WO2011049066A1 - アルミニウムまたはアルミニウム合金バレル電気めっき方法 - Google Patents
アルミニウムまたはアルミニウム合金バレル電気めっき方法 Download PDFInfo
- Publication number
- WO2011049066A1 WO2011049066A1 PCT/JP2010/068328 JP2010068328W WO2011049066A1 WO 2011049066 A1 WO2011049066 A1 WO 2011049066A1 JP 2010068328 W JP2010068328 W JP 2010068328W WO 2011049066 A1 WO2011049066 A1 WO 2011049066A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- barrel
- anode
- halides
- plating bath
- plating
- Prior art date
Links
- 229910000838 Al alloy Inorganic materials 0.000 title claims abstract description 33
- 238000009713 electroplating Methods 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims abstract description 30
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 29
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 24
- 238000007747 plating Methods 0.000 claims abstract description 155
- 150000004820 halides Chemical class 0.000 claims description 34
- -1 aluminum halide Chemical class 0.000 claims description 31
- 229910052757 nitrogen Inorganic materials 0.000 claims description 31
- 150000001875 compounds Chemical class 0.000 claims description 12
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 239000011572 manganese Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 239000011737 fluorine Substances 0.000 claims description 6
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 229910018131 Al-Mn Inorganic materials 0.000 claims description 3
- 229910018461 Al—Mn Inorganic materials 0.000 claims description 3
- 150000001449 anionic compounds Chemical class 0.000 claims description 3
- 239000002608 ionic liquid Substances 0.000 claims description 3
- 150000002891 organic anions Chemical class 0.000 claims description 3
- 229910052700 potassium Inorganic materials 0.000 claims 2
- 239000011591 potassium Substances 0.000 claims 2
- 229910001093 Zr alloy Inorganic materials 0.000 claims 1
- 230000008021 deposition Effects 0.000 abstract description 2
- 230000032798 delamination Effects 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 description 25
- 229910000914 Mn alloy Inorganic materials 0.000 description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 9
- 125000005843 halogen group Chemical group 0.000 description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 8
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 8
- 125000006165 cyclic alkyl group Chemical group 0.000 description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229920000620 organic polymer Polymers 0.000 description 6
- 239000004809 Teflon Substances 0.000 description 5
- 229920006362 Teflon® Polymers 0.000 description 5
- 150000002391 heterocyclic compounds Chemical class 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- AJRFBXAXVLBZMP-UHFFFAOYSA-M 1-methyl-3-propylimidazol-1-ium;bromide Chemical compound [Br-].CCCN1C=C[N+](C)=C1 AJRFBXAXVLBZMP-UHFFFAOYSA-M 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 3
- 150000003934 aromatic aldehydes Chemical class 0.000 description 3
- 150000008365 aromatic ketones Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical group 0.000 description 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- GWHJZXXIDMPWGX-UHFFFAOYSA-N 1,2,4-trimethylbenzene Chemical compound CC1=CC=C(C)C(C)=C1 GWHJZXXIDMPWGX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229910018580 Al—Zr Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 2
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229940099607 manganese chloride Drugs 0.000 description 2
- 235000002867 manganese chloride Nutrition 0.000 description 2
- 239000011565 manganese chloride Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 2
- JNBRDOQHPXUXLY-UHFFFAOYSA-N (2,5-difluorophenyl)hydrazine Chemical compound NNC1=CC(F)=CC=C1F JNBRDOQHPXUXLY-UHFFFAOYSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- GARJMFRQLMUUDD-UHFFFAOYSA-N 1,1-dimethylpyrrolidin-1-ium Chemical compound C[N+]1(C)CCCC1 GARJMFRQLMUUDD-UHFFFAOYSA-N 0.000 description 1
- YMRMDGSNYHCUCL-UHFFFAOYSA-N 1,2-dichloro-1,1,2-trifluoroethane Chemical compound FC(Cl)C(F)(F)Cl YMRMDGSNYHCUCL-UHFFFAOYSA-N 0.000 description 1
- QEIMBQONIVMYOA-UHFFFAOYSA-M 1,2-diethylpyrazol-1-ium;bromide Chemical compound [Br-].CCN1C=CC=[N+]1CC QEIMBQONIVMYOA-UHFFFAOYSA-M 0.000 description 1
- QDJNGYKMDNEXDS-UHFFFAOYSA-M 1,2-diethylpyrazol-1-ium;chloride Chemical compound [Cl-].CCN1C=CC=[N+]1CC QDJNGYKMDNEXDS-UHFFFAOYSA-M 0.000 description 1
- QJKFAOGSPNKIFY-UHFFFAOYSA-M 1,2-dimethylpyrazol-1-ium;bromide Chemical compound [Br-].CN1C=CC=[N+]1C QJKFAOGSPNKIFY-UHFFFAOYSA-M 0.000 description 1
- SYEJGWDUBPYTOR-UHFFFAOYSA-M 1,2-dimethylpyrazol-1-ium;chloride Chemical compound [Cl-].CN1C=CC=[N+]1C SYEJGWDUBPYTOR-UHFFFAOYSA-M 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- LORRLQMLLQLPSJ-UHFFFAOYSA-N 1,3,5-trithiane Chemical compound C1SCSCS1 LORRLQMLLQLPSJ-UHFFFAOYSA-N 0.000 description 1
- XUZFNEAIMDGBMY-UHFFFAOYSA-M 1,3-dibutylimidazol-1-ium;bromide Chemical compound [Br-].CCCCN1C=C[N+](CCCC)=C1 XUZFNEAIMDGBMY-UHFFFAOYSA-M 0.000 description 1
- YHQWECCOTSKSQC-UHFFFAOYSA-M 1,3-dibutylimidazol-1-ium;chloride Chemical compound [Cl-].CCCCN1C=C[N+](CCCC)=C1 YHQWECCOTSKSQC-UHFFFAOYSA-M 0.000 description 1
- CIKIMCLALRWQLU-UHFFFAOYSA-M 1,3-diethylimidazol-1-ium;bromide Chemical compound [Br-].CCN1C=C[N+](CC)=C1 CIKIMCLALRWQLU-UHFFFAOYSA-M 0.000 description 1
- YSNRFLSZENCKRS-UHFFFAOYSA-M 1,3-diethylimidazol-1-ium;chloride Chemical compound [Cl-].CCN1C=C[N+](CC)=C1 YSNRFLSZENCKRS-UHFFFAOYSA-M 0.000 description 1
- SKNNBMMWHRMJHX-UHFFFAOYSA-M 1,3-dimethylimidazol-1-ium;bromide Chemical compound [Br-].CN1C=C[N+](C)=C1 SKNNBMMWHRMJHX-UHFFFAOYSA-M 0.000 description 1
- IIJSFQFJZAEKHB-UHFFFAOYSA-M 1,3-dimethylimidazol-1-ium;chloride Chemical compound [Cl-].CN1C=C[N+](C)=C1 IIJSFQFJZAEKHB-UHFFFAOYSA-M 0.000 description 1
- XHQBIYCRFVVHFD-UHFFFAOYSA-N 1-benzothiophen-3-ol Chemical group C1=CC=C2C(O)=CSC2=C1 XHQBIYCRFVVHFD-UHFFFAOYSA-N 0.000 description 1
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 1
- MHESOLAAORBNPM-UHFFFAOYSA-N 1-benzothiophene-2,3-dione Chemical compound C1=CC=C2C(=O)C(=O)SC2=C1 MHESOLAAORBNPM-UHFFFAOYSA-N 0.000 description 1
- BOOXKGZZTBKJFE-UHFFFAOYSA-M 1-butyl-1-methylpyrrolidin-1-ium;chloride Chemical compound [Cl-].CCCC[N+]1(C)CCCC1 BOOXKGZZTBKJFE-UHFFFAOYSA-M 0.000 description 1
- DXVBBMSWHDSSPW-UHFFFAOYSA-N 1-butyl-1h-pyrazol-1-ium;bromide Chemical compound [Br-].CCCC[NH+]1C=CC=N1 DXVBBMSWHDSSPW-UHFFFAOYSA-N 0.000 description 1
- AESBACLQLRCOLY-UHFFFAOYSA-M 1-butyl-2-methylpyrazol-2-ium;bromide Chemical compound [Br-].CCCCN1C=CC=[N+]1C AESBACLQLRCOLY-UHFFFAOYSA-M 0.000 description 1
- DXYVZQCZGRAFNX-UHFFFAOYSA-M 1-butyl-2-methylpyrazol-2-ium;chloride Chemical compound [Cl-].CCCCN1C=CC=[N+]1C DXYVZQCZGRAFNX-UHFFFAOYSA-M 0.000 description 1
- KVBQNFMTEUEOCD-UHFFFAOYSA-M 1-butylpyridin-1-ium;bromide Chemical compound [Br-].CCCC[N+]1=CC=CC=C1 KVBQNFMTEUEOCD-UHFFFAOYSA-M 0.000 description 1
- POKOASTYJWUQJG-UHFFFAOYSA-M 1-butylpyridin-1-ium;chloride Chemical compound [Cl-].CCCC[N+]1=CC=CC=C1 POKOASTYJWUQJG-UHFFFAOYSA-M 0.000 description 1
- JXIJPHVMDSPMTP-UHFFFAOYSA-N 1-butylpyrrolidin-1-ium;chloride Chemical compound Cl.CCCCN1CCCC1 JXIJPHVMDSPMTP-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- SREOJFTWJYAMFN-UHFFFAOYSA-M 1-ethyl-1-methyl-2h-pyridin-1-ium;chloride Chemical compound [Cl-].CC[N+]1(C)CC=CC=C1 SREOJFTWJYAMFN-UHFFFAOYSA-M 0.000 description 1
- JZZVIWVVEXOIIC-UHFFFAOYSA-M 1-ethyl-1-methylpyrrolidin-1-ium;chloride Chemical compound [Cl-].CC[N+]1(C)CCCC1 JZZVIWVVEXOIIC-UHFFFAOYSA-M 0.000 description 1
- FUJYPVGWFCTJEX-UHFFFAOYSA-M 1-ethyl-1-propyl-2h-pyridin-1-ium;chloride Chemical compound [Cl-].CCC[N+]1(CC)CC=CC=C1 FUJYPVGWFCTJEX-UHFFFAOYSA-M 0.000 description 1
- WZLJIIAUVGOWMI-UHFFFAOYSA-M 1-ethyl-2-methylpyrazol-2-ium;bromide Chemical compound [Br-].CCN1C=CC=[N+]1C WZLJIIAUVGOWMI-UHFFFAOYSA-M 0.000 description 1
- IBZJNLWLRUHZIX-UHFFFAOYSA-N 1-ethyl-3-methyl-2h-imidazole Chemical compound CCN1CN(C)C=C1 IBZJNLWLRUHZIX-UHFFFAOYSA-N 0.000 description 1
- BMQZYMYBQZGEEY-UHFFFAOYSA-M 1-ethyl-3-methylimidazolium chloride Chemical compound [Cl-].CCN1C=C[N+](C)=C1 BMQZYMYBQZGEEY-UHFFFAOYSA-M 0.000 description 1
- PUBHYFMAUADWKI-UHFFFAOYSA-M 1-ethyl-3-methylpyridin-1-ium;bromide Chemical compound [Br-].CC[N+]1=CC=CC(C)=C1 PUBHYFMAUADWKI-UHFFFAOYSA-M 0.000 description 1
- DVDFUOWAJIWJJN-UHFFFAOYSA-M 1-ethyl-3-methylpyridin-1-ium;chloride Chemical compound [Cl-].CC[N+]1=CC=CC(C)=C1 DVDFUOWAJIWJJN-UHFFFAOYSA-M 0.000 description 1
- IWDFHWZHHOSSGR-UHFFFAOYSA-N 1-ethylimidazole Chemical compound CCN1C=CN=C1 IWDFHWZHHOSSGR-UHFFFAOYSA-N 0.000 description 1
- ABFDKXBSQCTIKH-UHFFFAOYSA-M 1-ethylpyridin-1-ium;bromide Chemical compound [Br-].CC[N+]1=CC=CC=C1 ABFDKXBSQCTIKH-UHFFFAOYSA-M 0.000 description 1
- AMFMJCAPWCXUEI-UHFFFAOYSA-M 1-ethylpyridin-1-ium;chloride Chemical compound [Cl-].CC[N+]1=CC=CC=C1 AMFMJCAPWCXUEI-UHFFFAOYSA-M 0.000 description 1
- OEUPQULTDYTGGS-UHFFFAOYSA-N 1-ethylpyrrolidin-1-ium;chloride Chemical compound Cl.CCN1CCCC1 OEUPQULTDYTGGS-UHFFFAOYSA-N 0.000 description 1
