WO2011010452A1 - 基板ホルダシステム、基板接合装置およびデバイスの製造方法 - Google Patents
基板ホルダシステム、基板接合装置およびデバイスの製造方法 Download PDFInfo
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- WO2011010452A1 WO2011010452A1 PCT/JP2010/004659 JP2010004659W WO2011010452A1 WO 2011010452 A1 WO2011010452 A1 WO 2011010452A1 JP 2010004659 W JP2010004659 W JP 2010004659W WO 2011010452 A1 WO2011010452 A1 WO 2011010452A1
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- substrate holder
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/185—Joining of semiconductor bodies for junction formation
- H01L21/187—Joining of semiconductor bodies for junction formation by direct bonding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
- Y10T156/1702—For plural parts or plural areas of single part
- Y10T156/1744—Means bringing discrete articles into assembled relationship
Definitions
- the present invention relates to a substrate holder system, a substrate bonding apparatus, and a device manufacturing method.
- a stacked semiconductor device manufactured by stacking semiconductor substrates each formed with an element, a circuit, and the like.
- a pair of semiconductor substrates held by a substrate holder are accurately positioned and stacked with line width accuracy of a semiconductor circuit, and then the entire substrate is heated and pressed to be bonded.
- a positioning device that positions the pair of semiconductor substrates and a heating and pressing device that realizes permanent bonding by heating and pressing are used.
- an object of one aspect of the present invention is to provide a “substrate holder system, substrate bonding apparatus, and device manufacturing method” that can solve the above-described problems. This object is achieved by a combination of features described in the independent claims.
- the dependent claims define further advantageous specific examples of the present invention.
- a substrate holder system in a first aspect of the present invention holds a first substrate holder that holds a first substrate, a coupling member that is provided on the first substrate holder, and a second substrate.
- the second substrate holder and the second substrate holder are provided at positions facing the coupling member when the first substrate holder and the second substrate holder face each other with the first substrate and the second substrate sandwiched therebetween.
- a member to be coupled, and a buffer provided at at least one of the contact portions of the coupling member or the member to be coupled.
- a device manufacturing method is a device manufacturing method manufactured by stacking a plurality of substrates, and the step of stacking the plurality of substrates includes: A first substrate holder for holding one substrate; a coupling member provided on the first substrate holder; a second substrate holder for holding a second substrate; and a second substrate holder on the first substrate holder and the second substrate holder When the substrate holder sandwiches and opposes the first substrate and the second substrate, the substrate holder is provided at a position facing the coupling member and at least one of the coupling member or each contact portion of the coupled member.
- FIG. 11 is a perspective view including an adsorber in the deformed state of the leaf spring shown in FIG. 10. It is a perspective view which shows roughly the example which has arrange
- FIG. 1 is an explanatory view schematically showing a substrate bonding apparatus 10 according to the present embodiment.
- the substrate bonding apparatus 10 includes an alignment apparatus 11 that performs relative alignment between a first substrate 16 that is a semiconductor wafer and a second substrate 17 that is a semiconductor wafer laminated thereon.
- the bonding apparatus 12 which bonds the 1st board
- the first substrate 16 is held by the first substrate holder 14, and the second substrate 17 is held by the second substrate holder 15.
- the first substrate holder 14 and the second substrate holder 15 are integrated by sandwiching them to form a substrate holder pair 18.
- a specific configuration of the substrate holder pair 18 will be described later.
- the substrate bonding apparatus 10 further includes a transport device 13 that transports the substrate holder pair 18 integrated by the alignment device 11 to the bonding device 12. Further, the transfer device 13 can transfer between the semiconductor wafer and the substrate holder alone.
- the transport device 13 includes a gripping unit 19 that grips a gripping object such as the substrate holder pair 18 and the like, and an arm unit 20 that moves the gripping object to a predetermined position by rotation and expansion / contraction operations.
- FIG. 2 is a plan view schematically showing the semiconductor wafer according to the present embodiment.
- the first substrate 16 and the second substrate 17 which are semiconductor wafers are made of a circular thin plate member made of a single single crystal silicon, and a plurality of circuit regions 21 are formed on one surface thereof.
- Circuit elements 21 such as transistors, resistors and capacitors are formed in the circuit area 21 partitioned and formed in a matrix.
