WO2009101982A1 - 縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ - Google Patents
縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ Download PDFInfo
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- WO2009101982A1 WO2009101982A1 PCT/JP2009/052319 JP2009052319W WO2009101982A1 WO 2009101982 A1 WO2009101982 A1 WO 2009101982A1 JP 2009052319 W JP2009052319 W JP 2009052319W WO 2009101982 A1 WO2009101982 A1 WO 2009101982A1
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- organic thin
- thin film
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- polymer
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- 125000000217 alkyl group Chemical group 0.000 claims abstract description 35
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- 125000001424 substituent group Chemical group 0.000 claims description 33
- 125000003118 aryl group Chemical group 0.000 claims description 25
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
- C07D333/62—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D495/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/22—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains four or more hetero rings
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Definitions
- the present invention relates to a condensed ring compound, a method for producing the same, a polymer, an organic thin film containing them, and an organic thin film element and an organic thin film transistor including the same.
- organic semiconductor materials are applied to various organic thin film elements such as organic EL (electroluminescence) elements, organic transistors, organic solar cells, and optical sensors, they have been actively studied in recent years.
- organic semiconductor material is required to have high charge (electron or hole) transportability.
- charge transporting property it is important to use molecules in which ⁇ conjugation is spread in the organic semiconductor material, improve the packing of the molecules, and enhance the interaction between the molecules.
- Patent Document 1 a compound containing dithienothiophene (Patent Document 1) or a compound in which a plurality of thiophene rings are combined in a plane (see Non-Patent Document 1) as an organic semiconductor material capable of obtaining high charge transportability. Etc. are known. JP 2004-339516 A Z. Bao et al. "Appl. Phys. Lett.”, 1996, 69, 4108.
- the present invention has been made in view of such circumstances, and an object thereof is to provide a condensed ring compound and a polymer that can exhibit sufficient charge transportability and have excellent solubility in a solvent. To do. Another object of the present invention is to provide a method for producing the condensed ring compound, an organic thin film using the condensed ring compound and / or a polymer, and an organic thin film element and an organic thin film transistor provided with the organic thin film.
- the condensed ring compound of the present invention is represented by the following general formula (1).
- R 11 and R 12 each independently have a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group having 3 or more carbon atoms in the alkyl moiety, or a substituent.
- at least one of R 11 and R 12 is not a hydrogen atom.
- R 13 and R 14 each independently represents a monovalent group
- m and n each independently represents an integer of 0 to 2.
- R 13 and R 14 When a plurality of R 13 and R 14 are present, they may be the same or different.
- Y 11 and Y 12 are each independently a divalent group represented by the following formula (2a), (2b), (2c), (2d), (2e), (2f), (2g), or (2h).
- Y 13 and Y 14 are each independently the following formulas (2a), (2b), (2c), (2d), (2e), (2f), (2g), (2h) or It is a divalent group represented by (2i).
- R 21 , R 22 , R23 and R 24 each independently represent a hydrogen atom or a monovalent group, and R 23 and R 24 may be bonded to each other to form a ring.
- the condensed ring compound having the above structure has a structure in which five aromatic ring structures are condensed and ⁇ conjugation spreads, it can exhibit high charge transportability when an organic thin film or the like is formed. Further, such a condensed ring compound has a structure in which a substituent is introduced into the central benzene ring structure. Therefore, the solubility with respect to a solvent etc. is also favorable, and the process to an organic thin film etc. is easy.
- the present invention has a structure in which a condensed ring having two rings at two positions with respect to the central benzene ring has a condensed structure. High charge transportability tends to be obtained. Therefore, the fused ring compound of the present invention is useful as an organic semiconductor material for forming an organic thin film in an organic thin film element or the like.
- Y 11 and Y 12 are a divalent group represented by the above formula (2a), and Y 13 and Y 14 are a divalent group represented by the above formula (2i). It is preferable that it is group of. Thereby, the charge transport property by the condensed ring compound is further improved. Moreover, such a compound has the advantage that the synthesis is relatively easy and the raw materials are easily available.
- R 11 and R 12 are preferably each independently an alkyl group having 1 to 10 carbon atoms or an aryl group optionally having a substituent having 6 to 20 carbon atoms. This further improves the solubility of the condensed ring compound in the solvent.
- the polymer of this invention has the structure represented by following General formula (3) as a structural unit, It is characterized by the above-mentioned.
- R 31 and R 32 each independently have a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group having 3 or more carbon atoms in the alkyl moiety, or a substituent.
- at least one of R 31 and R 32 is not a hydrogen atom.
- R 33 and R 34 each independently represent a hydrogen atom or a monovalent group.
- Y 31 and Y 32 are each independently a divalent group represented by the following formula (4a), (4b), (4c), (4d), (4e), (4f), (4g), or (4h).
- Y 33 and Y 34 are each independently the following formulas (4a), (4b), (4c), (4d), (4e), (4f), (4g), (4h) or It is a divalent group represented by (4i).
- R 41 , R 42 , R 43 and R 44 each independently represent a hydrogen atom or a monovalent group, and R 43 and R 44 may be bonded to each other to form a ring.
- Such a polymer contains the same condensed ring structure as the condensed ring compound of the present invention, it has excellent charge mobility and excellent solubility in a solvent.
- the polymer of the present invention further has a structural unit represented by the following general formula (5). This further improves the charge mobility of the polymer.
- Ar 5 represents a divalent aromatic hydrocarbon group which may have a substituent or a divalent heterocyclic group which may have a substituent.
- Ar 5 is preferably a group represented by the following general formula (6).
- R 61 and R 62 each independently represent a hydrogen atom or a monovalent group, and R 61 and R 62 may combine to form a ring.
- Y 6 is a divalent group represented by the following formula (7a), (7b), (7c), (7d), (7e), (7f), (7g), (7h) or (7i). is there.
- R 71 , R 72 , R 73 and R 74 each independently represent a hydrogen atom or a monovalent group, and R 73 and R 74 may be bonded to each other to form a ring.
- Y 31 and Y 32 are divalent groups represented by the above formula (4a), and Y 33 and Y 34 are divalent groups represented by the above formula (4i).
- Y 6 in the group represented by the general formula (6) is preferably a divalent group represented by the above formula (7a). Thereby, further excellent charge mobility and solubility can be obtained.
- the method for producing a fused ring compound according to the present invention is a method for forming the fused ring compound of the present invention favorably, and is a compound represented by the following general formula (8a) in the presence of a base and a metal complex catalyst. And a compound represented by the following general formula (8b) are reacted to obtain a condensed ring compound represented by the following general formula (8c).
- X 81 and X 82 each independently represent a hydrogen atom or a halogen atom. Provided that at least one of X 81 and X 82 is a halogen atom.
- R 81 and R 82 may each independently have a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group having 3 or more carbon atoms in the alkyl moiety, or a substituent.
- An aryl group, a monovalent heterocyclic group which may have a substituent, or a cyano group is shown. However, at least one of R 81 and R 82 is not a hydrogen atom.
- R 83 and R 84 each independently represent a monovalent group, and p and q are each independently an integer of 0 to 2. However, when a plurality of R 83 and R 84 are present, they may be the same or different.
- Y 81 and Y 82 are each independently a divalent group represented by the following formula (9a), (9b), (9c), (9d), (9e), (9f), (9g), or (9h).
- Y 83 and Y 84 are each independently the following formulas (9a), (9b), (9c), (9d), (9e), (9f), (9g), (9h) or (9i) is a divalent group represented.
- R 91 , R 92 , R 93 and R 94 each independently represent a hydrogen atom or a monovalent group, and R 93 and R 94 may be bonded to each other to form a ring.
- the condensed ring compound can be obtained simply by reacting the compound of the above formula (8a) with the compound of the above formula (8b). A condensed ring compound can be obtained.
- Y 81 and Y 82 are divalent groups represented by the above formula (9a), and Y 83 and Y 84 are divalent groups represented by the above formula (9i). And preferred.
- a condensed ring compound having further excellent charge transport properties can be obtained.
- a condensed ring compound can be easily produced by using such a compound.
- At least one of X 81 and X 82 is a halogen atom, but it is more preferable that both are halogen atoms.
- at least one of X 81 and X 82 is more preferably an iodine atom, and both are particularly preferably an iodine atom. If it carries out like this, reaction with the compound represented by the said general formula (8a) and the compound represented by the said general formula (8b) will arise easily, and the compound represented by the said general formula (8c) will be more efficient. It will be obtained.