- NQCGTURNQPKCRW-UHFFFAOYSA-M 1-hexyl-1-methyl-2h-pyridin-1-ium;chloride Chemical compound [Cl-].CCCCCC[N+]1(C)CC=CC=C1 NQCGTURNQPKCRW-UHFFFAOYSA-M 0.000 description 1
- AAYSMYJPAJCXCJ-UHFFFAOYSA-M 1-hexyl-2-methylpyrazol-2-ium;bromide Chemical compound [Br-].CCCCCCN1C=CC=[N+]1C AAYSMYJPAJCXCJ-UHFFFAOYSA-M 0.000 description 1
- PXOAHFAVUCZMFZ-UHFFFAOYSA-M 1-hexyl-2-methylpyrazol-2-ium;chloride Chemical compound [Cl-].CCCCCCN1C=CC=[N+]1C PXOAHFAVUCZMFZ-UHFFFAOYSA-M 0.000 description 1
- SZRSEFNUSHACPD-UHFFFAOYSA-M 1-hexylpyridin-1-ium;bromide Chemical compound [Br-].CCCCCC[N+]1=CC=CC=C1 SZRSEFNUSHACPD-UHFFFAOYSA-M 0.000 description 1
- JEOSMYVMLZTQOH-UHFFFAOYSA-M 1-hexylpyridin-1-ium;chloride Chemical compound [Cl-].CCCCCC[N+]1=CC=CC=C1 JEOSMYVMLZTQOH-UHFFFAOYSA-M 0.000 description 1
- ZRJFXYGBCSIPLT-UHFFFAOYSA-M 1-methyl-1-propyl-2h-pyridin-1-ium;chloride Chemical compound [Cl-].CCC[N+]1(C)CC=CC=C1 ZRJFXYGBCSIPLT-UHFFFAOYSA-M 0.000 description 1
- OOKUTCYPKPJYFV-UHFFFAOYSA-N 1-methyl-1h-imidazol-1-ium;bromide Chemical compound [Br-].CN1C=C[NH+]=C1 OOKUTCYPKPJYFV-UHFFFAOYSA-N 0.000 description 1
- STCBHSHARMAIOM-UHFFFAOYSA-N 1-methyl-1h-imidazol-1-ium;chloride Chemical compound Cl.CN1C=CN=C1 STCBHSHARMAIOM-UHFFFAOYSA-N 0.000 description 1
- SFHHFDBXQBNJAT-UHFFFAOYSA-M 1-methyl-2-propylpyrazol-1-ium;bromide Chemical compound [Br-].CCCN1C=CC=[N+]1C SFHHFDBXQBNJAT-UHFFFAOYSA-M 0.000 description 1
- PAYYUKPPZWOSMS-UHFFFAOYSA-M 1-methyl-2-propylpyrazol-1-ium;chloride Chemical compound [Cl-].CCCN1C=CC=[N+]1C PAYYUKPPZWOSMS-UHFFFAOYSA-M 0.000 description 1
- JOLFMOZUQSZTML-UHFFFAOYSA-M 1-methyl-3-propylimidazol-1-ium;chloride Chemical compound [Cl-].CCCN1C=C[N+](C)=C1 JOLFMOZUQSZTML-UHFFFAOYSA-M 0.000 description 1
- WTDKNKIQGBNMKG-UHFFFAOYSA-M 1-methylpyridin-1-ium;bromide Chemical compound [Br-].C[N+]1=CC=CC=C1 WTDKNKIQGBNMKG-UHFFFAOYSA-M 0.000 description 1
- QAIGYXWRIHZZAA-UHFFFAOYSA-M 1-methylpyridin-1-ium;chloride Chemical compound [Cl-].C[N+]1=CC=CC=C1 QAIGYXWRIHZZAA-UHFFFAOYSA-M 0.000 description 1
- WIGRVUWJNPVKPB-UHFFFAOYSA-N 1-methylpyrrolidin-1-ium;chloride Chemical compound Cl.CN1CCCC1 WIGRVUWJNPVKPB-UHFFFAOYSA-N 0.000 description 1
- XXZFCJVFXKCILB-UHFFFAOYSA-N 1-methylpyrrolidine;hydrobromide Chemical compound [Br-].C[NH+]1CCCC1 XXZFCJVFXKCILB-UHFFFAOYSA-N 0.000 description 1
- JJSMKFMMHVAWBK-UHFFFAOYSA-N 1-octyl-1h-imidazol-1-ium;bromide Chemical compound [Br-].CCCCCCCC[N+]=1C=CNC=1 JJSMKFMMHVAWBK-UHFFFAOYSA-N 0.000 description 1
- RRMCUJFIZQNXQL-UHFFFAOYSA-N 1-propyl-1h-imidazol-1-ium;bromide Chemical compound [Br-].CCC[NH+]1C=CN=C1 RRMCUJFIZQNXQL-UHFFFAOYSA-N 0.000 description 1
- IBOIUWAYPMADRC-UHFFFAOYSA-M 1-propylpyridin-1-ium;chloride Chemical compound [Cl-].CCC[N+]1=CC=CC=C1 IBOIUWAYPMADRC-UHFFFAOYSA-M 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- YTGSYRVSBPFKMQ-UHFFFAOYSA-N 2,2,2-tribromoacetaldehyde Chemical compound BrC(Br)(Br)C=O YTGSYRVSBPFKMQ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- VJEZYZLITKUTFH-UHFFFAOYSA-N 2-(hydrazinecarbonyl)benzoic acid Chemical compound NNC(=O)C1=CC=CC=C1C(O)=O VJEZYZLITKUTFH-UHFFFAOYSA-N 0.000 description 1
- LXUNZSDDXMPKLP-UHFFFAOYSA-N 2-Methylbenzenethiol Chemical compound CC1=CC=CC=C1S LXUNZSDDXMPKLP-UHFFFAOYSA-N 0.000 description 1
- RFCQDOVPMUSZMN-UHFFFAOYSA-N 2-Naphthalenethiol Chemical compound C1=CC=CC2=CC(S)=CC=C21 RFCQDOVPMUSZMN-UHFFFAOYSA-N 0.000 description 1
- RZPFMIUPVMYKEO-UHFFFAOYSA-N 2-butyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].CCCC[NH+]1C=CC=N1 RZPFMIUPVMYKEO-UHFFFAOYSA-N 0.000 description 1
- LGYNIFWIKSEESD-UHFFFAOYSA-N 2-ethylhexanal Chemical compound CCCCC(CC)C=O LGYNIFWIKSEESD-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- FYQCZRZXGKSJGD-UHFFFAOYSA-N 2-hexyl-1h-pyrazol-2-ium;bromide Chemical compound [Br-].CCCCCC[NH+]1C=CC=N1 FYQCZRZXGKSJGD-UHFFFAOYSA-N 0.000 description 1
- WAZMNAJKBTUSFY-UHFFFAOYSA-N 2-hexyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].CCCCCC[NH+]1C=CC=N1 WAZMNAJKBTUSFY-UHFFFAOYSA-N 0.000 description 1
- DIJITKCUPZPMFZ-UHFFFAOYSA-M 2-methyl-1-propylpyridin-1-ium;bromide Chemical compound [Br-].CCC[N+]1=CC=CC=C1C DIJITKCUPZPMFZ-UHFFFAOYSA-M 0.000 description 1
- ZNDYAWHMRLOIBB-UHFFFAOYSA-M 2-methyl-1-propylpyridin-1-ium;chloride Chemical compound [Cl-].CCC[N+]1=CC=CC=C1C ZNDYAWHMRLOIBB-UHFFFAOYSA-M 0.000 description 1
- TUODQTJBSURDDW-UHFFFAOYSA-N 2-methyl-1h-pyrazol-2-ium;bromide Chemical compound [Br-].C[NH+]1C=CC=N1 TUODQTJBSURDDW-UHFFFAOYSA-N 0.000 description 1
- HLGHIKBHXHNJQP-UHFFFAOYSA-N 2-methyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].C[NH+]1C=CC=N1 HLGHIKBHXHNJQP-UHFFFAOYSA-N 0.000 description 1
- YVJYCLNKTRASAI-UHFFFAOYSA-N 2-propyl-1h-pyrazol-2-ium;bromide Chemical compound [Br-].CCC[NH+]1C=CC=N1 YVJYCLNKTRASAI-UHFFFAOYSA-N 0.000 description 1
- CEXCVJQRVZRCBE-UHFFFAOYSA-N 2-propyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].CCC[NH+]1C=CC=N1 CEXCVJQRVZRCBE-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- ABDVJABGTGHCPI-UHFFFAOYSA-N 3-ethyl-1h-imidazol-3-ium;chloride Chemical compound Cl.CCN1C=CN=C1 ABDVJABGTGHCPI-UHFFFAOYSA-N 0.000 description 1
- IATNTPRVOWFGAL-UHFFFAOYSA-N 3-octyl-1h-imidazol-3-ium;chloride Chemical compound [Cl-].CCCCCCCC[NH+]1C=CN=C1 IATNTPRVOWFGAL-UHFFFAOYSA-N 0.000 description 1
- DHILVHZCFOSZSW-UHFFFAOYSA-N 3-propyl-1h-imidazol-3-ium;chloride Chemical compound [Cl-].CCCN1C=C[NH+]=C1 DHILVHZCFOSZSW-UHFFFAOYSA-N 0.000 description 1
- RAFAYWADRVMWFA-UHFFFAOYSA-N 4,6-dimethyl-1h-pyrimidine-2-thione Chemical compound CC1=CC(C)=NC(S)=N1 RAFAYWADRVMWFA-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- PQJUJGAVDBINPI-UHFFFAOYSA-N 9H-thioxanthene Chemical compound C1=CC=C2CC3=CC=CC=C3SC2=C1 PQJUJGAVDBINPI-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- BWHOZHOGCMHOBV-UHFFFAOYSA-N Benzalacetone Natural products CC(=O)C=CC1=CC=CC=C1 BWHOZHOGCMHOBV-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical class OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 1
- XQFRJNBWHJMXHO-RRKCRQDMSA-N IDUR Chemical compound C1[C@H](O)[C@@H](CO)O[C@H]1N1C(=O)NC(=O)C(I)=C1 XQFRJNBWHJMXHO-RRKCRQDMSA-N 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- 241000234435 Lilium Species 0.000 description 1
- BGRDGMRNKXEXQD-UHFFFAOYSA-N Maleic hydrazide Chemical compound OC1=CC=C(O)N=N1 BGRDGMRNKXEXQD-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- QPFYXYFORQJZEC-FOCLMDBBSA-N Phenazopyridine Chemical group NC1=NC(N)=CC=C1\N=N\C1=CC=CC=C1 QPFYXYFORQJZEC-FOCLMDBBSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-O Pyrazolium Chemical compound C1=CN[NH+]=C1 WTKZEGDFNFYCGP-UHFFFAOYSA-O 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- QIOZLISABUUKJY-UHFFFAOYSA-N Thiobenzamide Chemical compound NC(=S)C1=CC=CC=C1 QIOZLISABUUKJY-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- MPYROIBZEQBJBO-UHFFFAOYSA-L [Br-].C(CC)[N+]=1N(C=CC1)C.[Cl-].C(CC)[N+]=1N(C=CC1)C Chemical compound [Br-].C(CC)[N+]=1N(C=CC1)C.[Cl-].C(CC)[N+]=1N(C=CC1)C MPYROIBZEQBJBO-UHFFFAOYSA-L 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- UIJGNTRUPZPVNG-UHFFFAOYSA-N benzenecarbothioic s-acid Chemical compound SC(=O)C1=CC=CC=C1 UIJGNTRUPZPVNG-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- FRZDLTCXOSFHJC-UHFFFAOYSA-N chromene-2-thione Chemical compound C1=CC=C2OC(=S)C=CC2=C1 FRZDLTCXOSFHJC-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- HFJRKMMYBMWEAD-UHFFFAOYSA-N dodecanal Chemical compound CCCCCCCCCCCC=O HFJRKMMYBMWEAD-UHFFFAOYSA-N 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 description 1
- 229940089454 lauryl aldehyde Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine powder Natural products NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- BOQKCADLPNLYCZ-UHFFFAOYSA-N n-phenylbenzenecarbothioamide Chemical compound C=1C=CC=CC=1C(=S)NC1=CC=CC=C1 BOQKCADLPNLYCZ-UHFFFAOYSA-N 0.000 description 1
- MWCGLTCRJJFXKR-UHFFFAOYSA-N n-phenylethanethioamide Chemical compound CC(=S)NC1=CC=CC=C1 MWCGLTCRJJFXKR-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- FXLOVSHXALFLKQ-UHFFFAOYSA-N p-tolualdehyde Chemical compound CC1=CC=C(C=O)C=C1 FXLOVSHXALFLKQ-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 description 1
- ACOOSTZBTYEGER-UHFFFAOYSA-N thiobenzaldehyde Chemical compound S=CC1=CC=CC=C1 ACOOSTZBTYEGER-UHFFFAOYSA-N 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- ZEMGGZBWXRYJHK-UHFFFAOYSA-N thiouracil Chemical compound O=C1C=CNC(=S)N1 ZEMGGZBWXRYJHK-UHFFFAOYSA-N 0.000 description 1
- 229950000329 thiouracil Drugs 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- BWHOZHOGCMHOBV-BQYQJAHWSA-N trans-benzylideneacetone Chemical compound CC(=O)\C=C\C1=CC=CC=C1 BWHOZHOGCMHOBV-BQYQJAHWSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- LOIYMIARKYCTBW-OWOJBTEDSA-N trans-urocanic acid Chemical compound OC(=O)\C=C\C1=CNC=N1 LOIYMIARKYCTBW-OWOJBTEDSA-N 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/18—Apparatus for electrolytic coating of small objects in bulk having closed containers
- C25D17/20—Horizontal barrels
