the photoelectric conversion layer as described above between a pair of electrodes.
- the material of the electrode is not particularly limited, and a conventionally known material can be used.
- the anode material include metals such as gold, CuI, ITO (indium tin oxide), SnO 2 , AZO (aluminum zinc oxide). Material), conductive transparent materials such as IZO (indium zinc oxide) and GZO (gallium zinc oxide), and conductive transparent polymers.
- the cathode material include sodium, sodium-potassium alloy, lithium, magnesium, aluminum, magnesium-silver mixture, magnesium-indium mixture, aluminum-lithium alloy, Al / Al 2 O 3 mixture, Al / LiF mixture, and the like. Can be mentioned. These materials may be used alone or in combination of two or more.
- the organic thin film solar cell of the present invention may further have a substrate, a hole transport layer, an electron transport layer, and the like.
- substrate is not specifically limited, For example, transparent glass substrates, such as soda-lime glass and an alkali free glass, a ceramic substrate, a transparent plastic substrate, etc. are mentioned.
- the material of the hole transport layer is not particularly limited, and examples thereof include a P-type conductive polymer, a P-type low molecular organic semiconductor, a P-type metal oxide, a P-type metal sulfide, and a surfactant.
- examples include polystyrene sulfonic acid adduct of polyethylene dioxythiophene, carboxyl group-containing polythiophene, phthalocyanine, porphyrin, molybdenum oxide, vanadium oxide, tungsten oxide, nickel oxide, copper oxide, tin oxide, molybdenum sulfide, tungsten sulfide, copper sulfide. , Tin sulfide and the like, fluoro group-containing phosphonic acid, carbonyl group-containing phosphonic acid and the like.
- the material of the electron transport layer is not particularly limited.
- N-type conductive polymer, N-type low molecular organic semiconductor, N-type metal oxide, N-type metal sulfide, alkali metal halide, alkali metal, surface activity examples include cyano group-containing polyphenylene vinylene, boron-containing polymer, bathocuproine, bathophenanthrene, hydroxyquinolinato aluminum, oxadiazole compound, benzimidazole compound, naphthalene tetracarboxylic acid compound, perylene derivative, Examples include phosphine oxide compounds, phosphine sulfide compounds, fluoro group-containing phthalocyanines, titanium oxide, zinc oxide, indium oxide, tin oxide, gallium oxide, tin sulfide, indium sulfide, and zinc sulfide.
- the organic thin film solar cell of the present invention has a layer composed of a sulfide site (a layer containing a sulfide of a group 15 element of the periodic table) and a layer composed of an organic semiconductor site (a molecular weight of less than 10,000) between a pair of electrodes.
- a photoelectric conversion layer which is a laminate including a layer containing an organic semiconductor
- an electron transport layer be further provided between one electrode and a layer made of a sulfide site.
- FIG. 1 An example of the organic thin-film solar cell of this invention in case a photoelectric converting layer is a laminated body is typically shown in FIG.
- a substrate 2 a transparent electrode (anode) 3
- a layer made of an organic semiconductor part a layer containing an organic semiconductor having a molecular weight of less than 10,000
- a layer made of a sulfide part A layer containing a sulfide of a Group 15 element of the periodic table) 5
- an electron transport layer 6 and an electrode (cathode) 7 are laminated in this order.
- the organic thin film solar cell of the present invention has a photoelectric conversion layer which is a composite film in which a sulfide part and an organic semiconductor part are mixed and combined between a pair of electrodes, and one electrode and the photoelectric conversion It is preferable to further have an electron transport layer between the layers. Furthermore, it is preferable that an electron transport layer is further provided between one electrode and the photoelectric conversion layer, and a hole transport layer is further provided between the other electrode and the photoelectric conversion layer.
- An example of the organic thin film solar cell of the present invention when the photoelectric conversion layer is a composite film is schematically shown in FIG. In the organic thin film solar cell 8 shown in FIG.
- a substrate 9, a transparent electrode (anode) 10, a hole transport layer 11, a composite film 14 of an organic semiconductor portion 12 and a sulfide portion 13, an electron transport layer 15, an electrode (cathode) 16) are stacked in this order.
- the preferred lower limit of the thickness of the layer comprising the sulfide moiety is 5 nm, and the preferred upper limit is 5000 nm.
- the thickness is 5 nm or more, light can be absorbed more sufficiently, and the photoelectric conversion efficiency is increased.
- region which cannot carry out electric charge separation can be suppressed as the said thickness is 5000 nm or less, and the fall of photoelectric conversion efficiency can be prevented.
- the more preferable lower limit of the thickness of the layer including the sulfide moiety is 10 nm, the more preferable upper limit is 1000 nm, the still more preferable lower limit is 20 nm, and the still more preferable upper limit is 500 nm.
- a preferable minimum is 5 nm and a preferable upper limit is 1000 nm.
- the thickness is 5 nm or more, light can be absorbed more sufficiently, and the photoelectric conversion efficiency is increased.
- region which cannot carry out charge separation can be suppressed as the said thickness is 1000 nm or less, and the fall of a photoelectric conversion efficiency can be prevented.
- the more preferable lower limit of the thickness of the layer composed of the organic semiconductor portion is 10 nm, the more preferable upper limit is 500 nm, the still more preferable lower limit is 20 nm, and the still more preferable upper limit is 200 nm.
- the preferable lower limit of the thickness of the hole transport layer is 1 nm, and the preferable upper limit is 200 nm.
- the thickness is 1 nm or more, electrons can be more sufficiently blocked.
- the thickness is 200 nm or less, resistance during hole transportation is difficult to be obtained, and the photoelectric conversion efficiency is increased.