- the circuit element is formed using a forming technique such as a thin film forming technique, an etching technique, and an impurity diffusion technique with the lithography technique as a core.
- An alignment mark is provided inside each circuit region 21. The alignment mark is an index used for alignment between the substrates.
- the design coordinate values of the plurality of alignment marks provided on each of the first substrate 16 and the second substrate 17 are individually stored in a memory and managed.
- the semiconductor wafer to be stacked may be a semiconductor wafer that has already been stacked and in which other semiconductor wafers are stacked. In this case, it is preferable that an unnecessary thickness of the already laminated circuit layer is removed through a thinning process.
- FIG. 3 is a plan view schematically showing the first substrate holder 14 holding the first substrate 16.
- the first substrate holder 14 includes a holder main body 22 and a suction unit 30 and has a disk shape whose diameter is slightly larger than that of the first substrate 16 as a whole.
- the holder body 22 is integrally formed of a highly rigid material such as ceramic or metal.
- the holder body 22 includes a region for holding the first substrate 16 on the surface thereof. This holding region is polished and has high flatness.
- the first substrate 16 is held by suction using an electrostatic force. Specifically, by applying a voltage to the electrode embedded in the holder body 22 via a voltage application terminal provided on the back surface of the holder body 22, the first substrate holder 14 and the first substrate 16 are interposed. A potential difference is generated to attract the first substrate 16 to the first substrate holder 14.
- the suction surface of the first substrate 16 is a surface opposite to the surface on which the circuit region 21 is provided.
- a plurality of suction units 30 are arranged on the outer surface of the first substrate 16 on the outer surface of the first substrate 16. In the case of the drawing, a total of six suction units 30 are arranged every 120 degrees, with two as one set. A specific configuration will be described later.
- FIG. 4 is a plan view schematically showing the second substrate holder 15 holding the second substrate 17.
- the second substrate holder 15 has a holder main body 23 and a magnet unit 31 and has a disk shape whose diameter is slightly larger than that of the second substrate 17 as a whole.
- the holder body 23 is integrally formed of a highly rigid material such as ceramic or metal.
- the holder main body 23 includes a region for holding the second substrate 17 on the surface thereof. This holding region is polished and has high flatness.
- the second substrate 17 is held by suction using an electrostatic force. Specifically, a voltage is applied to the electrode embedded in the holder main body 23 via a voltage application terminal provided on the back surface of the holder main body 23, so that a gap between the second substrate holder 15 and the second substrate 17 is obtained. A potential difference is generated to attract the second substrate 17 to the second substrate holder 15.
- the suction surface of the second substrate 17 is the surface opposite to the surface where the circuit region 21 is provided.
- a plurality of magnet units 31 are arranged on the outer surface of the second substrate 17 on the outer surface of the second substrate 17. In the case of the figure, a total of six magnet units 31 are arranged every 120 degrees with two as one set.
- the magnet units 31 are arranged so as to correspond to the suction units 30 of the first substrate holder 14 respectively. Then, when the first substrate holder 14 holding the first substrate 16 and the second substrate holder 15 holding the second substrate 17 face each other to cause the adsorption unit 30 and the magnet unit 31 to act, the first substrate 16 And the second substrate 17 can be sandwiched and fixed in an overlapped state. The state of being sandwiched and fixed in this way is the substrate holder pair 18. The specific configuration and the action of adsorption will be described later.
- FIG. 5 is a cross-sectional view schematically showing a state immediately before the formation of the substrate holder pair 18 in the alignment apparatus 11. Specifically, the first substrate holder 14 holding the first substrate 16 is fixed by vacuum suction to the first stage 51 of the alignment apparatus 11, and the second substrate holder 15 holding the second substrate 17 is aligned with the alignment apparatus 11. It is sectional drawing of the state fixed to the 2nd stage 52 by vacuum suction. In particular, cross-sectional views taken along line AA shown in FIGS. 3 and 4 are shown.
- the first stage 51 can move in the Z-axis direction, which is the direction in which the first substrate 16 is stacked on the second substrate 17, and the X-axis and Y-axis directions orthogonal to the Z-axis.
- the alignment apparatus 11 uses a first microscope disposed in the alignment apparatus 11 so that the first substrate 16 can be observed, and a second microscope disposed in the alignment apparatus 11 so that the second substrate 17 can be observed. The first substrate 16 and the second substrate 17 are aligned.
