WO2011125699A1 - 積層体及びその製造方法 - Google Patents
積層体及びその製造方法 Download PDFInfo
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- WO2011125699A1 WO2011125699A1 PCT/JP2011/057951 JP2011057951W WO2011125699A1 WO 2011125699 A1 WO2011125699 A1 WO 2011125699A1 JP 2011057951 W JP2011057951 W JP 2011057951W WO 2011125699 A1 WO2011125699 A1 WO 2011125699A1
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- intermediate layer
- layer
- surface layer
- laminate
- active energy
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- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- PHPGKIATZDCVHL-UHFFFAOYSA-N trimethyl(propoxy)silane Chemical compound CCCO[Si](C)(C)C PHPGKIATZDCVHL-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Images
Classifications
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- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
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- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
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- G—PHYSICS
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/536—Hardness
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2475/00—Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
- C08J2475/04—Polyurethanes
- C08J2475/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C08J2475/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
Definitions
- the present invention relates to a laminate and a method for producing the same, and more particularly to a laminate having excellent scratch resistance even when, for example, a nano-concave structure is provided on the surface.
- a nano uneven structure having a nano uneven structure on the surface exhibits antireflection performance due to a continuous change in refractive index.
- the nano uneven structure can also exhibit super water-repellent performance due to the lotus effect.
- the surface of the nano concavo-convex structure is easy to incline the nano-scale convex part, and the scratch resistance and durability are lower than the smooth surface formed of the same resin.
- Examples of the method for forming the nano uneven structure include, for example, a method of injection molding or press molding using a stamper in which an inverted structure of the nano uneven structure is formed, and an active energy ray-curable resin composition between the stamper and the transparent substrate.
- a material hereinafter referred to as “resin composition”
- the resin composition is cured by irradiation with active energy rays
- the stamper is removed after transferring the uneven shape of the stamper
- the unevenness of the stamper on the resin composition A method has been proposed in which the stamper is peeled after the shape is transferred, and then the resin composition is cured by irradiation with active energy rays.
- a method of transferring the nano uneven structure by curing the resin composition by irradiation with active energy rays is preferable. This method is particularly suitable when a belt-shaped or roll-shaped stamper capable of continuous production is used, and is a method with excellent productivity.
- a resin having a high crosslink density and a high elastic modulus is used in order to prevent the convex portion from being inclined when the stamper is released or by heating.
- the distance between adjacent convex portions or concave portions be a size equal to or smaller than the wavelength of visible light.
- Such a nano uneven structure is inferior in scratch resistance as compared with a molded article such as a hard coat having a smooth surface produced using the same resin composition, and has a problem in durability during use.
- the resin composition used for preparation of the nano uneven structure is not sufficiently robust, a phenomenon in which the protrusions come close to each other easily due to release from the mold or heating.
- a nano concavo-convex structure in which a nano concavo-convex structure is formed by a method of curing a resin composition by irradiation of active energy rays and transferring the nano concavo-convex structure, or a resin composition for forming a nano concavo-convex structure has been proposed.
- Patent Document 1 describes that a nano concavo-convex structure having a wavelength less than or equal to the wavelength of visible light is produced using a silica sol that is closely packed as a template.
- a polyfunctional monomer having an extremely high number of double bonds per molecular weight such as trimethylolpropane triacrylate is used.
- Patent Document 2 describes that the hard coat layer having fine irregularities is desirably a resin having a hardness of “H” or higher in a pencil hardness test according to JIS K5600-5-4 (paragraph 0022). ).
- polyfunctional monomers having an extremely high number of double bonds per molecular weight such as dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, and pentaerythritol tetraacrylate, are used.
- an intermediate layer (Patent Documents 2 and 3) that increases the adhesion and adhesion between the base film and the surface of the nano uneven structure, and a refractive index adjustment layer (Patent Document) below the nano uneven structure surface to enhance the antireflection effect. 4) and an antireflection film (Patent Document 5) in which an intermediate layer having a function of restoring dents (self-healing function) and a hard coat layer having a different refractive index are provided thereon (Patent Document 5) are also reported. ing.
- the nano uneven structures described in Patent Documents 1 to 4 do not always satisfy the scratch resistance.
- the fine projections may be bent or bent, and the antireflection performance may be impaired.
- Applications will be limited.
- Even when an intermediate layer is provided the purpose is to improve adhesiveness and antireflection performance, and the scratch resistance depends on the physical properties of the resin constituting the nano uneven structure.
- the antireflection film described in Patent Document 5 has an intermediate layer having a self-repairing function against dents due to pressing, it may not exhibit sufficient scratch resistance. For example, when the thickness of the uppermost hard coat layer is as thin as 0.1 ⁇ m and this is pushed in, the hard coat layer is broken and easily scratched in the pencil hardness test.
- the object of the present invention is to exhibit an antireflection function by, for example, a nano-concave structure, etc., and has high scratch resistance that could not be realized in the past, particularly “3H” or higher in a pencil hardness test according to JIS K5600-5-4. It is to provide the laminate shown.
- the object of the present invention is high in resilience against strain caused by pressing and excellent in scratch resistance, particularly high in scratch resistance when repeated strain due to pressing, excellent in durability, and has a high antireflection function. It has it in providing the laminated body which has and a favorable external appearance.
- the present invention is a laminate in which a surface layer is laminated on a base material via an intermediate layer, the thickness of the intermediate layer is 8 to 40 ⁇ m, and the thickness of the surface layer is 0.4 of the thickness of the intermediate layer.
- the laminate is 1.5 times larger and satisfies the following (A) and / or (B).
- (A) The tan ⁇ (loss tangent) of the intermediate layer measured at 20 ° C. under a vibration frequency of 1 Hz is 0.2 or more.
- B) The ratio (MG / SG) of the storage elastic modulus (MG) of the intermediate layer to the storage elastic modulus (SG) of the surface layer measured at 20 ° C. under a vibration frequency of 1 Hz is 0.003 or more and 0.14 or less. It is.
- the present invention is a method for producing each of the above laminates, wherein an intermediate layer material is applied on a substrate, and the coating film of the intermediate layer material is completely cured or completely cured by irradiation with active energy rays.
- An active energy ray-curable resin composition is disposed between an intermediate layer forming step for curing to a state that does not lead to curing, and a stamper having an inverted structure of a nano uneven structure and the intermediate layer formed on the substrate. Then, the active energy ray curable resin composition is cured by active energy ray irradiation, and the stamper is peeled from the cured material layer to form a surface layer having a nano uneven structure made of the cured material. It is a manufacturing method of the laminated body which has a nano uneven
- the intermediate layer has specific physical properties and thickness, and the ratio of the thickness of the surface layer to the intermediate layer is within a specific range. Abrasion resistance with respect to scratches is remarkably improved, and a pencil hardness test according to JIS K5600-5-4 indicates “3H” or more.
- the ratio of the storage elastic modulus of the surface layer and the storage elastic modulus of the intermediate layer is within a specific range, it has high resilience against strain due to pressing and excellent scratch resistance, and in particular, strain due to pressing is repeated. In addition to being highly scratch resistant and excellent in durability, it has a high antireflection function and a good appearance.
- the laminated body of this invention is comprised from a base material, an intermediate
- the intermediate layer may be two or more layers, but is preferably one layer from the viewpoint of productivity and cost.
- the base material may be any material as long as it can support the surface layer through the intermediate layer. However, as described later, the surface layer can be cured by irradiation with active energy rays through the base material, and a light-transmitting base material (hereinafter referred to as “light-transmitting stamper”) can be used. "Transparent substrate”) is preferred. A transparent base material will not be specifically limited if it is a molded object which permeate
- Examples of the material constituting the transparent substrate include synthetic polymers such as methyl methacrylate (co) polymer, polycarbonate, styrene (co) polymer, methyl methacrylate-styrene copolymer, cellulose diacetate, cellulose triacetate, and cellulose.
- synthetic polymers such as methyl methacrylate (co) polymer, polycarbonate, styrene (co) polymer, methyl methacrylate-styrene copolymer, cellulose diacetate, cellulose triacetate, and cellulose.
- Semi-synthetic polymers such as acetate butyrate, polyesters such as polyethylene terephthalate and polylactic acid, polyamide, polyimide, polyether sulfone, polysulfone, polyethylene, polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl acetal, polyether ketone, polyurethane , A composite of these polymers (for example, a composite of polymethyl methacrylate and polylactic acid, a composite of polymethyl methacrylate and polyvinyl chloride), and glass.
- the shape and manufacturing method of the substrate are not particularly limited.
- an injection molded body, an extrusion molded body, and a cast molded body can be used.
- the shape may be a sheet shape, a film shape, or other three-dimensional shapes.
- a flexible film is preferable from the viewpoint of facilitating the molding of the upper layer.
- the surface of the substrate may be subjected to coating or corona treatment.
- the thickness is preferably 500 ⁇ m or less.
- a molded body having a nano uneven surface can be easily produced by using it on the surface of a molded body or the like.
- the intermediate layer is preferably composed of a resin having specific physical properties to be described later.
- Such an intermediate layer can be formed, for example, from an intermediate layer material containing a polymerization reactive monomer component, an active energy ray polymerization initiator, and, if necessary, a solvent or other components. It can also be formed by applying a polymer compound dissolved in a solvent, and drying and removing the solvent.
- the thickness of the intermediate layer is preferably 8 to 40 ⁇ m, more preferably 10 to 30 ⁇ m, particularly preferably 10 to 25 ⁇ m, and most preferably 15 to 20 ⁇ m.
- the lower limit of these ranges is significant in that it reduces the damage to the surface layer of the laminate by dispersing energy such as indentation stress on the laminate and friction on the laminate.
- the upper limit value is significant in that it suppresses the amount of compressive deformation at the time of pressing and prevents the surface layer from cracking without being able to follow the amount of deformation.
- the thickness accuracy of the intermediate layer is preferably within ⁇ 2 ⁇ m, and more preferably within ⁇ 1 ⁇ m.
- the tan ⁇ (loss tangent) of the intermediate layer is preferably 0.2 or more and more preferably 0.4 or more and 2 or less at 20 ° C. and 1 Hz.
- energy such as friction on a laminated body, can be disperse
- This tan ⁇ is a value obtained by dividing the storage elastic modulus by the loss elastic modulus, and is evaluated and calculated by general dynamic viscoelasticity measurement.
- the intermediate layer raw material is photocured, or a polymer dissolved in a solvent is applied and the solvent is dried and removed to form a film having a thickness of 500 ⁇ m.
- the intermediate layer has a compressive fracture stress of 20 MPa or more, a compressive stress of 1 to 20 MPa at a compression rate of 20%, and is made of a resin that returns to 90% or more of the original thickness when the stress is released after compression. It is preferable.
- the intermediate layer raw material is photocured, or a polymer dissolved in a solvent is applied and the solvent is dried and removed to form a plate having a thickness of 5 mm.
- the test piece was punched into a columnar shape, measured with a compression tester at a speed of 0.5 mm / min until the compression rate reached 50%, and then the stress was released to 90% of the original thickness. Confirmed whether to return.
