WO2009102031A1 - 多環縮環化合物、多環縮環重合体及びこれらを含む有機薄膜 - Google Patents
多環縮環化合物、多環縮環重合体及びこれらを含む有機薄膜 Download PDFInfo
- Publication number
- WO2009102031A1 WO2009102031A1 PCT/JP2009/052429 JP2009052429W WO2009102031A1 WO 2009102031 A1 WO2009102031 A1 WO 2009102031A1 JP 2009052429 W JP2009052429 W JP 2009052429W WO 2009102031 A1 WO2009102031 A1 WO 2009102031A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- organic thin
- polycyclic fused
- thin film
- compound
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title claims description 159
- 150000001875 compounds Chemical class 0.000 title claims description 130
- 229920000642 polymer Polymers 0.000 title claims description 111
- 229920005567 polycyclic polymer Polymers 0.000 title abstract description 4
- -1 polycyclic compound Chemical class 0.000 title description 33
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 50
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 34
- 125000005843 halogen group Chemical group 0.000 claims abstract description 25
- 125000003118 aryl group Chemical group 0.000 claims abstract description 17
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 15
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 9
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 9
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 8
- 125000004417 unsaturated alkyl group Chemical group 0.000 claims abstract description 3
- 125000003367 polycyclic group Chemical group 0.000 claims description 228
- 125000004432 carbon atom Chemical group C* 0.000 claims description 49
- 125000001424 substituent group Chemical group 0.000 claims description 36
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 11
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 10
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 10
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 9
- 125000005227 alkyl sulfonate group Chemical group 0.000 claims description 8
- 125000005228 aryl sulfonate group Chemical group 0.000 claims description 8
- 239000004327 boric acid Substances 0.000 claims description 8
- 125000005619 boric acid group Chemical group 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 5
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 claims description 4
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- 239000002904 solvent Substances 0.000 abstract description 53
- 230000001747 exhibiting effect Effects 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 98
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 81
- 238000006243 chemical reaction Methods 0.000 description 50
- 238000000034 method Methods 0.000 description 47
- 239000000758 substrate Substances 0.000 description 44
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 39
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 36
- 239000000243 solution Substances 0.000 description 33
- 238000005160 1H NMR spectroscopy Methods 0.000 description 32
- 239000007787 solid Substances 0.000 description 29
- 230000015572 biosynthetic process Effects 0.000 description 25
- 238000003786 synthesis reaction Methods 0.000 description 23
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 18
- 239000010408 film Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 239000000463 material Substances 0.000 description 17
- 238000005259 measurement Methods 0.000 description 17
- 239000000047 product Substances 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 125000003545 alkoxy group Chemical group 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- 238000010898 silica gel chromatography Methods 0.000 description 11
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 10
- 239000012044 organic layer Substances 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 10
- 229910052938 sodium sulfate Inorganic materials 0.000 description 10
- 235000011152 sodium sulphate Nutrition 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 230000005669 field effect Effects 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 235000002597 Solanum melongena Nutrition 0.000 description 8
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 8
- 125000004122 cyclic group Chemical group 0.000 description 8
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 8
- 125000002252 acyl group Chemical group 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 229930195734 saturated hydrocarbon Natural products 0.000 description 7
- 125000001544 thienyl group Chemical group 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 108010021119 Trichosanthin Proteins 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 150000002430 hydrocarbons Chemical group 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 5
- 125000005605 benzo group Chemical group 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- FVIZARNDLVOMSU-UHFFFAOYSA-N ginsenoside K Natural products C1CC(C2(CCC3C(C)(C)C(O)CCC3(C)C2CC2O)C)(C)C2C1C(C)(CCC=C(C)C)OC1OC(CO)C(O)C(O)C1O FVIZARNDLVOMSU-UHFFFAOYSA-N 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 230000005525 hole transport Effects 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229940126062 Compound A Drugs 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 238000006069 Suzuki reaction reaction Methods 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 229910052751 metal Chemical class 0.000 description 4
- 239000002184 metal Chemical class 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 4
- 229920000123 polythiophene Polymers 0.000 description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 125000004076 pyridyl group Chemical group 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000002194 synthesizing effect Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 238000006619 Stille reaction Methods 0.000 description 3
- 125000003282 alkyl amino group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- JNGZXGGOCLZBFB-IVCQMTBJSA-N compound E Chemical compound N([C@@H](C)C(=O)N[C@@H]1C(N(C)C2=CC=CC=C2C(C=2C=CC=CC=2)=N1)=O)C(=O)CC1=CC(F)=CC(F)=C1 JNGZXGGOCLZBFB-IVCQMTBJSA-N 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- ZTQSADJAYQOCDD-UHFFFAOYSA-N ginsenoside-Rd2 Natural products C1CC(C2(CCC3C(C)(C)C(OC4C(C(O)C(O)C(CO)O4)O)CCC3(C)C2CC2O)C)(C)C2C1C(C)(CCC=C(C)C)OC(C(C(O)C1O)O)OC1COC1OCC(O)C(O)C1O ZTQSADJAYQOCDD-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 150000002391 heterocyclic compounds Chemical class 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 3
- 229920000767 polyaniline Polymers 0.000 description 3
- 229920005596 polymer binder Polymers 0.000 description 3
- 239000002491 polymer binding agent Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000006239 protecting group Chemical group 0.000 description 3
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000000967 suction filtration Methods 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 2
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 2
- MNDIARAMWBIKFW-UHFFFAOYSA-N 1-bromohexane Chemical compound CCCCCCBr MNDIARAMWBIKFW-UHFFFAOYSA-N 0.000 description 2
- YZWKKMVJZFACSU-UHFFFAOYSA-N 1-bromopentane Chemical compound CCCCCBr YZWKKMVJZFACSU-UHFFFAOYSA-N 0.000 description 2
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 2
- MLRVZFYXUZQSRU-UHFFFAOYSA-N 1-chlorohexane Chemical compound CCCCCCCl MLRVZFYXUZQSRU-UHFFFAOYSA-N 0.000 description 2
- SQCZQTSHSZLZIQ-UHFFFAOYSA-N 1-chloropentane Chemical compound CCCCCCl SQCZQTSHSZLZIQ-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- 0 Cc1c(-c2ccc(-c3ccc(*)[s]3)[s]2)[s]c2cc3cc(cc(c(*)c(C*)[s]4)c4c4)c4cc3cc12 Chemical compound Cc1c(-c2ccc(-c3ccc(*)[s]3)[s]2)[s]c2cc3cc(cc(c(*)c(C*)[s]4)c4c4)c4cc3cc12 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000003747 Grignard reaction Methods 0.000 description 2
- 238000007341 Heck reaction Methods 0.000 description 2
- 238000006546 Horner-Wadsworth-Emmons reaction Methods 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 238000006000 Knoevenagel condensation reaction Methods 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 101150003085 Pdcl gene Proteins 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 2
- 238000007239 Wittig reaction Methods 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 125000005236 alkanoylamino group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 125000001769 aryl amino group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- AQNQQHJNRPDOQV-UHFFFAOYSA-N bromocyclohexane Chemical compound BrC1CCCCC1 AQNQQHJNRPDOQV-UHFFFAOYSA-N 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 2
- 229910000024 caesium carbonate Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- CNXMDTWQWLGCPE-UHFFFAOYSA-N ditert-butyl-(2-phenylphenyl)phosphane Chemical group CC(C)(C)P(C(C)(C)C)C1=CC=CC=C1C1=CC=CC=C1 CNXMDTWQWLGCPE-UHFFFAOYSA-N 0.000 description 2
- HKNRNTYTYUWGLN-UHFFFAOYSA-N dithieno[3,2-a:2',3'-d]thiophene Chemical compound C1=CSC2=C1SC1=C2C=CS1 HKNRNTYTYUWGLN-UHFFFAOYSA-N 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 125000006575 electron-withdrawing group Chemical group 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000004428 fluoroalkoxy group Chemical group 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- 229910003472 fullerene Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000004896 high resolution mass spectrometry Methods 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- UNFUYWDGSFDHCW-UHFFFAOYSA-N monochlorocyclohexane Chemical compound ClC1CCCCC1 UNFUYWDGSFDHCW-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 2
- 125000005582 pentacene group Chemical group 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000011698 potassium fluoride Substances 0.000 description 2
- 235000003270 potassium fluoride Nutrition 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 125000005581 pyrene group Chemical group 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- URMVZUQDPPDABD-UHFFFAOYSA-N thieno[2,3-f][1]benzothiole Chemical compound C1=C2SC=CC2=CC2=C1C=CS2 URMVZUQDPPDABD-UHFFFAOYSA-N 0.000 description 2
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical compound S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 2
- 229930192474 thiophene Natural products 0.000 description 2
- UKTDFYOZPFNQOQ-UHFFFAOYSA-N tributyl(thiophen-2-yl)stannane Chemical compound CCCC[Sn](CCCC)(CCCC)C1=CC=CS1 UKTDFYOZPFNQOQ-UHFFFAOYSA-N 0.000 description 2
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- UGOMMVLRQDMAQQ-UHFFFAOYSA-N xphos Chemical compound CC(C)C1=CC(C(C)C)=CC(C(C)C)=C1C1=CC=CC=C1P(C1CCCCC1)C1CCCCC1 UGOMMVLRQDMAQQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- PDQRQJVPEFGVRK-UHFFFAOYSA-N 2,1,3-benzothiadiazole Chemical compound C1=CC=CC2=NSN=C21 PDQRQJVPEFGVRK-UHFFFAOYSA-N 0.000 description 1
- VFBJMPNFKOMEEW-UHFFFAOYSA-N 2,3-diphenylbut-2-enedinitrile Chemical group C=1C=CC=CC=1C(C#N)=C(C#N)C1=CC=CC=C1 VFBJMPNFKOMEEW-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DDTHMESPCBONDT-UHFFFAOYSA-N 4-(4-oxocyclohexa-2,5-dien-1-ylidene)cyclohexa-2,5-dien-1-one Chemical class C1=CC(=O)C=CC1=C1C=CC(=O)C=C1 DDTHMESPCBONDT-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Chemical class 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DCERHCFNWRGHLK-UHFFFAOYSA-N C[Si](C)C Chemical compound C[Si](C)C DCERHCFNWRGHLK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000292 Polyquinoline Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000005138 alkoxysulfonyl group Chemical group 0.000 description 1
- 125000005741 alkyl alkenyl group Chemical group 0.000 description 1
- 125000005115 alkyl carbamoyl group Chemical group 0.000 description 1
- 125000005153 alkyl sulfamoyl group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001642 boronic acid derivatives Chemical group 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- ZVDBUOGYYYNMQI-UHFFFAOYSA-N dodec-1-yne Chemical compound CCCCCCCCCCC#C ZVDBUOGYYYNMQI-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 150000008376 fluorenones Chemical class 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DCZNSJVFOQPSRV-UHFFFAOYSA-N n,n-diphenyl-4-[4-(n-phenylanilino)phenyl]aniline Chemical class C1=CC=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 DCZNSJVFOQPSRV-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- UMIPWJGWASORKV-UHFFFAOYSA-N oct-1-yne Chemical compound CCCCCCC#C UMIPWJGWASORKV-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical class C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 150000005839 radical cations Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005579 tetracene group Chemical group 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- HCHJCBXNKUSQOT-UHFFFAOYSA-N tributyl-[5-(5-tributylstannylthiophen-2-yl)thiophen-2-yl]stannane Chemical compound S1C([Sn](CCCC)(CCCC)CCCC)=CC=C1C1=CC=C([Sn](CCCC)(CCCC)CCCC)S1 HCHJCBXNKUSQOT-UHFFFAOYSA-N 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D495/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/491—Vertical transistors, e.g. vertical carbon nanotube field effect transistors [CNT-FETs]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/32—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
- C08G2261/322—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed
- C08G2261/3223—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed containing one or more sulfur atoms as the only heteroatom, e.g. thiophene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/32—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
- C08G2261/324—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed
- C08G2261/3243—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed containing one or more sulfur atoms as the only heteroatom, e.g. benzothiophene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/36—Oligomers, i.e. comprising up to 10 repeat units
- C08G2261/364—Oligomers, i.e. comprising up to 10 repeat units containing hetero atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/40—Polymerisation processes
- C08G2261/41—Organometallic coupling reactions
- C08G2261/412—Yamamoto reactions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/90—Applications
- C08G2261/92—TFT applications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to a polycyclic fused-ring compound, a polycyclic fused-ring polymer, an organic thin film containing these, an organic thin-film element including the organic thin-film, and an organic thin-film transistor.