- the present invention also provides an organic thin film containing the fused ring compound and / or polymer of the present invention. Since such an organic thin film contains the fused ring compound and / or polymer of the present invention, it has excellent charge transport properties and is suitable for an organic thin film element or the like.
- the present invention further provides an organic thin film element comprising the organic thin film of the present invention.
- an organic thin film element an organic thin film transistor is preferable. Since these organic thin film elements are provided with the organic thin film having a high charge transporting property of the present invention, they can exhibit excellent characteristics.
- ADVANTAGE OF THE INVENTION while being able to exhibit sufficient electric charge transportability, it becomes possible to provide the condensed ring compound and polymer which have the outstanding solubility with respect to a solvent. Moreover, according to this invention, it becomes possible to provide the suitable manufacturing method of the said condensed ring compound. Furthermore, according to the present invention, it is possible to provide an organic thin film obtained by using the fused ring compound and having excellent charge transportability, and an organic thin film element and an organic thin film transistor provided with the organic thin film.
- the fused ring compound of the present embodiment is a compound represented by the general formula (1).
- the group represented by R 11 or R 12 is a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkylamino group, or an alkyl moiety having 3 or more carbon atoms.
- At least one of R 11 and R 12 is not a hydrogen atom, and it is preferable that both of them are not hydrogen atoms.
- an alkyl group a linear, branched, and cyclic thing is contained.
- part or all of the hydrogen atoms of the functional group may be substituted with a halogen atom (particularly a fluorine atom).
- the alkyl group is preferably one having 1 to 20 carbon atoms (abbreviated as “C1 to 20”, the same applies hereinafter).
- Examples of such an alkyl group include a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, an iso-butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, and a hexyl group.
- a C1-16 alkyl group is preferable, and a C6-C12 alkyl group is more preferable from the viewpoint of improving solubility in a solvent.
- a hexyl group, a heptyl group, an octyl group, a decyl group, or a cyclohexyl group is preferable.
- alkoxy group alkylthio group, alkylamino group or alkoxycarbonyl group
- those in which the alkyl group they contain is a C1-20 alkyl group are suitable.
- the carbon number of the alkyl group which the alkoxycarbonyl group has is 3 or more. Examples of the C1-20 alkyl group are the same as those described above.
- the aryl group which may have a substituent one having C6 to 60 is preferable.
- examples thereof include a phenyl group, a phenyl group having a C1-12 alkoxy group, a phenyl group having a C1-12 alkyl group, a 1-naphthyl group, a 2-naphthyl group, and the like.
- a C6-20 aryl group is preferable, and a phenyl group having a C1-12 alkoxy group or a phenyl group having a C1-12 alkyl group is more preferable.
- the monovalent heterocyclic group which may have a substituent is preferably a C3-60 group.
- Examples include a thienyl group, a thienyl group having a C1-12 alkyl group, a pyrrolyl group, a furyl group, a pyridyl group, a pyridyl group having a C1-12 alkyl group, and the like.
- a C3-20 heterocyclic group is preferable, and a thienyl group, a thienyl group having a C1-12 alkyl group, a pyridyl group, or a pyridyl group having a C1-12 alkyl group is more preferable.
- the heterocyclic group means a group in which at least one atom constituting the ring is a heteroatom in an organic group having a cyclic structure.
- R 11 and R 12 are each independently preferably an alkyl group having 1 to 20 carbon atoms or an aryl group optionally having a substituent having 6 to 60 carbon atoms.
- An aryl group which is an alkyl group having 1 to 14 carbon atoms or optionally having a substituent having 6 to 20 carbon atoms is more preferable, and an alkyl group having 1 to 14 carbon atoms is particularly preferable.
- R 13 and R 14 are each independently a monovalent group, and m and n are integers of 0-2. However, when m or n is 2, the plurality of R 13 or R 14 may be the same group or different groups.
- R 13 and R 14 include an alkyl group, an alkoxy group, a fluoroalkyl group, a fluoroalkoxy group, an aryl group, an arylamino group, or a monovalent heterocyclic group. Of these, an alkyl group, an alkoxy group, a fluoroalkyl group, a fluoroalkoxy group, an aryl group or an arylamino group is preferable, and an alkyl group or an aryl group is more preferable.
- R 13 and R 14 are preferably suitably changed depending on the carrier organic thin film to be transported comprising a fused ring compound.
- an electron donating group such as an arylamino group is preferable for increasing the hole transport property of the organic thin film
- an electron withdrawing group such as a fluoroalkyl group or a fluoroalkoxy group is preferable from the viewpoint of increasing the electron transport property.
- a polymerizable functional group is also mentioned as a monovalent group represented by R 13 and R 14 .
- the condensed ring compound represented by the general formula (1) is suitable as a raw material for the polymer described later.
- the condensed ring compound represented by the general formula (1) is suitable as a raw material for the polymer described later.
- the condensed ring compound represented by the general formula (1) is suitable as a raw material for the polymer described later.
- R 13 and R 14 is preferably a group as defined above other than a polymerizable functional group.
- the polymerizable functional group refers to a group capable of causing a polymerization reaction with another polymerizable functional group.
- the polymerizable functional group include a Wittig reaction, a Heck reaction, a Horner-Wadsworth-Emmons reaction, a Knoevenagel reaction, a Suzuki coupling reaction, a Grindard reaction, a Stille reaction, and a polymerization reaction using a Ni (0) catalyst.
- it refers to a group that can react with other polymerizable functional groups to form a bond.
- polymerizable functional groups examples include halogen atoms, alkyl sulfonate groups, aryl sulfonate groups, aryl alkyl sulfonate groups, alkylstannyl groups, arylstannyl groups, arylalkylstannyl groups, boric acid ester residues, Examples thereof include a sulfonium methyl group, a phosphonium methyl group, a phosphonate methyl group, a monohalogenated methyl group, a boric acid residue (—B (OH) 2 ), a formyl group, and a vinyl group.
- a halogen atom, an alkylstannyl group or a borate ester residue is preferred.
- R is an alkyl group or an aryl group, and two Rs may be bonded to form a ring.
- the boric acid residue means a group in which a hydroxyl group is substituted for boron.
- the boric acid ester residue is a monovalent group having a structure in which one of the bonds of the boron atom in the boric acid ester is replaced with a bonding bond for substitution, for example, the following formula (100a) to And a group represented by (100d).
- Y 11 and Y 12 are each independently the formulas (2a), (2b), (2c), (2d), (2e), (2f), (2g) or ( 2h) (hereinafter expressed as “(2a) to (2h)”).
- R 21 and R 22 in these divalent groups are each independently a hydrogen atom or a monovalent group. Examples of the monovalent group include a halogen atom in addition to the groups similar to R 11 and R 12 described above.
- the group represented by the above formula (2h) has an asymmetric structure, the direction in which the bonding chain is bonded is not particularly limited.
- the formula (2a), (2b), 2 divalent group is preferably represented by (2c) or (2h), the formula (2a), (2b) or ( The divalent group represented by 2c) is more preferable.
- Y 11 and Y 12 are divalent groups represented by the above formula (2a), (2b) or (2c), a ring structure containing them (having R 11 and R 12 as substituents)
- the two 5-membered rings fused to the benzene ring are each a thiophene ring, a furan ring or a pyrrole ring.
- Y 11 and Y 12 are a divalent group represented by the above formula (2a) (that is, the ring structure is a thiophene ring) because good charge transportability is obtained.
- Y 13 and Y 14 are each independently the formulas (2a), (2b), (2c), (2d), (2e), (2f), (2g), ( 2h) or (2i) (hereinafter referred to as “(2a) to (2i)”).
- R 21 in these divalent groups, R 22, R 23 and R 24 each independently represent a hydrogen atom or a monovalent group, and R 23 and R 24, bonded to each other to form a ring It may be.
- the monovalent group include a halogen atom in addition to the groups similar to R 11 and R 12 described above. Note that, as described above, the direction of bonding of the bonding chain of the group represented by the formula (2h) is not particularly limited.
- Y 13 and Y 14 the formula (2a), (2b), , (2c), (2h) or a divalent group preferably represented by (2i), the formula (2a) ( The divalent group represented by 2b), (2c) or (2i) is more preferable.
- Y 13 and Y 14 are divalent groups represented by the above formula (2a), (2b), (2c) or (2i)
- a ring structure containing them Y 11 or Y 12 is represented by Two 5-membered rings or 6-membered rings fused to the ring structure to be included are a thiophene ring, a furan ring, a pyrrole ring, or a benzene ring, respectively.