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/42—Electroplating: Baths therefor from solutions of light metals
- C25D3/44—Aluminium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/001—Magnets
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/003—Threaded pieces, e.g. bolts or nuts
Definitions
- the present invention relates to a barrel plating method, and more particularly, to an aluminum or aluminum alloy barrel electroplating method for small parts such as bolts and screws.
- Patent Document 1 describes a barrel rotation support method and apparatus in a plating tank.
- the plating apparatus described here includes a barrel that accommodates an object to be plated, a cathode that is inserted into the barrel and is in contact with the object to be plated, and an anode that is disposed outside the barrel.
- FIG. 6 is a cross-sectional view schematically showing an example of a barrel plating apparatus used in a conventional barrel electroplating method. As shown in FIG. 6, a conventional barrel electroplating apparatus 100 has a barrel 104 rotatably supported in a plating tank 102, and an object to be plated W is accommodated in the barrel 104.
- the cathode 106 is arrange
- the anode 108 is disposed outside the barrel 104 in the plating tank 102.
- the present invention makes it possible to obtain a uniform plating film that does not easily cause adhesion failure such as non-plating, blistering, and peeling regardless of the amount of the object to be plated, and that is free from burns and gloss defects on the plating film. It aims to provide a barrel electroplating method that can be used.
- an object of the present invention is to provide a barrel electroplating method capable of efficiently plating aluminum or an aluminum alloy on an object to be plated.
- the present invention is a method of performing barrel electroplating using an aluminum or aluminum alloy plating bath, in which an anode disposed inside a barrel containing an object to be plated is rotated and shaken. While moving or vibrating, a voltage is applied between the anode and the cathode provided on the inner wall surface of the barrel to rotate, swing or vibrate the barrel.
- the object to be plated accommodated in the barrel is electrically connected to the cathode provided on the inner wall surface of the barrel.
- the barrel is rotated, rocked or oscillated.
- the anode is disposed in the barrel and is rotated, rocked, or vibrated by the anode driving unit.
- the cathode is provided on the inner wall surface of the barrel, the conduction between the object to be plated and the cathode is reliably ensured, and the anode is disposed in the barrel. Since it is rotated, oscillated, or oscillated by the drive unit, an excessive increase in bath voltage can be prevented. Thereby, regardless of the amount of the object to be plated, a good plating film can be obtained.
- the aluminum or aluminum alloy plating bath is a non-aqueous aluminum plating bath or a non-aqueous aluminum alloy plating bath.
- the non-aqueous aluminum plating bath or the non-aqueous aluminum alloy plating bath includes, for example, the following baths.
- the Al plating bath is composed of A) aluminum halide and (B) N-alkylpyridinium halides, N-alkylimidazolium halides, N, N'-alkylimidazolium halides, N-alkylpyrazolium halides, N , N'- alkyl pyrazolium halides, N- alkylpyrrolidinium halides and N, N- alkylpyrrolidinium halide or BF4 -, PF6 -, TFSI - , BOB - fluorine-based inorganic or organic anions such as 1 type, or 2 or more types of compounds chosen from the group which consists of ionic liquids.
- Al plating bath contains, for example, (C) zirconium halide, (D) manganese halide alone or both, an Al—Zr alloy plating bath, an Al—Mn alloy plating bath, and an Al—Zr—Mn plating bath, respectively. It becomes. When other metals are contained, an Al alloy bath with the contained metals is obtained.
- the (A) aluminum halide used in the present invention is represented by AlX 3 , where X is a halogen such as fluorine, chlorine, bromine or iodine, with chlorine or bromine being preferred. In view of economy, chlorine is most preferable.
- the N-alkylpyridinium halides used as the compound (B) in the present invention may have an alkyl group substituted on the pyridium skeleton, and are represented by, for example, the following general formula (I).
- R 1 is a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, preferably a linear or branched alkyl group having 1 to 5 carbon atoms
- R 2 is a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, preferably a linear or branched alkyl group having 1 to 3 carbon atoms
- Is a halogen atom, and a bromine atom is most preferable as a halogen atom in consideration of reactivity.
- Specific N-alkylpyridinium halides include, for example, N-methylpyridinium chloride, N-methylpyridinium bromide, N-ethylpyridinium chlor
- N-alkylimidazolium halides and N, N′-alkylimidazolium halides used as the compound (B) in the present invention are represented by the following general formula (II).
- R 3 is a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, preferably a linear or branched alkyl group having 1 to 5 carbon atoms
- R 4 is a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, preferably a hydrogen atom or a linear or branched alkyl group having 1 to 3 carbon atoms.
- N-alkylimidazolium halides and N, N′-alkylimidazolium halides include, for example, 1-methylimidazolium chloride, 1-methylimidazolium bromide, 1-ethylimidazolium chloride, 1-ethylimidazole.
- N-alkylpyrazolium halides and N, N′-alkylpyrazolium halides used as the compound (B) in the present invention are represented by the following general formula (III).
- R 5 is a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, preferably a linear or branched alkyl group having 1 to 5 carbon atoms
- R 6 is a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, preferably a hydrogen atom or a linear or branched alkyl group having 1 to 3 carbon atoms.
- N-alkylpyrazolium halides and N, N′-alkylpyrazolium halides include, for example, 1-methylpyrazolium chloride, 1-methylpyrazolium bromide, 1-propylpyrazolium chloride.
- N-alkylpyrrolidinium halides and N, N-alkylpyrrolidinium halides used as the compound (B) in the present invention are represented by the following general formula (IV).
- R 7 is a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, preferably a linear or branched alkyl group having 1 to 5 carbon atoms.
- R 8 is a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, preferably a hydrogen atom or a linear or branched chain having 1 to 3 carbon atoms.
- N-alkylpyrrolidinium halides and N, N-alkylpyrrolidinium halides include, for example, 1-methylpyrrolidinium chloride, 1-methylpyrrolidinium bromide, 1,1-dimethylpyrrolidinium.
- Chloride 1-ethyl-1-methylpyrrolidinium chloride, 1-ethylpyrrolidinium chloride, 1-propylpyridinium chloride, 1-methyl-1-propylpyridinium chloride, 1-butyl-1-methylpyrrolidinium chloride, Examples thereof include 1-ethyl-1-propylpyridinium chloride, 1-methyl-1-hexylpyridinium chloride, 1-butylpyrrolidinium chloride, 1-ethyl-1-methylpyridinium chloride and the like.
- the compound (B) includes the above-mentioned N-alkylpyridinium halides, N-alkylimidazolium halides, N, N′-alkylimidazolium halides, N-alkylpyrazolium halides, N, N′— It may be a mixture of two or more of alkyl pyrazolium halides, N-alkyl pyrrolidinium halides and N, N-alkyl pyrrolidinium halides, and also a mixture of two or more of different halogen atoms. May be.
- the ratio of the number of moles of (A) aluminum halide to the number of moles of (B) compound is preferably in the range of 1: 1 to 3: 1, more preferably 2: 1.
- the (C) zirconium halide used in the present invention is represented by ZrX 4 , where X is a halogen such as fluorine, chlorine, bromine or iodine, and chlorine is preferred for handling.
- the concentration of zirconium halide in the bath is preferably 4 ⁇ 10 ⁇ 4 to 4 ⁇ 10 ⁇ 1 mol / l, more preferably 4 ⁇ 10 ⁇ 3 to 2 ⁇ 10 ⁇ 1 mol / l.
- manganese halide is represented by MnX 2
- X is fluorine, chlorine, bromine, a halogen such as iodine, handling, chlorine is preferred.
- the concentration of manganese halide in the bath is preferably 8 ⁇ 10 ⁇ 4 to 8 ⁇ 10 ⁇ 1 mol / l, more preferably 8 ⁇ 10 ⁇ 3 to 4 ⁇ 10 ⁇ 1 mol / l, even more preferably. Is 8 ⁇ 10 ⁇ 3 to 8 ⁇ 10 ⁇ 2 mol / l.
- the electric Al plating bath and the electric Al alloy plating bath used in the present invention may contain (E) an aromatic hydrocarbon solvent within a range not exceeding 50% by volume.
- the aromatic hydrocarbon solvent may be any non-aqueous aromatic solvent that can be dissolved in the molten salt and does not decrease the electrical conductivity of the molten salt.
- As an aromatic hydrocarbon solvent benzene, toluene, xylene, ethylbenzene, cumene, tetralin, mesitylene, hemimeritene, pseudocumene, etc. are mentioned. Of these, benzene, toluene, and xylene are preferred, with toluene being most preferred.