- Thin films containing organic materials having charge (electron or hole) transport properties are expected to be applied to organic thin film elements such as organic thin film transistors, organic solar cells, and optical sensors.
- Organic p-type semiconductors that can form such thin films Various materials (showing hole transport properties) and organic n-type semiconductor materials (showing electron transport properties) have been studied.
- a compound having a thiophene ring such as oligothiophene and polythiophene, can take a stable radical cation state, and is expected to exhibit high hole transportability.
- oligothiophenes having a long chain length are expected to have higher hole transportability because the conjugation length becomes longer.
- numerator has few regularity of the molecular arrangement
- Patent Document 1 US Patent Application Publication No. 2004/186266
- the organic material having charge transporting properties as described above has an advantage that a thin film can be easily formed by dissolving and applying in a solvent or the like.
- it is necessary to have high charge transportability in the state of an organic thin film but the organic material having structurally high charge transportability as described above.
- high charge transportability cannot be obtained when an organic thin film is used. This is partly because it is difficult to form a homogeneous film when forming an organic thin film because conventional organic materials having a structure with a high charge transporting property have low solubility in a solvent. Conceivable.
- the present invention has been made in view of such circumstances, and has a structure capable of exhibiting high charge transportability, and has excellent solubility in a solvent and a polycyclic fused ring polymer and a polycyclic fused ring.
- the object is to provide a compound.
- the present invention also provides a polycyclic fused ring compound for obtaining a polycyclic fused ring polymer, an organic thin film containing the polycyclic fused ring polymer or the polycyclic fused ring compound, and an organic thin film element such as an organic thin film transistor provided with the organic thin film. The purpose is to provide.
- the polycyclic fused-ring polymer of the present invention includes a first structural unit represented by the following general formula (1) and a second structural unit represented by the following general formula (2). A plurality of at least one of them, or a combination of the first structural unit and the second structural unit.
- X 1 and X 2 each independently represent an oxygen atom, a sulfur atom or a selenium atom, and R 1 and R 2 each independently represent a halogen atom or an unsaturated alkyl group.
- R 3 and R 4 each independently represent a monovalent group which may have a substituent, and when there are a plurality of R 3 and R 4 , they may be the same or different.
- m, n, s, and t are each independently an integer of 0 to 2.
- Such a polycyclic fused ring polymer of the present invention has a high ⁇ -conjugated planarity by condensing a plurality of rings, and therefore has a structure that can exhibit high charge transportability (hole transportability) It has become. Moreover, since this polycyclic fused-ring polymer has a predetermined substituent as R ⁇ 1 > and R ⁇ 2 >, it also has the high solubility with respect to a solvent. Therefore, according to the polycyclic fused ring polymer of the present invention, a uniform thin film can be satisfactorily formed by coating, and a high charge transport property attributable to the structure can be sufficiently obtained.
- X 1 and X 2 are preferably sulfur atoms. With such a structure, higher charge transport properties can be obtained.
- the polycyclic fused-ring polymer of this invention has further the structural unit represented by following General formula (3), since higher charge transport property and the solubility with respect to a solvent will be obtained, it is preferable.
- Ar 1 represents a divalent aromatic hydrocarbon group which may have a substituent or a divalent heterocyclic group which may have a substituent.
- the group represented by Z 1 is particularly preferably a group represented by the following formula (ii). [In Formula (4), R 5 and R 6 each independently represent a hydrogen atom, a halogen atom or a monovalent group, and R 5 and R 6 may be bonded to each other to form a ring. .
- Z 3 represents the following formulas (i), (ii), (iii), (iv), (v), (vi), (vii), (viii) and (ix) (hereinafter, “(i) to ( ix) "and any one of the groups represented by
- R 7 , R 8 , R 9 and R 10 each independently represent a hydrogen atom, a halogen atom or a monovalent group, and R 7 and R 8 may be bonded to each other to form a ring. Good.
- the group represented by the formula (viii) may be horizontally reversed.
- the polycyclic fused ring compound of the present invention is a compound suitable for obtaining the polycyclic fused ring polymer of the present invention, and is represented by the following general formula (5) or the following general formula (6).
- X 1 and X 2 each independently represent an oxygen atom, a sulfur atom, or a selenium atom, and R 1 and R 2 each independently represent a halogen atom or an unsaturated group.
- R 3 and R 4 each independently represent a monovalent group which may have a substituent, and when there are a plurality of R 3 and R 4 , they may be the same or different.
- Y 1 and Y 2 are each independently a halogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl sulfonate group, an aryl sulfonate group, an arylalkyl sulfonate group, an alkylstannyl group, an arylstannyl group, an arylalkylstannyl group, A boric acid ester residue, a sulfonium methyl group, a phosphonium methyl group, a phosphonate methyl group, a monohalogenated methyl group, a boric acid residue, a formyl group, or a vinyl group is shown.
- m, n, s, and t are each independently an integer of 0 to 2.
- X 1 and X 2 each independently represent an oxygen atom, a sulfur atom, or a selenium atom
- R 1 and R 2 each independently represent 8 to 20 carbon atoms.
- a linear, branched or cyclic alkyl group, a non-alkyl group including a linear, branched or cyclic alkyl group, an aryl group having 6 to 60 carbon atoms which may have a substituent, or a substituted group A monovalent heterocyclic group having 4 to 60 carbon atoms which may have a group.
- R 3 and R 4 each independently represent a monovalent group which may have a substituent, and when there are a plurality of R 3 and R 4 , they may be the same or different.
- Y 5 and Y 6 each independently have a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 60 carbon atoms, or a substituent.
- Monovalent heterocyclic group having 4 to 60 carbon atoms, carboxyl group, alkoxycarbonyl group, alkylsulfonate group, arylsulfonate group, arylalkylsulfonate group, alkylstannyl group, arylstannyl group, arylalkylstannyl Group, boric acid ester residue, sulfonium methyl group, phosphonium methyl group, phosphonate methyl group, monohalogenated methyl group, boric acid residue, formyl group, or vinyl group.
- Ar 2 and Ar 3 each independently represent a divalent aromatic hydrocarbon group which may have a substituent or a divalent heterocyclic group which may have a substituent.
- m, n, s, and t are each independently an integer of 0 to 2
- u and v are each independently 0 or 1 and u + v is 1 or more.
- the polycyclic fused ring polymer of the present invention can be easily formed by polymerization. Therefore, it is extremely useful as a raw material compound of the polycyclic fused-ring polymer of the present invention.
- the polycyclic fused ring compound represented by the general formula (7) or (8) has a structure with high charge transporting property and is excellent in solubility in a solvent. As such, it is useful as a charge transport material.
- X 1 and X 2 are more preferably sulfur atoms. Thereby, the charge transport property of the polycyclic fused-ring polymer is further improved.
- the present invention also provides an organic thin film containing the polycyclic fused ring polymer or polycyclic fused ring compound of the present invention. Since such an organic thin film is obtained using the polycyclic fused ring polymer or polycyclic fused ring compound of the present invention, it is a substantially homogeneous film, and the polycyclic fused ring polymer or polycyclic fused ring compound is The inherent high charge transport property can be fully exhibited.
- this invention provides an organic thin film element provided with the organic thin film of the said invention, especially an organic thin-film transistor. Since these organic thin film elements and organic thin film transistors include an organic thin film having a high charge transport property, they can have excellent characteristics as elements.
- a polycyclic fused ring polymer and a polycyclic fused ring compound having a structure capable of exhibiting high charge transportability and excellent in solubility in a solvent are also provided.
- an organic thin film element such as an organic thin film comprising a polycyclic fused ring compound, a polycyclic fused ring polymer or a polycyclic fused ring compound for obtaining a polycyclic fused ring polymer, and an organic thin film transistor provided with the organic thin film. It becomes possible.
- the polycyclic fused ring polymer includes at least one of the first structural unit represented by the general formula (1) and the second structural unit represented by the general formula (2). It has a plurality or a combination of the first structural unit and the second structural unit. That is, as the polycyclic fused ring polymer of the present embodiment, at least one having a plurality of first structural units, one having a plurality of second structural units, and first and second structural units, respectively. Including one by one.
- the “structural unit” of the polycyclic fused ring polymer means a structural unit constituting the main chain of the polymer.
- the “polymer” means a polymer having at least two such “structural units”, and includes both those usually classified into oligomers and polymers.
- the polycyclic fused-ring polymer preferably has 30 mol% or more of the first structural unit and / or second structural unit, more preferably 50 to 95 mol%.
- X 1 and X 2 in the general formulas (1) and (2) are each independently an oxygen atom, a sulfur atom or a selenium atom, preferably a sulfur atom. Further, from the viewpoint of facilitating the production of the polycyclic fused-ring polymer, X 1 and X 2 are preferably the same atom, and if both are sulfur atoms, a particularly high charge transport property is obtained, which is further preferable. .
- R 1 and R 2 from the viewpoint of obtaining high solubility in a solvent, a linear, branched or cyclic alkyl group having 8 to 20 carbon atoms, and a linear, branched or cyclic group.
- a non-alkyl group containing an alkyl group is preferable, a linear, branched or cyclic alkyl group having 8 to 20 carbon atoms is more preferable, and a linear alkyl group having 8 to 20 carbon atoms is particularly preferable.
- R 1 and R 2 are more preferably the same group.
- Examples of the alkyl group represented by R 1 and R 2 include octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group and the like.
- the non-alkyl group containing an alkyl group means an alkyl group and a group containing an atom other than a carbon atom, and an alkyl group and a group containing an unsaturated bond.
- the alkyl group contained in these alkyl groups and non-alkyl groups is more preferably an alkyl group having 8 to 16 carbon atoms, and still more preferably an alkyl group having 8 to 12 carbon atoms.
- Examples of the aryl group having 6 to 60 carbon atoms include a phenyl group, a phenyl group having an alkoxy group having 1 to 12 carbon atoms, a phenyl group having an alkyl group having 1 to 12 carbon atoms, a 1-naphthyl group, and a 2-naphthyl group. Can be illustrated. Among these, an aryl group having 6 to 20 carbon atoms is preferable, and a phenyl group having an alkoxy group having 1 to 12 carbon atoms and a phenyl group having an alkyl group having 1 to 12 carbon atoms are more preferable.
- Examples of the monovalent heterocyclic group having 3 to 60 carbon atoms include a thienyl group, a thienyl group having an alkyl group having 1 to 12 carbon atoms, a pyrrolyl group, a furyl group, a pyridyl group, and an alkyl group having 1 to 12 carbon atoms.
- a pyridyl group etc. are mentioned.
- a monovalent heterocyclic group having 3 to 20 carbon atoms is preferable, and a thienyl group, a thienyl group having an alkyl group having 1 to 12 carbon atoms, a pyridyl group, and a pyridyl group having an alkyl group having 1 to 12 carbon atoms. Groups are more preferred.
- the monovalent heterocyclic group means a group in which at least one atom constituting the ring is a heteroatom in an organic group having a cyclic structure.
- s and t are 1 or 2 from a viewpoint of improving the solubility to a solvent.
- the monovalent group represented by R 3 and R 4 include an alkyl group, an alkoxy group, a fluoroalkyl group, a fluoroalkoxy group, an aryl group, an arylamino group, and a monovalent heterocyclic group.
