WO2012133616A1 - 放電ランプ - Google Patents

放電ランプ Download PDF

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Publication number
WO2012133616A1
WO2012133616A1 PCT/JP2012/058304 JP2012058304W WO2012133616A1 WO 2012133616 A1 WO2012133616 A1 WO 2012133616A1 JP 2012058304 W JP2012058304 W JP 2012058304W WO 2012133616 A1 WO2012133616 A1 WO 2012133616A1
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WO
WIPO (PCT)
Prior art keywords
line
light
light receiving
spectral sensitivity
spectral
Prior art date
Application number
PCT/JP2012/058304
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
昭芳 藤森
金井　信夫
和正 藤原
圭 上条
陽佑 南雲
Original Assignee
株式会社オーク製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社オーク製作所 filed Critical 株式会社オーク製作所
Priority to KR1020137025788A priority Critical patent/KR101867527B1/ko
Priority to CN201280016296.5A priority patent/CN103460137B/zh
Publication of WO2012133616A1 publication Critical patent/WO2012133616A1/ja

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0219—Electrical interface; User interface
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0233—Handheld
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/82—Lamps with high-pressure unconstricted discharge having a cold pressure > 400 Torr
    • H01J61/822—High-pressure mercury lamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/84—Lamps with discharge constricted by high pressure
    • H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/36—Controlling
    • H05B41/38—Controlling the intensity of light