- the concentration of such aromatic hydrocarbon solvent in the bath is preferably in a range not exceeding 50% by volume, more preferably in the range of 1 to 50% by volume, and further preferably in the range of 5 to 10% by volume. is there.
- the throwing power is improved, uniform plating is obtained, and there is no risk of a decrease in electrical conductivity or a risk of flammability.
- the electric Al plating bath and the electric Al alloy plating bath used in the present invention contain (F) one or more organic polymers selected from the group consisting of a styrene polymer and an aliphatic diene polymer. Also good.
- the styrene polymer used as the organic polymer include styrene homopolymers such as styrene, ⁇ -methylstyrene, vinyltoluene, m-methylstyrene, copolymers of these, or styrene monomers. And copolymers of other polymerizable vinyl monomers.
- vinyl monomers examples include maleic anhydride, maleic acid, acrylic acid, methacrylic acid, methyl methacrylate, glycidyl methacrylate, itaconic acid, acrylamide, acrylonitrile, maleimide, vinyl pyridine, vinyl carbazole, acrylic ester, methacrylic acid.
- esters, fumaric acid esters, vinyl ethyl ether, and vinyl chloride Of these, ⁇ , ⁇ -unsaturated carboxylic acids having 3 to 10 carbon atoms or alkyl (1 to 3 carbon) esters thereof are preferred.
- Examples of the aliphatic diene polymer used as the organic polymer include polymers such as butadiene, isoprene, and pentadiene. Preferably, it is a polymer having a branched chain of 1, 2, or 3, 4 structure, or a copolymer of these with other polymerizable vinyl monomers. Examples of the vinyl monomer include those described for the styrene polymer.
- the weight average molecular weight of the organic polymer is preferably in the range of 200 to 80,000. In particular, low and medium molecular weight polystyrene having a weight average molecular weight of about 300 to 5,000 and poly- ⁇ -methylstyrene are most preferred because of their good molten salt solubility.
- the concentration in the bath is preferably in the range of 0.1 to 50 g / l, more preferably in the range of 1 to 10 g / l.
- the organic polymer (F) is used in such a range, dendrid precipitation can be prevented, a surface smoothing effect can be exhibited, and plating and burns can be prevented from occurring.
- the electric Al plating bath and the electric Al alloy plating bath used in the present invention may contain (G) a brightener.
- Brighteners include aliphatic aldehydes, aromatic aldehydes, aromatic ketones, nitrogen-containing unsaturated heterocyclic compounds, hydrazide compounds, S-containing heterocyclic compounds, aromatic hydrocarbons having an S-containing substituent, aromatic Examples thereof include one or more compounds selected from carboxylic acids and derivatives thereof, aliphatic carboxylic acids having a double bond and derivatives thereof, acetylene alcohol compounds, and trifluoroethylene chloride resins.
- the aliphatic aldehyde is, for example, an aliphatic aldehyde having 2 to 12 carbon atoms, and specific examples include tribromoacetaldehyde, metaaldehyde, 2-ethylhexyl aldehyde, lauryl aldehyde, and the like.
- the aromatic aldehyde is, for example, an aromatic aldehyde having 7 to 10 carbon atoms, and specifically includes 0-carboxybenzaldehyde, benzaldehyde, 0-chlorobenzaldehyde, p-tolualdehyde, anisaldehyde, p-dimethylaminobenzaldehyde, terephthalaldehyde.
- the aromatic ketone is, for example, an aromatic ketone having 8 to 14 carbon atoms, and specific examples include benzalacetone, benzophenone, acetophenone, terephthaloyl benzyl chloride and the like.
- the nitrogen-containing unsaturated heterocyclic compound is, for example, a nitrogen heterocyclic compound having 3 to 14 carbon atoms. Specifically, pyrimidine, pyrazine, pyridazine, s-triazine, quinoxaline, phthalazine, 1,10-phenanthroline, 1,2 , 3-benzotriazole, acetoguanamine, cyanuric chloride, imidazole-4-acrylic acid and the like.
- hydrazide compound examples include maleic acid hydrazide, isonicotinic acid hydrazide, phthalic acid hydrazide, and the like.
- the S-containing heterocyclic compound is, for example, an S-containing heterocyclic compound having 3 to 14 carbon atoms, and specific examples include thiouracil, thionicotinic acid amide, s-trithiane, 2-mercapto-4,6-dimethylpyrimidine and the like. .
- the aromatic hydrocarbon having an S-containing substituent is, for example, an aromatic hydrocarbon having an S-containing substituent having 7 to 20 carbon atoms, and specifically includes thiobenzoic acid, thioindigo, thioindoxyl, thioxanthene, thioxanthone. 2-thiocoumarin, thiocresol, thiodiphenylamine, thionaphthol, thiophenol, thiobenzamide, thiobenzanilide, thiobenzaldehyde, thionaphthenequinone, thionaphthene, thioacetanilide and the like.
- the aromatic carboxylic acid and derivatives thereof are, for example, aromatic carboxylic acids having 7 to 15 carbon atoms and derivatives thereof, and specific examples include benzoic acid, terephthalic acid, and ethyl benzoate.
- the aliphatic carboxylic acid having a double bond and its derivative are, for example, an aliphatic carboxylic acid having a double bond having 3 to 12 carbon atoms and its derivative, specifically, acrylic acid, crotonic acid, methacrylic acid, acrylic Examples include acid-2-ethylhexyl and 2-ethylhexyl methacrylate.
- Examples of the acetylene alcohol compound include propargyl alcohol.
- the fluororesin examples include a trifluorochloroethylene resin having an average molecular weight of 500 to 1300.
- the concentration of the brightener in the bath is preferably in the range of 0.001 to 0.1 mol / l, more preferably in the range of 0.002 to 0.02 mol / l.
- the brightening agent (G) when used in such a range, a smoothing effect is obtained, and even when plating is performed at a high current density, black Smut-like precipitation does not occur.
- two types of (E) aromatic hydrocarbon solvent, (F) organic polymer and (G) brightener may be used in combination. All of these three types may be used in combination.
- electroplating is used as the barrel plating method using the Al plating bath, Al-Zr alloy plating bath, Al-Mn alloy plating bath, and Al-Zr-Mn alloy plating bath of the present invention. Electroplating can be performed by direct current or pulse current, and pulse current is particularly preferable. When using a pulse current with a duty ratio (ON / OFF ratio) of preferably 1: 2 to 2: 1, most preferably 1: 1, an ON time of 5 to 20 ms, and an OFF time of 5 to 20 ms. It is preferable because the particles to be electrodeposited become dense and smooth.
- the bath temperature is usually in the range of 25 to 120 ° C, preferably in the range of 50 to 100 ° C.
- the current density is preferably 0.5 to 5 A / dm 2 , preferably 0.5 to 2 A / dm 2 .
- the barrel rotation speed is 0.5 to 10 rpm, preferably 0.5 to 2 rpm, and the anode rotation speed is 10 to 200 rpm, preferably 50 to 100 rpm.
- the non-aqueous Al plating bath and Al alloy plating bath of the present invention are safe to be exposed to oxygen and moisture, but in a dry oxygen-free atmosphere (dry nitrogen) from the standpoint of maintaining the stability of the plating bath and plating properties. Or in dry argon). Moreover, you may use liquid stirring together. If jet jet or ultrasonic stirring is used, the current density can be further increased.
- the plating when plating a complex shaped part, it is desirable to perform the plating for a long time at a low cathode current density of 0.5 to 1 A / dm 2 without stirring or weakening in order to improve the throwing power.
- the anode Al or an insoluble anode may be used.
- the barrel electroplating method of the present invention regardless of the amount of the object to be plated, it is difficult to cause poor adhesion such as non-plating, blistering, and peeling, and uniform plating with no burns or gloss defects on the plating film. A coating can be obtained.
- the barrel electroplating method of the present invention it is possible to efficiently plate aluminum or an aluminum alloy on an object to be plated.
- the present invention relates to a barrel in which an anode is disposed in the center of a barrel, a cathode is disposed on a barrel inner wall surface, the anode is rotated, rocked, or vibrated, and the cathode on the barrel wall surface is rocked, rotated, or vibrated.
- an aluminum or aluminum alloy plating method that uses an electroplating machine to improve the cathode contact so that the product to be plated is always energized, by reducing the bath voltage by reducing the distance between the electrodes, and by preventing current concentration This is based on the knowledge that the current density can be made uniform and a uniform plating film can be obtained.
- the present invention can improve the anode current efficiency and prevent the increase of the bath voltage by plating while rotating the anode installed in the barrel, further enhancing the uniformity of the film and the effect of preventing burns. This is based on the knowledge that high current density work is possible.
- FIGS. 1 is a front view of the barrel plating apparatus
- FIG. 2 is a left side view
- FIG. 3 is a right side view
- FIG. 4 is a cross-sectional view of the barrel
- FIG. 5 is a diagram showing a mechanism of an anode electrical contact for applying a positive voltage to the anode.
- the barrel plating apparatus 1 includes two frame plates 2a and 2b, a barrel 4 supported so as to be swingable with respect to the frame plate, and provided with a cathode, and the barrel 4 A voltage is applied between the cathode 6 and the anode 6 disposed on the central axis of the oscillation, the barrel driving motor 8 serving as the barrel driving unit, the anode driving motor 10 serving as the anode driving unit, and the anode 6.
- the barrel plating apparatus 1 is a barrel electroplating apparatus using an aluminum anode. This apparatus accommodates small articles such as bolts and screws in a barrel 4 and immerses the barrel plating apparatus 1 in a plating solution in a plating solution tank to a predetermined position. Next, while starting the anode driving motor 10 and rotating the anode 6, the barrel 4 is swung at a predetermined cycle, and a current is passed between the anode 6 and the cathode provided on the barrel 4, thereby The small article in 4 is subjected to aluminum or aluminum alloy plating.
- the power supply unit 11 is a pulse power supply unit that applies a pulsed voltage between the cathode and the anode 6.
- the frame plates 2a and 2b are two flat plates formed of an insulator, and are connected in parallel by three connecting rods 2c, 2d, and 2e.
- the frame plates 2a and 2b are provided with bearings for supporting the barrel 4 so as to be swingable between them.
- the frame plates 2a and 2b are made of Teflon (PTFE).
- the barrel 4 includes two large-diameter barrel gears 12 disposed at both ends, a thin metal plate 14 disposed so as to connect these, a positive electrode cover 16, and a negative terminal 18. And baffle plate 20.
- the thin plate 14 is bent into a concave shape to form a barrel having a half octagonal cross section, and an object to be plated (not shown) is accommodated inside this.
- the thin plate 14 is a copper plate provided with a large number of small holes, and its inner surface functions as a cathode provided on the inner wall surface. In use, the plating solution flows in or out through many small holes in the thin plate 14.
- the cathode itself is formed by forming the barrel itself from a conductive material.
- an insulator such as Teflon (registered trademark).
- a conductor cathode plate may be attached.
- the thin plate 14 is made of aluminum, but the barrel 4 may be made of nickel, stainless steel, titanium, carbon, or conductive resin as another metal.
- the anode cover 16 is formed of five plate-like members, and is disposed so as to cover the generally lower half of the anode 6 disposed in the barrel 4.
- the anode cover 16 prevents accidental contact of the object to be plated with the anode 6 when the number of objects to be plated is large.
- a large number of small holes are formed in the anode cover 16, and a current flows from the anode to the object to be plated through these small holes.
- the anode cover 16 is made of Teflon.
- the cathode terminal 18 is an elongated metal plate extending from both sides of the thin plate 14, and is connected to the negative terminal of the power supply unit 11 (FIG. 1).
