WO2013094633A1 - 太陽光反射用フィルムミラー及び太陽熱発電用反射装置 - Google Patents
太陽光反射用フィルムミラー及び太陽熱発電用反射装置 Download PDFInfo
- Publication number
- WO2013094633A1 WO2013094633A1 PCT/JP2012/082903 JP2012082903W WO2013094633A1 WO 2013094633 A1 WO2013094633 A1 WO 2013094633A1 JP 2012082903 W JP2012082903 W JP 2012082903W WO 2013094633 A1 WO2013094633 A1 WO 2013094633A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- layer
- film
- resin
- silver
- Prior art date
Links
- 238000010248 power generation Methods 0.000 title claims description 20
- 239000010410 layer Substances 0.000 claims abstract description 386
- 229920005989 resin Polymers 0.000 claims abstract description 270
- 239000011347 resin Substances 0.000 claims abstract description 270
- 239000011241 protective layer Substances 0.000 claims abstract description 170
- 229910052709 silver Inorganic materials 0.000 claims abstract description 161
- 239000004332 silver Substances 0.000 claims abstract description 161
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 160
- 239000003963 antioxidant agent Substances 0.000 claims description 94
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 87
- 230000003078 antioxidant effect Effects 0.000 claims description 87
- 239000000203 mixture Substances 0.000 claims description 67
- 125000000217 alkyl group Chemical group 0.000 claims description 53
- 125000004432 carbon atom Chemical group C* 0.000 claims description 51
- 229920000642 polymer Polymers 0.000 claims description 47
- 239000012964 benzotriazole Substances 0.000 claims description 44
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 43
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 33
- 239000012790 adhesive layer Substances 0.000 claims description 33
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 22
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 21
- 239000001257 hydrogen Substances 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 20
- 125000003545 alkoxy group Chemical group 0.000 claims description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 6
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 4
- 239000010408 film Substances 0.000 description 434
- -1 polyethylene terephthalate Polymers 0.000 description 228
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 162
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 103
- 239000000178 monomer Substances 0.000 description 100
- 235000006708 antioxidants Nutrition 0.000 description 92
- 150000001875 compounds Chemical class 0.000 description 82
- 238000000034 method Methods 0.000 description 67
- 239000000463 material Substances 0.000 description 57
- 239000000243 solution Substances 0.000 description 57
- 239000000126 substance Substances 0.000 description 52
- 239000002904 solvent Substances 0.000 description 51
- 238000006243 chemical reaction Methods 0.000 description 41
- 150000003254 radicals Chemical class 0.000 description 40
- 238000000576 coating method Methods 0.000 description 39
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 39
- 238000004519 manufacturing process Methods 0.000 description 37
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 35
- 239000011230 binding agent Substances 0.000 description 31
- 239000011248 coating agent Substances 0.000 description 31
- 239000004925 Acrylic resin Substances 0.000 description 30
- 229920000178 Acrylic resin Polymers 0.000 description 30
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 30
- 230000000052 comparative effect Effects 0.000 description 30
- 238000010992 reflux Methods 0.000 description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 28
- 229910001873 dinitrogen Inorganic materials 0.000 description 28
- 229910052751 metal Inorganic materials 0.000 description 28
- 239000002184 metal Substances 0.000 description 28
- 239000007788 liquid Substances 0.000 description 27
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- 150000001412 amines Chemical class 0.000 description 24
- 229920001709 polysilazane Polymers 0.000 description 24
- 150000002902 organometallic compounds Chemical class 0.000 description 23
- 239000003795 chemical substances by application Substances 0.000 description 22
- 238000010438 heat treatment Methods 0.000 description 22
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 22
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 239000011247 coating layer Substances 0.000 description 21
- 239000003999 initiator Substances 0.000 description 21
- OLFNXLXEGXRUOI-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-bis(2-phenylpropan-2-yl)phenol Chemical compound C=1C(N2N=C3C=CC=CC3=N2)=C(O)C(C(C)(C)C=2C=CC=CC=2)=CC=1C(C)(C)C1=CC=CC=C1 OLFNXLXEGXRUOI-UHFFFAOYSA-N 0.000 description 20
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 20
- 229910052809 inorganic oxide Inorganic materials 0.000 description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- 230000007797 corrosion Effects 0.000 description 19
- 238000005260 corrosion Methods 0.000 description 19
- 239000010419 fine particle Substances 0.000 description 19
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 18
- 230000002776 aggregation Effects 0.000 description 18
- 239000002585 base Substances 0.000 description 18
- 238000003756 stirring Methods 0.000 description 18
- 239000000654 additive Substances 0.000 description 17
- 238000004220 aggregation Methods 0.000 description 17
- 230000006866 deterioration Effects 0.000 description 17
- 229920006267 polyester film Polymers 0.000 description 17
- 239000005020 polyethylene terephthalate Substances 0.000 description 17
- 229920000139 polyethylene terephthalate Polymers 0.000 description 17
- 230000002829 reductive effect Effects 0.000 description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 239000006096 absorbing agent Substances 0.000 description 16
- 239000007789 gas Substances 0.000 description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 16
- 239000003505 polymerization initiator Substances 0.000 description 16
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- 230000006750 UV protection Effects 0.000 description 15
- 239000003112 inhibitor Substances 0.000 description 15
- 125000003118 aryl group Chemical group 0.000 description 14
- 230000004888 barrier function Effects 0.000 description 14
- 239000004611 light stabiliser Substances 0.000 description 14
- 238000001816 cooling Methods 0.000 description 13
- 238000002845 discoloration Methods 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- 239000011342 resin composition Substances 0.000 description 13
- 238000003980 solgel method Methods 0.000 description 13
- 238000001771 vacuum deposition Methods 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 230000007423 decrease Effects 0.000 description 12
- 229920001225 polyester resin Polymers 0.000 description 12
- 239000004645 polyester resin Substances 0.000 description 12
- 230000003746 surface roughness Effects 0.000 description 12
- 229910000831 Steel Inorganic materials 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 125000000524 functional group Chemical group 0.000 description 11
- 229910052736 halogen Inorganic materials 0.000 description 11
- 229920001296 polysiloxane Polymers 0.000 description 11
- 229920002050 silicone resin Polymers 0.000 description 11
- 239000010959 steel Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 229920001187 thermosetting polymer Polymers 0.000 description 11
- 238000002834 transmittance Methods 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 10
- BVCZEBOGSOYJJT-UHFFFAOYSA-N ammonium carbamate Chemical class [NH4+].NC([O-])=O BVCZEBOGSOYJJT-UHFFFAOYSA-N 0.000 description 10
- 239000001099 ammonium carbonate Substances 0.000 description 10
- 230000003373 anti-fouling effect Effects 0.000 description 10
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 10
- 239000012965 benzophenone Substances 0.000 description 10
- 239000011231 conductive filler Substances 0.000 description 10
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 10
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 10
- 229920006289 polycarbonate film Polymers 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical class [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 9
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 229920002678 cellulose Polymers 0.000 description 9
- 230000006870 function Effects 0.000 description 9
- 150000002431 hydrogen Chemical class 0.000 description 9
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- 238000002310 reflectometry Methods 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 229910052796 boron Inorganic materials 0.000 description 8
- KXDHJXZQYSOELW-UHFFFAOYSA-N carbonic acid monoamide Natural products NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 8
- 238000005336 cracking Methods 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 238000005096 rolling process Methods 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 7
- 229920000877 Melamine resin Polymers 0.000 description 7
- 239000004698 Polyethylene Substances 0.000 description 7
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 230000000740 bleeding effect Effects 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 7
- 229920001643 poly(ether ketone) Polymers 0.000 description 7
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 7
- 229920000728 polyester Polymers 0.000 description 7
- 239000004926 polymethyl methacrylate Substances 0.000 description 7
- 239000002243 precursor Substances 0.000 description 7
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 150000004703 alkoxides Chemical class 0.000 description 6
- 235000012501 ammonium carbonate Nutrition 0.000 description 6
- ZSIQJIWKELUFRJ-UHFFFAOYSA-N azepane Chemical compound C1CCCNCC1 ZSIQJIWKELUFRJ-UHFFFAOYSA-N 0.000 description 6
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 238000005266 casting Methods 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 6
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 238000007756 gravure coating Methods 0.000 description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 6
- 229910052738 indium Inorganic materials 0.000 description 6
- 239000003446 ligand Substances 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical group 0.000 description 6
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 6
- 239000000113 methacrylic resin Substances 0.000 description 6
- 239000012046 mixed solvent Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- ZQBAKBUEJOMQEX-UHFFFAOYSA-N phenyl salicylate Chemical compound OC1=CC=CC=C1C(=O)OC1=CC=CC=C1 ZQBAKBUEJOMQEX-UHFFFAOYSA-N 0.000 description 6
- 229920000573 polyethylene Polymers 0.000 description 6
- 229940100890 silver compound Drugs 0.000 description 6
- 150000003379 silver compounds Chemical class 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- 239000011135 tin Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 6
- PSYGHMBJXWRQFD-UHFFFAOYSA-N 2-(2-sulfanylacetyl)oxyethyl 2-sulfanylacetate Chemical compound SCC(=O)OCCOC(=O)CS PSYGHMBJXWRQFD-UHFFFAOYSA-N 0.000 description 5
- 229920000298 Cellophane Polymers 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000004640 Melamine resin Substances 0.000 description 5
- 239000004952 Polyamide Substances 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 5
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 125000002723 alicyclic group Chemical group 0.000 description 5
- 239000002216 antistatic agent Substances 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 235000011187 glycerol Nutrition 0.000 description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 5
- 239000012948 isocyanate Substances 0.000 description 5
- 150000002513 isocyanates Chemical class 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000000075 oxide glass Substances 0.000 description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 5
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 5
- 229920002647 polyamide Polymers 0.000 description 5
- 229920001230 polyarylate Polymers 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 230000002441 reversible effect Effects 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 150000003573 thiols Chemical class 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 4
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 229920008347 Cellulose acetate propionate Polymers 0.000 description 4
- 229920001747 Cellulose diacetate Polymers 0.000 description 4
- 229920002284 Cellulose triacetate Polymers 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- 239000004695 Polyether sulfone Substances 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 4
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229920010524 Syndiotactic polystyrene Polymers 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000000274 adsorptive effect Effects 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- FLPKSBDJMLUTEX-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) 2-butyl-2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]propanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)(CCCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 FLPKSBDJMLUTEX-UHFFFAOYSA-N 0.000 description 4
- XITRBUPOXXBIJN-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)NC(C)(C)C1 XITRBUPOXXBIJN-UHFFFAOYSA-N 0.000 description 4
- 239000001569 carbon dioxide Substances 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000004715 ethylene vinyl alcohol Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- RZXDTJIXPSCHCI-UHFFFAOYSA-N hexa-1,5-diene-2,5-diol Chemical compound OC(=C)CCC(O)=C RZXDTJIXPSCHCI-UHFFFAOYSA-N 0.000 description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 125000002883 imidazolyl group Chemical group 0.000 description 4
- 150000003949 imides Chemical class 0.000 description 4
- 125000001841 imino group Chemical group [H]N=* 0.000 description 4
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 4
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 239000010955 niobium Substances 0.000 description 4
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 239000003504 photosensitizing agent Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 4
- 229920002492 poly(sulfone) Polymers 0.000 description 4
- 229920006393 polyether sulfone Polymers 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 239000011112 polyethylene naphthalate Substances 0.000 description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 description 4
- 239000005033 polyvinylidene chloride Substances 0.000 description 4
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 4
- 125000003226 pyrazolyl group Chemical group 0.000 description 4
- 125000000168 pyrrolyl group Chemical group 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 150000003852 triazoles Chemical group 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 3
- LEVFXWNQQSSNAC-UHFFFAOYSA-N 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-hexoxyphenol Chemical compound OC1=CC(OCCCCCC)=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=CC=CC=2)=N1 LEVFXWNQQSSNAC-UHFFFAOYSA-N 0.000 description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 3
- WWZKQHOCKIZLMA-UHFFFAOYSA-N Caprylic acid Natural products CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- QPFYXYFORQJZEC-FOCLMDBBSA-N Phenazopyridine Chemical compound NC1=NC(N)=CC=C1\N=N\C1=CC=CC=C1 QPFYXYFORQJZEC-FOCLMDBBSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- 239000012963 UV stabilizer Substances 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 150000001242 acetic acid derivatives Chemical class 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 3
- RSOILICUEWXSLA-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 RSOILICUEWXSLA-UHFFFAOYSA-N 0.000 description 3
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 3
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 3
- 229920006265 cellulose acetate-butyrate film Polymers 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 3
- 238000007607 die coating method Methods 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000002803 fossil fuel Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 230000000670 limiting effect Effects 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- FDAKZQLBIFPGSV-UHFFFAOYSA-N n-butyl-2,2,6,6-tetramethylpiperidin-4-amine Chemical compound CCCCNC1CC(C)(C)NC(C)(C)C1 FDAKZQLBIFPGSV-UHFFFAOYSA-N 0.000 description 3
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 3
- 229920006284 nylon film Polymers 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 3
- 239000002530 phenolic antioxidant Substances 0.000 description 3
- 229960000969 phenyl salicylate Drugs 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 229940070891 pyridium Drugs 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 3
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 230000002195 synergetic effect Effects 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 125000003944 tolyl group Chemical group 0.000 description 3
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 210000002268 wool Anatomy 0.000 description 3
- 125000005023 xylyl group Chemical group 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- NWHNXXMYEICZAT-UHFFFAOYSA-N 1,2,2,6,6-pentamethylpiperidin-4-ol Chemical compound CN1C(C)(C)CC(O)CC1(C)C NWHNXXMYEICZAT-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 2
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 2
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 2
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 2
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 description 2
- YMMGRPLNZPTZBS-UHFFFAOYSA-N 2,3-dihydrothieno[2,3-b][1,4]dioxine Chemical compound O1CCOC2=C1C=CS2 YMMGRPLNZPTZBS-UHFFFAOYSA-N 0.000 description 2
- IYAZLDLPUNDVAG-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-(2,4,4-trimethylpentan-2-yl)phenol Chemical group CC(C)(C)CC(C)(C)C1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 IYAZLDLPUNDVAG-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- JTNKWKKYIJODNG-UHFFFAOYSA-N 2-[4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy]ethyl 2-methylprop-2-enoate Chemical compound OC1=CC(OCCOC(=O)C(=C)C)=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=CC=CC=2)=N1 JTNKWKKYIJODNG-UHFFFAOYSA-N 0.000 description 2
- SKMNWICOBCDSSQ-UHFFFAOYSA-N 2-[4-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2,6,6-tetramethylpiperidin-1-yl]ethyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCN2C(CC(CC2(C)C)OC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(C)C)=C1 SKMNWICOBCDSSQ-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- UDXBSNUCGGXUNH-UHFFFAOYSA-N 2-cyanoethylazanium;2-cyanoethyl carbonate Chemical compound [NH3+]CCC#N.[O-]C(=O)OCCC#N UDXBSNUCGGXUNH-UHFFFAOYSA-N 0.000 description 2
- XEXHIBLRARSXCL-UHFFFAOYSA-N 2-cyanoethylazanium;hydrogen carbonate Chemical compound OC([O-])=O.[NH3+]CCC#N XEXHIBLRARSXCL-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- WRJRTLNJQQNHLC-UHFFFAOYSA-N 2-ethylhexylazanium;2-ethylhexyl carbonate Chemical compound CCCCC(CC)C[NH3+].CCCCC(CC)COC([O-])=O WRJRTLNJQQNHLC-UHFFFAOYSA-N 0.000 description 2
- LFTWYPLGYKQPMV-UHFFFAOYSA-N 2-ethylhexylazanium;hydrogen carbonate Chemical compound OC([O-])=O.CCCCC(CC)C[NH3+] LFTWYPLGYKQPMV-UHFFFAOYSA-N 0.000 description 2
- JMPXSWBXXUOKFP-UHFFFAOYSA-N 2-ethylhexylazanium;n-(2-ethylhexyl)carbamate Chemical compound CCCCC(CC)C[NH3+].CCCCC(CC)CNC([O-])=O JMPXSWBXXUOKFP-UHFFFAOYSA-N 0.000 description 2
- RLHGFJMGWQXPBW-UHFFFAOYSA-N 2-hydroxy-3-(1h-imidazol-5-ylmethyl)benzamide Chemical compound NC(=O)C1=CC=CC(CC=2NC=NC=2)=C1O RLHGFJMGWQXPBW-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- ASUDFOJKTJLAIK-UHFFFAOYSA-N 2-methoxyethanamine Chemical compound COCCN ASUDFOJKTJLAIK-UHFFFAOYSA-N 0.000 description 2
- HTBCQGGKQJBADY-UHFFFAOYSA-N 2-methoxyethylazanium;2-methoxyethyl carbonate Chemical compound COCC[NH3+].COCCOC([O-])=O HTBCQGGKQJBADY-UHFFFAOYSA-N 0.000 description 2
- IUPKRHGZXTZBKD-UHFFFAOYSA-N 2-methylpropan-1-amine 2-methylpropyl carbamate Chemical compound CC(C)CN.CC(C)COC(N)=O IUPKRHGZXTZBKD-UHFFFAOYSA-N 0.000 description 2
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 description 2
- SZVUQKOTOXVFTL-UHFFFAOYSA-N 2-methylpropylazanium;2-methylpropyl carbonate Chemical compound CC(C)C[NH3+].CC(C)COC([O-])=O SZVUQKOTOXVFTL-UHFFFAOYSA-N 0.000 description 2
- WPMYUUITDBHVQZ-UHFFFAOYSA-M 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=CC(CCC([O-])=O)=CC(C(C)(C)C)=C1O WPMYUUITDBHVQZ-UHFFFAOYSA-M 0.000 description 2
- QZAIBYYLWJZCGH-UHFFFAOYSA-N 3-triethoxysilylpropyl carbamate Chemical compound CCO[Si](OCC)(OCC)CCCOC(N)=O QZAIBYYLWJZCGH-UHFFFAOYSA-N 0.000 description 2
- SKRSRJOKBARNAS-UHFFFAOYSA-N 3-triethoxysilylpropylazanium;3-triethoxysilylpropyl carbonate Chemical compound CCO[Si](OCC)(OCC)CCC[NH3+].CCO[Si](OCC)(OCC)CCCOC([O-])=O SKRSRJOKBARNAS-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- PYPBPYRRAUUNSM-UHFFFAOYSA-N CCCCCCCCCCNC.CCCCCCCCCCOC(OC)=O Chemical compound CCCCCCCCCCNC.CCCCCCCCCCOC(OC)=O PYPBPYRRAUUNSM-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- MUXOBHXGJLMRAB-UHFFFAOYSA-N Dimethyl succinate Chemical compound COC(=O)CCC(=O)OC MUXOBHXGJLMRAB-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical class OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 2
- HWVVYUPLWARZKN-UHFFFAOYSA-N N-butylbutan-1-amine dibutyl carbonate Chemical compound CCCCNCCCC.CCCCOC(=O)OCCCC HWVVYUPLWARZKN-UHFFFAOYSA-N 0.000 description 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 229920002873 Polyethylenimine Polymers 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229920000297 Rayon Polymers 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 2
- BEIOEBMXPVYLRY-UHFFFAOYSA-N [4-[4-bis(2,4-ditert-butylphenoxy)phosphanylphenyl]phenyl]-bis(2,4-ditert-butylphenoxy)phosphane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(C=1C=CC(=CC=1)C=1C=CC(=CC=1)P(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C BEIOEBMXPVYLRY-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 229920003180 amino resin Polymers 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QCLQZCOGUCNIOC-UHFFFAOYSA-N azanylidynelanthanum Chemical compound [La]#N QCLQZCOGUCNIOC-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- QJLWYBRKZCYIEK-UHFFFAOYSA-N benzylazanium;benzyl carbonate Chemical compound [NH3+]CC1=CC=CC=C1.[O-]C(=O)OCC1=CC=CC=C1 QJLWYBRKZCYIEK-UHFFFAOYSA-N 0.000 description 2
- CGABNMAUJREYGO-UHFFFAOYSA-N benzylcarbamic acid;phenylmethanamine Chemical compound NCC1=CC=CC=C1.OC(=O)NCC1=CC=CC=C1 CGABNMAUJREYGO-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- FQUNFJULCYSSOP-UHFFFAOYSA-N bisoctrizole Chemical compound N1=C2C=CC=CC2=NN1C1=CC(C(C)(C)CC(C)(C)C)=CC(CC=2C(=C(C=C(C=2)C(C)(C)CC(C)(C)C)N2N=C3C=CC=CC3=N2)O)=C1O FQUNFJULCYSSOP-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 150000001639 boron compounds Chemical class 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- NMJJFJNHVMGPGM-UHFFFAOYSA-N butyl formate Chemical compound CCCCOC=O NMJJFJNHVMGPGM-UHFFFAOYSA-N 0.000 description 2
- SCJNFWUKTOYSRT-UHFFFAOYSA-N butylazanium;butyl carbonate Chemical compound CCCC[NH3+].CCCCOC([O-])=O SCJNFWUKTOYSRT-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 210000003850 cellular structure Anatomy 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- 229960002887 deanol Drugs 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- FNPQBMYFLGSBBI-UHFFFAOYSA-N decyl(methyl)azanium;n-decyl-n-methylcarbamate Chemical compound CCCCCCCCCC[NH2+]C.CCCCCCCCCCN(C)C([O-])=O FNPQBMYFLGSBBI-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- JKZDDFARANSOQU-UHFFFAOYSA-N diazanium;morpholine;carbonate Chemical compound [NH4+].[NH4+].[O-]C([O-])=O.C1COCCN1.C1COCCN1 JKZDDFARANSOQU-UHFFFAOYSA-N 0.000 description 2
- LXSFGVACVWCFRS-UHFFFAOYSA-N dibutylazanium;n,n-dibutylcarbamate Chemical compound CCCC[NH2+]CCCC.CCCCN(C([O-])=O)CCCC LXSFGVACVWCFRS-UHFFFAOYSA-N 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- ZJIPHXXDPROMEF-UHFFFAOYSA-N dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O ZJIPHXXDPROMEF-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000012972 dimethylethanolamine Substances 0.000 description 2
- WVDBSYPGKQYWSS-UHFFFAOYSA-N dioctadecylazanium;hydrogen carbonate Chemical compound OC([O-])=O.CCCCCCCCCCCCCCCCCC[NH2+]CCCCCCCCCCCCCCCCCC WVDBSYPGKQYWSS-UHFFFAOYSA-N 0.000 description 2
- AYGOKHJRGBNMGQ-UHFFFAOYSA-N dioctadecylazanium;n,n-dioctadecylcarbamate Chemical compound CCCCCCCCCCCCCCCCCC[NH2+]CCCCCCCCCCCCCCCCCC.CCCCCCCCCCCCCCCCCCN(C([O-])=O)CCCCCCCCCCCCCCCCCC AYGOKHJRGBNMGQ-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 2
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- WAAUVORLARCBAF-UHFFFAOYSA-N ethylazanium;ethyl carbonate Chemical compound CC[NH3+].CCOC([O-])=O WAAUVORLARCBAF-UHFFFAOYSA-N 0.000 description 2
- GPUHGQYNYJIMDZ-UHFFFAOYSA-N ethylazanium;n-ethylcarbamate Chemical compound CC[NH3+].CCNC([O-])=O GPUHGQYNYJIMDZ-UHFFFAOYSA-N 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 239000011151 fibre-reinforced plastic Substances 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 2
- RGEULEMUWRTZMP-UHFFFAOYSA-N hydrogen carbonate;2-methoxyethylazanium Chemical compound OC([O-])=O.COCC[NH3+] RGEULEMUWRTZMP-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- BMFVGAAISNGQNM-UHFFFAOYSA-N isopentylamine Chemical compound CC(C)CCN BMFVGAAISNGQNM-UHFFFAOYSA-N 0.000 description 2
- JJWLVOIRVHMVIS-UHFFFAOYSA-O isopropylaminium Chemical compound CC(C)[NH3+] JJWLVOIRVHMVIS-UHFFFAOYSA-O 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- AZVCGYPLLBEUNV-UHFFFAOYSA-N lithium;ethanolate Chemical compound [Li+].CC[O-] AZVCGYPLLBEUNV-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- NPHYYTMURMCAQE-UHFFFAOYSA-N morpholin-4-ium;n-morpholin-4-ylcarbamate Chemical compound C1COCC[NH2+]1.[O-]C(=O)NN1CCOCC1 NPHYYTMURMCAQE-UHFFFAOYSA-N 0.000 description 2
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- BTDGNUHTDOIMKX-UHFFFAOYSA-N octadecan-1-amine octadecyl carbamate Chemical compound CCCCCCCCCCCCCCCCCCN.CCCCCCCCCCCCCCCCCCOC(N)=O BTDGNUHTDOIMKX-UHFFFAOYSA-N 0.000 description 2
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 2
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 2
- XKFXSYSPQZRVOY-UHFFFAOYSA-N octadecylazanium;octadecyl carbonate Chemical compound CCCCCCCCCCCCCCCCCC[NH3+].CCCCCCCCCCCCCCCCCCOC([O-])=O XKFXSYSPQZRVOY-UHFFFAOYSA-N 0.000 description 2
- NMRPBPVERJPACX-UHFFFAOYSA-N octan-3-ol Chemical compound CCCCCC(O)CC NMRPBPVERJPACX-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 125000003386 piperidinyl group Chemical group 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000011116 polymethylpentene Substances 0.000 description 2
- 229920000306 polymethylpentene Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920005673 polypropylene based resin Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- AHIHJODVQGBOND-UHFFFAOYSA-M propan-2-yl carbonate Chemical compound CC(C)OC([O-])=O AHIHJODVQGBOND-UHFFFAOYSA-M 0.000 description 2
- MPXHWRXXJUKENG-UHFFFAOYSA-N propan-2-ylazanium;n-propan-2-ylcarbamate Chemical compound CC(C)[NH3+].CC(C)NC([O-])=O MPXHWRXXJUKENG-UHFFFAOYSA-N 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 2
- 230000004224 protection Effects 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229940116351 sebacate Drugs 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- 235000013024 sodium fluoride Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- XKXIQBVKMABYQJ-UHFFFAOYSA-M tert-butyl carbonate Chemical compound CC(C)(C)OC([O-])=O XKXIQBVKMABYQJ-UHFFFAOYSA-M 0.000 description 2
- YSEKXGQQTHQQMK-UHFFFAOYSA-N tert-butylazanium;hydrogen carbonate Chemical compound OC([O-])=O.CC(C)(C)[NH3+] YSEKXGQQTHQQMK-UHFFFAOYSA-N 0.000 description 2
- XBXCNNQPRYLIDE-UHFFFAOYSA-N tert-butylcarbamic acid Chemical compound CC(C)(C)NC(O)=O XBXCNNQPRYLIDE-UHFFFAOYSA-N 0.000 description 2
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 2
- NZNAAUDJKMURFU-UHFFFAOYSA-N tetrakis(2,2,6,6-tetramethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)NC(C)(C)C1)C(C(=O)OC1CC(C)(C)NC(C)(C)C1)CC(=O)OC1CC(C)(C)NC(C)(C)C1 NZNAAUDJKMURFU-UHFFFAOYSA-N 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 2
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- KJYSXRBJOSZLEL-UHFFFAOYSA-N (2,4-ditert-butylphenyl) 3,5-ditert-butyl-4-hydroxybenzoate Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OC(=O)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 KJYSXRBJOSZLEL-UHFFFAOYSA-N 0.000 description 1
- POLSVAXEEHDBMJ-UHFFFAOYSA-N (2-hydroxy-4-octadecoxyphenyl)-phenylmethanone Chemical compound OC1=CC(OCCCCCCCCCCCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 POLSVAXEEHDBMJ-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- AWCHONBUIHCDMW-UHFFFAOYSA-N (3,5-ditert-butyl-4-hydroxyphenyl) acetate Chemical compound CC(=O)OC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 AWCHONBUIHCDMW-UHFFFAOYSA-N 0.000 description 1
- XCPFSALHURPPJE-UHFFFAOYSA-N (3,5-ditert-butyl-4-hydroxyphenyl) propanoate Chemical compound CCC(=O)OC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 XCPFSALHURPPJE-UHFFFAOYSA-N 0.000 description 1
- DKZFIPFKXAGEBP-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) benzoate Chemical compound OCC(C)(C)COC(=O)C1=CC=CC=C1 DKZFIPFKXAGEBP-UHFFFAOYSA-N 0.000 description 1
- ARVUDIQYNJVQIW-UHFFFAOYSA-N (4-dodecoxy-2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(OCCCCCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 ARVUDIQYNJVQIW-UHFFFAOYSA-N 0.000 description 1
- UXWKVPJOPVIIRU-UHFFFAOYSA-N (6-methylsulfanylpyridin-3-yl)boronic acid Chemical compound CSC1=CC=C(B(O)O)C=N1 UXWKVPJOPVIIRU-UHFFFAOYSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 1
- FIDRAVVQGKNYQK-UHFFFAOYSA-N 1,2,3,4-tetrahydrotriazine Chemical compound C1NNNC=C1 FIDRAVVQGKNYQK-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- LZTSCEYDCZBRCJ-UHFFFAOYSA-N 1,2-dihydro-1,2,4-triazol-3-one Chemical compound OC=1N=CNN=1 LZTSCEYDCZBRCJ-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- FGYJSJUSODGXAR-UHFFFAOYSA-N 1,3,7,9-tetratert-butyl-11-octoxy-5h-benzo[d][1,3,2]benzodioxaphosphocine Chemical compound C1C2=CC(C(C)(C)C)=CC(C(C)(C)C)=C2OP(OCCCCCCCC)OC2=C1C=C(C(C)(C)C)C=C2C(C)(C)C FGYJSJUSODGXAR-UHFFFAOYSA-N 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- ZXSQEZNORDWBGZ-UHFFFAOYSA-N 1,3-dihydropyrrolo[2,3-b]pyridin-2-one Chemical compound C1=CN=C2NC(=O)CC2=C1 ZXSQEZNORDWBGZ-UHFFFAOYSA-N 0.000 description 1
- IHDKBHLTKNUCCW-UHFFFAOYSA-N 1,3-thiazole 1-oxide Chemical compound O=S1C=CN=C1 IHDKBHLTKNUCCW-UHFFFAOYSA-N 0.000 description 1
- SLYRGJDSFOCAAI-UHFFFAOYSA-N 1,3-thiazolidin-2-one Chemical compound O=C1NCCS1 SLYRGJDSFOCAAI-UHFFFAOYSA-N 0.000 description 1
- OGYGFUAIIOPWQD-UHFFFAOYSA-N 1,3-thiazolidine Chemical compound C1CSCN1 OGYGFUAIIOPWQD-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- WGYZMNBUZFHYRX-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-ol Chemical compound COCC(C)OCC(C)O WGYZMNBUZFHYRX-UHFFFAOYSA-N 0.000 description 1