Definitions

  • the present invention relates to a photometric device that measures light such as illuminance, and more particularly to light measurement with respect to radiated light of a discharge lamp used in an exposure device or the like.
  • pattern light is projected onto a substrate coated with a photosensitive material such as a photoresist to form a pattern on the photosensitive material.
  • a photosensitive material such as a photoresist
  • lighting control is performed by measuring the illuminance and the like using a photometric device between exposures and adjusting the power supplied to the discharge lamp (for example, see Patent Documents 1 and 2).
  • a high-pressure / ultra-high-pressure mercury lamp that emits light including bright lines of g-line (436 nm), h-line (405 nm), and i-line (365 nm) is used (see Patent Document 3).
  • the photosensitive material also has sensitivity characteristics based on bright lines.
  • a filter that removes light other than g-line, h-line, and i-line is provided, and illuminance is measured based on light transmitted through the filter (for example, , See Patent Document 4).
  • the illuminance is detected using a filter with peak transmittance in line with the emission line for a discharge lamp with such radiation characteristics, it will be affected by noise-like spectral fluctuations near the peak, and the illuminance over the entire spectrum will be reduced. It cannot be detected accurately. As a result, power adjustment based on erroneous illuminance measurement is performed, and unnecessary power fluctuations frequently occur during lamp lighting, which affects the lamp life. In addition, an erroneous photometric value is detected in photometric calculations other than illuminance.
  • the present invention is directed to realizing a photometric apparatus and an exposure apparatus that appropriately measure light from a discharge lamp without being affected by noise-induced discharge fluctuations.
  • the exposure apparatus of the present invention includes a discharge lamp that emits spectral light including g-line (436 nm), h-line (405 nm), and i-line (365 nm) emission lines, and illuminance measurement means that measures light emitted from the discharge lamp. And a light adjusting means for adjusting the power supplied to the discharge lamp based on the measured value.
  • the discharge lamp As the discharge lamp, a high-pressure or ultrahigh-pressure mercury lamp can be applied.
  • a spectrum including g-line, h-line, and i-line emission line spectra is generated, and the spectrum distribution of the emitted light corresponds to the three emission lines. It exhibits a continuous spectral distribution curve with a large relative spectral intensity in a narrow wavelength region.
  • the discharge lamp can be applied as a mercury lamp sealed in a discharge tube with a mercury of 0.2 mg / mm 3 or more.
  • the light receiving unit of the light measuring means includes, for example, a light receiving element such as a photoelectric conversion element and a filter disposed on the incident light path, and performs measurement based on an electric signal generated by light incident on the light receiving element.
  • the spectral sensitivity characteristic of the light receiving unit is determined based on the spectral sensitivity characteristic of the light receiving element and the spectral transmittance characteristic of the filter. When the spectral sensitivity of the light receiving element is approximately constant over the entire wavelength range without having a deviating sensitivity in the specific wavelength range, the spectral transmission characteristic of the filter appears as it is as the spectral sensitivity characteristic of the light receiving unit.
  • the light measurement means can measure any of various physical quantities related to the emitted light of the discharge lamp, such as illuminance, luminance, and light quantity, as measurement values.
  • the light adjusting means adjusts the supplied power so as to maintain the measured photometric value at an appropriate value or a constant value.
  • the spectral sensitivity characteristic of the light measurement means is between two adjacent bright lines, i.e., between i line (365 nm) and h line (405 nm), or between h line (405 nm) and g line (436 nm). Between the two, peak sensitivity is provided.
  • the peak sensitivity of the light receiving portion is at a position shifted from the h-line and i-line that should be watched, and the sensitivity (spectral value) corresponding to the h-line and i-line in the spectral sensitivity characteristic is lower than the peak sensitivity. Since the sensitivity (spectrum value) decreases toward the i-line and h-line with the peak sensitivity at the top, even if a dominant discharge fluctuation of noise occurs near the bright line, the fluctuation is not greatly affected by the discharge lamp. Can be measured.
  • the spectral sensitivity characteristic can be represented by a substantially Gaussian distribution curve (normal distribution) centered on the peak sensitivity, or can be represented by a band pass (band).
  • the spectral sensitivity curve may be configured such that the peak sensitivity is as far as possible from i-line and h-line or g-line or i-line.
  • a peak may be provided in the intermediate region.
  • the light measurement means may have an effective sensitivity characteristic in which the half-value width of the spectral sensitivity curve is wider than the wavelength range between the i-line and the h-line. Thereby, the spectral intensity in the wavelength region between the i-line and the h-line is detected with high accuracy as a whole.
  • the sensitivity should be 85% or less of the peak sensitivity, and the spectral sensitivity curve has a wider half-value width than the wavelength range between the h-line and i-line. That's fine. As a result, it is possible to eliminate the influence of noise and to more reliably detect the overall spectrum variation.
  • a photometric device performs photometric calculation based on a light receiving unit having a light receiving element such as a photoelectric conversion element, a filter disposed on an incident optical path, and light incident on the light receiving element.