- Y 13 and Y 14 are a divalent group represented by the above formula (2a) (that is, the ring structure is a thiophene ring) or a divalent group represented by the above formula (2i). (That is, the ring structure is a benzene ring), and when Y 13 and Y 14 are a divalent group represented by the above formula (2i), a particularly good charge transport property can be obtained. preferable.
- condensed ring compound as described above include compounds represented by the following general formula (1a) or (1b).
- R ⁇ 11 >, R ⁇ 12 >, R ⁇ 13 >, R ⁇ 14 >, n, and m in the following formula are all as defined above.
- the polymer of this embodiment has a structural unit represented by the general formula (3).
- this structural unit is included as at least one of the structural units constituting the main chain of the polymer.
- the structural unit represented by the general formula (3) is preferably contained in an amount of 30 mol% or more of all the structural units constituting the main chain of the polymer. , 50 mol% or more is more preferable.
- R 31 , R 32 , R 33 , R 34 , Y 31 , Y 32 , Y 33, and Y 34 may be R 11 , R 12 , R 13 , The same groups as R 14 , Y 11 , Y 12 , Y 13 and Y 14 are preferred.
- R 33 and R 34 are preferably groups other than the polymerizable functional groups described above.
- the polymer means a polymer having two or more structural units formed from one monomer, and includes both those usually classified into oligomers and polymers.
- the polymer of the present embodiment may be composed only of the structural unit represented by the general formula (3) or may further include another monomer unit.
- a plurality of structural units of the general formula (3) are included, but the plurality of structural units of the general formula (3) may have the same structure or different structures. Also good.
- the plurality of structural units of the general formula (3) are each preferably the same structure.
- the polymer preferably further includes the structural unit of the general formula (5) as a structural unit constituting the main chain.
- the structural unit of the general formula (5) the charge transport property by the polymer is further improved, and the solubility in a solvent, mechanical strength, heat resistance, and the like are also improved.
- the group represented by Ar 5 in the structural unit of the general formula (5) is a divalent aromatic hydrocarbon group which may have a substituent or a divalent heterocyclic ring which may have a substituent. It is a group.
- a divalent aromatic hydrocarbon group or divalent heterocyclic group is a group having a structure in which two substitution positions in an aromatic hydrocarbon or heterocyclic ring are provided for bonding in a polymer, that is, aromatic It is a group composed of the remaining atomic group obtained by removing two hydrogen atoms from a hydrocarbon or heterocyclic ring.
- the divalent aromatic hydrocarbon group constituting the group represented by Ar 5 is preferably a divalent aromatic group (monocyclic or condensed ring) formed of C6 to 60, more preferably C6 to 20 Groups are preferred.
- the condensed ring include naphthalene ring, anthracene ring, tetracene ring, pentacene ring, pyrene ring, perylene ring, fluorene ring and the like.
- an aromatic ring which comprises this aromatic hydrocarbon group a benzene ring, a pentacene ring, a pyrene ring, or a fluorene ring is preferable.
- the aromatic hydrocarbon group may further have a substituent as described above.
- substituents include a halogen atom, a saturated or unsaturated hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group.
- the divalent heterocyclic group is preferably a divalent group formed from a C3-60, more preferably a C3-20 heterocyclic ring.
- the divalent heterocyclic group includes, for example, a compound in which 2 to 6 thiophene rings are condensed such as thiophene, thienothiophene or dithienothiophene, two hydrogen atoms from thiazole, pyrrole, pyridine, pyrimidine, pyrazine, triazine, etc.
- Such a divalent heterocyclic group may further have a substituent, and examples of such a substituent include the same substituents as the aromatic hydrocarbon group described above.
- the group represented by Ar 5 is preferably a group represented by the general formula (6).
- the group represented by Y 6 in general formula (6) the same as Y 11 or Y 12 in the general formula (1) are preferred.
- Y 6 in the group represented by the general formula (6) is preferably a group represented by the general formula (7a).
- the polymer contains both the structural unit represented by the above general formula (3) and the structural unit represented by the above general formula (5), these suitable ratios in the polymer are represented by the general formula (3).
- the ratio of the structural unit of the general formula (5) is preferably 10 to 1000 mol, more preferably 25 to 400 mol, and still more preferably 50 to 200 mol, per 100 mol of the monomer unit.
- a polymer containing a combination of the structural unit represented by the general formula (3) and the structural unit represented by the general formula (5) is preferable.
- these structural units may be copolymerized randomly or may be copolymerized in blocks. Examples of such a polymer include those having a structure represented by the following general formula (10a) or (10b).
- R 31 to R 34 , Y 31 to Y 34 and Ar 5 are all as defined above.
- k is an integer of 1 to 10. When k is 2 or more and there are a plurality of Ar 5 , they may be the same or different.
- A is an integer of preferably 2 to 500, more preferably 3 to 20.
- b is preferably an integer of 1 to 500, more preferably 2 to 20.
- Y 31 and Y 32 are both sulfide groups
- Y 33 and Y 34 are both vinylene groups
- R 31 and R 32 are each independently an alkyl group or an aryl group (preferably Particularly preferred are those in which R 33 and R 34 are hydrogen atoms.
- the terminal group of such a polymer is not particularly limited, and examples thereof include an electron-withdrawing group or an electron-donating group such as a hydrogen atom, an alkyl group, an alkoxy group, a fluoroalkyl group, a fluoroalkoxy group, an aryl group, and a heterocyclic group. It is done. From the viewpoint of enhancing the electron transport property of the polymer, the terminal group is preferably an electron withdrawing group such as a fluoroalkyl group or a fluoroalkoxy group.
- the terminal group may have a structure that can be conjugated with a conjugated structure of the main chain, and examples thereof include an aryl group having a unsaturated bond at a bonding site with the main chain or a monovalent heterocyclic group. It is done.
- the fused ring compound having a polymerizable functional group as the group represented by R 13 and R 14 in the general formula (1) as a raw material monomer in the manufacture of the polymer polymerized
- the polymerizable functional group remains at the later end.
- the terminal composed of this polymerizable functional group may reduce durability and the like when an organic thin film is formed. Therefore, in the polymer, it is preferable to protect the polymerizable functional group with a stable group.
- polymers represented by the following general formulas (11a) to (11p) are preferable as the polymer of the present embodiment.
- R 31 to R 34 are as defined above.
- R 111 and R 112 are each independently the terminal group described above.
- R 113 represents a monovalent group.
- R 114 and R 115 each independently represent a hydrogen atom or a monovalent group. Examples of these monovalent groups include the same groups as R 13 and R 14 in the general formula (1). Of these, an alkyl group or an alkoxy group is preferable, and an alkyl group is more preferable.
- d represents an integer of 1 ⁇ 500
- e is an integer of up to the number of substitutable positions in the ring 0 ⁇ R 113 are bonded.
- f represents an integer of 1 to 3
- g represents an integer of 0 to 3.
- e, f or g is 2 or more, there are a plurality of groups or structural units in parentheses to which these are attached, but they may be the same or different.
- the value of d is preferably selected as appropriate according to the method for forming the organic thin film using the polymer.
- the polymer is an oligomer in which d is preferably 1 to 10, more preferably 2 to 10, and further preferably 2 to 5. Is preferred.
- d is preferably 3 to 500, more preferably 6 to 300, still more preferably 20 to 200 as the polymer. It is.
- the number average molecular weight in terms of polystyrene of the polymer preferable to be 1 ⁇ 10 3 ⁇ 1 ⁇ 10 8, 1 ⁇ 10 4 ⁇ 1 ⁇ 10 6 is more preferable.
- the polymer has a structure in which a plurality of structural units in parentheses in each of the above general formulas are repeated.
- the plurality of structural units have different structures even though they have the same structure. You may have. That is, functional groups such as R 113 ⁇ R 115 in the structural unit may be the same or different for each repeating unit. However, from the viewpoint of easily producing the polymer, it is preferable that all the structural units have the same structure.
- the condensed ring compound can be obtained by reacting the compound represented by the general formula (8a) with the compound represented by the general formula (8b) in the presence of a base and a metal complex catalyst. In such a production method, a reaction occurs between the group represented by X 81 and X 82 in the compound of the general formula (8a) and the triple bond in the compound of the general formula (8b). Two condensed rings in the compound of formula (8a) are bridged to form a 6-membered ring structure between them. In addition, it is preferable to perform this reaction in inert gas atmosphere, such as nitrogen and argon.
- inert gas atmosphere such as nitrogen and argon.