- the alignment mark of each substrate to be observed is imaged with each microscope, and the captured image data is subjected to image processing, thereby detecting the exact position of the alignment mark. Then, the amount of misalignment between corresponding alignment marks is calculated, the first stage 51 is moved according to the amount of misalignment, and the first substrate 16 and the second substrate 17 are made to face each other. Thereby, each of the circuit regions 21 of the first substrate 16 opposes each of the corresponding circuit regions 21 of the second substrate 17.
- the calculation of the positional deviation amount is, for example, a statistic such that when the plurality of alignment marks on the first substrate 16 and the plurality of alignment marks on the second substrate 17 are superimposed, the mutual positional deviation amount is minimized. Is calculated using a global alignment method or the like that is determined automatically.
- the second stage 52 includes a plurality of coupling restriction units 53 so that the adsorption unit 30 is not coupled to the magnet unit 31 in this state.
- the coupling regulation unit 53 mainly includes a push pin 54 that is a columnar member and a cylinder portion 55 that drives the push pin 54.
- the push pin 54 In the extended position, the push pin 54 is aligned with the holder insertion hole 24 provided in the second substrate holder 15 and the magnet insertion hole 32 provided in the magnet unit 31 that is aligned and aligned with the holder insertion hole 24.
- the tip protrudes from the magnet insertion hole 32.
- a part of the cylinder portion 55 is stored and retracts from the insertion hole. That is, the push pin 54 advances and retreats in the Z-axis direction by driving the cylinder portion 55 inside each insertion hole.
- the push pin 54 is controlled to the extended position so as to contact the upper surface of the suction unit 30, and the suction The coupling of the unit 30 to the magnet unit 31 is prevented.
- the adsorption unit 30 includes the adsorber 33 and the leaf spring 34 that fixes the adsorber 33.
- the push pin 54 is not attached to the magnet unit 31 by the elastic deformation of the leaf spring 34. Is pressed from above to suppress elastic deformation of the leaf spring 34.
- the alignment of the first substrate 16 and the second substrate 17 by the alignment device 11 is performed with a moving amount such that the tip of the push pin 54 slides on the upper surface of the suction unit 30 in the final fine adjustment stage. Is done.
- the first substrate 16 and the second substrate 17 are relatively separated from each other in the X, Y, and Z axis directions. There is no unexpected binding to 31. Therefore, the push pin 54 is controlled to the extended position when the magnetic force of the magnet unit 31 reaches the attraction unit 30 and it is desired to restrict the coupling between the two, and is controlled to the retracted position otherwise.
- FIG. 6 is a cross-sectional view schematically showing a state immediately after the formation of the substrate holder pair 18 in the alignment apparatus 11. Specifically, the state where the first stage 51 is driven in the Z-axis direction so that the surface of the first substrate 16 and the surface of the second substrate 17 are in contact with each other from the state of FIG. The state where the attraction unit 30 is coupled to the magnet unit 31 under the control of the storage position is shown.
- the first substrate 16 and the second substrate 17 are aligned, and the magnet unit 31 as a coupling member and the attraction unit 30 as the coupled member are coupled.
- the first substrate holder 14 and the second substrate holder 15 are integrated to form a substrate holder pair 18 as a substrate holder system.
- the Z-axis direction is the direction of gravity
- the first stage 51 is positioned below the second stage 52.
- the relationship of each surface with respect to the gravitational direction is, in order from the top to the bottom, the holding surface of the second substrate 17 of the second substrate holder 15, the bonding surface of the second substrate 17 and the first substrate 16, and the first substrate holder 14.
- the holding surface of the first substrate 16 is positioned.
- the leaf spring 34 is elastically deformed with the operation of moving the push pin 54 to the storage position, and the attracting unit 30 is coupled to the magnet unit 31.
- the attractor 33 of the attracting unit 30 is coupled to the magnet unit 31 with a certain degree of impact. Therefore, at this time, the position of the contact surface between the attractor 33 and the magnet unit 31 in the gravity direction is set so as to be positioned below the joint surface between the second substrate 17 and the first substrate 16.
- the first substrate holder 14 is set so as to be positioned further below the holding surface of the first substrate 16.
- the first substrate holder 14 is set so as to be positioned below the holding surface of the first substrate 16, the adhesion of dust on the surface can also be suppressed.