- the compressive fracture stress of the resin constituting the intermediate layer is preferably 20 MPa or more, more preferably 30 MPa or more, particularly preferably 40 MPa or more, and most preferably 50 MPa or more. These ranges are significant in that the intermediate layer is not destroyed even in a test that applies a high load such as a pencil hardness test, and the problem that scratches remain without being able to withstand indentation is significant.
- the compressive stress at a compression rate of 20% of the resin constituting the intermediate layer is preferably 1 to 20 MPa, more preferably 1 to 15 MPa, particularly preferably 2 to 15 MPa, and most preferably 2 to 10 MPa.
- the upper limit of these ranges is significant in that it makes it easier to disperse the stress applied to the laminate.
- the lower limit value is significant in that it suppresses the occurrence of cracks in the surface layer because the surface layer cannot follow it by suppressing the amount of compressive deformation during pressing.
- the compression rate of 20% indicates a state compressed by 1 mm which is 20%.
- the resin constituting the intermediate layer is preferably constituted by a resin that returns to 90% or more of the original thickness when the stress is released after compression.
- the limit of recovery to 90% or more of the original thickness is preferably a compression ratio of 20% or more, more preferably a compression ratio of 40% or more, and particularly preferably a compression ratio of 50% or more.
- the time from releasing the stress to restoring to 90% of the original thickness from the 50% compressed state is preferably within 5 minutes, More preferably, it is within 3 minutes, and particularly preferably within 1 minute. Even if the recovery from deformation is slow, the recovery can be accelerated by heating or the like.
- the polymerization reactive monomer component is not particularly limited as long as it can form an intermediate layer having desired physical properties and can form an intermediate layer made of a cured resin by a curing reaction.
- generate the cured resin which shows each physical property mentioned above is preferable.
- a monomer having a polar site capable of forming a hydrogen bond is preferable.
- the polar site include a urethane bond, a carboxyl group, and a hydroxyl group.
- Specific examples of the monomer having a carboxyl group include acrylic acid, methacrylic acid, maleic acid, and succinic acid.
- Specific examples of the monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, cyclohexanedimethanol mono (meth) acrylate, N-methylol ( And (meth) acrylamide.
- lactone-modified (meth) acrylates [commercially available products such as “Placcel (registered trademark)” series manufactured by Daicel Chemical Industries, Ltd.].
- a polyfunctional monomer include monomers having a plurality of polymerizable double bonds and a hydroxyl group such as pentaerythritol tri (meth) acrylate and dipentaerythritol penta (meth) acrylate.
- (Meth) acrylate” means “acrylate and / or methacrylate”.
- Specific examples of the monomer having a urethane bond include polyfunctional urethane (meth) acrylate.
- urethane (meth) acrylate such as polycaprolactone-modified active energy ray-curable urethane (meth) acrylate having a long-chain alkyl group having 13 to 25 carbon atoms is suitable.
- Such monomers are described in detail in Japanese Patent No. 3676260.
- a monomer having a flexible side chain with high mobility is preferable.
- a monomer is, for example, an alkyl (meth) acrylate having 4 or more carbon atoms in the alkyl group portion and a polyalkylene oxide mono (meth) acrylate having 4 or more carbon atoms in the polyalkylene oxide portion.
- the monomer whose glass transition temperature of a homopolymer will be 0 degrees C or less is preferable.
- the polyalkylene oxide mono (meth) acrylate is preferable.
- polyethylene glycol mono (meth) acrylate examples thereof include polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and polytetramethylene glycol mono (meth) acrylate.
- the number of alkylene oxide repeats is determined as desired.
- the content of the component that contributes to adhesion to the base material or the surface layer in the intermediate layer is preferably 10 to 30 parts by mass with respect to 100 parts by mass of the resin component, and the content of the component that imparts restoring force is 40
- the content of the component imparting impact absorbing ability is preferably 3 to 20 parts by mass. If the content of the component that contributes to adhesion is in the above range, the adhesion with the surface layer is strengthened, and even when a pressing force is applied, it is possible to suppress the occurrence of interface peeling between the intermediate layer and the surface layer due to shear deformation. And damage to the surface layer can be suppressed.
- the content of the component that imparts shock absorption capacity is 3 parts by mass or more, good shock absorption capacity can be imparted to the intermediate layer, and damage such as cracking can be suppressed in the surface layer, and 20 parts by mass If it is below, the strength reduction of the intermediate layer can be suppressed, the scratch resistance can be improved, and the destruction and peeling can be suppressed.
- the content of the component that imparts a restoring force is within the above range, it is possible to improve the resilience of deformation and distortion caused by the pressing force being applied, and particularly excellent for the pressing force that is repeatedly applied. It has a high restoring force and can suppress damage to the nanoscale protrusions on the surface layer.
- the active energy ray polymerization initiator is not particularly limited as long as it is a compound that is cleaved by irradiation with active energy rays and generates a radical that initiates a polymerization reaction of the polymerization reactive monomer component.
- the “active energy ray” means, for example, an electron beam, ultraviolet rays, visible rays, plasma, infrared rays or other heat rays. In particular, it is preferable to use ultraviolet rays from the viewpoint of apparatus cost and productivity.
- the type and amount of the active energy ray polymerization initiator is, for example, whether the environment layer is irradiated with active energy rays in the presence of oxygen or a nitrogen atmosphere, or whether the surface of the intermediate layer is to be completely cured. Alternatively, it may be appropriately determined according to a request such as whether or not it is desired to make the raw material constituting the surface layer easily penetrated by incomplete surface hardening.
- active energy ray polymerization initiator for example, various known polymerization initiators described in JP-A-2009-31764 can be used.
- polymers of various polymerization reactive monomer components listed above can be used.
- the polymer is preferably used after being dissolved in a solvent.
- middle layer raw material may be diluted with the solvent as needed.
- middle layer can also be improved by melt
- a solvent having an appropriate boiling point may be selected depending on the drying method and the like.
- Specific examples of the solvent include toluene, alcohols such as methyl ethyl ketone, cyclohexanone, and isopropyl alcohol. These may be used alone or in combination.
- the intermediate layer may be a resin other than the polymer obtained from the above monomer, an ultraviolet absorber, an antioxidant, a release agent, a lubricant, a plasticizer, an antistatic agent, a light stabilizer, a flame retardant, You may contain additives, such as a fuel assistant, a polymerization inhibitor, a filler, a silane coupling agent, a coloring agent, a reinforcement
- an antistatic agent, an ultraviolet absorber, a near infrared absorber, etc. are contained in the surface layer, it may be difficult to maintain the shape of the nano uneven structure, so these additives are contained in the surface layer. It is preferable that it is contained in the intermediate layer from the viewpoint of scratch resistance of the laminate and suppression of reflection.
- ⁇ Antistatic agent suppresses dust and the like from adhering to the laminate.
- the antistatic agent include conductive polymers such as polythiol-based, polythiophene-based, and polyaniline-based materials, inorganic fine particles such as carbon nanotubes and carbon black, lithium salts as exemplified in JP-A-2007-70449, A quaternary ammonium salt is mentioned. These may be used in combination. Among these, a lithium perfluoroalkyl acid salt that does not impair the transparency of the laminate, is relatively inexpensive, and exhibits stable performance is preferable.
- the addition amount of the antistatic agent is preferably 0.5 to 20 parts by mass with respect to 100 parts by mass of the polymerizable component or polymer in the intermediate layer raw material (that is, 100 parts by mass of the polymer in the intermediate layer). Part by mass is more preferable.
- the lower limits of these ranges are significant in that the surface resistance value of the laminate is lowered and the dust adhesion prevention performance is exhibited.
- the upper limit is significant in terms of the degree of improvement in performance per added amount and the cost.
- the thickness of the surface layer laminated on the intermediate layer is preferably 100 ⁇ m or less, more preferably 50 ⁇ m or less.
- the near-infrared absorber gives a heat insulating effect to the laminate, and when the laminate is used for a plasma display or the like, it can suppress malfunction of the infrared remote controller of various home appliances.
- Examples of near infrared absorbers include organic dyes such as diimonium dyes, phthalocyanine dyes, dithiol metal complex dyes, substituted benzenedithiol metal complex dyes, cyanine dyes, squalium dyes, and conductive antimony
- organic dyes such as diimonium dyes, phthalocyanine dyes, dithiol metal complex dyes, substituted benzenedithiol metal complex dyes, cyanine dyes, squalium dyes, and conductive antimony
- examples thereof include inorganic particles such as tin oxide fine particles, conductive tin-containing indium oxide fine particles, tungsten oxide fine particles, and composite tungsten oxide fine particles. These may be used in combination.
- additives may be added to the surface layer of the laminate. However, it is preferable to add it to the intermediate layer without adding it to the surface layer, since it is possible to suppress the maintenance of the nano uneven surface shape from being inhibited and to suppress the occurrence of bleed out over time.
- the viscosity of the polymer dissolved in the intermediate layer raw material or solvent may be adjusted to an optimum value according to the coating method. Moreover, what is necessary is just to select an appropriate coating method according to the viscosity. For example, when the viscosity is 50 mPa ⁇ s or less, it can be uniformly applied to the transparent substrate by gravure coating.
- An intermediate layer can be formed by applying the intermediate layer raw material described above on a substrate and irradiating active energy rays, or by applying a polymer dissolved in a solvent and drying and removing the solvent.
- active energy ray it is preferable to use ultraviolet rays from the viewpoint of apparatus cost and productivity. What is necessary is just to determine suitably the irradiation amount of an ultraviolet-ray according to the quantity of the initiator which an intermediate
- the environment for irradiating with ultraviolet rays may be in the presence of oxygen or in a nitrogen atmosphere. It is also possible to improve the adhesion to the surface layer by incompletely curing the surface.
- the standard of the integrated light quantity is 200 to 4000 mJ / cm 2 .
- the surface layer is the uppermost layer laminated on the base material via the intermediate layer.
- This surface layer is typically a cured resin film formed of an active energy ray-curable resin composition.
- the thickness of the surface layer is preferably 0.4 to 1.5 times, more preferably 0.5 to 1.5 times, and particularly preferably 0.8 to 1.2 times the thickness of the intermediate layer. If the thickness of the surface layer is moderately thin, curing proceeds sufficiently with normal ultraviolet irradiation. Moreover, if the thickness is moderate, it can be avoided that the surface layer is easily broken. Further, the thickness of the surface layer is a thickness that allows the active energy rays to sufficiently advance into the uncured surface layer when cured by irradiation with active energy rays, and to cure efficiently and uniformly, and It is preferable that the thickness is such that the energy can be dispersed to cause a deformation strain and can be restored with respect to the pressing force.
- the thickness is preferably 6 to 29 ⁇ m, more preferably 8 to 21 ⁇ m.
- the thickness of the surface layer can be measured by the same measurement method as that for the intermediate layer, and is the distance from the interface of the intermediate layer to the tip of the convex portion.