- R 83 , R 84 , Y 81 , Y 82 , Y 83, and Y 84 may be R 13 , R 14 , Y 11 , Y 12 , Y in the general formula (1). 13 and from each other similar to the groups represented by Y 14 can be applied.
- X 81 and X 82 are each independently a hydrogen atom or a halogen atom, when both are halogen atom. More specifically, at least one of X 81 and X 82 is preferably an iodine atom, and more preferably both are iodine atoms.
- Examples of the metal complex catalyst in the above reaction include a palladium complex, a nickel complex, a platinum complex, a ruthenium complex, a rhodium complex, and an iridium complex.
- a palladium complex or a nickel complex is preferable, and a palladium complex is more preferable.
- the palladium complex include a divalent palladium complex and a palladium complex compound having an electron donating ligand.
- Examples of the divalent palladium complex include palladium acetate, palladium chloride, sodium palladium acid, potassium palladium acid and the like, and palladium acetate is preferable.
- Examples of the palladium complex compound having an electron-donating ligand include tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, tris (dibenzylideneacetone) dipalladium, and tetrakis (triphenylphosphine). Phosphine) palladium is preferred.
- the metal complex catalyst is preferably 0.01 to 50 mol%, more preferably 1.0 to 20 mol%, still more preferably 3 to 15 mol%, based on the compound represented by the general formula (8a) as a raw material. Use.
- both an inorganic base and an organic base can be applied, and an organic base is more preferable.
- the inorganic base include alkali metal or alkaline earth metal hydroxides, carbonates, ammonium salts, acetates, and the like.
- the organic base include trialkylamines, dialkylarylamines, alkyldiarylamines containing C1-20 alkyl groups, amines such as triarylamines, and pyridine.
- organic base examples include trimethylamine, triethylamine, diisopropylethylamine, tri-n-propylamine, tributylamine, dicyclohexylmethylamine, pyridine, 2,3-lutidine, 2,4-lutidine, and 2,5-lutidine.
- amines are particularly preferable. By using amines as the base, the formation of by-products during the reaction can be suppressed, and the desired condensed ring compound can be obtained in a high yield.
- alkylamines particularly trialkylamines are preferred.
- the above-described reaction can also be performed in a solvent.
- a solvent inert to the reaction by the metal complex catalyst is preferable.
- toluene, dimethylformamide (DMF), N-methyl-2-pyrrolidone (NMP), tetrahydrofuran (THF), dioxane, isopropyl alcohol, acetonitrile, pinacolone and the like can be mentioned.
- toluene, NMP or dioxane is preferable.
- the amount of the solvent used is not particularly limited.
- the amount is preferably 1 to 100 times, more preferably 2 to 30 times the weight of the compound represented by the general formula (8a) as the raw material. it can.
- the reaction time is not particularly limited, and the reaction can be terminated when one of the compound represented by the general formula (8a) and the compound represented by the general formula (8b) disappears.
- the time taken from the start to the end of the reaction is about 0.5 to 200 hours.
- the reaction temperature can be appropriately set in the range of ⁇ 50 to 300 ° C., and preferably about 50 to 150 ° C.
- a condensed ring compound can be obtained satisfactorily by the production method described above.
- a reaction represented by the following reaction formula occurs, and a condensed ring compound represented by the following general formula (8c) is obtained.
- the polymer can be obtained by polymerizing a monomer represented by the following general formula (13a) and a monomer represented by the following general formula (13b).
- R 31 to R 34 , Y 31 , Y 32 , Y 33 and Y 34 are all as defined above.
- R 131 to R 134 are each independently a polymerizable functional group.
- R 33 and R 34 preferably from non-polymerizable functional groups.
- examples of the polymerizable functional group include the same groups as those exemplified as the polymerizable functional groups for R 13 and R 14 in the general formula (1).
- reaction for forming a bond between the compounds represented by the formula (13b) is repeatedly generated.
- the reaction for forming a bond between the above compounds include Wittig reaction, Heck reaction, Horner-Wadsworth-Emmons reaction, Knoevenagel reaction, Suzuki coupling reaction, Grindard reaction, Stille reaction, and polymerization using Ni (0) catalyst. Reaction etc. are mentioned.
- a reaction by decomposition of an intermediate compound having an appropriate leaving group can also be applied.
- An example is a method of synthesizing poly (p-phenylene vinylene) from an intermediate compound having a sulfonium group.
- the polymerizable functional group of R 131 to R 134 is preferably selected as appropriate according to the target reaction.
- the polymer may be formed by a method other than the reaction with a polymerizable functional group. For example, a method in which condensed ring compounds in which m and n are 0 in the above general formula (1) are repeatedly bonded by an oxidation polymerization reaction using FeCl 3 or a polymerization reaction by electrochemical oxidation, etc.
- the Suzuki coupling reaction, Grindard reaction, Stille reaction, and polymerization reaction using a Ni (0) catalyst are easy to control the structure, and the preparation of raw materials is relatively It is preferable because it is easy and the reaction operation is simple.
- An oxidative polymerization reaction using FeCl 3 is also preferable because the preparation of raw materials is relatively easy and the reaction operation is simple.
- combinations of polymerizable functional groups suitable for these reactions include a combination of a boric acid residue or a boric acid ester residue and a halogen atom in the case of the Suzuki coupling reaction.
- the combination of a halomagnesium carbanion and a halogen atom is mentioned.
- a combination of an alkylstannyl group and a halogen atom is exemplified, and in the case of a polymerization reaction using a Ni (0) catalyst, a combination of halogen atoms is exemplified.
- the reaction for obtaining the polymer is preferably performed in an inert atmosphere in order to suppress side reactions. Further, from the viewpoint of obtaining a high-purity organic thin film from the polymer, it is desirable to purify the raw material monomer by various methods such as distillation, sublimation, and recrystallization. Further, after the reaction, the target product, the polymer, is extracted from the extract after extraction with an organic solvent and the solvent is distilled off. This polymer is further purified by means such as chromatography and recrystallization. It is preferable to do.
- Each of the above reactions can occur in a solution in which the raw material monomer is dissolved in a solvent.
- Suitable solvents vary depending on the reaction to be generated.
- saturated hydrocarbons such as pentane, hexane, heptane, octane and cyclohexane
- aromatic hydrocarbons such as benzene, toluene, ethylbenzene and xylene, carbon tetrachloride, chloroform
- Halogenated saturated hydrocarbons such as dichloromethane, chlorobutane, bromobutane, chloropentane, bromopentane, chlorohexane, bromohexane, chlorocyclohexane and bromocyclohexane
- halogenated aromatic hydrocarbons such as chlorobenzene, dichlorobenzene and trichlorobenzene
- methanol Alcohols such as ethanol, propanol, isopropyl alcohol, butanol, t-butyl alcohol, carboxylic acids such as formic acid,
- the organic thin film has a configuration having a film shape including the fused ring compound or polymer of the above-described embodiment.
- the organic thin film may contain only one of the condensed ring compound and the polymer, or may contain both of them.
- the organic thin film may contain two or more condensed ring compounds or polymers in combination.
- the organic thin film may be composed only of a condensed ring compound or a polymer, or may further comprise other components.
- the suitable thickness of such an organic thin film varies depending on the element to which the organic thin film is applied, but is usually in the range of 1 nm to 100 ⁇ m, preferably 2 nm to 1000 nm, and more preferably 5 nm to 500 nm. 20 nm to 200 nm is more preferable.
- the organic thin film when the organic thin film further contains a component other than the condensed ring compound or a polymer thereof, the organic thin film preferably contains at least 30% by mass of any of the condensed ring compound and the polymer, and preferably contains 50% by mass or more. More preferred. When the content of either the condensed ring compound or the polymer is less than 30% by mass, good charge mobility tends to be difficult to obtain.
- the organic thin film may further contain a compound having a hole transport property or an electron transport property in order to obtain excellent charge (hole or electron) mobility.
- the compound having a hole transporting property include pyrazoline derivatives, arylamine derivatives, stilbene derivatives, triphenyldiamine derivatives, oligothiophene and derivatives thereof, polyvinylcarbazole and derivatives thereof, polysilane and derivatives thereof, aromatics in side chains or main chains.
- Examples thereof include polysiloxane derivatives having a group amine, polyaniline and derivatives thereof, polythiophene and derivatives thereof, polypyrrole and derivatives thereof, polyphenylene vinylene and derivatives thereof, or polythienylene vinylene and derivatives thereof.