- substrate holder 14 used repeatedly can be maintained in a clean state, and when mounting another 1st board
- the substrate holder pair 18 After the substrate holder pair 18 is formed, the substrate holder pair 18 is released from the vacuum suction from the second stage 52, pulled down by the first stage 51, and transported to the bonding apparatus 12 by the transport device 13.
- the conveyance mechanism of the conveyance device 13 and the bonding process of the bonding device 12 will be described later.
- FIG. 7 is a perspective view schematically showing the magnet unit 31.
- the magnet unit 31 includes a magnet 36, a support portion 35 that accommodates and supports the magnet 36, and a plurality of spherical convex bodies 41.
- the support part 35 has a cylindrical accommodation part that accommodates the magnet 36, and has a screw hole 37 through which a screw fixed to the second substrate 17 passes.
- the support part 35 is made of, for example, carbon steel S25C.
- the magnet 36 is a permanent magnet having a cylindrical shape that is inserted into the accommodating portion of the support portion 35, and has a magnetic force of about 8N, for example.
- An insertion hole 38 through which the push pin 54 is inserted is provided in the central axis of the magnet 36, and an insertion hole 39 is also provided in the support portion 35 so as to connect to the insertion hole 38.
- a magnet insertion hole 32 is formed by the two insertion holes.
- the support part 35 has a facing surface 40 that faces the adsorber 33. At least three spherical convex bodies 41 are embedded in the facing surface 40.
- the spherical convex body 41 is embedded and fixed by press-fitting through a fixing member 42 which is provided on the facing surface 40 and is, for example, a ring-shaped brass. Or you may comprise so that the opposing surface 40 of the support part 35 may be processed by grinding etc., and the spherical convex body 41 may be formed integrally with the support part 35.
- the magnet unit 31 and the attractor 33 can be brought into point contact. That is, since the surface virtually formed by the spherical convex body 41 is the contact surface with the adsorber 33, the contact area between the two can be greatly reduced, and the generation of dust can be suppressed as much as possible. .
- FIG. 8 is a perspective view schematically showing another example of the magnet unit 31.
- the opposing surface 40 is formed with a linear convex body 50 that is a convex portion having a triangular cross-sectional shape.
- the linear convex body 50 is configured so that the opposing surface 40 of the support portion 35 is formed integrally with the support portion 35 by grinding or the like, but is formed separately and fixed to the opposing surface 40. Also good.
- the magnet unit 31 and the attractor 33 can be brought into line contact.
- the cross-sectional shape is a triangle, the surface virtually formed by the straight line with its apex as the ridge becomes the contact surface with the adsorber 33, so the contact area of both is greatly reduced compared to the surface contact. Therefore, generation of dust can be suppressed as much as possible.
- the cross-sectional shape is not limited to a triangle, and may be any shape as long as it can substantially realize line contact. Further, even if a slight flat portion remains in the contact portion due to grinding or the like, it may be regarded as substantially a line contact.
- FIG. 9 is a plan view schematically showing the leaf spring 34 of the suction unit 30.
- the leaf spring 34 is an elastic member having elasticity in a direction perpendicular to the holding surface of the second substrate holder 15 that holds the second substrate 17, and is formed of, for example, high-strength precipitation hardening stainless steel such as SUS631.
- the leaf spring 34 includes a circular portion 43 near the center and a mounting portion 44 protruding like an ear.
- the circular portion 43 has a diameter of 22 mm and a thickness of 0.1 mm.
- the circular portion 43 is formed with a pair of slits 46 that extend along the same direction and are spaced from each other in a direction perpendicular to the extending direction.
- the slits 46 are equal in distance from the center of the circular portion 43. Due to the two slits 46, a band-like portion 48 is formed near the center of the circular portion 43.
- the belt-like portion 48 is provided with a through hole 47 that fixes the adsorber 33 at a position that becomes the center of the circular portion 43.
- the attachment portion 44 has a screw hole 45 through which a screw for fixing the leaf spring 34 to the second substrate holder 15 passes.
- the plate spring 34 has two screw holes 45 along the circumferential direction of the second substrate holder 15 and the extension direction of the slit 46 along the substantially radial direction of the second substrate holder 15 with respect to the second substrate holder 15. In addition, it is arranged in the outer peripheral region of the holder body 23.