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 description 1
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 description 1
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
- XFRVVPUIAFSTFO-UHFFFAOYSA-N 1-Tridecanol Chemical compound CCCCCCCCCCCCCO XFRVVPUIAFSTFO-UHFFFAOYSA-N 0.000 description 1
- XUIXZBXRQFZHIT-UHFFFAOYSA-N 1-[1-(1-hydroxypropan-2-yloxy)propan-2-yloxy]-3-methoxypropan-2-ol Chemical compound COCC(O)COC(C)COC(C)CO XUIXZBXRQFZHIT-UHFFFAOYSA-N 0.000 description 1
- LXQMHOKEXZETKB-UHFFFAOYSA-N 1-amino-2-methylpropan-2-ol Chemical compound CC(C)(O)CN LXQMHOKEXZETKB-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- JGKOPBGMDUJNPF-UHFFFAOYSA-N 1-butyl-2,5-dimethylpyrrole Chemical compound CCCCN1C(C)=CC=C1C JGKOPBGMDUJNPF-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- MWZDIEIXRBWPLG-UHFFFAOYSA-N 1-methyl-1,2,4-triazole Chemical compound CN1C=NC=N1 MWZDIEIXRBWPLG-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- SLLDKGIPVBZBFW-UHFFFAOYSA-N 11-[4-(4,6-diphenyl-1,3,5-triazin-2-yl)-3-hydroxyphenoxy]undecyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCCCCCCOc1ccc(c(O)c1)-c1nc(nc(n1)-c1ccccc1)-c1ccccc1 SLLDKGIPVBZBFW-UHFFFAOYSA-N 0.000 description 1
- UBSWWINJYDIUIP-UHFFFAOYSA-N 11-[4-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]undecyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCCCCCCOc1ccc(c(O)c1)-c1nc(nc(n1)-c1ccc(C)cc1C)-c1ccc(C)cc1C UBSWWINJYDIUIP-UHFFFAOYSA-N 0.000 description 1
- BTTRPWLNXPPSRW-UHFFFAOYSA-N 11-[4-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]undecyl prop-2-enoate Chemical compound Cc1ccc(c(C)c1)-c1nc(nc(n1)-c1ccc(OCCCCCCCCCCCOC(=O)C=C)cc1O)-c1ccc(C)cc1C BTTRPWLNXPPSRW-UHFFFAOYSA-N 0.000 description 1
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 1
- ZQEXIXXJFSQPNA-UHFFFAOYSA-N 1h-imidazole-5-carbaldehyde Chemical compound O=CC1=CNC=N1 ZQEXIXXJFSQPNA-UHFFFAOYSA-N 0.000 description 1
- AXINVSXSGNSVLV-UHFFFAOYSA-N 1h-pyrazol-4-amine Chemical compound NC=1C=NNC=1 AXINVSXSGNSVLV-UHFFFAOYSA-N 0.000 description 1
- MEZZCSHVIGVWFI-UHFFFAOYSA-N 2,2'-Dihydroxy-4-methoxybenzophenone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1O MEZZCSHVIGVWFI-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- QKWWDTYDYOFRJL-UHFFFAOYSA-N 2,2-dimethoxyethanamine Chemical compound COC(CN)OC QKWWDTYDYOFRJL-UHFFFAOYSA-N 0.000 description 1
- OSTJJSXYRBNBNC-UHFFFAOYSA-N 2,2-dimethylpropanoic acid;pentanoic acid Chemical compound CCCCC(O)=O.CC(C)(C)C(O)=O OSTJJSXYRBNBNC-UHFFFAOYSA-N 0.000 description 1
- XNDAGYLOQWQWIM-UHFFFAOYSA-N 2,2-dimethylpropyl 3-hydroxy-2,2-dimethylpropanoate Chemical compound CC(C)(C)COC(=O)C(C)(C)CO XNDAGYLOQWQWIM-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- JNXIFVSGXLGULI-UHFFFAOYSA-N 2,5-dimethyl-1-phenylpyrrole Chemical compound CC1=CC=C(C)N1C1=CC=CC=C1 JNXIFVSGXLGULI-UHFFFAOYSA-N 0.000 description 1
- YAJAIRFZIPHSNA-UHFFFAOYSA-N 2,5-dimethyl-1-phenylpyrrole-3,4-dicarbaldehyde Chemical compound CC1=C(C=O)C(C=O)=C(C)N1C1=CC=CC=C1 YAJAIRFZIPHSNA-UHFFFAOYSA-N 0.000 description 1
- LNROIXNEIZSESG-UHFFFAOYSA-N 2,5-dimethyl-1-phenylpyrrole-3-carbaldehyde Chemical compound CC1=CC(C=O)=C(C)N1C1=CC=CC=C1 LNROIXNEIZSESG-UHFFFAOYSA-N 0.000 description 1
- WSOMHEOIWBKOPF-UHFFFAOYSA-N 2,6-ditert-butyl-4-[(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)methyl]phenol Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CP2(=O)C3=CC=CC=C3C3=CC=CC=C3O2)=C1 WSOMHEOIWBKOPF-UHFFFAOYSA-N 0.000 description 1
- JLZIIHMTTRXXIN-UHFFFAOYSA-N 2-(2-hydroxy-4-methoxybenzoyl)benzoic acid Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1C(O)=O JLZIIHMTTRXXIN-UHFFFAOYSA-N 0.000 description 1
- AOFFRVQVWKIQEV-UHFFFAOYSA-N 2-(2-hydroxy-4-prop-2-enoyloxybutoxy)carbonylbenzoic acid Chemical compound C=CC(=O)OCCC(O)COC(=O)C1=CC=CC=C1C(O)=O AOFFRVQVWKIQEV-UHFFFAOYSA-N 0.000 description 1
- HLIQLHSBZXDKLV-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol Chemical compound OCCOCC(O)OC1=CC=CC=C1 HLIQLHSBZXDKLV-UHFFFAOYSA-N 0.000 description 1
- QWCGXANSAOXRFE-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanamine Chemical compound COCCOCCN QWCGXANSAOXRFE-UHFFFAOYSA-N 0.000 description 1
- RKYJPYDJNQXILT-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCOC(=O)C=C RKYJPYDJNQXILT-UHFFFAOYSA-N 0.000 description 1
- BXPKASQEUYICBF-UHFFFAOYSA-N 2-(3-prop-2-enoyloxypropoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCCOC(=O)C=C BXPKASQEUYICBF-UHFFFAOYSA-N 0.000 description 1
- ASVSBPGJUQTHBG-UHFFFAOYSA-N 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-dodecoxyphenol Chemical compound CCCCCCCCCCCCOc1ccc(c(O)c1)-c1nc(nc(n1)-c1ccccc1)-c1ccccc1 ASVSBPGJUQTHBG-UHFFFAOYSA-N 0.000 description 1
- UUINYPIVWRZHAG-UHFFFAOYSA-N 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-methoxyphenol Chemical compound OC1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=CC=CC=2)=N1 UUINYPIVWRZHAG-UHFFFAOYSA-N 0.000 description 1
- BBBLHSHFZWKLPP-UHFFFAOYSA-N 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-phenylmethoxyphenol Chemical compound Oc1cc(OCc2ccccc2)ccc1-c1nc(nc(n1)-c1ccccc1)-c1ccccc1 BBBLHSHFZWKLPP-UHFFFAOYSA-N 0.000 description 1
- DSBLSFKNWFKZON-UHFFFAOYSA-N 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-propoxyphenol Chemical compound CCCOc1ccc(c(O)c1)-c1nc(nc(n1)-c1ccccc1)-c1ccccc1 DSBLSFKNWFKZON-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- JCGAFSOOJHZRCB-UHFFFAOYSA-N 2-[(3,5-ditert-butyl-4-hydroxyphenyl)methoxycarbonyl]hexanoic acid Chemical compound CCCCC(C(O)=O)C(=O)OCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 JCGAFSOOJHZRCB-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- OKUWOEKJQRUMBW-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]ethanamine Chemical compound COCCOCCOCCN OKUWOEKJQRUMBW-UHFFFAOYSA-N 0.000 description 1
- RPJLPEUNIGUTJT-UHFFFAOYSA-N 2-[2-(3,5-ditert-butyl-4-hydroxyphenyl)acetyl]oxyethyl 2-(3,5-ditert-butyl-4-hydroxyphenyl)acetate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CC(=O)OCCOC(=O)CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 RPJLPEUNIGUTJT-UHFFFAOYSA-N 0.000 description 1
- XXHDHAPOSIFMIG-UHFFFAOYSA-N 2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]-1-phenoxyethanol Chemical compound OCCOCCOCCOCC(O)OC1=CC=CC=C1 XXHDHAPOSIFMIG-UHFFFAOYSA-N 0.000 description 1
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 1
- OBFOSROPNNOGQF-UHFFFAOYSA-N 2-[2-[2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]-1-phenoxyethanol Chemical compound OCCOCCOCCOCCOCCOCC(O)OC1=CC=CC=C1 OBFOSROPNNOGQF-UHFFFAOYSA-N 0.000 description 1
- QSRJVOOOWGXUDY-UHFFFAOYSA-N 2-[2-[2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]ethoxy]ethoxy]ethyl 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCCOCCOCCOC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 QSRJVOOOWGXUDY-UHFFFAOYSA-N 0.000 description 1
- QGXGFUDOEKFBGD-UHFFFAOYSA-N 2-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]ethyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 QGXGFUDOEKFBGD-UHFFFAOYSA-N 0.000 description 1
- KSHSOORFYDAJOE-UHFFFAOYSA-N 2-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]propyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound C=1C(C(C)(C)C)=C(O)C(C(C)(C)C)=CC=1CCC(=O)OC(C)COC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 KSHSOORFYDAJOE-UHFFFAOYSA-N 0.000 description 1
- ZSSVCEUEVMALRD-UHFFFAOYSA-N 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-5-(octyloxy)phenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(C)=CC=2)C)=N1 ZSSVCEUEVMALRD-UHFFFAOYSA-N 0.000 description 1
- SJPFUAOURZAVGX-UHFFFAOYSA-N 2-[4-[4,6-bis(2,4-diethoxyphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl prop-2-enoate Chemical compound CCOc1ccc(c(OCC)c1)-c1nc(nc(n1)-c1ccc(OCC)cc1OCC)-c1ccc(OCCOC(=O)C=C)cc1O SJPFUAOURZAVGX-UHFFFAOYSA-N 0.000 description 1
- YCCBNMQMWVNQOB-UHFFFAOYSA-N 2-[4-[4,6-bis(2,4-diethylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl prop-2-enoate Chemical compound CCc1ccc(c(CC)c1)-c1nc(nc(n1)-c1ccc(CC)cc1CC)-c1ccc(OCCOC(=O)C=C)cc1O YCCBNMQMWVNQOB-UHFFFAOYSA-N 0.000 description 1
- FUYIHKBHDPTJHK-UHFFFAOYSA-N 2-[4-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl prop-2-enoate Chemical compound CC1=CC(C)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(OCCOC(=O)C=C)=CC=2)O)=N1 FUYIHKBHDPTJHK-UHFFFAOYSA-N 0.000 description 1
- AJLWEESZATXDDQ-UHFFFAOYSA-N 2-[4-[4,6-bis(2-ethylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl 2-methylprop-2-enoate Chemical compound CCc1ccccc1-c1nc(nc(n1)-c1ccccc1CC)-c1ccc(OCCOC(=O)C(C)=C)cc1O AJLWEESZATXDDQ-UHFFFAOYSA-N 0.000 description 1
- RABLPXGTMOYVMI-UHFFFAOYSA-N 2-[4-[4,6-bis(2-ethylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl prop-2-enoate Chemical compound CCc1ccccc1-c1nc(nc(n1)-c1ccccc1CC)-c1ccc(OCCOC(=O)C=C)cc1O RABLPXGTMOYVMI-UHFFFAOYSA-N 0.000 description 1
- USJBPXKZBWLZKN-UHFFFAOYSA-N 2-[4-[4,6-bis(2-methoxyphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl 2-methylprop-2-enoate Chemical compound COc1ccccc1-c1nc(nc(n1)-c1ccccc1OC)-c1ccc(OCCOC(=O)C(C)=C)cc1O USJBPXKZBWLZKN-UHFFFAOYSA-N 0.000 description 1
- DULUGOJTGOGPGL-UHFFFAOYSA-N 2-[4-[4,6-bis(2-methoxyphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl prop-2-enoate Chemical compound COc1ccccc1-c1nc(nc(n1)-c1ccccc1OC)-c1ccc(OCCOC(=O)C=C)cc1O DULUGOJTGOGPGL-UHFFFAOYSA-N 0.000 description 1
- PCEBQOTZTPHURJ-UHFFFAOYSA-N 2-[4-[4,6-bis(2-methylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOc1ccc(c(O)c1)-c1nc(nc(n1)-c1ccccc1C)-c1ccccc1C PCEBQOTZTPHURJ-UHFFFAOYSA-N 0.000 description 1
- XQOAGIMJMPMBHX-UHFFFAOYSA-N 2-[4-[4,6-bis(2-methylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]ethyl prop-2-enoate Chemical compound Cc1ccccc1-c1nc(nc(n1)-c1ccc(OCCOC(=O)C=C)cc1O)-c1ccccc1C XQOAGIMJMPMBHX-UHFFFAOYSA-N 0.000 description 1
- UXFQFBNBSPQBJW-UHFFFAOYSA-N 2-amino-2-methylpropane-1,3-diol Chemical compound OCC(N)(C)CO UXFQFBNBSPQBJW-UHFFFAOYSA-N 0.000 description 1
- HLCPWBZNUKCSBN-UHFFFAOYSA-N 2-aminobenzonitrile Chemical compound NC1=CC=CC=C1C#N HLCPWBZNUKCSBN-UHFFFAOYSA-N 0.000 description 1
- WUGCLPOLOCIDHW-UHFFFAOYSA-N 2-aminoethanol;benzoic acid Chemical compound [NH3+]CCO.[O-]C(=O)C1=CC=CC=C1 WUGCLPOLOCIDHW-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- LODWDQOANQTUGD-UHFFFAOYSA-N 2-carboxyphenolate;dicyclohexylazanium Chemical compound OC(=O)C1=CC=CC=C1[O-].C1CCCCC1[NH2+]C1CCCCC1 LODWDQOANQTUGD-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- BHRGYSLLXICIEL-UHFFFAOYSA-N 2-cyanoethylazanium;n-(2-cyanoethyl)carbamate Chemical compound [NH3+]CCC#N.[O-]C(=O)NCCC#N BHRGYSLLXICIEL-UHFFFAOYSA-N 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- BPGIOCZAQDIBPI-UHFFFAOYSA-N 2-ethoxyethanamine Chemical compound CCOCCN BPGIOCZAQDIBPI-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- RLBMKAXUSJOVJI-UHFFFAOYSA-N 2-ethyl-5-methyl-1h-imidazole-4-carbaldehyde Chemical compound CCC1=NC(C=O)=C(C)N1 RLBMKAXUSJOVJI-UHFFFAOYSA-N 0.000 description 1
- LTHNHFOGQMKPOV-UHFFFAOYSA-N 2-ethylhexan-1-amine Chemical compound CCCCC(CC)CN LTHNHFOGQMKPOV-UHFFFAOYSA-N 0.000 description 1
- HPHBKRQUHGHVEO-UHFFFAOYSA-L 2-ethylhexan-1-amine;nickel(2+);2-[2-oxido-5-(2,4,4-trimethylpentan-2-yl)phenyl]sulfanyl-4-(2,4,4-trimethylpentan-2-yl)phenolate Chemical compound [Ni+2].CCCCC(CC)CN.CC(C)(C)CC(C)(C)C1=CC=C([O-])C(SC=2C(=CC=C(C=2)C(C)(C)CC(C)(C)C)[O-])=C1 HPHBKRQUHGHVEO-UHFFFAOYSA-L 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- YNVZDODIHZTHOZ-UHFFFAOYSA-K 2-hydroxypropanoate;iron(3+) Chemical compound [Fe+3].CC(O)C([O-])=O.CC(O)C([O-])=O.CC(O)C([O-])=O YNVZDODIHZTHOZ-UHFFFAOYSA-K 0.000 description 1
- FVRYCPZDHKLBNR-UHFFFAOYSA-N 2-mercaptoindole Chemical compound C1=CC=C2NC(S)=CC2=C1 FVRYCPZDHKLBNR-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- QAQJKDRAJZWQCM-UHFFFAOYSA-N 2-methoxyethyl carbamate Chemical compound COCCOC(N)=O QAQJKDRAJZWQCM-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- FTERHQFTRLXWDG-UHFFFAOYSA-N 2-methyl-1h-1,2,4-triazole-5-thione Chemical compound CN1C=NC(S)=N1 FTERHQFTRLXWDG-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZWULFIBGPXWGFG-UHFFFAOYSA-N 2-methyl-1h-imidazole-5-carbaldehyde Chemical compound CC1=NC=C(C=O)N1 ZWULFIBGPXWGFG-UHFFFAOYSA-N 0.000 description 1
- SAAZSCOLNCGLKL-UHFFFAOYSA-N 2-methylbuta-1,3-diene;pent-1-ene Chemical compound CCCC=C.CC(=C)C=C SAAZSCOLNCGLKL-UHFFFAOYSA-N 0.000 description 1
- JMMZCWZIJXAGKW-UHFFFAOYSA-N 2-methylpent-2-ene Chemical compound CCC=C(C)C JMMZCWZIJXAGKW-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- UWRXMIQVSKQAIJ-UHFFFAOYSA-N 2-n-[3-[[4,6-bis[butyl-(1,2,2,6,6-pentamethylpiperidin-4-yl)amino]-1h-triazin-2-yl]-[2-[[4,6-bis[butyl-(1,2,2,6,6-pentamethylpiperidin-4-yl)amino]-1h-triazin-2-yl]-[3-[[4,6-bis[butyl-(1,2,2,6,6-pentamethylpiperidin-4-yl)amino]-1h-triazin-2-yl]amino]propyl Chemical compound C=1C(N(CCCC)C2CC(C)(C)N(C)C(C)(C)C2)=NN(NCCCN(CCN(CCCNN2N=C(C=C(N2)N(CCCC)C2CC(C)(C)N(C)C(C)(C)C2)N(CCCC)C2CC(C)(C)N(C)C(C)(C)C2)N2N=C(C=C(N2)N(CCCC)C2CC(C)(C)N(C)C(C)(C)C2)N(CCCC)C2CC(C)(C)N(C)C(C)(C)C2)N2N=C(C=C(N2)N(CCCC)C2CC(C)(C)N(C)C(C)(C)C2)N(CCCC)C2CC(C)(C)N(C)C(C)(C)C2)NC=1N(CCCC)C1CC(C)(C)N(C)C(C)(C)C1 UWRXMIQVSKQAIJ-UHFFFAOYSA-N 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- LFKJFIOTRHYONM-UHFFFAOYSA-N 2-phenyl-1h-imidazole-5-carbaldehyde Chemical compound N1C(C=O)=CN=C1C1=CC=CC=C1 LFKJFIOTRHYONM-UHFFFAOYSA-N 0.000 description 1
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 description 1
- PFANXOISJYKQRP-UHFFFAOYSA-N 2-tert-butyl-4-[1-(5-tert-butyl-4-hydroxy-2-methylphenyl)butyl]-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(CCC)C1=CC(C(C)(C)C)=C(O)C=C1C PFANXOISJYKQRP-UHFFFAOYSA-N 0.000 description 1
- GPNYZBKIGXGYNU-UHFFFAOYSA-N 2-tert-butyl-6-[(3-tert-butyl-5-ethyl-2-hydroxyphenyl)methyl]-4-ethylphenol Chemical compound CC(C)(C)C1=CC(CC)=CC(CC=2C(=C(C=C(CC)C=2)C(C)(C)C)O)=C1O GPNYZBKIGXGYNU-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- KFJDQPJLANOOOB-UHFFFAOYSA-N 2h-benzotriazole-4-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=NNN=C12 KFJDQPJLANOOOB-UHFFFAOYSA-N 0.000 description 1
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 description 1
- AIBRSVLEQRWAEG-UHFFFAOYSA-N 3,9-bis(2,4-ditert-butylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP1OCC2(COP(OC=3C(=CC(=CC=3)C(C)(C)C)C(C)(C)C)OC2)CO1 AIBRSVLEQRWAEG-UHFFFAOYSA-N 0.000 description 1
- SSADPHQCUURWSW-UHFFFAOYSA-N 3,9-bis(2,6-ditert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound CC(C)(C)C1=CC(C)=CC(C(C)(C)C)=C1OP1OCC2(COP(OC=3C(=CC(C)=CC=3C(C)(C)C)C(C)(C)C)OC2)CO1 SSADPHQCUURWSW-UHFFFAOYSA-N 0.000 description 1
- PZRWFKGUFWPFID-UHFFFAOYSA-N 3,9-dioctadecoxy-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound C1OP(OCCCCCCCCCCCCCCCCCC)OCC21COP(OCCCCCCCCCCCCCCCCCC)OC2 PZRWFKGUFWPFID-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- MZBKHWGKJKGZLN-UHFFFAOYSA-N 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoic acid 2-(hydroxymethyl)-2-methylpropane-1,3-diol Chemical compound OCC(C)(CO)CO.CC(C)(C)C1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O MZBKHWGKJKGZLN-UHFFFAOYSA-N 0.000 description 1
- PRKMQTLVLAHFAW-UHFFFAOYSA-N 3-[1-(3,5-ditert-butyl-4-hydroxyphenyl)-2-methyl-4,4-bis(1,2,2,6,6-pentamethylpiperidin-4-yl)butan-2-yl]oxy-3-oxopropanoic acid Chemical compound C1C(C)(C)N(C)C(C)(C)CC1C(C1CC(C)(C)N(C)C(C)(C)C1)CC(C)(OC(=O)CC(O)=O)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 PRKMQTLVLAHFAW-UHFFFAOYSA-N 0.000 description 1
- AGNTUZCMJBTHOG-UHFFFAOYSA-N 3-[3-(2,3-dihydroxypropoxy)-2-hydroxypropoxy]propane-1,2-diol Chemical compound OCC(O)COCC(O)COCC(O)CO AGNTUZCMJBTHOG-UHFFFAOYSA-N 0.000 description 1
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 1
- FAXDZWQIWUSWJH-UHFFFAOYSA-N 3-methoxypropan-1-amine Chemical compound COCCCN FAXDZWQIWUSWJH-UHFFFAOYSA-N 0.000 description 1
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 1
- UIKUBYKUYUSRSM-UHFFFAOYSA-N 3-morpholinopropylamine Chemical compound NCCCN1CCOCC1 UIKUBYKUYUSRSM-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- STEYNUVPFMIUOY-UHFFFAOYSA-N 4-Hydroxy-1-(2-hydroxyethyl)-2,2,6,6-tetramethylpiperidine Chemical compound CC1(C)CC(O)CC(C)(C)N1CCO STEYNUVPFMIUOY-UHFFFAOYSA-N 0.000 description 1
- PRWJPWSKLXYEPD-UHFFFAOYSA-N 4-[4,4-bis(5-tert-butyl-4-hydroxy-2-methylphenyl)butan-2-yl]-2-tert-butyl-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(C)CC(C=1C(=CC(O)=C(C=1)C(C)(C)C)C)C1=CC(C(C)(C)C)=C(O)C=C1C PRWJPWSKLXYEPD-UHFFFAOYSA-N 0.000 description 1
- VUTBELPREDJDDH-UHFFFAOYSA-N 4-amino-5-hydroxymethyl-2-methylpyrimidine Chemical compound CC1=NC=C(CO)C(N)=N1 VUTBELPREDJDDH-UHFFFAOYSA-N 0.000 description 1
- BLFRQYKZFKYQLO-UHFFFAOYSA-N 4-aminobutan-1-ol Chemical compound NCCCCO BLFRQYKZFKYQLO-UHFFFAOYSA-N 0.000 description 1
- ZAAQJFLUOUQAOG-UHFFFAOYSA-N 4-benzyl-2,6-ditert-butylphenol Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CC=2C=CC=CC=2)=C1 ZAAQJFLUOUQAOG-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- CQTGQYVQJOJQCM-UHFFFAOYSA-N 4-chloro-1h-indazole Chemical compound ClC1=CC=CC2=C1C=NN2 CQTGQYVQJOJQCM-UHFFFAOYSA-N 0.000 description 1
- YKVAWSVTEWXJGJ-UHFFFAOYSA-N 4-chloro-2-methylsulfanylthieno[3,2-d]pyrimidine Chemical compound CSC1=NC(Cl)=C2SC=CC2=N1 YKVAWSVTEWXJGJ-UHFFFAOYSA-N 0.000 description 1
- AXZCWGUWGPLXOR-UHFFFAOYSA-N 4-chloro-5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1Cl AXZCWGUWGPLXOR-UHFFFAOYSA-N 0.000 description 1
- 125000006042 4-hexenyl group Chemical group 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- YFTIQMINSIRDMS-UHFFFAOYSA-N 4-methyl-2-phenylimidazole-4-carbaldehyde Chemical compound O=CC1(C)C=NC(C=2C=CC=CC=2)=N1 YFTIQMINSIRDMS-UHFFFAOYSA-N 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- GVSNQMFKEPBIOY-UHFFFAOYSA-N 4-methyl-2h-triazole Chemical compound CC=1C=NNN=1 GVSNQMFKEPBIOY-UHFFFAOYSA-N 0.000 description 1
- 125000003119 4-methyl-3-pentenyl group Chemical group [H]\C(=C(/C([H])([H])[H])C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- RJWLLQWLBMJCFD-UHFFFAOYSA-N 4-methylpiperazin-1-amine Chemical compound CN1CCN(N)CC1 RJWLLQWLBMJCFD-UHFFFAOYSA-N 0.000 description 1
- WBTVZVUYPVQEIF-UHFFFAOYSA-N 4-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=CC2=C1C=NN2 WBTVZVUYPVQEIF-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- GCPDCGCMGILXLN-UHFFFAOYSA-N 5-butoxy-2-(4,6-diphenyl-1,3,5-triazin-2-yl)phenol Chemical compound OC1=CC(OCCCC)=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=CC=CC=2)=N1 GCPDCGCMGILXLN-UHFFFAOYSA-N 0.000 description 1
- WGVHNCAJPFIFCR-UHFFFAOYSA-N 5-methyl-1,2-dihydropyrazol-3-one Chemical compound CC1=CC(O)=NN1 WGVHNCAJPFIFCR-UHFFFAOYSA-N 0.000 description 1
- FJRZOOICEHBAED-UHFFFAOYSA-N 5-methyl-1h-1,2,4-triazol-3-amine Chemical compound CC1=NNC(N)=N1 FJRZOOICEHBAED-UHFFFAOYSA-N 0.000 description 1
- PZKFSRWSQOQYNR-UHFFFAOYSA-N 5-methyl-1h-1,2,4-triazole Chemical compound CC1=NC=NN1 PZKFSRWSQOQYNR-UHFFFAOYSA-N 0.000 description 1
- KMWCSNCNHSEXIF-UHFFFAOYSA-N 5-methyl-1h-imidazole-4-carbaldehyde Chemical compound CC=1N=CNC=1C=O KMWCSNCNHSEXIF-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 1
- LPULCTXGGDJCTO-UHFFFAOYSA-N 6-methylheptan-1-amine Chemical compound CC(C)CCCCCN LPULCTXGGDJCTO-UHFFFAOYSA-N 0.000 description 1
- YPIFGDQKSSMYHQ-UHFFFAOYSA-N 7,7-dimethyloctanoic acid Chemical compound CC(C)(C)CCCCCC(O)=O YPIFGDQKSSMYHQ-UHFFFAOYSA-N 0.000 description 1
- RAZWNFJQEZAVOT-UHFFFAOYSA-N 8-acetyl-3-dodecyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro[4.5]decane-2,4-dione Chemical compound O=C1N(CCCCCCCCCCCC)C(=O)NC11CC(C)(C)N(C(C)=O)C(C)(C)C1 RAZWNFJQEZAVOT-UHFFFAOYSA-N 0.000 description 1
- ADRNSOYXKABLGT-UHFFFAOYSA-N 8-methylnonyl diphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OCCCCCCCC(C)C)OC1=CC=CC=C1 ADRNSOYXKABLGT-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004251 Ammonium lactate Substances 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- XWUNIDGEMNBBAQ-UHFFFAOYSA-N Bisphenol A ethoxylate diacrylate Chemical compound C=1C=C(OCCOC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OCCOC(=O)C=C)C=C1 XWUNIDGEMNBBAQ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- FRPHFZCDPYBUAU-UHFFFAOYSA-N Bromocresolgreen Chemical compound CC1=C(Br)C(O)=C(Br)C=C1C1(C=2C(=C(Br)C(O)=C(Br)C=2)C)C2=CC=CC=C2S(=O)(=O)O1 FRPHFZCDPYBUAU-UHFFFAOYSA-N 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- KCPAPOXEYKRRBH-UHFFFAOYSA-N C(#N)CCNC([O-])=O.C(#N)CC[NH3+].C(N)(OCCOC)=O.COCC[NH3+].C(#N)CCNC([O-])=O Chemical compound C(#N)CCNC([O-])=O.C(#N)CC[NH3+].C(N)(OCCOC)=O.COCC[NH3+].C(#N)CCNC([O-])=O KCPAPOXEYKRRBH-UHFFFAOYSA-N 0.000 description 1
- KGJXNACIJUAVDZ-UHFFFAOYSA-L C(C(=O)[O-])(=O)[O-].[Mn+2].[Nb+5] Chemical compound C(C(=O)[O-])(=O)[O-].[Mn+2].[Nb+5] KGJXNACIJUAVDZ-UHFFFAOYSA-L 0.000 description 1
- AAYXOHMOQRVFBT-UHFFFAOYSA-N C(C)(C)(C)C1=C(C(=CC=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=CC=C1C(C)(C)C)C(C)(C)C Chemical compound C(C)(C)(C)C1=C(C(=CC=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=CC=C1C(C)(C)C)C(C)(C)C AAYXOHMOQRVFBT-UHFFFAOYSA-N 0.000 description 1
- RHYWOHBGIBAKGM-UHFFFAOYSA-N CC(C)(C)C(C(C)=C1)=CC(C(C)(C)C)=C1OPO Chemical compound CC(C)(C)C(C(C)=C1)=CC(C(C)(C)C)=C1OPO RHYWOHBGIBAKGM-UHFFFAOYSA-N 0.000 description 1
- WTFMAEPTGGLSDL-UHFFFAOYSA-N CCCCOC(N)=O.N Chemical compound CCCCOC(N)=O.N WTFMAEPTGGLSDL-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 244000223760 Cinnamomum zeylanicum Species 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- HTJDQJBWANPRPF-UHFFFAOYSA-N Cyclopropylamine Chemical compound NC1CC1 HTJDQJBWANPRPF-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- WJYIASZWHGOTOU-UHFFFAOYSA-N Heptylamine Chemical compound CCCCCCCN WJYIASZWHGOTOU-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- GMPKIPWJBDOURN-UHFFFAOYSA-N Methoxyamine Chemical compound CON GMPKIPWJBDOURN-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- UAEPNZWRGJTJPN-UHFFFAOYSA-N Methylcyclohexane Natural products CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 1
- AIJULSRZWUXGPQ-UHFFFAOYSA-N Methylglyoxal Chemical group CC(=O)C=O AIJULSRZWUXGPQ-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- OATFOSWYTAYMES-UHFFFAOYSA-N N-[3-(benzotriazol-2-yl)-2-hydroxy-5-(2,4,4-trimethylpentan-2-yl)phenyl]-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)Nc1cc(cc(c1O)-n1nc2ccccc2n1)C(C)(C)CC(C)(C)C OATFOSWYTAYMES-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- BJJASUBMAFOCLG-UHFFFAOYSA-N OC1=C(C=C(C=C1C(C)(C)C)C)N1N=C2C(=N1)C=CC=C2.OC2=C(C=C(C=C2C(C)(C)C)C(C)(C)C)N2N=C1C(=N2)C=CC=C1 Chemical compound OC1=C(C=C(C=C1C(C)(C)C)C)N1N=C2C(=N1)C=CC=C2.OC2=C(C=C(C=C2C(C)(C)C)C(C)(C)C)N2N=C1C(=N2)C=CC=C1 BJJASUBMAFOCLG-UHFFFAOYSA-N 0.000 description 1
- SAIYIHUAERDQJJ-UHFFFAOYSA-N OC1=C(C=C(C=C1C(C)(C)C)C)N1N=C2C(=N1)C=CC=C2.OC2=C(C=CC(=C2)OCCCCCCCC)N2N=C1C(=N2)C=CC=C1 Chemical compound OC1=C(C=C(C=C1C(C)(C)C)C)N1N=C2C(=N1)C=CC=C2.OC2=C(C=CC(=C2)OCCCCCCCC)N2N=C1C(=N2)C=CC=C1 SAIYIHUAERDQJJ-UHFFFAOYSA-N 0.000 description 1
- FDBMBOYIVUGUSL-UHFFFAOYSA-N OP(O)OP(O)O.C(C)(C)(C)C1=C(C(=CC(=C1)C)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1C(C)(C)C)C)C(C)(C)C Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C(=CC(=C1)C)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1C(C)(C)C)C)C(C)(C)C FDBMBOYIVUGUSL-UHFFFAOYSA-N 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- WVTGEXVLAGGBMD-UHFFFAOYSA-N P.CC1=C(C(=CC=C1)C)C1=C(C=CC=C1)P(O)C1=CC=CC=C1 Chemical group P.CC1=C(C(=CC=C1)C)C1=C(C=CC=C1)P(O)C1=CC=CC=C1 WVTGEXVLAGGBMD-UHFFFAOYSA-N 0.000 description 1
- 239000005662 Paraffin oil Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- BRTMLDAYGUXKNK-UHFFFAOYSA-N [3-(benzotriazol-2-yl)-4-hydroxyphenyl]methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 BRTMLDAYGUXKNK-UHFFFAOYSA-N 0.000 description 1
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- HIVQCJOGAHNXBO-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] propanoate Chemical compound CCC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C HIVQCJOGAHNXBO-UHFFFAOYSA-N 0.000 description 1
- YNUDZCVMRZTAOJ-UHFFFAOYSA-N [4-(4-dihydroxyphosphanylphenyl)phenyl]phosphonous acid Chemical group C1=CC(P(O)O)=CC=C1C1=CC=C(P(O)O)C=C1 YNUDZCVMRZTAOJ-UHFFFAOYSA-N 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- ZCZKAOXXROZYGH-UHFFFAOYSA-J [Cu+4].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O Chemical compound [Cu+4].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O ZCZKAOXXROZYGH-UHFFFAOYSA-J 0.000 description 1
- XGDCTINWLIXLHU-UHFFFAOYSA-N [N+](=O)([O-])C1=CC=CC2=CC=CC=C12.N(=O)O Chemical compound [N+](=O)([O-])C1=CC=CC2=CC=CC=C12.N(=O)O XGDCTINWLIXLHU-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 229910052946 acanthite Inorganic materials 0.000 description 1
- OFLXLNCGODUUOT-UHFFFAOYSA-N acetohydrazide Chemical compound C\C(O)=N\N OFLXLNCGODUUOT-UHFFFAOYSA-N 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 229910052767 actinium Inorganic materials 0.000 description 1
- QQINRWTZWGJFDB-UHFFFAOYSA-N actinium atom Chemical compound [Ac] QQINRWTZWGJFDB-UHFFFAOYSA-N 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- PRKQVKDSMLBJBJ-UHFFFAOYSA-N ammonium carbonate Chemical class N.N.OC(O)=O PRKQVKDSMLBJBJ-UHFFFAOYSA-N 0.000 description 1
- 235000011162 ammonium carbonates Nutrition 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229940059265 ammonium lactate Drugs 0.000 description 1
- 235000019286 ammonium lactate Nutrition 0.000 description 1
- 229940056585 ammonium laurate Drugs 0.000 description 1
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 1
- 239000011609 ammonium molybdate Substances 0.000 description 1
- 235000018660 ammonium molybdate Nutrition 0.000 description 1
- 229940010552 ammonium molybdate Drugs 0.000 description 1
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 description 1
- TZIHFWKZFHZASV-UHFFFAOYSA-N anhydrous methyl formate Natural products COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 1
- 150000001449 anionic compounds Chemical class 0.000 description 1
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Inorganic materials O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- VJCJAQSLASCYAW-UHFFFAOYSA-N azane;dodecanoic acid Chemical compound [NH4+].CCCCCCCCCCCC([O-])=O VJCJAQSLASCYAW-UHFFFAOYSA-N 0.000 description 1
- RZOBLYBZQXQGFY-HSHFZTNMSA-N azanium;(2r)-2-hydroxypropanoate Chemical compound [NH4+].C[C@@H](O)C([O-])=O RZOBLYBZQXQGFY-HSHFZTNMSA-N 0.000 description 1
- GYIWFHXWLCXGQO-UHFFFAOYSA-N barium(2+);ethanolate Chemical compound [Ba+2].CC[O-].CC[O-] GYIWFHXWLCXGQO-UHFFFAOYSA-N 0.000 description 1
- CPUJSIVIXCTVEI-UHFFFAOYSA-N barium(2+);propan-2-olate Chemical compound [Ba+2].CC(C)[O-].CC(C)[O-] CPUJSIVIXCTVEI-UHFFFAOYSA-N 0.000 description 1
- BAPVPOOWCZUVGA-UHFFFAOYSA-N benzoic acid;n-propan-2-ylpropan-2-amine Chemical compound CC(C)[NH2+]C(C)C.[O-]C(=O)C1=CC=CC=C1 BAPVPOOWCZUVGA-UHFFFAOYSA-N 0.000 description 1
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- AGSPXMVUFBBBMO-UHFFFAOYSA-N beta-aminopropionitrile Chemical compound NCCC#N AGSPXMVUFBBBMO-UHFFFAOYSA-N 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- DLHNOZQXRABONJ-UHFFFAOYSA-N bis(1-cyclohexyloxy-2,2,6,6-tetramethylpiperidin-4-yl) decanedioate Chemical compound CC1(C)CC(OC(=O)CCCCCCCCC(=O)OC2CC(C)(C)N(OC3CCCCC3)C(C)(C)C2)CC(C)(C)N1OC1CCCCC1 DLHNOZQXRABONJ-UHFFFAOYSA-N 0.000 description 1
- OSIVCXJNIBEGCL-UHFFFAOYSA-N bis(2,2,6,6-tetramethyl-1-octoxypiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(OCCCCCCCC)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(OCCCCCCCC)C(C)(C)C1 OSIVCXJNIBEGCL-UHFFFAOYSA-N 0.000 description 1
- GOJOVSYIGHASEI-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-4-yl) butanedioate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CCC(=O)OC1CC(C)(C)NC(C)(C)C1 GOJOVSYIGHASEI-UHFFFAOYSA-N 0.000 description 1
- SODJJEXAWOSSON-UHFFFAOYSA-N bis(2-hydroxy-4-methoxyphenyl)methanone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=C(OC)C=C1O SODJJEXAWOSSON-UHFFFAOYSA-N 0.000 description 1
- SXXILWLQSQDLDL-UHFFFAOYSA-N bis(8-methylnonyl) phenyl phosphite Chemical compound CC(C)CCCCCCCOP(OCCCCCCCC(C)C)OC1=CC=CC=C1 SXXILWLQSQDLDL-UHFFFAOYSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- LWTNJZJJELQQJM-UHFFFAOYSA-N boron;butan-1-amine Chemical compound [B].CCCCN LWTNJZJJELQQJM-UHFFFAOYSA-N 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- DDWQBJYWGXHLCN-UHFFFAOYSA-N butan-1-amine;butylcarbamic acid Chemical compound CCCC[NH3+].CCCCNC([O-])=O DDWQBJYWGXHLCN-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 description 1
- SZORMCBRRGPWKG-UHFFFAOYSA-N butanoic acid;pentanoic acid Chemical compound CCCC(O)=O.CCCCC(O)=O SZORMCBRRGPWKG-UHFFFAOYSA-N 0.000 description 1
- YFNONBGXNFCTMM-UHFFFAOYSA-N butoxybenzene Chemical group CCCCOC1=CC=CC=C1 YFNONBGXNFCTMM-UHFFFAOYSA-N 0.000 description 1
- 125000006226 butoxyethyl group Chemical group 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- GAWOVNGQYQVFLI-ISLYRVAYSA-N c1cc(OCC)ccc1\N=N\c1ccc(N)cc1N Chemical compound c1cc(OCC)ccc1\N=N\c1ccc(N)cc1N GAWOVNGQYQVFLI-ISLYRVAYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- VAYGVODTVNMVPV-UHFFFAOYSA-N carbamic acid;cyclohexanamine Chemical compound NC([O-])=O.[NH3+]C1CCCCC1 VAYGVODTVNMVPV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 235000017803 cinnamon Nutrition 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- NRLCNVYHWRDHTJ-UHFFFAOYSA-L cobalt(2+);naphthalene-1-carboxylate Chemical compound [Co+2].C1=CC=C2C(C(=O)[O-])=CC=CC2=C1.C1=CC=C2C(C(=O)[O-])=CC=CC2=C1 NRLCNVYHWRDHTJ-UHFFFAOYSA-L 0.000 description 1
- AMFIJXSMYBKJQV-UHFFFAOYSA-L cobalt(2+);octadecanoate Chemical compound [Co+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O AMFIJXSMYBKJQV-UHFFFAOYSA-L 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- QHECZRAGQOGJLT-UHFFFAOYSA-N copper;1h-quinolin-2-one Chemical compound [Cu].C1=CC=CC2=NC(O)=CC=C21 QHECZRAGQOGJLT-UHFFFAOYSA-N 0.000 description 1
- AQEDFGUKQJUMBV-UHFFFAOYSA-N copper;ethane-1,2-diamine Chemical compound [Cu].NCCN AQEDFGUKQJUMBV-UHFFFAOYSA-N 0.000 description 1
- QNZRVYCYEMYQMD-UHFFFAOYSA-N copper;pentane-2,4-dione Chemical compound [Cu].CC(=O)CC(C)=O QNZRVYCYEMYQMD-UHFFFAOYSA-N 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000005536 corrosion prevention Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- IBAHLNWTOIHLKE-UHFFFAOYSA-N cyano cyanate Chemical compound N#COC#N IBAHLNWTOIHLKE-UHFFFAOYSA-N 0.000 description 1
- 125000004802 cyanophenyl group Chemical group 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- RIBMRDXQOWISQN-UHFFFAOYSA-N cyclohexanamine;cyclohexanecarboxylic acid Chemical compound NC1CCCCC1.OC(=O)C1CCCCC1 RIBMRDXQOWISQN-UHFFFAOYSA-N 0.000 description 1
- FNPGYAQZEUKTCV-UHFFFAOYSA-N cyclohexanamine;prop-2-enoic acid Chemical compound OC(=O)C=C.NC1CCCCC1 FNPGYAQZEUKTCV-UHFFFAOYSA-N 0.000 description 1
- BNAFKNQBXIKNDQ-UHFFFAOYSA-N cyclohexanecarboxylate;dicyclohexylazanium Chemical compound [O-]C(=O)C1CCCCC1.C1CCCCC1[NH2+]C1CCCCC1 BNAFKNQBXIKNDQ-UHFFFAOYSA-N 0.000 description 1