- the more preferable lower limit of the thickness of the hole transport layer is 3 nm, the more preferable upper limit is 150 nm, the still more preferable lower limit is 5 nm, and the still more preferable upper limit is 100 nm.
- a preferable lower limit of the thickness of the electron transport layer is 1 nm, and a preferable upper limit is 200 nm.
- a preferable lower limit of the thickness of the electron transport layer is 1 nm or more, holes can be blocked more sufficiently.
- the thickness is 200 nm or less, resistance during electron transportation is unlikely to occur, and the photoelectric conversion efficiency is increased.
- the more preferable lower limit of the thickness of the electron transport layer is 3 nm, the more preferable upper limit is 150 nm, the still more preferable lower limit is 5 nm, and the still more preferable upper limit is 100 nm.
- the preferable lower limit of the thickness of the photoelectric conversion layer is 30 nm, and the preferable upper limit is 3000 nm.
- the thickness is 30 nm or more, light can be absorbed more sufficiently, and the photoelectric conversion efficiency is increased.
- the thickness is 3000 nm or less, electric charges easily reach the electrode, and the photoelectric conversion efficiency is increased.
- the more preferable lower limit of the thickness of the photoelectric conversion layer is 40 nm
- the more preferable upper limit is 1000 nm
- the still more preferable lower limit is 50 nm
- the still more preferable upper limit is 500 nm.
- the ratio between the sulfide site and the organic semiconductor site is very important.
- the ratio between the sulfide site and the organic semiconductor site is preferably 1: 9 to 9: 1 (volume ratio).
- the ratio is more preferably 2: 8 to 8: 2 (volume ratio).
- the method for producing the organic thin film solar cell of the present invention is not particularly limited.
- an electrode (anode) is formed on the substrate, and then the surface of the electrode (anode) is formed.
- a layer composed of an organic semiconductor region is formed by a printing method such as spin coating, a vacuum deposition method, etc., and then a layer composed of a sulfide region is formed on the surface of the layer composed of the organic semiconductor region by a vacuum deposition method or the like.
- a method of forming an electrode (cathode) on the surface of the layer composed of the sulfide portion may be formed in this order.
- the organic semiconductor can enter a fine gap in the sulfide site because the molecular weight of the organic semiconductor is less than 10,000. . For this reason, the organic thin film solar cell of this invention becomes small [dispersion
- the organic semiconductor site can be formed stably and simply by a printing method such as a spin coating method, the cost for forming the organic semiconductor site can be reduced.
- a precursor solution of a sulfide of a group 15 element of a periodic table or a nanoparticle dispersion of a group 15 element of a periodic table is spin-coated.
- the film can also be formed by a printing method such as
- the photoelectric conversion layer is a composite film
- a precursor solution of an organic semiconductor having a molecular weight of less than 10,000 and a sulfide of a group 15 element of the periodic table, or a nanostructure of a sulfide of the group 15 element of the periodic table It can be set as a composite film using the liquid mixture which mixed the particle dispersion liquid.
- a composite film can be produced by co-evaporating a sulfide of a group 15 element of the periodic table and an organic semiconductor having a molecular weight of less than 10,000.
- the photoelectric conversion efficiency is high, the dispersion
- Examples 1 to 11 and Comparative Examples 1 to 16 below show the production of organic thin-film solar cells when the photoelectric conversion layer is a laminate.
- Example 1 An ITO film having a thickness of 240 nm was formed as a cathode on a glass substrate, and was ultrasonically cleaned for 10 minutes each using acetone, methanol and isopropyl alcohol in this order, and then dried.
- ⁇ Electron transport layer> On the surface of the ITO film, a dispersion of zinc oxide nanoparticles as an electron transport layer was formed to a thickness of 50 nm by spin coating.
- an antimony sulfide film having a thickness of 40 nm was formed by vacuum deposition as a layer composed of sulfide sites (mainly acting as an N-type semiconductor), and annealing was performed at 260 ° C. for 2 minutes. Further, copper phthalocyanine (molecular weight 576) was formed in a thickness of 30 nm as a layer made of an organic semiconductor portion (mainly acting as a P-type semiconductor) on the surface of the layer made of the sulfide portion by a vacuum evaporation method.
- PEDOT polystyrene sulfonate
- Example 2 uses ⁇ -6T ( ⁇ -sexithiophene) (molecular weight 495) instead of copper phthalocyanine (molecular weight 576), and Example 3 uses pentacene (molecular weight 278). Thus, an organic thin film solar cell was obtained.
- Example 4 In the same manner as in Example 1, except that t-butyl group-containing copper phthalocyanine (manufactured by Aldrich, molecular weight 800) was used instead of copper phthalocyanine (molecular weight 576), a film having a thickness of 20 nm was formed by spin coating. A thin film solar cell was obtained.
- t-butyl group-containing copper phthalocyanine manufactured by Aldrich, molecular weight 800
- copper phthalocyanine molecular weight 576
- Example 5 In Example 5, compound 1 (weight average molecular weight 5400) was used instead of copper phthalocyanine (molecular weight 576), and in Example 6, compound 2 (weight average molecular weight 8100) was used to form a film having a thickness of 20 nm by spin coating. Except for this, an organic thin film solar cell was obtained in the same manner as in Example 1.
- Compounds 1 and 2 are diketopyrrolopyrrole skeleton-containing donor-acceptor type polymers having different weight average molecular weights, and were synthesized as follows.
- reaction solution was cooled to room temperature and poured into 200 mL of methanol to precipitate a polymer.