  • a light receiving portion having a spectral sensitivity characteristic having a peak sensitivity between two adjacent bright lines of g-line (436 nm), h-line (405 nm), and i-line (365 nm). .
  • the present invention it is possible to measure accurate illuminance, luminance, light quantity, etc. by the spectral sensitivity characteristics of the light receiving section, and it is possible to realize accurate photometry of the discharge lamp.
  • the above-described spectral sensitivity characteristic can be applied.
  • the photometric device can detect, for example, illuminance, luminance, light amount, etc., and can be configured as an illuminometer, luminance meter, and light meter, respectively.
  • the photometric device can be configured as a handycam type photometric device, for example, and the light receiving unit and the measuring unit may be integrated. Alternatively, the light receiving unit and the measurement unit can be connected via a signal cable.
  • the light receiving unit may be connected to the desktop type photometric device main body with a cable.
  • the photometric device can be used by being incorporated in the exposure device or the light source device, or can be configured to perform photometry by installing the photometric device on a drawing table or the like in the exposure preparation stage.
  • a photometric device includes a light receiving unit having a light receiving element, a filter disposed on an incident optical path, and a measuring unit that performs photometric calculation based on light incident on the light receiving element. It has a spectral sensitivity characteristic having a peak sensitivity between two matched bright lines.
  • FIG. 1 is a schematic block diagram of an exposure apparatus according to the first embodiment.
  • the exposure apparatus 10 is a maskless exposure apparatus that directly forms a pattern on a substrate SW having a photosensitive material such as a photoresist formed on the surface thereof, and includes a discharge lamp 21 and a DMD (Digital Micro-mirror Device) 24.
  • the substrate SW is irradiated based on the light from the discharge lamp 21 to form a pattern on the surface of the substrate SW.
  • the discharge lamp 21 is a high-pressure or ultrahigh-pressure mercury lamp and contains, for example, 0.2 mg / mm 3 or more of mercury.
  • the spectrum of the discharge lamp has a continuous spectral distribution at about 330 nm to 480 nm and emits g-line (436 nm), h-line (405 nm), and i-line (365 nm) emission line spectrum light.
  • the light emitted from the discharge lamp 21 is shaped into parallel light by the illumination optical system 23 and guided to the DMD 24 through the mirror 25, the half mirror 27A, and the mirror 27B.
  • the DMD 24 is a light modulation element array (for example, 1024 ⁇ 768) in which micro rectangular micromirrors of several ⁇ m to several tens ⁇ m are two-dimensionally arranged in a matrix, and is controlled by the exposure control unit 60.
  • each micromirror is selectively ON / OFF controlled based on the exposure data sent from the exposure control unit 60.
  • the light reflected by the micromirror in the ON state is guided to the projection optical system 28 via the half mirror 27A.
  • the light beam formed by the reflected light from the ON state mirror, that is, the light of the pattern image is irradiated onto the substrate SW.
  • a pattern is formed on the entire substrate while moving the substrate SW.
  • the exposure apparatus 10 includes an illuminance measurement control device 50 including an illuminance calculation control unit 30 and a light receiving unit 40.
  • the illuminance measurement control device 50 measures the illuminance of the discharge lamp 21 and performs constant illuminance lighting control.
  • the light from the discharge lamp 21 is guided to the light receiving unit 40 by moving the light receiving unit 40 to the irradiation region of the projection optical system 28.
  • the illuminance measurement is performed based on the light incident on the light receiving unit 40 from the end of drawing on one substrate to the start of drawing on the next substrate.
  • the light receiving unit 40 includes a light receiving element 41 composed of a photoelectric conversion element and the like, and a filter 42 disposed to face the light receiving surface of the light receiving element 41, and light incident from a window (not shown) of the housing part is The light enters the light receiving element 41 through the filter 42 on the incident optical path.
  • the filter 42 has a spectral transmittance characteristic that transmits light in a predetermined band including g-line (436 nm), h-line (405 nm), and i-line (365 nm), and a wavelength region other than that band. Remove the light. A signal generated by the light incident on the light receiving element 41 is sent to the illuminance calculation control unit 30.
  • the signal input to the illuminance calculation control unit 30 is amplified by the amplifier 35 and then converted into a digital signal by the A / D converter 34. Then, the illuminance is calculated in the calculation unit 36.
  • the illuminance calculation method is obtained by a conventionally known method.
  • the illuminance control unit 33 adjusts the power supplied from the lamp driving unit 32 to the discharge lamp 21 based on the illuminance data. Thereby, while the lamp is lit, light is irradiated from the discharge lamp 21 to the substrate SW with a constant illuminance.
  • FIG. 2 is a diagram showing the spectral sensitivity characteristics of the light receiving section.
  • FIG. 3 is a diagram showing the spectral sensitivity characteristic of the light receiving unit and the spectral distribution characteristic of the discharge lamp. The spectral sensitivity characteristics of the light receiving unit will be described with reference to FIGS.
  • the photosensitive material of the substrate SW on which a pattern is formed by the exposure apparatus 10 often has a photosensitive characteristic that reacts with g-rays, h-rays, or i-rays as mercury rays.
  • the spectral sensitivity curve L1 of the light receiving unit 40 is a curve that approximates a Gaussian distribution over the wavelength range 340 to 480 nm according to these emission lines, and has a peak sensitivity P1 at 385 nm.
  • the sensitivity at the h-line (405 nm) is P2