- the intermediate layer when a laminate having a flexible intermediate layer is pushed in, the intermediate layer can be compressed and deformed to avoid scratches.
- the surface layer may break in tension.
- the cured resin in order to satisfactorily form a nano uneven structure on the surface layer, the cured resin must have a high crosslinking density and be a highly elastic resin. It is difficult to obtain a tensile elongation with a cured resin having a high crosslinking density, and the tensile elongation at break is generally 5% or less.
- the surface layer When a point load is applied to a laminate having a surface layer made of such a resin and a flexible intermediate layer, the surface layer will be tensile-ruptured before the intermediate layer undergoes compressive failure, and even after the intermediate layer has been restored, fine cracks will occur. It remains as a scratch that can be visually confirmed.
- the thickness of the surface layer is moderately thick with respect to the thickness of the intermediate layer, such tensile fracture of the surface layer can be avoided. In particular, it is favorable when the thickness of the surface layer is in the above preferred range.
- the stress applied to the laminate is not well dispersed by the intermediate layer, and the cured resin on the surface layer is damaged. If the thickness of the surface layer is appropriately reduced with respect to the thickness of the intermediate layer, the stress is well dispersed and temporary dents can be restored. In particular, it is favorable when the thickness of the surface layer is in the above preferred range.
- the intermediate layer and the surface layer are sufficiently adhered.
- the adhesion between the two layers is sufficient, interface peeling due to shear deformation hardly occurs.
- the intermediate layer and the surface layer may be in a mixed state where no clear interface exists. Insufficient curing of the surface of the intermediate layer and permeation of the active energy ray-curable resin composition that constitutes the surface layer into the intermediate layer, without having a clear interface and providing good adhesion I can do it.
- the thickness of both layers when there is no clear sea level is measured using the intermediate position of the mixed portion between the intermediate layer and the surface layer as an interface. Further, adhesion can be improved by applying heat when forming the surface layer.
- the ratio (MG / SG) of the storage elastic modulus (MG) of the intermediate layer to the storage elastic modulus (SG) of the surface layer measured at 20 ° C. under a vibration frequency of 1 Hz is preferably 0.003 or more and 0.14. In the following, it is more preferably 0.01 or more and 0.08 or less. In this case, it is possible to absorb the strain applied to the surface by the pressing force of the intermediate layer, remarkably improve the scratch resistance with respect to the surface layer, and suppress the occurrence of damage such as cracks in the surface layer. When the surface layer has a nano concavo-convex structure, the tensile elongation at break is generally 5% or less and is easily cracked or damaged when a pressing force is applied.
- the scratch resistance can be remarkably improved, and the antireflection property by the nano uneven structure and the lotus effect can be achieved over a long period of time. Can be maintained.
- the storage elastic modulus is obtained by forming an intermediate layer material and a surface layer material into a film having a thickness of 500 ⁇ m and punching it into a strip shape having a width of 5 mm to prepare an intermediate layer test piece and a surface layer test piece.
- an elasticity measuring device DMS110 manufactured by Seiko Instruments Inc.
- MG / SG can be obtained from the measured value (MG) of the piece and the measured value (SG) of the surface layer test piece.
- the intermediate layer and the surface layer are stored in the rubber-like flat region of the intermediate layer with respect to the minimum value (sg) of the storage elastic modulus of the rubber-like flat region of the surface layer measured using the viscoelasticity measuring device under the condition of the vibration frequency of 1 Hz.
- the ratio (mg / sg) of the minimum value (mg) of the elastic modulus is preferably 0.009 or more and 0.05 or less, more preferably 0.022 or more and 0.045 or less.
- the rubber-like flat region is a region where the change in the storage elastic modulus is small with respect to the temperature change on the higher temperature side than the glass transition point in the viscoelasticity measurement.
- the material of the surface layer having a nano uneven structure on the surface is preferably a highly elastic resin having a high crosslinking density.
- the polymerizable component constituting this resin is described in JP-A-2009-31764, etc., and there are a radical polymerizable bond, a monomer having a cationic polymerizable bond in the molecule, an oligomer, a reactive polymer, and the like. Can be mentioned.
- the monomer having a radical polymerizable bond may be either a monofunctional or polyfunctional monomer.
- monofunctional monomers include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, and s-butyl (meth) acrylate.
- polyfunctional monomer having a radical polymerizable bond examples include ethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, isocyanuric acid ethylene oxide-modified di (meth) acrylate, triethylene glycol di (meth) ) Acrylate, diethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,5-pentanediol di (meth) acrylate, 1,3-butylene glycol di (Meth) acrylate, polybutylene glycol di (meth) acrylate, 2,2-bis (4- (meth) acryloxypolyethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxyethoxyphenyl) propa 2,2-bis (4- (3- (meth) acryloxy-2-hydroxypropoxy) phenyl) propane,
- Examples of the monomer having a cationic polymerizable bond include monomers having an epoxy group, an oxetanyl group, an oxazolyl group, a vinyloxy group, and the like. Among these, a monomer having an epoxy group is preferable.
- oligomer or reactive polymer having a radical polymerizable bond and / or a cationic polymerizable bond in the molecule include unsaturated polyesters such as a condensate of unsaturated dicarboxylic acid and polyhydric alcohol; polyester (meth) Acrylate, polyether (meth) acrylate, polyol (meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, cationic polymerization type epoxy compound, single or co-polymerization of the above-mentioned monomers having radical polymerizable bonds in the side chain
- the polymerizable polymer may include a polymer.
- a polymerization initiator used for the active energy ray-curable resin composition containing the polymerizable component a known polymerization initiator can be used, and the active energy used when the active energy ray-curable resin composition is cured. It is preferable to select appropriately according to the kind of line.
- photoinitiators when using a photocuring reaction, include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl, benzophenone, p-methoxybenzophenone, 2,2-diethoxyacetophenone.
- ⁇ , ⁇ -dimethoxy- ⁇ -phenylacetophenone methylphenylglyoxylate, ethylphenylglyoxylate, 4,4′-bis (dimethylamino) benzophenone, 2-hydroxy-2-methyl-1-phenylpropane-1 Carbonyl compounds such as -one; sulfur compounds such as tetramethylthiuram monosulfide and tetramethylthiuram disulfide; 2,4,6-trimethylbenzoyldiphenylphosphine oxide, benzoyldie Carboxymethyl phosphine oxide and the like. These may be used alone or in combination of two or more.
- polymerization initiators include benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylbenzophenone, methyl orthobenzoylbenzoate, 4-phenylbenzophenone, t-butylanthraquinone Thioxanthone such as 2-ethylanthraquinone, 2,4-diethylthioxanthone, isopropylthioxanthone, 2,4-dichlorothioxanthone; diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal 1-hydroxycyclohexyl-phenyl ketone, 2-methyl-2-morpholino (4-thiomethylphenyl) propan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) Acetophenone such as butanone; benzoin ether such as benzo
- the content of the polymerization initiator in the active energy ray-curable resin composition is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the polymerization reactive compound.
- the polymerization initiator is less than 0.1 part by mass, the polymerization is difficult to proceed. If the polymerization initiator exceeds 10 parts by mass, the resin layer (nano-concave structure) may be colored or the mechanical strength may be reduced.
- the active energy ray curable resin composition may contain a non-reactive polymer.
- Non-reactive polymers include acrylic resins, styrene resins, polyurethane resins, cellulose resins, polyvinyl butyral resins, polyester resins, thermoplastic elastomers, and the like.
- the active energy ray-curable resin composition may be a sol-gel reactive composition.
- Examples of the active energy ray sol-gel reactive composition include alkoxysilane compounds and alkylsilicate compounds.
- alkoxysilane compound examples include those represented by RxSi (OR ′) y.
- tetramethoxysilane tetra-iso-propoxysilane, tetra-n-propoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, tetra-tert-butoxysilane, methyltriethoxysilane, methyl
- tripropoxysilane methyltributoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylethoxysilane, trimethylmethoxysilane, trimethylpropoxysilane, and trimethylbutoxysilane.
- alkyl silicate compound examples include those represented by R 1 O [Si (OR 3 ) (OR 4 ) O] zR 2 .
- R 1 to R 4 each represents an alkyl group having 1 to 5 carbon atoms, and z represents an integer of 3 to 20.
- Specific examples include methyl silicate, ethyl silicate, isopropyl silicate, n-propyl silicate, n-butyl silicate, n-pentyl silicate, acetyl silicate and the like.
- the surface layer may contain an acrylic resin, a styrene resin, a polyurethane resin, a cellulose resin, a polyvinyl butyral resin, a polyester resin, a thermoplastic elastomer, or the like, as necessary, other than the polymer of the monomer.
- the surface layer may contain an ultraviolet absorber, an antioxidant, a release agent, a lubricant, a plasticizer, an antistatic agent, a light stabilizer, a flame retardant, a flame retardant aid, a polymerization inhibitor, a filler, if necessary.
- a silane coupling agent, a colorant, a reinforcing agent, an inorganic filler, and an impact modifier may be contained.
- FIGS. 1A and 1B are schematic cross-sectional views showing an embodiment of a laminate of the present invention.
- the laminated body 10 by which the intermediate
- the surface of the surface layer 12 may be smooth, but as shown in FIG. 1, the surface of the surface layer 12 preferably has a nano uneven structure that exhibits functions such as surface antireflection and water repellency.
- convex portions 13 and concave portions 14 are formed at equal intervals on the surface of the surface layer 12. In particular, the shape of the convex portion 13 in FIG.
- the shape of the convex portion 13 in FIG. 1B is a bell shape.
- the shape of the convex portion 13 of the nano uneven structure is not limited to these, and may be any structure that continuously increases the occupation ratio of the cross-sectional area when cut on the surface of the surface layer 12 film.
- the fine concavo-convex portions may be united to form a nano concavo-convex structure. That is, even in shapes other than those shown in FIGS. 1 (a) and 1 (b), the refractive index is continuously increased from the air to the surface of the material, and the antireflection performance that achieves both low reflectance and low wavelength dependence is exhibited. Any shape can be used.
- a shape such as a conical shape, a pyramidal shape, a bell-shaped shape, etc. in which the cross-sectional area when cut by a plane perpendicular to the height direction of the convex portion continuously increases from the top to the bottom of the convex portion is preferable.
- the above-described nano uneven structure may be formed by uniting finer protrusions.
- the interval between adjacent convex portions 13 or concave portions 14 of the nano uneven structure is The size must be equal to or smaller than the wavelength of visible light.
- visible light refers to light having a wavelength of 380 to 780 nm. If this interval w1 is 400 nm or less (more preferably 380 nm or less), the scattering of visible light can be suppressed.
- the laminate of the present invention can be suitably used for optical applications such as an antireflection film.
- the interval w1 of the nano concavo-convex structure is larger than 400 nm, visible light is scattered, which is not suitable for use in an optical application such as an antireflection film.
- the lower limit value of the interval w1 is not particularly limited as long as it can be manufactured.
- the interval w1 is preferably 20 nm or more, and more preferably 40 nm or more from the viewpoint of ease of production of the mold.