- the precipitated polymer was separated by filtration, dissolved in 60 mL of chloroform, added with 60 mL of aqueous ammonia, and stirred at room temperature for 4 hours.
- the organic layer was taken out by liquid separation operation, and 60 mL of about 0.1 mol / L of ethylenediaminetetraacetic acid disodium salt (EDTA 2 Na) was added to the organic layer, followed by stirring at room temperature for 16 hours.
- EDTA 2 Na ethylenediaminetetraacetic acid disodium salt
- the obtained dried solid was dissolved in about 1 mL of chloroform and then poured into 500 mL of methanol to precipitate a polymer.
- the precipitated polymer was filtered off, washed successively with methanol, water and hexane, and dried under reduced pressure to obtain black-green compound 1 (solid, 10 mg, yield 20% with respect to the diketopyrrolopyrrole derivative).
- Compound 1 had a number average molecular weight of 4,100 and a weight average molecular weight of 5,400.
- the number average molecular weight and the weight average molecular weight were measured at 40 ° C. in chloroform using gel permeation chromatography (HLC-8020, manufactured by Tosoh Corporation), and calculated based on standard polystyrene.
- the precipitated polymer was separated by filtration, dissolved in 25 mL of chloroform, added with 25 mL of aqueous ammonia, and stirred for 3 hours.
- the organic layer was taken out by a liquid separation operation, 75 mg of ethylenediaminetetraacetic acid (EDTA) was added to the organic layer, and the mixture was stirred at room temperature for 16 hours, and further 25 mL of water was added and stirred for 12 hours.
- EDTA ethylenediaminetetraacetic acid
- the organic layer was taken out again by a liquid separation operation, and the solvent was distilled off under reduced pressure.
- the obtained dried solid was dissolved in about 1 mL of chloroform and then poured into 500 mL of methanol to precipitate a polymer.
- the precipitated polymer was filtered off, washed successively with methanol, water and hexane, and dried under reduced pressure to obtain black-blue compound 2 (solid, 32.4 mg, yield 60% with respect to the diketopyrrolopyrrole derivative).
- Compound 2 had a number average molecular weight of 4000 and a weight average molecular weight of 8,100. The number average molecular weight and the weight average molecular weight were measured at 40 ° C. in chloroform using gel permeation chromatography (HLC-8020, manufactured by Tosoh Corporation), and calculated based on standard polystyrene.
- Example 7 zinc phthalocyanine (molecular weight 579) was used instead of copper phthalocyanine (molecular weight 576), and in Example 8, alkoxy group-containing zinc phthalocyanine (zinc 1,4,8,11,15,18,22,25-octa).
- An organic thin film solar cell was obtained in the same manner as in Example 1 except that butoxy-29H, 31H-phthalocyanine, molecular weight 1163) was used, and benzoporphyrin (molecular weight 510) was used in Example 9.
- Example 10 In the same manner as in Example 1 except that bicycloporphyrin (molecular weight 510) was used instead of copper phthalocyanine (molecular weight 576), and bicycloporphyrin was converted to benzoporphyrin by heat treatment at 180 ° C. to form a benzoporphyrin layer. A thin film solar cell was obtained.
- Example 11 An organic thin film solar cell was obtained in the same manner as in Example 1 except that bismuth sulfide was used instead of antimony sulfide.
- Example 1 Example 1 except that fullerene was used instead of antimony sulfide and poly-3-hexylthiophene (weight average molecular weight 40000) was used instead of copper phthalocyanine (molecular weight 576) to form a film having a thickness of 40 nm by spin coating. In the same manner, an organic thin film solar cell was obtained.
- Comparative Examples 2 and 3 In Comparative Example 2, the annealing temperature at the time of fullerene layer formation was changed to 180 ° C., and in Comparative Example 3, an organic thin film solar cell was obtained in the same manner as in Comparative Example 1 except that the annealing at the time of fullerene layer formation was not performed. .
- Comparative Example 4 uses zinc oxide nanoparticles to form a film by spin coating
- Comparative Example 5 uses tin sulfide
- Comparative Example 6 uses zinc sulfide nanoparticles to form a film by spin coating.
- Comparative Example 7 an organic thin film solar cell was obtained in the same manner as Comparative Example 1 except that bismuth sulfide was used.
- ⁇ Electron transport layer> On the surface of the layer composed of sulfide sites, a dispersion of zinc oxide nanoparticles as an electron transport layer was formed to a thickness of 50 nm by spin coating, and annealed at 260 ° C. for 2 minutes.
- ⁇ Cathode> On the surface of the electron transport layer, an aluminum film having a thickness of 100 nm was formed as a cathode by vacuum vapor deposition to obtain an organic thin film solar cell.
- poly-3-hexylthiophene (weight average molecular weight 40000) as a layer made of an organic semiconductor portion (mainly acting as a P-type semiconductor) is formed on the surface of the layer made of the sulfide portion by a spin coating method to a thickness of 40 nm.
- a film was formed.
- Polyethylene dioxide thiophene: polystyrene sulfonate (PEDOT: PSS) as a hole transport layer was formed on the surface of the layer composed of the organic semiconductor site to a thickness of 50 nm by a spin coating method.
- ⁇ Anode> On the surface of the hole transport layer, a gold film having a thickness of 100 nm was formed as an anode by vacuum vapor deposition to obtain an organic thin film solar cell.
- Comparative Examples 11 and 12 In Comparative Example 11, the annealing temperature at the time of forming the layer consisting of sulfide sites was changed to 240 ° C., and in Comparative Example 12, the annealing temperature at the time of forming the layer consisting of sulfide sites was changed to 200 ° C. Similarly, an organic thin film solar cell was obtained.