- CIFYUXXXOJJPOL-UHFFFAOYSA-N cyclohexylazanium;benzoate Chemical compound [NH3+]C1CCCCC1.[O-]C(=O)C1=CC=CC=C1 CIFYUXXXOJJPOL-UHFFFAOYSA-N 0.000 description 1
- NISGSNTVMOOSJQ-UHFFFAOYSA-N cyclopentanamine Chemical compound NC1CCCC1 NISGSNTVMOOSJQ-UHFFFAOYSA-N 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- VSFQMZYFJAOOOG-UHFFFAOYSA-N di(propan-2-yloxy)lead Chemical compound CC(C)O[Pb]OC(C)C VSFQMZYFJAOOOG-UHFFFAOYSA-N 0.000 description 1
- 150000001983 dialkylethers Chemical class 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- OKGXJRGLYVRVNE-UHFFFAOYSA-N diaminomethylidenethiourea Chemical compound NC(N)=NC(N)=S OKGXJRGLYVRVNE-UHFFFAOYSA-N 0.000 description 1
- CKKXWJDFFQPBQL-UAIGNFCESA-N diazanium;(z)-but-2-enedioate Chemical compound [NH4+].[NH4+].[O-]C(=O)\C=C/C([O-])=O CKKXWJDFFQPBQL-UAIGNFCESA-N 0.000 description 1
- HDFFVHSMHLDSLO-UHFFFAOYSA-M dibenzyl phosphate Chemical compound C=1C=CC=CC=1COP(=O)([O-])OCC1=CC=CC=C1 HDFFVHSMHLDSLO-UHFFFAOYSA-M 0.000 description 1
- QNNPHOLOYSXYNU-UHFFFAOYSA-N dicyclohexylazanium;benzoate Chemical compound OC(=O)C1=CC=CC=C1.C1CCCCC1NC1CCCCC1 QNNPHOLOYSXYNU-UHFFFAOYSA-N 0.000 description 1
- ZFAKTZXUUNBLEB-UHFFFAOYSA-N dicyclohexylazanium;nitrite Chemical compound [O-]N=O.C1CCCCC1[NH2+]C1CCCCC1 ZFAKTZXUUNBLEB-UHFFFAOYSA-N 0.000 description 1
- CYYRAVBQFCQGFE-UHFFFAOYSA-N dicyclohexylazanium;prop-2-enoate Chemical compound [O-]C(=O)C=C.C1CCCCC1[NH2+]C1CCCCC1 CYYRAVBQFCQGFE-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- JGUQDUKBUKFFRO-CIIODKQPSA-N dimethylglyoxime Chemical compound O/N=C(/C)\C(\C)=N\O JGUQDUKBUKFFRO-CIIODKQPSA-N 0.000 description 1
- HSFZJWNDRZGOKZ-UHFFFAOYSA-N dioctadecyl carbonate N-octadecyloctadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC.CCCCCCCCCCCCCCCCCCOC(=O)OCCCCCCCCCCCCCCCCCC HSFZJWNDRZGOKZ-UHFFFAOYSA-N 0.000 description 1
- HKUFIYBZNQSHQS-UHFFFAOYSA-O dioctadecylazanium Chemical compound CCCCCCCCCCCCCCCCCC[NH2+]CCCCCCCCCCCCCCCCCC HKUFIYBZNQSHQS-UHFFFAOYSA-O 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 1
- WLGSIWNFEGRXDF-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O.CCCCCCCCCCCC(O)=O WLGSIWNFEGRXDF-UHFFFAOYSA-N 0.000 description 1
- DDLFPQSWXAWPLE-UHFFFAOYSA-N dodecyl 2-(3,5-ditert-butyl-4-hydroxyphenyl)benzoate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 DDLFPQSWXAWPLE-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003256 environmental substance Substances 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 229940031098 ethanolamine Drugs 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- ACGYFGHQFAXLCI-UHFFFAOYSA-N ethyl 3,5-ditert-butyl-4-hydroxybenzoate Chemical compound CCOC(=O)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 ACGYFGHQFAXLCI-UHFFFAOYSA-N 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- CTEPBUFYCZLELZ-UHFFFAOYSA-N ethyl n-hexylcarbamate Chemical compound CCCCCCNC(=O)OCC CTEPBUFYCZLELZ-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 229920006244 ethylene-ethyl acrylate Polymers 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- OTCKNHQTLOBDDD-UHFFFAOYSA-K gold(3+);triacetate Chemical compound [Au+3].CC([O-])=O.CC([O-])=O.CC([O-])=O OTCKNHQTLOBDDD-UHFFFAOYSA-K 0.000 description 1
- 229940093915 gynecological organic acid Drugs 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000005446 heptyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 150000002391 heterocyclic compounds Chemical group 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- YLFGPZWMGHODNV-UHFFFAOYSA-N hexyl 2-(3,5-ditert-butyl-4-hydroxyphenyl)benzoate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 YLFGPZWMGHODNV-UHFFFAOYSA-N 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- YCADFRFBAHDVOS-UHFFFAOYSA-N hydrogen carbonate;propan-2-ylazanium Chemical compound CC(C)[NH3+].OC([O-])=O YCADFRFBAHDVOS-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- JCRTYCUNXFKTAZ-UHFFFAOYSA-N hydroxy(triphenyl)-$l^{5}-phosphane Chemical group C=1C=CC=CC=1P(C=1C=CC=CC=1)(O)C1=CC=CC=C1 JCRTYCUNXFKTAZ-UHFFFAOYSA-N 0.000 description 1
- XLSMFKSTNGKWQX-UHFFFAOYSA-N hydroxyacetone Chemical compound CC(=O)CO XLSMFKSTNGKWQX-UHFFFAOYSA-N 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- ILPVRBLJWLAMPB-UHFFFAOYSA-N lanthanum(3+) propan-1-olate Chemical compound [La+3].CCC[O-].CCC[O-].CCC[O-] ILPVRBLJWLAMPB-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- ORPJQHHQRCLVIC-UHFFFAOYSA-N magnesium;propan-2-olate Chemical compound CC(C)O[Mg]OC(C)C ORPJQHHQRCLVIC-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- DRLFMBDRBRZALE-UHFFFAOYSA-N melatonin Chemical compound COC1=CC=C2NC=C(CCNC(C)=O)C2=C1 DRLFMBDRBRZALE-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- ZUVVLBGWTRIOFH-UHFFFAOYSA-N methyl 4-methyl-2-[(4-methylphenyl)sulfonylamino]pentanoate Chemical compound COC(=O)C(CC(C)C)NS(=O)(=O)C1=CC=C(C)C=C1 ZUVVLBGWTRIOFH-UHFFFAOYSA-N 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- CEQFOVLGLXCDCX-WUKNDPDISA-N methyl red Chemical compound C1=CC(N(C)C)=CC=C1\N=N\C1=CC=CC=C1C(O)=O CEQFOVLGLXCDCX-WUKNDPDISA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- WHIVNJATOVLWBW-SNAWJCMRSA-N methylethyl ketone oxime Chemical compound CC\C(C)=N\O WHIVNJATOVLWBW-SNAWJCMRSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- FRVPQJVZFCJNCO-UHFFFAOYSA-N morpholine;2,4,6-trichloro-1,3,5-triazine Chemical compound C1COCCN1.ClC1=NC(Cl)=NC(Cl)=N1 FRVPQJVZFCJNCO-UHFFFAOYSA-N 0.000 description 1
- PUKBPIIUNNWYDU-UHFFFAOYSA-N n-[[3-(benzotriazol-2-yl)-2-hydroxy-5-(2,4,4-trimethylpentan-2-yl)phenyl]methyl]-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCC1=CC(C(C)(C)CC(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O PUKBPIIUNNWYDU-UHFFFAOYSA-N 0.000 description 1
- SGMHGVVTMOGJMX-UHFFFAOYSA-N n-naphthalen-2-yl-2-sulfanylacetamide Chemical compound C1=CC=CC2=CC(NC(=O)CS)=CC=C21 SGMHGVVTMOGJMX-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- HRRDCWDFRIJIQZ-UHFFFAOYSA-N naphthalene-1,8-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=CC2=C1 HRRDCWDFRIJIQZ-UHFFFAOYSA-N 0.000 description 1
- WTQSPDBNCMUOKF-UHFFFAOYSA-L naphthalene-1-carboxylate;nickel(2+) Chemical compound [Ni+2].C1=CC=C2C(C(=O)[O-])=CC=CC2=C1.C1=CC=C2C(C(=O)[O-])=CC=CC2=C1 WTQSPDBNCMUOKF-UHFFFAOYSA-L 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- ZTILUDNICMILKJ-UHFFFAOYSA-N niobium(v) ethoxide Chemical compound CCO[Nb](OCC)(OCC)(OCC)OCC ZTILUDNICMILKJ-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- PDDANVVLWYOEPS-UHFFFAOYSA-N nitrous acid;n-propan-2-ylpropan-2-amine Chemical compound [O-]N=O.CC(C)[NH2+]C(C)C PDDANVVLWYOEPS-UHFFFAOYSA-N 0.000 description 1
- FJDUDHYHRVPMJZ-UHFFFAOYSA-N nonan-1-amine Chemical compound CCCCCCCCCN FJDUDHYHRVPMJZ-UHFFFAOYSA-N 0.000 description 1
- 125000006611 nonyloxy group Chemical group 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- XKIVKIIBCJIWNU-UHFFFAOYSA-N o-[3-pentadecanethioyloxy-2,2-bis(pentadecanethioyloxymethyl)propyl] pentadecanethioate Chemical compound CCCCCCCCCCCCCCC(=S)OCC(COC(=S)CCCCCCCCCCCCCC)(COC(=S)CCCCCCCCCCCCCC)COC(=S)CCCCCCCCCCCCCC XKIVKIIBCJIWNU-UHFFFAOYSA-N 0.000 description 1
- WCVVIGQKJZLJDB-UHFFFAOYSA-N o-butylhydroxylamine Chemical compound CCCCON WCVVIGQKJZLJDB-UHFFFAOYSA-N 0.000 description 1
- AQFWNELGMODZGC-UHFFFAOYSA-N o-ethylhydroxylamine Chemical compound CCON AQFWNELGMODZGC-UHFFFAOYSA-N 0.000 description 1
- ZCYWLWVJCJEYPJ-UHFFFAOYSA-N o-hexan-2-ylhydroxylamine Chemical compound CCCCC(C)ON ZCYWLWVJCJEYPJ-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- RNVAPPWJCZTWQL-UHFFFAOYSA-N octadecyl 3,5-ditert-butyl-4-hydroxybenzoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 RNVAPPWJCZTWQL-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- MADOXCFISYCULS-UHFFFAOYSA-N octyl 2-sulfanylacetate Chemical compound CCCCCCCCOC(=O)CS MADOXCFISYCULS-UHFFFAOYSA-N 0.000 description 1
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- PZKNFJIOIKQCPA-UHFFFAOYSA-N oxalic acid palladium Chemical compound [Pd].OC(=O)C(O)=O PZKNFJIOIKQCPA-UHFFFAOYSA-N 0.000 description 1
- GJXAPHONGGLIOM-UHFFFAOYSA-N oxaphosphepine Chemical group O1C=CC=CC=P1 GJXAPHONGGLIOM-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229940049953 phenylacetate Drugs 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 125000005538 phosphinite group Chemical group 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- STIABRLGDKHASC-UHFFFAOYSA-N phthalic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C1=CC=CC=C1C(O)=O STIABRLGDKHASC-UHFFFAOYSA-N 0.000 description 1
- VVOPUZNLRVJDJQ-UHFFFAOYSA-N phthalocyanine copper Chemical compound [Cu].C12=CC=CC=C2C(N=C2NC(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2N1 VVOPUZNLRVJDJQ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- LMRCKXYHPYNEJV-UHFFFAOYSA-N piperazine;piperidine Chemical compound C1CCNCC1.C1CNCCN1 LMRCKXYHPYNEJV-UHFFFAOYSA-N 0.000 description 1
- 150000003053 piperidines Chemical class 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- WUBJXWWQGDPUCE-UHFFFAOYSA-N propan-1-olate yttrium(3+) Chemical compound [Y+3].CCC[O-].CCC[O-].CCC[O-] WUBJXWWQGDPUCE-UHFFFAOYSA-N 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- TZRORHHMAGATLL-UHFFFAOYSA-N propan-2-ylazanium;propan-2-yl carbonate Chemical compound CC(C)[NH3+].CC(C)OC([O-])=O TZRORHHMAGATLL-UHFFFAOYSA-N 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical compound O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical compound O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- USPWKWBDZOARPV-UHFFFAOYSA-N pyrazolidine Chemical compound C1CNNC1 USPWKWBDZOARPV-UHFFFAOYSA-N 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003872 salicylic acid derivatives Chemical class 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- CQLFBEKRDQMJLZ-UHFFFAOYSA-M silver acetate Chemical compound [Ag+].CC([O-])=O CQLFBEKRDQMJLZ-UHFFFAOYSA-M 0.000 description 1
- 229940071536 silver acetate Drugs 0.000 description 1
- 229910001958 silver carbonate Inorganic materials 0.000 description 1
- LKZMBDSASOBTPN-UHFFFAOYSA-L silver carbonate Substances [Ag].[O-]C([O-])=O LKZMBDSASOBTPN-UHFFFAOYSA-L 0.000 description 1
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 1
- 229940098221 silver cyanide Drugs 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- KKKDGYXNGYJJRX-UHFFFAOYSA-M silver nitrite Chemical compound [Ag+].[O-]N=O KKKDGYXNGYJJRX-UHFFFAOYSA-M 0.000 description 1
- XNGYKPINNDWGGF-UHFFFAOYSA-L silver oxalate Chemical compound [Ag+].[Ag+].[O-]C(=O)C([O-])=O XNGYKPINNDWGGF-UHFFFAOYSA-L 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- FJOLTQXXWSRAIX-UHFFFAOYSA-K silver phosphate Chemical compound [Ag+].[Ag+].[Ag+].[O-]P([O-])([O-])=O FJOLTQXXWSRAIX-UHFFFAOYSA-K 0.000 description 1
- 229940019931 silver phosphate Drugs 0.000 description 1
- 229910000161 silver phosphate Inorganic materials 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 229940056910 silver sulfide Drugs 0.000 description 1
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 description 1
- 229910001494 silver tetrafluoroborate Inorganic materials 0.000 description 1
- RHUVFRWZKMEWNS-UHFFFAOYSA-M silver thiocyanate Chemical compound [Ag+].[S-]C#N RHUVFRWZKMEWNS-UHFFFAOYSA-M 0.000 description 1
- CHACQUSVOVNARW-LNKPDPKZSA-M silver;(z)-4-oxopent-2-en-2-olate Chemical compound [Ag+].C\C([O-])=C\C(C)=O CHACQUSVOVNARW-LNKPDPKZSA-M 0.000 description 1
- WXENESFPQCWDHY-UHFFFAOYSA-M silver;2-ethylhexanoate Chemical compound [Ag+].CCCCC(CC)C([O-])=O WXENESFPQCWDHY-UHFFFAOYSA-M 0.000 description 1
- LMEWRZSPCQHBOB-UHFFFAOYSA-M silver;2-hydroxypropanoate Chemical compound [Ag+].CC(O)C([O-])=O LMEWRZSPCQHBOB-UHFFFAOYSA-M 0.000 description 1
- RQZVTOHLJOBKCW-UHFFFAOYSA-M silver;7,7-dimethyloctanoate Chemical compound [Ag+].CC(C)(C)CCCCCC([O-])=O RQZVTOHLJOBKCW-UHFFFAOYSA-M 0.000 description 1
- DOQQTKLDEQSKIE-UHFFFAOYSA-N silver;isocyanate Chemical compound [Ag+].[N-]=C=O DOQQTKLDEQSKIE-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 229940037312 stearamide Drugs 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- WUPCFMITFBVJMS-UHFFFAOYSA-N tetrakis(1,2,2,6,6-pentamethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)CC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 WUPCFMITFBVJMS-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 229940087291 tridecyl alcohol Drugs 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- CMLWFCUAXGSMBB-UHFFFAOYSA-N tris(2,6-dimethoxyphenyl)phosphane Chemical group COC1=CC=CC(OC)=C1P(C=1C(=CC=CC=1OC)OC)C1=C(OC)C=CC=C1OC CMLWFCUAXGSMBB-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- QQBLOZGVRHAYGT-UHFFFAOYSA-N tris-decyl phosphite Chemical group CCCCCCCCCCOP(OCCCCCCCCCC)OCCCCCCCCCC QQBLOZGVRHAYGT-UHFFFAOYSA-N 0.000 description 1
- WRSPWQHUHVRNFV-UHFFFAOYSA-N tris[3,5-di(nonyl)phenyl] phosphite Chemical compound CCCCCCCCCC1=CC(CCCCCCCCC)=CC(OP(OC=2C=C(CCCCCCCCC)C=C(CCCCCCCCC)C=2)OC=2C=C(CCCCCCCCC)C=C(CCCCCCCCC)C=2)=C1 WRSPWQHUHVRNFV-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
- TYSXNZUFDKPFED-UHFFFAOYSA-N zinc;propan-1-olate Chemical compound [Zn+2].CCC[O-].CCC[O-] TYSXNZUFDKPFED-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S23/00—Arrangements for concentrating solar-rays for solar heat collectors
- F24S23/70—Arrangements for concentrating solar-rays for solar heat collectors with reflectors
- F24S23/82—Arrangements for concentrating solar-rays for solar heat collectors with reflectors characterised by the material or the construction of the reflector
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G02B1/105—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S80/00—Details, accessories or component parts of solar heat collectors not provided for in groups F24S10/00-F24S70/00
- F24S2080/01—Selection of particular materials
- F24S2080/015—Plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Definitions
- the present invention relates to a film mirror for reflecting sunlight and a reflecting device for solar thermal power generation.
- Solar energy can be considered as one of the stable and abundant natural energies as alternative energy for fossil fuels.
- the vast desert spreads near the equator which is called the world's sun belt, and the solar energy that falls down here is truly inexhaustible.
- energy of as much as 7,000 GW can be obtained using only a few percent of the desert that extends to the southeastern United States.
- using only a few percent of the Arabian peninsula and the deserts of North Africa can cover all the energy used by all centuries.
- a glass-based mirror has been used for the reflection device.
- a glass mirror has problems such as large mass, large volume, high transportation cost, difficult installation, and easy breakage. . Therefore, if a mirror made of resin is used as an alternative to glass, the weight can be reduced and the problem of cracking does not occur. Therefore, a film mirror, which is a product in which the mirror is made into a film, has attracted attention. Since the film mirror is a film-like mirror in which a resin is used, it is an excellent reflecting mirror that is lightweight and flexible, can be manufactured in a large area, and can be mass-produced while suppressing manufacturing costs.
- Patent Document 1 discloses a protective layer to which an ultraviolet absorber or an antioxidant is added in order to protect the resin layer from ultraviolet rays.
- a low molecular compound such as an ultraviolet absorber or an antioxidant is added to the resin material. Therefore, when the resin is exposed to ultraviolet rays and the resin deteriorates, the low molecular compound and the resin material interact with each other.
- the film mirror for sunlight reflection has a silver reflection layer, some ultraviolet rays contained in sunlight are strongly reflected. That is, in the layer on the sunlight incident side with respect to the silver reflection layer, first, after direct sunlight is irradiated, the sunlight is reflected by the silver reflection layer and hits the layer again. In other words, in areas where there is a large amount of ultraviolet radiation from sunlight, it is exposed twice to ultraviolet radiation due to reflection, so the problems of bleedout and silver aggregation become more serious. Is very important.
- Patent Document 2 discloses a protective layer made of a UV-absorbing resin composition in which the polyester resin itself has a UV-absorbing group, although it is not intended to be used as a solar reflective film mirror. .
- the present inventor can ignore the bleed-out of a substance having an ultraviolet absorbing ability by using the technique disclosed in Patent Document 2 as a film mirror for sunlight reflection, and can improve compatibility with ultraviolet rays. It has been found that the protective layer can have more UV-absorbing groups than when the absorbent is added.
- the present inventor believes that a part of the ultraviolet rays contained in sunlight is generated because the film mirror for sunlight reflection is used in an environment such as a desert where the amount of ultraviolet irradiation is very large. Focusing on the issues unique to solar reflective film mirrors, such as irradiating the protective layer twice, bleed-out, compatibility, decreased reflectivity due to bleed-out, silver aggregation, discoloration, film peeling, cracks, etc. As a result of intensive studies, the inventors have found that the technique of Patent Document 2 can be used. It is the inventors of the present invention to apply an invention that does not have a problem described because it is a film mirror having a silver reflection layer, such as Patent Document 2, to the present invention for the purpose of reflecting sunlight. I strongly recommend that it is a unique point of view and not easy at all.
- An object of the present invention is to provide a film mirror for reflecting sunlight and a reflecting device for solar thermal power generation that can be suitably used even in an environment where the amount of ultraviolet irradiation is very large such as a desert.
- the film mirror for sunlight reflection of Claim 1 is a film mirror which has a resin film-like support body, a silver reflection layer, and a protective layer, Comprising:
- the said protective layer is the said resin film-like support body and the said silver reflection layer.
- the solar light is provided on the sunlight incident side, the protective layer has a resin, and the resin has the ultraviolet absorbing group (1) and / or (2).
- the solar reflective film mirror is made of resin, it is lightweight and flexible, and can be manufactured with a large area and mass production while suppressing manufacturing costs.
- the protective layer is provided in the sunlight incident side rather than the resin film-like support body, it becomes possible to prevent deterioration of the resin film-like support body.
- the protective layer has an ultraviolet absorbing ability, it is naturally less likely to cause discoloration, film peeling or cracking of the resin film-like support as compared with a film mirror not having such a protective layer. .
- the group of the protective layer resin is a benzotriazole-based UV-absorbing group and / or a triazine-based UV-absorbing group, an appropriate UV resistance (UV absorbing ability) suitable for the wavelength characteristics of sunlight. And UV stability).
- UV resistance UV absorbing ability
- the resin of the protective layer of the film mirror has an ultraviolet absorbing group, the resin itself becomes a polymer compound having an ultraviolet absorbing group. As a result, since the interaction between the resin and the ultraviolet absorbing group is strengthened, the bleeding out of the ultraviolet absorbing group is overwhelmingly difficult to occur.
- the resin since the resin has UV-absorbing groups rather than being added, it can have more UV-absorbing groups, improving compatibility and improving UV resistance. Highly preferred.
- the film mirror since the film mirror is used in an environment where the amount of ultraviolet irradiation is very large, such as a desert, and has a silver reflection layer, a part of ultraviolet rays contained in sunlight is 2% against the protective layer. The problem of bleed-out and silver agglomeration becomes particularly large because of the excessive irradiation, but bleed-out is less likely to occur because the protective layer resin is based on UV-absorbing groups.
- the film mirror for sunlight reflection according to claim 2 is the invention according to claim 1, wherein the benzotriazole-based ultraviolet absorbing group has a composition represented by the following formula (1a) or (1b), and the triazine
- the system ultraviolet absorbing group is characterized by having a composition represented by the following formula (2).
- R 1 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms
- R 2 represents an alkylene group having 1 to 6 carbon atoms
- R 3 represents a hydrogen atom or a methyl group
- X 1 represents hydrogen
- An atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a cyano group, or a nitro group is represented.
- R 4 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a cyano group or a nitro group
- R 5 represents an element capable of forming a hydrogen bond
- R 6 represents a hydrogen atom or a methyl group
- R 7 represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
- R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 and R 15 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, 10 represents an alkenyl group or an alkoxy group having 1 to 10 carbon atoms, X 2 represents a hydrogen atom or a methyl group, and A represents — (CH 2 CH 2 O) p —, —CH 2 CH (OH) —CH 2 O—, — (CH 2 ) p —O—, —CH 2 CH (CH 2 OR 16 ) —O—, —CH 2 CH (R 16 ) —O—, or —CH 2 (CH 2 Q represents COO—B—O—, R 16 represents an alkyl group having 1 to 10 carbon atoms, B represents a methylene group, an ethylene group, or —CH 2 CH (OH) CH 2 —, and p represents 1 represents an integer of 1 to 20, and q represents 0
- the film mirror for sunlight reflection according to claim 3 is the invention according to claim 1 or 2, wherein the resin has an antioxidant group.
- the resin constituting the protective layer has an antioxidant group
- radicals, active oxygen, and the like generated when ultraviolet rays hit the resin of the protective layer can be inactivated.
- the ultraviolet absorber or ultraviolet absorbing group is exposed to excessive and / or long-term ultraviolet rays, the polarity of the ultraviolet absorber or ultraviolet absorbing group changes, and the ultraviolet absorber or ultraviolet absorbing group itself is decomposed. As a result, radicals are generated.
- the resin since the resin has an antioxidant group, silver in the silver reflecting layer is aggregated by radicals generated by the decomposition of the resin and / or the group of the resin.
- the resin has both an ultraviolet absorbing group and an antioxidant group
- a synergistic effect can be obtained instead of an additive effect.
- the antioxidant group can prevent the ultraviolet absorbing group from being deteriorated, that is, has an ability to stabilize against ultraviolet rays, so that it can contribute to extending the life of the protective layer.
- the resin of the protective layer has an antioxidant group, the distance between the ultraviolet absorbing group and the antioxidant group is close, and radicals generated by ultraviolet rays are easily inactivated. As a result, the protective layer has a longer life even in an ultraviolet environment as compared with the case where an antioxidant is added.
- the resin of the protective layer has an antioxidant group, unlike the protective layer to which the antioxidant is added, the bleedout of the antioxidant group itself is almost the same as the ultraviolet absorbing group. It does not occur, and the compatibility is good, so that it can be contained in a large amount, and the influence of a decrease in regular reflectance due to bleed-out can be avoided.
- the film mirror for sunlight reflection according to claim 4 is the invention according to claim 3, wherein the antioxidant group is HALS.
- the antioxidant group is HALS.
- the UV stability of the protective layer is particularly preferable for a long period of time.
- the film mirror for solar light reflection according to claim 5 is the invention according to claim 4, wherein the HALS is a one-side polymer group-modified HALS.
- HALS is a one-side polymer group-modified HALS, it is preferable in terms of ease of production and low cost.
- the solar reflective film mirror according to claim 6 is the invention according to any one of claims 1 to 5, wherein the solar reflective film mirror has an acrylic layer, and the acrylic mirror The layer is provided between the silver reflective layer and the protective layer.
- the acrylic layer is more likely to be uneven as compared with a resin such as polyethylene terephthalate. Even when a roll-to-roll method for continuously forming a film is used, sticking such as blocking when the film mirror is wound into a roll can be prevented.
- an acrylic resin is used as the protective layer resin and the acrylic layer and the protective layer are adjacent to each other, the adhesion between the acrylic layer and the protective layer can be kept high.
- the film mirror for sunlight reflection according to claim 7 is the invention according to claim 6, wherein an adhesive layer is not present between the silver reflection layer and the protective layer.
- the acrylic layer between the silver reflective layer and the protective layer for example, by coating or the like is closer to the sunlight incident side than the silver reflective layer. It is formed.
- the protective layer is also formed on the sunlight incident side with respect to the acrylic layer by coating or the like.
- an acrylic layer or a protective layer is formed by coating, etc., but in that case, a large amount of coating solution is used, so when a film is bonded to a silver reflective layer that can be almost ignored There arises a problem of penetration of the coating liquid of the acrylic layer and the protective layer.
- ultraviolet rays are applied to the resin of the coating solution for the acrylic layer or the protective layer, radicals are generated, and when the radicals reach the silver reflection layer, silver aggregation is caused.
- a protective layer is provided, the problem of silver aggregation becomes larger, but since the resin has an ultraviolet absorbing group, it can have a larger amount of ultraviolet absorbing groups than when an ultraviolet absorber is added.
- the protective layer has an antioxidant group, radicals generated from the resin of the protective layer and the acrylic layer and radicals generated from other than the resin can be inactivated, which is preferable because aggregation of the silver reflective layer can be further prevented.
- the absence of the adhesive layer makes it possible to make the film mirror thinner.
- the solar reflective film mirror according to claim 8 is the invention according to any one of claims 1 to 5, wherein the solar reflective film mirror has an acrylic layer, and the protection The layer is provided between the silver reflective layer and the acrylic layer.
- the acrylic layer is more likely to be uneven as compared with a resin such as polyethylene terephthalate. Even when a roll-to-roll method for continuously forming a film is used, sticking such as blocking when the film mirror is wound into a roll can be prevented.
- an acrylic resin is used as the protective layer resin and the acrylic layer and the protective layer are adjacent to each other, the adhesion between the acrylic layer and the protective layer can be kept high.
- the solar reflective film mirror according to claim 9 is the invention according to any one of claims 1 to 8, wherein the solar reflective film mirror is formed from a sunlight incident side surface of the silver reflective layer.
- the total film thickness of the outermost surface on the sunlight incident side is 5 ⁇ m or more and 125 ⁇ m or less.
- attaining a silver reflection layer does not occur easily.
- a reflecting device for solar thermal power generation according to claim 10 is characterized by having the film mirror for solar light reflection according to any one of claims 1 to 9 and a holding member.
- the protective layer bleeds out, the reflectance decreases with bleedout, the aggregation of the silver, the discoloration, the film peeling of the resin film-like support, cracks, etc. Can be greatly reduced, and a highly reflective film mirror for solar reflection and a solar power generation reflector can be provided.
- the solar reflective film mirror is used in an environment where the amount of ultraviolet irradiation is very large, such as a desert. Irradiates the protective layer twice, bleed out, compatibility, decrease in reflectivity due to bleed out, decrease in reflectivity due to aggregation of silver, discoloration, film peeling, crack, etc. It finds unique challenges and provides solutions.
- the film mirror for sunlight reflection refers to a film-like mirror having at least a resin film-like support, a silver reflection layer, and a protective layer. Moreover, the protective layer is provided in the sunlight incident side rather than the resin film-like support body and the silver reflective layer.
- the thickness of the film mirror is 20 to 600 ⁇ m, preferably 80 to 300 ⁇ m, more preferably 80 to 200 ⁇ m, and most preferably 80 to 170 ⁇ m. It is preferable to set the thickness of the film mirror to 20 ⁇ m or more because when the film mirror is bonded to a substrate that supports the film mirror, the mirror does not bend and it becomes easy to obtain good reflectance.
- the thickness of the film mirror 600 ⁇ m or less because the handleability is improved. Since the film mirror has flatness, it can be manufactured by roll-to-roll, and is preferably used from the viewpoint of manufacturing cost. The film mirror can be said to be very lightweight because of the material used and the thickness of about 20 to 600 ⁇ m. Furthermore, since the support is a resin film, the film mirror does not have a problem such as cracking unlike glass, and has flexibility. In other words, the film mirror has features that it is lightweight and flexible, and can be manufactured with a large area and mass production while suppressing manufacturing costs.
- the film mirror for sunlight reflection may have a layer other than the resin film support, the silver reflection layer, and the protective layer.
- it has any or some or all of a hard coat layer, an acrylic layer, a resin coat layer, an anchor layer, an adhesive layer and the like.
- the hard coat layer 8, the protective layer 7, the acrylic layer 6, the resin coat layer 4, the silver reflective layer 3, and the anchor are sequentially arranged from the sunlight incident side.