- the baffle plate 20 is a prismatic member disposed at the corner of the folded thin plate 14, and the baffle plate 20 forms a triangular cross-section mountain inside the barrel 4.
- the baffle plate 20 forms a mountain on the inside of the barrel 4 so that the object to be plated is well mixed when the barrel 4 is swung.
- the anode 6 is a stepped shaft-like Al cylinder having a small diameter at both ends, and both ends extend through the frame plates 2a and 2b. ing. Thereby, the anode 6 is supported rotatably with respect to the frame plates 2a and 2b.
- An anode driving gear 22 is attached to one step of the anode 6.
- the anode 6 can be formed hollow and cylindrical.
- the anode 6 can also be comprised by attaching the soluble or insoluble anode material to the surface of the hollow cylinder formed with the plastic and / or metal so that replacement
- Aluminum or the like can be used for the anode.
- dimple-like irregularities of the golf ball are formed on the surface of the anode 6.
- the anode driving motor 10 disposed on the upper portion of the barrel plating apparatus 1 rotates and drives the anode driving gear 22 through transmission gears 24a, 24b, and 24c attached to the frame plate 2b. To do. Thereby, the anode 6 is rotationally driven.
- the barrel driving motor 8 arranged at the upper part of the barrel plating apparatus 1 drives the barrel gear 12 via transmission gears 26a and 26b attached to the frame plate 2a.
- the barrel gear 12 is provided with protrusions 12a and 12b.
- the protrusions 12a and 12b are moved, and thereby the rod 28 rotatably attached to the frame plate 2a is rotated.
- the tip of the rotated rod 28 switches the microswitches 30a and 30b arranged on both sides thereof on or off. That is, in FIG.
- the anode electrical contact portion includes a rod-like anode terminal 32, a coil spring 34 that urges the anode terminal 32, and a fixed-side contact member 36 that is a fixed-side member that contacts the anode 6. And an insulating sleeve 38 through which the anode terminal 32 passes, and a spring adjustment bolt 40 for adjusting the urging force of the coil spring 34.
- the anode electrical contact portion is immersed in the plating solution, and the anode 6 is slid with respect to the stationary contact member 36.
- the anode terminal 32 is a stepped shaft with a thin upper portion, and the upper end thereof is connected to the plus terminal of the power supply unit 11, and the fixed contact member 36 is attached to the lower end.
- the thinned upper portion of the anode terminal 32 is passed through the coil spring 34, and the stepped portion of the anode terminal 32 is engaged with the lower end of the coil spring 34.
- the stationary contact member 36 is made of titanium and is screwed to the lower end of the anode terminal 32.
- the bottom surface of the stationary contact member 36 is formed in a cylindrical surface so as to slide with a small contact area with the small diameter portion of the anode 6.
- the anode 6 is rotated while the bottom surface of the stationary contact member 36 that is the stationary side of the anode electrical contact and the Al anode 6 that is the movable side of the anode electrical contact are in contact.
- a current flows from the positive terminal of the power supply unit 11 to the anode 6 through the anode terminal 32 and the stationary contact member 36.
- the fixed side contact member 36 and / or the movable side of the anode electrical contact can be made of a corrosion-resistant metal material such as titanium or a titanium alloy.
- the insulating sleeve 38 is a pipe made of Teflon, and is arranged so as to cover the anode terminal 32 and the coil spring 34.
- the spring adjustment bolt 40 is a Teflon bolt-shaped member having a bore formed in the center. And is formed so as to be screwed onto the upper portion of the insulating sleeve 38.
- the spring adjustment bolt 40 is disposed such that the anode terminal 32 passes through the bore and the tip of the spring adjustment bolt 40 presses the upper end of the coil spring 34. For this reason, by rotating the spring adjustment bolt 40, the force for compressing the coil spring 34 changes, and the force for pressing the stationary contact member 36 against the anode 6 can be adjusted.
- each to-be-plated object is electrically connected with a cathode through the other to-be-plated object which is in direct contact with the inner wall surface of the barrel 4 or in contact with the inner wall surface of the barrel 4.
- substrate which is a to-be-plated object
- metals and alloys such as various metals, such as nickel and copper, and these alloys other than iron are mentioned.
- the object to be plated include various shapes such as bolts, nuts, washers, small press articles, rectangular parallelepipeds, columns, cylinders, and spherical objects.
- the barrel plating apparatus 1 After putting an object to be plated in the barrel 4, the barrel plating apparatus 1 is immersed in a plating tank containing a plating solution to a predetermined position. Specifically, the barrel plating apparatus 1 is plated so that the barrel 4 and the anode 6 are completely immersed in the plating solution, and the barrel driving motor 8 and the anode driving motor 10 are positioned above the liquid surface of the plating solution. Immerse in the liquid.
- the non-aqueous aluminum plating bath or the non-aqueous aluminum alloy plating bath that can be preferably used can be any of the non-aqueous aluminum plating bath and the non-aqueous aluminum alloy plating bath exemplified above.
- the barrel driving motor 8 and the anode driving motor 10 are started.
- the anode 6 is rotated at about 50 to 100 rpm around the central axis of the anode 6 by the driving force of the anode driving motor 10.
- the barrel gear 12 of the barrel 4 is rotationally driven at a rotational speed of about 1 rpm by the driving force of the barrel driving motor 8 and is swung so that the rotational direction is reversed every time it is rotated about 90 °. .
- a pulsed current of 50 A-10 V is caused to flow between the anode terminal 32 and the cathode terminal 18 by the power supply unit 11.
- the current flows through the anode terminal 32, the fixed contact member 36, the anode 6, the plating solution, the object to be plated, and the cathode (the inner wall surface of the barrel 4).
- the current flowing between the anode terminal 32 and the cathode terminal 18 may be a direct current.
- the bath temperature depends on the plating solution, but is generally 25 to 120 ° C, preferably 50 to 100 ° C.
- the current density is 0.1 to 5 A / dm 2 , preferably 0.5 to 2 A / dm 2 , more preferably 0.5 to 1.0 A / dm 2 .
- a plating solution in the barrel 4 is preferably circulated using a filter (not shown).
- the object to be plated in the barrel 4 is mixed, and a uniform plating layer is formed on the surface of the object to be plated.
- the baffle plate 20 provided in the barrel 4 promotes the mixing of the objects to be plated in the barrel 4 and forms a more uniform plating layer.
- the inner wall surface of the barrel 4 constitutes the cathode, the number of the objects to be plated is small, and even when the objects to be plated are not in contact with each other, the conduction of the objects to be plated to the cathode is ensured. The occurrence of bipolar phenomenon is prevented.
- the anode cover 16 is disposed around the anode 6, even when the number of objects to be plated is large, direct contact of the objects to be plated with the anode 6 is prevented.
- the anode 6 immersed in the plating solution is rotated, a flow of the plating solution is always generated around the anode 6 and the bath voltage (voltage between the anode terminal 32 and the cathode terminal 18) is abnormally increased. Can be prevented. Furthermore, since the anode 6 is disposed in the barrel 4 at a position relatively close to the cathode, and the object to be plated is disposed so as to surround the anode 6, the exposed area of the anode 6 with respect to the object to be plated increases, Black deposits due to concentration and burning are prevented. After a predetermined time, the application of voltage by the power supply unit 11 is stopped, and the barrel plating apparatus 1 is pulled up from the plating bath to finish the plating operation. Although aluminum and aluminum alloy plating of any thickness can be formed by this method, the thickness of the plating is preferably 2 ⁇ m or more, more preferably 3 to 25 ⁇ m.
- an Al-Zr-Mn alloy plating bath is particularly preferable.
- Example 1 Aluminum alloy plating was applied to M8 bolts using a barrel plating apparatus 1 (5 kg barrel) in which the cathode was an Al plate and the anode was Al. The amount of bolt input was varied between 1 and 5 kg. First, as pretreatment, alkaline degreasing, alkaline electrolytic cleaning and pickling are performed, Ni plating is performed, and water is thoroughly washed. It was dried after water replacement with ethanol.
- the composition of the plating bath is such that 10 g / L manganese chloride and 1 g / l zirconium chloride are added to a bath obtained by mixing and melting AlCl 3 and 1-methyl-3-propylimidazolium bromide in a molar ratio of 2: 1.
- An electric Al—Zr—Mn alloy plating bath was prepared. Immerse in the electric Al—Zr—Mn alloy plating bath maintained at 100 ° C. in a dry nitrogen gas atmosphere for 5 minutes, and then pulse current (duty ratio: 1/1, ON time: 10 ms, OFF in the same plating bath. Time: 10 ms) Al—Zr—Mn alloy plating was performed.
- the plating conditions were a current density of 1 A / dm 2 , a plating time of 120 minutes, and a bath temperature of 100 ° C.
- a glossy aluminum alloy plating film could be obtained at any of the input amounts of 1 to 5 kg.
- Comparative Example 1 As a comparative example, the result of applying aluminum alloy plating to M8 bolts using the conventional barrel plating apparatus (5 kg) shown in FIG. 6 will be described.
- the cathode was Cu and the anode was an Al plate.
- the amount of bolt input was varied between 1 and 5 kg.
- pretreatment alkaline degreasing, alkaline electrolytic cleaning and pickling are performed, Ni plating is performed, and water is thoroughly washed. It was dried after water replacement with ethanol.
- the composition of the plating bath is such that 20 g / L manganese chloride and 1 g / l zirconium chloride are added to a bath in which AlCl 3 and 1-methyl-3-propylimidazolium bromide are mixed and melted at a molar ratio of 2: 1.
- An electric Al—Zr—Mn alloy plating bath was prepared. Immerse in the electric Al—Zr—Mn alloy plating bath maintained at 100 ° C. in a dry nitrogen gas atmosphere for 5 minutes, and then pulse current (duty ratio: 1/1, ON time: 10 ms, OFF in the same plating bath. Time: 10 ms) Al—Zr—Mn alloy plating was performed.
- the plating conditions were a current density of 1 A / dm 2 , a plating time of 120 minutes, and a bath temperature of 100 ° C.
- Table 1 As shown in Table 1, as a result of applying the Al—Zr—Mn alloy plating, only a matte aluminum alloy plating film with poor adhesion or poor adhesion can be obtained at any input amount of 1 to 5 kg. could not.
- Example 1 even when the amount of bolts to be plated is small, the cathode and the object to be plated are always in contact with each other.
- Comparative Example 1 using a conventional barrel plating apparatus when the input amount of the object to be plated is small, the object to be plated and the cathode are not sufficiently in contact with each other. Plating defects such as defects occurred. This is presumably because a bipolar phenomenon occurred in an object to be plated that was not sufficiently connected to the cathode.
- the aluminum or aluminum alloy barrel electroplating method of the embodiment of the present invention there is no significant influence on the amount of the object to be plated, no adhesion failure such as non-plating, blistering, peeling, and so on. A uniform plating film without gloss failure can be obtained.
- this invention can perform high quality aluminum plating and aluminum alloy plating efficiently, it can be expected to be used in a wide range of applications such as automobile parts and household appliance parts.
- the anode is rotated in the barrel.
- the barrel plating apparatus may be configured such that the anode is swung or vibrated.