- Comparative Examples 13 to 16 instead of antimony sulfide, a fullerene derivative is used in Comparative Example 13, a film is formed by spin coating using zinc oxide nanoparticles in Comparative Example 14, and a film is formed by spin coating using zinc sulfide nanoparticles in Comparative Example 15.
- Comparative Example 16 an organic thin film solar cell was obtained in the same manner as in Example 10 except that tin sulfide was used.
- Examples 12 to 14 and Comparative Examples 17 to 20 below show the production of organic thin-film solar cells when the photoelectric conversion layer is a composite film.
- Example 12 A composite film of antimony sulfide (mainly acting as an N-type semiconductor) and copper phthalocyanine (molecular weight 576) (mainly acting as a P-type semiconductor) is formed to a thickness of 100 nm by a co-evaporation method, and then at 260 ° C. for 2 minutes. An organic thin film solar cell was obtained in the same manner as in Example 1 except that annealing was performed. The volume ratio of antimony sulfide to copper phthalocyanine was 8: 2.
- Example 13 In Example 13, a composite film of antimony sulfide and copper phthalocyanine (molecular weight 576) was formed to a thickness of 160 nm in Example 14, and a composite film of bismuth sulfide and copper phthalocyanine (molecular weight 576) was formed to a thickness of 160 nm by co-evaporation.
- An organic thin film solar cell was obtained in the same manner as in Example 1 except that annealing was performed at 260 ° C. for 2 minutes.
- the volume ratio of antimony sulfide or bismuth sulfide to copper phthalocyanine was 6: 4.
- ⁇ Photoelectric conversion layer (composite film)> 8 parts by weight of a fullerene derivative (PCBM, manufactured by American Dice Source) and 10 parts by weight of poly-3-hexylthiophene (weight average molecular weight 40000) are dispersed and dissolved in 600 parts by weight of chlorobenzene to obtain a mixed solution.
- This mixed solution was applied on the surface of the hole transport layer and formed into a film having a thickness of 150 nm to obtain a composite film.
- Comparative Example 20 Similar to Comparative Example 17, except that antimony sulfide was used instead of the fullerene derivative and compound 3 (weight average molecular weight 12100) was used instead of poly-3-hexylthiophene (weight average molecular weight 40000). A battery was obtained.
- Compound 3 is a diketopyrrolopyrrole skeleton-containing donor-acceptor polymer and was synthesized as follows.
- the precipitated polymer was separated by filtration, dissolved in 25 mL of chloroform, added with 25 mL of aqueous ammonia, and stirred for 3 hours.
- the organic layer was taken out by a liquid separation operation, 75 mg of ethylenediaminetetraacetic acid (EDTA) was added to the organic layer, and the mixture was stirred at room temperature for 16 hours, and further 25 mL of water was added and stirred for 12 hours.
- EDTA ethylenediaminetetraacetic acid
- the organic layer was taken out again by a liquid separation operation, and the solvent was distilled off under reduced pressure.