- the aspect ratio represented by the height / interval w1 is preferably 0.5 or more, more preferably 0.8 or more, and 1.2 or more from the viewpoint of suppressing the minimum reflectance and the increase in reflectance at a specific wavelength. Is particularly preferred.
- the upper limit of the aspect ratio is not particularly limited as long as it can be manufactured.
- the aspect ratio of the convex portion is 5 or less for accurate transfer.
- the height of the convex portion or the depth of the concave portion [in FIG. 1A, the vertical distance d1 from the central point (bottom point) 14a of the concave portion to the central point (vertex) 13a of the convex portion] is preferably 60 nm or more, 90 nm The above is more preferable.
- the shape and manufacturing method of the nano concavo-convex structure that exhibits good antireflection performance is described in JP 2009-31764 A, and the same shape and manufacturing method can be used in the present invention.
- the size of the nano concavo-convex structure on the surface was determined by depositing a vertical cross section of the nano concavo-convex structure for 10 minutes and observing it with a field emission scanning electron microscope (JSM-7400F: manufactured by JEOL Ltd.) at an acceleration voltage of 3.00 kV. It is possible to measure the interval (period) of the matching pores and the depth of the pores, measure 10 points each, and adopt the average value.
- JSM-7400F manufactured by JEOL Ltd.
- the refractive index n 1 of the surface layer is preferably 1.40 or more, more preferably 1.43 or more, and most preferably 1.49 or more.
- the above lower limits of the refractive index n1 of the cured product are significant in terms of the reflection reduction effect.
- the refractive index n 1 of the cured product is preferably 1.55 or less, and more preferably 1.52 or less.
- Each of the above upper limits of the refractive index n1 of the cured product is significant in that it suppresses the decrease in transparency and coloring, and suppresses the resin composition before curing from becoming highly viscous or solidified.
- the viscosity of the resin composition is high, when the nano uneven shape is formed by a transfer method using a mold, the transferability is lowered, and as a result, the reflectance may be increased.
- the viscosity of the resin composition measured with a rotary B-type viscometer at 25 ° C. is 10,000 mPa ⁇ s or less in consideration of workability.
- 5000 mPa ⁇ s or less is more preferable, and 2000 mPa ⁇ s or less is particularly preferable.
- the viscosity of the resin composition measured with a rotary B-type viscometer at 70 ° C. is preferably 5000 mPa ⁇ s or less, and more preferably 2000 mPa ⁇ s or less.
- the viscosity measured by a rotary B-type viscometer at 25 ° C. of the resin composition is 100 mPa ⁇ s or more is preferable, 150 mPa ⁇ s or more is more preferable, and 200 mPa ⁇ s or more is particularly preferable. These ranges are significant in that it is difficult to leak to the side beyond the width of the stamper in the step of pressing the stamper, or the thickness of the cured product is easily adjusted.
- the viscosity of the resin composition can be adjusted by adjusting the type and content of the monomer. Specifically, when a large amount of a monomer containing a functional group having an intermolecular interaction such as a hydrogen bond or a chemical structure is used, the viscosity of the resin composition increases. Further, when a large amount of a low molecular weight monomer having no intermolecular interaction is used, the viscosity of the resin composition becomes low.
- nano-sized protrusions may snuggle up when peeling from or after peeling from the stamper that forms the nano uneven structure.
- surface tension that does not pose a problem in the macro region works remarkably. That is, in order to reduce the surface free energy, a force is applied to close the nano-sized protrusions and reduce the surface area. If this force exceeds the hardness of the resin composition, the protrusions cling to each other.
- Such a nano concavo-convex structure may not have desired antireflection performance and water repellency.
- the tensile modulus of the cured resin composition is preferably 1 GPa or more. If such a resin composition is used, it becomes easy to avoid that protrusions snuggle up.
- the laminate of the present invention is optimal as a functional article having a nano uneven structure on the surface layer.
- functional articles include antireflection articles and water-repellent articles provided with the laminate of the present invention.
- a display or an automobile member provided with the laminate of the present invention is suitable as a functional article.
- the antireflection article of the present invention comprises a laminate having the nano uneven structure of the present invention in the surface layer.
- This antireflection article exhibits high scratch resistance and good antireflection performance.
- a laminated body having a nano uneven structure is pasted on the surface of an object such as a liquid crystal display device, a plasma display panel, an electroluminescence display, an image display device such as a cathode ray tube display device, a lens, a show window, or a spectacle lens. Use with attachment.
- the water-repellent article of the present invention includes a laminate having the nano uneven structure of the present invention as a surface layer.
- This water-repellent article has high scratch resistance and good water repellency, and exhibits excellent antireflection performance.
- a laminate having a nano concavo-convex structure is attached to the surfaces of window materials, roof tiles, outdoor lighting, curved mirrors, vehicle windows, and vehicle mirrors.
- the part to which the laminate of each target article is attached is a three-dimensional shape
- the laminated body may be attached to a predetermined part of the target article.
- the laminate of the present invention may be attached to the front plate, not limited to the surface thereof, or the front plate itself is configured from the laminate of the present invention. You can also
- the laminate of the present invention can be applied to optical uses such as optical waveguides, relief holograms, lenses, and polarization separation elements, and uses of cell culture sheets in addition to the uses described above.
- the laminate of the present invention is, for example, an intermediate layer in which an intermediate layer raw material is applied on a transparent substrate, and the coating film of the intermediate layer raw material is completely cured or not cured completely by irradiation with active energy rays. It can be produced by a forming step and a surface layer forming step in which an active energy ray-curable resin composition is disposed on the intermediate layer and cured by irradiation with active energy rays.
- This forming method includes, for example, a process of applying the intermediate layer raw material to the substrate, a drying process for volatilizing the solvent when a solvent is used, and a process of curing the intermediate layer raw material by irradiating active energy rays. Consists of.
- an intermediate layer material is applied on a transparent substrate to form a coating film made of the intermediate layer material.
- the application method is not particularly limited.
- An optimum method may be selected from known coating methods in consideration of the flexibility of the base material and the viscosity of the intermediate layer material. Specifically, for example, it is preferable to control the thickness of the coating film with an air knife when applying the intermediate layer material, or to apply the intermediate layer material by gravure coating.
- Known coating methods are described in detail, for example, in JP-A-01-216837.
- the intermediate layer raw material contains a solvent
- the volatilization of the solvent may be promoted by heating or reduced pressure.
- care must be taken because only the surface side of the coating film may dry and the solvent may remain inside.
- an appropriate drying method may be selected depending on the type and content of the solvent.
- the coating film made of the intermediate layer material formed on the transparent substrate is cured to form the intermediate layer.
- the intermediate layer raw material is a raw material containing a polymerization reactive monomer component and an active energy ray polymerization initiator, it may be polymerized and cured by irradiation with active energy rays.
- ultraviolet rays are preferable.
- the lamp that irradiates ultraviolet rays include a high-pressure mercury lamp, a metal halide lamp, and a fusion lamp. What is necessary is just to determine the irradiation amount of an ultraviolet-ray according to the absorption wavelength and content of a polymerization initiator.
- the integrated light quantity is preferably 200 ⁇ 4000mJ / cm 2, more preferably 400 ⁇ 2000mJ / cm 2.
- the lower limit values of these ranges are significant in that the intermediate layer raw material is sufficiently cured to prevent deterioration of the scratch resistance of the laminate due to insufficient curing.
- the upper limit is significant in that it prevents coloring of the intermediate layer and deterioration of the transparent substrate.
- the irradiation intensity is not particularly limited, but it is preferable to suppress the output to such an extent that the transparent substrate is not deteriorated.
- the coating of the intermediate layer raw material is cured to a state where it does not completely cure by ultraviolet irradiation in the presence of oxygen, and then the surface layer forming step is performed. is there.
- the active energy ray-curable resin composition which is the surface layer raw material, penetrates into the incompletely cured intermediate layer to some extent in the surface layer forming step, the adhesion between the surface layer and the intermediate layer is improved.
- a surface layer is formed on the intermediate layer formed as described above.
- This surface layer is preferably a layer having a nano uneven structure.
- an active energy ray-curable resin composition is disposed between a stamper having an inverted structure of a nano-concave structure and an intermediate layer formed on the transparent substrate, and the active energy ray-curable resin is irradiated by active energy rays.
- a surface layer having a nano uneven structure made of the cured product can be formed by curing the composition and peeling the stamper from the layer made of the cured product.
- a known technique described in JP 2009-31764 A may be adopted. More specifically, it is preferable to form a nano uneven structure by a transfer method using a stamper having an inverted structure of the nano uneven structure. By using the stamper, the nano uneven structure can be easily transferred to the molded body in one step.
- the method for transferring the reversal structure of the stamper to the surface of the molded body is not particularly limited, but an active energy ray curable resin composition is provided by placing an uncured active energy ray curable resin composition between the stamper and the transparent substrate.
- a method of releasing the stamper after irradiating the active energy ray to cure the active energy ray-curable resin composition is preferable. By this method, a molded body having the nano uneven structure transferred to the surface can be obtained.
- the stamper has an inverted structure of a nano uneven structure formed on the surface, and the material of the stamper includes metals (including those having an oxide film formed on the surface), quartz, glass, resin, ceramics, etc. Can be mentioned.
- Examples of the shape of the stamper include a roll shape, a circular tube shape, a flat plate shape, and a sheet shape.
- the nano concavo-convex structure of the stamper is an inverted structure of the nano concavo-convex structure formed on the surface layer, and the size of the stamper is measured by depositing a vertical section of a part of the stamper for 1 minute, and then measuring the size of the nano concavo-convex structure of the surface layer. A measurement value obtained by the same measurement method as in the above measurement can be employed.
- Examples of the stamper manufacturing method include an electron beam lithography method, a laser beam interference method, and the like. From the viewpoint that a large-area stamper or a roll-shaped stamper can be easily produced, an anodic oxidation method is preferable.
- the anodizing method can be manufactured by the following steps (a) to (e), for example, as shown in FIG.
- the aluminum substrate used here preferably has a purity of more than 99.0%, more preferably 99.5% or more, and still more preferably 99.9% or more. If the aluminum purity exceeds 99.0%, the pores formed by anodization are regularly formed without branching.
- a chromic acid / phosphoric acid mixed solution or the like is used to remove an oxide film on a flat or curved surface (hereinafter also referred to as a work surface) of an aluminum base material forming an inverted structure of a nano uneven structure. It is also possible to perform a pretreatment soaked in the substrate.
- An anodized porous alumina stamper can be manufactured, for example, through the following steps (a) to (e) (see FIG. 2).
- the plane or curved surface which gives the inversion structure of a nano uneven structure on an aluminum base material is called a to-be-processed surface.
- the thickness of the first oxide film 32 is preferably 10 ⁇ m or less.
- the pore diameter can be increased as the voltage is increased.
- the electrolytic solution to be used include an acidic electrolytic solution and an alkaline electrolytic solution, and an acidic electrolytic solution is preferable.