- the barrel is swung or rotated, but the barrel plating apparatus can be configured so that the barrel is vibrated.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
図6は、従来のバレル電気めっき方法に使用されているバレルめっき装置の一例を模式的に示す断面図である。図6に示すように、従来のバレル電気めっき装置100は、めっき槽102の中に回転自在に支持されたバレル104を有し、このバレル104の内部に被めっき物Wが収容される。また、陰極106は、バレル104に収容された被めっき物Wに接触するように、バレル104内に配置される。一方、陽極108は、めっき槽102の中の、バレル104の外部に配置される。めっきを行う際には、バレルを回転させながら、陽極108と陰極106の間に電圧が付与され、陽極108と、陰極106に接触した被めっき物Wの間に電流が流される。
特に、本発明は、アルミニウムまたはアルミニウム合金を、被めっき物に効率良くめっきすることができるバレル電気めっき方法を提供することを目的としている。
Alめっき浴は、A)アルミニウムハロゲン化物と(B)N-アルキルピリジニウムハライド類、N-アルキルイミダゾリウムハライド類、N,N’-アルキルイミダゾリウムハライド類、N-アルキルピラゾリウムハライド類、N,N’-アルキルピラゾリウムハライド類、N-アルキルピロリジニウムハライド類及びN,N-アルキルピロリジニウムハライド類もしくはBF4-、PF6-、TFSI-、BOB-などのフッ素系無機または有機アニオンなどのイオン液体からなる群より選ばれる1種又は2種以上の化合物を含有する。
上記Alめっき浴に例えば(C)ジルコニウムハロゲン化物、(D)マンガンハロゲン化物を単独もしくは両者を含有すれば、それぞれAl-Zr合金めっき浴、Al-Mn合金めっき浴、Al-Zr-Mnめっき浴となる。それ以外の金属を含有させた場合は、含有金属とのAl合金浴が得られる。
本発明で用いる(A)アルミニウムハロゲン化物は、AlX3で表され、Xはフッ素、塩素、臭素、ヨウ素などのハロゲンであり、塩素もしくは臭素が好ましい。経済性を考慮すると塩素が最も好ましい。
具体的なN-アルキルピリジニウムハライド類としては、例えばN-メチルピリジニウムクロライド、N-メチルピリジニウムブロマイド、N-エチルピリジニウムクロライド、N-エチルピリジニウムブロマイド、N-ブチルピリジニウムクロライド、N-ブチルピリジニウムブロマイド、N-ヘキシルピリジニウムクロライド、N-ヘキシルピリジニウムブロマイド、2-メチル-N-プロピルピリジニウムクロライド、2-メチル-N-プロピルピリジニウムブロマイド、3-メチル-N-エチルピリジニウムクロライド、3-メチル-N-エチルピリジニウムブロマイドなどが挙げられる。
具体的なN-アルキルイミダゾリウムハライド類及びN,N’-アルキルイミダゾリウムハライド類としては、例えば1-メチルイミダゾリウムクロライド、1-メチルイミダゾリウムブロマイド、1-エチルイミダゾリウムクロライド、1-エチルイミダゾリウムブロマイド、1-プロピルイミダゾリウムクロライド、1-プロピルイミダゾリウムブロマイド、1-オクチルイミダゾリウムクロライド、1-オクチルイミダゾリウムブロマイド、1-メチル-3-エチルイミダゾリウムクロライド、1-メチル-3-エチルイミダゾリウムブロマイド、1,3-ジメチルイミダゾリウムクロライド、1,3-ジメチルイミダゾリウムブロマイド、1,3-ジエチルイミダゾリウムクロライド、1,3-ジエチルイミダゾリウムブロマイド、1-メチル-3-プロピルイミダゾリウムクロライド、1-メチル-3-プロピルイミダゾリウムブロマイド、1-ブチル-3-ブチルイミダゾリウムクロライド、1-ブチル-3-ブチルイミダゾリウムブロマイドなどが挙げられる。
具体的なN-アルキルピラゾリウムハライド類及びN,N’-アルキルピラゾリウムハライド類としては、例えば1-メチルピラゾリウムクロライド、1-メチルピラゾリウムブロマイド、1-プロピルピラゾリウムクロライド、1-プロピルピラゾリウムブロマイド、1-ブチルピラゾリウムクロライド、1-ブチルピラゾリウムブロマイド、1-ヘキシルピラゾリウムクロライド、1-ヘキシルピラゾリウムブロマイド、1-メチル-2-エチルピラゾリウムクロライド、1-メチル-2-エチルピラゾリウムブロマイド、1-メチル-2-プロピルピラゾリウムクロライド、1-メチル-2-プロピルピラゾリウムブロマイド、1-プロピル-2-メチルピラゾリウムクロライド、1-プロピル-2-メチルピラゾリウムブロマイド、1-ブチル-2-メチルピラゾリウムクロライド、1-ブチル-2-メチルピラゾリウムブロマイド、1-へキシル-2-メチルピラゾリウムクロライド、1-へキシル-2-メチルピラゾリウムブロマイド、1,2-ジメチルピラゾリウムクロライド、1,2-ジメチルピラゾリウムブロマイド、1,2-ジエチルピラゾリウムクロライド、1,2-ジエチルピラゾリウムブロマイドなどが挙げられる。
具体的なN-アルキルピロリジニウムハライド類及びN,N-アルキルピロリジニウムハライド類としては、例えば1-メチルピロリジニウムクロライド、1-メチルピロリジニウムブロマイド、1,1-ジメチルピロリジニウムクロライド、1-エチル-1-メチルピロリジニウムクロライド、1-エチルピロリジニウムクロライド、1-プロピルピリジニウムクロライド、1-メチル-1-プロピルピリジニウムクロライド、1-ブチル-1-メチルピロリジニウムクロライド、1-エチル-1-プロピルピリジニウムクロライド、1-メチル-1-ヘキシルピリジニウムクロライド、1-ブチルピロリジニウムクロライド、1-エチル-1-メチルピリジニウムクロライドなどが挙げられる。
ジルコニウムハロゲン化物の浴中濃度は、好ましくは4×10-4~4×10-1モル/lであり、より好ましくは4×10-3~2×10-1モル/lである。このような浴中濃度とすることで、Al-Zr-Mn合金めっき皮膜中のZr共析率を適切な範囲とすることができ、黒色の粉末として析出することもない。
マンガンハロゲン化物の浴中濃度は、好ましくは8×10-4~8×10-1モル/lであり、より好ましくは8×10-3~4×10-1モル/lであり、さらに好ましくは8×10-3~8×10-2モル/lである。このような浴中濃度とすることで、Al-Zr-Mn合金めっき皮膜中のMn共析率を適切な範囲とすることができ、黒色の粉末として析出することもない。
(F)有機重合体として用いる脂肪族ジエン系ポリマーとしては、ブタジエン、イソプレン、ペンタジエンなどの重合体などが挙げられる。好ましくは、1,2又は3,4構造の分枝鎖を有する重合体、又はこれらと他の重合性ビニル系モノマーとのコポリマーである。前記ビニル系モノマーとしては、上記スチレン系ポリマーについて記載したものと同様のものが挙げられる。
(F)有機重合体の重量平均分子量は、200~80000の範囲が好ましい。特に、重量平均分子量が300~5000程度の低中分子量のポリスチレン及びポリ-α-メチルスチレンは、溶融塩溶解性が良く最も好ましい。その浴中濃度は、0.1~50g/lの範囲が好ましく、より好ましくは1~10g/lの範囲である。(F)有機重合体をこのような範囲で用いると、デンドライド析出を防止し、表面平滑効果を発揮し、めっきやけが発生するのを防止できる。
脂肪族アルデヒドは、例えば炭素数2~12の脂肪族アルデヒドであり、具体的にはトリブロモアセトアルデヒド、メタアルデヒド、2-エチルヘキシルアルデヒド、ラウリルアルデヒドなどが挙げられる。
芳香族アルデヒドは、例えば炭素数7~10の芳香族アルデヒドであり、具体的には0-カルボキシベンズアルデヒド、ベンズアルデヒド、0-クロルベンズアルデヒド、p-トルアルデヒド、アニスアルデヒド、p-ジメチルアミノベンズアルデヒド、テレフタルアルデヒドなどが挙げられる。
芳香族ケトンとしては、例えば炭素数8~14の芳香族ケトンであり、具体的にはベンザルアセトン、ベンゾフェノン、アセトフェノン、塩化テレフタロイルベンジルなどが挙げられる。
含窒素不飽和複素環化合物は、例えば炭素数3~14の窒素複素環化合物であり、具体的にはピリミジン、ピラジン、ピリダジン、s-トリアジン、キノキサリン、フタラジン、1,10-フェナントロリン、1,2,3-ベンゾトリアゾール、アセトグアナミン、塩化シアヌル、イミダゾール-4-アクリル酸などが挙げられる。
S含有複素環化合物は、例えば炭素数3~14のS含有複素環化合物であり、具体的にはチオウラシル、チオニコチン酸アミド、s-トリチアン、2-メルカプト-4,6-ジメチルピリミジンなどが挙げられる。
S含有置換基を有する芳香族炭化水素は、例えば炭素数7~20のS含有置換基を有する芳香族炭化水素であり、具体的にはチオ安息香酸、チオインジゴ、チオインドキシル、チオキサンテン、チオキサントン、2-チオクマリン、チオクレゾール、チオジフェニルアミン、チオナフトール、チオフェノール、チオベンズアミド、チオベンズアニリド、チオベンズアルデヒド、チオナフテンキノン、チオナフテン、チオアセトアニリドなどが挙げられる。
芳香族カルボン酸及びその誘導体は、例えば炭素数7~15の芳香族カルボン酸及びその誘導体であり、具体的には安息香酸、テレフタル酸、安息香酸エチルなどが挙げられる。
二重結合を有する脂肪族カルボン酸及びその誘導体は、例えば炭素数3~12の二重結合を有する脂肪族カルボン酸及びその誘導体であり、具体的にはアクリル酸、クロトン酸、メタクリル酸、アクリル酸-2-エチルヘキシル、メタクリル酸-2-エチルヘキシルなどが挙げられる。
アセチレンアルコール化合物としては、例えばプロパギルアルコールなどが挙げられる。
フッ素樹脂としては、例えば平均分子量が500~1300の三フッ化塩化エチレン樹脂などが挙げられる。
(G)光沢剤の浴中濃度は、好ましくは0.001~0.1モル/lの範囲であり、より好ましくは0.002~0.02モル/lの範囲である。本発明で用いられる電気Alめっき浴、電気Al合金めっき浴においては、(G)光沢剤をこのような範囲で用いると、平滑効果が得られ、高電流密度でめっきを施した場合でも、黒色スマット状の析出を生じることはない。
本発明で用いられる電気Alめっき浴、電気Al合金めっき浴においては、(E)芳香族炭化水素溶媒、(F)有機重合体及び(G)光沢剤のうちの2種を併用しもてよく、これら3種のすべてを併用してもよい。
尚、本発明の非水系Alめっき浴、Al合金めっき浴は、酸素や水分に触れても安全であるが、めっき浴の安定性維持及びめっき性状などの点から乾燥無酸素雰囲気中(乾燥窒素や乾燥アルゴン中)で行うのが望ましい。また液撹拌を併用しても良い。ジェット噴流や超音波攪拌などを使用すれば、電流密度をさらに高くすることができる。ただし、複雑な形状部品をめっきする場合は、着き回り性をよくするために攪拌を行わないか弱くし、0.5~1A/dm2の低い陰極電流密度で長時間めっきを行うことが望ましい。陽極としては、Alまたは不溶性陽極でも構わない。
特に、本発明のバレル電気めっき方法によれば、アルミニウムまたはアルミニウム合金を、被めっき物に効率良くめっきすることができる。
本発明は、陽極をバレル内中央に配置し、陰極をバレル内壁面に配置し、陽極を回転、揺動、又は振動させ、バレル壁面の陰極を揺動、回転、又は振動させてめっきするバレル電気めっき装置を用いてめっきを行うアルミニウム、アルミニウム合金めっき方法により、常に被めっき品に通電されるようにした陰極接点の改善、極間距離の短縮による浴電圧の低下、及び電流集中の防止による電流密度の均一化を図ることができ、均一なめっき皮膜を得ることができるという知見に基づいて為されたものである。また、本発明は、バレル内に設置された陽極を回転させながらめっきすることにより、陽極電流効率の改善、浴電圧の上昇を防止することができ、皮膜の均一性、こげ防止効果をさらに高め、高電流密度作業が可能になると言う知見に基づいて為されたものである。
フレーム板2a、2bは、絶縁体で形成された2枚の平板であり、3本の連結棒2c、2d、2eにより、平行に連結されている。また、フレーム板2a、2bには、それらの間にバレル4を揺動可能に支持するための軸受けが設けられている。なお、本実施形態においては、フレーム板2a、2bは、テフロン(PTFE)製である。
邪魔板20は、折り曲げられた薄板14の角部に配置された角柱状の部材であり、この邪魔板20により、バレル4の内側に三角形状の断面の山を形成している。邪魔板20は、バレル4の内側に山を形成することにより、バレル4が揺動された際に、被めっき物が良く混合されるようにしている。
図5に示すように、陽極電気接点部は、棒状の陽極端子32と、この陽極端子32を付勢するコイルスプリング34と、陽極6と接触する固定側の部材である固定側接点部材36と、内部に陽極端子32を通す絶縁スリーブ38と、コイルスプリング34による付勢力を調節するスプリング調節ボルト40と、を有する。なお、使用時において、陽極電気接点部はめっき液の中に浸漬され、固定側接点部材36に対して陽極6が摺動される。
なお、変形例として、固定側接点部材36及び/又は陽極電気接点の可動側を、チタン、チタン合金等の耐腐食性の金属材料で構成することもできる。
まず、バレルめっき装置1のバレル4に、被めっき物である例えば鉄材のボルト、ねじ等の小物物品を入れる。これにより、各被めっき物は、バレル4の内壁面に直接接触して、又は、バレル4の内壁面に接触している他の被めっき物を介して陰極と導通される。なお、被めっき物である基体としては、鉄の他、ニッケル、銅などの各種金属、及びこれらの合金などの金属や合金が挙げられる。また、被めっき物としては、ボルト、ナット、ワッシャー、プレス小物品や直方体、円柱、円筒、球状物など種々の形状のものが挙げられる。
所定時間後、電源部11による電圧の印加を停止し、バレルめっき装置1をめっき液槽から引き上げで、めっき作業を終了する。本方法により任意の厚さのアルミニウム及びアルミニウム合金めっきを形成することができるが、めっきの厚さは2μm以上であるのが好ましく、より好ましくは3~25μmである。
実施例1
陰極をAl板、陽極をAlとしたバレルめっき装置1(5kgバレル)を使用して、M8のボルトにアルミニウム合金めっきを施した。ボルトの投入量は、1~5kgの間で変化させた。まず、前処理として、アルカリ脱脂、アルカリ電解洗浄及び酸洗を行い、Niめっきを行いよく水洗し。エタノールで水置換後乾燥した。
