JP2008010541A - 有機半導体材料、有機半導体膜、有機薄膜トランジスタ及び有機薄膜トランジスタの製造方法 - Google Patents
有機半導体材料、有機半導体膜、有機薄膜トランジスタ及び有機薄膜トランジスタの製造方法 Download PDFInfo
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- JP2008010541A JP2008010541A JP2006177814A JP2006177814A JP2008010541A JP 2008010541 A JP2008010541 A JP 2008010541A JP 2006177814 A JP2006177814 A JP 2006177814A JP 2006177814 A JP2006177814 A JP 2006177814A JP 2008010541 A JP2008010541 A JP 2008010541A
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- Prior art keywords
- organic semiconductor
- group
- organic
- alkyl group
- semiconductor material
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 98
- 239000010408 film Substances 0.000 title claims abstract description 56
- 239000010409 thin film Substances 0.000 title claims abstract description 56
- 239000000463 material Substances 0.000 title claims abstract description 55
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 49
- 125000001424 substituent group Chemical group 0.000 claims abstract description 36
- 125000003118 aryl group Chemical group 0.000 claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 22
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 18
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 16
- 239000003960 organic solvent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 229910052717 sulfur Inorganic materials 0.000 claims description 9
- 229910005965 SO 2 Inorganic materials 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 3
- 238000000034 method Methods 0.000 abstract description 73
- 239000012298 atmosphere Substances 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 43
- -1 polythiophene Chemical class 0.000 description 29
- 239000010419 fine particle Substances 0.000 description 23
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- 239000002184 metal Substances 0.000 description 21
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- 239000010949 copper Substances 0.000 description 6
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- 239000004973 liquid crystal related substance Substances 0.000 description 4
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000005110 aryl thio group Chemical group 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
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- 238000007650 screen-printing Methods 0.000 description 3
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
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- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
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Abstract