- the acidic electrolyte sulfuric acid, oxalic acid, phosphoric acid, or a mixture thereof can be used.
- the concentration of oxalic acid is preferably 6.5% by mass or less.
- the concentration of oxalic acid is 6.5% by mass or less, it is possible to suppress the formation of a rough surface oxide film because the current value during anodization increases.
- the voltage during anodization to 30 to 60 V, highly regular pores with a period of about 100 nm are formed, the nano uneven structure has regularity, and a laminate with high water repellency is obtained. It is done.
- the temperature of the electrolytic solution is preferably 50 ° C. or lower, and more preferably 35 ° C. or lower. When the temperature of the electrolytic solution exceeds 50 ° C., it is possible to suppress the occurrence of a so-called “yake” phenomenon and form regular pores.
- Step (b) The first oxide film 32 formed in the step (a) is all removed, and periodic depressions 33 corresponding to the pores 31 are formed at the bottom of the removed first oxide film (referred to as a barrier layer). It is formed.
- This dent 33 becomes a pore generation point of anodic oxidation and can improve the regularity of the finally formed nano uneven structure (for example, Masuda, “Applied Physics”, 2000, Vol. 69, No. 5, p.558).
- a method of removing all of the first oxide film 32 there is a method of removing with a solution that selectively dissolves alumina without dissolving aluminum.
- a solution that selectively dissolves alumina without dissolving aluminum.
- examples of such a solution include a chromic acid / phosphoric acid mixed solution.
- anodization may be performed under the same conditions (electrolyte concentration, electrolyte temperature, chemical conversion voltage, etc.) as in step (a). Also in the step (c), deeper pores can be obtained as the anodic oxidation is performed for a longer time. However, when the nano uneven structure is used as a stamper, the thickness is 0 in the step (c).
- An oxide film having a thickness of about 0.01 to 0.5 ⁇ m may be formed, and it is not necessary to form an oxide film as thick as that formed in step (a). Also in the step (c), deeper pores can be obtained as the anodic oxidation is performed for a longer time. However, as a stamper for transferring the nano uneven structure, a thickness of 0.01 to 0 is used in the step (c). An oxide film having a thickness of about 0.5 ⁇ m may be formed, and it is not necessary to form an oxide film having a thickness as large as that formed in the step (a).
- a specific method of the pore diameter expansion treatment a method of immersing in a solution dissolving alumina and expanding the diameter of the pores formed in the step (c) by etching can be mentioned.
- An example of such a solution is an aqueous phosphoric acid solution of about 5.0% by mass. The longer the time of step (d), the larger the pore diameter.
- the shape of the pores 35 is changed to a taper shape in which the diameter gradually decreases in the depth direction from the opening as shown in FIG. 2 (f).
- the number of repetitions of the step (c) and the step (d) can be made a smoother taper as the number of times increases, and is preferably performed at least three times in total.
- various shapes of pores can be formed.
- a stamper having a suitable diameter expansion ratio in the deep part can be formed. Such a stamper enables formation of a nano uneven structure having a sharp tip.
- the tip of the tip formed in the final step is smaller than the diameter of the pore 35 formed in the first step (c).
- the diameter of the hole 35 is preferably 1.1 to 1.9 times, more preferably 1.1 to 1.8 times, and still more preferably 1.1 to 1.7 times.
- a tapered surface whose diameter is gradually reduced in the depth direction from the opening is formed on the processed surface of the mirror-finished aluminum base material.
- the method for removing the oxide film include a method of dipping in a chromic acid / phosphoric acid mixed solution.
- the anodic porous alumina thus obtained is suitable as a stamper for transferring the nano uneven structure to the resin composition in order to produce the molded article of the present invention.
- the shape of the stamper is not particularly limited, and may be a flat plate or a roll. Further, the surface of the stamper on which the inverted structure of the nano concavo-convex structure is formed may be subjected to a release treatment so that the release is easy. Examples of the release treatment method include a method of coating a silicone-based polymer or a fluorine polymer, a method of depositing a fluorine compound, a method of coating a fluorine-based or fluorine-silicone-based silane coupling agent, and the like.
- the inverted structure of the nano-concave structure of the stamper is transferred on the surface in a relationship between the key and the keyhole.
- the surface of the stamper can be subjected to a mold release treatment for facilitating the separation of the stamper from a laminate formed using the stamper.
- a mold release treatment for facilitating the separation of the stamper from a laminate formed using the stamper.
- the mold release treatment include a method of coating a silicone-based polymer or a fluorine polymer, a method of depositing a fluorine compound, a method of coating a fluorine-based or fluorine-silicone-based silane coupling agent, and the like.
- stamper pores A vertical section of a part of a stamper made of anodized porous alumina is deposited by Pt for 1 minute, and observed with a field emission scanning electron microscope (trade name JSM-7400F, manufactured by JEOL Ltd.) at an acceleration voltage of 3.00 kV. The interval (period) of the pores and the depth of the pores were measured. Specifically, 10 points were measured for each, and the average value was taken as the measured value.
- Viscosity measurement of resin composition The viscosity at 25 ° C. of the resin composition was measured with a rotary E-type viscometer.
- Viscoelasticity measurement of intermediate layer The intermediate layer raw material was photocured and formed into a film having a thickness of 500 ⁇ m, and this film was punched into a strip shape having a width of 5 mm as a test piece.
- a viscoelasticity measuring device DMS110 manufactured by Seiko Instruments Inc. a tensile mode
- Tan ⁇ was determined by measuring the temperature from 2 to 20 ° C. at a rate of 2 ° C./min at 2 cm between chucks and a vibration frequency of 1 Hz.
- the intermediate layer raw material is photocured and formed into a plate shape having a thickness of 5 mm, and this plate is punched into a cylindrical shape having a diameter of 12 mm.
- the test piece is used as a test piece, and the compression rate is 0.5 mm / min. Compression to 50% yielded a stress-strain curve. Further, the compression stress at a compression rate of 20% and the time until the stress was released after compression to 50% and returned to 90% of the original thickness were also measured.
- Measurement of thickness of each layer The thickness of each layer was calculated by measuring the thickness after forming the substrate and the intermediate layer and after forming the surface layer.
- Pencil hardness test In accordance with JIS K5600-5-4, a test was performed with a load of 750 g. At 5 minutes after the test, the appearance was visually observed, and the hardness of the pencil without scratches was noted. (When 2H is not scratched and 3H is scratched, it is expressed as “2H”.)
- Evaluation of scratch resistance A 1 cm square canvas cloth is attached to an abrasion tester (made by Shinto Kagaku Co., Ltd., trade name HEIDON), the surface of the nano uneven structure is subjected to a load of 100 g, a reciprocating distance of 50 mm, and a head speed of 60 mm / s. Was scratched 1000 times.
- the obtained anodized porous alumina was washed with deionized water, and then water on the surface was removed by air blow, and the fluorine-based release material (trade name Optool DSX, manufactured by Daikin Industries, Ltd.) was adjusted to a solid content of 0.1% by mass. Thus, it was immersed in a solution diluted with a diluent (trade name HD-ZV, manufactured by Harves Co., Ltd.) for 10 minutes and air-dried for 20 hours to obtain a stamper having pores formed on the surface.
- a diluent trade name HD-ZV, manufactured by Harves Co., Ltd.
- Example A1 (Formation of intermediate layer) As a transparent substrate, a polyethylene terephthalate film (manufactured by Toyobo, trade name A-4300, thickness 188 ⁇ m) was prepared. On this base film, the intermediate layer raw material A1 was uniformly coated using a bar coater, and was allowed to stand in a dryer at 80 ° C. for 5 minutes. Next, the coating film was cured by irradiating ultraviolet rays with an energy of 800 mJ / cm 2 using a high-pressure mercury lamp from the side where the intermediate layer material was applied to form an intermediate layer. The thickness of the intermediate layer was 18 ⁇ m.
- the resin composition for forming the surface layer was poured onto the pore surface of the stamper, and the base film was spread and coated so that the intermediate layer was in contact with the resin composition.
- the resin composition was cured by irradiating ultraviolet rays with an energy of 2000 mJ / cm 2 using a high-pressure mercury lamp from the base film side. Thereafter, the stamper was peeled off to obtain a laminate having a nano uneven structure on the surface.
- the nano-concave structure of the stamper is transferred onto the surface of this laminate, and as shown in FIG. 1A, the interval w1 between the adjacent convex portions 13 is 100 nm, and the height d1 of the convex portions 13 is 180 nm. A certain conical nano uneven structure was formed. Each performance of this nano uneven structure was evaluated. The results are shown in Table 2.
- Examples A2 to A11 and A15 to A17, Comparative Examples A1 to A10, Reference Examples A1 to A2] A laminate having a nano-concave structure having the same size as that of Example A1 on the surface was prepared except that the intermediate layer raw material and each layer thickness shown in Table 2 were employed. The evaluation results are shown in Table 2.
- the intermediate layer was thin, and as a result, the stress could not be dispersed in the pencil hardness test, and the scratch was scratched with the pencil hardness H.
- the surface layer was thinner than the intermediate layer. As a result, the surface layer did not follow the deformation of the intermediate layer in the pencil hardness test, and the surface layer was cracked, and scratched with a pencil hardness of 2H.
- the surface layer of the laminate of Comparative Example A3 was too thin, and as a result, peeling of the surface layer occurred in the pencil hardness test 2H.
- the laminate of Comparative Examples A4, A5 and A9 has a thin surface layer relative to the intermediate layer. As a result, in the pencil hardness test, the surface layer cannot fully follow the deformation of the intermediate layer, resulting in cracks in the surface layer, and scratches with a pencil hardness of 2H. It was.
- the surface layer was thicker than the intermediate layer. As a result, the stress could not be dispersed in the pencil hardness test, and the pencil hardness was scratched.
- the tan ⁇ of the intermediate layer is small and the compression property is not appropriate. As a result, the energy cannot be relaxed in the reciprocal scratch test, and there is a visible scratch.
- the surface layer was peeled off or scratched.
- the surface layer of the laminates of Reference Examples A1 and A2 was too thick, and as a result, the stress could not be dispersed in the pencil hardness test, and the pencil hardness was scratched.
- Example A2 (interlayer raw material 2) except that a predetermined amount of antistatic agent (LFBS, fluorinated alkyl sulfonate (manufactured by Mitsubishi Materials Electronic Chemicals: F-top LFBS)) was added.
- LFBS fluorinated alkyl sulfonate
- An intermediate layer raw material having the same composition as that of Example 2 was prepared. Since each of these intermediate layer materials has the same main component composition as Example A2, the viscosity, tan ⁇ , 20% compression stress, and recovery time from 50% compression are substantially the same as Example A2 (interlayer material 2). Is.
- a laminate having a nano uneven structure of the same size as Example A1 on the surface was prepared except that each of the intermediate layer raw materials described above was used and the intermediate layer and the surface layer thicknesses shown in Table 3 were employed.
- a surface resistance value at a voltage of 100 V was measured using an insulation resistance meter SM-10E manufactured by Toa Denpa Kogyo Co., Ltd. The results are shown in Table 3.