- the positional relationship among the layer 2, the resin film-like support 1, the adhesive layer 9a, and the release layer 9b is preferable.
- the acrylic layer is preferably provided between the silver reflective layer and the protective layer, but a protective layer may be provided between the silver reflective layer and the acrylic layer.
- a protective layer may be provided between the silver reflective layer and the acrylic layer.
- another layer may be interposed on the sunlight incident side of one of the layers described above or on the opposite side, or a plurality of such other layers may be provided.
- the respective layers described above may be adjacent to each other.
- an adhesive layer may be provided between any of the layers.
- an adhesive layer may be provided between the acrylic layer and the resin coat layer.
- you may provide the layer (peeling layer) by a peeling sheet so that an adhesion layer may be covered.
- the surface roughness Ra of the film mirror is preferably 0.01 ⁇ m or more and 0.1 ⁇ m or less, and more preferably 0.02 ⁇ m or more and 0.07 ⁇ m or less. If the surface roughness of the film mirror is 0.01 ⁇ m or more, even if the surface is accidentally touched with a finger during transportation or when assembling or adjusting the solar reflective film mirror, It is possible to prevent the reflectance from being lowered due to fingerprints. Further, when a roll-to-roll method capable of continuously forming a film mirror is used, sticking such as blocking can be prevented by the surface roughness. If the surface roughness of the film mirror is 0.1 ⁇ m or less, the scattering of sunlight by the film mirror surface is not so great.
- the surface roughness is 0.02 ⁇ m or more and 0.07 ⁇ m or less, the above-described effect becomes more remarkable.
- the surface roughness is measured with a three-dimensional measuring device NH-3SP (Mitaka Kogyo).
- the measurement conditions at that time are a measurement range of 2 mm, a measurement pitch of 2 ⁇ m, an objective lens of 100 ⁇ , and a cutoff value of 0.250 mm.
- the protective layer is provided closer to the sunlight incident side than the resin film-like support and the silver reflective layer, and has a resin.
- the resin has the ultraviolet absorbing group (1) and / or (2).
- the protective layer has a role of preventing deterioration of a layer on the opposite side of the sunlight incident side from the protective layer, such as a resin film-like support or a silver reflective layer, due to an environment such as ultraviolet rays.
- the resin film-like support of the film mirror is not deteriorated by ultraviolet rays, so that discoloration, film peeling, cracking, and the like are less likely to occur.
- the group of the protective layer resin is a benzotriazole-based UV-absorbing group and / or a triazine-based UV-absorbing group, compared to other UV-absorbing groups such as a benzophenone-based UV-absorbing group. Therefore, it has UV resistance appropriate for the wavelength characteristics of sunlight.
- the resin of the protective layer has an ultraviolet absorbing group
- the resin becomes a polymer compound having an ultraviolet absorbing group, and bleeding out is hardly generated.
- the resin since the resin has an ultraviolet absorbing group instead of adding an ultraviolet absorber to the resin, it can have more ultraviolet absorbing groups than when added. And compatibility is also good, which is very preferable.
- the film mirror for sunlight reflection is used in an environment where the amount of ultraviolet irradiation is very large such as a desert and has a silver reflection layer, some of the protection layer is included in sunlight. Even if the ultraviolet ray has been irradiated twice, since the resin of the protective layer has an ultraviolet absorbing group, bleed-out hardly occurs. Since the bleed-out can be almost ignored in the protective layer, it is possible to avoid a serious problem as a film mirror for solar light reflection such as a decrease in the reflectance due to the bleed-out and maintain a high regular reflectance.
- the resin of the protective layer has a benzotriazole-based ultraviolet absorbing property
- a problem with ultraviolet rays contained in sunlight is a wavelength of about 400 nm or less, and the intensity tends to increase as the wavelength approaches 400 nm.
- the benzotriazole-based UV-absorbing group has a wavelength around 345 nm as the maximum UV absorption wavelength. Since the resin of the protective layer has a benzotriazole-based ultraviolet absorbing group, the ultraviolet rays contained in sunlight can be largely absorbed around 345 nm. On the contrary, it becomes possible to greatly reduce the amount of ultraviolet irradiation to a certain layer.
- the triazine-based ultraviolet absorbing group has a wavelength around 270 nm as a maximum ultraviolet absorption wavelength. Since the resin of the protective layer has a triazine-based ultraviolet absorbing group, ultraviolet rays contained in sunlight can be largely absorbed around 270 nm, and as a result, it is opposite to the sunlight incident side than the protective layer. Therefore, it is possible to greatly reduce the amount of ultraviolet irradiation to the layer.
- UV rays that were not absorbed by the triazine UV-absorbing group are reflected by the silver reflecting layer and are irradiated again to the protective layer.
- the resin has a UV-absorbing group
- the bleed-out can be almost ignored even in a strong UV environment such as a desert.
- the triazine-based UV-absorbing group has not only the ability to absorb UV rays centered on a wavelength of 270 nm, but also the ability to significantly decompose UV rays, that is, the ability to stabilize UV rays. Especially suitable for outdoor use.
- the UV-absorbing group of the protective layer resin is only one of the benzotriazole-based UV-absorbing group and the triazine-based UV-absorbing group, discoloration or film peeling of the film mirror, bleeding out in the protective layer, although the problem of radical generation can be reduced, it is more preferable that the resin has both a benzotriazole-based UV-absorbing group and a triazine-based UV-absorbing group.
- the resin of the protective layer it becomes possible to sufficiently absorb ultraviolet rays even if the degree of modification of each is not so high.
- the ultraviolet-ray contained in sunlight can be absorbed over a long zone
- the resin of the protective layer has an antioxidant group
- radicals and active oxygen generated when the resin of the protective layer and / or the ultraviolet absorbing group and / or other solution of the resin are irradiated Can be inactivated, and aggregation and discoloration of the silver reflection layer and a decrease in the regular reflectance of the film mirror can be further prevented.
- a synergistic effect can be acquired by having both the ultraviolet-absorbing group and antioxidant group.
- the antioxidant group can prevent the ultraviolet absorbing group from being deteriorated, that is, has stability against ultraviolet rays, and thus can contribute to the extension of the life of the protective layer.
- the protective layer resin has an antioxidant group
- the distance between the UV absorbing group and the antioxidant group is close, and it is easy to inactivate radicals generated by UV rays.
- the protective layer has a longer life even in an ultraviolet environment.
- the resin of the protective layer has an antioxidant group, unlike the protective layer to which an antioxidant is added, the antioxidant group itself hardly bleeds out, and the compatibility becomes high. Furthermore, the influence of a decrease in regular reflectance due to bleed-out can be avoided.
- the antioxidant group bonded to the resin skeleton is HALS, and that one-side polymer group-modified HALS is preferable in terms of ease of production and low cost, and both-side polymer group-modified HALS. Since the degree of modification of the resin with HALS is high, the resin has a very high UV stability.
- the present inventors have found that it is preferable to use a benzotriazole-based UV-absorbing group as the UV-absorbing group and HALS as the antioxidant group because the life of the protective layer is further prolonged due to a synergistic effect. .
- the position of the protective layer is not particularly limited as long as it is closer to the sunlight incident side than the resin film-like support or the silver reflective layer.
- the resin of the protective layer is an acrylic resin and is adjacent to the acrylic layer, the adhesion between the two layers is kept very high, and it is preferable that film peeling does not easily occur.
- the thickness of the protective layer is 1 to 100 ⁇ m, and preferably 3 to 50 ⁇ m. If the thickness of the protective layer is 1 ⁇ m or more, it is easy to have a high ultraviolet absorption ability, and if it is 100 ⁇ m or less, the regular reflectance of the solar reflective film mirror is hardly lowered, which is preferable.
- Resin used for protective layer As a resin material used for the protective layer, various conventionally known resin films can be used. For example, cellulose ester film, polyester film, polycarbonate film, polyarylate film, polysulfone (including polyether sulfone) film, polyester film such as polyethylene terephthalate and polyethylene naphthalate, polyethylene film, polypropylene film, cellophane, cellulose Diacetate film, cellulose triacetate film, cellulose acetate propionate film, cellulose acetate butyrate film, polyvinylidene chloride film, polyvinyl alcohol film, ethylene vinyl alcohol film, syndiotactic polystyrene film, polycarbonate film, norbornene resin film, Polymethylpentene film, Li ether ketone film, polyether ketone imide film, a polyamide film, a fluororesin film, a nylon film, polymethyl methacrylate film, and acrylic films.
- cellulose ester film cellulose ester film, polyester film
- polycarbonate films polyester films such as polyethylene terephthalate, norbornene resin films, cellulose ester films, and acrylic films are preferable.
- a polyester film such as polyethylene terephthalate or an acrylic film, and it may be a film manufactured by melt casting film formation or a film manufactured by solution casting film formation.
- the preferable content of the resin in the protective layer is preferably 5 to 100% by mass in 100% by mass of the composition of the protective layer. If it is this range, the adhesiveness with respect to a plastic base material will become favorable. If it is 5% by mass or more, the interaction with the adjacent layer is high, the adhesion is sufficiently maintained, and it is within 100% by mass, so that the weather resistance is sufficient. More preferably, it is 10 to 90% by mass, and further preferably 10 to 50% by mass.
- the protective layer may contain other resins.
- other resins include thermoplastic resins and thermosetting resins that are crosslinked and cured by the action of the resin itself or by a curing agent. More specifically, other than the above-mentioned resins, thermoplastic resins such as vinyl chloride resins, polyester resins, acrylic resins, silicone resins; urethane resins, aminoplast resins, silicone resins, epoxy resins, Examples include single-curing heat / ultraviolet / electron beam curable resins such as acrylic resins; thermosetting resins that are cured by a curing agent such as polyester resins, acrylic resins, and epoxy resins.
- Benzotriazole UV Absorbing Group The functional groups used for the benzotriazole-based UV-absorbing group possessed by the protective layer resin will be described in detail below. Hereinafter, a compound is treated as a functional group.
- a preferred benzotriazole-based UV-absorbing group is represented by the following general formula (1a) or (1b).
- R 1 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms
- R 2 represents an alkylene group having 1 to 6 carbon atoms
- R 3 represents a hydrogen atom or a methyl group
- X 1 represents hydrogen An atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a cyano group, or a nitro group is represented.
- R 4 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a cyano group or a nitro group
- R 5 represents an element capable of forming a hydrogen bond
- R 6 represents a hydrogen atom or a methyl group
- R 7 represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
- examples of the alkyl group having 1 to 8 carbon atoms represented by R 1 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, and pentyl.
- the alkylene group having 1 to 6 carbon atoms represented by R 2 is, for example, a linear alkylene group such as a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group or a hexylene group.
- branched chain alkylene groups such as isopropylene group, isobutylene group, sec-butylene group, t-butylene group, isopentylene group and neopentylene group.
- examples of the halogen atom represented by X 1 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- examples of the alkyl group having 1 to 8 carbon atoms represented by X 1 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a pentyl group, a hexyl group, and a heptyl group.
- Chain alkyl groups such as octyl group: cyclopropyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group and other alicyclic alkyl groups; phenyl group, tolyl group, xylyl group, benzyl group, phenethyl group, etc.
- An aromatic alkyl group of Examples of the alkoxy group having 1 to 6 carbon atoms represented by X 1 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, and a hexyloxy group.
- the ultraviolet-absorbing group represented by the above formula (1a) is not particularly limited, and examples thereof include 2- [2′-hydroxy-5 ′-(methacryloyloxymethyl) phenyl] -2H-benzotriazole.
- examples of the halogen atom represented by R 4 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- examples of the alkyl group having 1 to 8 carbon atoms represented by R 4 include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, n -Linear or branched such as -pentyl group, isopentyl group, 2,2-dimethylpropyl group, n-heptyl group, n-octyl group, 1,1,3,3-tetramethylbutyl group, 2-ethylhexyl group An alicyclic alkyl group such as a cyclohexyl group; and the like.
- Examples of the alkoxy group having 1 to 4 carbon atoms represented by R 4 include a methoxy
- examples of the group represented by R 5 and having an element capable of forming a hydrogen bond include —NH—, —CH 2 NH—, —OCH 2 CH (OH) CH 2 O— , —CH 2 CH 2 COOCH 2 CH (OH) CH 2 O—, and the like.
- these groups in that they contain a nitrogen atom having an active hydrogen, -NH -, - CH 2 NH- are preferred, -CH 2 NH- is particularly preferred.
- examples of the alkyl group having 1 to 12 carbon atoms represented by R 7 include, for example, the above-described substituents listed as the alkyl group having 1 to 8 carbon atoms represented by R 5.
- Linear or branched alkyl groups such as nonyl group, decyl group, undecyl group and dodecyl group; aromatic alkyl groups such as phenyl group, tolyl group, xylyl group, benzyl group and phenethyl group; it can.
- a linear or branched alkyl group having 4 to 12 carbon atoms is preferable, and a bulky branched alkyl group such as 1,1,3,3-tetramethylbutyl group (or the like). Particularly preferred are groups having
- the ultraviolet-absorbing group represented by the above formula (1b) is not particularly limited, and examples thereof include 2- [2′-hydroxy-3 ′-(meth) acryloylaminophenyl] -2H-benzotriazole.
- UV absorbing groups may be used alone or in combination of two or more.
- 2- [2′-hydroxy-3 ′-(meth) acryloylamino-5 ′-(1,1) has a bulky substituent R 7 bonded to the 5-position.
- 3,3-tetramethylbutyl) phenyl] -2H-benzotriazole and 2- [2′-hydroxy-3 ′-(meth) acryloylaminomethyl-5 ′-(1,1,3,3-tetra Methylbutyl) phenyl] -2H-benzotriazole is preferred.
- benzotriazole-based UV-absorbing group represented by the above formula (1a) or (1b) examples include (meth) acrylic acid chloride, N-methylolacrylamide or the corresponding benzotriazole (commercially available as an UV absorber) It can be synthesized by a method such as reacting the alkyl ether.
- 2- [2′-hydroxy-3′-methacryloylamino-5 ′-(1,1,3,3-tetramethylbutyl) phenyl] -2H-benzotriazole is represented by 2- [2′-hydroxy-3 It can be obtained by reacting '-amino-5'-(1,1,3,3-tetramethylbutyl) phenyl] -benzotriazole with methacrylic acid chloride.
- 2- [2′-hydroxy-3′-methacryloylaminomethyl-5 ′-(1,1,3,3-tetramethylbutyl) phenyl] -2H-benzotriazole is 2- [2′-hydroxy- 5 ′-(1,1,3,3-tetramethylbutyl) phenyl] -benzotriazole (for example, CYASORB (registered trademark) UV-5411, manufactured by CYTEC) and N-methylolacrylamide (for example, manufactured by Nitto Chemical Industries, Ltd.) Etc.) can be obtained by reaction.
- the compound used for these ultraviolet-absorbing groups may be used independently, or may use 2 or more types together. In particular, those using Tinuvin 234 (Ciba Japan) as a material can be preferably used.
- Triazine UV absorbing group The functional group used for the triazine-based ultraviolet absorbing group possessed by the resin of the protective layer will be described in detail below. Hereinafter, a compound is treated as a functional group.
- a preferable triazine-based ultraviolet absorbing group is represented by the following general formula (2).
- R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 and R 15 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, 10 represents an alkenyl group or an alkoxy group having 1 to 10 carbon atoms, X 2 represents a hydrogen atom or a methyl group, and A represents — (CH 2 CH 2 O) p —, —CH 2 CH (OH) —CH 2 O—, — (CH 2 ) p —O—, —CH 2 CH (CH 2 OR 16 ) —O—, —CH 2 CH (R 16 ) —O—, or —CH 2 (CH 2 Q represents COO—B—O—, R 16 represents an alkyl group having 1 to 10 carbon atoms, B represents a methylene group, an ethylene group, or —CH 2 CH (OH) CH 2 —, and p represents 1 represents an integer of 1 to 20, and q represents 0 or 1.
- examples of the alkyl group having 1 to 10 carbon atoms represented by R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 or R 15 include a methyl group, Ethyl, propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, n-pentyl, isopentyl, 2,2-dimethylpropyl, n-heptyl, n- Linear or branched alkyl group such as octyl group, n-nonyl group, n-decyl group, 1,1,3,3-tetramethylbutyl group and 2-ethylhexyl group; alicyclic alkyl group such as cyclohexyl group Group; and the like.
- Examples of the alkenyl group having 2 to 10 carbon atoms represented by R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 or R 15 include a vinyl group, an allyl group, and a 1-propenyl group.
- Examples thereof include a 3-pentenyl group, a 6-methyl-5-heptenyl group, and a 2,6-dimethyl-5-heptenyl group.
- Examples of the alkoxy group having 1 to 10 carbon atoms represented by R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 or R 15 include, for example, methoxy group, ethoxy group, propoxy group, butoxy Group, pentyloxy group, hexyloxy group, heptyloxy group, octyloxy group, nonyloxy group, decyloxy group and the like.
- examples of the alkyl group having 1 to 10 carbon atoms represented by R 16 in A include R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14.
- the above-described substituents listed as the alkyl group having 1 to 10 carbon atoms represented by R 15 can be given.
- the ultraviolet-absorbing group represented by the above formula (2) is not particularly limited, but for example, 2,4-diphenyl-6- [2-hydroxy-4- (2-acryloyloxy) phenyl] -1,3,5-triazine, 2,4-bis (2-methylphenyl) -6- [2-hydroxy-4- (2-acryloyloxyethoxy) phenyl] -1,3,5-triazine, 2, 4-bis (2-methoxyphenyl) -6- [2-hydroxy-4- (2-acryloyloxyethoxy) phenyl] -1,3,5-triazine, 2,4-bis (2-ethylphenyl) -6 -[2-hydroxy-4- (2-acryloyloxyethoxy) phenyl] -1,3,5-triazine, 2,4-bis (2-ethoxyphenyl) -6- [2-hydroxy-4- (2- Ak Royloxyethoxy) phenyl] -1,3,5-triazine, 2,4-dipheny
- UV-absorbing group represented by formula (2b)
- UV-absorbing group represented by formula (2c)
- a preferable content of the benzotriazole-based UV-absorbing group having the composition (1a) or (1b) and / or the triazine-based UV-absorbing group having the composition (2) in the protective layer is 100% by mass of the composition of the protective layer. 5 mass% or more and 60 mass% or less are preferable as the whole ultraviolet absorptive group, 7 mass% or more and 50 mass% or less are more preferable, and 10 mass% or more and 20 mass% or less are more preferable. If it is this range, the ultraviolet-absorbing capability of a protective layer will become enough, and yellowing of resin used for a film mirror can be suppressed over a long period of time.
- the ultraviolet resistance of the protective layer is preferably increased.
- the ratio of the benzotriazole-based UV-absorbing group and the triazine-based UV-absorbing group may be 0: 100 or 100: 0 by mass%, but the ratio is close to 50:50, specifically 30:70.
- a ratio of ⁇ 70: 30 is preferable from the viewpoint of ultraviolet resistance, and more preferably 40: 60-60: 40.
- Antioxidant group The functional group used for the antioxidant group which the resin of the protective layer has will be described in detail below. Hereinafter, a compound is treated as a functional group.
- antioxidant groups applicable to the present invention include hindered amine-based antioxidant groups, hindered phenol-based antioxidant groups, and phosphorus-based antioxidant groups.
- HALS hindered amine light stabilizer
- photostable groups are generally referred to as HALS (hindered amine light stabilizer) and are also referred to as photostable groups, and are preferably used.
- HALS include bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (2,2,6,6-tetramethyl-4-piperidyl) succinate, bis (1,2 , 2,6,6-Pentamethyl-4-piperidyl) sebacate, bis (N-octoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (N-benzyloxy-2,2,6) , 6-Tetramethyl-4-piperidyl) sebacate, bis (N-cyclohexyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl- 4-piperidyl) 2- (3,5-di-t-butyl-4-hydroxybenzyl)
- N N ′, N ′′, N ′′ ′-tetrakis- [4,6-bis- [butyl- (N-methyl-2,2 , 6,6-tetramethylpiperidin-4-yl) amino] -triazin-2-yl] -4,7-diazadecane-1,10-diamine, dibutylamine and 1,3,5-triazine-N, N ′ -Polycondensation of bis (2,2,6,6-tetramethyl-4-piperidyl) -1,6-hexamethylenediamine with N- (2,2,6,6-tetramethyl-4-piperidyl) butylamine Polycondensate of dibutylamine, 1,3,5-triazine and N, N'-bis (2,2,6,6-tetramethyl-4-piperidyl) butylamine, poly [ ⁇ (1,1, 3,3-tetramethylbutyl)
- Mn molecular weight of 2,000 to 5,000 is preferred.
- the materials of the above-mentioned types of hindered amine antioxidant groups are commercially available from Ciba Japan, for example, under the trade names “TINUVIN 144” and “TINUVIN 770”, and from ADEKA, Inc., “ADK STAB LA-52”.
- hindered phenol antioxidant group examples include n-octadecyl 3- (3,5-di-tert-butyl-4-hydroxyphenyl) -propionate, n-octadecyl 3- (3,5-di- t-butyl-4-hydroxyphenyl) -acetate, n-octadecyl 3,5-di-t-butyl-4-hydroxybenzoate, n-hexyl 3,5-di-t-butyl-4-hydroxyphenylbenzoate, n -Dodecyl 3,5-di-t-butyl-4-hydroxyphenylbenzoate, neo-dodecyl 3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate, dodecyl ⁇ (3,5-di- t-butyl-4-hydroxyphenyl) propionate, ethyl ⁇ - (4-hydroxy-3,5-di-di
- phosphorus antioxidant groups include triphenyl phosphite, diphenylisodecyl phosphite, phenyl diisodecyl phosphite, tris (nonylphenyl) phosphite, tris (dinonylphenyl) phosphite, tris (2,4 -Di-t-butylphenyl) phosphite, 10- (3,5-di-t-butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 6- [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-tert-butyldibenz [d, f] [1,3,2] di Monophosphite antioxidant groups such as oxaphosphepine and tridecyl phosphite;
- the phosphorous antioxidant group of the above type is, for example, from Sumitomo Chemical Co., Ltd. “Sumizer GP”, from ADEKA Co., Ltd. “ADK STAB PEP-24G”, “ADK STAB PEP-36” and “ADK STAB 3010”, Ciba -Commercially available under the trade name "IRGAFOS P-EPQ” from Japan Co., Ltd. and "GSY-P101” from Sakai Chemical Industry Co., Ltd.
- the content of the antioxidant group in the protective layer is preferably 0.1% by mass or more and 60% by mass or less, preferably 0.5% by mass or more, 40% by mass in 100% by mass of the composition in the protective layer. More preferably, it is more preferably 5% by mass or more and 20% by mass or less.
- the ratio of the antioxidant group and the ratio of the whole UV-absorbing group are substantially equal.
- the ratio of the antioxidant group and the entire ultraviolet absorbing group is preferably 30 to 70 to 70 to 30 in terms of mass% from the viewpoint of ultraviolet resistance, and more preferably 40 to 60 to 60 to 40. It is to be.
- the protective layer of the present invention may have other groups.
- Additives include organic ultraviolet absorbers such as benzotriazole, benzophenone, triazine, and indole, and inorganic ultraviolet absorbers such as zinc oxide; sterically hindered piperidine compounds (for example, manufactured by Ciba Specialty Chemicals) Additive type UV stabilizers such as "TINUVIN (registered trademark) 123", “TINUVIN 144", “TINUVIN 765", etc.); leveling agents, antioxidants, fillers such as talc, rust preventives, fluorescent whitening agents, Antioxidants, surfactants, antistatic agents such as lithium and organic boron, pigments, dyes, thickeners, colloidal silica, alumina sol and other inorganic fine particles, and polymethylmethacrylate acrylic fine particles Additives common in the field can be mentioned. When these additives are used, they are used so that the content of the resin having an ultraviolet absorbing group of the present invention is 50% by mass or more, more preferably 80% by mass or more, and further preferably 90% by
- the protective layer of the present invention is a resin having a benzotriazole-based ultraviolet absorbing group or a triazine-based ultraviolet absorbing group, a sufficient effect can be obtained, but further, other compounds such as solvents, additives, and resins. Needless to say, it may also be configured to include.
- each compound may be polymerized and added according to the use and required characteristics. Various conventional polymerization methods may be used for the polymerization.
- the hard coat layer is provided for the purpose of adding, to the film mirror, scratch resistance that prevents the surface of the film mirror from being scratched, antifouling property that prevents adhesion of dirt, and the like. Since the film mirror has a hard coat layer and a protective layer, the layers below the protective layer such as the silver reflective layer and the resin film support are protected from the external environment such as ultraviolet rays, dust, and water droplets. It can contribute to life extension. Since film mirrors for sunlight reflection are often used mainly in deserts, it is preferable that they have resistance to various external factors such as ultraviolet rays, heat, wind and rain, and sandstorms.
- the hard coat layer can reduce the corrosion of the metal used in the silver reflection layer due to oxygen, water vapor, hydrogen sulfide, etc., deterioration of the resin film support due to ultraviolet rays, discoloration of the film mirror, and film peeling. .
- the hard coat layer can reduce scratches on the surface of the film mirror caused by washing away dirt adhering to the film mirror with a brush or the like, and as a result, a reduction in reflection efficiency can also be prevented.
- the position of the hard coat layer is preferably provided on either the outermost surface layer on the sunlight incident side of the film mirror, the second layer, or the third layer. Another thin layer (preferably a thickness of 1 ⁇ m or less) may be provided on the hard coat layer.
- the thickness of a hard-coat layer is 0.05 micrometer or more and 10 micrometers or less, More preferably, they are 1 micrometer or more and 4 micrometers or less, More preferably, they are 1.5 micrometers or more and 3 micrometers or less.
- the thickness of the hard coat layer is 0.05 ⁇ m or more, sufficient scratch resistance can be obtained.
- the thickness of the hard coat layer is 10 ⁇ m or less, it is possible to prevent the hard coat layer from being cracked due to excessive stress.
- the electrical resistance value is low, that is, the thickness is 10 ⁇ m or less.
- the scratch resistance of the hard coat layer is preferably 30 or less in a steel wool test with a pencil hardness of H or more and less than 6H and a weight of 500 g / cm 2 .
- the pencil hardness is evaluated based on the pencil hardness test JIS-K5400.
- the pencil hardness of each sample at 45 ° inclination and 1 kg load is evaluated.
- the electric resistance value of the outermost surface of the film mirror is 1.0 ⁇ 10 ⁇ 3 to 1.0 ⁇ 10 12 ⁇ ⁇ ⁇ . More preferably, it is 3.0 ⁇ 10 9 to 2.0 ⁇ 10 11 ⁇ ⁇ ⁇ .
- the surface electrical resistance value is measured according to the standard of JIS K 7194 using Hiresta manufactured by Mitsubishi Chemical Corporation. However, after leaving the sample in an environment with a humidity of 50% and a temperature of 50 ° C. for 2 hours or more, placing the sample on a conductive metal plate, applying a voltage of 500 V, and measuring the surface electricity of the sample 30 seconds after the start of measurement. The resistance value is measured using a probe.
- the falling angle of the hard coat layer is larger than 0 ° and not larger than 30 ° because water droplets adhering to the surface of the film mirror easily fall off due to rain or condensation.
- the falling angle refers to a value obtained by dropping a water drop on a horizontal mirror and then gradually increasing the tilt angle of the mirror to measure the minimum angle at which a predetermined weight of water drop falls. Say. It can be said that the smaller the tumbling angle, the easier the water droplets to roll off the surface, and the surface to which the water droplets hardly adhere.
- steel wool (# 0000) was attached as a wear material to a reciprocating wear tester (HEIDON-14DR manufactured by Shinto Kagaku Co., Ltd.), and each water repellency and antifouling property was applied under a load of 500 g / cm 2 .
- This test evaluates the number of scratches by reciprocating the surface of the article 10 times at a speed of 10 mm / sec.
- the sliding angle was measured by attaching a sliding method kit DM-SA01 to a contact angle meter DM501 (Kyowa Interface Chemistry), dripping 50 ⁇ l of water, tilting the support from a horizontal state at a speed of 0.5 ° / second, The angle at which the rolls down is measured as the fall angle.
- a smaller rolling angle is preferable because water droplets can be easily dropped and have excellent antifouling properties.
- the material of the hard coat layer is preferably one that can provide transparency, weather resistance, scratch resistance, and antifouling properties.
- the hard coat layer can be composed of an acrylic resin, urethane resin, melamine resin, epoxy resin, organic silicate compound, silicone resin, or the like.
- silicone resins and acrylic resins are preferable.
- those made of an active energy ray-curable acrylic resin or a thermosetting acrylic resin are preferable.
- the active energy ray-curable acrylic resin or thermosetting acrylic resin is a composition containing a polyfunctional acrylate, an acrylic oligomer, or a reactive diluent as a polymerization curing component.
- Acrylic oligomers include polyester acrylates, urethane acrylates, epoxy acrylates, polyether acrylates, etc., including those in which a reactive acrylic group is bonded to an acrylic resin skeleton, and rigid materials such as melamine and isocyanuric acid. A structure in which an acrylic group is bonded to a simple skeleton can also be used.
- the reactive diluent has a function of a solvent in the coating process as a medium of the coating agent, and has a group that itself reacts with a monofunctional or polyfunctional acrylic oligomer. It becomes a copolymerization component.
- polyfunctional acrylic cured paints include Mitsubishi Rayon Co., Ltd. (trade name “Diabeam (registered trademark)” series, etc.), Nagase Sangyo Co., Ltd. (trade name “Denacol (registered trademark)” series, etc. ), Shin-Nakamura Co., Ltd. (trade name “NK Ester” series, etc.), Dainippon Ink Chemical Industries, Ltd.
- thermosetting resin composed of a partially hydrolyzed oligomer of an alkoxysilane compound, a heat A hard coat made of a curable polysiloxane resin, an ultraviolet curable acrylic hard coat made of an acrylic compound having an unsaturated group, and a thermosetting inorganic material are preferable.
- materials that can be used for the hard coat layer an aqueous colloidal silica-containing acrylic resin (Japanese Patent Laid-Open No. 2005-66824), a polyurethane-based resin composition (Japanese Patent Laid-Open No.
- Resin film used Japanese Patent Laid-Open No. 2004-142161
- photocatalytic oxide-containing silica film such as titanium oxide or alumina
- photocatalytic film such as titanium oxide or niobium oxide having a high aspect ratio
- Examples thereof include a photocatalyst-containing fluororesin coating (Pyrex Technologies), an organic / inorganic polysilazane film, and a film using a hydrophilization accelerator (AZ Electronics) on organic / inorganic polysilazane.
- AZ Electronics hydrophilization accelerator
- thermosetting silicone hard coat layer a partially hydrolyzed oligomer of an alkoxysilane compound synthesized by a known method can be used.
- An example of the synthesis method is as follows. First, tetramethoxysilane or tetraethoxysilane is used as an alkoxysilane compound, and a predetermined amount of water is added to the alkoxysilane compound in the presence of an acid catalyst such as hydrochloric acid or nitric acid to remove by-produced alcohol from room temperature to 80 ° C. React with.
- an acid catalyst such as hydrochloric acid or nitric acid
- the alkoxysilane is hydrolyzed, and further, a partially hydrolyzed oligomer of the alkoxysilane compound having an average polymerization degree of 4 to 8 having two or more silanol groups or alkoxy groups in one molecule is obtained by the condensation reaction.
- a curing catalyst such as acetic acid or maleic acid is added to this and dissolved in an alcohol or glycol ether organic solvent to obtain a thermosetting silicone hard coat liquid. And this is apply
- an acrylic compound having an unsaturated group such as pentaerythritol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethyloltetra
- a polyfunctional (meth) acrylate mixture such as (meth) acrylate can be used, and a photopolymerization initiator such as benzoin, benzoin methyl ether, or benzophenone is blended and used.
- a hard-coat layer is formed by apply
- the hard coat layer may be subjected to a surface treatment.
- a surface treatment examples thereof include corona treatment (Japanese Patent Laid-Open No. 11-172028), plasma surface treatment, ultraviolet / ozone treatment, surface protrusion formation (Japanese Patent Laid-Open No. 2009-226613), and surface fine processing.
- a method for producing the hard coat layer conventionally known coating methods such as a gravure coating method, a reverse coating method, and a die coating method can be used.
- the hard coat layer When the hard coat layer is made of an inorganic material, it can be formed, for example, by depositing silicon oxide, aluminum oxide, silicon nitride, aluminum nitride, lanthanum oxide, lanthanum nitride, or the like by a vacuum film forming method.
- the vacuum film forming method include a resistance heating vacuum deposition method, an electron beam heating vacuum deposition method, an ion plating method, an ion beam assisted vacuum deposition method, and a sputtering method.
- a hard-coat layer consists of an inorganic substance
- the hard coat precursor contains polysilazane
- R 17 , R 18 , and R 19 are the same or different and independently of each other, hydrogen, or an optionally substituted alkyl group, aryl group, vinyl group, or (trialkoxysilyl) )
- alkyl group preferably hydrogen, methyl, ethyl, propyl, iso-propyl, butyl, iso-butyl, tert-butyl, phenyl, vinyl or 3- (triethoxysilyl) propyl, 3- (trimethoxysilylpropyl)
- n is an integer
- n is determined so that the polysilazane has a number average molecular weight of 150 to 150,000 g / mol.
- catalysts preferably basic catalysts, in particular N, N-diethylethanolamine, N, N-dimethylethanolamine, triethanolamine, triethylamine, 3-morpholinopropylamine or N-heterocyclic compounds are used.
- the catalyst concentration is usually in the range of 0.1 to 10 mol%, preferably 0.5 to 7 mol%, based on polysilazane.
- a solution containing perhydropolysilazane in which all of R 17 , R 18 and R 19 in formula (3) are hydrogen atoms is used.
- the hard coat layer contains at least one polysilazane represented by the following general formula (4). -(SiR 20 R 21 -NR 22 ) n- (SiR 23 R 24 -NR 25 ) p- (4)
- R 20 , R 21 , R 22 , R 23 , R 24 and R 25 are independently of each other hydrogen, or an optionally substituted alkyl group, aryl group, vinyl group or ( Represents a trialkoxysilyl) alkyl group;
- n and p are integers, and in particular, n is determined so that polysilazane has a number average molecular weight of 150 to 150,000 g / mol.
- R 20 , R 22 and R 25 represent hydrogen and R 21 , R 23 and R 24 represent methyl.
- R 20 , R 22 , R 23 and R 25 represent hydrogen, and R 21 and R 24 represent methyl.
- the hard coat layer contains at least one polysilazane represented by the following general formula (5). -(SiR 26 R 27 -NR 28 ) n- (SiR 29 R 30 -NR 31 ) p- (SiR 32 R 33 -NR 34 ) q- (5)
- R 26 , R 27 , R 28 , R 29 , R 30 , R 31 , R 32 , R 33 and R 34 are independently of each other hydrogen or optionally substituted alkyl.
- n, p and q are integers, and in particular, n is determined so that polysilazane has a number average molecular weight of 150 to 150,000 g / mol.