  • the sensitivity at the i-line (365 nm) is P3, which is a substantially symmetrical distribution curve centering on the peak P1 having the highest relative spectral value.
  • FIG. 3 shows the spectral distribution curve SP of the discharge lamp 21 together with the spectral sensitivity curve L1 of the light receiving section.
  • the spectral sensitivity curve L1 of the light receiving unit is based on the spectral transmittance characteristic of the filter 42 and the spectral sensitivity characteristic of the light receiving element 41.
  • the discharge lamp 21 emits continuous spectrum light including g-line (436 nm), h-line (405 nm), and i-line (365 nm) emission lines, and has a sharp spectral power with a narrow wavelength width of around 436 nm, 405 nm, and 365 nm. It has.
  • the spectral change is relatively gradual, and a continuous distribution curve spread over a wide range.
  • FIG. 3 shows a spectral distribution curve in which the spectral value suddenly decreases in the vicinity of the g-line (436 nm), h-line (405 nm), and i-line (365 nm), and the self-absorption phenomenon of the discharge lamp 21 appears prominently.
  • Spectral distribution characteristics are illustrated. Such spectral fluctuations in a specific narrow wavelength range occur irregularly during lighting.
  • the wavelength range with high sensitivity in the spectral sensitivity curve L1 is excluded from the h-line and i-line, and is not affected by fluctuations in the spectral distribution due to self-absorption, and the wavelength between the h-line and i-line. Light is transmitted over the entire area.
  • the spectral power of the light incident on the light receiving element 41 becomes light that is not controlled by noise-like spectral fluctuations, and the actual illuminance is appropriately detected. And based on the illumination intensity detected appropriately, the constant illumination illumination which adjusted the electric power supplied to the discharge lamp 21 is performed, and frequent power adjustment is suppressed.
  • the exposure apparatus 10 that forms a pattern using the discharge lamp 21 includes the illuminance measurement control device 50 including the illuminance calculation control unit 30 and the light receiving unit 40, and the light receiving unit 40.
  • the peak P1 is shifted from the h-line (405 nm) and the i-line (365 nm), and is provided in a substantially intermediate wavelength region from two adjacent bright lines.
  • the sensitivity for h-line and i-line is lower than the peak sensitivity, and the sensitivity ratio R1 at the wavelength of h-line and the sensitivity ratio R2 at the wavelength of i-line are 85% or less of P1.
  • the half-value width ( ⁇ / 2) of the spectral sensitivity curve is wider than the wavelength region between the h-line and the i-line.
  • a photometric device according to the second embodiment will be described with reference to FIGS.
  • a photometric device independent of the exposure device is used for illuminance measurement.
  • FIG. 4 is a schematic diagram of an illuminometer in the second embodiment.
  • the handycam type illuminance meter 100 includes a main body 120 including a display unit 129 and a light receiving unit 110, and the light receiving unit 110 is connected to a connection unit 127 of the main body 120 via a signal cable 130 attached to the light receiving unit 110. Connected. In order to measure illuminance in an exposure apparatus (not shown), the light receiving unit 110 of the illuminometer 100 is placed on the substrate mounting stage, and the light receiving unit 110 is moved to a predetermined measurement point. And the illumination intensity displayed on the display part 129 of the main body 120 is confirmed, and the electric power supplied to a discharge lamp is adjusted.
  • FIG. 5 is a block diagram of an illuminometer according to the second embodiment.
  • the light receiving unit 110 includes a filter 114 and a light receiving element 116 below a window 112 provided on the upper surface of the light receiving unit main body 110H, and the light receiving unit 110 is disposed to face the light receiving element 116.
  • a light receiving unit 110 ′ having a spectral sensitivity characteristic described later can be selectively connected to the main body 120.
  • FIG. 6 is a diagram showing the spectral sensitivity characteristics of the light receiving unit different from the first embodiment.
  • the spectral sensitivity curve L2 has the peak P2 in the approximate middle between the g-line and the h-line, it is not affected by the noise-dominated spectrum fluctuation due to self-absorption and the like, and The spectral light in the entire wavelength range is appropriately transmitted and guided to the light receiving element 116.
  • the electrical signal generated in the light receiving element 116 of the light receiving unit 110 or the light receiving element 116 'of the light receiving unit 110' is amplified by the amplifier 122 and then converted into a digital signal by the A / D converter 124. Then, the illuminance is calculated in the calculation unit 128. The obtained illuminance data is displayed on the display unit 129.
  • the controller 126 controls the power supply circuit and signal processing circuit inside the main body.
  • the illuminance meter is configured as a photometric device.
  • other photometric devices such as a luminance meter, an integrated light meter, and an integrated intensity meter can be applied.
  • the luminance, light quantity, intensity, and the like are calculated from a signal based on the received light according to a conventionally known arithmetic processing method.
  • the main body 120 can be configured not only as a handy cam type but also as a desktop device.
  • the filter may be selectively detachably attached to the light receiving unit by a slide mechanism using a guide groove.
  • the discharge lamp a mercury lamp other than the above can be used, and a discharge lamp that emits continuous spectrum light including a continuous spectrum and a bright line of g-line, h-line, and i-line is applicable. Is possible. Alternatively, a discharge lamp that emits continuous spectrum light including a plurality of other bright lines may be used.
  • the photometric device is configured to have spectral sensitivity characteristics that match the characteristics of the discharge lamp. Further, when the illuminance measuring device is incorporated in the exposure apparatus as in the first embodiment, a configuration having sensitivity characteristics by a filter may be used.
  • This example is composed of an illuminometer provided with a light receiving portion having the spectral sensitivity characteristics described in the first and second embodiments.
  • a comparison experiment with a conventional illuminometer provided with a light receiving portion having spectral sensitivity characteristics was performed.
  • FIG. 7 is a diagram showing spectral sensitivity characteristics of a conventional light receiving portion (hereinafter referred to as a first conventional light receiving portion) corresponding to i-line (365 nm).
  • FIG. 8 is a diagram showing spectral sensitivity characteristics of a conventional light receiving unit (hereinafter referred to as a second conventional light receiving unit) corresponding to h line (405 nm).
  • the spectral sensitivity curve L3 shown in FIG. 7 is a distribution curve having a peak sensitivity of about 355 nm, and has a maximum sensitivity on the short wavelength side near the i-line (365 nm).
  • a spectral sensitivity curve L4 shown in FIG. 8 is a distribution curve having a peak sensitivity of about 405 nm, and has a maximum sensitivity on the short wavelength side near the h line (405 nm).
  • Sensitivity ratio R41 0.75 at the wavelength of g-line (436 nm)
  • sensitivity ratio 42 0.99 at the wavelength of h-line (405 nm)
  • sensitivity ratio R43 0.35 at the wavelength of i-line (365 nm)
  • the half-value width ⁇ / 2 of the spectral sensitivity curve is 75 nm.
  • Each spectral sensitivity curve has a peak sensitivity in a wavelength range that is easily affected by noise-like spectral fluctuations due to self-absorption.
  • FIG. 9 is a graph showing fluctuations in lamp supply power when constant illuminance lighting control is performed using the first and second conventional light receiving units shown in FIGS.
  • FIG. 10 is a graph showing power fluctuations when constant illuminance lighting control is performed using the light receiving unit of the present embodiment.
  • a super-high pressure mercury lamp of mercury 0.2 mg / mm 3 or more was used as a discharge lamp, and constant illumination lighting control was performed.
  • FIG. 10 is a graph showing fluctuations in lamp supply power when constant illumination lighting control is performed using the light receiving unit of the present embodiment.
  • power adjustment is performed with almost no large power fluctuation. This is because, by using the light receiving unit of the present embodiment described above, the entire spectrum power is accurately detected and an appropriate power adjustment is performed without being affected by the radiation spectrum fluctuation in which noise becomes dominant.
  • 10 shows the power fluctuation of the discharge lamp which is an example according to the first embodiment, but the discharge lamp which is an example according to the second embodiment is also accompanied by a large power fluctuation. Absent.
  • FIG. 11 is a diagram showing changes in the spectral distribution measured when the supplied power is adjusted stepwise.
  • the power distribution is changed in steps of 20 W in the range of 170 W to 250 W, and the spectrum distributions SL1 to SL5 at that time are shown.
  • the spectral intensity of the spectral distribution curve decreases as a whole.
  • the spectral distribution shown in FIG. 11 is a graph created based on the spectral distribution curve obtained by measuring the light emitted from the discharge lamp and passing through the optical system with the multi-side optical system MC-3000-28C (manufactured by Otsuka Electronics Co., Ltd.). It is.
  • FIG. 12 is a graph plotting the spectral relative integrated intensity for each power.
  • the relative integrated value obtained by integrating the values obtained by multiplying the spectral distribution curve measured for each supply power by the sensitivity curve of the light receiving unit is graphed in comparison with each light receiving unit.
  • the integrated value of the second conventional light receiving unit when the supplied power is 250 W as a reference (100%) the ratio of the integrated intensity in the supplied power of each light receiving unit is shown.
  • the spectral distribution curve calculated for each supply power shown in FIG. 11 is multiplied by the spectral sensitivity curve shown in FIG. 2 for each unit wavelength (1 nm), and 300 nm.
  • the integrated value between 500 nm and 500 nm is obtained and shown as a ratio to the integrated value of the second conventional light receiving unit when the supplied power calculated by the same method is 250 W.
  • the spectrum relative integrated intensity in each light receiving unit decreases with reference to the supplied power of 250 W, and the integrated intensity decreases almost in proportion to the amount of power change.
  • the overall spectral relative integrated intensity is large.
  • FIG. 13 is a graph showing the rate of change of the spectral relative integrated intensity.
  • the rate of change of the integrated intensity when the input power is 170 W is used as a reference.
  • the rate of change is greatest when the light receiving unit of this embodiment is used.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
PCT/JP2012/058304 2011-03-30 2012-03-29 放電ランプ WO2012133616A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020137025788A KR101867527B1 (ko) 2011-03-30 2012-03-29 측광 장치 및 노광 장치
CN201280016296.5A CN103460137B (zh) 2011-03-30 2012-03-29 测光装置和曝光装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-074420 2011-03-30
JP2011074420A JP5723652B2 (ja) 2011-03-30 2011-03-30 測光装置および露光装置

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WO2012133616A1 true WO2012133616A1 (ja) 2012-10-04

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JP (1) JP5723652B2 (zh)
KR (1) KR101867527B1 (zh)
CN (1) CN103460137B (zh)
TW (1) TWI536119B (zh)
WO (1) WO2012133616A1 (zh)

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TWI629568B (zh) 2013-08-09 2018-07-11 日商奧克製作所股份有限公司 照明裝置及包含該照明裝置的曝光裝置
KR20150134527A (ko) 2014-05-22 2015-12-02 주식회사 만도 유압 밸브의 코일 전류 측정 장치 및 그 코일 전류 측정 방법

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