めっき浴の組成は、AlCl3と1-メチル-3プロピルイミダゾリウムブロマイドとを2:1のモル比に混合溶融してなる浴に、塩化マンガン10g/L及び塩化ジルコニウム1g/lを添加して電気Al-Zr-Mn合金めっき浴を調製した。乾燥窒素ガス雰囲気中で、100℃に保った前記電気Al-Zr-Mn合金めっき浴に5分間浸漬し、その後、同じめっき浴でパルス電流(デューティー比:1/1、ON時間:10ms、OFF時間:10ms)にてAl-Zr-Mn合金めっきを行った。めっき条件は、電流密度1A/dm2、めっき時間120分、浴温100゜Cとした。表1に示すように、Al-Zr-Mn合金めっきを施した結果として、投入量1~5kgの何れにおいても光沢のあるアルミニウム合金めっき皮膜を得ることができた。
次に、比較例として、図6に示した従来のバレルめっき装置(5kg)を使用してM8のボルトにアルミニウム合金めっきを施した結果を説明する。
陰極をCu、陽極をAl板とした。ボルトの投入量は、1~5kgの間で変化させた。まず、前処理として、アルカリ脱脂、アルカリ電解洗浄及び酸洗を行い、Niめっきを行いよく水洗し。エタノールで水置換後乾燥した。
めっき浴の組成は、AlCl3と1-メチル-3プロピルイミダゾリウムブロマイドとを2:1のモル比に混合溶融してなる浴に、塩化マンガン20g/L及び塩化ジルコニウム1g/lを添加して電気Al-Zr-Mn合金めっき浴を調製した。乾燥窒素ガス雰囲気中で、100℃に保った前記電気Al-Zr-Mn合金めっき浴に5分間浸漬し、その後、同じめっき浴でパルス電流(デューティー比:1/1、ON時間:10ms、OFF時間:10ms)にてAl-Zr-Mn合金めっきを行った。めっき条件は、電流密度1A/dm2、めっき時間120分、浴温100゜Cとした。表1に示すように、Al-Zr-Mn合金めっきを施した結果として、投入量1~5kgの何れにおいても未着または焦げのある密着性の悪い無光沢のアルミニウム合金めっき皮膜しか得ることができなかった。
2a、2b フレーム板
2c、2d、2e 連結棒
4 バレル
6 陽極
8 バレル駆動用モーター(バレル駆動部)
10 陽極駆動用モーター(陽極駆動部)
11 電源部
12 バレル歯車
14 薄板
16 陽極カバー
18 陰極端子
20 邪魔板
22 陽極駆動用歯車
24a、24b、24c 伝動用歯車
26a、26b 伝動用歯車
28 ロッド
30a、30b マイクロスイッチ
32 陽極端子
34 コイルスプリング
36 固定側接点部材
38 絶縁スリーブ
40 スプリング調節ボルト
100 従来のバレル電気めっき装置
102 めっき槽
104 バレル
106 陰極
108 陽極
W 被めっき物
Claims (5)
- アルミニウム又はアルミニウム合金めっき浴を用いてバレル電気めっきを施す方法であって、
被めっき物を収容したバレルの内部に配置された陽極を回転、揺動又は振動させると共に、上記陽極と上記バレルの内壁面に設けられた陰極との間に電圧を印加し、上記バレルを回転、揺動又は振動させることを特徴とするバレル電気めっき方法。 - 上記アルミニウム又はアルミニウム合金めっき浴が、非水系アルミニウムめっき浴又は非水系アルミニウム合金めっき浴である請求項1記載のバレル電気めっき方法。
- 上記非水系アルミニウム合金めっき浴が、(A)アルミニウムハロゲン化物と(B)N-アルキルピリジニウムハライド類、N-アルキルイミダゾリウムハライド類、N,N’-アルキルイミダゾリウムハライド類、N-アルキルピラゾリウムハライド類、N,N’-アルキルピラゾリウムハライド類、N-アルキルピロリジニウムハライド類及びN,N-アルキルピロリジニウムハライド類もしくはBF4-、PF6-、TFSI-、BOB-などのフッ素系無機または有機アニオンなどのイオン液体からなる群より選ばれる1種又は2種以上の化合物を含有する非水系アルミニウムめっき浴である請求項2記載のバレル電気めっき方法。
- 上記非水系アルミニウム合金めっき浴が、(A)アルミニウムハロゲン化物と(B)N-アルキルピリジニウムハライド類、N-アルキルイミダゾリウムハライド類、N,N’-アルキルイミダゾリウムハライド類、N-アルキルピラゾリウムハライド類、N,N’-アルキルピラゾリウムハライド類、N-アルキルピロリジニウムハライド類及びN,N-アルキルピロリジニウムハライド類もしくはBF4-、PF6-、TFSI-、BOB-などのフッ素系無機または有機アニオンなどのイオン液体からなる群より選ばれる1種又は2種以上の化合物を含有し、さらに(C)ジルコニウムハロゲン化物、(D)マンガンハロゲン化物を単独もしくは両者を含有するAl-Zr合金めっき浴、Al-Mn合金めっき浴、Al-Zr-Mnめっき浴である請求項2記載のバレル電気めっき方法。
- 浴温が25~120℃、平均陰極電流密度は、0.5~5A/dm2、バレル回転数は0.5~10rpm、かつ陽極回転数が10~200rpmである請求項1乃至4の何れか1項に記載のバレル電気めっき方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201080047301.XA CN102575375B (zh) | 2009-10-19 | 2010-10-19 | 铝或铝合金滚镀方法 |
EP10824915.2A EP2492376B1 (en) | 2009-10-19 | 2010-10-19 | Method of barrel electroplating with aluminum or aluminum alloy |
US13/502,442 US8916039B2 (en) | 2009-10-19 | 2010-10-19 | Aluminum or aluminum alloy barrel electroplating method |
BR112012008978A BR112012008978B8 (pt) | 2009-10-19 | 2010-10-19 | método para realizar eletrodeposição de cilindro pelo uso de um banho de deposição de alumínio ou liga de alumínio |
IN3307DEN2012 IN2012DN03307A (ja) | 2009-10-19 | 2010-10-19 | |
KR1020127008903A KR101390062B1 (ko) | 2009-10-19 | 2010-10-19 | 알루미늄 또는 알루미늄 합금 배럴 전기 도금 방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009240422A JP5581523B2 (ja) | 2009-10-19 | 2009-10-19 | アルミニウムまたはアルミニウム合金バレル電気めっき方法 |
JP2009-240422 | 2009-10-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011049066A1 true WO2011049066A1 (ja) | 2011-04-28 |
Family
ID=43900291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2010/068328 WO2011049066A1 (ja) | 2009-10-19 | 2010-10-19 | アルミニウムまたはアルミニウム合金バレル電気めっき方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US8916039B2 (ja) |
EP (1) | EP2492376B1 (ja) |
JP (1) | JP5581523B2 (ja) |
KR (1) | KR101390062B1 (ja) |
CN (1) | CN102575375B (ja) |
BR (1) | BR112012008978B8 (ja) |
IN (1) | IN2012DN03307A (ja) |
MY (1) | MY157154A (ja) |
WO (1) | WO2011049066A1 (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5649502B2 (ja) † | 2010-05-25 | 2015-01-07 | アイダエンジニアリング株式会社 | 複数ポイント式サーボプレス装置 |
US20170241030A9 (en) * | 2010-08-30 | 2017-08-24 | Honda Motor Co., Ltd. | Electric Al-Zr-Mn Alloy-Plating Bath Using Room Temperature Molten Salt Bath, Plating Method Using the Same and Al-Zr-Mn Alloy-Plated Film |
EP2623643A4 (en) * | 2010-09-30 | 2015-03-04 | Hitachi Ltd | ALUMINUMGALVANISIERUNGSLÖSUNG |
KR20150052058A (ko) | 2012-09-10 | 2015-05-13 | 스미토모덴키고교가부시키가이샤 | 알루미늄막의 제조 방법 |
CN103103588A (zh) * | 2013-02-28 | 2013-05-15 | 中国科学院宁波材料技术与工程研究所 | 一种金属基体表面Al-Mn合金防护镀层的制备方法 |
GB201308473D0 (en) * | 2013-05-10 | 2013-06-19 | Authentix Inc | Plating of articles |
US9903034B2 (en) * | 2013-11-22 | 2018-02-27 | Sikorsky Aircraft Corporation | Methods and materials for electroplating aluminum in ionic liquids |
CN104499036A (zh) * | 2014-11-14 | 2015-04-08 | 无锡信大气象传感网科技有限公司 | 电镀滚筒 |
EP3088571B1 (en) | 2015-04-28 | 2021-06-02 | The Boeing Company | Environmentally friendly aluminum coatings as sacrificial coatings for high strength steel alloys |
CN105200475A (zh) * | 2015-10-29 | 2015-12-30 | 中物院成都科学技术发展中心 | 一种螺栓电镀预处理方法 |
CN105200476B (zh) * | 2015-10-29 | 2018-10-09 | 中物院成都科学技术发展中心 | 一种不锈钢螺栓电镀预处理方法 |
CN105200468A (zh) * | 2015-10-29 | 2015-12-30 | 中物院成都科学技术发展中心 | 一种螺栓表面防腐蚀方法 |
CN105239122B (zh) * | 2015-10-29 | 2019-01-22 | 中物院成都科学技术发展中心 | 一种碳钢螺栓电镀预处理方法 |
CN105648489A (zh) * | 2015-12-21 | 2016-06-08 | 中国航空工业集团公司北京航空材料研究院 | 一种用于Al-Zr合金电镀的电镀液、其制备方法及电镀方法 |
CN108885979B (zh) | 2016-03-11 | 2024-04-09 | 应用材料公司 | 作为铝半导体处理设备的阻挡层的铝电镀和氧化物形成 |
JP6795915B2 (ja) * | 2016-06-10 | 2020-12-02 | 株式会社荏原製作所 | アノードに給電可能な給電体及びめっき装置 |
US11261533B2 (en) | 2017-02-10 | 2022-03-01 | Applied Materials, Inc. | Aluminum plating at low temperature with high efficiency |
US20180320282A1 (en) * | 2017-05-05 | 2018-11-08 | Hamilton Sundstrand Corporation | Method of making aluminum-coated metal |
JP7025253B2 (ja) * | 2018-03-15 | 2022-02-24 | 株式会社Uacj | アルミニウムの製造方法 |
US10864567B2 (en) * | 2018-04-17 | 2020-12-15 | Government Of The United States As Represented By The Secretary Of The Army | Systems and methods for electroprocessing a gun barrel using a moving electrode |
CN112095131B (zh) * | 2020-08-24 | 2023-03-24 | 中国兵器工业第五九研究所 | 一种用于制备收口筒形内腔陶瓷层的工装设备及方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49130A (ja) | 1972-04-18 | 1974-01-05 | ||
JPH02153100A (ja) * | 1988-12-02 | 1990-06-12 | Ebara Yuujiraito Kk | バレルめっき装置 |
JP2005060822A (ja) * | 2003-08-08 | 2005-03-10 | Rohm & Haas Electronic Materials Llc | 複合基体の電気メッキ |
JP2009185381A (ja) * | 2007-12-12 | 2009-08-20 | Rohm & Haas Electronic Materials Llc | 青銅の電気めっき |
JP2009235486A (ja) * | 2008-03-27 | 2009-10-15 | Tdk Corp | バレルめっき装置 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB190920057A (en) | 1909-09-01 | 1910-09-01 | Sherard Osborn Cowper-Coles | Improvements in Apparatus for Electro-plating. |