- Examples of the compound having an electron transporting property include oxadiazole derivatives, anthraquinodimethane and derivatives thereof, benzoquinone and derivatives thereof, naphthoquinone and derivatives thereof, anthraquinones and derivatives thereof, tetracyanoanthraquinodimethane and derivatives thereof. , fluorenone derivatives, diphenyldicyanoethylene and derivatives thereof, diphenoquinone derivatives, 8-hydroxyquinoline and metal complexes of derivatives thereof, polyquinoline and derivatives thereof, polyquinoxaline and derivatives thereof, polyfluorene and derivatives thereof, fullerenes such as C 60 and a Examples thereof include derivatives.
- the organic thin film may further contain other components in order to improve its properties.
- other components include charge generation materials.
- the organic thin film contains a charge generation material, the thin film absorbs light to generate charges, which is suitable for applications such as an optical sensor that requires charge generation by light absorption.
- charge generation materials include azo compounds and derivatives thereof, diazo compounds and derivatives thereof, metal-free phthalocyanine compounds and derivatives thereof, metal phthalocyanine compounds and derivatives thereof, perylene compounds and derivatives thereof, polycyclic quinone compounds and derivatives thereof, squarylium compound and a derivative thereof, an azulenium compound and a derivative thereof, a thiapyrylium compound and a derivative thereof, and fullerenes such as C 60 and derivatives thereof.
- the organic thin film further includes a sensitizer for sensitizing the charge generation function of the above-described charge generation material, a stabilizer for stabilizing the thin film, a UV absorber for absorbing UV light, and the like. May be included.
- the organic thin film may further contain a polymer compound other than the condensed ring compound or the polymer as a polymer binder from the viewpoint of increasing its mechanical strength.
- a polymer binder those that do not excessively reduce the charge transportability are preferable, and those that do not excessively absorb visible light are preferable.
- polymer binder examples include poly (N-vinylcarbazole), polyaniline and derivatives thereof, polythiophene and derivatives thereof, poly (p-phenylene vinylene) and derivatives thereof, and poly (2,5-thienylene vinylene) and derivatives thereof.
- the organic thin film mentioned above can be manufactured by the following methods, for example.
- the organic thin film is formed by applying a solution obtained by dissolving a condensed ring compound and / or a polymer and other components described above in a solvent as necessary onto a predetermined substrate, and then volatilizing the solvent. It can form by removing by.
- the solvent is preferably a solvent that can dissolve or uniformly disperse the condensed ring compound or polymer and other components.
- solvents include aromatic hydrocarbon solvents such as toluene, xylene, mesitylene, tetralin, decalin, n-butylbenzene, carbon tetrachloride, chloroform, dichloromethane, dichloroethane, chlorobutane, bromobutane, chloropentane, bromopentane, Halogenated saturated hydrocarbon solvents such as chlorohexane, bromohexane, chlorocyclohexane and bromocyclohexane, halogenated aromatic hydrocarbon solvents such as chlorobenzene, dichlorobenzene and trichlorobenzene, ether solvents such as tetrahydrofuran and tetrahydropyran, etc. Can be illustrated.
- the condensed ring compound or polymer is preferably
- Examples of the method for applying the solution include spin coating, casting, micro gravure coating, gravure coating, bar coating, roll coating, wire bar coating, dip coating, spray coating, and screen printing. , Flexographic printing method, offset printing method, inkjet printing method, dispenser printing method and the like. Of these, spin coating, flexographic printing, inkjet printing, or dispenser printing are preferred.
- the method for producing the organic thin film is not necessarily limited thereto.
- a vapor phase growth method such as a vacuum vapor deposition method can be applied.
- the organic thin film may be further subjected to a step of orienting the condensed ring compound or polymer in the organic thin film according to its use.
- a step of orienting the condensed ring compound or polymer in the organic thin film according to its use.
- condensed ring compounds and polymers (main chain or side chain) in the organic thin film are arranged in a certain direction, and the charge transport property of the organic thin film is further enhanced.
- an alignment method of the organic thin film a method usually used for alignment of liquid crystal or the like can be applied. Specifically, a rubbing method, a photo-alignment method, a sharing method (shear stress application method), a pulling application method, and the like are preferable because they are simple and useful, and a rubbing method or a sharing method is more preferable.
- Organic thin film element Since the organic thin film of the above-described embodiment includes the condensed ring compound and / or polymer of the above-described embodiment, the organic thin film has excellent charge (electron or hole) transportability. Therefore, this organic thin film can efficiently transport electrons or holes injected from electrodes or the like, or electric charges generated by light absorption, etc., and can be used for various electric elements (organic thin film elements) using the organic thin film. Can be applied. Hereinafter, examples of organic thin film elements will be described.
- the organic thin film transistor includes a source electrode and a drain electrode, an organic thin film layer (active layer) containing the condensed ring compound and / or polymer of the present invention, and a gate electrode for controlling the amount of current passing through the current path.
- a source electrode and a drain electrode an organic thin film layer (active layer) containing the condensed ring compound and / or polymer of the present invention
- a gate electrode for controlling the amount of current passing through the current path.
- Any structure provided may be used, and field effect type, electrostatic induction type and the like are exemplified.
- the field effect organic thin film transistor controls the amount of current passing through the source electrode and the drain electrode, the organic thin film layer (active layer) containing the condensed ring compound and / or polymer of the present invention, and the current path between them. It is preferable to include a gate electrode and an insulating layer disposed between the active layer and the gate electrode.
- the source electrode and the drain electrode are provided in contact with the organic thin film layer (active layer) containing the condensed ring compound and / or polymer of the present invention, and the gate is sandwiched between the insulating layers in contact with the organic thin film layer. It is preferable that an electrode is provided.
- the electrostatic induction type organic thin film transistor controls the amount of current passing through the source electrode and the drain electrode, the organic thin film layer containing the condensed ring compound and / or polymer of the present invention as a current path therebetween, and the current path.
- a gate electrode and the gate electrode is provided in the organic thin film layer.
- the source electrode, the drain electrode, and the gate electrode provided in the organic thin film layer are preferably provided in contact with the organic thin film layer containing the condensed ring compound and / or polymer of the present invention.
- the structure of the gate electrode may be any structure as long as a current path flowing from the source electrode to the drain electrode is formed and the amount of current flowing through the current path can be controlled by a voltage applied to the gate electrode. It is done.
- FIG. 1 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a first embodiment.
- An organic thin film transistor 100 shown in FIG. 1 includes a substrate 1, a source electrode 5 and a drain electrode 6 formed on the substrate 1 with a predetermined interval, and a source electrode 5 and a drain electrode 6 so as to cover the substrate 1. Formed on the insulating layer 3 so as to cover the region of the insulating layer 3 between the source electrode 5 and the drain electrode 6, the insulating layer 3 formed on the active layer 2, and the insulating layer 3 formed between the source electrode 5 and the drain electrode 6. And a gate electrode 4.
- FIG. 2 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a second embodiment.
- An organic thin film transistor 110 shown in FIG. 2 includes a substrate 1, a source electrode 5 formed on the substrate 1, an active layer 2 formed on the substrate 1 so as to cover the source electrode 5, a source electrode 5 and a predetermined electrode.
- the drain electrode 6 formed on the active layer 2 with an interval of the insulating layer 3 formed on the active layer 2 and the drain electrode 6, and the insulating layer 3 between the source electrode 5 and the drain electrode 6.
- a gate electrode 4 formed on the insulating layer 3 so as to cover the region.
- FIG. 3 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a third embodiment.
- the organic thin film transistor 120 shown in FIG. 3 includes a substrate 1, an active layer 2 formed on the substrate 1, a source electrode 5 and a drain electrode 6 formed on the active layer 2 with a predetermined interval, and a source electrode. 5 and the drain electrode 6 so as to partially cover the insulating layer 3 formed on the active layer 2, the region of the insulating layer 3 where the source electrode 5 is formed below, and the drain electrode 6 are formed below.
- a gate electrode 4 formed on the insulating layer 3 so as to partially cover the region of the insulating layer 3.
- FIG. 4 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a fourth embodiment.
- 4 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- an active layer 2 formed on the insulating layer 3 so as to cover it.
- FIG. 5 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a fifth embodiment.
- An organic thin film transistor 140 shown in FIG. 5 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- a source electrode 5 formed on the insulating layer 3 so as to partially cover the region of the insulating layer 3 formed on the active layer 2 and an active layer 2 formed on the insulating layer 3 so as to partially cover the source electrode 5.
- a drain electrode 6 formed on the insulating layer 3 at a predetermined interval so as to partially cover the region of the active layer 2 formed below the gate electrode 4 It is.