- FIG. 10 is a perspective view schematically showing a state in which the leaf spring 34 is elastically deformed. Specifically, it represents a deformed state when the attractor 33 fixed to the leaf spring 34 is attracted and coupled to the magnet unit 31. However, the adsorbent 33 is not shown in the figure.
- each slit 46 deforms the opening shape so as to allow the respective deformation.
- FIG. 11 is a perspective view including the adsorber 33 in the deformed state of the leaf spring 34 shown in FIG.
- the adsorber 33 is fixed to the leaf spring 34 through a through hole 47 with a fastening member such as a screw.
- the adsorber 33 is formed of a ferromagnetic material. For example, it is made of carbon steel S25C.
- a buffer plate 49 is fixed to the adsorber 33 on the contact surface with the magnet unit 31.
- the hardness of the buffer plate 49 is smaller than the hardness of the member that forms the contact surface of the magnet unit 31.
- Si-based material or resin-based material is used as the material of the buffer plate.
- the buffer plate 49 is configured to be exchangeable with respect to the adsorber 33. Since the buffer plate 49 is in contact with the contact surface of the magnet unit 31, and particularly when a convex portion such as the spherical convex body 41 or the linear convex body 50 is provided, the buffer plate 49 receives concentrated stress. By absorbing the impact, dents, scrapes, etc. may occur. Therefore, the buffer plate 49 is replaced every use for a certain period.
- the buffer plate 49 is fixed by fitting in a recess provided in the adsorber 33 or by sticking using an adhesive or the like.
- FIG. 12 shows a perspective view when the spherical convex body 41 is arranged on the adsorber 33.
- a fixing member 42 that is, for example, a ring-shaped brass.
- the spherical convex body 41 may be formed integrally with the adsorbent 33 by processing by grinding or the like.
- a buffer plate 49 is provided on the support portion 35 of the magnet unit 31.
- the position of the contact surface between the attractor 33 and the magnet unit 31 in the gravitational direction is more than the joint surface between the second substrate 17 and the first substrate 16 even when the convex portion and the buffer plate 49 are formed in reverse.
- the first substrate holder 14 is set so as to be positioned further below the holding surface of the first substrate 16.
- FIG. 13 is a cross-sectional view showing the coupling action of the magnet unit 31 and the adsorption unit 30.
- cross-sectional views taken along the line BB shown in FIGS. 3 and 4 are shown.
- etc. Is abbreviate
- FIG. 13 shows a state before the attractor 33 is coupled to the magnet unit 31.
- 14 shows a state after the attractor 33 is coupled to the magnet unit 31 in the same cross section as FIG.
- the magnet unit 31 is fixed to the surface of the second substrate holder 15 via screws. Further, the plane that contacts the buffer plate 49 that constitutes the contact surface of the adsorber 33 is a virtual plane that is constituted by the vertices of the spherical convex body 41, and this virtual plane is the first plane of the first substrate holder 14. It is located below the holding surface of the first substrate 16.
- the first substrate holder 14 is provided with a recess 25 in which a surface that is one step lower than the holding surface of the first substrate 16 is formed corresponding to the region where the suction unit 30 is installed.
- a virtual plane constituted by the vertices of the spherical convex body 41 is located in the space of the concave portion 25 when the surface of the first substrate 16 and the surface of the second substrate 17 are in contact with each other.
- the through-hole 26 that allows the adsorber 33 to move up and down is provided in the recess 25. Further, a concave portion 27 is provided around the through hole 26 from the back surface side of the first substrate holder 14 which is the surface opposite to the holding surface of the first substrate 16, and a plate spring is provided so as to fit in the concave portion. 34 and a screw for fixing the leaf spring 34 to the first substrate holder 14 are disposed.
- the belt-like portion 48 to which the attractor 33 is fixed is elastically deformed by attracting the attractor 33 to the magnet 36.
- the leaf spring 34 sandwiches the first substrate 16 and the second substrate 17 and holds the first substrate holder 14 and the second substrate holder 15. Energize in the direction to draw each other and balance.
- FIG. 15 is a longitudinal sectional view schematically showing the coupling restriction unit 53.
- a plurality of coupling restriction units 53 are arranged on the second substrate holder 15 corresponding to the magnet unit 31.
- An air pump 56 that adjusts the air pressure inside the cylinder portion 55 is connected to the cylinder portion 55.