- an alkyl group, an alkoxy group, a fluoroalkyl group, a fluoroalkoxy group, an aryl group, and an arylamino group are preferable, and an alkyl group and an aryl group are more preferable.
- R 3 and R 4 are contained in the molecule.
- the plurality of R 3 and R 4 are the same or different. May be.
- R 3 together, R 4 together, or a combination of R 3 and R 4 are preferably the same group.
- n and n are each independently an integer of 0 to 2, but from the viewpoint of increasing the charge mobility by the polycyclic fused-ring polymer, m + n is 0. , 1, 2 or 4 is preferable, and m + n is particularly preferably 0.
- the polycyclic fused ring polymer of a preferred embodiment is: It is preferable to have a structural unit represented by the general formula (3).
- the third structural unit represented by the general formula (3) in addition to the solubility in the solvent, the range in which the mechanical, thermal, or electronic properties can be adjusted to a suitable level is widened. .
- the content ratio of the first structural unit and / or the second structural unit and the third structural unit is 10 to 1000 mol of the latter with respect to 100 mol of the former. More preferably, the latter is 25 to 400 moles with respect to 100 moles of the former, and further preferably 50 to 200 moles with respect to 100 moles of the former.
- Ar 1 is a divalent aromatic hydrocarbon group which may have a substituent or a divalent heterocyclic group which may have a substituent.
- the divalent aromatic hydrocarbon group means a remaining atomic group obtained by removing two hydrogen atoms from a benzene ring or a polycyclic condensed ring, preferably having 6 to 60 carbon atoms, More preferably, it is 20.
- the polycyclic condensed ring include a naphthalene ring, anthracene ring, tetracene ring, pentacene ring, pyrene ring, perylene ring, and fluorene ring.
- divalent aromatic hydrocarbon group or divalent heterocyclic group a group consisting of the remaining atomic group obtained by removing two hydrogen atoms from a benzene ring, pentacene ring, pyrene ring or fluorene ring is particularly preferred.
- These divalent aromatic hydrocarbon groups may have a substituent.
- the carbon number of the preferable divalent aromatic hydrocarbon group described above does not include the carbon number of the substituent.
- substituent include a halogen atom, a saturated or unsaturated hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group.
- the divalent heterocyclic group refers to the remaining atomic group obtained by removing two hydrogen atoms from a heterocyclic compound, and preferably has 3 to 60 carbon atoms, more preferably 3 to 20 carbon atoms.
- the heterocyclic compound is an organic compound having a cyclic structure, in which the atoms constituting the ring are not only carbon atoms, but also oxygen atoms, sulfur atoms, nitrogen atoms, phosphorus atoms, boron atoms, silicon atoms, etc. In the ring.
- heterocyclic compound examples include thiophene, thienothiophene, dithienothiophene, a compound in which four or five thiophene rings are condensed, pyrrole, pyridine, pyrimidine, pyrazine, and triazine, and thiophene, thienothiophene, and dithienothiophene. preferable.
- the divalent heterocyclic group may also have a substituent, but the carbon number of the above-described divalent heterocyclic group does not include the carbon number of the substituent.
- the substituent include a halogen atom, a saturated or unsaturated hydrocarbon group, an aryl group, an alkoxy group, an aryloxy group, a monovalent heterocyclic group, an amino group, a nitro group, and a cyano group.
- a group represented by the general formula (4) is particularly preferable. If the polycyclic fused ring polymer contains such a group in the structural unit, it becomes easier to obtain better solubility in a solvent and charge transportability.
- Z 1 in the general formula (4) is preferably any one of the groups represented by the above formulas (i), (ii), (iii), (vii), (viii), (ix), Any of the groups represented by the formulas (ii) and (vii) is more preferable, and the group represented by the formula (ii) is particularly preferable.
- Z 1 is a group represented by the above formula (i), (ii) or (ix)
- the group represented by the above general formula (4) has a thiophene ring, furan ring or pyrrole ring structure, respectively.
- these rings, particularly thiophene rings exhibit suitable electrical properties, and thus can exhibit various electrical characteristics.
- R 5 to R 10 are each independently a hydrogen atom, a halogen atom or a monovalent group, but when R 5 and R 6 or R 7 and R 8 are a monovalent group, These may be bonded to each other to form a ring.
- the monovalent group represented by R 5 to R 10 is preferably a group having a linear or branched low molecular chain and a monovalent cyclic group.
- the monovalent cyclic group may be either a monocyclic ring or a condensed ring, may be either a hydrocarbon ring or a heterocyclic ring, may be either a saturated ring or an unsaturated ring, and may further have a substituent. Good.
- These monovalent groups may be electron donating groups or electron withdrawing groups.
- examples of the monovalent group of R 5 to R 10 include the above low molecular chain group having 1 to 20 carbon atoms in the low molecular chain and the above cyclic group having 3 to 60 constituent atoms in the cyclic group. Groups are preferred.
- saturated or unsaturated hydrocarbon group hydroxy group, alkoxy group, alkanoyloxy group, amino group, oxyamino group, alkylamino group, dialkylamino group, alkanoylamino group, cyano group, nitro group, sulfo group
- the saturated hydrocarbon group includes methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, or tert-butyl. Groups are preferred.
- the alkyl group in a group containing an alkyl group in the structure is preferably the same group as the above alkyl group.
- Examples of the unsaturated hydrocarbon group include a vinyl group, a 1-propenyl group, an allyl group, a propargyl group, an isopropenyl group, a 1-butenyl group, and a 2-butenyl group, and a vinyl group is preferable.
- alkanoyl group examples include formyl group, acetyl group, propionyl group, isobutyryl group, valeryl group, and isovaleryl group.
- the C 1 alkanoyl group means a formyl group.
- Preferable alkanoyl groups include formyl group and acetyl group.
- examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- the terminal group of the polycyclic fused ring polymer includes a hydrogen atom, a fluorine atom, an alkyl group, an alkoxy group, an acyl group, an aminoketo group, an aryl group, a monovalent heterocyclic group (a hydrogen atom bonded to these groups) Or a group having an ⁇ -fluoroketone structure, other electron donating groups, electron withdrawing groups, and the like.
- an alkyl group, an alkoxy group, an aryl group, and a monovalent heterocyclic group are preferable.
- the terminal group preferably has a conjugated bond continuous with the conjugated structure of the main chain. Examples of such a terminal group include an aryl group bonded to the main chain through a carbon-carbon bond and a monovalent heterocyclic group.
- examples of the terminal group of the polycyclic condensed ring polymer include a polymerization active group.
- the polycyclic fused-ring polymer can also be used as a precursor for obtaining a higher molecular weight polycyclic fused-ring polymer.
- the polycyclic fused-ring polymer preferably has two polymerization active groups in the molecule.
- Polymerization active groups include halogen atoms, carboxyl groups, alkoxycarbonyl groups, alkyl sulfonate groups, aryl sulfonate groups, aryl alkyl sulfonate groups, alkylstannyl groups, arylstannyl groups, arylalkylstannyl groups, and boric acid ester residues.
- the borate ester residue is a monovalent group having a structure in which one of the bonds of a boron atom in the borate ester is replaced with a bond for substitution, and the following formulas (100a) to (100) Group represented by 100d).
- a polymerization active group remains as a terminal group, the properties and durability when an organic thin film element is formed may be reduced.
- the active group may be protected with a stable group.
- polycyclic fused ring polymer those having a structure represented by the following general formulas (20) to (30) are particularly preferable because they can achieve both higher charge mobility and excellent solubility in a solvent. It is.
- R 10 and R 11 each independently represent the above-described terminal group, preferably an alkyl group, an alkoxy group, an aryl group, or a monovalent heterocyclic group.
- P represents an integer of 2 or more
- p and q can be suitably selected according to the formation method of the organic thin film using the polycyclic fused-ring polymer. That is, if the polycyclic fused-ring polymer has sublimability, it can be formed into an organic thin film using a vapor phase growth method such as a vacuum evaporation method. 10 is preferable, and 2 to 5 is more preferable.
- p and q are preferably 3 to 500, more preferably 6 to 300, and further preferably 20 to 200. preferable.
- the polycyclic fused-ring polymer described above has a polystyrene-equivalent number average molecular weight of 1 ⁇ 10 3 to 1 ⁇ 10 8 from the viewpoint of enhancing the uniformity of the film when an organic thin film is formed by coating. It is preferably 1 ⁇ 10 3 to 1 ⁇ 10 6 , more preferably 5 ⁇ 10 3 to 1 ⁇ 10 5 .
- the polycyclic fused ring polymer of the present embodiment includes a polycyclic fused ring compound for forming the first structural unit and / or the second structural unit, and a raw material for forming the third structural unit. It can be obtained by reacting with a monomer to form a polymer.
- the polycyclic fused ring compound for forming the first structural unit As the polycyclic fused ring compound for forming the first structural unit, the polycyclic fused ring compound represented by the above general formula (5), and Y 5 and Y 6 in the above general formula (7) are polymerization activities. A polycyclic fused ring compound which is a group is preferred.
- the polycyclic fused ring compound for forming the second structural unit As the polycyclic fused ring compound for forming the second structural unit, the polycyclic fused ring compound represented by the general formula (6), or Y 5 and Y 6 in the general formula (8) are A polycyclic fused ring compound which is a polymerization active group is preferred.
- a compound represented by the following general formula (31) is suitable as the monomer compound for forming the third structural unit.
- these polycyclic fused-ring compounds and monomer compounds you may use in combination of multiple types, respectively.
- Y 1 and Y 2 are each independently a halogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl sulfonate group, an aryl sulfonate group, an arylalkyl sulfonate group, an alkylstannyl group, an arylstannyl group, an arylalkylstannyl group, Examples thereof include a boric acid ester residue, a sulfonium methyl group, a phosphonium methyl group, a phosphonate methyl group, a monohalogenated methyl group, a boric acid residue, a formyl group, and a vinyl group.
- Y 5 and Y 6 each independently have a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 60 carbon atoms, or a substituent.
- Monovalent heterocyclic group having 4 to 60 carbon atoms, carboxyl group, alkoxycarbonyl group, alkylsulfonate group, arylsulfonate group, arylalkylsulfonate group, alkylstannyl group, arylstannyl group, arylalkylstannyl Group, boric acid ester residue, sulfonium methyl group, phosphonium methyl group, phosphonate methyl group, monohalogenated methyl group, boric acid residue, formyl group, or vinyl group.
- the alkyl group may be linear, branched or cyclic.
- the Y 2 and Y 3 independently, include the same groups as above Y 1 and Y 2.
- Ar 2 and Ar 3 are each independently a divalent aromatic hydrocarbon group or substituent which may have a substituent.
- the divalent heterocyclic group which may have is shown.
- at least one of Ar 2 and Ar 3 is preferably a divalent heterocyclic group which may have a substituent. In this case, the effect that it is easy to take a ⁇ - ⁇ stack structure is obtained by the interaction of heteroatoms between molecules.
- Y 1, Y 2, Y 3, Y 4, Y 5 and Y 6 is preferably a polymerization active group as described above.
- a halogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl sulfonate group, an aryl sulfonate group, an arylalkyl sulfonate group, an alkylstannyl group, a boric acid ester residue, and a boric acid residue are preferable.
- the polycyclic fused ring polymer can be synthesized by repeatedly generating a reaction that generates a bond between the polycyclic fused ring compound and the monomer compound or between the polycyclic fused ring compounds.
- a reaction for forming a bond between these compounds Wittig reaction, Heck reaction, Horner-Wadsworth-Emmons reaction, Knoevenagel reaction, Suzuki coupling reaction, Grindard reaction, Stille reaction, or polymerization using Ni (0) catalyst. Reaction etc. are mentioned.
- a reaction by decomposition of an intermediate compound having a suitable leaving group can be applied, and a method of synthesizing poly (p-phenylene vinylene) from an intermediate compound having a sulfonium group can be mentioned.