- R 26 , R 28 and R 31 represent hydrogen
- R 27 , R 29 , R 30 and R 33 represent methyl
- R 34 represents (triethoxysilyl) propyl
- R 32 Is a compound representing alkyl or hydrogen.
- the proportion of polysilazane in the solvent is generally 1 to 80% by mass, preferably 5 to 50% by mass, and particularly preferably 10 to 40% by mass.
- water and a reactive group for example, a hydroxyl group or an amine group
- an organic system that is inert to polysilazane and preferably an aprotic solvent is particularly suitable.
- binders such as those conventionally used in the production of paints can be used.
- cellulose ethers and cellulose esters such as ethyl cellulose, nitrocellulose, cellulose acetate or cellulose acetobutyrate, natural resins such as rubber or rosin resins, or synthetic resins such as polymerized resins or condensed resins such as aminoplasts, in particular Urea resins and melamine formaldehyde resins, alkyd resins, acrylic resins, polyesters or modified polyesters, epoxides, polyisocyanates or blocked polyisocyanates, or polysiloxanes.
- an additive that affects the viscosity, wettability of the preparation, film forming property, lubricating action or exhaust property, or inorganic nanoparticles such as SiO 2 TiO 2 , ZnO, ZrO 2 or Al 2 O 3 can be used.
- the polysilazane hard coat layer thus formed can also be used as an oxygen / water vapor barrier film.
- the hard coat layer is a hard coat layer containing a polyfunctional acrylic monomer and a silicone resin.
- the polyfunctional acrylic monomer is hereinafter referred to as “A” component
- the silicone resin is hereinafter referred to as “B” component.
- the polyfunctional acrylic monomer “A” component preferably has an unsaturated group, particularly an active energy ray-reactive unsaturated group.
- the active energy ray referred to in the present specification preferably means an electron beam or an ultraviolet ray.
- a radical polymerization monomer is used, preferably a bifunctional or higher functional monomer having an ⁇ , ⁇ -unsaturated double bond in the molecule.
- a certain polyfunctional acrylate type or polyfunctional methacrylate type monomer may be mentioned.
- a vinyl monomer, an allyl monomer, or a monofunctional monomer may be included.
- the radical polymerization monomer can be used alone or in combination of two or more kinds of monomers in order to adjust the crosslinking density.
- the “A” component in addition to these relatively low molecular weight compounds, for example, so-called narrowly-defined monomers having a molecular weight of less than 1000, oligomers and prepolymers having a somewhat high molecular weight, for example, a weight average molecular weight of 1000 or more and less than 10,000 may be used. Is possible.
- monofunctional (meth) acrylate monomers include 2- (meth) acryloyloxyethyl phthalate, 2- (meth) acryloyloxyethyl-2-hydroxyethyl phthalate, and 2- (meth) acryloyloxyethyl.
- polyfunctional (meth) acrylate monomer examples include 1,3-butylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, bisphenol A di (meth) acrylate, bisphenol F di (meth) acrylate, diethylene glycol di (meth) acrylate, hexahydrophthalic acid di (meth) acrylate, neopentyl hydroxypivalate Glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, hydroxypivalate ester neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, di (meth) acrylate phthalate , Polyethylene glycol di (meth) acrylate
- Examples of such commercially available “A” component that is a polymerizable organic compound include Aronix M-400, M-408, M-450, M-305, M-309, M-manufactured by Toagosei Co., Ltd. 310, M-315, M-320, M-350, M-360, M-208, M-210, M-215, M-220, M-225, M-233, M-240, M-245, M-260, M-270, M-1100, M-1200, M-1210, M-1310, M-1600, M-221, M-203, TO-924, TO-1270, TO-1231, TO- 595, TO-756, TO-1343, TO-902, TO-904, TO-905, TO-1330, KAYARAD D-310, D-330, DPHA, DPCA-20, DP manufactured by Nippon Kayaku Co., Ltd.
- the content of the polymerizable organic compound “A” component is 10 to 90% by weight based on the total composition of “A” + “B” being 100% by weight from the viewpoint of improving antifouling properties and light resistance. It is preferably 15 to 80% by weight.
- the silicone resin “B” component is preferably a silicone resin having an active energy ray-reactive unsaturated group.
- the silicone resin contains a polyorganosiloxane, and is preferably a compound having a polyorganosiloxane chain having an active energy ray-curable unsaturated bond in the molecule.
- the monomer (a) having a radically polymerizable double bond and a polyorganosiloxane chain (1) to 50% by weight and a monomer other than (a) having a radically polymerizable double bond and a reactive functional group ( b) a polymer obtained by polymerizing a monomer containing 10 to 95% by weight and a monomer (c) having a radical polymerizable double bond other than (a) and (b) (c).
- Activity which is a vinyl copolymer having a number average molecular weight of 5000 to 100,000, which is obtained by reacting ( ⁇ ) with a functional group capable of reacting with the above-mentioned reactive functional group and a compound ( ⁇ ) having a radical polymerizable double bond It is preferable that it is an energy beam curable resin composition.
- the monomer (a) having a radical polymerizable double bond and a polyorganosiloxane chain include, for example, one end of Silaplane FM-0711, FM-0721, FM-0725 manufactured by Chisso Corporation.
- examples thereof include (meth) acryloxy group-containing polyorganosiloxane compounds, AC-SQ SI-20 manufactured by Toa Gosei Co., Ltd., POSS (Polyhydrate Oligomeric Silsesquioxane) series acrylate and methacrylate-containing compounds manufactured by Hybrid Plastics.
- the “B” component can be used alone or in combination of two or more depending on the required performance.
- the polymerization ratio is preferably 1 to 50% by weight, more preferably 10 to 35% by weight, based on the total weight of monomers constituting the polymer.
- the copolymerization ratio of the “B” component is less than 1% by weight, it becomes difficult to impart antifouling properties and weather resistance to the upper surface of the cured product, and when it exceeds 50% by weight, scratch resistance is obtained.
- An appropriate amount of polysiloxane can also be contained in the above components, and depending on the chemical structure and quantitative ratio of the “B” component, the durability can be improved by adding polysiloxane.
- This hard coat layer is preferably flexible and does not warp.
- the hard coat layer on the outermost surface layer of the film mirror may form a dense cross-linked structure, which may cause the film to bend or bend easily due to lack of flexibility, making handling difficult. Become. In such a case, it is preferable to design so as to obtain flexibility and flatness by adjusting the amount of the inorganic substance in the hard coat layer composition.
- the hard-coat layer may contain various additives, such as a ultraviolet absorber and antioxidant. Various additives are described in detail below.
- UV absorber> Although there is no restriction
- benzophenone ultraviolet absorber examples include 2,4-dihydroxy-benzophenone, 2-hydroxy-4-methoxy-benzophenone, 2-hydroxy-4-n-octoxy-benzophenone, 2-hydroxy-4-dodecyloxy-benzophenone, 2- Hydroxy-4-octadecyloxy-benzophenone, 2,2'-dihydroxy-4-methoxy-benzophenone, 2,2'-dihydroxy-4,4'-dimethoxy-benzophenone, 2,2 ', 4,4'-tetra And hydroxy-benzophenone.
- benzotriazole ultraviolet absorbers examples include 2- (2′-hydroxy-5-methylphenyl) benzotriazole, 2- (2′-hydroxy-3 ′, 5′-di-t-butylphenyl) benzotriazole 2- (2′-hydroxy-3′-t-butyl-5′-methylphenyl) benzotriazole, 2,2′-methylenebis [6- (2H-benzotriazol-2-yl) -4- (1, 1,3,3-tetramethylbutyl) phenol] (molecular weight 659; examples of commercial products are LA31 from ADEKA Corporation), 2- (2H-benzotriazol-2-yl) -4,6-bis (1- Methyl-1-phenylethyl) phenol (molecular weight 447.6; an example of a commercial product is TINUVIN234 from Ciba Specialty Chemicals) Etc., and the like.
- phenyl salicylate ultraviolet absorber examples include phenylsalicylate, 2-4-di-t-butylphenyl-3,5-di-t-butyl-4-hydroxybenzoate, and the like.
- hindered amine ultraviolet absorber examples include bis (2,2,6,6-tetramethylpiperidin-4-yl) sebacate.
- triazine ultraviolet absorbers examples include 2,4-diphenyl-6- (2-hydroxy-4-methoxyphenyl) -1,3,5-triazine, 2,4-diphenyl-6- (2-hydroxy-4-). Ethoxyphenyl) -1,3,5-triazine, 2,4-diphenyl- (2-hydroxy-4-propoxyphenyl) -1,3,5-triazine, 2,4-diphenyl- (2-hydroxy-4-) Butoxyphenyl) -1,3,5-triazine, 2,4-diphenyl-6- (2-hydroxy-4-butoxyphenyl) -1,3,5-triazine, 2,4-diphenyl-6- (2- Hydroxy-4-hexyloxyphenyl) -1,3,5-triazine, 2,4-diphenyl-6- (2-hydroxy-4-octyloxyphenyl) -1,3,5-tria 2,4-diphenyl-6- (2-hydroxy-4-dodecyloxy
- benzoate-based ultraviolet absorber examples include 2,4-di-tert-butylphenyl-3,5-di-tert-butyl-4-hydroxybenzoate (molecular weight 438.7; examples of commercially available products) Sumisorb 400) from Sumitomo Chemical Co., Ltd.
- the ultraviolet absorber a compound having a function of converting the energy held by ultraviolet rays into vibrational energy in the molecule and releasing the vibrational energy as heat energy or the like can be used. Furthermore, those that exhibit an effect when used in combination with an antioxidant or a colorant, or light stabilizers acting as a light energy conversion agent, called quenchers, can be used in combination.
- quenchers light stabilizers acting as a light energy conversion agent
- each of the above ultraviolet absorbers may be used in combination of two or more thereof as necessary.
- an ultraviolet absorber other than the above-described ultraviolet absorber for example, a salicylic acid derivative, a substituted acrylonitrile, a nickel complex, or the like can be contained.
- a preferred UV absorber in a hard coat layer containing a polyfunctional acrylic monomer and a silicone resin is a benzotriazole-based UV absorber.
- a benzotriazole-based ultraviolet absorber in the hard coat layer, it is possible to obtain an excellent effect that not only the weather resistance is further improved, but also the falling angle can be further reduced.
- a compound represented by the following general formula (6) is contained in the hard coat layer, the effect of lowering the sliding angle is remarkable.
- the amount of the UV absorber used in the hard coat layer is preferably 0.1 to 20% by mass in order to improve the weather resistance while maintaining good adhesion. More preferably, it is 0.25 to 15% by mass, and more preferably 0.5 to 10% by mass.
- antioxidant it is preferable to use organic antioxidants such as phenolic antioxidants, hindered amine antioxidants, thiol antioxidants, and phosphite antioxidants.
- the falling angle can also be reduced by including an organic antioxidant in the hard coat layer.
- An antioxidant and a light stabilizer may be used in combination.
- phenolic antioxidants examples include 1,1,3-tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, 2,2′-methylenebis (4-ethyl-6-t- Butylphenol), tetrakis- [methylene-3- (3 ′, 5′-di-t-butyl-4′-hydroxyphenyl) propionate] methane, 2,6-di-t-butyl-p-cresol, 4,4 '-Thiobis (3-methyl-6-t-butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 1,3,5-tris (3', 5'-di-t -Butyl-4'-hydroxybenzyl) -S-triazine-2,4,6- (1H, 3H, 5H) trione, stearyl- ⁇ - (3,5-di-t-butyl-4-hydroxyphenyl) propi , Triethylene glycol bis [3- (3-
- hindered amine light stabilizers include bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, Bis (1,2,2,6,6-pentamethyl-4-piperidyl) -2- (3,5-di-t-butyl-4-hydroxybenzyl) -2-n-butylmalonate, 1-methyl- 8- (1,2,2,6,6-pentamethyl-4-piperidyl) -sebacate, 1- [2- [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionyloxy] ethyl ] -4- [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionyloxy] -2,2,6,6-tetramethylpiperidine, 4-benzoyloxy-2,2,6, 6-Tetrame Lupiperidine, tetrakis (2,2,2,
- a hindered amine light stabilizer containing only a tertiary amine is preferable.
- bis (1,2,2,6,6-pentamethyl-4-piperidyl) is preferable.
- -Sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) -2- (3,5-di-t-butyl-4-hydroxybenzyl) -2-n-butyl malonate Alternatively, a condensate of 1,2,2,6,6-pentamethyl-4-piperidinol / tridecyl alcohol and 1,2,3,4-butanetetracarboxylic acid is preferable.
- thiol antioxidant examples include distearyl-3,3'-thiodipropionate, pentaerythritol-tetrakis ( ⁇ -lauryl-thiopropionate), and the like.
- phosphite antioxidant examples include tris (2,4-di-t-butylphenyl) phosphite, distearyl pentaerythritol diphosphite, di (2,6-di-t-butylphenyl) pentaerythritol.
- Diphosphite bis- (2,6-di-t-butyl-4-methylphenyl) -pentaerythritol diphosphite, tetrakis (2,4-di-t-butylphenyl) 4,4′-biphenylene-diphosphonite 2,2′-methylenebis (4,6-di-t-butylphenyl) octyl phosphite and the like.
- the above antioxidant and the following light stabilizer can be used in combination.
- a nickel-based UV stabilizer can also be used.
- the nickel-based UV stabilizer [2,2′-thiobis (4-tert-octylphenolate)]-2-ethylhexylamine nickel ( II), nickel complex-3,5-di-t-butyl-4-hydroxybenzyl phosphate monoethylate, nickel dibutyl dithiocarbamate, and the like.
- the hard coat layer particularly the hard coat layer containing a polyfunctional acrylic monomer and a silicone resin, preferably contains an initiator for initiating polymerization.
- an initiator a photopolymerization initiator of an active energy ray-curable resin such as ultraviolet rays is preferably used. Examples include benzoin and derivatives thereof, acetophenone, benzophenone, hydroxybenzophenone, Michler's ketone, ⁇ -amyloxime ester, thioxanthone, and the like.
- the above initiator can also be used as a photosensitizer.
- a sensitizer such as n-butylamine, triethylamine, tri-n-butylphosphine can be used.
- the initiator or photosensitizer is used in an amount of 0.1 to 15 parts by weight, preferably 1 to 10 parts by weight, more preferably 2 to 5 parts by weight, based on 100 parts by weight of the composition.
- Two types of initiators can be used in combination.
- the polymerization reaction of all the monomers may not be performed by the initiator.
- the initiator that absorbs longer wavelengths improves the reactivity, but the initiator may be colored during long-term use. Therefore, it is preferable to use radical initiators that absorb different wavelengths in order to improve the weather resistance and also the polymerization reactivity without coloring even during long-term use.
- additives In the hard coat layer, various additives can be further blended as necessary. For example, a surfactant, a leveling agent and an antistatic agent can be used.
- ⁇ Leveling agent is effective in reducing small irregularities on the surface.
- a dimethylpolysiloxane-polyoxyalkylene copolymer for example, SH190 manufactured by Toray Dow Corning Co., Ltd.
- SH190 manufactured by Toray Dow Corning Co., Ltd. is suitable as the silicone leveling agent.
- An antistatic agent is effective in improving the antifouling property of the film mirror.
- the electric resistance value on the surface of the film mirror can be reduced by making the hard coat layer conductive.
- the electrical resistance value of the film mirror surface is reduced and the antifouling property is improved. It is possible.
- the antistatic layer has a function of preventing the outermost layer on the sunlight incident side of the film mirror from being charged.
- Film mirrors have a resin film-like support compared to glass mirrors and the surface is often made of resin, so they are easily charged and easily attract dirt such as sand and dust. . Therefore, sand, dust, etc. adhere and it is mentioned as a problem that reflection efficiency falls.
- the presence of an antistatic layer in the layer closest to the outermost layer of the film mirror can suppress the charging of the surface of the film mirror, can suppress the adhesion of dirt such as sand and dust, This is preferable because high reflection efficiency can be maintained.
- the antistatic layer is preferably present through a very thin layer between the layer adjacent to the outermost layer of the film mirror or the outermost layer. Further, any other layer, for example, a protective layer, may also serve as the antistatic layer.
- an antistatic technique a method in which a conductive filler which is a conductive substance is dispersed and contained in an antistatic layer, a method using a conductive polymer, a method in which a metal compound is dispersed or coated on a surface, an organic sulfonic acid And an internal addition method using an anionic compound such as organic phosphoric acid, a method using a surface active type low molecular weight antistatic agent such as polyoxyethylene alkylamine, polyoxyethylene alkenylamine, and glycerin fatty acid ester, carbon There is a method of dispersing conductive fine particles such as black. In particular, it is preferable to use a method in which conductive fillers, which are conductive substances, are dispersed and contained.
- the electrical resistance value of the antistatic layer if the coating film resistance is largely divided in the first place, it can be divided into particle internal resistance and contact resistance.
- the internal resistance of the particles is affected by the amount of doping / oxygen defects of different metals and crystallinity.
- the contact resistance is affected by the particle diameter and shape, the dispersibility of the fine particles in the paint, and the conductivity of the binder resin. Since a film having a relatively high conductivity is considered to have a larger influence of contact resistance than internal resistance of the particle, it is important to form a conductive path by controlling the particle state.
- the antistatic layer has an antistatic property by containing a conductive filler.
- a conductive filler contained in the antistatic layer, there are conductive inorganic fine particles, among which metal fine particles, conductive inorganic oxide fine particles and the like can be used.
- conductive inorganic oxide fine particles can be preferably used.
- metal fine particles examples include fine particles of gold, silver, palladium, ruthenium, rhodium, osmium, iridium, tin, antimony, indium and the like.
- inorganic oxide fine particles examples include fine particles of indium antimony pentoxide, tin oxide, zinc oxide, ITO (indium tin oxide), ATO (antimony tin oxide), phosphorus-doped oxide, and the like.
- inorganic double oxide fine particles such as phosphorus-doped oxide are preferable because of their high conductivity and weather resistance.
- the primary particle diameter of the conductive filler is preferably 1 to 100 nm, particularly 1 to 50 nm, in order not to lower the transparency of the antistatic layer. Is preferred. In order to ensure conductivity, the particles must be close to each other to some extent, so that the particle diameter is preferably 1 nm or more. If the particle diameter exceeds 100 nm, light is reflected and the light transmittance is lowered, which is not preferable.
- the conductive inorganic oxide fine particles commercially available ones can be used. Specifically, Cellax series (manufactured by Nissan Chemical Industries, Ltd.), P-30, P-32, P-35, P- 45, P-120, P-130 (all manufactured by JGC Catalysts & Chemicals Co., Ltd.), T-1, S-1, S-2000, EP SP2 (all manufactured by Mitsubishi Materials Electronics Chemical Co., Ltd.) and the like can be used.
- an organic binder or an inorganic binder can be used as a binder for holding the conductive filler.
- a resin can be used, and examples thereof include acrylic resins, cycloolefin resins, and polycarbonate resins.
- a hard coat can be used as a binder, and an ultraviolet curable polyfunctional acrylic resin, urethane acrylate, epoxy acrylate, oxetane resin, polyfunctional oxetane resin, and the like can be used.
- the inorganic binder include inorganic oxide binders (may be inorganic oxide binders using a sol-gel method) and tetrafunctional inorganic binders.
- Preferable examples of the inorganic oxide binder include silicon dioxide, titanium oxide, aluminum oxide, strontium oxide and the like. Particularly preferred is silicon dioxide.
- Preferred examples of the tetrafunctional inorganic binder include polysilazane (for example, trade name: Aquamica (manufactured by AZ Electronics Co., Ltd.)), siloxane compounds (for example, Colcoat P (manufactured by Colcoat Co., Ltd.)), alkyl silicates and metal alcoholates. Mixing FJ803 (manufactured by GRANDEX), alumina sol (manufactured by Kawaken Fine Chemical Co., Ltd.), and the like can be used.
- a sol-gel solution containing tetraethoxysilane as a main raw material and added with a catalyst may be used.
- materials having both organic and inorganic properties include polyorganosiloxane and polysilazane. These materials can be said to be organic binders and inorganic binders.
- a mixture of an inorganic binder and an organic binder may be used as the binder for the antistatic layer, but the total amount of the binder is preferably an inorganic binder.
- the binder is an inorganic binder, it is desirable because it has weather resistance to ultraviolet rays and can maintain high reflectivity over a long period even when used outdoors.
- the adhesion between the antistatic layer and the hard coat layer is good when the binder of the antistatic layer is an inorganic binder.
- the binder of the antistatic layer is an inorganic binder.
- inorganic binders are more susceptible to cracking than organic binders, but by providing a hard coat layer as the upper layer of the antistatic layer, cracking prevention, chipping prevention and chipping scattering prevention effects can be obtained, and inorganic cracking is easy. Since a binder can be used without any problem, the film mirror preferably has two layers, an antistatic layer and a hard coat layer.
- the antistatic layer can be formed by a conventionally known coating method such as a gravure coating method, a reverse coating method, or a die coating method.
- the film thickness of an antistatic layer is 100 nm or more and 1 micrometer or less. If the film thickness of the antistatic layer is 1 ⁇ m or less, good light transmittance can be obtained.
- the antistatic layer preferably contains a conductive filler (conductive inorganic fine particles) in a proportion of 75% to 95%. If the content of the conductive filler is less than 75%, the conductivity cannot be secured. Moreover, if the content of the conductive filler exceeds 95%, the light transmittance is deteriorated.
- a conductive filler conductive inorganic fine particles
- the acrylic layer preferably has an ultraviolet absorbing ability. It is preferable that the resin of the layer adjacent to the acrylic layer is an acrylic resin because the adhesion with the layer is kept high. In addition, since the acrylic layer is more likely to be uneven than a resin such as polyethylene terephthalate, the surface roughness of the sunlight reflecting film mirror becomes rough due to the unevenness on the surface of the acrylic layer. Even when the roll-to-roll method for forming the film is used, sticking such as blocking when the film mirror is wound into a roll can be prevented. Since the acrylic layer is hard, plasticizer fine particles may be contained in order to obtain an acrylic layer that is soft and difficult to break. Preferable examples of the plasticizer fine particles include butyl rubber and butyl acrylate fine particles.
- the thickness of the acrylic layer is preferably from 20 to 150 ⁇ m because it can provide an incident light transmittance and an appropriate surface roughness to the film mirror. More preferably, it is 40 to 100 ⁇ m. Moreover, you may add a ultraviolet absorber and antioxidant to an acrylic layer.
- the acrylic layer is preferably composed of a methacrylic resin as a base resin.
- the methacrylic resin is a polymer mainly composed of a methacrylic acid ester, and may be a homopolymer of a methacrylic acid ester, or a methacrylic acid ester of 50% by weight or more and other monomers of 50% by weight or less. A copolymer may also be used.
- the methacrylic acid ester an alkyl ester of methacrylic acid is usually used.
- a particularly preferred methacrylic resin is polymethyl methacrylate resin (PMMA).
- the preferred monomer composition of the methacrylic resin is 50 to 100% by weight of methacrylic acid ester, 0 to 50% by weight of acrylic acid ester, and 0 to 49% by weight of other monomers based on the total monomers. More preferably, the methacrylic acid ester is 50 to 99.9% by weight, the acrylic acid ester is 0.1 to 50% by weight, and other monomers are 0 to 49% by weight.
- examples of the alkyl methacrylate include methyl methacrylate, ethyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate and the like, and the alkyl group usually has 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms. It is. Of these, methyl methacrylate is preferably used.
- alkyl acrylates include methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, and the like.
- the alkyl group usually has 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms. is there.
- the monomer other than alkyl methacrylate and alkyl acrylate may be a monofunctional monomer, that is, a compound having one polymerizable carbon-carbon double bond in the molecule, or a polyfunctional monofunctional monomer. Although it may be a monomer, that is, a compound having at least two polymerizable carbon-carbon double bonds in the molecule, a monofunctional monomer is preferably used.
- the monofunctional monomer include aromatic alkenyl compounds such as styrene, ⁇ -methylstyrene, and vinyl toluene, and alkenyl cyan compounds such as acrylonitrile and methacrylonitrile.
- polyfunctional monomers examples include polyunsaturated carboxylic acid esters of polyhydric alcohols such as ethylene glycol dimethacrylate, butanediol dimethacrylate, trimethylolpropane triacrylate, allyl acrylate, allyl methacrylate, and cinnamon.
- Alkenyl esters of unsaturated carboxylic acids such as allyl acid
- polyalkenyl esters of polybasic acids such as diallyl phthalate, diallyl maleate, triallyl cyanurate, triallyl isocyanurate
- aromatic polyalkenyl compounds such as divinylbenzene, etc.
- alkyl methacrylate alkyl methacrylate
- alkyl acrylate and monomers other than these, respectively, you may use those 2 or more types as needed.
- the glass transition temperature of the methacrylic resin is preferably 40 ° C. or higher, more preferably 60 ° C. or higher, from the viewpoint of heat resistance of the film mirror. This glass transition temperature can be appropriately set by adjusting the type of monomer and the ratio thereof.
- the methacrylic resin can be prepared by polymerizing the monomer component by a method such as suspension polymerization, emulsion polymerization or bulk polymerization. At that time, in order to obtain a suitable glass transition temperature or to obtain a viscosity showing a formability to a suitable film, it is preferable to use a chain transfer agent during the polymerization.
- the amount of the chain transfer agent may be appropriately determined according to the type of monomer and the ratio thereof.
- UV absorber added to the acrylic layer. Those described in UV absorber> can be used in the same manner.
- the amount of the ultraviolet absorber added to the acrylic layer is preferably 0.1 to 20% by mass, more preferably 1 to 15% by mass, and further preferably 3 to 10% by mass.
- the addition amount of the UV absorber to the acrylic layer is 0.17 to 2.28 g / m 2 per unit area of the film, more preferably 0.4 to 2.2. 28 g / m 2 or more.
- antioxidant added to the acrylic layer including the description of the light stabilizer, ⁇ 2-2-3 (b). Those described in ⁇ Antioxidant> can be used in the same manner. By adding an antioxidant, it is possible to prevent deterioration of the acrylic layer during melt film formation. Moreover, it can also prevent that an acrylic layer deteriorates because an antioxidant capture
- Adhesive layer is not particularly limited as long as it has a function of improving the adhesion between the layers. Adhesion or adhesion may be used. Preferably, it is a layer that adheres the protective layer or the acrylic layer to the acrylic layer, the resin coat layer, or the silver reflective layer. Adhesive layer has adhesion to adhere the layers, heat resistance that can withstand heat when the silver reflective layer is formed by vacuum deposition, etc., and smoothness to bring out the high reflective performance inherent to the silver reflective layer. It is preferable to have it.
- the adhesive layer may consist of only one layer or may consist of a plurality of layers.
- the thickness of the adhesive layer is preferably 1 to 10 ⁇ m, more preferably 3 to 8 ⁇ m, from the viewpoints of adhesion, smoothness, reflectance of the reflecting material, and the like.
- the resin is not particularly limited as long as it satisfies the above conditions of adhesion, heat resistance, and smoothness
- polyester resin, urethane resin, acrylic resin, melamine Resin, epoxy resin, polyamide resin, vinyl chloride resin, vinyl chloride vinyl acetate copolymer resin, etc. can be used singly or as a mixed resin.
- polyester resin and melamine resin or polyester resin can be used.
- a mixed resin of a resin and a urethane-based resin is preferable, and a thermosetting resin in which a curing agent such as isocyanate is mixed such that an isocyanate is mixed with an acrylic resin is more preferable.
- a method for forming the adhesive layer conventionally known coating methods such as a gravure coating method, a reverse coating method, and a die coating method can be used.
- the adhesive layer is a metal oxide
- it can be formed by various vacuum film forming methods such as silicon oxide, aluminum oxide, silicon nitride, aluminum nitride, lanthanum oxide, and lanthanum nitride.
- various vacuum film forming methods such as silicon oxide, aluminum oxide, silicon nitride, aluminum nitride, lanthanum oxide, and lanthanum nitride.
- an acrylic layer or a protective layer may be formed by coating, etc., but in that case, the coating solution may penetrate into other layers and approach the silver reflective layer.
- the possibility that the radicals generated when the ultraviolet rays hit the coating solution of the protective layer reaches the silver of the silver reflecting layer and aggregates increases.
- the resin of the protective layer since the resin of the protective layer has a UV-absorbing group, it can have a larger amount of UV-absorbing groups than when a UV absorber is added, and thus has a high UV resistance. Since generation of radicals from the coating liquid for the protective layer can be suppressed, the above-mentioned problem is less likely to occur.
- the protective layer has an antioxidant group
- radicals generated from the resin of the protective layer and acrylic layer and radicals generated from other than the resin can be inactivated, further preventing the silver reflection layer from aggregating. This is preferable because it is possible.
- the absence of the adhesive layer makes it possible to make the film mirror thinner. Also, if there is no adhesive layer between the silver reflective layer and the protective layer, the distance between the silver reflective layer and the acrylic layer, protective layer, etc.
- the acrylic layer or protective layer resin or its resin Decomposition of the ultraviolet absorbing group possessed by the ultraviolet ray, and the radicals generated along with it are more likely to approach the silver reflective layer, but the protective layer resin has an ultraviolet absorbing group, so Ultraviolet rays can be provided, and radical generation can be suppressed over a long period of time.
- the protective layer has an antioxidant group, radicals generated from the resin of the protective layer and the acrylic layer and radicals generated from other than the resin can be inactivated. Needless to say, since aggregation can be prevented.
- Gas barrier layer> You may provide a gas barrier layer in the sunlight incident side rather than a silver reflection layer.
- a gas barrier layer is preferably provided between the protective layer or the acrylic layer and the silver reflective layer. Furthermore, it is preferable to provide a gas barrier layer between the adhesive layer and the resin coat layer.
- the gas barrier layer is intended to prevent the deterioration of the humidity, especially the resin film-like support and the constituent layers supported by the resin film-like support due to high humidity, but it has special functions and applications. As long as it has the function of preventing deterioration, a gas barrier layer of various modes can be provided.
- the water vapor permeability at 40 ° C. and 90% RH is preferably 1 g / m 2 ⁇ day or less, more preferably 0.5 g / m 2 ⁇ day or less, still more preferably 0. .2 g / m 2 ⁇ day or less.
- the oxygen permeability of the gas barrier layer is preferably 0.6 ml / m 2 / day / atm or less under the conditions of a measurement temperature of 23 ° C. and a humidity of 90% RH.
- the gas barrier layer may consist of only one layer or a plurality of layers.
- the thickness of the gas barrier layer is preferably 10 to 500 nm, more preferably 50 to 200 nm.
- Examples of the method for forming the gas barrier layer include a method of forming an inorganic oxide by a method such as vacuum vapor deposition, sputtering, ion beam assist, chemical vapor deposition, and the like.
- An inorganic oxide precursor by a sol-gel method is used.
- a method of forming an inorganic oxide film by applying heat treatment and / or ultraviolet irradiation treatment to the coating film after coating is also preferably used.
- the inorganic oxide is formed by local heating from a sol using an organometallic compound as a raw material.
- an organometallic compound for example, silicon (Si), aluminum (Al), zirconium (Zr), titanium (Ti), tantalum (Ta), zinc (Zn), barium (Ba), indium (In) contained in the organometallic compound,
- An oxide of an element such as tin (Sn) or niobium (Nb), for example, silicon oxide, aluminum oxide, zirconium oxide, or the like. Of these, silicon oxide is preferable.
- the inorganic oxide As a method for forming the inorganic oxide, it is preferable to use a so-called sol-gel method or a polysilazane method.
- the sol-gel method is a method of forming an inorganic oxide from an organometallic compound that is a precursor of an inorganic oxide
- the polysilazane method is a method of forming an inorganic oxide from a polysilazane that is a precursor of an inorganic oxide.
- the gas barrier layer can be formed by applying a general heating method after applying a precursor that forms an inorganic oxide by heating, but is preferably formed by local heating.
- This precursor is preferably a sol-shaped organometallic compound or polysilazane.
- Organometallic compound preferably contains at least one element of silicon, aluminum, lithium, zirconium, titanium, tantalum, zinc, barium, indium, tin, lanthanum, yttrium, and niobium.
- the organometallic compound preferably contains at least one element of silicon, aluminum, lithium, zirconium, titanium, zinc, and barium.
- the organometallic compound is not particularly limited as long as it can be hydrolyzed, and preferred organometallic compounds include metal alkoxides.
- This metal alkoxide is represented by the following general formula (8).
- M represents a metal having an oxidation number n.
- R 35 and R 36 each independently represents an alkyl group.
- m represents an integer of 0 to (n ⁇ 1).
- R 35 and R 36 may be the same or different.
- an alkyl group having 4 or less carbon atoms is preferable.
- a methyl group CH 3 (hereinafter sometimes represented by Me), an ethyl group C 2 H 5 (hereinafter represented by Et), Propyl group C 3 H 7 (hereinafter also referred to as Pr), isopropyl group i-C 3 H 7 (hereinafter also referred to as i-Pr), butyl group C 4 H 9 (hereinafter referred to as Bu)
- a lower alkyl group such as an isobutyl group i-C 4 H 9 (hereinafter also referred to as i-Bu).
- Examples of the metal alkoxide represented by the above formula (8) include lithium ethoxide LiOEt, niobium ethoxide Nb (OEt) 5 , magnesium isopropoxide Mg (OPr-i) 2 , and aluminum isopropoxide Al.
- the “sol-gel method” is to obtain a hydroxide sol by hydrolyzing an organometallic compound, etc., dehydrate it into a gel, and further heat-treat the gel. It refers to a method for preparing a metal oxide glass having a certain shape (film, particle, fiber, etc.).
- a multi-component metal oxide glass can be obtained by a method of mixing a plurality of different sol solutions, a method of adding other metal ions, or the like. Specifically, it is preferable to produce an inorganic oxide by a sol-gel method having the following steps.
- the organometallic compound in a reaction solution containing at least water and an organic solvent, is hydrolyzed and dehydrated and condensed while adjusting the pH to 4.5 to 5.0 using a halogen ion as a catalyst in the presence of boron ion.
- Generation of micropores due to high-temperature heat treatment is produced by a sol-gel method having a step of obtaining a reaction product by heating and vitrifying the reaction product at a temperature of 200 ° C. or less. And is particularly preferable from the viewpoint that no deterioration of the film occurs.
- the organometallic compound used as a raw material is not particularly limited as long as it can be hydrolyzed, and preferred organometallic compounds include the metal alkoxides described above. It is done.
- the above-described organometallic compound may be used for the reaction as it is, but it is preferably diluted with a solvent for easy control of the reaction.
- the dilution solvent may be any solvent that can dissolve the organometallic compound and can be uniformly mixed with water.
- Preferred examples of such a solvent for dilution include aliphatic lower alcohols such as methanol, ethanol, propanol, isopropanol, butanol, isobutanol, ethylene glycol, propylene glycol, and mixtures thereof.
- a mixed solvent of butanol, cellosolve, and butyl cellosolve or a mixed solvent of xylol, cellosolve acetate, methyl isobutyl ketone, and cyclohexane may be used.
- the metal when the metal is calcium, magnesium, aluminum, etc., it reacts with water in the reaction solution to form a hydroxide, or when carbonate ion CO 3 2- is present, a carbonate is formed. Therefore, it is preferable to add an alcohol solution of triethanolamine as a masking agent to the reaction solution.