- the obtained dried solid was dissolved in about 1 mL of chloroform and then poured into 500 mL of methanol to precipitate a polymer.
- the precipitated polymer was filtered off, washed successively with methanol, water and hexane, and dried under reduced pressure to obtain black-blue compound 3 (solid, 32.4 mg, yield 42% with respect to the diketopyrrolopyrrole derivative).
- Compound 3 had a number average molecular weight of 7,600 and a weight average molecular weight of 12,100. The number average molecular weight and the weight average molecular weight were measured at 40 ° C. in chloroform using gel permeation chromatography (HLC-8020, manufactured by Tosoh Corporation), and calculated based on standard polystyrene.
- the photoelectric conversion efficiency is high, the dispersion
- Organic thin film solar cell 1
- Transparent electrode (anode) 4 Layers consisting of organic semiconductor parts (layers containing organic semiconductors with a molecular weight of less than 10,000)
- Layers composed of sulfide sites layers containing sulfides of Group 15 elements of the periodic table
- Electron transport layer 7
- Electrode (cathode) 8
- Organic thin film solar cell 9
- Transparent electrode (anode) 11 hole transport layer 12 organic semiconductor part 13 sulfide part 14 composite film 15 electron transport layer 16 electrode (cathode)
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Abstract
Description
以下、本発明を詳述する。
このような光電変換層においては、上記硫化物部位が主にN型半導体として、上記有機半導体部位が主にP型半導体として働くと推測され、光励起によりP型半導体又はN型半導体で光キャリア(電子-ホール対)が生成し、電子がN型半導体を、ホールがP型半導体を移動することで、電界が生じる。ただし、上記硫化物部位は、部分的にはP型半導体として働いていてもよいし、上記有機半導体部位は、部分的にはN型半導体として働いていてもよい。
また、硫化物部位と有機半導体部位とを組み合わせて用いることにより、本発明の有機薄膜太陽電池は電荷分離効率が極めて高くなり、光電変換効率が高くなる。また、N型半導体とP型半導体とがいずれも無機半導体である場合はこれらの固溶体が界面で析出する可能性があるのに対し、本発明の有機薄膜太陽電池においては固溶体の析出がなく、高温時においても高い安定性を得ることができる。
上記周期表15族元素の硫化物は、周期表15族元素の2種以上の元素を同一の分子に含有する複合硫化物であってもよい。
なお、結晶性半導体とは、X線回折測定等で測定し、散乱ピークが検出できる半導体を意味する。
なお、結晶化度は、X線回折測定等により検出された結晶質由来の散乱ピークと、非晶質部由来のハローとをフィッティングにより分離し、それぞれの強度積分を求めて、全体のうちの結晶質部分の比を算出することにより求めることができる。
上記分子量1万未満の有機半導体は特に限定されず、例えば、チオフェン骨格、フタロシアニン骨格、ナフタロシアニン骨格、ペンタセン骨格、ベンゾポルフィリン骨格等のポルフィリン骨格等を有する化合物が挙げられる。なかでも、比較的耐久性が高いことから、チオフェン骨格、フタロシアニン骨格、ナフタロシアニン骨格、ベンゾポルフィリン骨格を有する化合物が好ましい。
光電変換層が積層体である場合の本発明の有機薄膜太陽電池の一例を図1に模式的に示す。図1に示す有機薄膜太陽電池1においては、基板2、透明電極(陽極)3、有機半導体部位からなる層(分子量1万未満の有機半導体を含有する層)4、硫化物部位からなる層(周期表15族元素の硫化物を含有する層)5、電子輸送層6、電極(陰極)7がこの順で積層されている。
光電変換層が複合膜である場合の本発明の有機薄膜太陽電池の一例を図2に模式的に示す。図2に示す有機薄膜太陽電池8においては、基板9、透明電極(陽極)10、ホール輸送層11、有機半導体部位12と硫化物部位13との複合膜14、電子輸送層15、電極(陰極)16がこの順で積層されている。
以下の実施例1~11及び比較例1~16には、光電変換層が積層体である場合の有機薄膜太陽電池の製造を示す。
<陰極>
ガラス基板上に、陰極として厚み240nmのITO膜を形成し、アセトン、メタノール及びイソプロピルアルコールをこの順に用いて各10分間超音波洗浄した後、乾燥させた。
<電子輸送層>
ITO膜の表面上に、電子輸送層として酸化亜鉛ナノ粒子の分散液をスピンコート法により50nmの厚みに成膜した。
<光電変換層(積層体)>
電子輸送層の表面上に、硫化物部位からなる層(主にN型半導体として働く)として硫化アンチモンを真空蒸着法により40nmの厚みに成膜して、260℃で2分アニーリングを行った。更に、この硫化物部位からなる層の表面上に、有機半導体部位からなる層(主にP型半導体として働く)として銅フタロシアニン(分子量576)を真空蒸着法により30nmの厚みに成膜した。
<ホール輸送層>
有機半導体部位からなる層の表面上に、ホール輸送層としてポリエチレンジオキサイドチオフェン:ポリスチレンスルフォネート(PEDOT:PSS)をスピンコート法により50nmの厚みに成膜した。