- the combination of groups represented by Y 1 , Y 2 , Y 3 , Y 4 , Y 5 and Y 6 can be appropriately selected according to the target reaction.
- a method using a Wittig reaction a method using a Heck reaction, a method using a Horner-Wadsworth-Emmons reaction, a method using a Knoevenagel reaction, and a method using a Suzuki coupling reaction
- a method using a Grignard reaction, a method using a Stille reaction, or a method using a Ni (0) catalyst is preferable because the structure of the polycyclic fused-ring polymer can be easily controlled.
- a method using a Suzuki coupling reaction a method using a Grignard reaction, a method using a Stille reaction, and a method using a Ni (0) catalyst are more preferable because the raw materials are easily available and the reaction operation is simple.
- the synthetic reaction of the polycyclic fused ring polymer is, for example, a raw material polycyclic fused ring compound or monomer compound dissolved in an organic solvent as necessary, and then in the presence of an alkali or a suitable catalyst as necessary.
- the reaction can be carried out at a temperature not lower than the melting point of the organic solvent and not higher than the boiling point.
- reaction although depending on the compound used and the type of reaction, it is generally preferable to use an organic solvent that has been sufficiently deoxygenated in order to suppress side reactions. It is also preferable to use a suitable solvent (however, this is not the case in the case of a reaction in a two-phase system with water such as the Suzuki coupling reaction).
- a suitable solvent although, this is not the case in the case of a reaction in a two-phase system with water such as the Suzuki coupling reaction.
- the reaction is preferably allowed to proceed under an inert atmosphere.
- Solvents used in the reaction include saturated hydrocarbons such as pentane, hexane, heptane, octane and cyclohexane, unsaturated hydrocarbons such as benzene, toluene, ethylbenzene and xylene, carbon tetrachloride, chloroform, dichloromethane, chlorobutane, bromobutane and chloropentane.
- Halogenated saturated hydrocarbons such as bromopentane, chlorohexane, bromohexane, chlorocyclohexane and bromocyclohexane, halogenated unsaturated hydrocarbons such as chlorobenzene, dichlorobenzene and trichlorobenzene, methanol, ethanol, propanol, isopropanol, butanol, t -Alcohols such as butyl alcohol, carboxylic acids such as formic acid, acetic acid, propionic acid, dimethyl ether, diethyl ether, methyl-t-butyl ether, tetra Dorofuran, tetrahydropyran, dioxane and the like, hydrochloric acid, hydrobromic acid, hydrofluoric acid, sulfuric acid, and inorganic acids such as nitric acid is.
- the said solvent may be used individually by 1 type, and may use 2 or more types together.
- the synthetic reaction of a polycyclic fused-ring polymer can be efficiently produced by adding the alkali mentioned above and a suitable catalyst suitably. What is necessary is just to select an alkali and a catalyst according to reaction to produce.
- the alkali or catalyst those that are sufficiently soluble in the solvent used for the reaction are particularly preferred.
- the polycyclic fused ring compound and the monomer compound before the reaction are preferably reacted after being purified by a method such as distillation, sublimation purification, recrystallization and the like.
- purification treatment such as reprecipitation purification and fractionation by chromatography.
- the polycyclic fused-ring polymer can be obtained by a usual post-treatment such as quenching the solution after the reaction with, for example, water, extracting with an organic solvent, and further distilling off the solvent. Isolation and purification of the polycyclic fused-ring polymer can be performed by a method such as fractionation by chromatography or recrystallization.
- the polycyclic condensed ring compound used for the production of the above-mentioned condensed polycyclic polymer can be obtained, for example, by a reaction represented by the following scheme.
- a process for producing the polycyclic fused ring compound represented by the general formula (5) is shown.
- m and n are as defined above
- X is as defined above for X 1 and X 2
- Y is as defined above for Y 1 and Y 2
- the group containing R is the same as the alkyl group shown as R 1 and R 2 described above.
- a polycyclic fused-ring compound is suitably obtained by the following methods, you may manufacture it by another method.
- the functional group is converted into a functional group (protecting group) that is inactive in the subsequent reaction, the reaction A step of removing the protecting group may be further performed after the completion of the step.
- the protecting group can be appropriately selected depending on the functional group to be protected and the reaction used. For example, trimethylsilyl (TMS), triethylsilyl (TES), tert-butyldimethylsilyl can be used for protecting active hydrogen. (TBS or TBDMS), triisopropylsilyl (TIPS), tert-butyldiphenylsilyl (TBDPS) and the like can be applied.
- an appropriate solvent can be used as necessary, as shown in the formula.
- the solvent is preferably one that does not inhibit the target reaction as much as possible.
- Solvents include aliphatic hydrocarbons such as hexane, aromatic hydrocarbons such as benzene and toluene, nitriles such as acetonitrile, ethers such as diethyl ether, tetrahydrofuran and 1,2-dimethoxyethane, dichloromethane, 1,2-dichloroethane, Examples include halogenated solvents such as carbon tetrachloride, and dichloromethane is preferred. These may be used alone or in combination of two or more.
- reaction conditions and reaction reagents used in the synthesis of the above-mentioned polycyclic fused ring polymer and the polycyclic fused ring compound that is a raw material thereof can be appropriately selected and used other than those exemplified above. is there.
- the above-mentioned polycyclic fused ring compound itself may have a high charge transport property, it may be used as it is as a charge transport material.
- the compounds represented by the general formulas (7) and (8) tend to exhibit particularly high charge transport properties.
- examples of a compound suitable as a charge transporting material include those having structures represented by the following general formulas (32) to (39).
- the same reference numerals as those described above have the same meaning as described above.
- R 12 and R 13 each independently represent a halogen atom, an alkyl group, an alkoxy group, an aryl group or a monovalent heterocyclic group, and among them, an alkyl group is preferable.
- the organic thin film includes the polycyclic fused ring polymer or polycyclic fused ring compound of the above-described embodiment and has a configuration having a film shape.
- the suitable thickness of the organic thin film varies depending on the element to which the organic thin film is applied, but is usually in the range of 1 nm to 100 ⁇ m, preferably 2 nm to 1000 nm, more preferably 5 nm to 500 nm, and more preferably 20 nm to More preferably, it is 200 nm.
- the organic thin film may contain one kind of the polycyclic fused ring polymer or the polycyclic fused ring compound of the present invention alone, or two or more kinds of the polycyclic fused ring polymer or the polycyclic fused ring compound. May be included.
- a low molecular compound or polymer compound having electron transport property or hole transport property is mixed in addition to the polycyclic fused ring polymer or the polycyclic fused ring compound. Can also be used.
- the organic thin film contains a component other than the polycyclic fused ring polymer or the polycyclic fused ring compound
- the polycyclic fused ring polymer or the polycyclic fused ring compound is contained in an amount of 30% by mass or more, and 50% by mass or more. More preferably.
- the content of the polycyclic fused ring polymer or the polycyclic fused ring compound is less than 30% by mass, good charge mobility tends to be difficult to obtain.
- Examples of the compound having a hole transporting property include pyrazoline derivatives, arylamine derivatives, stilbene derivatives, triphenyldiamine derivatives, oligothiophene and derivatives thereof, polyvinylcarbazole and derivatives thereof, polysilane and derivatives thereof, and aromatic amines in side chains or main chains.
- Examples include polysiloxane derivatives having polyaniline, polyaniline and derivatives thereof, polythiophene and derivatives thereof, polypyrrole and derivatives thereof, polyphenylene vinylene and derivatives thereof, polythienylene vinylene and derivatives thereof, and the like.
- the compounds having electron transport properties include oxadiazole derivatives, anthraquinodimethane and its derivatives, benzoquinone and its derivatives, naphthoquinone and its derivatives, anthraquinone and its derivatives, tetracyanoanthraquinodimethane and its derivatives, fluorenone derivatives, diphenyldicyanoethylene and derivatives thereof, diphenoquinone derivatives, 8-hydroxyquinoline and metal complexes of derivatives thereof, polyquinoline and derivatives thereof, polyquinoxaline and derivatives thereof, polyfluorene and a derivative thereof, and fullerenes such as C 60 and derivatives thereof Can be illustrated.
- the organic thin film may further contain other components in order to improve its properties.
- other components include charge generation materials.
- the organic thin film contains a charge generation material, the thin film absorbs light to generate charges, which is suitable for applications such as an optical sensor that requires charge generation by light absorption.
- charge generation materials include azo compounds and derivatives thereof, diazo compounds and derivatives thereof, metal-free phthalocyanine compounds and derivatives thereof, metal phthalocyanine compounds and derivatives thereof, perylene compounds and derivatives thereof, polycyclic quinone compounds and derivatives thereof, squarylium compounds. and its derivatives, azulenium compounds and their derivatives, thiapyrylium compounds and their derivatives, fullerenes such as C 60 and derivatives thereof.
- the organic thin film may further contain materials necessary for developing various functions. Examples thereof include a sensitizer for sensitizing the function of generating charges by absorbed light, a stabilizer for increasing stability, a UV absorber for absorbing UV light, and the like.
- the organic thin film may further contain a polymer compound material as a polymer binder from the viewpoint of increasing its mechanical strength.
- a polymer binder those that do not excessively reduce the charge transportability are preferable, and those that do not excessively absorb visible light are preferable.
- Polymer binders include poly (N-vinylcarbazole), polyaniline and derivatives thereof, polythiophene and derivatives thereof, poly (p-phenylene vinylene) and derivatives thereof, poly (2,5-thienylene vinylene) and derivatives thereof, polycarbonate , Polyacrylate, polymethyl acrylate, polymethyl methacrylate, polystyrene, polyvinyl chloride, polysiloxane and the like.
- the organic thin film mentioned above can be manufactured by the following methods, for example.
- the organic thin film is obtained by applying a solution obtained by dissolving a polycyclic fused ring polymer or a polycyclic fused ring compound and other components described above in a solvent as necessary onto a predetermined base material, It can be formed by removing by volatilization.
- an organic thin film can also be formed by methods, such as a vacuum evaporation method.
- the solvent is preferably a solvent capable of dissolving or uniformly dispersing a polycyclic condensed ring polymer or a polycyclic condensed ring compound or other components.
- solvents include aromatic hydrocarbon solvents such as toluene, xylene, mesitylene, tetralin, decalin, n-butylbenzene, carbon tetrachloride, chloroform, dichloromethane, dichloroethane, chlorobutane, bromobutane, chloropentane, bromopentane, Halogenated saturated hydrocarbon solvents such as chlorohexane, bromohexane, chlorocyclohexane and bromocyclohexane, halogenated aromatic hydrocarbon solvents such as chlorobenzene, dichlorobenzene and trichlorobenzene, ether solvents such as tetrahydrofuran and tetrahydropyran, etc. Can be illustrated.
- the solution can be applied by spin coating, casting, micro gravure coating, gravure coating, bar coating, roll coating, wire bar coating, dip coating, spray coating, screen printing, flexographic printing.
- examples thereof include a printing method, an offset printing method, an ink jet printing method, and a dispenser printing method. Of these, spin coating, flexographic printing, ink jet printing, and dispenser printing are preferred.
- the organic thin film may be further subjected to a step of orienting the polycyclic fused ring polymer or polycyclic fused ring compound in the organic thin film depending on the use.
- a step of orienting the polycyclic fused ring polymer or polycyclic fused ring compound in the organic thin film depending on the use.
- the main chain and side chain of the polycyclic fused ring polymer or polycyclic fused ring compound in the organic thin film are aligned in a certain direction, and the charge transport property of the organic thin film is further enhanced.
- an alignment method of the organic thin film a method usually used for alignment of liquid crystal or the like can be applied. Specifically, a rubbing method, a photo-alignment method, a sharing method (shear stress application method), a pulling coating method and the like are preferable because they are simple and useful, and a rubbing method and a sharing method are more preferable.