- Example B1 The following materials were mixed to prepare an active energy ray-curable surface layer raw material.
- Ethoxylated pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name NK ester ATM-4E) 80 parts silicone diacrylate (manufactured by Shin-Etsu Chemical Co., Ltd., trade name x-22-1602) 15 parts 2-hydroxyethyl acrylate 5
- a polyethylene terephthalate film (trade name A-4300, thickness 188 ⁇ m, manufactured by Toyobo Co.,
- the intermediate layer raw material 1 was uniformly coated using a bar coater and allowed to stand in a dryer at 80 ° C. for 5 minutes.
- the coating film was cured by irradiating ultraviolet rays with an energy of 800 mJ / cm 2 using a high-pressure mercury lamp from the side on which the intermediate layer raw material was applied to form an intermediate layer.
- the resin composition for forming the surface layer was poured onto the pore surface of the stamper, and the base film was spread and coated so that the intermediate layer was in contact therewith.
- Ultraviolet rays were irradiated from the base film side with an energy of 2000 mJ / cm 2 using a high pressure mercury lamp to cure the surface layer raw material. Thereafter, the stamper was peeled off to obtain a laminate having a nano uneven structure on the surface.
- the nano-concave structure of the stamper is transferred onto the surface of this laminate, and as shown in FIG. 1A, the interval w1 between the adjacent convex portions 13 is 100 nm, and the height d1 of the convex portions 13 is 180 nm. A certain conical nano uneven structure was formed.
- the laminate was evaluated for scratch resistance and pencil hardness as follows. The results are shown in Table 5.
- Examples B2 to B5 Comparative Examples B1 to B8
- a laminate was produced in the same manner as in Example B1, except that the intermediate layer material shown in Table 4 was used. The evaluation results are shown in Table 5.
- the laminates of Examples B1 to B5 had a good appearance after the reciprocating scratch test and had excellent scratch resistance. Further, the laminates of Examples B1 to B3 showed “3H” or higher in the pencil test.
- the laminate of Comparative Example B1 has a low ratio of the storage elastic modulus of the intermediate layer to the storage elastic modulus of the surface layer, and due to insufficient strength, the surface layer is scraped off together with the intermediate layer in the pencil test, or the surface layer is cracked or peeled off. occured.
- the laminates of Comparative Examples B2 to B5 all showed “3H” or more in the pencil test, but the ratio of the storage elastic modulus of the intermediate layer to the storage elastic modulus of the surface layer at 1 Hz and 20 ° C. was high, and the protrusions became brittle. It was easy to break and was clearly scratched in the reciprocal scratch test.
- the ratio of the storage elastic modulus of the intermediate layer to the storage elastic modulus of the surface layer at 1 Hz and 20 ° C. was high, the protrusions became brittle and easily worn, and were scratched in the reciprocal scratch test. . Further, the ratio of the minimum value of the storage elastic modulus of the intermediate layer to the minimum value of the storage elastic modulus of the surface layer in the rubber-like flat portion was high, and scratches due to the breakage of the protrusion occurred in the pencil test.
- the laminate of the present invention has excellent scratch resistance, the nano uneven structure on the surface is not easily damaged, building materials such as surface walls and roofs, window materials for houses, automobiles, trains, ships, etc. It can be used for mirrors, displays that can be touched by human hands, etc., and is extremely useful industrially.
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Abstract
Description
(A)20℃において振動周波数1Hzの条件で測定した中間層のtanδ(損失正接)が0.2以上である。
(B)20℃において振動周波数1Hzの条件で測定した表層の貯蔵弾性率(SG)に対する中間層の貯蔵弾性率(MG)の比(MG/SG)が、0.003以上、0.14以下である。
本発明の積層体は、基材と中間層と表層から構成される。中間層は2層以上でもよいが、生産性とコストの点から1層であることが望ましい。
基材は、中間層を介して表層を支持可能なものであれば、その材質はいずれであってもよい。ただし後述するように、基材を介して表層を活性エネルギー線の照射により硬化可能とし、遮光性のスタンパの使用を可能とするため、活性エネルギー線に対して透光性を有する基材(以下「透明基材」という)が好ましい。透明基材は、上記の活性エネルギー線を透過する成形体であれば特に限定されない。透明基材を構成する材料としては、例えば、メチルメタクリレート(共)重合体、ポリカーボネート、スチレン(共)重合体、メチルメタクリレート-スチレン共重合体等の合成高分子、セルロースジアセテート、セルローストリアセテート、セルロースアセテートブチレート等の半合成高分子、ポリエチレンテレフタレート、ポリ乳酸等のポリエステル、ポリアミド、ポリイミド、ポリエーテルスルフォン、ポリスルフォン、ポリエチレン、ポリプロピレン、ポリメチルペンテン、ポリ塩化ビニル、ポリビニルアセタール、ポリエーテルケトン、ポリウレタン、それら高分子の複合物(例えば、ポリメチルメタクリレートとポリ乳酸の複合物、ポリメチルメタクリレートとポリ塩化ビニルの複合物)、ガラスが挙げられる。
中間層は、後述する特定の物性を有する樹脂から構成されることが好ましい。そのような中間層は、例えば、重合反応性モノマー成分と、活性エネルギー線重合開始剤と、必要に応じて溶剤やその他の成分を含有する中間層原料によって形成できる。また、溶剤に溶かした高分子化合物を塗布し、溶剤を乾燥・除去することによっても形成できる。
重合反応性モノマー成分は、所望の物性の中間層を形成でき、硬化反応によって硬化樹脂からなる中間層を形成できるものであれば良く、特に限定されない。好ましくは、上述した各物性を示す硬化樹脂を生成できるモノマーが好ましい。例えば、透明基材や表層との密着性に寄与する成分、中間層に復元力を付与する成分、中間層に衝撃吸収能を付与する成分を含有することが好ましい。
活性エネルギー線重合開始剤は、活性エネルギー線を照射することで開裂して、重合反応性モノマー成分の重合反応を開始させるラジカルを発生する化合物であれば良く、特に限定されない。ここで「活性エネルギー線」とは、例えば、電子線、紫外線、可視光線、プラズマ、赤外線などの熱線等を意味する。特に、装置コストや生産性の観点から、紫外線を用いることが好ましい。
中間層を形成する為の高分子としては、例えば、先に挙げた各種の重合反応性モノマー成分の重合物を使用できる。
上記高分子は、溶剤に溶解して使用することが好ましい。また、中間層原料は、必要に応じて溶剤で希釈されていてもよい。特に、高粘度で均一塗布が難しい場合は、コーティング方法に適した粘度となるよう適宜調整することが好ましい。また、溶剤で透明基材の表面を一部溶解することで、透明基材と中間層との密着性を改善することもできる。
中間層は、必要に応じて、上記モノマーから得られる重合体以外の樹脂や、紫外線吸収剤、酸化防止剤、離型剤、滑剤、可塑剤、帯電防止剤、光安定剤、難燃剤、難燃助剤、重合禁止剤、充填剤、シランカップリング剤、着色剤、強化剤、無機フィラー、耐衝撃性改質剤、近赤外線吸収剤等の添加剤を含有してもよい。特に、帯電防止剤、紫外線吸収剤、近赤外線吸収剤等が表層に含有されると、ナノ凹凸構造の形状の維持が困難になる場合があることから、これらの添加剤は、表層には含有されず、中間層に含有されることが、積層体の耐擦傷性、反射抑制の点から、好ましい。
表層は、基材上に中間層を介して積層される最上層である。この表層は、代表的には、活性エネルギー線硬化性樹脂組成物によって形成される硬化樹脂膜である。
図1(a)及び(b)は、本発明の積層体の実施形態を示す模式的断面図である。図1においては、透明基材11上に中間層15と表層12が順次積層されてなる積層体10を例示している。表層12の表面は平滑でもよいが、図1に示すように、表層12の表面が表面反射防止性や撥水性等の機能を発現するナノ凹凸構造を有することが好ましい。具体的には、表層12の表面に凸部13及び凹部14が等間隔で形成されている。特に、図1(a)の凸部13の形状は円錐状又は角錐状であり、図1(b)の凸部13の形状は釣鐘状である。ただし、ナノ凹凸構造の凸部13の形状はこれらに限定されず、表層12膜面で切断した時の断面積の占有率が連続的に増大するような構造であればよい。また、より微細な凸部が合一してナノ凹凸構造を形成していてもよい。すなわち、図1(a)及び(b)以外の形状であっても、空気から材料表面まで連続的に屈折率を増大し、低反射率と低波長依存性を両立させた反射防止性能を示すような形状であればよい。特に、円錐状、角錐状、釣鐘状など、凸部の高さ方向に垂直な面で切断した時の断面積が、凸部の頂部から底部に向かって連続的に増大するような形状が好ましい。また、より微細な突起が合一して上記のナノ凹凸構造を形成していてもよい。