- FIG. 6 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a sixth embodiment.
- An organic thin film transistor 150 shown in FIG. 6 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- the active layer 2 is formed on the insulating layer 3 so as to partially cover the region of the active layer 2 formed under the active layer 2 and the gate electrode 4 formed below.
- the source electrode 5 and the drain electrode 6 formed on the insulating layer 3 with a predetermined distance from the source electrode 5 so as to partially cover the region of the active layer 2 where the gate electrode 4 is formed below. , Are provided.
- FIG. 7 is a schematic cross-sectional view of an organic thin film transistor (static induction organic thin film transistor) according to a seventh embodiment.
- the organic thin film transistor 160 shown in FIG. 7 includes a substrate 1, a source electrode 5 formed on the substrate 1, an active layer 2 formed on the source electrode 5, and a plurality on the active layer 2 with a predetermined interval.
- a drain electrode 6 formed on the active layer 2a.
- the active layer 2 and / or the active layer 2a contain the condensed ring compound and / or polymer of the present invention, and the source electrode 5 and the drain electrode 6 It becomes a current passage (channel).
- the gate electrode 4 controls the amount of current passing through the current path (channel) in the active layer 2 and / or the active layer 2a by applying a voltage.
- Such a field effect organic thin film transistor can be manufactured by a known method, for example, a method described in JP-A-5-110069.
- the electrostatic induction organic thin film transistor can be produced by a known method, for example, a method described in JP-A-2004-006476.
- the substrate 1 is not particularly limited as long as the characteristics as an organic thin film transistor are not impaired, but a glass substrate, a flexible film substrate, or a plastic substrate can be used.
- the active layer 2 When forming the active layer 2, it is very advantageous and preferable to use an organic solvent-soluble compound, so that the active layer 2 is formed by using the organic thin film manufacturing method of the present invention described above. An organic thin film can be formed.
- the insulating layer 3 in contact with the active layer 2 is not particularly limited as long as it is a material having high electrical insulation, and a known material can be used.
- a known material can be used.
- the surface of the insulating layer 3 is treated with a surface treatment agent such as a silane coupling agent in order to improve the interface characteristics between the insulating layer 3 and the active layer 2. It is also possible to form the active layer 2 after the modification.
- a surface treatment agent such as a silane coupling agent
- the surface treatment agent include silylamine compounds such as long-chain alkylchlorosilanes, long-chain alkylalkoxysilanes, fluorinated alkylchlorosilanes, fluorinated alkylalkoxysilanes, and hexamethyldisilazane.
- the surface of the insulating layer can be treated with ozone UV or O 2 plasma.
- a protective film on the organic thin film transistor after the organic thin film transistor is manufactured in order to protect the element.
- an organic thin-film transistor is interrupted
- the influence from the process of forming the display device driven on an organic thin-film transistor with a protective film can be reduced.
- a method for forming a protective film for example, a method of covering with SiON x film of UV curable resin, thermosetting resin or inorganic.
- a method of covering with SiON x film of UV curable resin, thermosetting resin or inorganic In order to effectively cut off from the atmosphere, it is preferable to perform the steps from the preparation of the organic thin film transistor to the formation of the protective film without exposure to the atmosphere (for example, in a dry nitrogen atmosphere or in a vacuum).
- FIG. 8 is a schematic cross-sectional view of the solar cell according to the embodiment.
- a solar cell 200 shown in FIG. 8 includes a substrate 1, a first electrode 7a formed on the substrate 1, and a condensed ring compound and / or polymer of the present invention formed on the first electrode 7a.
- An active layer 2 made of an organic thin film and a second electrode 7b formed on the active layer 2 are provided.
- a transparent or translucent electrode is used for one of the first electrode 7a and the second electrode 7b.
- an electrode material a metal such as aluminum, gold, silver, copper, alkali metal, alkaline earth metal, or a translucent film or a transparent conductive film thereof can be used.
- each electrode is preferably selected so that the difference in work function is large.
- a charge generating agent, a sensitizer and the like can be added and used in order to increase photosensitivity.
- the substrate 1 a silicon substrate, a glass substrate, a plastic substrate, or the like can be used.
- FIG. 9 is a schematic cross-sectional view of the photosensor according to the first embodiment.
- the optical sensor 300 shown in FIG. 9 includes the substrate 1, the first electrode 7a formed on the substrate 1, and the condensed ring compound and / or polymer of the present invention formed on the first electrode 7a.
- An active layer 2 made of an organic thin film, a charge generation layer 8 formed on the active layer 2, and a second electrode 7b formed on the charge generation layer 8 are provided.
- FIG. 10 is a schematic cross-sectional view of an optical sensor according to the second embodiment.
- An optical sensor 310 illustrated in FIG. 10 is formed on the substrate 1, the first electrode 7a formed on the substrate 1, the charge generation layer 8 formed on the first electrode 7a, and the charge generation layer 8.
- the active layer 2 made of an organic thin film containing the fused ring compound and / or polymer of the present invention, and a second electrode 7b formed on the active layer 2 are provided.
- FIG. 11 is a schematic cross-sectional view of an optical sensor according to the third embodiment.
- An optical sensor 320 shown in FIG. 11 includes a substrate 1, a first electrode 7a formed on the substrate 1, and a condensed ring compound and / or polymer of the present invention formed on the first electrode 7a.
- An active layer 2 made of an organic thin film and a second electrode 7b formed on the active layer 2 are provided.
- a transparent or translucent electrode is used as one of the first electrode 7a and the second electrode 7b.
- the charge generation layer 8 is a layer that absorbs light and generates charges.
- a metal such as aluminum, gold, silver, copper, alkali metal, alkaline earth metal, or a translucent film or a transparent conductive film thereof can be used.
- the active layer 2 organic thin film
- a carrier generating agent, a sensitizer and the like can be added and used in order to increase photosensitivity.
- the base material 1 a silicon substrate, a glass substrate, a plastic substrate, etc. can be used as the base material 1.
- the organic thin film element is not limited to the above-described embodiment as long as it is an electric element to which the organic thin film is applied.
- organic thin film elements other than the above include organic EL elements, organic memories, photorefractive elements, spatial light modulators, and image sensors.
- Example 2 Synthesis of 2,9-dibromo-5,6-di (n-decanyl) benzo [2,1-b: 3,4-b ′] bis [1] benzothiophene To a two-necked flask, add 6,6′-dibromo-3,3′-diiodo-2,2′-bibenzo [b] thiophene, 1,2-didecanylethyne, palladium acetate, N, N-dicyclohexylmethylamine and DMF The inside of the reaction vessel is purged with nitrogen, and heated and stirred to react.
- Example 3 Synthesis of poly (5,6-di (n-decanyl) benzo [2,1-b: 3,4-b ′] bis [1] benzothiophene) In a two-neck flask, 2,9-dibromo-5,6-di (n- heptyl) benzo [2,1-b: 3,4-b '] bis [1] benzothiophene, Ni (COD) 2, 1 , 5-cyclooctadiene, bipyridyl and N, N-dimethylformamide are added, the inside of the reaction vessel is purged with nitrogen, and the mixture is reacted by stirring at 60 ° C.
- Example 4 Production of organic thin film transistor and evaluation of its characteristics
- An appropriate amount of the polymer A is weighed and chloroform is added thereto to prepare a chloroform solution, which is filtered through a membrane filter made of Teflon (registered trademark) to obtain a coating solution.
- the substrate on which a thermally oxidized silicon oxide film serving as an insulating layer is formed on the surface of a highly doped n-type silicon substrate serving as a gate electrode is subjected to ultra-cleaning with an alkaline detergent, ultrapure water, or acetone. After sonic cleaning, the surface is cleaned by ozone UV irradiation. Hexamethyldisilazane (HMDS; manufactured by Hexamethyldisilazane, Aldrich) is dropped onto the cleaned substrate, and then the substrate surface is treated with HMDS by spinning. A chloroform solution (coating solution) of the above polymer A is dropped on the surface-treated substrate and then spun to form a polymer A thin film.
- HMDS Hexamethyldisilazane
- a Pt / Au electrode is deposited on the polymer A thin film by a vacuum deposition method using a metal mask to form a source electrode and a drain electrode to obtain an organic thin film transistor.