- the organic thin film of the embodiment described above includes the polycyclic fused ring polymer or the polycyclic fused ring compound of the above embodiment, the organic thin film has excellent charge (electron or hole) transportability. Therefore, this organic thin film can efficiently transport electrons or holes injected from electrodes or the like, or electric charges generated by light absorption, etc., and can be used for various electric elements (organic thin film elements) using the organic thin film. Can be applied.
- organic thin film for these organic thin film elements when it is made to align and use by an orientation process, it exists in the preferable tendency from higher electron transport property or hole transport property being acquired.
- examples of organic thin film elements will be described.
- organic thin film transistor controls the amount of current passing through the source electrode and the drain electrode, the organic thin film layer (active layer) containing the polycyclic fused ring polymer or polycyclic fused ring compound of the present invention, and the current path between them.
- Any structure may be used as long as it has a gate electrode, and examples thereof include a field effect type and an electrostatic induction type.
- the field effect organic thin film transistor includes a source electrode and a drain electrode, an organic thin film layer (active layer) containing a polycyclic fused ring polymer or a polycyclic fused ring compound of the present invention, and a current passing through the current path. It is preferable to provide a gate electrode for controlling the amount, and an insulating layer disposed between the active layer and the gate electrode.
- the source electrode and the drain electrode are provided in contact with an organic thin film layer (active layer) containing the polycyclic fused ring polymer or polycyclic fused ring compound of the present invention, and further an insulating layer in contact with the organic thin film layer It is preferable that a gate electrode is provided with the electrode interposed therebetween.
- the electrostatic induction type organic thin film transistor includes a source electrode and a drain electrode, an organic thin film layer containing a polycyclic fused ring polymer or a polycyclic fused ring compound of the present invention as a current path between them, and a current passing through the current path. It is preferable to have a gate electrode for controlling the amount, and the gate electrode is provided in the organic thin film layer.
- the source electrode, the drain electrode, and the gate electrode provided in the organic thin film layer are preferably provided in contact with the organic thin film layer containing the polycyclic fused ring polymer or polycyclic fused ring compound of the present invention.
- the structure of the gate electrode may be any structure as long as a current path flowing from the source electrode to the drain electrode is formed and the amount of current flowing through the current path can be controlled by a voltage applied to the gate electrode. It is done.
- FIG. 1 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a first embodiment.
- An organic thin film transistor 100 shown in FIG. 1 includes a substrate 1, a source electrode 5 and a drain electrode 6 formed on the substrate 1 with a predetermined interval, and a source electrode 5 and a drain electrode 6 so as to cover the substrate 1. Formed on the insulating layer 3 so as to cover the region of the insulating layer 3 between the source electrode 5 and the drain electrode 6, the insulating layer 3 formed on the active layer 2, and the insulating layer 3 formed between the source electrode 5 and the drain electrode 6. And a gate electrode 4.
- FIG. 2 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a second embodiment.
- An organic thin film transistor 110 shown in FIG. 2 includes a substrate 1, a source electrode 5 formed on the substrate 1, an active layer 2 formed on the substrate 1 so as to cover the source electrode 5, a source electrode 5 and a predetermined electrode.
- the drain electrode 6 formed on the active layer 2 with an interval of the insulating layer 3 formed on the active layer 2 and the drain electrode 6, and the insulating layer 3 between the source electrode 5 and the drain electrode 6.
- a gate electrode 4 formed on the insulating layer 3 so as to cover the region.
- FIG. 3 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a third embodiment.
- the organic thin film transistor 120 shown in FIG. 3 includes a substrate 1, an active layer 2 formed on the substrate 1, a source electrode 5 and a drain electrode 6 formed on the active layer 2 with a predetermined interval, and a source electrode. 5 and the drain electrode 6 so as to partially cover the insulating layer 3 formed on the active layer 2, the region of the insulating layer 3 where the source electrode 5 is formed below, and the drain electrode 6 are formed below.
- a gate electrode 4 formed on the insulating layer 3 so as to partially cover the region of the insulating layer 3.
- FIG. 4 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a fourth embodiment.
- 4 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- an active layer 2 formed on the insulating layer 3 so as to cover it.
- FIG. 5 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a fifth embodiment.
- An organic thin film transistor 140 shown in FIG. 5 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- a source electrode 5 formed on the insulating layer 3 so as to partially cover the region of the insulating layer 3 formed on the active layer 2 and an active layer 2 formed on the insulating layer 3 so as to partially cover the source electrode 5.
- a drain electrode 6 formed on the insulating layer 3 at a predetermined interval so as to partially cover the region of the active layer 2 formed below the gate electrode 4 It is.
- FIG. 6 is a schematic cross-sectional view of an organic thin film transistor (field effect organic thin film transistor) according to a sixth embodiment.
- An organic thin film transistor 150 shown in FIG. 6 includes a substrate 1, a gate electrode 4 formed on the substrate 1, an insulating layer 3 formed on the substrate 1 so as to cover the gate electrode 4, and the gate electrode 4 at the bottom.
- the active layer 2 is formed on the insulating layer 3 so as to partially cover the region of the active layer 2 formed under the active layer 2 and the gate electrode 4 formed below.
- the source electrode 5 and the drain electrode 6 formed on the insulating layer 3 with a predetermined distance from the source electrode 5 so as to partially cover the region of the active layer 2 where the gate electrode 4 is formed below. , Are provided.
- FIG. 7 is a schematic cross-sectional view of an organic thin film transistor (static induction organic thin film transistor) according to a seventh embodiment.
- the organic thin film transistor 160 shown in FIG. 7 includes a substrate 1, a source electrode 5 formed on the substrate 1, an active layer 2 formed on the source electrode 5, and a plurality on the active layer 2 with a predetermined interval.
- a drain electrode 6 formed on the active layer 2a.
- the active layer 2 and / or the active layer 2a contains the polycyclic fused ring polymer or the polycyclic fused ring compound of the present invention
- a current path (channel) is formed between the drain electrodes 6.
- the gate electrode 4 controls the amount of current passing through the current path (channel) in the active layer 2 and / or the active layer 2a by applying a voltage.
- Such a field effect organic thin film transistor can be manufactured by a known method, for example, a method described in JP-A-5-110069.
- the electrostatic induction organic thin film transistor can be produced by a known method, for example, a method described in JP-A-2004-006476.
- the substrate 1 it is sufficient that the characteristics as an organic thin film transistor are not hindered, and a glass substrate, a flexible film substrate, or a plastic substrate can be used.
- the active layer 2 When forming the active layer 2, it is very advantageous and preferable to use an organic solvent-soluble compound, so that the active layer 2 is formed by using the organic thin film manufacturing method of the present invention described above. An organic thin film can be formed.
- any material having high electrical insulation may be used, and a known material can be used.
- a known material can be used.
- the surface of the insulating layer 3 is treated with a surface treatment agent such as a silane coupling agent in order to improve the interface characteristics between the insulating layer 3 and the active layer 2. It is also possible to form the active layer 2 after the modification.
- a surface treatment agent such as a silane coupling agent
- the surface treatment agent include silylamine compounds such as long-chain alkylchlorosilanes, long-chain alkylalkoxysilanes, fluorinated alkylchlorosilanes, fluorinated alkylalkoxysilanes, and hexamethyldisilazane.
- the surface of the insulating layer can be treated with ozone UV or O 2 plasma.
- a protective film on the organic thin film transistor after the organic thin film transistor is manufactured in order to protect the element.
- an organic thin-film transistor is interrupted
- the influence from the process of forming the display device driven on an organic thin-film transistor with a protective film can be reduced.
- Examples of the method for forming the protective film include a method of covering with a UV curable resin, a thermosetting resin, or an inorganic SiON x film.
- a method of covering with a UV curable resin, a thermosetting resin, or an inorganic SiON x film In order to effectively cut off from the atmosphere, it is preferable to perform the steps from the preparation of the organic thin film transistor to the formation of the protective film without exposure to the atmosphere (for example, in a dry nitrogen atmosphere or in a vacuum).
- FIG. 8 is a schematic cross-sectional view of the solar cell according to the embodiment.
- the solar cell 200 shown in FIG. 8 includes a substrate 1, a first electrode 7 a formed on the substrate 1, and a polycyclic condensed ring polymer or polycyclic condensed polymer of the present invention formed on the first electrode 7 a.
- An active layer 2 made of an organic thin film containing a ring compound and a second electrode 7b formed on the active layer 2 are provided.
- a transparent or translucent electrode is used for one of the first electrode 7a and the second electrode 7b.
- an electrode material metals such as aluminum, gold, silver, copper, alkali metal, alkaline earth metal, and their translucent films and transparent conductive films can be used.
- each electrode is preferably selected so that the difference in work function is large.
- a charge generating agent, a sensitizer and the like can be added and used in order to increase photosensitivity.
- the substrate 1 a silicon substrate, a glass substrate, a plastic substrate, or the like can be used.
- FIG. 9 is a schematic cross-sectional view of the photosensor according to the first embodiment.
- the optical sensor 300 shown in FIG. 9 includes a substrate 1, a first electrode 7a formed on the substrate 1, and a polycyclic fused polymer or polycyclic fused polymer of the present invention formed on the first electrode 7a.
- An active layer 2 made of an organic thin film containing a ring compound, a charge generation layer 8 formed on the active layer 2, and a second electrode 7b formed on the charge generation layer 8 are provided.
- FIG. 10 is a schematic cross-sectional view of an optical sensor according to the second embodiment.
- An optical sensor 310 illustrated in FIG. 10 is formed on the substrate 1, the first electrode 7a formed on the substrate 1, the charge generation layer 8 formed on the first electrode 7a, and the charge generation layer 8.
- the active layer 2 made of an organic thin film containing the polycyclic fused-ring polymer or polycyclic fused-ring compound of the present invention, and a second electrode 7b formed on the active layer 2 are provided.
- FIG. 11 is a schematic cross-sectional view of an optical sensor according to the third embodiment.
- An optical sensor 320 shown in FIG. 11 includes a substrate 1, a first electrode 7a formed on the substrate 1, and a polycyclic fused polymer or polycyclic fused polymer of the present invention formed on the first electrode 7a.
- An active layer 2 made of an organic thin film containing a ring compound and a second electrode 7b formed on the active layer 2 are provided.
- a transparent or translucent electrode is used as one of the first electrode 7a and the second electrode 7b.
- the charge generation layer 8 is a layer that absorbs light and generates charges.
- an electrode material metals such as aluminum, gold, silver, copper, alkali metal, alkaline earth metal, and their translucent films and transparent conductive films can be used.
- the active layer 2 organic thin film
- a carrier generating agent, a sensitizer and the like can be added and used in order to increase photosensitivity.
- the base material 1 a silicon substrate, a glass substrate, a plastic substrate, etc. can be used as the base material 1.
- the organic thin film element is not limited to the above-described embodiment as long as it is an electric element to which the organic thin film is applied.
- organic thin film elements other than the above include organic EL elements, organic memories, photorefractive elements, spatial light modulators, imaging elements, and the like.
- Example 15 ⁇ Manufacture of organic thin-film transistor 1 and evaluation of its transistor characteristics>
- a silicon oxide film to be an insulating layer is formed to 300 nm by thermal oxidation, and a substrate on which a source electrode and a drain electrode are formed by a lift-off method is formed.
- an organic thin film is formed by spin coating using the chloroform solution of the polycyclic fusedring polymer C synthesized in Example 14 to produce the organic thin film transistor 1.
- the gate voltage Vg and the source-drain voltage Vsd are applied to the obtained organic thin film transistor 1 in a vacuum and the transistor characteristics are measured, good drain current-gate voltage (Id-Vg) characteristics can be obtained.
- Example 23 ⁇ Manufacture of organic thin film transistor 2 and evaluation of transistor characteristics> A 300 nm thick silicon oxide film serving as an insulating layer is formed on the surface of a heavily doped p-type silicon substrate serving as a gate electrode by thermal oxidation, and the substrate is then added to an octadecyltrichlorosilane / octane (200 ⁇ L / 25 mL) solution with nitrogen. The silicon oxide film surface was modified by immersing in the solution for 15 hours.