本発明の反射防止物品は、本発明のナノ凹凸構造を表層に有した積層体を備える。この反射防止物品は、高い耐擦傷性と良好な反射防止性能を発現する。例えば、液晶表示装置、プラズマディスプレイパネル、エレクトロルミネッセンスディスプレイ、陰極管表示装置のような画像表示装置、レンズ、ショーウィンドー、眼鏡レンズ等の対象物の表面に、ナノ凹凸構造を有する積層体を貼り付けて使用する。
本発明の撥水性物品は、本発明のナノ凹凸構造を表層に有した積層体を備える。この撥水性物品は、高い耐擦傷性と良好な撥水性を有すると共に、優れた反射防止性能を発現する。例えば、窓材、屋根瓦、屋外照明、カーブミラー、車両用窓、車両用ミラーの表面に、ナノ凹凸構造を有する積層体を貼り付けて使用する。
本発明の積層体は、例えば、透明基材上に中間層原料を塗布し、活性エネルギー線照射によって中間層原料の塗膜を完全に硬化又は完全な硬化には至らない状態まで硬化させる中間層形成工程と、その中間層上に活性エネルギー線硬化性樹脂組成物を配し、活性エネルギー線照射によって硬化させる表層形成工程とによって製造できる。
まず、透明基材上に中間層原料を塗布して、中間層原料からなる塗膜を形成する。その塗布方法は特に限定されない。基材の柔軟性や中間層原料の粘度を勘案して、公知のコーティング方法から最適な方法を選択すればよい。具体的には、例えば、中間層原料の塗布の際にエアナイフによって塗膜の厚さを制御したり、あるいは、中間層原料の塗布をグラビヤコーティングにより行うことが好適である。公知のコーティング方法は、例えば特開平01-216837号公報などに詳しく記載されている。
中間層原料が溶剤を含有している場合は、透明基材上に形成された塗膜を乾燥して溶剤を揮発除去する必要がある。例えば、加熱や減圧によって溶剤の揮発を促進してもよい。ただし、急速な乾燥では、塗膜の表面側のみが乾いて内部に溶剤が残る場合があるので注意を要する。具体的には、溶剤の種類や含有量によって適切な乾燥方法を選ぶとよい。また、加熱することで透明基材に変形を生じる場合もあるので注意を要する。
次に、透明基材上に形成された中間層原料からなる塗膜を硬化させて、中間層を形成する。例えば、中間層原料が、重合反応性モノマー成分と活性エネルギー線重合開始剤を含有する原料である場合は、活性エネルギー線を照射して重合硬化させればよい。
・工程(a):アルミニウム基材の被加工面を電解液中、定電圧下で陽極酸化して、細孔を有する第1の酸化皮膜を被加工面に形成する第1の酸化皮膜形成工程。
・工程(b):形成された第1の酸化皮膜を全て除去し、陽極酸化の細孔発生点を被加工面に形成する酸化皮膜除去工程。
・工程(c):細孔発生点が形成されたアルミニウム基材の被加工面を電解液中、定電圧下で再度陽極酸化し、前記細孔発生点に対応した細孔を有する第2の酸化皮膜を被加工面に形成する第2の酸化皮膜形成工程。
・工程(d):第2の酸化皮膜の一部を除去して、形成された細孔の孔径を拡大させる孔径拡大処理工程。
・工程(e):前記工程(c)と工程(d)を繰り返し行う工程。
図2(a)に示すように、工程(a)では、鏡面化されたアルミニウム基材の被加工面30を電解液中、定電圧下で陽極酸化し、アルミニウム基材の被加工面30に、細孔31を有する第1の酸化皮膜32を被加工面30に形成する。第1の酸化皮膜32の厚さは10μm以下が好ましい。
工程(a)により形成された第1の酸化皮膜32を全て除去し、除去された第1の酸化皮膜の底部(バリア層と呼ばれる)に、細孔31に対応して周期的な窪み33が形成される。この窪み33が、陽極酸化の細孔発生点となり、最終的に形成されるナノ凹凸構造の規則性を向上できる(例えば、益田、「応用物理」、2000年、第69巻、第5号、p.558参照。)。
細孔発生点33が形成されたアルミニウム基材の被加工面30を電解液中、定電圧下で再度陽極酸化して、細孔発生点に対応した円柱状の細孔35を有する第2の酸化皮膜34を形成する。工程(c)では、工程(a)と同様の条件(電解液濃度、電解液温度、化成電圧等)下で陽極酸化すればよい。工程(c)においても、陽極酸化を長時間施すほど、深い細孔を得ることができるが、ナノ凹凸構造を転写するためのスタンパとして使用する場合には、工程(c)では厚さが0.01~0.5μm程度の酸化皮膜を形成すればよく、工程(a)で形成するほどの厚さの酸化皮膜を形成する必要はない。工程(c)においても、陽極酸化を長時間施すほど、深い細孔を得ることができるが、ナノ凹凸構造を転写するためのスタンパとしては、工程(c)では厚さが0.01~0.5μm程度の酸化皮膜を形成すればよく、工程(a)で形成するほどの厚さの酸化皮膜を形成する必要はない。
工程(c)の後、第2の酸化皮膜34の一部を除去し、工程(c)で形成された細孔31の径を拡大させる孔径拡大処理を行って、細孔35の径を工程(c)で形成された細孔の径よりも拡大する。孔径拡大処理の具体的方法としては、アルミナを溶解する溶液に浸漬して、工程(c)で形成された細孔の径をエッチングにより拡大させる方法が挙げられる。このような溶液としては、例えば、5.0質量%程度のリン酸水溶液が挙げられる。工程(d)の時間を長くするほど、細孔の径は大きくなる。
再度、工程(c)を行って、細孔35の形状を径の異なる2段の円柱状とし、その後、再度、工程(d)を行う。このように、工程(c)と工程(d)を繰り返すことで、図2(f)に示すように、細孔35の形状を開口部から深さ方向に徐々に径が縮小するテーパー形状にでき、その結果、周期的な複数の細孔からなるナノ凹凸構造が形成された陽極酸化アルミナが被加工面に形成されたスタンパ20が得られる。
陽極酸化ポーラスアルミナからなるスタンパの一部の縦断面を1分間Pt蒸着し、電界放出形走査電子顕微鏡(日本電子社製、商品名JSM-7400F)により加速電圧3.00kVで観察し、隣り合う細孔の間隔(周期)及び細孔の深さを測定した。具体的にはそれぞれ10点ずつ測定し、その平均値を測定値とした。
ナノ凹凸構造の縦断面を10分間Pt蒸着し、上記(1)の場合と同じ装置及び条件にて、隣り合う凸部又は凹部の間隔及び凸部の高さを測定した。具体的にはそれぞれ10点ずつ測定し、その平均値を測定値とした。
樹脂組成物の25℃における粘度を、回転式E型粘度計にて測定した。
中間層原料を光硬化させて厚さ500μmのフィルムに成形し、このフィルムを幅5mmの短冊状に打ち抜いたものを試験片とし、セイコーインスツルメンツ株式会社製粘弾性測定装置DMS110を用い、引張モード、チャック間2cm、振動周波数1Hzにて-50~100℃まで2℃/分で昇温の条件で測定し、tanδを求めた。
中間層原料を光硬化させて厚さ5mmの板状に成形し、この板を直径12mmの円柱状に打ち抜いたものを試験片とし、圧縮試験機にて0.5mm/分の速度で圧縮率50%になるまで圧縮して応力-歪曲線を得た。また、圧縮率20%における圧縮応力と、50%まで圧縮した後応力を解放し、元の厚みの90%に戻るまでの時間も測定した。
基材、中間層形成後、表層形成後のそれぞれの厚さを測ることで、各層の厚さを算出した。
JIS K5600-5-4に準じて、荷重750gで試験を行った。試験後5分経った時点で、外観を目視にて観察し、傷が付かない鉛筆の硬度を記した。(2Hで傷が付かず、3Hで傷が付く場合は「2H」と表記する。)
(8)耐擦傷性の評価:
磨耗試験機(新東科学社製、商品名HEIDON)に1cm四方のキャンバス布を装着し、100gの荷重をかけて、往復距離50mm、ヘッドスピード60mm/sの条件にてナノ凹凸構造体の表面を1000回擦傷した。その後、外観を目視にて観察し、以下の基準により評価した。
「◎」:どの角度から見ても傷が確認できない。
「○」:見る角度によって傷が確認される。
「△」:どの角度から見ても1~2本の傷が確認される。
「×」:3本以上の傷が確認される。
純度99.99%のアルミニウム板を、羽布研磨及び過塩素酸/エタノール混合溶液(1/4体積比)中で電解研磨し鏡面化した。
(a)工程:
このアルミニウム板を、0.3Mシュウ酸水溶液中で、直流40V、温度16℃の条件で30分間陽極酸化を行った。
(b)工程:
上記工程で酸化皮膜が形成されたアルミニウム板を、6質量%リン酸/1.8質量%クロム酸混合水溶液に6時間浸漬して、酸化皮膜を除去した。
(c)工程:
このアルミニウム板を、0.3Mシュウ酸水溶液中、直流40V、温度16℃の条件で30秒陽極酸化を行った。
(d)工程:
上記工程で酸化皮膜が形成されたアルミニウム板を、32℃の5質量%リン酸に8分間浸漬して、細孔径拡大処理を行った。
(e)工程:
前記(c)工程及び(d)工程を合計で5回繰り返し、周期100nm、深さ180nmの略円錐形状の細孔を有する陽極酸化ポーラスアルミナを得た。
表1に示す配合量(部)で各成分を混合し、中間層原料A1~A11を得た。表1中の略号は以下の通りである。
・「EB8402」:2官能ウレタンアクリレート(ダイセル・サイテック製、商品名EBECRYL8402)
・「EB8465」:2官能ウレタンアクリレート(ダイセル・サイテック製、商品名EBECRYL8465)
・「EB8701」:2官能ウレタンアクリレート(ダイセル・サイテック製、商品名EBECRYL8701)
・「A-600」:ポリエチレングリコールジアクリレート(新中村化学製、商品名NKエステルA-600)
・「M1200」:2官能ウレタンアクリレート(東亞合成製、商品名アロニックスM1200)
・「ATM-4E」:エトキシ化ペンタエリスリトールテトラアクリレート(新中村化学製、商品名NKエステルATM-4E)
・「CHDMMA」:シクロヘキサンジメタノールモノアクリレート(日本合成製)
・「AE400」:ポリエチレングリコール(繰返し数=9)モノアクリレート(日油製、商品名ブレンマーAE400)
・「AP400」:ポリプロピレングリコール(繰返し数=7)モノアクリレート(日油製、商品名ブレンマーAP400)
・「AM230」:末端メチル化ポリエチレングリコール(繰返し数=23)モノアクリレート(新中村化学工業社製、商品名NKエステルAM230G)
・「TPO」:2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド(日本チバガイギー社製、商品名Darocure TPO)
・「MEK」:メチルエチルケトン
(表層形成用の樹脂組成物の調製)
エトキシ化ペンタエリスリトールテトラアクリレート(新中村化学工業社製、商品名NKエステルATM-4E)80部、シリコーンジアクリレート(信越化学工業社製、商品名x-22-1602)15部、2-ヒドロキシエチルアクリレート5部、活性エネルギー線重合開始剤として2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン(日本チバガイギー社製、商品名DAROCURE 1173)0.5部及び2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド(日本チバガイギー社製、商品名DAROCURE TPO)0.5部を混合して、表層形成用の活性エネルギー線硬化性樹脂組成物を得た。
(中間層の形成)
透明基材として、ポリエチレンテレフタレートフィルム(東洋紡社製、商品名A-4300、厚さ188μm)を用意した。この基材フィルム上に、バーコーターを用いて中間層原料A1を均一塗布し、80℃の乾燥機内に5分間静置した。次いで、中間層原料を塗布した側から高圧水銀灯を用いて800mJ/cm2のエネルギーで紫外線を照射して塗膜を硬化し、中間層を形成した。中間層の厚さは18μmであった。
スタンパの細孔面上に表層形成用の樹脂組成物を流し込み、その上に中間層が接するように基材フィルムを押し広げながら被覆した。この基材フィルム側から高圧水銀灯を用いて2000mJ/cm2のエネルギーで紫外線を照射し、樹脂組成物を硬化した。その後スタンパを剥離して、ナノ凹凸構造を表面に有する積層体を得た。
表2に示す中間層原料と各層厚を採用したたこと以外は、実施例A1と同じサイズのナノ凹凸構造を表面に有する積層体を作製した。評価結果を表2に示す。
表3に示すように、所定量の帯電防止剤(LFBS、フッ素化アルキルスルホン酸塩(三菱マテリアル電子化成製:エフトップLFBS))を添加したこと以外は、実施例A2(中間層原料2)と同様の組成の中間層原料を調製した。なお、これらの各中間層原料は主要成分組成が実施例A2と同じ故に、実施例A2(中間層原料2)と略同じ粘度、tanδ、20%圧縮応力、50%圧縮からの復元時間を示すものである。
表3に示すように、実施例A12~A14は帯電防止剤を用いているため、表面抵抗値が低減され、帯電防止能が良好であった。参考例3は帯電防止剤を用いていないため、表面抵抗値が高いものになった。参考例4は表層が厚すぎ、中間層の帯電防止能が反映されなかった。
表1に示す配合量(部)で各成分を混合し、中間層用原料B1~B13を得た。
・「EB8402」:2官能ウレタンアクリレート(ダイセル・サイテック製、商品名EBECRYL8402)
・「EB8465」:2官能ウレタンアクリレート(ダイセル・サイテック製、商品名EBECRYL8465)
・「EB8701」:3官能ウレタンアクリレート(ダイセル・サイテック製)
・「A-600」:2官能ポリエチレングリコールジアクリレート(新中村化学製、商品名NKエステルA-600)
・「M1200」:2官能ウレタンアクリレート(東亞合成製、商品名アロニックスM1200)
・「ATM-4E」:エトキシ化ペンタエリスリトールテトラアクリレート(新中村化学製、商品名NKエステルATM-4E)