- the control unit controls the air pump 56 to move the push pin 54 forward and backward. That is, the storage position where at least a part of the push pin 54 is located inside the cylinder portion 55 and the extended position where the tip 57 of the push pin 54 pushes the buffer plate 49 are controlled. Therefore, the pressing force with which the push pin 54 presses the buffer plate 49 has a magnitude that resists the elastic force of the leaf spring 34.
- the tip 57 of the push pin 54 is processed into a spherical shape so as to make point contact with the buffer plate 49.
- a sphere such as the spherical convex body 41 may be provided as a separate body at the tip.
- FIG. 16 is a side view schematically showing a state in which the transport device 13 grips the substrate holder pair 18.
- the transport device 13 includes an arm portion 20 and a grip portion 19 connected to the arm portion 20.
- the grip portion 19 includes a support plate 62 that supports the substrate holder pair 18 from below and a press plate 63 that presses from above.
- the support plate 62 is provided with an air intake hole for fixing the substrate holder pair 18 by vacuum suction, and the substrate holder pair 18 is fixed to the support plate 62 by this action.
- the pressing plate 63 is provided on a support column 64 provided at an end of the support plate 62, and can be advanced and retracted in a direction in which the substrate holder pair 18 is sandwiched.
- the pressing plate 63 applies a pressing force to the substrate holder pair 18 fixed to the support plate 62, the substrate holder pair 18 can be held between the pressing plate 63 and the support plate 62.
- the transfer device 13 operates the arm unit 20 to transfer the substrate holder pair 18 from the alignment device 11 to the bonding device 12.
- FIG. 17 is a side view schematically showing a main part of the joining device 12.
- the bonding apparatus 12 includes a lower pressure stage 65 disposed below the first substrate holder 14 and an upper pressure stage 66 disposed above the second substrate holder 15.
- the upper pressure stage 66 can move in a direction approaching the lower pressure stage 65 in order to press the substrate holder pair 18 in cooperation with the lower pressure stage 65.
- a heater is built in the lower pressurization stage 65 and the upper pressurization stage 66, and not only pressurization but also heating can be performed on the placed substrate holder pair 18.
- the electrodes in contact with each other of the first substrate 16 and the second substrate 17 are welded together. As a result, the corresponding circuit regions 21 of the first substrate 16 and the second substrate 17 are bonded.
- the buffer plate 49 suppresses dust generation when the magnet unit 31 and the attractor 33 contact each other. Since it is a member having a function, the shape may not be a plate shape. That is, it is only necessary that a buffer part is provided in at least one of the contact parts.
- the buffer portion is formed so as to have a different hardness from the contact partner in order to suppress dust generation when the magnet unit 31 and the attractor 33 are in contact with each other. In other words, even if the buffer side is softer than the contact partner, or conversely, if the buffer side is harder than the contact partner, the surface of the buffer part itself is not scraped off. If there is no chipping, it is sufficient as a function of the buffer section. Therefore, as a form of a buffer part, the form by which the buffer material was coated by the contact part other than plate shape, for example may be sufficient. Examples of the coating material include Si-based materials and resin-based materials as described above. When the buffer portion is formed of a coating material, the coating material can be applied to a convex portion serving as a contact portion, such as the above-described spherical convex body 41, even if it is not a flat surface.