- An organic thin film was formed on this silicon oxide film by spin coating using a 0.5 wt% toluene solution of the polycyclic fused ring compound Q synthesized in Example 19, and then at 60 ° C. in nitrogen. A heat treatment was performed for 30 minutes to form an organic thin film containing the polycyclic fusedring compound Q.
- Example 24 ⁇ Manufacture of organic thin-film transistor 3 and evaluation of its transistor characteristics> An organic thin film transistor 3 was obtained in the same manner as in Example 23 except that the polycyclic fused ring compound P synthesized in Example 18 was used in place of the polycyclic fused ring compound Q.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Thin Film Transistor (AREA)
- Light Receiving Elements (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Junction Field-Effect Transistors (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
好適な実施形態の多環縮環重合体は、上記一般式(1)で表される第1の構造単位及び上記一般式(2)で表される第2の構造単位のうちの少なくとも一方を複数有するか、第1の構造単位及び第2の構造単位を組み合わせて有するものである。すなわち、本実施形態の多環縮環重合体としては、第1の構造単位を複数有するもの、第2の構造単位を複数有するもの、及び、第1及び第2の構造単位をそれぞれ少なくとも一つずつ含むもの、等が挙げられる。ここで、多環縮環重合体の「構造単位」とは、当該重合体の主鎖を構成している構造単位を意味する。また、「重合体」とは、かかる「構造単位」を少なくとも2つ有するものをいい、通常オリゴマーやポリマーに分類されるものの両方を含む。多環縮環重合体は、第1の構造単位及び/又は第2の構造単位を、30モル%以上有していると好ましく、50~95モル%有しているとより好ましい。
上述した構造を有する多環縮環重合体の製造方法としては、以下に示すように多環縮環化合物を重合させる方法が簡便であるため、特に好ましい。以下の例では、上記一般式(1)で表される第1の構造単位及び/又は上記一般式(2)で表される第2の構造単位と、上記一般式(3)で表される第3の構造単位とを備えた構造を有する多環縮環重合体の好適な製造方法について説明する。
次に、好適な実施形態に係る有機薄膜について説明する。有機薄膜は、上述した実施形態の多環縮環重合体又は多環縮環化合物を含み膜状の形状を有する構成を有している。
上述した実施形態の有機薄膜は、上記実施形態の多環縮環重合体又は多環縮環化合物を含むことから、優れた電荷(電子又はホール)輸送性を有するものとなる。したがって、この有機薄膜は、電極等から注入された電子又はホール、或いは、光吸収により発生した電荷等を効率よく輸送できるものであり、有機薄膜を用いた各種の電気素子(有機薄膜素子)に応用することができる。なお、有機薄膜をこれらの有機薄膜素子に用いる場合は、配向処理により配向させて用いると、より高い電子輸送性又はホール輸送性が得られることから好ましい傾向にある。以下、有機薄膜素子の例についてそれぞれ説明する。
まず、好適な実施形態に係る有機薄膜トランジスタについて説明する。有機薄膜トランジスタは、ソース電極及びドレイン電極、これらの間の電流経路となり本発明の多環縮環重合体又は多環縮環化合物を含む有機薄膜層(活性層)、電流経路を通る電流量を制御するゲート電極を備えた構造であればよく、電界効果型、静電誘導型などが例示される。
次に、本発明の有機薄膜の太陽電池への応用を説明する。図8は、実施形態に係る太陽電池の模式断面図である。図8に示す太陽電池200は、基板1と、基板1上に形成された第1の電極7aと、第1の電極7a上に形成された本発明の多環縮環重合体又は多環縮環化合物を含む有機薄膜からなる活性層2と、活性層2上に形成された第2の電極7bと、を備えるものである。
次に、本発明の有機薄膜の光センサへの応用を説明する。図9は、第1実施形態に係る光センサの模式断面図である。図9に示す光センサ300は、基板1と、基板1上に形成された第1の電極7aと、第1の電極7a上に形成された本発明の多環縮環重合体又は多環縮環化合物を含む有機薄膜からなる活性層2と、活性層2上に形成された電荷発生層8と、電荷発生層8上に形成された第2の電極7bと、を備えるものである。
以下の合成例及び実施例において、各種の分析等は以下の条件で行った。まず、核磁気共鳴(NMR)スペクトルは、日本電子社製のJNM-GSX-400を用いて測定した。ガスクロマトグラフ-質量分析(GC-MS)は、島津製作所社製のQP-5050を用い、電子衝撃法により行った。高分解質量分析(HRMS)は、日本電子社製のJMS-DX-303を用いて行った。ガスクロマトグラフ(GC)分析は、島津製作所社製のGC-8Aにジーエルサイエンス社製のシリコンOV-17充填ガラスカラム(内径2.6mm、長さ1.5m)を装着して用いた。カラムクロマトグラフィー分離におけるシリカゲルは、和光純薬工業社製のワコーゲルC-200を用いた。
<多環縮環化合物A:3,7-ジクロロベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチルの合成>
まず、出発原料である3,7-ジクロロベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボニルクロリドを、参考文献(M. Malesevic, G. Karminski-Zamora, M. Bajic, D. W. Boykin, Heterocycles, 1995, 41, 2691-2699)の記載を参照して合成した。そして、これを用いてエステル化反応を行い、3,7-ジクロロベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチルを合成した。すなわち、まず、200mLのナスフラスコに、3,7-ジクロロベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボニルクロリド(16.5g,43mmol)、n-ブタノール(15.5mL,172mmol)、ピリジン(13.9mL,172mmol)、クロロベンゼン(60mL)を加え、100℃で16.5時間攪拌した。
1H-NMR(400MHz,CDCl3):δ7.95(s,2H),4.41(t,J=6.4Hz,4H),1.84-1.77(m,4H),1.58-1.48(m,4H),1.02(t,J=7.3Hz,6H)
<多環縮環化合物B:3,7-ジ(1-オクチニル)ベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチルの合成>
100mLの二口フラスコに3,7-ジクロロベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチル(多環縮環化合物A)(689mg,1.5mmol)、1-オクチン(668mg,6mmol)、PdCl2(PhCN)2(11.5mg,0.03mmol)、ジシクロヘキシル(2’,4’,6’-トリイソプロピルビフェニル-2-イル)ホスフィン(42.9mg,0.09mmol)、炭酸セシウム(3.9g,12mmol)、アセトニトリル(10mL)を加え、100℃で24時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.99 (s, 2H), 4.39 (t, J = 6.4 Hz, 4H), 2.63 (t, J = 7.2 Hz, 4H), 1.82 - 1.70 (m, 8H), 1.57 - 1.48 (m, 8H), 1.39 - 1.32 (m, 4H), 1.00 (t, J = 7.2 Hz, 6H) , 0.95 - 0.90 (m, 6H)
<多環縮環化合物C:3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチルの合成>
50mLのオートクレーブ容器に10重量%Pd/C(52.5mg,0.025mmol)を入れ、水素置換して常圧で1時間活性化した後、3,7-ジ(1-オクチニル)ベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチル(多環縮環化合物B)(308mg,0.50mmol)を脱水エタノール(5mL)に溶かした溶液を加え15気圧の水素下、室温で48時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.79 (s, 2H), 4.36 (t, J = 6.0 Hz, 4H), 3.33 (t, J = 7.6 Hz, 4H), 1.82 - 1.75 (m, 4H), 1.72 - 1.65 (m, 4H), 1.61 - 1.24 (m, 24H), 1.00, (t, J = 7.6 Hz, 6H), 0.94 - 0.86 (m, 6H)
<多環縮環化合物D:3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸の合成>
100mLのナスフラスコに3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチル(多環縮環化合物C)(254mg,0.41mmol)、KOH(134mg,2.4mmol)、水(1mL)、エタノール(5mL)を加え、100℃で7時間攪拌した。
<多環縮環化合物E:3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
100mLのナスフラスコに3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸(多環縮環化合物D)(150mg,0.298mmol)、銅粉(40mg,0.6mmol)、キノリン(1.5mL)を加え、窒素雰囲気下260℃で4時間撹拌した。
1H-NMR (400 MHz, CDCl3) δ 7.71 (s, 2H), 7.03 (s, 2H), 2.88 (t, J = 7.3 Hz, 6H), 1.81 - 1.73 (m, 4H), 1.47 - 1.21 (m, 20H) , 0.90 - 0.84 (m, 6H)
<多環縮環化合物F:2,6-ジブロモ-3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
100mLのナスフラスコに3,7-オクチルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物E)(110mg,0.27mmol)、NBS(141mg,0.8mmol)、DMF(3mL)を加え室温で4時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.55 (s, 2H), 2.84 (t, J = 8.0 Hz, 4H), 1.67 - 1.59 (m, 4H), 1.45 - 1.20 (m, 20H), 0.87 (t, J = 6.8 Hz, 6H)
<多環縮環化合物G:3,7-ジ(1-ドデシニル)ベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチルの合成>
30mLの二口フラスコに3,7-ジクロロベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチル(多環縮環化合物A)(990mg,2.15mmol)、1-ドデシン(1.48g,8.9mmol)、PdCl2(PhCN)2(17mg,0.044mmol)、ジシクロヘキシル(2’,4’,6’-トリイソプロピルビフェニル-2-イル)ホスフィン(65.2mg,0.13mmol)、炭酸セシウム(5.79g,17.8mmol)、アセトニトリル(15mL)を加え、100℃で24時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.99 (s, 2H), 4.39 (t, J = 6.4 Hz, 4H), 2.62 (t, J=6.8 Hz, 4H) , 1.83 - 1.71 (m, 8H), 1.58 - 1.48 (m, 8H), 1.43 - 1.18 (m, 24H), 1.00 (t, J = 7.6 Hz, 6H), 0.88 (t, J = 6.0 Hz, 6H)
<多環縮環化合物H:3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチルの合成>
50mLのオートクレーブ容器に10重量%Pd/C(128mg,0.061mmol)を入れ水素置換して常圧で1時間活性化した後、3,7-ジ(1-ドデシニル)ベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチル(多環縮環化合物G)(742mg,1.03mmol)を脱水エタノール(7mL)、ジオキサン(6mL)に溶かした溶液を加え14気圧の水素下、室温で48時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.78 (s, 2H), 4.36 (t, J = 7.2 Hz, 4H), 3.32 (t, J = 7.6, 4H), 1.82 - 1.75 (m, 4H), 1.72 - 1.64 (m, 4H), 1.58 - 1.42 (m, 10H), 1.37 - 1.13 (m, 30H), 1.01 (t, J = 7.6 Hz, 6H), 0.88 (t, J = 6.4 Hz, 6H)
<多環縮環化合物I:3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸の合成>
100mLのナスフラスコに3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸ジブチル(多環縮環化合物H)(710mg,0.97mmol)、KOH(327.2mg,5.84mmol)、水(1mL)、エタノール(12.5mL)を加え、100℃で8時間攪拌した。
<多環縮環化合物J:3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
100mLのナスフラスコに3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン-2,6-ジカルボン酸(多環縮環化合物I)(553mg,0.897mmol)、銅粉(114mg,1.74mmol)、キノリン(4.0mL)を加え、窒素雰囲気下260℃で4時間撹拌した。
1H-NMR (400 MHz, CDCl3) δ 7.70 (s, 2H), 7.02 (s, 2H), 2.88 (t, J = 7.6 Hz, 4H), 1.79 - 1.73 (m, 4H), 1.70 - 1.57 (m, 4H), 1.48 - 1.20 (m, 36H), 0.88 (t, J = 7.3 Hz, 6H)
<多環縮環化合物K:2,6-ジブロモ-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
100mLのナスフラスコに3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物J)(298mg,0.58mmol)、NBS(307mg,1.73mmol)、DMF(5mL)を加え室温で5時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.59 (s, 2H), 2.86 (t, J = 7.6 Hz, 2H), 1.68 - 1.61 (m, 4H), 1.45 - 1.12 (m, 36H), 0.88 (t, J = 7.2 Hz, 4H)