・「TMPT-9EO」:エトキシ化トリメチロールプロパントリメタクリレート(新中村化学株製、商品名NKエステルTMPT-9EO)
・「CHDMMA」:シクロヘキサンジメタノールモノアクリレート(日本合成製)
・「AP400」:ポリプロピレングリコール(繰返し数=7)モノアクリレート(日油製、商品名ブレンマーAP400)
・「AM230」:末端メチル化ポリエチレングリコール(繰返し数=23)モノアクリレート(新中村化学工業社製、商品名NKエステルAM230G)
・「Irg」:1.2 α-ヒドロキシアルキルフェノン(日本チバガイギー社製、商品名Irgacure 184)
・「MEK」:メチルエチルケトン
[実施例B1]
以下の材料を混合して、活性エネルギー線硬化性表層用原料を調製した。
エトキシ化ペンタエリスリトールテトラアクリレート(新中村化学工業社製、商品名NKエステルATM-4E)80部
シリコーンジアクリレート(信越化学工業社製、商品名x-22-1602)15部
2-ヒドロキシエチルアクリレート5部
活性エネルギー線重合開始剤
2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン(日本チバガイギー社製、商品名DAROCURE 1173)0.5部
2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド(日本チバガイギー社製、商品名DAROCURE TPO)0.5部
透明基材として、ポリエチレンテレフタレートフィルム(東洋紡社製、商品名A-4300、厚さ188μm)を用意した。この基材フィルム上に、バーコーターを用いて中間層用原料1を均一塗布し、80℃の乾燥機内に5分間静置した。次いで、中間層用原料を塗布した側から高圧水銀灯を用いて800mJ/cm2のエネルギーで紫外線を照射して塗膜を硬化し、中間層を形成した。
前記(8)の耐擦傷性の評価と、3500回擦傷したこと以外は同じ方法で試験を行い、以下の基準により評価した。
「◎」:傷が確認できない。
「○」:見る角度によって又は黒い布などの上に置いた場合にのみ傷が確認される。
「×」:傷が確認される。
前記(7)の鉛筆硬度試験と同じ方法で試験を行い、以下の規準で評価を行なった。
「◎」:4H以上。
「○」:2Hを超え4H未満。
「×」:2H以下。
表4に示す中間層原料を採用したこと以外は、実施例B1と同様にして積層体を作製した。評価結果を表5に示す。
11 透明基材
12 表層
13、13b 凸部
13a 凸部の頂点
14 凹部
14a 凹部の底点
15 中間層
W1 隣り合う凸部の間隔
d1 凹部の底点から凸部の頂点までの垂直距離
20 スタンパ
30 被加工面
31 細孔
32 第1の酸化皮膜
33 細孔発生点
34 第2の酸化皮膜
Claims (14)
- 基材上に中間層を介して表層が積層された積層体であって、中間層の厚さが8~40μmであり、表層の厚さが中間層の厚さの0.4~1.5倍であり、かつ、下記(A)および/または(B)を満たす積層体。
(A)20℃において振動周波数1Hzの条件で測定した中間層のtanδ(損失正接)が0.2以上である。
(B)20℃において振動周波数1Hzの条件で測定した表層の貯蔵弾性率(SG)に対する中間層の貯蔵弾性率(MG)の比(MG/SG)が、0.003以上、0.14以下である。 - 表層がナノ凹凸構造を有する層である請求項1記載の積層体。
- 圧縮破壊応力が20MPa以上であり、圧縮率20%における圧縮応力が1~20MPaであり、圧縮後に応力を解放した場合元の厚さの90%以上に戻る樹脂によって中間層が構成されている請求項1記載の積層体。
- 振動周波数1Hzの条件で測定した表層のゴム状平坦領域における貯蔵弾性率の極小値(sg)に対する中間層のゴム状平坦領域における貯蔵弾性率の極小値(mg)の比(mg/sg)が、0.009以上、0.05以下である請求項1記載の積層体。
- 中間層が、中間層原料を活性エネルギー線照射によって硬化させて形成した層である請求項1記載の積層体。
- 中間層が、帯電防止剤、紫外線吸収剤及び近赤外線吸収剤からなる群より選択される一種以上の添加剤を含む請求項1記載の積層体。
- 請求項1記載の積層体を備えた反射防止物品。
- 請求項1記載の積層体を備えた撥水性物品。
- 請求項1記載の積層体を備えたディスプレイ。
- 請求項1記載の積層体を備えた自動車用部材。
- 請求項1記載の積層体の製造方法であって、
基材上に中間層原料を塗布し、活性エネルギー線照射によって前記中間層原料の塗膜を完全に硬化又は完全な硬化には至らない状態まで硬化させる中間層形成工程と、
ナノ凹凸構造の反転構造を有するスタンパと前記基材上に形成された前記中間層との間に活性エネルギー線硬化性樹脂組成物を配し、活性エネルギー線照射によって前記活性エネルギー線硬化性樹脂組成物を硬化させ、その硬化物からなる層から前記スタンパを剥離することにより、前記硬化物からなるナノ凹凸構造を有する表層を形成する表層形成工程とを有することを特徴とするナノ凹凸構造を有する積層体の製造方法。 - 中間層形成工程において、酸素存在下での紫外線照射によって中間層原料の塗膜を完全な硬化には至らない状態まで硬化させる請求項11記載の積層体の製造方法。
- 中間層形成工程において、中間層原料の塗布の際にエアナイフによって塗膜の厚さを制御する請求項11記載の積層体の製造方法。
- 中間層形成工程において、中間層原料の塗布をグラビヤコーティングにより行う請求項11記載の積層体の製造方法。
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KR (1) | KR101304658B1 (ja) |
CN (1) | CN102883878B (ja) |
BR (1) | BR112012024875A2 (ja) |
TW (1) | TWI447026B (ja) |
WO (1) | WO2011125699A1 (ja) |
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CN104254443A (zh) * | 2012-04-25 | 2014-12-31 | 三菱丽阳株式会社 | 层积体及其制造方法 |
JP5652516B1 (ja) * | 2013-07-18 | 2015-01-14 | 大日本印刷株式会社 | 反射防止物品、及び画像表示装置 |
US20150144185A1 (en) * | 2012-05-18 | 2015-05-28 | Mitsubishi Rayon Co., Ltd. | Film, method for producing same, plate-like product, image display device, and solar cell |
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WO2017104520A1 (ja) * | 2015-12-15 | 2017-06-22 | シャープ株式会社 | 光学部材、及び、重合体層 |
WO2017145881A1 (ja) * | 2016-02-22 | 2017-08-31 | シャープ株式会社 | 光学部材の製造方法、及び、光学部材 |
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WO2018190208A1 (ja) * | 2017-04-11 | 2018-10-18 | 富士フイルム株式会社 | 光学積層体ならびにこれを有する画像表示装置の前面板、画像表示装置、抵抗膜式タッチパネルおよび静電容量式タッチパネル |
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- 2011-03-30 KR KR1020127028245A patent/KR101304658B1/ko active IP Right Grant
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- 2011-03-30 TW TW100111049A patent/TWI447026B/zh not_active IP Right Cessation
- 2011-03-30 CN CN201180017298.1A patent/CN102883878B/zh not_active Expired - Fee Related
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- 2011-03-30 BR BR112012024875A patent/BR112012024875A2/pt not_active Application Discontinuation
- 2011-03-30 US US13/638,058 patent/US9290666B2/en not_active Expired - Fee Related
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Cited By (14)
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US20130302564A1 (en) * | 2011-01-12 | 2013-11-14 | Mitsubishi Rayon Co., Ltd. | Active energy ray-curable resin composition, product having the uneven microstructure, and method for producing product having the uneven microstructure |
US9062142B2 (en) * | 2011-01-12 | 2015-06-23 | Mitsubishi Rayon Co., Ltd. | Active energy ray-curable resin composition, product having the uneven microstructure, and method for producing product having the uneven microstructure |
CN104254443B (zh) * | 2012-04-25 | 2017-03-15 | 三菱丽阳株式会社 | 层积体及其制造方法 |
CN104254443A (zh) * | 2012-04-25 | 2014-12-31 | 三菱丽阳株式会社 | 层积体及其制造方法 |
US20150144185A1 (en) * | 2012-05-18 | 2015-05-28 | Mitsubishi Rayon Co., Ltd. | Film, method for producing same, plate-like product, image display device, and solar cell |
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JP5652516B1 (ja) * | 2013-07-18 | 2015-01-14 | 大日本印刷株式会社 | 反射防止物品、及び画像表示装置 |
WO2017104520A1 (ja) * | 2015-12-15 | 2017-06-22 | シャープ株式会社 | 光学部材、及び、重合体層 |
US10947411B2 (en) | 2015-12-15 | 2021-03-16 | Sharp Kabushiki Kaisha | Optical member and polymer layer |
WO2017145881A1 (ja) * | 2016-02-22 | 2017-08-31 | シャープ株式会社 | 光学部材の製造方法、及び、光学部材 |
US11335282B2 (en) | 2018-10-30 | 2022-05-17 | HKC Corporation Limited | Driving method for display panel and driving device thereof |
WO2022124420A1 (ja) * | 2020-12-11 | 2022-06-16 | デクセリアルズ株式会社 | 光学体、光学体の製造方法、積層体及びイメージセンサ |
Also Published As
Publication number | Publication date |
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TW201144073A (en) | 2011-12-16 |
KR101304658B1 (ko) | 2013-09-05 |
EP2554366B1 (en) | 2014-12-17 |
BR112012024875A2 (pt) | 2018-07-24 |
KR20130006675A (ko) | 2013-01-17 |
CN102883878A (zh) | 2013-01-16 |
EP2554366A1 (en) | 2013-02-06 |
US20130129977A1 (en) | 2013-05-23 |
CN102883878B (zh) | 2014-04-23 |
TWI447026B (zh) | 2014-08-01 |
US9290666B2 (en) | 2016-03-22 |
EP2554366A4 (en) | 2014-04-09 |
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