<陽極>
ホール輸送層の表面上に、陽極として真空蒸着により厚み100nmの金膜を形成し、有機薄膜太陽電池を得た。
銅フタロシアニン(分子量576)の代わりに実施例2ではα-6T(α-セキシチオフェン)(分子量495)を用い、実施例3ではペンタセン(分子量278)を用いたこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
銅フタロシアニン(分子量576)の代わりにt-ブチル基含有銅フタロシアニン(アルドリッチ社製、分子量800)を用いてスピンコート法により20nmの厚みに成膜したこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
銅フタロシアニン(分子量576)の代わりに実施例5では化合物1(重量平均分子量5400)を用い、実施例6では化合物2(重量平均分子量8100)を用いてスピンコート法により20nmの厚みに成膜したこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
なお、化合物1、2は、それぞれ重量平均分子量が異なるジケトピロロピロール骨格含有ドナーアクセプター型ポリマーであり、以下のようにして合成した。
攪拌機を備え付け、窒素置換を行った25mL容量のシュレンク管Aに、ジケトピロロピロール誘導体54.0mg(0.057ミリモル)、5,5’-ビス(4,4,5,5-テトラメチル-1,3,2-ジオキサボラン-2-イル)-2,2’-ビチオフェン24.0mg(0.057ミリモル)、トリフェニルホスフィン(PPh3)1.5mg(5.7マイクロモル)、凍結脱気を3回行ったトルエン0.96mL及びAliquant336 54.0μLを仕込んだ。
別の25mL容量のシュレンク管Bの窒素置換を行い、リン酸トリカリウム(K3PO4)615mg(2.9ミリモル)及び蒸留水1.1mLを仕込み、窒素バブリングを20分行った。得られた水溶液107μLをシュレンク管Aに加え、次いで、トリス(ジベンジリデンアセトン)二パラジウム(0)(Pd2(dba)3)2.2mg(2.4マイクロモル)を加え、窒素雰囲気下で115℃まで昇温し、同温度で72時間反応させた。その後、反応液を室温まで冷却し、メタノール200mLに注いでポリマーを析出させた。
析出したポリマーをろ別した後、クロロホルム60mLに溶かし、アンモニア水60mLを加え、室温で4時間攪拌した。分液操作によって有機層を取り出し、有機層に約0.1モル/リットルのエチレンジアミン四酢酸2ナトリウム塩(EDTA2Na)を60mL加え、室温で16時間攪拌した。次に、再度分液操作によって有機層を取り出し、溶媒を減圧留去した。得られた乾燥後の固体を約1mLのクロロホルムに溶解させた後、メタノール500mLに注ぎ、ポリマーを析出させた。析出したポリマーをろ別した後、メタノール、水及びヘキサンで順次洗浄し、減圧乾燥して黒緑色の化合物1(固体、10mg、ジケトピロロピロール誘導体に対する収率20%)を得た。
化合物1の数平均分子量は4100、重量平均分子量は5400であった。なお、数平均分子量及び重量平均分子量は、ゲルパーミエーションクロマトグラフィー(東ソー社製、HLC-8020)を用いて、クロロホルム中40℃にて測定し、標準ポリスチレンを基準にして算出した。
撹拌機を備え付け、窒素置換を行った25mL容量のシュレンク管Aに、ジケトピロロピロール誘導体(Lumtec社製)59.8mg(0.063ミリモル)、2,5-チオフェンジボロン酸11.0mg(0.064ミリモル)、Aliquat336 59.2μL、トルエン59.2μL及びトリフェニルフホスフィン(PPh3)1.6mg(6.2マイクロモル)を仕込んだ。
リン酸トリカリウム(K3PO4)67.4mg(0.32ミリモル)を溶解させた蒸留水0.12mLとトルエン1.1mLとの混合溶液を、シュレンク管Aに加え、窒素バブリングを5分行った。次いで、トリス(ジベンジリデンアセトン)二パラジウム(0)(Pd2(dba)3)2.4mg(2.6マイクロモル)を加え、窒素雰囲気下で115℃まで昇温し、同温度で72時間反応させた。その後、反応液を室温まで冷却し、メタノール500mLに注いでポリマーを析出させた。
析出したポリマーをろ別した後、クロロホルム25mLに溶かし、アンモニア水25mLを加え、3時間攪拌した。分液操作によって有機層を取り出し、有機層にエチレンジアミン四酢酸(EDTA)を75mg加え、室温で16時間攪拌し、更に、水25mLを加え、12時間撹拌した。次に、再度分液操作によって有機層を取り出し、溶媒を減圧留去した。得られた乾燥後の固体を約1mLのクロロホルムに溶解させた後、メタノール500mLに注ぎ、ポリマーを析出させた。析出したポリマーをろ別した後、メタノール、水及びヘキサンで順次洗浄し、減圧乾燥して黒青色の化合物2(固体、32.4mg、ジケトピロロピロール誘導体に対する収率60%)を得た。
化合物2の数平均分子量は4000、重量平均分子量は8100であった。なお、数平均分子量及び重量平均分子量は、ゲルパーミエーションクロマトグラフィー(東ソー社製、HLC-8020)を用いて、クロロホルム中40℃にて測定し、標準ポリスチレンを基準にして算出した。
銅フタロシアニン(分子量576)の代わりに実施例7では亜鉛フタロシアニン(分子量579)を用い、実施例8ではアルコキシ基含有亜鉛フタロシアニン(亜鉛1,4,8,11,15,18,22,25-オクタブトキシ-29H,31H-フタロシアニン、分子量1163)を用い、実施例9ではベンゾポルフィリン(分子量510)を用いたこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
銅フタロシアニン(分子量576)の代わりにビシクロポルフィリン(分子量510)を用い、180℃の熱処理によりビシクロポルフィリンをベンゾポルフィリンに変換してベンゾポルフィリン層を形成したこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
硫化アンチモンの代わりに硫化ビスマスを用いたこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
硫化アンチモンの代わりにフラーレンを用い、銅フタロシアニン(分子量576)の代わりにポリ-3-ヘキシルチオフェン(重量平均分子量40000)を用いてスピンコート法により40nmの厚みに成膜したこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
比較例2ではフラーレン層形成時のアニール温度を180℃に変更し、比較例3ではフラーレン層形成時のアニーリングを行わなかったこと以外は比較例1と同様にして、有機薄膜太陽電池を得た。
フラーレンの代わりに、比較例4では酸化亜鉛ナノ粒子を用いてスピンコート法により成膜し、比較例5では硫化スズを用い、比較例6では硫化亜鉛ナノ粒子を用いてスピンコート法により成膜し、比較例7では硫化ビスマスを用いたこと以外は比較例1と同様にして、有機薄膜太陽電池を得た。