<多環縮環化合物L:2,6-ジ(2-チエニル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
20mLの二口フラスコに2,6-ジブロモ-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物K)(342mg,0.51mmol)、トリブチル(2-チエニル)スズ(373mg,1.02mmol)、テトラキス(トリフェニルホスフィン)パラジウム(29mg,0.025mmol)、DMF(3mL)、トルエン(3mL)を加え、窒素下85℃で24時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.67 (s, 2H), 7.39 (dd, J = 5.2, 1.2 Hz, 2H), 7.28 (dd, J=3.6, 1.2 Hz, 2H), 7.12 (dd, J = 5.2, 3.6 Hz, 2H), 3.07- 3.03 (m, 4H), 1.78 - 1.72 (m, 4H), 1.52 - 1.43 (m, 4H), 1.36- 1.20 (m, 32H), 0.88 (t, J = 7.0 Hz, 6H)
<多環縮環化合物M:2,6-ジ(5-ブロモチオフェン-2-イル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
100mLのナスフラスコに2,6-ジ(2-チエニル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物L)(274mg,0.38mmol)、NBS(210mg,1.18mmol)、DMF(4mL)を加え室温で5時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.66 (s, 2H), 7.06 (d, J = 4.0 Hz, 2H), 7.01 (d, J = 4.0 Hz, 2H), 3.03 - 2.98 (m, 4H), 1.70 - 1.66 (m, 4H), 1.50 - 1.42 (m, 4H), 1.39 - 1.20 (m, 32H), 0.88 (t, J = 7.0 Hz, 6H)
<多環縮環重合体Cの合成>
50mLシュレンク管に2,6-ジ(5-ブロモチオフェン-2-イル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物M)(210mg,0.25mmol)、Ni(COD)2(82.5mg,0.30mmol)、ビピリジル(48.4mg,0.31mmol)、トルエン(7.5mL)を加え110℃で21時間攪拌した。
<有機薄膜トランジスタ1の製造及びそのトランジスタ特性の評価>
ゲート電極となる高濃度にドープされたp型シリコン基板の表面に、絶縁層となるシリコン酸化膜を熱酸化により300nm形成し、その上に、リフトオフ法によりソース電極及びドレイン電極を形成した基板を準備する。この基板上に、実施例14で合成した多環縮環重合体Cのクロロホルム溶液を用い、スピンコート法により有機薄膜を成膜して、有機薄膜トランジスタ1を作製する。得られた有機薄膜トランジスタ1に、真空中でゲート電圧Vg、ソース-ドレイン間電圧Vsdを印加し、トランジスタ特性を測定すると、良好なドレイン電流-ゲート電圧(Id-Vg)特性が得られる。
<多環縮環化合物N:2,6-ジ(2-チエニル)-3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
20mLの二口フラスコに2,6-ジブロモ-3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物F)(200mg,0.35mmol)、トリブチル(2-チエニル)スズ(318mg,0.84mmol)、テトラキス(トリフェニルホスフィン)パラジウム(29mg,0.025mmol)、DMF(3mL)、トルエン(3mL)を加え、窒素下85℃で24時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.67 (s, 2H), 7.39 (dd, J = 5.2, 1.2 Hz, 2H), 7.28 (dd, J=3.6, 1.2 Hz, 2H), 7.12 (dd, J = 5.2, 3.6 Hz, 2H), 3.07- 3.03 (m, 4H), 1.78 - 1.69 (m, 4H), 1.52 - 1.43 (m, 4H), 1.36- 1.20 (m, 16H), 0.88 (t, J = 7.0 Hz, 6H)
<多環縮環化合物O:2,6-ジ(5-ブロモチオフェン-2-イル)-3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
100mLのナスフラスコに2,6-ジ(2-チエニル)-3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物N)(143mg,0.25mmol)、NBS(115mg,0.65mmol)、DMF(3mL)を加え室温で5時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.66 (s, 2H), 7.06 (d, J = 4.0Hz, 2H), 7.01 (d, J = 4.0Hz, 2H), 3.03 - 2.98 (m, 4H), 1.73 - 1.66 (m, 4H), 1.50 - 1.40 (m, 4H), 1.40 - 1.20 (m, 16H), 0.89 (t, J = 7.0 Hz, 6H)
<多環縮環化合物P:2,6-ジ(5-フェニルチオフェン-2-イル)-3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
20mLの反応器に2,6-ジ(5-ブロモチオフェン-2-イル)-3,7-ジオクチルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物O)(130mg,0.18mmol)、ジヒドロキシフェニルボラン(65.8mg,0.54mmol)、酢酸パラジウム(2.0mg,0.009mmol)、2-(ジ-t-ブチルホスフィノ)ビフェニル(5.4mg,0.018mmol)、フッ化カリウム(48.8mg,0.84mmol)、トルエン(3mL)を加え、100℃で10時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.68 (s, 2H), 7.65 (d, J = 4.0, 4H), 7.41 (t, J=7.7Hz, 4H), 7.32 (dd, J = 3.6 Hz, 4H), 7.26 (d, J = 4.0Hz, 4H), 3.03 - 2.98 (m, 4H), 1.73 - 1.66 (m, 4H), 1.50- 1.40 (m, 4H), 1.40 - 1.20 (m, 16H), 0.89 (t, J = 7.0 Hz, 6H)
<多環縮環化合物Q:2,6-ジ(5-フェニルチオフェン-2-イル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
20mLの反応器に2,6-ジ(5-ブロモチオフェン-2-イル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物M)(300mg,0.35mmol)、ジヒドロキシフェニルボラン(128mg,1.05mmol)、酢酸パラジウム(3.9mg,0.018mmol)、2-(ジ-t-ブチルホスフィノ)ビフェニル(10.4mg,0.035mmol)、フッ化カリウム(162.6mg,2.8mmol)、トルエン(4mL)を加え、100℃で10時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.68 (s, 2H), 7.65 (d, J = 4.0, 4H), 7.41 (t, J=7.7Hz, 4H), 7.32 (dd, J = 3.6 Hz, 4H), 7.26 (d, J = 4.0Hz, 4H), 3.03 - 2.98 (m, 4H), 1.73 - 1.66 (m, 4H), 1.50- 1.40 (m, 4H), 1.40 - 1.20 (m, 32H), 0.89 (t, J = 7.0 Hz, 6H)
<多環縮環化合物R:2,6-ジ(2-ベンゾ[b]チエニル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェンの合成>
20mLの反応器に2,6-ジブロモ-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物K)(240mg,0.36mmol)、トリブチル(2-ベンゾ[b]チエニル)スズ(181mg,0.426mmol)、テトラキス(トリフェニルホスフィン)パラジウム(20.8mg,0.018mmol)、DMF(2mL)、トルエン(2mL)を加え、窒素下85℃で24時間攪拌した。
1H-NMR (400 MHz, CDCl3) δ 7.85 (d, J = 7.6Hz, 2H), 7.81 (d, J = 7.6Hz, 2H), 7.67 (s, 2H), 7.51 (s, 2H), 7.41- 7.33 (m, 4H), 3.17 - 3.13 (m, 4H), 1.82 - 1.72 (m, 4H), 1.68- 1.63 (m, 4H), 1.53 - 1.46 (m, 4H), 1.40 - 1.28 (m, 28H), 0.88 (t, J = 7.0 Hz, 6H)
[実施例21]<多環縮環重合体Dの合成>
20mLの反応器に2,6-ジブロモ-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物K)(199mg,0.29mmol)、5,5’-ビス(トリブチルスタニル)-2,2’-ビチオフェン(214mg、0.29mmol)、テトラキス(トリフェニルホスフィン)パラジウム(17.3mg、0.015mmol)、クロロベンゼン(10mL)を加え、窒素下、85℃で48時間攪拌した。
<多環縮環重合体Eの合成>
50mLの3口フラスコに5,5’-ビス(4,4,5,5-テトラメチル-1,3,5-ジオキサボロラン-2-イル)-2,2’-ビチオフェン(319mg、0.4mmol)、2,6-ジ(5-ブロモチオフェン-2-イル)-3,7-ジドデシルベンゾ[1,2-b:4,5-b’]ジチオフェン(多環縮環化合物M)(340mg、0.4mmol)、トリス(ジベンジリデンアセトン)ジパラジウム(0)(7.3mg、0.008mmol)、トリ-tert-ブチルホスホニウムテトラフルオロボレート(9.3mg、0.032mmol)、テトラヒドロフラン(7.7mL)を入れた。ここに、炭酸カリウム水溶液(2mol/L、0.6mL)を加えた後、80℃で5時間反応させた。
<有機薄膜トランジスタ2の製造及びそのトランジスタ特性の評価>
ゲート電極となる高濃度にドープされたp型シリコン基板の表面に、絶縁層となるシリコン酸化膜を熱酸化により300nm形成した後、この基板をオクタデシルトリクロロシラン/オクタン(200μL/25mL)溶液に窒素中で15時間浸漬して、シリコン酸化膜表面の改質処理を行った。
<有機薄膜トランジスタ3の製造及びそのトランジスタ特性の評価>
実施例18で合成した多環縮環化合物Pを、多環縮環化合物Qに代えて用いたこと以外は、実施例23と同様にして有機薄膜トランジスタ3を得た。
Claims (11)
- 下記一般式(1)で表される第1の構造単位及び下記一般式(2)で表される第2の構造単位のうちの少なくとも一方を複数有するか、前記第1の構造単位及び前記第2の構造単位を組み合わせて有する、多環縮環重合体。
- 前記X1及び前記X2が、硫黄原子である、請求項1記載の多環縮環重合体。
- 前記Z1は、前記式(ii)で表される基である、請求項4記載の多環縮環重合体。
- 下記一般式(5)又は下記一般式(6)で表される多環縮環化合物。
- 下記一般式(7)又は下記一般式(8)で表される多環縮環化合物。
- 前記X1及びX2は、硫黄原子である、請求項6又は7記載の多環縮環化合物。
- 請求項1~5のいずれか一項に記載の多環縮環重合体又は請求項7記載の多環縮環化合物を含む有機薄膜。
- 請求項9記載の有機薄膜を備える有機薄膜素子。
- 請求項9記載の有機薄膜を備える有機薄膜トランジスタ。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200980104939XA CN101945917A (zh) | 2008-02-13 | 2009-02-13 | 多环稠环化合物、多环稠环聚合物和含有它们的有机薄膜 |
US12/867,225 US20110040069A1 (en) | 2008-02-13 | 2009-02-13 | Condensed polycyclic compound, condensed polycyclic polymer and organic thin film containing the compound or the polymer |
EP09710447A EP2248840A4 (en) | 2008-02-13 | 2009-02-13 | CONDENSED POLYCYCLIC COMPOUND, CONDENSED POLYCYCLIC POLYMER, AND ORGANIC THIN FILM CONTAINING THE COMPOUND OR THE POLYMER |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008-032245 | 2008-02-13 | ||
JP2008032245 | 2008-02-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009102031A1 true WO2009102031A1 (ja) | 2009-08-20 |
Family
ID=40957061
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2009/052429 WO2009102031A1 (ja) | 2008-02-13 | 2009-02-13 | 多環縮環化合物、多環縮環重合体及びこれらを含む有機薄膜 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20110040069A1 (ja) |
EP (1) | EP2248840A4 (ja) |
JP (1) | JP2009215546A (ja) |
KR (1) | KR20100134590A (ja) |
CN (1) | CN101945917A (ja) |
WO (1) | WO2009102031A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011078246A1 (ja) * | 2009-12-25 | 2011-06-30 | 住友化学株式会社 | 高分子化合物、これを含む薄膜及びインク組成物 |
WO2011078248A1 (ja) * | 2009-12-25 | 2011-06-30 | 住友化学株式会社 | 高分子化合物、これを含む薄膜及びインク組成物 |
WO2012105517A1 (ja) * | 2011-01-31 | 2012-08-09 | 住友化学株式会社 | 多環縮環化合物、多環縮環重合体及びこれらを含む有機薄膜 |
WO2016013460A1 (ja) * | 2014-07-23 | 2016-01-28 | 住友化学株式会社 | 高分子化合物およびそれを用いた有機半導体素子 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8304512B2 (en) * | 2010-01-19 | 2012-11-06 | Xerox Corporation | Benzodithiophene based materials compositions |
CN102844312B (zh) * | 2010-04-19 | 2015-04-15 | 默克专利股份有限公司 | 苯并二噻吩的聚合物及其作为有机半导体的用途 |
DE102011119900A1 (de) | 2011-01-21 | 2012-07-26 | Merck Patent Gmbh | Flüssigkristalline Medien, Bauteile für die Hochfrequenztechnik und mesogene Verbindungen |