US1531417A (en) | 1923-11-30 | 1925-03-31 | Schulte Louis | Plating apparatus |
US1609357A (en) | 1925-11-19 | 1926-12-07 | Hulmer Josef | Electrolytic plating machine |
GB342477A (en) | 1929-12-24 | 1931-02-05 | Albert Butziger | Improvements in the process of, and apparatus for, galvanically coating articles with chromium |
US2865831A (en) * | 1955-12-06 | 1958-12-23 | Ransohoff Inc N | Electroplating machine |
GB1050404A (ja) * | 1963-02-27 | |||
GB1230375A (ja) * | 1967-05-18 | 1971-04-28 | ||
CH603832A5 (ja) * | 1975-08-21 | 1978-08-31 | Siemens Ag | |
JPS60190599A (ja) | 1984-03-13 | 1985-09-28 | Seikosha Co Ltd | 電解メツキ装置 |
US4596636A (en) * | 1984-08-20 | 1986-06-24 | Alumatec, Inc. | Method for the electrodeposition of metal and method of workpiece pretreatment therefor |
US4661213A (en) | 1986-02-13 | 1987-04-28 | Dorsett Terry E | Electroplate to moving metal |
DE3907186A1 (de) * | 1989-03-06 | 1990-09-13 | Siemens Ag | Einrichtung zum transport von schuettfaehigem gut mit einem schwingfoerderer, der in eine fluessigkeit eintaucht |
JP2844452B2 (ja) | 1996-09-02 | 1999-01-06 | 株式会社金属化工技術研究所 | バレルめっき用のカソード装置 |
US6059952A (en) * | 1997-07-10 | 2000-05-09 | International Business Machines Corporation | Method of fabricating coated powder materials and their use for high conductivity paste applications |
JP3316750B2 (ja) * | 1998-11-30 | 2002-08-19 | 株式会社村田製作所 | 電子部品の製造方法 |
CN1122120C (zh) * | 1999-05-25 | 2003-09-24 | 谢锐兵 | 一种滚桶电镀的加工方法及其装置 |
US6656606B1 (en) * | 2000-08-17 | 2003-12-02 | The Westaim Corporation | Electroplated aluminum parts and process of production |
JP4635221B2 (ja) * | 2005-06-13 | 2011-02-23 | 学校法人福岡大学 | 微小物の電解めっき装置及びめっき方法 |
JP5134553B2 (ja) * | 2006-02-15 | 2013-01-30 | アクゾ ノーベル ナムローゼ フェンノートシャップ | イオン液体を用いる金属電着法 |
JP4609777B2 (ja) * | 2006-06-29 | 2011-01-12 | 日立金属株式会社 | アルミニウムめっき層および金属部材並びにその製造方法 |
JP5080097B2 (ja) * | 2007-02-09 | 2012-11-21 | ディップソール株式会社 | 溶融塩電気アルミニウムめっき浴及びそれを用いためっき方法 |
JP2008195990A (ja) * | 2007-02-09 | 2008-08-28 | Dipsol Chem Co Ltd | 電気アルミニウムめっき浴及びそれを用いためっき方法 |
JP5270846B2 (ja) * | 2007-02-09 | 2013-08-21 | ディップソール株式会社 | 常温溶融塩浴を用いた電気Al−Zr合金めっき浴とそれを用いるめっき方法 |
WO2009106269A1 (de) * | 2008-02-26 | 2009-09-03 | Ewald Dörken Ag | Beschichtungsverfahren für ein werkstück |
-
2009
- 2009-10-19 JP JP2009240422A patent/JP5581523B2/ja not_active Expired - Fee Related
-
2010
- 2010-10-19 BR BR112012008978A patent/BR112012008978B8/pt not_active IP Right Cessation
- 2010-10-19 US US13/502,442 patent/US8916039B2/en not_active Expired - Fee Related
- 2010-10-19 WO PCT/JP2010/068328 patent/WO2011049066A1/ja active Application Filing
- 2010-10-19 EP EP10824915.2A patent/EP2492376B1/en not_active Not-in-force
- 2010-10-19 KR KR1020127008903A patent/KR101390062B1/ko active IP Right Grant
- 2010-10-19 IN IN3307DEN2012 patent/IN2012DN03307A/en unknown
- 2010-10-19 CN CN201080047301.XA patent/CN102575375B/zh not_active Expired - Fee Related
- 2010-10-19 MY MYPI2012001662A patent/MY157154A/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49130A (ja) | 1972-04-18 | 1974-01-05 | ||
JPH02153100A (ja) * | 1988-12-02 | 1990-06-12 | Ebara Yuujiraito Kk | バレルめっき装置 |
JP2005060822A (ja) * | 2003-08-08 | 2005-03-10 | Rohm & Haas Electronic Materials Llc | 複合基体の電気メッキ |
JP2009185381A (ja) * | 2007-12-12 | 2009-08-20 | Rohm & Haas Electronic Materials Llc | 青銅の電気めっき |
JP2009235486A (ja) * | 2008-03-27 | 2009-10-15 | Tdk Corp | バレルめっき装置 |
Non-Patent Citations (2)
Title |
---|
See also references of EP2492376A4 |
YOSHIAKI HOSHINO, NP SERIES, 25 May 1995 (1995-05-25), pages 8 - 9, 24 TO 26, 127 TO 128, XP008155794 * |
Also Published As
Publication number | Publication date |
---|---|
KR101390062B1 (ko) | 2014-04-29 |
EP2492376A1 (en) | 2012-08-29 |
BR112012008978B8 (pt) | 2019-07-02 |
JP2011084798A (ja) | 2011-04-28 |
BR112012008978A2 (pt) | 2017-06-20 |
US8916039B2 (en) | 2014-12-23 |
EP2492376A4 (en) | 2013-05-01 |
CN102575375A (zh) | 2012-07-11 |
JP5581523B2 (ja) | 2014-09-03 |
CN102575375B (zh) | 2015-02-11 |
KR20120063511A (ko) | 2012-06-15 |
IN2012DN03307A (ja) | 2015-10-23 |
BR112012008978B1 (pt) | 2019-06-18 |
EP2492376B1 (en) | 2019-06-19 |
MY157154A (en) | 2016-05-13 |
US20120205249A1 (en) | 2012-08-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5581523B2 (ja) | アルミニウムまたはアルミニウム合金バレル電気めっき方法 | |
JP5270846B2 (ja) | 常温溶融塩浴を用いた電気Al−Zr合金めっき浴とそれを用いるめっき方法 | |
US10309025B2 (en) | Aluminum or aluminum alloy molten salt electroplating bath having good throwing power, electroplating method using the bath, and pretreatment method of the bath | |
JP5299814B2 (ja) | 常温溶融塩浴を用いた電気Al−Zr−Mn合金めっき浴、そのめっき浴を用いためっき方法及びAl−Zr−Mn合金めっき皮膜 | |
JP2008195990A (ja) | 電気アルミニウムめっき浴及びそれを用いためっき方法 | |
US8821707B2 (en) | Electric Al or Al alloy plating bath using room temperature molten salt bath and plating method using the same | |
JP5080097B2 (ja) | 溶融塩電気アルミニウムめっき浴及びそれを用いためっき方法 | |
US20120052324A1 (en) | Electric Al-Zr-Mn Alloy-Plating Bath Using Room Temperature Molten Salt Bath, Plating Method Using the Same and Al-Zr-Mn Alloy-Plated Film | |
JP2009173977A (ja) | 常温溶融塩浴を用いた電気Al又はAl合金めっき浴及びそれを用いるめっき方法 | |
JPH0551785A (ja) | 電気アルミニウムめつき浴 | |
JP5581522B2 (ja) | バレルめっき装置 | |
JP5688596B2 (ja) | 亜鉛または亜鉛合金バレル電気めっき方法 | |
US20150159290A1 (en) | Electric Al-Zr-Mn Alloy-Plating Bath Using Room Temperature Molten Salt Bath, Plating Method Using the Same and Al-Zr-Mn Alloy-Plated Film | |
JPH0280589A (ja) | 電気タングステンめっき浴およびその浴によるめっき方法 | |
JPH0488188A (ja) | 電気Al合金めっき浴およびその浴によるめっき方法 | |
JPH04362191A (ja) | 常温溶融塩電解液及び該電解液を用いた電気アルミニウムめっき方法 | |
JPH02133596A (ja) | つき回り性に優れた電気アルミニウムめっき浴およびその浴によるめっき方法 | |
JPH08260183A (ja) | 高い電気伝導度を有し、良好なスラッジ抑制能と錫溶解性を備えた錫めっき用硫酸浴 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201080047301.X Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10824915 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 20127008903 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13502442 Country of ref document: US Ref document number: 3307/DELNP/2012 Country of ref document: IN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1201001764 Country of ref document: TH |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2010824915 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: BR Ref legal event code: B01A Ref document number: 112012008978 Country of ref document: BR |
|
ENP | Entry into the national phase |
Ref document number: 112012008978 Country of ref document: BR Kind code of ref document: A2 Effective date: 20120416 |