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Abstract
Description
[先行技術文献]
[特許文献]
[特許文献1] 特開平11-261000号公報
[特許文献2] 特開2005-251972号公報
[特許文献3] 特開2007-115978号公報
Claims (12)
- 第1基板を保持する第1基板ホルダと、
前記第1基板ホルダに設けられる結合部材と、
第2基板を保持する第2基板ホルダと、
前記第2基板ホルダ上であって、前記第1基板ホルダと前記第2基板ホルダが前記第1基板と前記第2基板を挟持して対向したときに、前記結合部材と対向する位置に設けられる被結合部材と、
前記結合部材または前記被結合部材のそれぞれの接触部の少なくとも一方に設けられる緩衝部と
を備える基板ホルダシステム。 - 前記緩衝部が前記結合部材または前記被結合部材と接触する場合、前記緩衝部の硬度は前記結合部材または前記被結合部材の接触部の硬度と異なる請求項1に記載の基板ホルダシステム。
- 前記緩衝部は、板状である緩衝プレートにより構成される請求項1または2に記載の基板ホルダシステム。
- 前記緩衝プレートが前記結合部材または前記被結合部材と接触する場合、前記緩衝プレートの硬度は前記結合部材または前記被結合部材の接触部の硬度よりも小さい請求項3に記載の基板ホルダシステム。
- 前記緩衝プレートと接触する前記結合部材または前記被結合部材の接触部は、前記緩衝プレートと点接触または線接触するように凸部として形成される請求項4に記載の基板ホルダシステム。
- 前記凸部は、少なくとも3個の球部材が前記結合部材または前記被結合部材に埋設されて形成される請求項5に記載の基板ホルダシステム。
- 前記緩衝プレートは交換することができる請求項3から6のいずれか1項に記載の基板ホルダシステム。
- 前記緩衝部は、前記結合部材または前記被結合部材のそれぞれの接触部の少なくとも一方に施されるコーティング材により構成される請求項1または2に記載の基板ホルダシステム。
- 前記結合部材または前記被結合部材の接触部は、前記コーティング材が施された凸部として形成される請求項8に記載の基板ホルダシステム。
- 前記緩衝部はSi系材料または樹脂系材料により形成される請求項1から9のいずれか1項に記載の基板ホルダシステム。
- 請求項1から10のいずれか1項に記載の基板ホルダシステムを備える基板接合装置。
- 複数の基板を重ね合わせて製造されるデバイスの製造方法であって、
前記複数の基板を重ね合わせる工程は、第1基板を保持する第1基板ホルダと、前記第1基板ホルダに設けられる結合部材と、第2基板を保持する第2基板ホルダと、前記第2基板ホルダ上であって、前記第1基板ホルダと前記第2基板ホルダが前記第1基板と前記第2基板を挟持して対向したときに、前記結合部材と対向する位置に設けられる被結合部材と、前記結合部材または前記被結合部材のそれぞれの接触部の少なくとも一方に設けられる緩衝部とを備える基板ホルダシステムを用いて、
前記第1基板を前記第1基板ホルダに載置するステップと、
前記第2基板を前記第2基板ホルダに載置するステップと、
前記結合部材と前記被結合部材を接触させて、前記第1基板と前記第2基板を挟持するステップと
を含むデバイスの製造方法。
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EP10802073.6A EP2458628A4 (en) | 2009-07-21 | 2010-07-21 | SUBSTRATE MOUNTING SYSTEM, SUBSTRATE CONNECTING DEVICE AND METHOD FOR MANUFACTURING THIS DEVICE |
CN201080041652.XA CN102498559B (zh) | 2009-07-21 | 2010-07-21 | 基板保持架系统、基板接合装置以及器件的制造方法 |
IN1481DEN2012 IN2012DN01481A (ja) | 2009-07-21 | 2010-07-21 | |
JP2011523552A JP5810914B2 (ja) | 2009-07-21 | 2010-07-21 | 基板ホルダシステム、基板ホルダ、基板接合装置およびデバイス製造方法 |
US13/354,570 US9054140B2 (en) | 2009-07-21 | 2012-01-20 | Substrate holder system, substrate holder, fastening mechanism, substrate bonding apparatus and method for manufacturing devices |
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EP (1) | EP2458628A4 (ja) |
JP (1) | JP5810914B2 (ja) |
KR (1) | KR20120037999A (ja) |
CN (1) | CN102498559B (ja) |
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JP2018503239A (ja) * | 2014-12-18 | 2018-02-01 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 薄膜化基板の貼り合わせ方法 |
JP2018085539A (ja) * | 2018-01-29 | 2018-05-31 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板スタックを取り扱うための、収容システム及び装置及び方法 |
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US10121760B2 (en) | 2013-11-01 | 2018-11-06 | Nikon Corporation | Wafer bonding system and method |
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TW201131689A (en) | 2011-09-16 |
JPWO2011010452A1 (ja) | 2012-12-27 |
KR20120037999A (ko) | 2012-04-20 |
EP2458628A1 (en) | 2012-05-30 |
CN102498559B (zh) | 2016-03-02 |
US9054140B2 (en) | 2015-06-09 |
US20120205024A1 (en) | 2012-08-16 |
EP2458628A4 (en) | 2016-12-21 |
IN2012DN01481A (ja) | 2015-06-05 |
JP5810914B2 (ja) | 2015-11-11 |
CN102498559A (zh) | 2012-06-13 |
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