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Abstract
Description
まず、好適な実施形態に係る縮合環化合物について説明する。本実施形態の縮合環化合物は、上記一般式(1)で表される化合物である。上記一般式(1)で表される化合物において、R11又はR12で表される基は、水素原子、アルキル基、アルコキシ基、アルキルチオ基、アルキルアミノ基、アルキル部分の炭素数が3以上であるアルコキシカルボニル基、置換基を有していてもよいアリール基、置換基を有していてもよい1価の複素環基又はシアノ基である。R11及びR12の少なくとも一方は水素原子ではなく、これらの両方が水素原子でないことが好ましい。なお、アルキル基としては、直鎖状、分岐状及び環状のものが含まれる。また、上述した官能基は、当該官能基が有している水素原子の一部又は全てがハロゲン原子(特にフッ素原子)で置換されていてもよい。
次に、好適な実施形態に係る重合体について説明する。本実施形態の重合体は、上記一般式(3)で表される構造単位を有するものである。重合体において、この構造単位は、当該重合体の主鎖を構成している構造単位の少なくとも一つとして含まれている。本実施形態の重合体において、上記一般式(3)で表される構造単位は、当該重合体の主鎖を構成している全ての構造単位のうち、30モル%以上含まれていると好ましく、50モル%以上含まれているとより好ましい。
次に、上述した構造を有する縮合環化合物の好適な製造方法について説明する。縮合環化合物は、上記一般式(8a)で表される化合物と、上記一般式(8b)で表される化合物とを、塩基及び金属錯体触媒の存在下で反応させることによって得ることができる。このような製造方法においては、一般式(8a)の化合物におけるX81及びX82で表される基と、一般式(8b)の化合物における3重結合との間で反応が生じ、これによって一般式(8a)の化合物における2つの縮環が架橋されて、これらの間に6員環構造が形成される。なお、この反応は、窒素やアルゴン等の不活性ガス雰囲気下で行うことが好ましい。
次に、上述した構造を有する重合体の好適な製造方法について説明する。以下の説明においては、上記一般式(3)で表されるモノマー単位及び上記一般式(5)で表されるモノマー単位の両方を有する重合体を製造する方法について説明する。
次に、好適な実施形態に係る有機薄膜について説明する。有機薄膜は、上述した実施形態の縮合環化合物や重合体を含み膜状の形状を有する構成を有している。有機薄膜は、縮合環化合物及び重合体のいずれか一方のみを含んでいてもよく、これらの両方を含んでいてもよい。また、有機薄膜中には、縮合環化合物又は重合体がそれぞれ2種以上組み合わせて含まれていてもよい。
上述した実施形態の有機薄膜は、上記実施形態の縮合環化合物及び/又は重合体を含むことから、優れた電荷(電子又はホール)輸送性を有するものとなる。したがって、この有機薄膜は、電極等から注入された電子又はホール、或いは、光吸収により発生した電荷等を効率よく輸送できるものであり、有機薄膜を用いた各種の電気素子(有機薄膜素子)に応用することができる。以下、有機薄膜素子の例についてそれぞれ説明する。
まず、好適な実施形態に係る有機薄膜トランジスタについて説明する。有機薄膜トランジスタは、ソース電極及びドレイン電極、これらの間の電流経路となり本発明の縮合環化合物及び/又は重合体を含む有機薄膜層(活性層)、電流経路を通る電流量を制御するゲート電極を備えた構造であればよく、電界効果型、静電誘導型などが例示される。
次に、本発明の有機薄膜の太陽電池への応用を説明する。図8は、実施形態に係る太陽電池の模式断面図である。図8に示す太陽電池200は、基板1と、基板1上に形成された第1の電極7aと、第1の電極7a上に形成された本発明の縮合環化合物及び/又は重合体を含む有機薄膜からなる活性層2と、活性層2上に形成された第2の電極7bと、を備えるものである。
次に、本発明の有機薄膜の光センサへの応用を説明する。図9は、第1実施形態に係る光センサの模式断面図である。図9に示す光センサ300は、基板1と、基板1上に形成された第1の電極7aと、第1の電極7a上に形成された本発明の縮合環化合物及び/又は重合体を含む有機薄膜からなる活性層2と、活性層2上に形成された電荷発生層8と、電荷発生層8上に形成された第2の電極7bと、を備えるものである。
以下の合成例及び実施例において、各種の分析等は以下の条件で行った。すなわち、まず、核磁気共鳴(NMR)スペクトルは、日本電子社製のJNM-GSX-400を用いて測定した。ガスクロマトグラフ-質量分析(GC-MS)は、島津製作所社製のQP-5050を用い、電子衝撃法により行った。高分解質量分析(HRMS)は、日本電子社製のJMS-DX-303を用いて行った。ガスクロマトグラフ(GC)分析は、島津製作所社製のGC-8Aにジーエルサイエンス社製のシリコンOV-17充填ガラスカラム(内径2.6mm、長さ1.5m)を装着して用いた。カラムクロマトグラフィー分離におけるシリカゲルは、和光純薬工業社製のワコーゲルC-200を用いた。
まず、出発原料である3,3’-ジブロモ-2,2’-ビベンゾ[b]チオフェンを、参考文献(U. Dahlmann, R. Neidlein, Helv. Chim.Acta., 1997, 80, 111-120)の記載を参照して合成した。そして、これを用いてハロゲン交換反応を行い、3,3’-ジヨード-2,2’-ビベンゾ[b]チオフェンを合成した。
得られた目的物の1H-NMR、及びHRMSの測定結果は以下の通りであった。
1H-NMR(400MHz,CDCl3)δ7.92-7.78(m,4H),7.57-7.43(m,4H);HRMS(EI):m/z=517.8164(C16H8I2S2の計算値は517.8157である)
(実施例1:(5,6-ジ(n-ヘプチル)ベンゾ[2,1-b:3,4-b’]ビス[1]ベンゾチオフェンの合成)
30mLの二口フラスコに、上記で得られた3,3’-ジヨード-2,2’-ビベンゾ[b]チオフェン(575mg,1.11mmol)、8-ヘキサデシン(302mg,1.33mmol)、酢酸パラジウム(24.4mg,0.11mmol)、N,N-ジシクロヘキシルメチルアミン(520mg,2.66mmol)、DMF(15mL)を加え、反応容器内を窒素置換して140℃で2.5時間、加熱撹拌し反応させた。
1H-NMR(400MHz,CDCl3);δ8.31(d,J=7.6Hz,2H), 7.90(d,J=7.6,2H),7.55-7.41(m,4H),3.43-3.30(m,4H),1.88-1.73(m,4H),1.70-1.57(m,4H),1.55-1.30(m,12H),0.92(t,J=7.3Hz,6H)、HRMS(EI):m/z=486.2421(C32H38S2の計算値は486.2415である)
二口フラスコに、6,6’-ジブロモ-3,3’-ジヨード-2,2’-ビベンゾ[b]チオフェン、1,2-ジデカニルエチン、酢酸パラジウム、N,N-ジシクロヘキシルメチルアミン及びDMFを加え、反応容器内を窒素置換して、加熱撹拌し反応させる。
(実施例3:ポリ(5,6-ジ(n-デカニル)ベンゾ〔2,1-b:3,4-b’〕ビス[1] ベンゾチオフェン)の合成)
二口フラスコに、2,9-ジブロモ-5,6-ジ(n-ヘプチル)ベンゾ[2,1-b:3,4-b’]ビス[1]ベンゾチオフェン、Ni(COD)2、1,5-シクロオクタジエン、ビピリジル及び、N,N-ジメチルホルムアミドを加え、反応容器内を窒素置換し、60℃で攪拌して反応させる。
(実施例4:有機薄膜トランジスタの製造及びその特性の評価)
重合体Aを適量秤量し、これにクロロホルムを加えて、クロロホルム溶液を調製し、これをテフロン(登録商標)製のメンブランフィルターで濾過して、塗布液とする。
Claims (13)
- 下記一般式(1)で表される縮合環化合物。
- 前記Y11及び前記Y12が、前記式(2a)で表される2価の基であり、前記Y13及び前記Y14が、前記式(2i)で表される2価の基である請求項1記載の縮合環化合物。
- 前記R11及び前記R12が、それぞれ独立に、炭素数1~10のアルキル基であるか又は炭素数6~20の置換基を有していてもよいアリール基である請求項1又は2記載の縮合環化合物。
- 下記一般式(3)で表される構造単位を有する重合体。
- 前記Y31及び前記Y32が、前記式(4a)で表される2価の基であり、前記Y33及び前記Y34が、前記式(4i)で表される2価の基であり、前記Y6が、前記式(7a)で表される2価の基である請求項6記載の重合体。
- 塩基及び金属錯体触媒の存在下で、下記一般式(8a)で表される化合物と、下記一般式(8b)で表される化合物とを反応させて、下記一般式(8c)で表される縮合環化合物を得る縮合環化合物の製造方法。
- 前記Y81及び前記Y82が、前記式(9a)で表される2価の基であり、前記Y83及び前記Y84が、前記式(9i)で表される2価の基である請求項8記載の縮合環化合物の製造方法。
- 前記X81及び前記X82の少なくとも一方が、ヨウ素原子である請求項8又は9記載の縮合環化合物の製造方法。
- 請求項1~3のいずれか一項に記載の縮合環化合物及び/又は請求項4~7のいずれか一項に記載の重合体を含む有機薄膜。
- 請求項11記載の有機薄膜を備える有機薄膜素子。
- 請求項11記載の有機薄膜を備える有機薄膜トランジスタ。
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US12/867,182 US8344095B2 (en) | 2008-02-13 | 2009-02-12 | Fused ring compound, method for producing the same, polymer, organic thin film containing the compound and/or polymer, and organic thin film device and organic thin film transistor each comprising the organic thin film |
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05110069A (ja) | 1991-10-14 | 1993-04-30 | Mitsubishi Electric Corp | 電界効果トランジスタの製造方法 |
JP2001508023A (ja) * | 1995-12-11 | 2001-06-19 | セファロン・インコーポレイテッド | タンパク質キナーゼcの阻害剤としての縮合イソインドロン |
JP2004006476A (ja) | 2002-05-31 | 2004-01-08 | Ricoh Co Ltd | 縦型有機トランジスタ |
JP2004339516A (ja) | 2003-05-16 | 2004-12-02 | Merck Patent Gmbh | フルオレンおよびアリール基を含むモノマー、オリゴマーおよびポリマー |
WO2005087780A1 (ja) * | 2004-03-10 | 2005-09-22 | Japan Science And Technology Agency | 含カルコゲン縮環多環式有機材料及びその製造方法 |
WO2007105386A1 (ja) * | 2006-03-10 | 2007-09-20 | Osaka University | 縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ |
JP2008010541A (ja) * | 2006-06-28 | 2008-01-17 | Konica Minolta Holdings Inc | 有機半導体材料、有機半導体膜、有機薄膜トランジスタ及び有機薄膜トランジスタの製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5843607A (en) * | 1997-10-02 | 1998-12-01 | Xerox Corporation | Indolocarbazole photoconductors |
US8217181B2 (en) * | 2004-12-30 | 2012-07-10 | E. I. Du Pont De Nemours And Company | Dihalogen indolocarbazole monomers and poly (indolocarbazoles) |
DE102005023437A1 (de) * | 2005-05-20 | 2006-11-30 | Merck Patent Gmbh | Verbindungen für organische elektronische Vorrichtungen |
JP2007019294A (ja) * | 2005-07-08 | 2007-01-25 | Konica Minolta Holdings Inc | 有機半導体材料、有機半導体膜、有機半導体素子及び有機薄膜トランジスタ |
JP5004071B2 (ja) | 2006-03-10 | 2012-08-22 | 住友化学株式会社 | 縮合環化合物の製造方法 |
US8049411B2 (en) * | 2008-06-05 | 2011-11-01 | Idemitsu Kosan Co., Ltd. | Material for organic electroluminescence device and organic electroluminescence device using the same |
US8057919B2 (en) * | 2008-06-05 | 2011-11-15 | Idemitsu Kosan Co., Ltd. | Material for organic electroluminescence device and organic electroluminescence device using the same |
-
2008
- 2008-02-13 JP JP2008032246A patent/JP2009190999A/ja active Pending
-
2009
- 2009-02-12 CN CN2009801049188A patent/CN101945878A/zh active Pending
- 2009-02-12 EP EP09709634A patent/EP2251342A4/en not_active Withdrawn
- 2009-02-12 WO PCT/JP2009/052319 patent/WO2009101982A1/ja active Application Filing
- 2009-02-12 KR KR1020107020207A patent/KR20100135741A/ko not_active Application Discontinuation
- 2009-02-12 US US12/867,182 patent/US8344095B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05110069A (ja) | 1991-10-14 | 1993-04-30 | Mitsubishi Electric Corp | 電界効果トランジスタの製造方法 |
JP2001508023A (ja) * | 1995-12-11 | 2001-06-19 | セファロン・インコーポレイテッド | タンパク質キナーゼcの阻害剤としての縮合イソインドロン |
JP2004006476A (ja) | 2002-05-31 | 2004-01-08 | Ricoh Co Ltd | 縦型有機トランジスタ |
JP2004339516A (ja) | 2003-05-16 | 2004-12-02 | Merck Patent Gmbh | フルオレンおよびアリール基を含むモノマー、オリゴマーおよびポリマー |
WO2005087780A1 (ja) * | 2004-03-10 | 2005-09-22 | Japan Science And Technology Agency | 含カルコゲン縮環多環式有機材料及びその製造方法 |
WO2007105386A1 (ja) * | 2006-03-10 | 2007-09-20 | Osaka University | 縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ |
JP2008010541A (ja) * | 2006-06-28 | 2008-01-17 | Konica Minolta Holdings Inc | 有機半導体材料、有機半導体膜、有機薄膜トランジスタ及び有機薄膜トランジスタの製造方法 |
Non-Patent Citations (6)
Title |
---|
DAHLMANN, U. ET AL.: "The diyne reaction of 3,3'-bis(phenylethynyl)-2,2'-bithiophene derivatives via rhodium complexes. A novel approach to condensed benzo[2,1-b:3,4-b'] dithiophenes", HELVETICA CHIMICA ACTA, vol. 80, no. 1, 1997, pages 111 - 120, XP008139779 * |
HUDKINS, R.L. ET AL.: "Synthesis and Mixed Lineage Kinase Activity of Pyrrolocarbazole and Isoindolone Analogs of (+)-K-252a", JOURNAL OF MEDICINAL CHEMISTRY, vol. 50, no. 3, 2007, pages 433 - 441, XP008139773 * |
See also references of EP2251342A4 |
U. DAHLMANN; R. NEIDLEIN, HELV. CHIM. ACTA., vol. 80, 1997, pages 111 - 120 |
Z. BAO ET AL., APPL. PHYS. LETT., vol. 69, 1996, pages 4108 |
ZANDER, M.: "Photoluminescence of thiophene benzologs, Zeitschrift fuer Naturforschung, Teil A: Physik, Physikalische Chemie", KOSMOPHYSIK, vol. 40A, no. 5, 1985, pages 497 - 502, XP008139783 * |
Cited By (8)
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---|---|---|---|---|
JP2015145370A (ja) * | 2008-06-05 | 2015-08-13 | 出光興産株式会社 | ハロゲン化合物、多環系化合物及びそれを用いた有機エレクトロルミネッセンス素子 |
CN102209720A (zh) * | 2008-09-08 | 2011-10-05 | 住友化学株式会社 | 新型化合物及有机半导体材料 |
JP2012503679A (ja) * | 2008-09-19 | 2012-02-09 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | ベンゾビス(シロロチオフェン)より誘導されるポリマー、および、有機半導体としてのそれらの使用 |
WO2011120951A1 (en) * | 2010-03-31 | 2011-10-06 | Basf Se | Annealed dithiophene copolymers |
CN102834945A (zh) * | 2010-03-31 | 2012-12-19 | 巴斯夫欧洲公司 | 稠合的二噻吩共聚物 |
US8729220B2 (en) | 2010-03-31 | 2014-05-20 | Basf Se | Annellated dithiophene copolymers |
JPWO2016147773A1 (ja) * | 2015-03-13 | 2017-12-28 | 富士フイルム株式会社 | 有機半導体膜形成用組成物、有機薄膜トランジスタ、電子ペーパー、および、ディスプレイデバイス |
US10510965B2 (en) | 2015-03-13 | 2019-12-17 | Fujifilm Corporation | Composition for forming organic semiconductor film, organic thin film transistor, electronic paper, and display device |
Also Published As
Publication number | Publication date |
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US8344095B2 (en) | 2013-01-01 |
CN101945878A (zh) | 2011-01-12 |
US20110213119A2 (en) | 2011-09-01 |
EP2251342A1 (en) | 2010-11-17 |
JP2009190999A (ja) | 2009-08-27 |
EP2251342A4 (en) | 2012-06-27 |
US20110065895A1 (en) | 2011-03-17 |
KR20100135741A (ko) | 2010-12-27 |
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