【解決手段】少なくとも一つのベンゼン環とこれに隣接した少なくとも2つの環からなる芳香族複素環が縮合した少なくとも3環以上の芳香族縮合環を部分構造として有し、且つ該芳香族縮合環にアルキル基またはアルキル基を有する置換基を有する化合物であることを特徴とする有機半導体材料。
【選択図】なし
Description
3.前記有機半導体材料が下記一般式(2)で表される化合物であることを特徴とする前記2に記載の有機半導体材料。
4.前記一般式(2)で表される化合物が下記一般式(3)で表されることを特徴とする前記3に記載の有機半導体材料。
5.前記R1、R2の内少なくとも一つがアルキル基もしくはアルキル基を有する置換基を有するアリール基、またはアルキル基もしくはアルキル基を有する置換基を有する芳香族複素環基であることを特徴とする前記3または4に記載の有機半導体材料。
本発明の有機半導体材料は、少なくとも一つのベンゼン環とこれに隣接した少なくとも2つの環からなる芳香族複素環が縮合した少なくとも3環以上の芳香族縮合環を部分構造として有し、且つ該芳香族縮合環にアルキル基またはアルキル基を有する置換基を有する化合物であることを特徴とする。ここで、少なくとも一つのベンゼン環とこれに隣接した少なくとも2つの環からなる芳香族複素環が縮合した少なくとも3環以上の芳香族縮合環としては、具体的には前記一般式(1)で表される。
本発明に係る有機溶媒は、本発明の有機半導体材料を溶解して適切な濃度の溶液が調製できるものであれば格別の制限はないが、ジエチルエーテルやジイソプロピルエーテル等の鎖状エーテル系溶媒、テトラヒドロフランやジオキサンなどの環状エーテル系溶媒、アセトンやメチルエチルケトン等のケトン系溶媒、クロロホルムや1,2−ジクロロエタン等の脂肪族ハロゲン化炭化水素系溶媒、トルエン、o−ジクロロベンゼン、ニトロベンゼン、m−クレゾール等の芳香族系溶媒、ヘキサンやシクロヘキサン等の脂肪族炭化水素系溶媒、N−メチルピロリドン、2硫化炭素等を挙げることができる。
有機薄膜トランジスタは、支持体上に有機半導体チャネル(活性層)で連結されたソース電極とドレイン電極を有し、その上にゲート絶縁層を介してゲート電極を有するトップゲート型と、支持体上に先ずゲート電極を有し、ゲート絶縁層を介して有機半導体チャネルで連結されたソース電極とドレイン電極を有するボトムゲート型に大別される。本発明の有機薄膜トランジスタは、これらトップゲート型またボトムゲート型のいずれでもよく、またその形態を問わない。
《有機薄膜トランジスタ素子の作製》
図1(f)に記載の層構成を有する有機薄膜トランジスタ素子(以下、TFT素子と呼ぶ)1を作製した。
(トランジスタ特性)
以上のように作製したTFT素子1〜15は、pチャンネルのエンハンスメント型FETの動作特性を示した。それぞれのTFT素子について、I−V特性の飽和領域からキャリア移動度を求め、更にON/OFF比(ドレインバイアス−40Vとし、ゲートバイアス−50V及び0Vにしたときのドレイン電流値の比率)を求め、結果を表1に示した。また、25℃、湿度45%の条件下で1ヶ月放置したとき、及び50℃、湿度60%の条件下で1ヶ月放置したとき、それぞれのキャリア移動度及びON/OFF比についても評価し、表1に示した。
2 ソース電極
3 ドレイン電極
4 ゲート電極
5 絶縁層
6 支持体
7 ゲートバスライン
8 ソースバスライン
10 TFTシート
11 有機TFT
12 出力素子
13 蓄積コンデンサ
14 垂直駆動回路
15 水平駆動回路
Claims (13)
- 少なくとも一つのベンゼン環とこれに隣接した少なくとも2つの環からなる芳香族複素環が縮合した少なくとも3環以上の芳香族縮合環を部分構造として有し、且つ該芳香族縮合環にアルキル基またはアルキル基を有する置換基を有する化合物であることを特徴とする有機半導体材料。
- 前記有機半導体材料が下記一般式(2)で表される化合物であることを特徴とする請求項2に記載の有機半導体材料。
- 前記一般式(2)で表される化合物が下記一般式(3)で表されることを特徴とする請求項3に記載の有機半導体材料。
- 前記R1、R2の内少なくとも一つがアルキル基もしくはアルキル基を有する置換基を有するアリール基、またはアルキル基もしくはアルキル基を有する置換基を有する芳香族複素環基であることを特徴とする請求項3または4に記載の有機半導体材料。
- 前記アリール基がフェニル基であることを特徴とする請求項5に記載の有機半導体材料。
- 前記A1、A2の内少なくとも一つがアリール基または芳香族複素環基であることを特徴とする請求項3〜6のいずれか1項に記載の有機半導体材料。
- 前記アリール基がフェニル基であることを特徴とする請求項7に記載の有機半導体材料。
- 前記アルキル基を有する置換基がアルキル基を有するエチニル基であることを特徴とする請求項1〜8のいずれか1項に記載の有機半導体材料。
- 請求項1〜9のいずれか1項に記載の有機半導体材料を少なくとも一つ含むことを特徴とする有機半導体膜。
- 前記有機半導体膜が有機溶媒を用いた塗布法により形成された膜であることを特徴とする請求項10に記載の有機半導体膜。
- 基板上にゲート電極、ゲート絶縁層、有機半導体層、ソース電極及びドレイン電極を有する有機薄膜トランジスタにおいて、該有機半導体層が請求項10または11に記載の有機半導体膜からなる層であることを特徴とする有機薄膜トランジスタ。
- 基板上にゲート電極、ゲート絶縁層、有機半導体層、ソース電極及びドレイン電極を有する有機薄膜トランジスタの製造方法において、請求項12に記載の有機薄膜トランジスタの有機半導体層を形成する有機半導体膜が有機溶媒を用いた塗布法により形成されることを特徴とする有機薄膜トランジスタの製造方法。
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