<陽極>
ガラス基板上に、陽極として厚み240nmのITO膜を形成し、アセトン、メタノール及びイソプロピルアルコールをこの順に用いて各10分間超音波洗浄した後、乾燥させた。
<光電変換層(積層体)>
ITO膜の表面上に、硫化銅(主にP型半導体として働く)を真空蒸着法により50nmの厚みに成膜した。次いで、この硫化銅層の表面上に、硫化物部位からなる層(主にN型半導体として働く)として硫化アンチモンを真空蒸着法により40nmの厚みに成膜した。
<電子輸送層>
硫化物部位からなる層の表面上に、電子輸送層として酸化亜鉛ナノ粒子の分散液をスピンコート法により50nmの厚みに成膜して、260℃で2分アニーリングを行った。
<陰極>
電子輸送層の表面上に、陰極として真空蒸着により厚み100nmのアルミニウム膜を形成し、有機薄膜太陽電池を得た。
銅フタロシアニン(分子量576)の代わりにポリ-3-ヘキシルチオフェン(重量平均分子量40000)を用いてスピンコート法により40nmの厚みに成膜したこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。
<陰極>
ガラス基板上に、陰極として厚み240nmのITO膜を形成し、アセトン、メタノール及びイソプロピルアルコールをこの順に用いて各10分間超音波洗浄した後、乾燥させた。
<光電変換層(積層体)>
ITO膜の表面上に、硫化物部位からなる層(主にN型半導体として働く)として硫化アンチモンを真空蒸着法により40nmの厚みに成膜して、260℃で2分アニーリングを行った。更に、この硫化物部位からなる層の表面上に、有機半導体部位からなる層(主にP型半導体として働く)としてポリ-3-ヘキシルチオフェン(重量平均分子量40000)をスピンコート法により40nmの厚みに成膜した。
<ホール輸送層>
有機半導体部位からなる層の表面上に、ホール輸送層としてポリエチレンジオキサイドチオフェン:ポリスチレンスルフォネート(PEDOT:PSS)をスピンコート法により50nmの厚みに成膜した。
<陽極>
ホール輸送層の表面上に、陽極として真空蒸着により厚み100nmの金膜を形成し、有機薄膜太陽電池を得た。
比較例11では硫化物部位からなる層形成時のアニール温度を240℃に変更し、比較例12では硫化物部位からなる層形成時のアニール温度を200℃に変更したこと以外は比較例9と同様にして、有機薄膜太陽電池を得た。
硫化アンチモンの代わりに比較例13ではフラーレン誘導体を用い、比較例14では酸化亜鉛ナノ粒子を用いてスピンコート法により成膜し、比較例15では硫化亜鉛ナノ粒子を用いてスピンコート法により成膜し、比較例16では硫化スズを用いたこと以外は実施例10と同様にして、有機薄膜太陽電池を得た。
共蒸着法により硫化アンチモン(主にN型半導体として働く)と銅フタロシアニン(分子量576)(主にP型半導体として働く)との複合膜を厚み100nmに成膜し、その後、260℃で2分アニーリングを行ったこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。硫化アンチモンと銅フタロシアニンとの体積比は8:2であった。
共蒸着法により、実施例13では硫化アンチモンと銅フタロシアニン(分子量576)との複合膜を、実施例14では硫化ビスマスと銅フタロシアニン(分子量576)との複合膜を厚み160nmに成膜し、その後、260℃で2分アニーリングを行ったこと以外は実施例1と同様にして、有機薄膜太陽電池を得た。硫化アンチモン又は硫化ビスマスと銅フタロシアニンとの体積比は6:4であった。
<陽極>
ガラス基板上に、陽極として厚み240nmのITO膜を形成し、アセトン、メタノール及びイソプロピルアルコールをこの順に用いて各10分間超音波洗浄した後、乾燥させた。
<ホール輸送層>
ITO膜の表面上に、ホール輸送層としてポリエチレンジオキサイドチオフェン:ポリスチレンスルフォネート(PEDOT:PSS)をスピンコート法により50nmの厚みに成膜した。
<光電変換層(複合膜)>
8重量部のフラーレン誘導体(PCBM、アメリカンダイソース社製)と、10重量部のポリ-3-ヘキシルチオフェン(重量平均分子量40000)とを、600重量部のクロロベンゼンに分散及び溶解させて、混合溶液を調製した。この混合溶液を、ホール輸送層の表面上に塗布して150nmの厚みに成膜し、複合膜とした。
<電子輸送層>
光電変換層の表面上に、電子輸送層として酸化亜鉛ナノ粒子の分散液をスピンコート法により50nmの厚みに成膜した。
<陰極>
電子輸送層の表面上に、陰極として真空蒸着により厚み100nmのアルミニウム膜を形成し、有機薄膜太陽電池を得た。
フラーレン誘導体の代わりに、比較例18では酸化亜鉛ナノ粒子を用い、比較例19では硫化亜鉛ナノ粒子を用いたこと以外は比較例17と同様にして、有機薄膜太陽電池を得た。
フラーレン誘導体の代わりに硫化アンチモンを用い、ポリ-3-ヘキシルチオフェン(重量平均分子量40000)の代わりに化合物3(重量平均分子量12100)を用いたこと以外は比較例17と同様にして、有機薄膜太陽電池を得た。
なお、化合物3は、ジケトピロロピロール骨格含有ドナーアクセプター型ポリマーであり、以下のようにして合成した。
撹拌機を備え付け、窒素置換を行った25mL容のシュレンク管Aに、ジケトピロロピロール誘導体(Lumtec社製)59.8mg(0.063ミリモル)、2,5-チオフェンジボロン酸11.0mg(0.064ミリモル)、Aliquat336 59.2μl、テトラヒドロフラン59.2μL及びトリフェニルフホスフィン(PPh3)1.6mg(6.2マイクロモル)を仕込んだ。
炭酸ナトリウム(Na2CO3)0.32ミリモルを溶解させた蒸留水0.12mLとテトラヒドロフラン1.1mLとの混合溶液を、シュレンク管Aに加え、窒素バブリングを5分行った。次いで、トリス(ジベンジリデンアセトン)二パラジウム(0)(Pd2(dba)3)2.4mg(2.6マイクロモル)を加え、窒素雰囲気下で85℃まで昇温し、同温度で72時間反応させた。その後、反応液を室温まで冷却し、メタノール500mLに注いでポリマーを析出させた。
析出したポリマーをろ別した後、クロロホルム25mLに溶かし、アンモニア水25mLを加え、3時間攪拌した。分液操作によって有機層を取り出し、有機層にエチレンジアミン四酢酸(EDTA)を75mg加え、室温で16時間攪拌し、更に、水25mLを加え、12時間撹拌した。次に、再度分液操作によって有機層を取り出し、溶媒を減圧留去した。得られた乾燥後の固体を約1mLのクロロホルムに溶解させた後、メタノール500mLに注ぎ、ポリマーを析出させた。析出したポリマーをろ別した後、メタノール、水及びヘキサンで順次洗浄し、減圧乾燥して黒青色の化合物3(固体、32.4mg、ジケトピロロピロール誘導体に対する収率42%)を得た。