- the concentration of the organometallic compound when mixed and dissolved in the solvent is preferably 70% by mass or less, and more preferably diluted to a range of 5 to 70% by mass.
- the reaction solution used in the sol-gel method contains at least water and an organic solvent.
- the organic solvent is not particularly limited as long as it can form a uniform solution with water, acid, and alkali.
- the same aliphatic aliphatic alcohols used for diluting the organometallic compound are preferably used.
- aliphatic lower alcohols propanol, isopropanol, butanol, and isobutanol having a larger number of carbon atoms are preferable to methanol and ethanol. This is because the growth of the metal oxide glass film to be generated is stable.
- the ratio of water is preferably in the range of 0.2 to 50 mol / L as the concentration of water.
- an organometallic compound is hydrolyzed in a reaction solution in the presence of boron ions using a halogen ion as a catalyst.
- Preferred examples of the compound that gives boron ion B 3+ include trialkoxyborane B (OR) 3 . Among these, triethoxyborane B (OEt) 3 is more preferable.
- the B 3+ ion concentration in the reaction solution is preferably in the range of 1.0 to 10.0 mol / L.
- a fluorine ion and / or a chlorine ion are mentioned suitably. That is, fluorine ions alone, chlorine ions alone or a mixture thereof may be used. Examples of the compound used, as long as it produces fluoride ions and / or chloride ions in the reaction mixture as described above, for example, as a source of fluoride ions, ammonium bifluoride NH 4 HF ⁇ HF, sodium fluoride NaF etc. Preferred Preferred examples of the chlorine ion source include ammonium chloride NH 4 Cl.
- the concentration of halogen ions in the reaction solution varies depending on the film thickness of the inorganic composition having the inorganic matrix to be produced and other conditions. A range of 0.001 to 2 mol / kg, particularly 0.002 to 0.3 mol / kg is preferable with respect to the total mass. If the halogen ion concentration is lower than 0.001 mol / kg, hydrolysis of the organometallic compound does not proceed sufficiently, and film formation becomes difficult. Moreover, since the produced
- boron used during the reaction, if to be contained as a B 2 O 3 component in the design the composition of the resulting inorganic matrix, by leaving product was added calculated amount of organic boron compound in accordance with the content of
- boron can be removed by evaporation as boron methyl ester by heating after film formation in the presence of methanol as a solvent or by immersing in methanol.
- a main agent solution in which a predetermined amount of an organometallic compound is usually mixed and dissolved in a mixed solvent containing a predetermined amount of water and an organic solvent, and After mixing a predetermined amount of a reaction solution containing a predetermined amount of halogen ions at a predetermined ratio and stirring sufficiently to obtain a uniform reaction solution, the pH of the reaction solution is adjusted to a desired value with an acid or alkali, The reaction product is obtained by aging for several hours. A predetermined amount of the boron compound is previously mixed and dissolved in the main agent solution or reaction solution. Further, when alkoxyborane is used, it is advantageous to dissolve it in the main agent solution together with other organometallic compounds.
- the pH of the reaction solution is selected according to the purpose, and when the purpose is to form a film made of an inorganic composition having an inorganic matrix (metal oxide glass), the pH is adjusted to 4.5 using an acid such as hydrochloric acid. It is preferable to ripen by adjusting to the range of ⁇ 5. In this case, for example, it is convenient to use a mixture of methyl red and bromocresol green as an indicator.
- the main component solution and the reaction solution including B 3+ and halogen ions having the same concentration and the same components are added in sequence at the same ratio while being adjusted to a predetermined pH.
- the reaction product can also be produced continuously.
- the concentration of the reaction solution is in the range of ⁇ 50% by mass
- the concentration of water (including acid or alkali) is in the range of ⁇ 30% by mass
- the concentration of the halogen ion is in the range of ⁇ 30% by mass.
- reaction product reaction solution after aging
- reaction solution after aging reaction solution after aging
- the temperature is raised gradually while paying particular attention to a temperature range of 50 to 70 ° C., followed by a preliminary drying (solvent volatilization) step and further raising the temperature.
- This drying is important for forming a non-porous film in the case of film formation.
- the temperature for heating and drying after the preliminary drying step is preferably 70 to 150 ° C, more preferably 80 to 130 ° C.
- the resin coat layer is preferably provided between the acrylic layer and the silver reflective layer.
- a corrosion inhibitor is preferably added so that the resin coat layer prevents corrosion of the silver reflective layer.
- the resin coat layer may have an ultraviolet absorbing ability.
- the resin coat layer may consist of only one layer or a plurality of layers.
- the thickness of the resin coat layer is preferably 0.1 to 10 ⁇ m, more preferably 2 to 8 ⁇ m.
- the binder of the resin coat layer for example, the following resins can be preferably used.
- Corrosion inhibitor As a corrosion inhibitor, it is preferable to have an adsorptive group for a metal which is a main constituent material of the silver reflective layer.
- corrosion refers to a phenomenon in which a metal is chemically or electrochemically eroded or deteriorated in material by an environmental substance surrounding it (see JIS Z0103-2004).
- the optimum amount of the corrosion inhibitor to be added varies depending on the compound to be used, but generally it is preferably within the range of 0.1 to 1.0 / m 2 .
- Corrosion inhibitors having an adsorptive group for metals include amines and derivatives thereof, compounds having a pyrrole ring, compounds having a triazole ring such as benzotriazole, compounds having a pyrazole ring, compounds having a thiazole ring, and having an imidazole ring It is desirable to be selected from a compound, a compound having an indazole ring, a copper chelate compound, a thiourea, a compound having a mercapto group, a naphthalene-based compound, or a mixture thereof.
- the ultraviolet absorber may also serve as a corrosion inhibitor. It is also possible to use a silicone-modified resin. It does not specifically limit as a silicone modified resin.
- amines and derivatives thereof include ethylamine, laurylamine, tri-n-butylamine, O-toluidine, diphenylamine, ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, monoethanolamine, diethanolamine, triethanolamine, 2N- Dimethylethanolamine, 2-amino-2-methyl-1,3-propanediol, acetamide, acrylamide, benzamide, p-ethoxychrysoidine, dicyclohexylammonium nitrite, dicyclohexylammonium salicylate, monoethanolamine benzoate, dicyclohexylammonium benzoate, diisopropyl Ammonium benzoate, diisopropylammonium nitrite , Cyclohexylamine carbamate, nitronaphthalene nitrite, cyclohexylamine benzoate, dicyclohexylamine
- Examples of the compound having a pyrrole ring include N-butyl-2,5-dimethylpyrrole, N-phenyl-2,5dimethylpyrrole, N-phenyl-3-formyl-2,5-dimethylpyrrole, N-phenyl-3, 4-diformyl-2,5-dimethylpyrrole, etc., or a mixture thereof.
- Examples of the compound having a triazole ring include 1,2,3-triazole, 1,2,4-triazole, 3-mercapto-1,2,4-triazole, 3-hydroxy-1,2,4-triazole, 3- Methyl-1,2,4-triazole, 1-methyl-1,2,4-triazole, 1-methyl-3-mercapto-1,2,4-triazole, 4-methyl-1,2,3-triazole, Benzotriazole, tolyltriazole, 1-hydroxybenzotriazole, 4,5,6,7-tetrahydrotriazole, 3-amino-1,2,4-triazole, 3-amino-5-methyl-1,2,4- Triazole, carboxybenzotriazole, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2′-hydroxy) -5'-tert-butylphenyl) benzotriazole, 2- (2'-hydroxy3'5'-di-tert-butylphenyl) benzotriazole, 2-
- Examples of the compound having a pyrazole ring include pyrazole, pyrazoline, pyrazolone, pyrazolidine, pyrazolidone, 3,5-dimethylpyrazole, 3-methyl-5-hydroxypyrazole, 4-aminopyrazole, and a mixture thereof.
- Examples of the compound having a thiazole ring include thiazole, thiazoline, thiazolone, thiazolidine, thiazolidone, isothiazole, benzothiazole, 2-N, N-diethylthiobenzothiazole, P-dimethylaminobenzallodanine, 2-mercaptobenzothiazole, etc. Or a mixture thereof.
- Examples of the compound having an imidazole ring include imidazole, histidine, 2-heptadecylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methyl Imidazole, 2-phenyl-4-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecyl Imidazole, 2-phenyl-4-methyl-5-hydromethylimidazole, 2-phenyl-4,5 dihydroxymethylimidazole, 4-formylimidazole, 2-methyl-4-formylimidazole, 2-phenyl-4- Formylimidazole, 4-methyl-5-formylimidazole, 2-ethyl
- Examples of the compound having an indazole ring include 4-chloroindazole, 4-nitroindazole, 5-nitroindazole, 4-chloro-5-nitroindazole, and a mixture thereof.
- copper chelate compounds include acetylacetone copper, ethylenediamine copper, phthalocyanine copper, ethylenediaminetetraacetate copper, hydroxyquinoline copper, and the like, or a mixture thereof.
- thioureas examples include thiourea, guanylthiourea, and the like, or a mixture thereof.
- mercaptoacetic acid thiophenol, 1,2-ethanediol, 3-mercapto-1,2,4-triazole, 1-methyl-3-mercapto
- naphthalene-based compounds examples include thionalide.
- the silver reflection layer is a layer made of silver having a function of reflecting sunlight.
- the surface reflectance of the silver reflective layer is preferably 80% or more, more preferably 90% or more.
- the silver reflective layer may be on the sunlight incident side (front surface side) or on the opposite side (back surface side), but the resin base material prevents the resin base material from being deteriorated by the ultraviolet rays of sunlight. For the purpose, it is preferable to arrange on the sunlight incident side. Further, when the thickness of the layer between the silver reflection layer and the protective layer is 0 ⁇ m or more and 5 ⁇ m or less, the ultraviolet absorbing group of the resin is decomposed by ultraviolet rays, and the radicals generated thereby are converted into the silver reflection layer.
- the resin of the protective layer has a UV absorbing group, it can have high UV resistance and suppress the generation of radicals over a long period of time. Because it can, it does not matter.
- the film thickness of the layer between the protective layer and the silver reflective layer is 0 ⁇ m or more and 5 ⁇ m or less, it can contribute to the thin film mirror as a whole.
- attains a silver reflective layer that the total film thickness of the sunlight incident side outermost surface of the film mirror for sunlight reflection from the sunlight incident side surface of a silver reflective layer is 5 micrometers or more and 125 micrometers or less Since the thickness is as thin as 5 ⁇ m or more and 125 ⁇ m, the attenuation of the intensity due to the layer through which sunlight passes until it reaches the silver reflection layer is difficult. Naturally, after reflection by the silver reflection layer, it passes through the layer up to the surface of the film mirror again, so that if the film thickness is thin, intensity attenuation at that time hardly occurs. Furthermore, since the film mirror can be made thinner, the cost of the material can be reduced, the weight can be reduced, the transportation efficiency can be improved, and the number of manufacturing steps can be reduced.
- the thickness of the silver reflective layer is preferably 10 to 200 nm, more preferably 30 to 150 nm, from the viewpoint of reflectivity and the like. It is preferable that the thickness of the silver reflective layer is greater than 10 nm because the film thickness is sufficient and does not transmit light, and the reflectance in the visible light region of the film mirror can be sufficiently secured. Further, the reflectance increases in proportion to the film thickness up to about 200 nm, but it does not depend on the film thickness over 200 nm.
- the surface roughness Ra of the silver reflective layer is 0.01 ⁇ m or more and 0.1 ⁇ m or less, preferably 0.02 ⁇ m or more and 0.07 ⁇ m or less.
- a silver reflective layer is preferable for a film mirror because of its high reflectance and corrosion resistance, but two or more such silver layers may be formed. By doing so, the reflectance from the infrared region to the visible light region of the film mirror can be increased, and the dependency of the reflectance on the incident angle can be reduced. From the infrared region to the visible light region means a wavelength region of 2500 to 400 nm.
- the incident angle means an angle with respect to a line (normal line) perpendicular to the film surface.
- the wet method is a general term for a plating method, and is a method of forming a film by depositing a metal from a solution. Specific examples include silver mirror reaction.
- the dry method is a general term for a vacuum film forming method, and specifically includes a resistance heating vacuum deposition method, an electron beam heating vacuum deposition method, an ion plating method, an ion beam assisted vacuum deposition method, and a sputtering method. and so on.
- a vapor deposition method capable of a roll-to-roll method for continuously forming a film is preferably used in the present invention.
- the manufacturing method of the film mirror for sunlight reflection it is preferable that it is a manufacturing method which forms a silver reflection layer by vapor deposition.
- the silver reflective layer in addition to silver, from an elemental army consisting of aluminum, silver, chromium, nickel, titanium, magnesium, rhodium, platinum, palladium, tin, gallium, indium, bismuth and gold
- an elemental army consisting of aluminum, silver, chromium, nickel, titanium, magnesium, rhodium, platinum, palladium, tin, gallium, indium, bismuth and gold
- Two or more kinds of metals may be selected and used as an alloy.
- the silver reflective layer is a film made of a silver alloy
- 90 to 99.8 atoms of silver are included in the total (100 atomic%) of silver and other metals in the silver reflective layer.
- the other metal is preferably 0.2 to 10 atomic% from the viewpoint of durability.
- gold is particularly preferable from the viewpoint of high temperature humidity resistance and reflectance.
- Silver complex compound having a ligand that can be vaporized and desorbed> it may be formed by heating and baking a coating film containing a silver complex compound from which a ligand can be vaporized / desorbed, in addition to a dry method or a wet method. Good.
- “Silver complex compound having a ligand that can be vaporized / desorbed” has a ligand for stably dissolving silver in a solution, but the ligand is removed by removing the solvent and heating and firing. Is a silver complex compound that can be thermally decomposed into CO 2 or a low molecular weight amine compound, vaporized / desorbed, and only metallic silver remains.
- the silver complex compound is contained in the silver coating liquid composition, and a coating film containing the complex according to the present invention is formed on the support by coating this. That is, it is preferable to form a silver reflective layer by forming a coating film on a film using a silver complex compound and then baking the coating film at a temperature in the range of 80 to 250 ° C. More preferably, it is in the range of 100 to 220 ° C, particularly preferably in the range of 120 to 200 ° C. There is no restriction
- X 3 represents oxygen, sulfur, halogen, cyano, cyanate, carbonate, nitrate, nitrite, sulfate, phosphate, thiocyanate, chlorate, perchlorate, tetrafluoroborate, acetylacetonate,
- a substituent selected from carboxylate and derivatives thereof n is an integer of 1 to 4, and R 37 to R 42 are independently of each other hydrogen, C 1 -C 30 aliphatic Or an alicyclic alkyl group, an aryl group or an aralkyl group, an alkyl or aryl group substituted with a functional group, a heterocyclic compound group, a polymer compound and a derivative thereof.
- Specific examples of the general formula (9) include, for example, silver oxide, silver thiocyanate, silver sulfide, silver chloride, silver cyanide, silver cyanate, silver carbonate, silver nitrate, silver nitrite, silver sulfate, silver phosphate, perchlorine.
- Examples include, but are not limited to, acid silver, silver tetrafluoroborate, silver acetylacetonate, silver acetate, silver lactate, silver oxalate and derivatives thereof.
- R 37 to R 42 are specifically, for example, hydrogen, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, amyl, hexyl, ethylhexyl, heptyl, octyl, isooctyl , Nonyl, decyl, dodecyl, hexadecyl, octadecyl, docodecyl, cyclopropyl, cyclopentyl, cyclohexyl, aryl, hydroxy, methoxy, hydroxyethyl, methoxyethyl, 2-hydroxypropyl, methoxypropyl, cyanoethyl, ethoxy, butoxy, hexyloxy, methoxy Ethoxyethyl, methoxyethoxyethoxyethyl, hexamethyleneimine, morpholine
- Examples of compounds of the general formulas (10) to (12) include, for example, ammonium carbamate, ammonium carbonate, ammonium bicarbonate, ethylammonium ethylcarbamate, isopropylammonium isopropylcarbamate, n- Butyl ammonium n-butyl carbamate, isobutyl ammonium isobutyl carbamate, t-butyl ammonium t-butyl carbamate, 2-ethylhexyl ammonium 2-ethylhexyl carbamate, octadecyl ammonium octadecyl carbamate, 2-methoxyethyl ammonium 2-methoxyethyl carbamate 2-cyanoethylammonium 2-cyanoethylcarbamate, dibutylammonium dibutylcarbamate, dioctadecylammonium dioctadec
- ammonium carbamate or ammonium carbonate compound are not particularly limited.
- US Pat. No. 4,542,214 describes that ammonium carbamate compounds can be prepared from carbon dioxide and primary amines, secondary amines, tertiary amines, or at least one of these mixtures. When 0.5 mol of water is further added per 1 mol of the amine, an ammonium carbonate compound is obtained. When 1 mol or more of water is added, an ammonium bicarbonate compound can be obtained.
- alcohols such as water, methanol, ethanol, isopropanol, butanol, ethylene glycol, glycerin, etc.
- Glycols ethyl acetate, butyl acetate, acetates such as carbitol acetate, ethers such as diethyl ether, tetrahydrofuran, dioxane, ketones such as methyl ethyl ketone, acetone, hydrocarbons such as hexane, heptane, Examples include aromatics such as benzene and toluene, and halogen-substituted solvents such as chloroform, methylene chloride, and carbon tetrachloride, or mixed solvents thereof. Is carbon dioxide bubbled in the gas phase?
- any known method may be used for the production of the ammonium carbamate or ammonium carbonate derivative as long as the structure of the final substance is the same. That is, it is not necessary to specifically limit the solvent, reaction temperature, concentration or catalyst for production, and the production yield is not affected.
- An organic silver complex compound can be produced by reacting the ammonium carbamate or ammonium carbonate compound thus produced with a silver compound.
- a silver compound for example, at least one silver compound represented by the general formula (9), at least one ammonium carbamate or ammonium carbonate derivative represented by the general formulas (10) to (12), and a mixture thereof.
- alcohols such as water, methanol, ethanol, isopropanol, butanol, ethylene glycol, glycerin Glycols such as ethyl acetate, butyl acetate, acetates such as carbitol acetate, ethers such as diethyl ether, tetrahydrofuran and dioxane, ketones such as methyl ethyl ketone and acetone, hydrocarbons such as hexane and heptane , Benzene, true It can be aromatic such as, and chloroform and methylene chloride, and the like halogenated solvent or a mixed solvent such as carbon tetrachloride used.
- a solution in which a silver compound of the general formula (9) and one or more amine compounds are mixed is reacted with carbon dioxide to produce a silver complex.
- Compounds can also be produced.
- the reaction can be performed directly without using a solvent in a normal pressure or pressurized state of a nitrogen atmosphere, or can be performed using a solvent.
- any known method may be used as long as the structure of the final material is the same. That is, it is not necessary to specifically limit the solvent for the production, the reaction temperature, the concentration, the presence or absence of the catalyst, and the production yield is not affected.
- the silver complex compound has a production method described in JP-T-2008-530001, and is recognized by the structure of the following general formula (13).
- the silver coating liquid composition used for forming a highly reflective and highly glossy reflective surface contains the above-mentioned silver complex compound, and if necessary, a solvent, a stabilizer, a leveling agent, a thin film Adjuncts, reducing agents, and additives for thermal decomposition reaction accelerators can be contained in the silver coating composition. Additives such as adjuvants, reducing agents and thermal decomposition reaction accelerators can be contained in the silver coating composition of the present invention.
- examples of the stabilizer include amine compounds such as primary amines, secondary amines, and tertiary amines, ammonium carbamates, ammonium carbonates, ammonium bicarbonate compounds, phosphines, and phosphites. And a phosphorus compound such as phosphate, a sulfur compound such as thiol and sulfide, and at least one mixture thereof.
- amine compounds include, for example, methyl Amine, ethylamine, n-propylamine, isopropylamine, n-butylamine, isobutylamine, isoamylamine, n-hexylamine, 2-ethylhexylamine, n-heptylamine, n-o Tylamine, isooctylamine, nonylamine, decylamine, dodecylamine, hexadecylamine, octadecylamine, docodecylamine, cyclopropylamine, cyclopentylamine, cyclohexylamine, arylamine, hydroxyamine, ammonium hydroxide, methoxyamine, 2-ethanol Amine, methoxyethylamine, 2-hydroxypropylamine, 2-hydroxy-2-methylpropylamine, methoxypropylamine, cyanoethylamine, ethoxyamine, n-
- ammonium carbamate, carbonate, and bicarbonate compounds include ammonium carbamate, ammonium carbonate, ammonium bicarbonate, ethylammonium ethylcarbamate, isopropylammonium isopropylcarbamate, and n-butyl.
- R 43 3 P examples include a phosphorus compound represented by (RO) 3 P or (RO) 3 PO.
- R 43 represents an alkyl or aryl group having 1 to 20 carbon atoms, and specific examples thereof include tributyl phosphine, triphenyl phosphine, triethyl phosphite, triphenyl phosphite, dibenzyl phosphate, triethyl phosphate and the like. .
- sulfur compound examples include butanethiol, n-hexanethiol, diethyl sulfide, tetrahydrothiophene, aryl disulfide, 2-mercaptobenzoazole, tetrahydrothiophene, octylthioglycolate, and the like.
- the amount of such a stabilizer used is not particularly limited as long as it matches the ink characteristics of the present invention.
- the content is preferably 0.1% to 90% in terms of molar ratio with respect to the silver compound.
- examples of the thin film auxiliary agent include organic acids and organic acid derivatives, or at least one mixture thereof. Specifically, for example, acetic acid, butyric acid (valeric acid), valeric acid (pivalic acid), hexanoic acid, octanoic acid, 2-ethyl-hexanoic acid, neodecanoic acid, lauric acid ( Lauric acid), stearic acid, naphthalic acid, and the like.
- organic acid derivatives include ammonium acetate, ammonium citrate, ammonium laurate, ammonium lactate, and ammonium maleate.
- Organic acid ammonium salts such as ammonium oxalate and ammonium molybdate, gold, copper, zinc, nickel, cobalt, palladium, platinum, titanium, vanadium, manganese, iron, chromium, zirconium, niobium Manganese oxalate containing metals such as molybdenum, tungsten, ruthenium, cadmium, tantalum, rhenium, osmium, iridium, aluminum, gallium, germanium, indium, tin, antimony, lead, bismuth, samarium, europium, actinium, thorium, etc.
- metals such as molybdenum, tungsten, ruthenium, cadmium, tantalum, rhenium, osmium, iridium, aluminum, gallium, germanium, indium, tin, antimony, lead, bismuth, samarium, europium, actinium,
- organic acid metal salts such as gold acetate, palladium oxalate, silver 2-ethylhexanoate, silver octoate, silver neodecanoate, cobalt stearate, nickel naphthalate and cobalt naphthalate.
- the amount of the thin film auxiliary used is not particularly limited, but is preferably 0.1 to 25% in terms of molar ratio with respect to the silver complex compound.
- Examples of the reducing agent include Lewis acid or weak Bronsted acid, and specific examples include hydrazine, hydrazine monohydrate, acetohydrazide, sodium borohydride or potassium borohydride, dimethylamine borane, Amine compounds such as butylamine borane, metal salts such as ferrous chloride and iron lactate, hydrogen, hydrogen iodide, carbon monoxide, aldehyde compounds such as formaldehyde, acetaldehyde and glyoxal, methyl formate, butyl formate, triethyl Mention may be made of formic acid compounds such as o-formic acid and mixtures thereof containing at least one reducing organic compound such as glucose, ascorbic acid and hydroquinone.
- formic acid compounds such as o-formic acid and mixtures thereof containing at least one reducing organic compound such as glucose, ascorbic acid and hydroquinone.
- thermal decomposition reaction accelerator examples include ethanolamine, methyldiethanolamine, triethanolamine, propanolamine, butanolamine, hexanolamine, hydroxyalkylamines such as dimethylethanolamine, piperidine, and N-methylpiperidine.
- a solvent is required for adjusting the viscosity of the silver coating liquid composition and for forming a smooth thin film.
- the solvent that can be used in this case include water, methanol, ethanol, isopropanol, 1-methoxypropanol, butanol, Ethyl hexyl alcohol, alcohols such as terpineol, ethylene glycol, glycols such as glycerin, ethyl acetate, butyl acetate, methoxypropyl acetate, carbitol acetate, acetates such as ethyl carbitol acetate, methyl cellosolve, butyl cellosolve, diethyl Ethers such as ether, tetrahydrofuran, dioxane, methyl ethyl ketone, acetone, dimethylformamide, ketones such as 1-methyl-2-pyrrolidone, hexane, Hydrocarbons such as pent
- Nitrogen-containing cyclic compound in the adjacent layer of the silver reflective layer When forming a silver reflective layer by heating and baking a coating film containing a silver complex compound capable of vaporizing and desorbing a ligand when forming a silver reflective layer, a nitrogen-containing cyclic layer is formed adjacent to the silver reflective layer. It is preferable to contain a compound.
- a corrosion inhibitor and an antioxidant having an adsorptive group for silver are preferably used.
- a desired corrosion prevention effect can be obtained by using a nitrogen-containing cyclic compound.
- a nitrogen-containing cyclic compound For example, it is desirable to be selected from at least one of a compound having a pyrrole ring, a compound having a triazole ring, a compound having a pyrazole ring, a compound having an imidazole ring, a compound having an indazole ring, or a mixture thereof.
- compounds having a pyrrole ring compounds having a triazole ring, compounds having a pyrazole ring, compounds having an imidazole ring, and compounds having an indazole ring, ⁇ 2-7-1. What is described in ⁇ Corrosion inhibitor> can be preferably used.
- antioxidant it is preferable to use a phenol-based antioxidant, a thiol-based antioxidant, and a phosphite-based antioxidant.
- examples of the phenol-based antioxidant, the thiol-based antioxidant, and the phosphite-based antioxidant are ⁇ 2-2-3 (b). What was described by antioxidant> can be used conveniently.
- the said antioxidant and light stabilizer can also be used together.
- the light stabilizer it is preferable to use a hindered amine light stabilizer or a nickel ultraviolet stabilizer. Examples of hindered amine light stabilizers and nickel ultraviolet light stabilizers are ⁇ 2-2-3 (b). What was described by antioxidant> can be used conveniently.
- Anchor layer is a layer which has resin and is preferably provided in order to adhere a fat film-like support and a silver reflective layer. Therefore, the anchor layer has an adhesive property that allows the resin film-like support and the silver reflective layer to be in close contact, heat resistance that can withstand heat when the silver reflective layer is formed by a vacuum deposition method, etc., and the silver reflective layer originally has high Smoothness is required to bring out the reflection performance.
- the resin used for the anchor layer is not particularly limited as long as it satisfies the above adhesiveness, heat resistance, and smoothness conditions.
- Polyester resin, acrylic resin, melamine resin, epoxy resin, polyamide Resin, vinyl chloride resin, vinyl chloride vinyl acetate copolymer resin, etc. can be used singly or as a mixed resin. From the viewpoint of weather resistance, polyester resin and melamine resin mixed resin or polyester resin and acrylic resin can be used.
- a resin mixed resin is preferable, and a thermosetting resin in which a curing agent such as isocyanate is further mixed is more preferable.
- the thickness of the anchor layer is preferably 0.01 to 3 ⁇ m, more preferably 0.1 to 2 ⁇ m. By satisfying this range, the unevenness of the resin film-like support surface can be covered while maintaining the adhesion, the smoothness can be improved, and the anchor layer can be sufficiently cured. The reflectance can be increased.
- the anchor layer has the above ⁇ 2-7-1. It is preferable to contain the corrosion inhibitor described in ⁇ Corrosion inhibitor>.
- an anchor layer can use conventionally well-known coating methods, such as a gravure coat method, a reverse coat method, and a die coat method.
- Resin Film Support Various conventionally known resin films can be used as the resin film-like support.
- resin films cellulose ester film, polyester film, polycarbonate film, polyarylate film, polysulfone (including polyethersulfone) film, polyethylene terephthalate, polyethylene naphthalate polyester film, polyethylene film, polypropylene film, cellophane, Cellulose diacetate film, cellulose triacetate film, cellulose acetate propionate film, cellulose acetate butyrate film, polyvinylidene chloride film, polyvinyl alcohol film, ethylene vinyl alcohol film, syndiotactic polystyrene film, polycarbonate film, norbornene resin film , Polymethylpentenef Can Lum, polyether ketone film, polyether ketone imide film, a polyamide film, a fluororesin film, a nylon film, polymethyl methacrylate film, and acrylic films.
- polyester films such as polyethylene terephthalate, norbornene resin films, cellulose ester films, and acrylic films are preferable.
- a polyester film such as polyethylene terephthalate or an acrylic film, and it may be a film manufactured by melt casting film formation or a film manufactured by solution casting film formation.
- the resin film-like support is preferably located at a position farther from the sunlight incident side than the silver reflection layer, ultraviolet rays hardly reach the resin film-like support.
- the presence of a protective layer on the sunlight incident side of the resin film-like support, or a hard coat layer or an acrylic layer to which an ultraviolet absorber is added is arranged on the sunlight incident side of the resin film-like support.
- ultraviolet rays are less likely to reach the resin film support. Therefore, the resin film-like support can be used even if it is a resin that easily deteriorates with respect to ultraviolet rays. From such a viewpoint, it becomes possible to use a polyester film such as polyethylene terephthalate as the resin film-like support.
- the thickness of the resin film-like support is preferably set to an appropriate thickness according to the type and purpose of the resin. For example, it is generally in the range of 10 to 250 ⁇ m. The thickness is preferably 20 to 200 ⁇ m.
- the adhesive layer of a film mirror is a layer for joining a film mirror to the below-mentioned base material by the said adhesive layer.
- the film mirror may have the layer by a peeling sheet in the reverse side to the sunlight incident side of an adhesion layer.
- the adhesive layer is not particularly limited, and for example, any of a dry laminating agent, a wet laminating agent, an adhesive, a heat seal agent, a hot melt agent and the like can be used.
- a polyester resin, a urethane resin, a polyvinyl acetate resin, an acrylic resin, a nitrile rubber, or the like is used.
- the laminating method for joining the adhesive layer and the substrate is not particularly limited. For example, it is preferable to carry out the roll method continuously from the viewpoint of economy and productivity.
- the thickness of the pressure-sensitive adhesive layer is usually preferably in the range of about 1 to 100 ⁇ m from the viewpoint of the pressure-sensitive adhesive effect, the drying speed, and the like.
- the thickness is larger than 1 ⁇ m, it is preferable because a sufficient adhesive effect can be obtained.
- the thickness is smaller than 100 ⁇ m, the pressure-sensitive adhesive layer is not too thick and the drying speed is not slowed, which is efficient.
- the original adhesive strength can be obtained, and no adverse effects such as residual solvent can occur.
- the film mirror may have a layer of a release sheet on the side opposite to the sunlight incident side of the adhesive layer.
- the film mirror when the film mirror is shipped, it can be shipped with the release sheet attached to the adhesive layer, and the release sheet can be peeled off to expose the adhesive layer and bonded to the substrate.
- Any release sheet may be used as long as it can protect the silver reflective layer.
- a resin film kneaded with titanium, silica, aluminum powder, copper powder, or the like, or a resin film coated with a resin kneaded with these, or subjected to metallization with a metal such as aluminum is used.
- the thickness of the release sheet is not particularly limited but is preferably in the range of 12 to 250 ⁇ m. Moreover, when surface roughness is provided to the film mirror for sunlight reflection or a silver reflection layer with a peeling sheet, it is preferable that surface roughness Ra of a peeling layer is 0.01 micrometer or more and 0.1 micrometer or less. Due to the surface roughness of the release layer, the surface of the solar reflective film mirror or the silver reflective layer also becomes rough, so even when using a roll-to-roll system that continuously forms films in the production stage of film mirrors, blocking, etc. Can be prevented.
- the solar reflective film mirror is preferably used by being bonded to a self-supporting base material.
- self-supporting substrate means supporting the opposite edge portions when cut to a size used as a substrate for a film mirror for sunlight reflection. This means that the substrate has rigidity enough to carry the substrate.
- the base material of the film mirror for sunlight reflection has self-supporting properties, so that it is easy to handle when installing the film mirror for sunlight reflection and the holding member for holding the film mirror for sunlight reflection is simple. Therefore, it is possible to reduce the weight of the reflection device, and it is possible to suppress power consumption during solar tracking.
- the substrate may be a single layer or a shape in which a plurality of layers are laminated.
- the base material may have a single structure or may be divided into a plurality of parts.
- the base material has a concave shape or can be a concave shape. Therefore, a base material that is variable from a flat shape to a concave shape may be used, or a base material that is fixed to a concave shape may be used.
- the base material that can be changed into the concave shape can adjust the curvature of the film mirror that is bonded by adjusting the curvature of the base material. It is preferable because a rate can be obtained.
- the base material having the concave shape fixed is preferable from the viewpoint of adjustment cost because it is not necessary to adjust the curvature.
- the base material includes steel plates, copper plates, aluminum plates, aluminum-plated steel plates, aluminum-based alloy-plated steel plates, copper-plated steel plates, tin-plated steel plates, chrome-plated steel plates, stainless steel plates, and veneer plates (preferably waterproofed) Wood board, fiber reinforced plastic (FRP) board, resin board, and the like.
- a metal plate from the viewpoint of high thermal conductivity. More preferably, it is a plated steel plate, stainless steel plate, aluminum plate or the like having not only high thermal conductivity but also good corrosion resistance. Most preferably, a steel plate combining a resin and a metal plate is used.
- the base material when most of the base material is made of resin, it is preferable to use a resin material having a hollow structure. This is because when the substrate is made of a resin material that does not have a hollow structure, the thickness required to obtain rigidity sufficient to provide self-supporting properties increases, and as a result, the substrate mass increases. However, when the layer is made of a resin material having a hollow structure, it is possible to reduce the weight while maintaining the self-supporting property. In addition, since a function as a heat insulating material due to the hollow structure also occurs, it is possible to suppress the temperature change of the surface opposite to the light incident side from being transmitted to the film mirror, to prevent condensation and to suppress deterioration due to heat It becomes.
- a layer having a resin material having a hollow structure it is preferable to provide a resin film having a smooth surface as a surface layer and to use a resin material having a hollow structure as an intermediate layer from the viewpoint of increasing the reflection efficiency of the film mirror. .
- various conventionally known resin films can be used.
- polycarbonate films polyester films such as polyethylene terephthalate, norbornene resin films, cellulose ester films, and acrylic films are preferable.
- a polyester film such as polyethylene terephthalate or an acrylic film, and it may be a film manufactured by melt casting film formation or a film manufactured by solution casting film formation.
- the thickness of the resin film is preferably set to an appropriate thickness according to the type and purpose of the resin. For example, it is generally in the range of 10 to 250 ⁇ m. The thickness is preferably 20 to 200 ⁇ m.
- a cellular structure made of a foamed resin a three-dimensional structure having a wall surface made of a resin material (such as a honeycomb structure), a resin material to which hollow fine particles are added, or the like can be used.
- the cellular structure of the foamed resin refers to a material in which a gas is finely dispersed in a resin material and formed into a foamed or porous shape, and a known foamed resin material can be used as the material.