US8742403B2 (en) | 2011-03-08 | 2014-06-03 | Samsung Electronics Co., Ltd. | Xanthene based semiconductor compositions |
JP5390554B2 (ja) * | 2011-03-24 | 2014-01-15 | 株式会社東芝 | 有機分子メモリ |
KR101777325B1 (ko) | 2011-05-04 | 2017-09-12 | 삼성전자주식회사 | 전자 공여체 고분자 및 이를 포함하는 유기 태양 전지 |
KR20140067008A (ko) * | 2011-07-21 | 2014-06-03 | 메르크 파텐트 게엠베하 | 공액 중합체 |
GB201203159D0 (en) | 2012-02-23 | 2012-04-11 | Smartkem Ltd | Organic semiconductor compositions |
CN103483558B (zh) * | 2013-08-19 | 2015-09-02 | 南京友斯贝特光电材料有限公司 | 一种d-a型聚合物半导体材料及其制备方法与应用 |
CN103450462B (zh) * | 2013-08-19 | 2016-03-02 | 南京友斯贝特光电材料有限公司 | D-a型聚合物半导体材料及其制备方法与应用 |
JP6241399B2 (ja) * | 2014-09-12 | 2017-12-06 | Jsr株式会社 | ブロック共重合体及びその製造方法並びにフィルム |
CN106633000A (zh) * | 2016-09-20 | 2017-05-10 | 常州大学 | 基于苯并二噻吩‑2,6‑二甲酸酯的d‑a型宽带隙聚合物光伏材料及其应用 |
CN106831813B (zh) * | 2017-01-23 | 2019-03-15 | 辽宁大学 | 一种基于含噻吩的多孔金属有机骨架化合物及其制备方法和应用 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05110069A (ja) | 1991-10-14 | 1993-04-30 | Mitsubishi Electric Corp | 電界効果トランジスタの製造方法 |
JPH11195790A (ja) * | 1997-10-16 | 1999-07-21 | Lucent Technol Inc | 薄膜トランジスタ及び薄膜トランジスタ用半導体材料 |
JP2001247576A (ja) * | 2000-03-09 | 2001-09-11 | Tdk Corp | チオフェン誘導体およびその重合体 |
JP2004006476A (ja) | 2002-05-31 | 2004-01-08 | Ricoh Co Ltd | 縦型有機トランジスタ |
US20040186266A1 (en) | 2003-03-19 | 2004-09-23 | Xerox Corporation | Fluorinated polythiophenes and devices thereof |
JP2005120379A (ja) * | 2003-10-15 | 2005-05-12 | Merck Patent Gmbh | ポリ(ベンゾジチオフェン) |
JP2005330185A (ja) * | 2004-05-18 | 2005-12-02 | Takasago Internatl Corp | ジチア−s−インダセン誘導体 |
JP2006232898A (ja) * | 2005-02-23 | 2006-09-07 | Ricoh Co Ltd | 導電性高分子材料、それを用いた電界効果型トランジスタ及びその製造方法 |
JP2007246579A (ja) * | 2006-03-14 | 2007-09-27 | Ricoh Co Ltd | 新規なベンゾジチオフェン重合体 |
JP2008109135A (ja) * | 2006-10-25 | 2008-05-08 | Xerox Corp | 電子デバイス |
JP2008153667A (ja) * | 2006-12-14 | 2008-07-03 | Xerox Corp | ポリチオフェン電子デバイス |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60305570T2 (de) * | 2002-04-24 | 2007-05-03 | Merck Patent Gmbh | Reaktive mesogene Benzodithiophene |
WO2005087187A1 (en) * | 2004-03-04 | 2005-09-22 | The Procter & Gamble Company | Keratin dyeing compounds, keratin dyeing compositions containing them, and use thereof |
-
2009
- 2009-02-10 JP JP2009028845A patent/JP2009215546A/ja not_active Withdrawn
- 2009-02-13 WO PCT/JP2009/052429 patent/WO2009102031A1/ja active Application Filing
- 2009-02-13 CN CN200980104939XA patent/CN101945917A/zh active Pending
- 2009-02-13 KR KR1020107020208A patent/KR20100134590A/ko not_active Application Discontinuation
- 2009-02-13 EP EP09710447A patent/EP2248840A4/en not_active Withdrawn
- 2009-02-13 US US12/867,225 patent/US20110040069A1/en not_active Abandoned
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05110069A (ja) | 1991-10-14 | 1993-04-30 | Mitsubishi Electric Corp | 電界効果トランジスタの製造方法 |
JPH11195790A (ja) * | 1997-10-16 | 1999-07-21 | Lucent Technol Inc | 薄膜トランジスタ及び薄膜トランジスタ用半導体材料 |
JP2001247576A (ja) * | 2000-03-09 | 2001-09-11 | Tdk Corp | チオフェン誘導体およびその重合体 |
JP2004006476A (ja) | 2002-05-31 | 2004-01-08 | Ricoh Co Ltd | 縦型有機トランジスタ |
US20040186266A1 (en) | 2003-03-19 | 2004-09-23 | Xerox Corporation | Fluorinated polythiophenes and devices thereof |
JP2005120379A (ja) * | 2003-10-15 | 2005-05-12 | Merck Patent Gmbh | ポリ(ベンゾジチオフェン) |
JP2005330185A (ja) * | 2004-05-18 | 2005-12-02 | Takasago Internatl Corp | ジチア−s−インダセン誘導体 |
JP2006232898A (ja) * | 2005-02-23 | 2006-09-07 | Ricoh Co Ltd | 導電性高分子材料、それを用いた電界効果型トランジスタ及びその製造方法 |
JP2007246579A (ja) * | 2006-03-14 | 2007-09-27 | Ricoh Co Ltd | 新規なベンゾジチオフェン重合体 |
JP2008109135A (ja) * | 2006-10-25 | 2008-05-08 | Xerox Corp | 電子デバイス |
JP2008153667A (ja) * | 2006-12-14 | 2008-07-03 | Xerox Corp | ポリチオフェン電子デバイス |
Non-Patent Citations (3)
Title |
---|
M. MALESEVIC; G KARMINSKI-ZAMORA; M. BAJIC; D. W. BOYKIN, HETEROCYCLES, vol. 41, 1995, pages 2691 - 2699 |
See also references of EP2248840A4 |
WANG, C. ET AL.: "Linear C 2-symmetric polycyclic benzodithiophene: efficient, highly diversified approaches and the optical properties", TETRAHEDRON LETT, vol. 46, no. 47, 2005, pages 8153 - 8157, XP008140197 * |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011078246A1 (ja) * | 2009-12-25 | 2011-06-30 | 住友化学株式会社 | 高分子化合物、これを含む薄膜及びインク組成物 |
WO2011078248A1 (ja) * | 2009-12-25 | 2011-06-30 | 住友化学株式会社 | 高分子化合物、これを含む薄膜及びインク組成物 |
JP2012131938A (ja) * | 2009-12-25 | 2012-07-12 | Sumitomo Chemical Co Ltd | 高分子化合物、これを含む薄膜及びインク組成物 |
JP2012131939A (ja) * | 2009-12-25 | 2012-07-12 | Sumitomo Chemical Co Ltd | 高分子化合物、これを含む薄膜及びインク組成物 |
US8921836B2 (en) | 2009-12-25 | 2014-12-30 | Sumitomo Chemical Company, Limited | Polymer compound, and thin film and ink composition each containing same |
WO2012105517A1 (ja) * | 2011-01-31 | 2012-08-09 | 住友化学株式会社 | 多環縮環化合物、多環縮環重合体及びこれらを含む有機薄膜 |
WO2016013460A1 (ja) * | 2014-07-23 | 2016-01-28 | 住友化学株式会社 | 高分子化合物およびそれを用いた有機半導体素子 |
JP6083491B2 (ja) * | 2014-07-23 | 2017-02-22 | 住友化学株式会社 | 高分子化合物およびそれを用いた有機半導体素子 |
US10239886B2 (en) | 2014-07-23 | 2019-03-26 | Sumitomo Chemical Company, Limited | Polymer compound and organic semiconductor device using the same |
Also Published As
Publication number | Publication date |
---|---|
JP2009215546A (ja) | 2009-09-24 |
EP2248840A1 (en) | 2010-11-10 |
KR20100134590A (ko) | 2010-12-23 |
EP2248840A4 (en) | 2012-02-29 |
CN101945917A (zh) | 2011-01-12 |
US20110040069A1 (en) | 2011-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2009102031A1 (ja) | 多環縮環化合物、多環縮環重合体及びこれらを含む有機薄膜 | |
US8344095B2 (en) | Fused ring compound, method for producing the same, polymer, organic thin film containing the compound and/or polymer, and organic thin film device and organic thin film transistor each comprising the organic thin film | |
US8895692B2 (en) | Fused ring compound and method for producing same, polymer, organic thin film containing those, and organic thin film device and organic thin film transistor comprising such organic thin film | |
JP5164134B2 (ja) | 縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ | |
EP2133321A1 (en) | Fluorine-containing polycyclic aromatic compound, fluorine-containing polymer, organic thin film and organic thin film device | |
WO2009101823A1 (ja) | 分岐型化合物、これを用いた有機薄膜及び有機薄膜素子 | |
US8841410B2 (en) | Nitrogen-containing condensed ring compound, nitrogen-containing condensed ring polymer, organic thin film, and organic thin film element | |
WO2012105517A1 (ja) | 多環縮環化合物、多環縮環重合体及びこれらを含む有機薄膜 | |
WO2010104042A1 (ja) | 含フッ素重合体及びこれを用いた有機薄膜 | |
WO2010104118A1 (ja) | 分岐型化合物、並びにこれを用いた有機薄膜及び有機薄膜素子 | |
WO2012111487A1 (ja) | アクセプター性の基を有する化合物、これを用いた有機薄膜及び有機薄膜素子 | |
JP6004848B2 (ja) | 重合体、この重合体を用いた有機薄膜及び有機薄膜素子 | |
WO2010104037A1 (ja) | 重合体、この重合体を用いた有機薄膜及びこれを備える有機薄膜素子 | |
JP5363771B2 (ja) | 含窒素縮合環化合物、含窒素縮合環重合体、有機薄膜及び有機薄膜素子 | |
WO2011108646A1 (ja) | 含窒素縮合環化合物、含窒素縮合環重合体、有機薄膜及び有機薄膜素子 | |
WO2012118128A1 (ja) | 重合体、この重合体を用いた有機薄膜及び有機薄膜素子 | |
WO2011102390A1 (ja) | 芳香族化合物、及びこれを用いた有機薄膜、並びにこの有機薄膜を備える有機薄膜素子 | |
WO2009101914A1 (ja) | 重合体、これを用いた有機薄膜及び有機薄膜素子 | |
JP2008110957A (ja) | 含フッ素化合物及びその製造方法、含フッ素重合体、有機薄膜、並びに、有機薄膜素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200980104939.X Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09710447 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2009710447 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: 20107020208 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 12867225 Country of ref document: US |