化合物3の数平均分子量は7600、重量平均分子量は12100であった。なお、数平均分子量及び重量平均分子量は、ゲルパーミエーションクロマトグラフィー(東ソー社製、HLC-8020)を用いて、クロロホルム中40℃にて測定し、標準ポリスチレンを基準にして算出した。
(1)光電変換効率の測定
有機薄膜太陽電池の電極間に、電源(KEITHLEY社製、236モデル)を接続し、100mW/cm2の強度のソーラーシミュレータ(山下電装社製)を用いて有機薄膜太陽電池の光電変換効率を測定した。比較例3の光電変換効率を1.00として規格化した(相対光電変換効率(比較例3との対比))。
有機薄膜太陽電池をガラス封止し、温度60℃、湿度35%の状態で60mW/cm2の光を24時間照射して耐候試験を行った。耐候試験前後の光電変換効率を上記と同様にして測定し、初期の光電変換効率(初期値)を1.00としたときの耐候試験後の相対変換効率を求めた。
上記の実施例及び比較例における有機薄膜太陽電池の製造方法と同じ方法で、25mm角のITOガラス内に、4つの評価用セルを作製した。4つの評価用セルの光電変換効率を上記と同様にしてそれぞれ測定した。
× 光電変換効率の最大値と最小値との差が、最大値の20%より大きかった
○ 光電変換効率の最大値と最小値との差が、最大値の20%以下であった
下記の基準で評価した。
× 相対光電変換効率(比較例3との対比)が1以下、又は、耐候試験後の相対変換効率(初期値との対比)が0.8以下、又は、光電変換効率のばらつきが×であった
○ 相対光電変換効率(比較例3との対比)が1を超えており、耐候試験後の相対変換効率(初期値との対比)が0.8を超えており、かつ、光電変換効率のばらつきが○であった
2 基板
3 透明電極(陽極)
4 有機半導体部位からなる層(分子量1万未満の有機半導体を含有する層)
5 硫化物部位からなる層(周期表15族元素の硫化物を含有する層)
6 電子輸送層
7 電極(陰極)
8 有機薄膜太陽電池
9 基板
10 透明電極(陽極)
11 ホール輸送層
12 有機半導体部位
13 硫化物部位
14 複合膜
15 電子輸送層
16 電極(陰極)
Claims (6)
- 光電変換層を有する有機薄膜太陽電池であって、
前記光電変換層は、周期表15族元素の硫化物を含有する部位と、分子量1万未満の有機半導体を含有する部位とを含み、
前記周期表15族元素の硫化物を含有する部位と前記分子量1万未満の有機半導体を含有する部位とが互いに接している
ことを特徴とする有機薄膜太陽電池。 - 周期表15族元素の硫化物は、硫化アンチモンであることを特徴とする請求項1記載の有機薄膜太陽電池。
- 光電変換層が、周期表15族元素の硫化物を含有する層と分子量1万未満の有機半導体を含有する層とを含む積層体であることを特徴とする請求項1又は2記載の有機薄膜太陽電池。
- 一組の電極間に、周期表15族元素の硫化物を含有する層と分子量1万未満の有機半導体を含有する層とを含む積層体である光電変換層を有し、
一方の電極と前記周期表15族元素の硫化物を含有する層との間に更に電子輸送層を、他方の電極と前記分子量1万未満の有機半導体を含有する層との間に更にホール輸送層を有することを特徴とする請求項3記載の有機薄膜太陽電池。 - 光電変換層が、周期表15族元素の硫化物を含有する部位と分子量1万未満の有機半導体を含有する部位とを混合して複合化した複合膜であることを特徴とする請求項1又は2記載の有機薄膜太陽電池。
- 一組の電極間に、周期表15族元素の硫化物を含有する部位と分子量1万未満の有機半導体を含有する部位とを混合して複合化した複合膜である光電変換層を有し、
一方の電極と前記光電変換層との間に更に電子輸送層を、他方の電極と前記光電変換層との間に更にホール輸送層を有することを特徴とする請求項5記載の有機薄膜太陽電池。
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US14/374,351 US20150027540A1 (en) | 2012-02-07 | 2013-02-07 | Organic thin film solar cell |
AU2013218713A AU2013218713B2 (en) | 2012-02-07 | 2013-02-07 | Organic thin film solar cell |
JP2013520320A JP5358751B1 (ja) | 2012-02-07 | 2013-02-07 | 有機薄膜太陽電池 |
CN201380008423.1A CN104115298A (zh) | 2012-02-07 | 2013-02-07 | 有机薄膜太阳能电池 |
EP13746416.0A EP2814076A4 (en) | 2012-02-07 | 2013-02-07 | ORGANIC THIN-CEREAL SOLAR CELL |
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JP2015198229A (ja) * | 2014-04-03 | 2015-11-09 | 積水化学工業株式会社 | 薄膜太陽電池及び薄膜太陽電池の製造方法 |
JP2015220331A (ja) * | 2014-05-16 | 2015-12-07 | 住友化学株式会社 | 光電変換素子 |
JP2016139805A (ja) * | 2015-01-27 | 2016-08-04 | 積水化学工業株式会社 | 太陽電池及び有機半導体材料 |
EP3067950A4 (en) * | 2013-11-07 | 2017-06-07 | Sekisui Chemical Co., Ltd. | Coating material for forming semiconductors, semiconductor thin film, thin film solar cell and method for manufacturing thin film solar cell |
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JP5667714B1 (ja) * | 2014-06-16 | 2015-02-12 | 積水化学工業株式会社 | 薄膜太陽電池及び薄膜太陽電池の製造方法 |
JP5667715B1 (ja) * | 2014-06-16 | 2015-02-12 | 積水化学工業株式会社 | 薄膜太陽電池及び薄膜太陽電池の製造方法 |
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AU2013218713A1 (en) | 2014-08-28 |
CN104115298A (zh) | 2014-10-22 |
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US20150027540A1 (en) | 2015-01-29 |
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