- Polyurethane, polyethylene, polystyrene and the like are preferably used.
- the honeycomb structure represents a general three-dimensional structure composed of a plurality of small spaces surrounded by side walls.
- the resin material constituting the wall surface is a homopolymer or copolymer of olefins such as ethylene, propylene, butene, isoprene pentene, and methylpentene.
- Acrylic derivatives such as polyolefin (for example, polypropylene, high-density polyethylene), polyamide, polystyrene, polyvinyl chloride, polyacrylonitrile, ethylene-ethyl acrylate copolymer, vinyl acetate copolymers such as polycarbonate, ethylene-vinyl acetate copolymer Terpolymers such as ionomers and ethylene-propylene-dienes, and thermoplastic resins such as ABS resins, polyolefin oxides and polyacetals are preferably used. In addition, these may be used individually by 1 type, or may mix and use 2 or more types.
- polyolefin for example, polypropylene, high-density polyethylene
- polyamide for example, polypropylene, high-density polyethylene
- polystyrene polyvinyl chloride
- polyacrylonitrile ethylene-ethyl acrylate copolymer
- vinyl acetate copolymers such as polycarbon
- thermoplastic resins olefin-based resins or resins mainly composed of olefin-based resins
- polypropylene-based resins or resins based mainly on polypropylene-based resins are preferable because of excellent balance between mechanical strength and moldability.
- the resin material may contain an additive.
- the additive include silica, mica, talc, calcium carbonate, glass fiber, carbon fiber, and other inorganic fillers, plasticizers, stabilizers, colorants, charging agents.
- An inhibitor, a flame retardant, a foaming agent, etc. are mentioned.
- the solar power generation reflecting device has a solar reflective film mirror and a holding member that holds the solar reflective film mirror.
- a cylindrical member having fluid inside is provided as a heat collecting part in the vicinity of the film mirror, and the internal fluid is heated by reflecting sunlight to the cylindrical member.
- a form generally referred to as a trough type, which generates heat by converting thermal energy, can be cited as one form.
- the form called a tower type as shown in FIG. 2, FIG. 3 is also mentioned.
- the tower type configuration includes at least one heat collecting part 14 and at least one condenser mirror 11 for reflecting the sunlight L and irradiating the heat collecting part 14.
- a plurality of solar power generation reflecting devices 15 are arranged around the heat collecting section 14.
- a plurality of solar power generation reflecting devices 15 are arranged in a concentric circle shape or a concentric fan shape as shown in FIG.
- the sunlight L is reflected to the condensing mirror 11 by the solar reflective film mirror (solar thermal power generation reflection device 15) installed around the support tower 12, and thereafter The light is further reflected by the condenser mirror 11, sent to the heat collecting unit 14, and sent to the heat exchange facility 13.
- the present invention can be used for both trough type and tower type. Of course, it can be used for various other types of solar thermal power generation.
- the solar power generation reflecting device includes a holding member that holds a solar reflective film mirror.
- the holding member preferably holds the solar antireflection film mirror in a state where the sun can be tracked.
- the holding member preferably has a configuration for holding the solar reflective film mirror in a state in which the sun can be tracked.
- the holding member may be driven manually, or a separate driving device may be provided automatically. It is good also as a structure which tracks the sun.
- the film mirror of a present Example is the embodiment shown in FIG. 4 or FIG.
- the present invention is not limited to these.
- “part” or “%” is used, and “part by mass” or “% by mass” is expressed unless otherwise specified.
- a biaxially stretched polyester film (polyethylene terephthalate film, thickness 25 ⁇ m) was used.
- a polyester resin Polyyester SP-181, manufactured by Nippon Synthetic Chemical Co., Ltd.
- TDI tolylene diisocyanate
- 2,4-tolylene diisocyanate 2,4-tolylene diisocyanate
- methyl ethyl ketone was added as a solvent, and further, an amount prepared to be 10% by mass of glycol dimercaptoacetate (manufactured by Wako Pure Chemical Industries, Ltd.) as a corrosion inhibitor was mixed and coated by a gravure coating method to have a thickness of 60 nm.
- Anchor layer 2 was formed.
- the silver reflection layer 3 was formed on the anchor layer 2 so as to be 80 nm by vacuum deposition.
- a resin coat layer 4 having a thickness of 60 nm was formed on the silver reflective layer 3 in the same manner except that TINUVIN 234 (manufactured by Ciba Japan) was used instead of the glycol dimercaptoacetate of the anchor layer 2.
- the adhesive TSB-730 manufactured by Dainippon Ink Co., Ltd. was coated by the gravure coating method so as to have a thickness of 5 ⁇ m, and the adhesive layer 5 was formed, and an ultraviolet absorber was contained thereon.
- Acrylic resin Sumitomo Chemical S001 (75 ⁇ m) was bonded by a roll method to form an acrylic layer 6 and a reflective film 10 was prepared.
- a biaxially stretched polyester film (polyethylene terephthalate film, thickness 25 ⁇ m) was used.
- a polyester resin Polyyester SP-181, manufactured by Nippon Synthetic Chemical Co., Ltd.
- TDI tolylene diisocyanate
- 2,4-tolylene diisocyanate 2,4-tolylene diisocyanate
- methyl ethyl ketone was added as a solvent, and further, an amount prepared to be 10% by mass of glycol dimercaptoacetate (manufactured by Wako Pure Chemical Industries, Ltd.) as a corrosion inhibitor was mixed and coated by a gravure coating method to have a thickness of 60 nm.
- Anchor layer 2 was formed.
- the silver reflection layer 3 was formed on the anchor layer 2 so as to be 80 nm by vacuum deposition.
- a resin coat layer 4 having a thickness of 60 nm was formed on the silver reflective layer 3 in the same manner except that TINUVIN 234 (manufactured by Ciba Japan) was used instead of the glycol dimercaptoacetate of the anchor layer 2.
- an acrylic BR-95 manufactured by Mitsubishi Rayon Co., Ltd.
- methyl ethyl ketone dissolved in methyl ethyl ketone is prepared on the resin coat layer 4 so as to be 15 parts by weight, and the film thickness is 75 ⁇ m using an applicator. It apply
- the reflective film 10 or 20 produced as described above is used as a basis for the solar reflective film mirror examples and comparative examples, and the protective layer 7 and the hard coat layer 8 are laminated on the reflective film 10 and implemented as follows.
- Examples 7 to 13 were prepared as Comparative Examples 18 to 20 in which the composition of the protective layer 7 was changed to that outside the present invention.
- the protective layer 7 and the hard coat layer 8 were laminated on the reflective film 20 and Examples 1 to 6 were changed as follows, and the protective layer 7 was changed to a composition outside the present invention as Comparative Example 14. To 17 were produced.
- Example No. Preparation of film mirror for solar reflection 1 A flask equipped with a stirrer, a dripping port, a thermometer, a cooling tube and a nitrogen gas inlet, as a benzotriazole-based UV-absorbing group, as a polymerizable group in the chemical structure of Tinuvin234 (manufactured by Ciba Japan), as a methacryloyl group 10 parts of the monomer 1 with the following: 50 parts of methyl methacrylate (MMA), 10 parts of n-butyl acrylate (BA) as other monomers, 2-hydroxyethyl methacrylate (HEMA) as the hydroxyl group-containing monomer 10 parts and 120 parts of ethyl acetate as a solvent were charged, and the temperature was raised to the reflux temperature while introducing nitrogen gas and stirring.
- MMA methyl methacrylate
- BA n-butyl acrylate
- HEMA 2-hydroxyethyl methacrylate
- Obtained UV-absorbing group-containing polymer No. 1 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 1 film mirror was produced.
- a hard coat liquid Perma-New 6000 California Hardcoating Company
- Example No. Preparation of film mirror for solar reflection 2 In a flask equipped with a stirrer, a dripping port, a thermometer, a cooling tube and a nitrogen gas inlet, as a triazine-based UV-absorbing group, in the chemical structure of Tinvin405 (manufactured by Ciba Japan), as a polymerizable group, as a methacryloyl group 10 parts of the monomer 2 with the following: 50 parts of methyl methacrylate (MMA) as the other monomer, 10 parts of n-butyl acrylate (BA), 2-hydroxyethyl methacrylate (HEMA) as the hydroxyl group-containing monomer 10 parts and 120 parts of ethyl acetate as a solvent were charged, and the temperature was raised to the reflux temperature while introducing nitrogen gas and stirring.
- MMA methyl methacrylate
- BA n-butyl acrylate
- HEMA 2-hydroxyethyl methacrylate
- Obtained UV-absorbing group-containing polymer No. 2 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to form a 10 ⁇ m-thick protective layer having a UV-absorbing group in the resin. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 2 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group.
- a hard coat liquid Perma-New 6000 (California Hardcoating Company) is coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m.
- a coating layer was formed and Example No. 3 film mirrors were produced.
- Example No. Production of film mirror for solar reflection 4 A flask equipped with a stirrer, a dripping port, a thermometer, a cooling tube and a nitrogen gas inlet, as a benzotriazole-based UV-absorbing group, as a polymerizable group in the chemical structure of Tinuvin234 (manufactured by Ciba Japan), as a methacryloyl group 10 parts of a monomer 1 having a hindered amine antioxidant group, 10 parts of a monomer 3 having a methacryloyl group as a polymerizable group in the chemical structure of LA52 (manufactured by ADEKA), As monomers, 50 parts of methyl methacrylate (MMA), 10 parts of n-butyl acrylate (BA), 10 parts of 2-hydroxyethyl methacrylate (HEMA) as a hydroxyl group-containing monomer, and 120 parts of ethyl acetate as a solvent were charged.
- MMA methyl methacrylate
- Obtained UV-absorbing group-containing polymer No. 4 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 4 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained UV-absorbing group-containing polymer No. 5 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 5 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained UV-absorbing group-containing polymer No. 6 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 6 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Example No. Preparation of film mirror for solar reflection No. 7 A flask equipped with a stirrer, a dripping port, a thermometer, a cooling tube and a nitrogen gas inlet, as a benzotriazole-based UV-absorbing group, as a polymerizable group in the chemical structure of Tinuvin234 (manufactured by Ciba Japan), as a methacryloyl group 10 parts of the monomer 1 with the following: 50 parts of methyl methacrylate (MMA), 10 parts of n-butyl acrylate (BA) as other monomers, 2-hydroxyethyl methacrylate (HEMA) as the hydroxyl group-containing monomer 10 parts and 120 parts of ethyl acetate as a solvent were charged, and the temperature was raised to the reflux temperature while introducing nitrogen gas and stirring.
- MMA methyl methacrylate
- BA n-butyl acrylate
- HEMA 2-hydroxyethyl methacrylate
- Obtained UV-absorbing group-containing polymer No. 7 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 7 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Example No. 8 Production of film mirror for sunlight reflection
- a flask equipped with a stirrer, a dripping port, a thermometer, a cooling tube and a nitrogen gas inlet as a benzotriazole-based UV-absorbing group, as a polymerizable group in the chemical structure of Tinuvin234 (manufactured by Ciba Japan), as a methacryloyl group 10 parts of a monomer 1 having a hindered amine antioxidant group, 10 parts of a monomer 3 having a methacryloyl group as a polymerizable group in the chemical structure of LA52 (manufactured by ADEKA), As monomers, 50 parts of methyl methacrylate (MMA), 10 parts of n-butyl acrylate (BA), 10 parts of 2-hydroxyethyl methacrylate (HEMA) as a hydroxyl group-containing monomer, and 120 parts of ethyl acetate as a solvent were charged.
- MMA methyl methacryl
- Obtained UV-absorbing group-containing polymer No. 8 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a film thickness of 10 ⁇ m, in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 8 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Example No. Production of film mirror for solar reflection 9 A flask equipped with a stirrer, a dripping port, a thermometer, a cooling tube and a nitrogen gas inlet, as a benzotriazole-based UV-absorbing group, as a polymerizable group in the chemical structure of Tinuvin234 (manufactured by Ciba Japan), as a methacryloyl group 5 parts of a monomer 1 having a triazine-based ultraviolet absorbing group, 10 parts of a monomer 2 having a methacryloyl group as a polymerizable group in the chemical structure of Tinuvin 405 (manufactured by Ciba Japan) As a hindered amine antioxidant group, the chemical structure of LA52 (manufactured by ADEKA), 5 parts of monomer 3 having a methacryloyl group as a polymerizable group, and methyl methacrylate (MMA) 50 as another monomer Parts, n-butyl acryl
- Obtained UV-absorbing group-containing polymer No. 9 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 9 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- a flask equipped with a stirrer, a dripping port, a thermometer, a cooling pipe and a nitrogen gas inlet has a triazine-based UV-absorbing group, a chemical structure of Tinuvin 1577 (manufactured by Ciba Japan), and a methacryloyl group as a polymerizable group.
- Obtained UV-absorbing group-containing polymer No. 10 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. Ten film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained UV-absorbing group-containing polymer No. 11 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 11 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained UV-absorbing group-containing polymer No. 12 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to form a 10 ⁇ m-thick protective layer having a UV-absorbing group in the resin. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. Twelve film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained UV-absorbing group-containing polymer No. 13 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to form a 10 ⁇ m-thick protective layer having a UV-absorbing group in the resin. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed and Example No. 13 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- a flask equipped with a stirrer, a dripping port, a thermometer, a cooling pipe, and a nitrogen gas inlet port has a methacryloyl group as a polymerizable group in the chemical structure of CHIMASSORB81 (manufactured by Ciba Japan) as a benzophenone-based ultraviolet absorbing group.
- Obtained UV-absorbing group-containing polymer No. 14 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has a benzophenone-based ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed, and Comparative Example No. 14 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- a flask equipped with a stirrer, a dripping port, a thermometer, a cooling pipe, and a nitrogen gas inlet port has a methacryloyl group as a polymerizable group in the chemical structure of CHIMASSORB81 (manufactured by Ciba Japan) as a benzophenone-based ultraviolet absorbing group.
- Obtained UV-absorbing group-containing polymer No. 15 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to form a protective layer having a thickness of 10 ⁇ m in which the resin has an ultraviolet absorbing group. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed, and Comparative Example No. Fifteen film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained ultraviolet absorber-added resin composition No. 1 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to obtain a protective layer having a thickness of 10 ⁇ m to which an ultraviolet absorber was added. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed, and Comparative Example No. Sixteen film mirrors were produced.
- Obtained ultraviolet absorber-added resin composition No. 2 was coated on the reflective film 20 with a wire bar and dried at 80 ° C. for 30 seconds to obtain a protective layer having a thickness of 10 ⁇ m to which an ultraviolet absorber was added. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed, and Comparative Example No. Seventeen film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained ultraviolet absorber-added resin composition No. 3 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to obtain a protective layer having a thickness of 10 ⁇ m to which an ultraviolet absorber was added. Thereafter, a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m. A coating layer was formed, and Comparative Example No. 18 film mirrors were produced.
- Perma-New 6000 California Hardcoating Company
- Obtained ultraviolet absorber-added resin composition No. 4 was coated on the reflective film 10 with a wire bar and dried at 80 ° C. for 30 seconds to obtain a protective layer having a thickness of 10 ⁇ m to which an ultraviolet absorber was added.
- a hard coat liquid Perma-New 6000 (California Hardcoating Company) was coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m.
- a coating layer was formed, and Comparative Example No. 19 film mirrors were produced.
- An acrylic resin composition is prepared by dissolving 120 parts of ethyl acetate as a solvent in 5 parts of Tinuvin 234 (manufactured by Ciba Japan), 10 parts of Tinuvin 405 (manufactured by Ciba Japan), and 5 parts of LA52 (manufactured by ADEKA).
- 50 parts of MMA, 10 parts of BA, and 10 parts of HEMA were mixed and stirred, and ultraviolet absorber-added resin composition No. 5 was produced.
- the obtained ultraviolet absorber-added resin composition No. 5 was coated on the reflective film 10 with a wire bar and dried at 80 ° C.
- a hard coat solution Perma-New 6000 (California Hardcoating Company) is coated with a wire bar, dried at 80 ° C. for 60 seconds, and then heat treated at 70 ° C. for 48 hours to obtain a hard film having a dry film thickness of 3 ⁇ m.
- a coating layer was formed and Comparative Example No. Twenty film mirrors were produced.
- the transmittance of the measurement sample is measured as an average reflectance from 250 nm to 2500 nm.
- the regular reflectance is measured with an incident angle of incident light of 5 ° with respect to the normal line of the reflecting surface using a dedicated jig. Evaluation is similarly measured as an average reflectance from 250 nm to 2500 nm.
- UV irradiation test Each of the solar reflective film mirrors produced was irradiated with 150 mW / ⁇ of ultraviolet rays at 65 ° C. for 600 hours using an i-super UV tester (Iwasaki Electric Co., Ltd.) to evaluate the ultraviolet resistance. .
- Examples 1 to 13 and Comparative Examples 16 to 20 silver aggregation, falling off, and discoloration did not occur, but a resin having a benzophenone-based UV absorbing group that does not have sufficient UV resistance was used.
- Comparative Examples 14 and 15 the regular reflectance, adhesion and transmittance were insufficient, and in Comparative Examples 16 and 17 where an acrylic layer was formed by coating using a solution to which an ultraviolet absorber was added, bleeding was observed. Aggregation, omission, and discoloration of silver occurred as well as out. This is due to the proximity of radicals to the silver reflective layer due to penetration of the coating solution of the protective layer and the acrylic layer, and the ease of generation of radicals due to the low UV resistance due to the use of additives. It is believed that there is.
- the present invention even if a part of ultraviolet rays contained in sunlight is irradiated twice on the protective layer because it has a silver reflection layer and an environment where the amount of ultraviolet irradiation is very large such as a desert. , Bleed-out, compatibility, decrease in reflectivity due to bleed-out, decrease in reflectivity due to aggregation of silver, discoloration, film peeling, cracks, etc.
- a film mirror and a solar power generation reflector can be provided.
- the present invention is configured as described above, it can be used as a film mirror for reflecting sunlight and a reflecting device for solar thermal power generation.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Thermal Sciences (AREA)
- Combustion & Propulsion (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Optical Elements Other Than Lenses (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
これに対して、太陽エネルギーのエネルギー密度が低いという問題は、反射装置で太陽エネルギーを集めることによって解決することが提案されている。
(1)ベンゾトリアゾール系紫外線吸収性基
(2)トリアジン系紫外線吸収性基
[式中、R1は水素原子または炭素数1~8のアルキル基を表し、R2は炭素数1~6のアルキレン基を表し、R3は水素原子またはメチル基を表し、X1は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数1~6のアルコキシ基、シアノ基またはニトロ基を表す。]
[式中、R4は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数1~4のアルコキシ基、シアノ基またはニトロ基を表し、R5は水素結合を形成し得る元素を有する基を表し、R6は水素原子またはメチル基を表し、R7は水素原子または炭素数1~12のアルキル基を表す。]
[式中、R8、R9、R10、R11、R12、R13、R14およびR15は、互いに独立して、水素原子、炭素数1~10のアルキル基、炭素数2~10のアルケニル基、または、炭素数1~10のアルコキシ基を表し、X2は水素原子またはメチル基を表し、Aは、-(CH2CH2O)p-、-CH2CH(OH)-CH2O-、-(CH2)p-O-、-CH2CH(CH2OR16)-O-、-CH2CH(R16)-O-、または、-CH2(CH2)qCOO-B-O-を表し、R16は炭素数1~10のアルキル基を表し、Bはメチレン基、エチレン基、または、-CH2CH(OH)CH2-を表し、pは1~20の整数を表し、qは0または1を表す。]
なお、本発明は、太陽光反射用フィルムミラーが砂漠のような紫外線照射量が非常に多い環境などで用いられること、銀反射層を有しているが故に太陽光に含まれる一部の紫外線が保護層に2度照射されるということ、ブリードアウト、相溶性、ブリードアウトに伴う反射率の低下、銀の凝集による反射率の低下、変色、膜剥がれ、ワレなどの太陽光反射用フィルムミラーならではの課題を見出し、その解決策を提供するものである。
太陽光反射用フィルムミラーは、樹脂フィルム状支持体と、銀反射層と、保護層とを少なくとも有するフィルム状のミラーをいう。また、保護層は樹脂フィルム状支持体及び銀反射層よりも太陽光入射側に設けられている。フィルムミラーの厚さは20~600μmであり、好ましくは80~300μm、更に好ましくは80~200μm、最も好ましくは80~170μmである。フィルムミラーの厚さを20μm以上にすることにより、フィルムミラーを支持する基材などに接合させた時に、ミラーが撓むことなく、良好な反射率を得やすくなるため好ましい。また、フィルムミラーの厚さを600μm以下にすることにより、取り扱い性が良好になるため好ましい。フィルムミラーには平面性があるため、ロールトゥロールで製造することも可能であり、製造費用の観点から好ましく用いられる。また、フィルムミラーは、用いられる材料や、20~600μm程度の厚さであることから、非常に軽量であるといえる。さらに、フィルムミラーは支持体が樹脂フィルムであるためガラスとは異なり割れる等の問題が発生せず、柔軟性を有する。つまり、フィルムミラーは、軽量で柔軟性があり、製造コストを抑え大面積化・大量生産することができるという特長を有している。
保護層は、樹脂フィルム状支持体及び銀反射層よりも太陽光入射側に設けられており、樹脂を有する。また、前記樹脂は(1)及び/または(2)の紫外線吸収性基を有する。
(1)ベンゾトリアゾール系紫外線吸収性基
(2)トリアジン系紫外線吸収性基
保護層に用いられる樹脂の材料としては、従来公知の種々の樹脂フィルムを用いることができる。例えば、セルロースエステル系、ポリエステル系フィルム、ポリカーボネート系フィルム、ポリアリレート系フィルム、ポリスルホン(ポリエーテルスルホンも含む)系フィルム、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステルフィルム、ポリエチレンフィルム、ポリプロピレンフィルム、セロファン、セルロースジアセテートフィルム、セルローストリアセテートフィルム、セルロースアセテートプロピオネートフィルム、セルロースアセテートブチレートフィルム、ポリ塩化ビニリデンフィルム、ポリビニルアルコールフィルム、エチレンビニルアルコールフィルム、シンジオタクティックポリスチレン系フィルム、ポリカーボネートフィルム、ノルボルネン系樹脂フィルム、ポリメチルペンテンフィルム、ポリエーテルケトンフィルム、ポリエーテルケトンイミドフィルム、ポリアミドフィルム、フッ素樹脂フィルム、ナイロンフィルム、ポリメチルメタクリレートフィルム、アクリルフィルム等を挙げることができる。中でも、ポリカーボネート系フィルム、ポリエチレンテレフタレート等のポリエステル系フィルム、ノルボルネン系樹脂フィルム、及びセルロースエステル系フィルム、アクリルフィルムが好ましい。特にポリエチレンテレフタレート等のポリエステル系フィルム又はアクリルフィルムを用いることが好ましく、溶融流延製膜で製造されたフィルムであっても、溶液流延製膜で製造されたフィルムであってもよい。また、保護層における樹脂の好ましい含有量は、保護層の組成物100質量%中5~100質量%配合することが好ましい。この範囲であれば、プラスチック基材に対する密着性が良好となる。5質量%以上であれば、隣接する層との相互作用が高く、密着性が十分保たれ、100質量%以内であるので、耐候性が十分となる。より好ましくは、10~90質量%、さらに好ましくは10~50質量%である。
保護層の樹脂が有するベンゾトリアゾール系紫外線吸収性基に用いられる官能基を以下に詳述する。なお、以下では化合物を官能基として扱う。
[式中、R1は水素原子または炭素数1~8のアルキル基を表し、R2は炭素数1~6のアルキレン基を表し、R3は水素原子またはメチル基を表し、X1は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数1~6のアルコキシ基、シアノ基またはニトロ基を表す。]
[式中、R4は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数1~4のアルコキシ基、シアノ基またはニトロ基を表し、R5は水素結合を形成し得る元素を有する基を表し、R6は水素原子またはメチル基を表し、R7は水素原子または炭素数1~12のアルキル基を表す。]
保護層の樹脂が有するトリアジン系紫外線吸収性基に用いられる官能基を以下に詳述する。なお、以下では化合物を官能基として扱う。
[式中、R8、R9、R10、R11、R12、R13、R14およびR15は、互いに独立して、水素原子、炭素数1~10のアルキル基、炭素数2~10のアルケニル基、または、炭素数1~10のアルコキシ基を表し、X2は水素原子またはメチル基を表し、Aは、-(CH2CH2O)p-、-CH2CH(OH)-CH2O-、-(CH2)p-O-、-CH2CH(CH2OR16)-O-、-CH2CH(R16)-O-、または、-CH2(CH2)qCOO-B-O-を表し、R16は炭素数1~10のアルキル基を表し、Bはメチレン基、エチレン基、または、-CH2CH(OH)CH2-を表し、pは1~20の整数を表し、qは0または1を表す。]
保護層の樹脂が有する酸化防止性基に用いられる官能基を以下に詳述する。なお、以下では化合物を官能基として扱う。
本発明の保護層は、ブリードアウトが発生しない程度に他の化合物を添加してもよい。また、保護層が他の基を有していても良い。
ハードコート層はフィルムミラーに、フィルムミラー表面の傷つきを防止する耐傷性、汚れの付着を防止する防汚性、などを付加することを目的に設けられる。フィルムミラーがハードコート層と保護層を有することにより、銀反射層や樹脂フィルム状支持体などの保護層以下にある層が紫外線、砂塵、水滴などの外部環境から守られるため、フィルムミラーの長寿命化に貢献できる。太陽光反射用フィルムミラーは主に砂漠で使用されることが多いため、紫外線や熱や風雨、砂嵐といった様々な外因に対する耐性を持っていることが好ましい。ハードコート層により、銀反射層に用いられている金属の、酸素や水蒸気や硫化水素などによる腐食、紫外線による樹脂フィルム状支持体の劣化、フィルムミラーの変色や膜剥がれなどを低減することができる。また、ハードコート層により、フィルムミラーに付着した汚れをブラシなどで洗い流すことによるフィルムミラー表面の傷つきも低減することができ、結果として反射効率の低下も防止できる。ハードコート層の位置としてはフィルムミラーの太陽光入射側の最表面層、2層目、又は3層目のいずれかに設けられることが好ましい。ハードコート層の上に更に別の薄い層(1μm以下の厚さが好ましい)を設けてもよい。なお、ハードコート層の厚さは、0.05μm以上10μm以下であることが好ましく、より好ましくは、1μm以上4μm以下であり、更に好ましくは、1.5μm以上3μm以下である。ハードコート層の厚さが0.05μm以上だと十分な耐傷性を得ることができる。また、ハードコート層の厚さが10μm以下であると、応力が強くなり過ぎてハードコート層が割れることを防止できる。さらに、砂塵等の汚れの静電的な付着を防止する観点からも電気抵抗値が低いこと、つまり厚さが10μm以下であることが好ましい。
-(SiR17R18-NR19)n- ・・・(3)
-(SiR20R21-NR22)n-(SiR23R24-NR25)p- ・・・(4)
-(SiR26R27-NR28)n-(SiR29R30-NR31)p-(SiR32R33-NR34)q- ・・・(5)
多官能アクリルモノマー「A」成分は、不飽和基、特に、活性エネルギー線反応性不飽和基を有することが好ましい。なお、本明細書で言う活性エネルギー線とは、好ましくは電子線か紫外線をいう。活性エネルギー線反応性不飽和基を有する多官能アクリルモノマーとしては、ラジカル重合系モノマーが用いられ、好ましくは、分子中にα,β-不飽和二重結合を有する2官能以上の多官能モノマーである多官能アクリレート型もしくは多官能メタクリレート型モノマー等が挙げられる。他に、ビニル型モノマー、アリル型モノマーや単官能のモノマーを有していてもよい。また、ラジカル重合系モノマーは、単独でも、または架橋密度を調整すべく2種類以上のモノマーを併用することも可能である。「A」成分としては、これら比較的低分子量化合物、例えば分子量が1000未満のいわゆる狭義のモノマーの他、ある程度分子量の大きい、例えば重量平均分子量が1000以上10000未満のオリゴマー、プレポリマーも用いることが可能である。
シリコーン樹脂「B」成分としては、活性エネルギー線反応性不飽和基を有するシリコーン樹脂であることが好ましい。シリコーン樹脂は、ポリオルガノシロキサンを含有し、好ましくは、活性エネルギー線硬化性不飽和結合を分子内に有したポリオルガノシロキサン鎖を有する化合物である。特に、ラジカル重合性二重結合およびポリオルガノシロキサン鎖を有する単量体(a)1~50重量%と、ラジカル重合性二重結合および反応性官能基を有する(a)以外の単量体(b)10~95重量%と、(a)および(b)以外のラジカル重合性二重結合を有する単量体(c)0~89重量%とを含む単量体を重合してなる重合体(α)に、前記した反応性官能基と反応可能な官能基、およびラジカル重合性二重結合を有する化合物(β)を反応させてなる数平均分子量5000~100000のビニル共重合体である活性エネルギー線硬化性樹脂組成物であることが好ましい。
ハードコート層に紫外線吸収剤や酸化防止剤などの各種の添加材を含有させてもよい。以下に各種の添加材について詳述する。
紫外線吸収剤としては、特に制限は無いが、有機系として、ベンゾフェノン系、ベンゾトリアゾール系、サリチル酸フェニル系、トリアジン系、ベンゾエート系等が挙げられ、また無機系として、酸化チタン、酸化亜鉛、酸化セリウム、酸化鉄等が挙げられる。なお、紫外線吸収剤を多量に含有させた際にブリードアウトしてしまうという問題を低減するためには、分子量の1000以上の高分子の紫外線吸収剤を用いることが好ましい。好ましくは、分子量1000以上、3000以下である。
酸化防止剤としては、フェノール系酸化防止剤、ヒンダードアミン系酸化防止剤、チオール系酸化防止剤およびホスファイト系酸化防止剤など、有機系酸化防止剤を使用することが好ましい。有機系酸化防止剤をハードコート層に含有させることでも、転落角を低下し得る。酸化防止剤と光安定剤を併用してもよい。
ハードコート層、特に、多官能アクリルモノマーとシリコーン樹脂を含有するハードコート層は、重合を開始するための開始剤を含有することが好ましい。開始剤には紫外線などの活性エネルギー線硬化性樹脂の光重合開始剤が好ましく用いられる。例えば、ベンゾイン及びその誘導体、アセトフェノン、ベンゾフェノン、ヒドロキシベンゾフェノン、ミヒラーズケトン、α-アミロキシムエステル、チオキサントン等及びこれらの誘導体を挙げることができる。また、開始剤を光増感剤と共に使用してもよい。上記開始剤も光増感剤として使用できる。また、エポキシアクリレート系の開始剤の使用の際、n-ブチルアミン、トリエチルアミン、トリ-n-ブチルホスフィン等の増感剤を用いることができる。開始剤また光増感剤は該組成物100質量部に対して0.1~15質量部であり、好ましくは1~10質量部、より好ましくは、2~5質量部である。2種類の開始剤を併用することもでき、特にラジカル系開始剤の場合、少なくとも2種類の開始剤、好ましくは互いに異なる波長を吸収するラジカル系開始剤を用いることである。より好ましくは、互いに紫外線吸収波長の異なる2種類の開始剤を使用することである。例えば、より短波長の波長を吸収する開始剤のみでは、開始剤によってモノマー全ての重合反応を行えない場合がある。一方、より長波長の波長を吸収する開始剤のみでは、反応性はよくなるが、長期使用時に開始剤が着色してしまう可能性がある。そこで、長期使用時においても着色することなく、耐候性を良好にし、更に、重合反応性も良好にするために、互いに異なる波長を吸収するラジカル系開始剤を用いることが好ましい。
ハードコート層中には、さらに各種の添加剤を必要に応じて配合することができる。例えば、界面活性剤、レベリング剤および帯電防止剤などを用いることができる。
帯電防止層は、フィルムミラーの太陽光入射側の最表層が帯電してしまうことを防止する機能を有している。フィルムミラーはガラスミラーなどと比較して、樹脂フィルム状支持体を有しており、また、表面が樹脂で形成されていることが多いため、帯電しやすく、砂や埃などの汚れを引き寄せやすい。そのため、砂や埃などが付着し、反射効率が低下することが問題として挙げられる。フィルムミラーの最表層の近い層に帯電防止層が存在することにより、フィルムミラーの表面の帯電を抑えることができ、砂やほこりなどの塵の汚れの付着を抑えることができ、長時間にわたって、高い反射効率を維持することができるため好ましい。帯電防止層はフィルムミラーの最表層に隣接する層または最表層との間に極薄い層を介して存在していることが好ましい。また、他のいずれかの層、例えば保護層が帯電防止層を兼ねても良い。
アクリル層は、紫外線吸収能を有することが好ましい。アクリル層と隣接する層の樹脂がアクリル樹脂であると、その層との密着性が高く保たれるため好ましい。また、アクリル層はポリエチレンテレフタレートなどの樹脂に比して凹凸を生じ易いため、そのアクリル層表面の凹凸に起因し、太陽光反射用フィルムミラーの表面粗さが粗くなるため、フィルムミラーを連続的に製膜するロールトゥロール方式を用いた場合でも、フィルムミラーをロール状に巻いた際のブロッキングなどの貼りつきを防止することができる。アクリル層は固いため、柔らかく破損しにくいアクリル層を得るため、可塑剤の微粒子を含有させてもよい。可塑剤の微粒子の好ましい例としては、例えば、ブチルゴムやブチルアクリレートの微粒子などが挙げられる。アクリル層の厚さは、20~150μmであると入射光の透過率やフィルムミラーに適度な表面粗さを付与することができるため好ましい。より好ましくは、40~100μmである。また、アクリル層に紫外線吸収剤や酸化防止剤を添加してもよい。
接着層は、層同士の接着性を高める機能があるものであれば特に限定はない。接着であっても粘着であってもよい。好ましくは、保護層またはアクリル層と、アクリル層または樹脂コート層または銀反射層とを接着させる層である。接着層は、層同士を密着する密着性、銀反射層を真空蒸着法等で形成する時の熱にも耐え得る耐熱性、及び銀反射層が本来有する高い反射性能を引き出すための平滑性を有する事が好ましい。
銀反射層よりも太陽光入射側にガスバリア層を設けてもよい。保護層またはアクリル層と、銀反射層の間にガスバリア層を設けることが好ましい。更には、接着層と樹脂コート層の間にガスバリア層を設けることが好ましい。ガスバリア層は、湿度の変動、特に高湿度による樹脂フィルム状支持体及び樹脂フィルム状支持体に支持される各構成層等の劣化を防止するためのものであるが、特別の機能・用途を持たせたものであってもよく、上記劣化防止機能を有する限りにおいて、種々の態様のガスバリア層を設けることができる。
無機酸化物は、有機金属化合物を原料とするゾルから局所的加熱により形成されたものである。例えば、有機金属化合物に含有されているケイ素(Si)、アルミニウム(Al)、ジルコニウム(Zr)、チタン(Ti)、タンタル(Ta)、亜鉛(Zn)、バリウム(Ba)、インジウム(In)、スズ(Sn)、ニオブ(Nb)等の元素の酸化物であり、例えば、酸化ケイ素、酸化アルミニウム、酸化ジルコニウム等である。これらのうち、好ましくは、酸化ケイ素である。
ガスバリア層は、加熱により無機酸化物を形成する前駆体を塗布した後に、一般的な加熱方法が適用して形成することできるが、局所的加熱により形成することが好ましい。この前駆体は、ゾル状の有機金属化合物又はポリシラザンが好ましい。
有機金属化合物は、ケイ素、アルミニウム、リチウム、ジルコニウム、チタン、タンタル、亜鉛、バリウム、インジウム、スズ、ランタン、イットリウム、及びニオブのうちの少なくとも一つの元素を含有することが好ましい。特に、有機金属化合物が、ケイ素、アルミニウム、リチウム、ジルコニウム、チタン、亜鉛、及びバリウムのうちの少なくとも一つの元素を含有することが好ましい。さらに、ケイ素、アルミニウム、及びリチウムのうちの少なくとも一つの元素を含有することが好ましい。
MR35 m(OR36)n-m ・・・(8)
上記の一般式(8)において、Mは、酸化数nの金属を表す。R35及びR36は、各々独立にアルキル基を表す。mは、0~(n-1)の整数を表す。また、R35及びR36は、同一でもよく、異なっていてもよい。R35及びR36としては、炭素原子4個以下のアルキル基が好ましく、例えば、メチル基CH3(以下、Meで表すこともある)、エチル基C2H5(以下、Etで表す)、プロピル基C3H7(以下、Prで表すこともある。)、イソプロピル基i-C3H7(以下、i-Prで表すこともある)、ブチル基C4H9(以下、Buで表すこともある)、イソブチル基i-C4H9(以下、i-Buで表すこともある)等の低級アルキル基がより好ましい。
ここで、「ゾル-ゲル法」とは、有機金属化合物を加水分解すること等により、水酸化物のゾルを得て、脱水処理してゲルとし、さらにこのゲルを加熱処理することで、ある一定の形状(フィルム状、粒子状、繊維状等)の金属酸化物ガラスを調製する方法をいう。異なる複数のゾル溶液を混合する方法、他の金属イオンを添加する方法等により、多成分系の金属酸化物ガラスを得ることも可能である。具体的には、下記の工程を有するゾル-ゲル法で、無機酸化物を製造することが好ましい。
樹脂コート層は、アクリル層と銀反射層の間に設けられていることが好ましい。樹脂コート層が銀反射層に隣接している場合、樹脂コート層が銀反射層の腐食を防止するよう、腐食防止剤が添加されていることが好ましい。また、樹脂コート層が紫外線吸収能を有していても良い。
腐食防止剤としては、銀反射層の主な構成物質である金属に対する吸着性基を有することが好ましい。ここで、「腐食」とは、金属がそれをとり囲む環境物質によって、化学的または電気化学的に浸食されるか若しくは材質的に劣化する現象をいう(JIS Z0103-2004参照)。なお、腐食防止剤の添加量は、使用する化合物によって最適量は異なるが、一般的には0.1~1.0/m2の範囲内であることが好ましい。
銀反射層は、太陽光を反射する機能を有する銀からなる層である。銀反射層の表面反射率は、好ましくは80%以上、より好ましくは90%以上である。銀反射層は太陽光入射側(表面側)にあっても、その反対側(裏面側)にあってもよいが、樹脂基材が、太陽光線の紫外線により樹脂劣化してしまうことを防止する目的から、太陽光入射側に配置することが好ましい。また、銀反射層と保護層との間にある層の膜厚が0μm以上5μm以下であると、樹脂が有している紫外線吸収性基の紫外線による分解、それに伴い発生したラジカルが銀反射層に容易に近づきやすいため、銀の凝集を招きやすくなるが、保護層の樹脂が紫外線吸収性基を有しているため、高い耐紫外線能をもたせることができ、長期間にわたってラジカルの発生を抑えることができるため、問題とならない。また、保護層と銀反射層との間にある層の膜厚が0μm以上5μm以下であるため、フィルムミラー全体の薄膜化にも貢献できる。そして、銀反射層の太陽光入射側表面から太陽光反射用フィルムミラーの太陽光入射側最表面の総膜厚が5μm以上125μm以下であると、太陽光が銀反射層に到達するまでの膜厚が5μm以上125μmと薄いため、太陽光が銀反射層に到達するまでに通過する層による強度の減衰が起きにくい。当然ながら、銀反射層による反射後に再びフィルムミラー表面までの層を通過するため、膜厚が薄ければその際の強度減衰も起きにくい。さらにフィルムミラーの薄膜化につながるため、材料のコストも安くでき、軽くなるため輸送効率も向上し、製造時の工数も減らすことができる。
本発明における銀反射層を形成する際には、乾式法や湿式法以外に、配位子が気化・脱離しうる銀錯体化合物を含有する塗布膜を加熱焼成することにより形成するようにしてもよい。
(一般式(13)において、Cは、一般式(10)~(12)の化合物であり、mは、0.5~1.5である。)
高反射、高光沢の反射面の形成のために使用される銀コーティング液組成物は、前記の銀錯体化合物を含有し、必要に応じて、溶媒、安定剤、レベリング剤(Leveling agent)、薄膜補助剤、還元剤、熱分解反応促進剤の添加剤を、銀コーティング組成物に含有することができる。補助剤、還元剤、熱分解反応促進剤の添加剤を、本発明の銀コーティング組成物に含有することができる。
銀反射層を形成する際に、配位子が気化・脱離しうる銀錯体化合物を含有する塗布膜を加熱焼成することにより銀反射層を形成する場合、銀反射層の隣接層に含窒素環状化合物を含有することが好ましい。当該含窒素環状化合物としては、大別して、銀に対する吸着性基を有する腐食防止剤と酸化防止剤が好ましく用いられる。
アンカー層は、樹脂を有し、期脂フィルム状支持体と銀反射層とを密着させるために好ましく設けられる層である。従って、アンカー層は樹脂フィルム状支持体と銀反射層とを密着させる密着性、銀反射層を真空蒸着法等で形成する時の熱にも耐え得る耐熱性、及び銀反射層が本来有する高い反射性能を引き出すための平滑性が必要である。
樹脂フィルム状支持体としては、従来公知の種々の樹脂フィルムを用いることができる。例えば、セルロースエステル系フィルム、ポリエステル系フィルム、ポリカーボネート系フィルム、ポリアリレート系フィルム、ポリスルホン(ポリエーテルスルホンも含む)系フィルム、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステルフィルム、ポリエチレンフィルム、ポリプロピレンフィルム、セロファン、セルロースジアセテートフィルム、セルローストリアセテートフィルム、セルロースアセテートプロピオネートフィルム、セルロースアセテートブチレートフィルム、ポリ塩化ビニリデンフィルム、ポリビニルアルコールフィルム、エチレンビニルアルコールフィルム、シンジオタクティックポリスチレン系フィルム、ポリカーボネートフィルム、ノルボルネン系樹脂フィルム、ポリメチルペンテンフィルム、ポリエーテルケトンフィルム、ポリエーテルケトンイミドフィルム、ポリアミドフィルム、フッ素樹脂フィルム、ナイロンフィルム、ポリメチルメタクリレートフィルム、アクリルフィルム等を挙げることができる。中でも、ポリカーボネート系フィルム、ポリエチレンテレフタレート等のポリエステル系フィルム、ノルボルネン系樹脂フィルム、及びセルロースエステル系フィルム、アクリルフィルムが好ましい。特にポリエチレンテレフタレート等のポリエステル系フィルム又はアクリルフィルムを用いることが好ましく、溶融流延製膜で製造されたフィルムであっても、溶液流延製膜で製造されたフィルムであってもよい。
フィルムミラーの粘着層は、当該粘着層によってフィルムミラーを後述の基材に接合するための層である。なお、フィルムミラーは粘着層の太陽光入射側とは逆側に、剥離シートによる層を有していてもよい。フィルムミラーが剥離シートによる層を有する場合、剥離シートを粘着層から剥離した後、粘着層を介してフィルムミラーを基材に接合させることができる。
フィルムミラーは、粘着層の太陽光入射側と逆側に剥離シートによる層を有していてもよい。例えば、フィルムミラーの出荷時には剥離シートが粘着層に張り付いた状態で出荷し、剥離シートを剥がし粘着層を露出させ、基材に接合させることができる。
太陽光反射用フィルムミラーは自己支持性のある基材に接合させて用いることが好ましい。「自己支持性の基材」という場合の、「自己支持性」とは、太陽光反射用フィルムミラーの基材として用いられる大きさに断裁された場合において、その対向する端縁部分を支持することで、基材を担持することが可能な程度の剛性を有することを表す。太陽光反射用フィルムミラーの基材が自己支持性を有することで、太陽光反射用フィルムミラーを設置する際に取り扱い性に優れるとともに、太陽光反射用フィルムミラーを保持するための保持部材を簡素な構成とすることが可能となるため、反射装置を軽量化することが可能となり、太陽追尾の際の消費電力を抑制することが可能となる。基材は、単層であってもよいし、複数の層を積層させた形状であってもよい。基材は、単一構造でもよいし、複数に分割されていてもよい。
太陽熱発電用反射装置は、太陽光反射用フィルムミラーと太陽光反射用フィルムミラーを保持する保持部材を有する。この太陽熱発電用反射装置を使用する場合、内部に流体を有する筒状部材を集熱部としてフィルムミラーの近傍に設け、筒状部材に太陽光を反射させることで内部の流体を加熱し、その熱エネルギーを変換して発電する、一般的にトラフ型と呼ばれる形態が一形態として挙げられる。また、その他の形態として、図2、図3に示すようなタワー型と呼ばれる形態も挙げられる。タワー型の形態は、少なくとも一つの集熱部14と、太陽光Lを反射して集熱部14に照射するための少なくとも一つの集光鏡11を有しており、集熱部14に集められた熱を用いて液体を加熱しタービンを回して発電するものがある。なお、集熱部14の周囲に、太陽熱発電用反射装置15が複数配置されていることが好ましい。また、それぞれの太陽熱発電用反射装置15が図2に示すように同心円状や、同心の扇状に複数配置されていることが好ましい。図2、3に示すタワー型の形態では支持タワー12の周囲に設置された太陽光反射用フィルムミラー(太陽熱発電用反射装置15)により、太陽光Lが集光鏡11へと反射され、その後、集光鏡11によりさらに反射し、集熱部14へと送られ熱交換施設13へ送られる。本発明はトラフ型、タワー型のどちらにも用いることができる。もちろん、それ以外の種々の太陽熱発電に用いることができる。
太陽熱発電用反射装置は、太陽光反射用フィルムミラーを保持する保持部材を有する。保持部材は、太陽光反反射用フィルムミラーを太陽を追尾可能な状態で保持する事が好ましい。保持部材の形態としては、特に制限はないが、例えば、太陽光反射用フィルムミラーが所望の形状を保持できるように、複数個所を棒状の保持部材により、保持する形態が好ましい。保持部材は太陽を追尾可能な状態で太陽光反射用フィルムミラーを保持する構成を有することが好ましいが、太陽追尾に際しては、手動で駆動させてもよいし、別途駆動装置を設けて自動的に太陽を追尾する構成としてもよい。
樹脂フィルム状支持体1として、二軸延伸ポリエステルフィルム(ポリエチレンテレフタレートフィルム、厚さ25μm)を用いた。このポリエステルフィルムの片面に、ポリエステル系樹脂(ポリエスター SP-181、日本合成化学社製)とTDI(トリレンジイソシアネート)系イソシアネート(2,4-トリレンジイソシアネート)を樹脂固形分比率で10:2に混合し、溶媒としてメチルエチルケトンを加え、更に腐食防止剤としてグリコールジメルカプトアセテート(和光純薬製)10質量%となるよう調製した量を混合し、グラビアコート法によりコーティングして、厚さ60nmのアンカー層2を形成した。
樹脂フィルム状支持体1として、二軸延伸ポリエステルフィルム(ポリエチレンテレフタレートフィルム、厚さ25μm)を用いた。このポリエステルフィルムの片面に、ポリエステル系樹脂(ポリエスター SP-181、日本合成化学社製)とTDI(トリレンジイソシアネート)系イソシアネート(2,4-トリレンジイソシアネート)を樹脂固形分比率で10:2に混合し、溶媒としてメチルエチルケトンを加え、更に腐食防止剤としてグリコールジメルカプトアセテート(和光純薬製)10質量%となるよう調製した量を混合し、グラビアコート法によりコーティングして、厚さ60nmのアンカー層2を形成した。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.1の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、トリアジン系紫外線吸収性基として、Tinuvin405(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.2の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を10部、トリアジン系紫外線吸収性基として、Tinuvin405(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.3の溶液を得た。
得られた紫外線吸収性基含有重合体No.3を用い、前記反射フィルム20上に、ワイヤーバーによりコートし、80℃にて30秒間乾燥させることにより、紫外線吸収性基を樹脂が有する10μmの膜厚の保護層を形成した。その後、ハードコート液Perma‐New 6000(California Hardcoating Company製)をワイヤーバーによりコートし、80℃にて60秒間乾燥後、70℃にて、48時間熱処理を行うことにより、乾燥膜厚3μmのハードコート層を形成し、実施例No.3のフィルムミラーを作製した。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.4の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、トリアジン系紫外線吸収性基として、Tinuvin405(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、ヒンダードアミン系酸化防止剤として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.5の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を5部、トリアジン系紫外線吸収性基として、Tinuvin405(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を5部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.6の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.7の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.8の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を5部、トリアジン系紫外線吸収性基として、Tinuvin405(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を5部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.9の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコにトリアジン系紫外線吸収性基として、Tinuvin1577(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体2を15部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を5部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.10の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin213(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を5部、トリアジン系紫外線吸収性基として、Tinuvin1577(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を5部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.11の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を5部、トリアジン系紫外線吸収性基として、Tinuvin405(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を5部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.12の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾトリアゾール系紫外線吸収性基として、Tinuvin234(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体1を5部、トリアジン系紫外線吸収性基として、Tinuvin477(チバ・ジャパン社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体2を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を5部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.13の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾフェノン系紫外線吸収性基として、CHIMASSORB81(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.14の溶液を得た。
撹拌機、滴下口、温度計、冷却管および窒素ガス導入口を備えたフラスコに、ベンゾフェノン系紫外線吸収性基として、CHIMASSORB81(チバ・ジャパン社製)の化学構造に重合性基として、メタクリロイル基をもった単量体を10部、ヒンダードアミン系酸化防止性基として、LA52(ADEKA社製)の化学構造に、重合性基として、メタクリロイル基をもった単量体3を10部、他の単量体として、メチルメタクリレート(MMA)50部、n-ブチルアクリレート(BA)10部、水酸基含有単量体として2-ヒドロキシエチルメタクリレート(HEMA)10部、溶媒として酢酸エチル120部を仕込み、窒素ガスを流入して撹拌しながら還流温度まで昇温した。一方、滴下槽に酢酸エチル10部と、重合開始剤として2,2’-アゾビス-(2-メチルブチロニトリル)1部との混合物を仕込み、2時間かけて滴下した。滴下終了後も還流反応を続け、滴下開始から6時間後に冷却し、不揮発分が40%となるよう酢酸エチルで希釈して、紫外線吸収性重合体No.15の溶液を得た。
Tinuvin234(チバ・ジャパン社製)10部、溶媒として酢酸エチル120部を用いて溶解し、アクリル樹脂組成物として、MMA50部、BA10部、HEMA10部を混合攪拌し、紫外線吸収剤添加型樹脂組成物No.1を作製した。
Tinuvin234(チバ・ジャパン社製)10部、LA52(ADEKA社製)10部に対して、溶媒として酢酸エチル120部を用いて溶解し、アクリル樹脂組成物として、MMA50部、BA10部、HEMA10部を混合攪拌し、紫外線吸収剤添加型樹脂組成物No.2を作製した。
Tinuvin234(チバ・ジャパン社製)10部、溶媒として酢酸エチル120部を用いて溶解し、アクリル樹脂組成物として、MMA50部、BA10部、HEMA10部を混合攪拌し、紫外線吸収剤添加型樹脂組成物No.3を作製した。
Tinuvin234(チバ・ジャパン社製)10部、LA52(ADEKA社製)10部に対して、溶媒として酢酸エチル120部を用いて溶解し、アクリル樹脂組成物として、MMA50部、BA10部、HEMA10部を混合攪拌し、紫外線吸収剤添加型樹脂組成物No.4を作製した。
Tinuvin234(チバ・ジャパン社製)5部、Tinuvin405(チバ・ジャパン社製)10部、LA52(ADEKA社製)5部に対して、溶媒として酢酸エチル120部を用いて溶解し、アクリル樹脂組成物として、MMA50部、BA10部、HEMA10部を混合攪拌し、紫外線吸収剤添加型樹脂組成物No.5を作製した。
得られた紫外線吸収剤添加型樹脂組成物No.5を前記反射フィルム10上に、ワイヤーバーによりコートし、80℃にて30秒間乾燥させることにより、紫外線吸収性剤を添加した10μmの膜厚の保護層とした。その後、ハードコート液Perma‐New 6000(California Hardcoating Company製)をワイヤーバーによりコートし、80℃にて60秒間乾燥後、70℃にて、48時間熱処理を行うことにより、乾燥膜厚3μmのハードコート層を形成し、比較例No.20のフィルムミラーを作製した。
上記のように作製した太陽光反射用フィルムミラー(実施例1~13及び比較例14~20)について、下記の方法に従って、紫外線照射試験の前後における正反射率、透過率、密着性を測定・評価した。得られた各太陽光反射用フィルムミラーの特性を表1A~1Dに示す。
島津製作所社製の分光光度計「U-4100」を用いて、測定試料の透過率を250nmから2500nmまでの平均反射率として測定する。正反射率に関して、専用の治具を用いて、反射面の法線に対して、入射光の入射角を5°の正反射率を測定する。評価は、同様に250nmから2500nmまでの平均反射率として測定する。
膜の密着性測定する方法で、JIS K 5600に準拠し、試料にカッターでクロス状に傷をつけ、100マスの切り目を入れる。セロハンテープを切れ目部分に貼り付けた後、45°方向に引っ張り、剥離後に塗膜が剥がれていないマス数を計測して、密着性を評価した。
作製した各太陽光反射用フィルムミラーに対し、アイスーパーUVテスター(岩崎電気社製)を用いて、150mW/□の紫外線を65℃の環境下で600時間照射を行い、耐紫外線能を評価した。
2 アンカー層
3 銀反射層
4 樹脂コート層
5 接着層
6 アクリル層
7 保護層
8 ハードコート層
11 集光鏡
12 支持タワー
13 熱交換施設
14 集熱部
15 太陽熱発電用反射装置
Claims (10)
- 樹脂フィルム状支持体、銀反射層、保護層とを有する太陽光反射用フィルムミラーであって、
前記保護層は前記樹脂フィルム状支持体及び前記銀反射層よりも太陽光入射側に設けられており、
前記保護層は樹脂を有し、前記樹脂は(1)及び/または(2)の紫外線吸収性基を有していることを特徴とする太陽光反射用フィルムミラー。
(1)ベンゾトリアゾール系紫外線吸収性基
(2)トリアジン系紫外線吸収性基 - 前記ベンゾトリアゾール系紫外線吸収性基は下記式(1a)または(1b)の組成であり、前記トリアジン系紫外線吸収性基は下記式(2)の組成であることを特徴とする請求項1に記載の太陽光反射用フィルムミラー。
[式中、R1は水素原子または炭素数1~8のアルキル基を表し、R2は炭素数1~6のアルキレン基を表し、R3は水素原子またはメチル基を表し、X1は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数1~6のアルコキシ基、シアノ基またはニトロ基を表す。]
[式中、R4は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数1~4のアルコキシ基、シアノ基またはニトロ基を表し、R5は水素結合を形成し得る元素を有する基を表し、R6は水素原子またはメチル基を表し、R7は水素原子または炭素数1~12のアルキル基を表す。]
[式中、R8、R9、R10、R11、R12、R13、R14およびR15は、互いに独立して、水素原子、炭素数1~10のアルキル基、炭素数2~10のアルケニル基、または、炭素数1~10のアルコキシ基を表し、X2は水素原子またはメチル基を表し、Aは、-(CH2CH2O)p-、-CH2CH(OH)-CH2O-、-(CH2)p-O-、-CH2CH(CH2OR16)-O-、-CH2CH(R16)-O-、または、-CH2(CH2)qCOO-B-O-を表し、R16は炭素数1~10のアルキル基を表し、Bはメチレン基、エチレン基、または、-CH2CH(OH)CH2-を表し、pは1~20の整数を表し、qは0または1を表す。] - 前記樹脂は酸化防止性基を有していることを特徴とする請求項1又は2に記載の太陽光反射用フィルムミラー。
- 前記酸化防止性基はHALSであることを特徴とする請求項3に記載の太陽光反射用フィルムミラー。
- 前記HALSは片側重合基修飾型HALSであることを特徴とする請求項4に記載の太陽光反射用フィルムミラー。
- 前記太陽光反射用フィルムミラーはアクリル層を有しており、
前記アクリル層は前記銀反射層と前記保護層との間に設けられていることを特徴とする請求項1~5の何れか一項に記載の太陽光反射用フィルムミラー。 - 前記銀反射層と前記保護層との間には接着層が存在しないことを特徴とする請求項6に記載の太陽光反射用フィルムミラー。
- 前記太陽光反射用フィルムミラーはアクリル層を有しており、
前記保護層は前記銀反射層と前記アクリル層との間に設けられていることを特徴とする請求項1~5の何れか一項に記載の太陽光反射用フィルムミラー。 - 前記銀反射層の太陽光入射側表面から前記太陽光反射用フィルムミラーの太陽光入射側最表面の総膜厚が5μm以上125μm以下であることを特徴とする請求項1~8の何れか一項に記載の太陽光反射用フィルムミラー。
- 請求項1~9の何れか一項に記載の太陽光反射用フィルムミラーと保持部材とを有していることを特徴とする太陽熱発電用反射装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/367,282 US20150116820A1 (en) | 2011-12-21 | 2012-12-19 | Film mirror for solar light reflection, and reflective device for solar power generation |
EP12860646.4A EP2796904A4 (en) | 2011-12-21 | 2012-12-19 | FILM MIRROR FOR SUNLIGHT REFLECTION AND REFLECTIVE DEVICE FOR A SOLAR POWER GENERATION SYSTEM |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-279516 | 2011-12-21 | ||
JP2011279516 | 2011-12-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013094633A1 true WO2013094633A1 (ja) | 2013-06-27 |
Family
ID=48668517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2012/082903 WO2013094633A1 (ja) | 2011-12-21 | 2012-12-19 | 太陽光反射用フィルムミラー及び太陽熱発電用反射装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20150116820A1 (ja) |
EP (1) | EP2796904A4 (ja) |
JP (1) | JPWO2013094633A1 (ja) |
WO (1) | WO2013094633A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015079803A1 (ja) * | 2013-11-28 | 2015-06-04 | コニカミノルタ株式会社 | フィルムミラー |
WO2015122337A1 (ja) * | 2014-02-13 | 2015-08-20 | コニカミノルタ株式会社 | フィルムミラーおよび太陽熱発電用反射装置 |
WO2015156676A1 (en) * | 2014-04-11 | 2015-10-15 | Aviation Glass & Technology B.V. | Vehicle mirror, and method for manufacturing such a mirror |
WO2016027733A1 (ja) * | 2014-08-22 | 2016-02-25 | コニカミノルタ株式会社 | 光反射フィルム、光反射フィルムの製造方法、光反射フィルムの加飾成型加工方法、合わせガラス及び曲面形状体 |
JP2020529037A (ja) * | 2018-06-29 | 2020-10-01 | エルジー・ケム・リミテッド | 紫外線遮断フィルム |
CN113238311A (zh) * | 2021-07-12 | 2021-08-10 | 翼捷安全设备(昆山)有限公司 | 一种红外滤光片及其制备方法、红外气体传感器 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10942302B2 (en) | 2015-09-16 | 2021-03-09 | Vitro Flat Glass Llc | Solar mirrors and methods of making solar mirrors having improved properties |
DE102021125828B4 (de) | 2021-10-05 | 2024-08-29 | Easymirror Gmbh | Spiegelplattenanordnung |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4542214A (en) | 1982-03-04 | 1985-09-17 | Air Products And Chemicals, Inc. | Carbamate and carbonate salts of tertiary amines |
JP2004142161A (ja) | 2002-10-22 | 2004-05-20 | Matsushita Electric Works Ltd | 表面防汚性複合樹脂フィルム、表面防汚性物品、化粧板 |
JP2005066824A (ja) | 2003-08-21 | 2005-03-17 | Okamoto Machine Tool Works Ltd | ガラス用親水性被覆材 |
JP2005110918A (ja) | 2003-10-07 | 2005-04-28 | Central Glass Co Ltd | 防曇鏡 |
JP2008530001A (ja) | 2005-02-07 | 2008-08-07 | インクテック カンパニー リミテッド | 有機銀錯体化合物及びこれを用いた薄膜形成方法 |
JP2009062216A (ja) | 2007-09-05 | 2009-03-26 | National Institute For Materials Science | 結晶成長用基板とこれを用いた結晶成長方法 |
JP2009535661A (ja) | 2006-04-29 | 2009-10-01 | インクテック カンパニー リミテッド | 有機銀錯体化合物を含む反射膜コーティング液組成物及びこれを用いた反射膜の製造方法 |
JP2009226613A (ja) | 2008-03-19 | 2009-10-08 | Nitto Denko Corp | 親水性シート |
JP2010500475A (ja) | 2006-08-07 | 2010-01-07 | インクテック カンパニー リミテッド | 銀ナノ粒子の製造方法及びこれにより製造される銀ナノ粒子を含む銀インク組成物 |
JP2010007027A (ja) | 2008-06-30 | 2010-01-14 | Nippon Shokubai Co Ltd | 紫外線吸収性樹脂組成物、および該紫外線吸収性樹脂組成物を用いた積層体 |
JP2011150316A (ja) | 2009-12-21 | 2011-08-04 | Konica Minolta Opto Inc | 太陽熱発電用フィルムミラー、その製造方法及び太陽熱発電用反射装置 |
JP2011150258A (ja) * | 2010-01-25 | 2011-08-04 | Panasonic Electric Works Co Ltd | コーティング反射板 |
JP2011173365A (ja) * | 2010-02-25 | 2011-09-08 | Mitsubishi Plastics Inc | 反射フィルム |
JP2011203553A (ja) * | 2010-03-26 | 2011-10-13 | Konica Minolta Opto Inc | フィルムミラー、その製造方法及び太陽光反射用ミラー |
JP2011206084A (ja) * | 2010-03-27 | 2011-10-20 | Konica Minolta Opto Inc | 反射装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6245915B1 (en) * | 1999-05-03 | 2001-06-12 | Ciba Specialty Chemicals Corporation | Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety |
TW200726797A (en) * | 2005-09-27 | 2007-07-16 | Nippon Catalytic Chem Ind | Resin composition for forming UV-absorbing layer and UV-absorbing-layer-containing multilayer body |
JPWO2011096248A1 (ja) * | 2010-02-02 | 2013-06-10 | コニカミノルタアドバンストレイヤー株式会社 | 太陽熱発電用光反射フィルム、その製造方法、及びそれを用いた太陽熱発電用反射装置 |
JP5920211B2 (ja) * | 2010-03-27 | 2016-05-18 | コニカミノルタ株式会社 | 太陽熱発電用フィルムミラー、太陽熱発電用フィルムミラーの製造方法及び太陽熱発電用反射装置 |
WO2012026312A1 (ja) * | 2010-08-25 | 2012-03-01 | コニカミノルタオプト株式会社 | 太陽熱発電用フィルムミラー、太陽熱発電用フィルムミラーの製造方法及び太陽熱発電用反射装置 |
-
2012
- 2012-12-19 WO PCT/JP2012/082903 patent/WO2013094633A1/ja active Application Filing
- 2012-12-19 EP EP12860646.4A patent/EP2796904A4/en not_active Withdrawn
- 2012-12-19 US US14/367,282 patent/US20150116820A1/en not_active Abandoned
- 2012-12-19 JP JP2013550303A patent/JPWO2013094633A1/ja active Pending
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4542214A (en) | 1982-03-04 | 1985-09-17 | Air Products And Chemicals, Inc. | Carbamate and carbonate salts of tertiary amines |
JP2004142161A (ja) | 2002-10-22 | 2004-05-20 | Matsushita Electric Works Ltd | 表面防汚性複合樹脂フィルム、表面防汚性物品、化粧板 |
JP2005066824A (ja) | 2003-08-21 | 2005-03-17 | Okamoto Machine Tool Works Ltd | ガラス用親水性被覆材 |
JP2005110918A (ja) | 2003-10-07 | 2005-04-28 | Central Glass Co Ltd | 防曇鏡 |
JP2008530001A (ja) | 2005-02-07 | 2008-08-07 | インクテック カンパニー リミテッド | 有機銀錯体化合物及びこれを用いた薄膜形成方法 |
JP2009535661A (ja) | 2006-04-29 | 2009-10-01 | インクテック カンパニー リミテッド | 有機銀錯体化合物を含む反射膜コーティング液組成物及びこれを用いた反射膜の製造方法 |
JP2010500475A (ja) | 2006-08-07 | 2010-01-07 | インクテック カンパニー リミテッド | 銀ナノ粒子の製造方法及びこれにより製造される銀ナノ粒子を含む銀インク組成物 |
JP2009062216A (ja) | 2007-09-05 | 2009-03-26 | National Institute For Materials Science | 結晶成長用基板とこれを用いた結晶成長方法 |
JP2009226613A (ja) | 2008-03-19 | 2009-10-08 | Nitto Denko Corp | 親水性シート |
JP2010007027A (ja) | 2008-06-30 | 2010-01-14 | Nippon Shokubai Co Ltd | 紫外線吸収性樹脂組成物、および該紫外線吸収性樹脂組成物を用いた積層体 |
JP2011150316A (ja) | 2009-12-21 | 2011-08-04 | Konica Minolta Opto Inc | 太陽熱発電用フィルムミラー、その製造方法及び太陽熱発電用反射装置 |
JP2011150258A (ja) * | 2010-01-25 | 2011-08-04 | Panasonic Electric Works Co Ltd | コーティング反射板 |
JP2011173365A (ja) * | 2010-02-25 | 2011-09-08 | Mitsubishi Plastics Inc | 反射フィルム |
JP2011203553A (ja) * | 2010-03-26 | 2011-10-13 | Konica Minolta Opto Inc | フィルムミラー、その製造方法及び太陽光反射用ミラー |
JP2011206084A (ja) * | 2010-03-27 | 2011-10-20 | Konica Minolta Opto Inc | 反射装置 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015079803A1 (ja) * | 2013-11-28 | 2015-06-04 | コニカミノルタ株式会社 | フィルムミラー |
WO2015122337A1 (ja) * | 2014-02-13 | 2015-08-20 | コニカミノルタ株式会社 | フィルムミラーおよび太陽熱発電用反射装置 |
WO2015156676A1 (en) * | 2014-04-11 | 2015-10-15 | Aviation Glass & Technology B.V. | Vehicle mirror, and method for manufacturing such a mirror |
US10180517B2 (en) | 2014-04-11 | 2019-01-15 | Aviation Glass & Technology Holding B.V. | Vehicle mirror, and method for manufacturing such a mirror |
WO2016027733A1 (ja) * | 2014-08-22 | 2016-02-25 | コニカミノルタ株式会社 | 光反射フィルム、光反射フィルムの製造方法、光反射フィルムの加飾成型加工方法、合わせガラス及び曲面形状体 |
CN107076888A (zh) * | 2014-08-22 | 2017-08-18 | 柯尼卡美能达株式会社 | 光反射膜、光反射膜的制造方法、光反射膜的装饰成型加工方法、夹层玻璃和曲面形状体 |
JP2020529037A (ja) * | 2018-06-29 | 2020-10-01 | エルジー・ケム・リミテッド | 紫外線遮断フィルム |
US11549025B2 (en) | 2018-06-29 | 2023-01-10 | Lg Chem, Ltd. | Film for blocking ultraviolet rays |
CN113238311A (zh) * | 2021-07-12 | 2021-08-10 | 翼捷安全设备(昆山)有限公司 | 一种红外滤光片及其制备方法、红外气体传感器 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2013094633A1 (ja) | 2015-04-27 |
EP2796904A1 (en) | 2014-10-29 |
US20150116820A1 (en) | 2015-04-30 |
EP2796904A4 (en) | 2015-08-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2013094633A1 (ja) | 太陽光反射用フィルムミラー及び太陽熱発電用反射装置 | |
JP6176116B2 (ja) | フィルムミラーの製造方法 | |
WO2012165460A1 (ja) | 太陽熱発電用反射装置、フィルムミラー及びフィルムミラーの製造方法 | |
JP5691811B2 (ja) | フィルムミラー、太陽光反射用ミラー及び太陽熱発電用反射装置 | |
WO2012133517A1 (ja) | ミラー及び太陽熱発電用反射装置 | |
JP5742726B2 (ja) | フィルムミラー、その製造方法及び太陽光反射用ミラー | |
US20130155497A1 (en) | Film mirror for solar thermal power generation,emthod for producing film mirror for solar thermal power generation, and reflectng device for solar thermal power generation | |
JP5962014B2 (ja) | フィルムミラー及びその製造方法 | |
JP5516603B2 (ja) | フィルムミラー、その製造方法及び太陽熱発電用反射装置 | |
WO2011078156A1 (ja) | フィルムミラー、その製造方法、それを用いた太陽熱発電用反射装置 | |
JP2015121806A (ja) | フィルムミラー、その製造方法、及び太陽光集光用フィルムミラー | |
JP5672071B2 (ja) | フィルムミラーの製造方法、フィルムミラー及び太陽熱発電用反射装置 | |
JP2012047861A (ja) | フィルムミラー、その製造方法、及び太陽光集光用フィルムミラー | |
WO2014061497A1 (ja) | フィルムミラー及び太陽熱発電用反射装置 | |
JP5794232B2 (ja) | 太陽熱発電用フィルムミラー、その製造方法及び太陽熱発電用反射装置 | |
WO2011077982A1 (ja) | フィルムミラー、その製造方法、それを用いた太陽熱発電用反射装置 | |
JPWO2014061497A6 (ja) | フィルムミラー及び太陽熱発電用反射装置 | |
WO2012057003A1 (ja) | 太陽熱発電用フィルムミラー及び太陽熱発電用反射装置 | |
JP5747547B2 (ja) | フィルムミラーおよび太陽熱発電用反射装置 | |
WO2013054869A1 (ja) | 太陽光反射用ミラー及び太陽熱発電用反射装置 | |
JPWO2012043606A1 (ja) | 太陽熱発電用フィルムミラー、太陽熱発電用フィルムミラーの製造方法及び太陽熱発電用反射装置 | |
WO2015079803A1 (ja) | フィルムミラー | |
JP2016009034A (ja) | 光反射フィルム |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12860646 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2013550303 Country of ref document: JP Kind code of ref document: A |
|
REEP | Request for entry into the european phase |
Ref document number: 2012860646 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012860646 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14367282 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |