WO2007013143A1 - 混合流体の均一化装置および混合流体供給設備 - Google Patents
混合流体の均一化装置および混合流体供給設備 Download PDFInfo
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- WO2007013143A1 WO2007013143A1 PCT/JP2005/013665 JP2005013665W WO2007013143A1 WO 2007013143 A1 WO2007013143 A1 WO 2007013143A1 JP 2005013665 W JP2005013665 W JP 2005013665W WO 2007013143 A1 WO2007013143 A1 WO 2007013143A1
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- Prior art keywords
- mixed fluid
- perforated plate
- flow path
- gas
- homogenizer
- Prior art date
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
- F16K3/0209—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor the valve having a particular passage, e.g. provided with a filter, throttle or safety device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/21—Mixing gases with liquids by introducing liquids into gaseous media
- B01F23/213—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids
- B01F23/2132—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids using nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
- B01F25/3132—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
- B01F25/3132—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices
- B01F25/31322—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices used simultaneously
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
- B01F25/3133—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit characterised by the specific design of the injector
- B01F25/31331—Perforated, multi-opening, with a plurality of holes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
- B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
- B01F25/4521—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
- B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
- B01F25/4521—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube
- B01F25/45212—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube the elements comprising means for adjusting the orifices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
- B01F35/71805—Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings
- B01F35/718051—Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings being adjustable
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
- F16K3/0218—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with only one sealing face
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/30—Details
- F16K3/32—Means for additional adjustment of the rate of flow
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K2200/00—Details of valves
Definitions
- the present invention relates to a mixed fluid homogenizer and a mixed fluid supply facility. More specifically, the present invention relates to a homogenization for further homogenizing the mixing degree of a mixed fluid obtained by mixing a plurality of fluids, and a mixed fluid supply facility equipped with the mixed fluid homogenizing device.
- the furnace top gas (Blast Furnace Gas, hereinafter referred to as BFG) has a relatively low calorific value from the blast furnace (low calorie). Is generated as a by-product gas. This BFG is used in many areas within the steelworks.
- Low calorie by-product gas is not limited to blast furnace gas (BFG), but many other types of gas such as converter gas (LDG) and coal bed gas (Coal mine gas, referred to as CMG) These mixed gases are included.
- the by-product gas generated (gas composition and calorie) varies depending on the operation content. Even in the same facility, it changes from moment to moment according to the characteristics of each raw material and the reaction process, and does not become constant.
- gas turbine combustion is performed by mixing the heat reducing gas so that the fluctuating calorie value does not exceed the upper limit allowable calorie value of the gas turbine. A sudden rise in combustion temperature in the chamber must be avoided.
- misfire in the gas turbine combustor must be avoided by mixing the heat increasing gas so as not to fall below the lower limit allowable caloric value.
- the mixed gas after the main gas for example, BFG
- the heat increasing / decreasing gas hereinafter also referred to as secondary gas
- the mixed gas is non-uniform in the cross section in the pipe, there is a possibility that the non-uniform portion may remain as it is and reach the combustor of the gas turbine.
- the combustion mode may be non-uniform in each combustor.
- a mixer for example, refer to Patent Document 1 including a stationary blade that swirls the gas in a flow path has been used.
- the function of the mixer is to achieve a predetermined mixing over the full range of calories and flow rates of the main gas and the main gas and the different gases to be mixed as a secondary gas.
- the mixer is designed according to the mixing conditions. (1) Main gas flow rate, gas specific gravity, gas composition, (2) Gas specific gravity of gas to be mixed, gas composition, (3 ) There is a range of mixing ratios between the main gas and the gas to be mixed.
- the mixing ratio of the main gas and the sub-gas that is, the mixing ratio is determined in advance based on the target heat increase value and the caloric value of the main gas and the sub-gas, it is initially planned.
- the secondary gas is changed to another type of heat increasing gas, or when the mixing ratio of the primary gas to the secondary gas has to be greatly changed due to the change in the caloric value of the primary gas. It is extremely difficult to ensure uniformity that falls within a certain deviation of mixing in the fuel supply distribution section downstream of the mixer.
- coke oven gas COG, calorific value is about 4000kcalZNm 3
- converter gas marked LDG, caloric value of about 2000kcalZNm 3
- natural gas NG, the mixing ratio of the caloric value of about 9000kcal / Nm 3 in each main gas (the product gas) is different.
- main gas BFG is set to 1, it is mixed at a ratio of 0.05 for COG, 0.1 for LDG, and 0.022 for NG.
- Patent Document 1 Japanese Patent Laid-Open No. 10-337458
- the present invention has been made to solve the above-described problems, and is adapted to various mixing conditions including different flow rates and compositions to improve mixing uniformity, and a conventional mixer is installed.
- a mixed fluid homogenizer for improving the uniformity of fluid mixing (regardless of the mixer), and a mixed fluid supply facility equipped with the mixed fluid homogenizer Speak for the purpose of providing.
- the mixed fluid homogenizing device of the present invention comprises:
- a plurality of perforated plates that are disposed in the fluid flow path and are in contact with each other so as to overlap each other;
- a plurality of through holes are formed in each perforated plate, and the degree of overlap of the through holes of each perforated plate is reduced by relative displacement in the surface direction with the plurality of perforated plates overlapping.
- the aperture ratio of all the through holes is changed to change.
- the sub-fluid for adjusting the properties of the main fluid is mixed on the upstream side of the perforated plate, which resists fluid flow, and further mixed immediately after passing through the through hole. , Mixing is promoted. This promotes uniform mixing. Further, by changing the aperture ratio of the through-hole according to the mixing condition, it becomes possible to select the optimal aperture ratio for the mixing condition.
- the apparatus further includes a perforated plate moving device for moving the perforated plate disposed outside the flow path,
- the plurality of perforated plates include a fixed perforated plate fixed inside the flow path and a movable perforated plate that is movable without being fixed, and the movable perforated plate is reciprocated by the perforated plate moving device.
- all the through holes are formed so that the opening area when the opening ratio is the maximum is equal to or larger than the cross-sectional area of the flow path. It is possible to reduce the resistance of the flow path as much as possible.
- the perforated plate can be disposed inclined from a direction perpendicular to the central axis of the flow path. In this case, the actual area of the perforated plate is increased, and the opening area formed by the entire through hole is also increased, so that the resistance of the flow path can be reduced as much as possible.
- a movement guide member is attached to the fixed perforated plate, and the movement guide member is configured to engage with both side portions of the movable perforated plate in a direction perpendicular to the reciprocating direction of the movable perforated plate to guide the movement. can do.
- One movable perforated plate is disposed between two fixed perforated plates, and a spacer is disposed between the two fixed perforated plates to maintain a gap in which the movable perforated plate can slide.
- the two fixed perforated plates and the spacer can be configured to guide the movement of the movable perforated plate.
- the through hole can be formed in a long hole shape extending in a direction perpendicular to the moving direction of the movable perforated plate. In this way, since the area ratio of the through holes on one perforated plate can be made relatively large, the opening area when the through holes are fully opened can be increased.
- the cleaning device further includes a cleaning device disposed in the flow path for cleaning the through hole, and the cleaning device has a plurality of nozzles for ejecting a cleaning liquid. Is preferred. This is because it is possible to clean the perforated plate by requiring a worker to enter the flow path as much as possible or by greatly reducing the frequency of entry.
- Another mixed fluid homogenizing device of the present invention includes: A perforated plate having a plurality of through holes formed in a fluid flow path is provided, and the perforated plate is in the plane of the perforated plate and around an imaginary straight line passing through the center of the perforated plate. It can be rotated to any angular position.
- Mixing of the mixed fluid can be further promoted by a powerful configuration. Furthermore, even if a situation occurs in which the fluid flow is interrupted urgently on the downstream side of the flow path and a sudden pressure fluctuation propagates to the upstream side, this rotatable perforated plate must be rotated in the direction to close the flow path. Therefore, the flow path resistance can be increased, so that the upstream propagation of the pressure fluctuation is suppressed.
- the perforated plate can be configured to be able to rotate between a fully open position where the surface is in a direction along the central axis of the flow path and a fully closed position where the flow path is closed.
- the fully closed position for closing the flow path means a position where the flow of fluid in the flow path is interrupted unless a through hole is formed in the perforated plate. Means to completely shut off! /, Don't do that! /
- the mixed fluid supply facility of the present invention comprises:
- This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
- the cross-sectional area of the portion where the mixed fluid homogenizer is disposed in the flow path is made larger than the cross-sectional area on the upstream side and the cross-sectional area on the downstream side.
- Another mixed fluid supply facility of the present invention includes:
- This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
- the cross-sectional area 1S on the downstream side of the portion where the mixed fluid homogenizer is disposed in the flow path is larger than the cross-sectional area on the upstream side.
- Another mixed fluid supply facility of the present invention includes:
- This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
- the uniformity of mixing is improved by changing the aperture ratio of the through holes of the perforated plate according to the mixed state of the mixed gas detected by the gas property detecting device. Therefore, an appropriate aperture ratio can be selected.
- the gas property detecting device for example, a calorie measuring device or the like can be adopted.
- the uniformity of mixing is improved, and even if the flow rate and composition of the main fluid and the subfluid to be mixed are changed, the fluid mixing is uniform. Can be improved.
- FIG. 1 is a piping diagram showing an outline of a mixed fluid supply facility including a mixed fluid homogenizer according to an embodiment of the present invention.
- FIG. 2 is a longitudinal sectional view schematically showing one embodiment of a mixed fluid equalizing apparatus in the mixed fluid supply facility of FIG.
- Fig. 3 is a front view schematically showing another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of Fig. 1, and Fig. 3 (b) is a partial cross-sectional view thereof. It is a side view.
- FIG. 4 is a perspective view showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG.
- FIG. 5 is a cross-sectional view taken along line V—V in FIG.
- FIG. 6 is a longitudinal sectional view showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
- FIG. 7 (a), FIG. 7 (b), and FIG. 7 (c) are cross-sectional views showing a part of the perforated plate of the mixed fluid homogenizer of FIG.
- FIG. 8 is a perspective view showing a perforated plate of the mixed fluid homogenizer of FIG.
- FIG. 9 is a cross-sectional view taken along the line IX-IX in FIG.
- FIG. 10 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid equalizing apparatus in the mixed fluid supply facility of FIG. 1.
- FIG. 11 is a partially cutaway perspective view of the mixed fluid homogenizer of FIG.
- FIG. 12 is a cross-sectional view taken along line XII— of FIG.
- FIG. 13 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
- FIG. 14 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
- FIG. 15 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
- FIG. 16 is a perspective view showing an example of a perforated plate of the mixed fluid homogenizer of FIG.
- FIG. 17 is a perspective view showing another example of the perforated plate of the mixed fluid homogenizing apparatus of FIG.
- FIG. 1 shows a mixed fluid supply facility 1 according to an embodiment of the present invention.
- a gas supply source S such as a blast furnace or a direct reduction iron facility
- gas supply equipment that supplies a mixture of by-product gases, or a fuel gas that mixes an inert gas with these fuel gases as a heat-reducing gas, or mixes and supplies COG or the like as a heat-up gas
- the gas supply source S includes a processing step such as dust removal necessary for supplying the generated gas as fuel.
- the fluid supplied by the mixed fluid supply facility of the present invention is not limited to gas, and includes liquid, powder, slurry, and the like. In the embodiments described below, gas is exemplified.
- the mixed fluid supply facility 1 includes a main gas pipe 2 for supplying the main gas generated from the gas supply source S, and a heat reducing gas and a heat increasing gas connected to the main gas pipe 2.
- a mixed gas pipe 4 for supplying a mixed gas with the auxiliary gas, and a mixed fluid homogenizer (hereinafter also simply referred to as a homogenizer) 6 disposed in the mixed gas pipe 4 are provided.
- the secondary gas pipe 3 supplies the secondary gas in order to stabilize the changing properties of the main gas (for example, calorie fluctuation).
- the gas uniformly mixed by the homogenizer 6 is sent to a combustion device C such as a combustor of a gas turbine when it is a fuel gas.
- a combustion device C such as a combustor of a gas turbine when it is a fuel gas.
- Each of the pipes 2, 3, and 4 is not limited to a pipe having a circular cross section, and may be a pipe having an elliptical cross section or a polygonal cross section.
- the secondary gas pipe 3 two or more types of secondary gas may be supplied and mixed at the same mixing point 5 or multiple different secondary gas pipes may be connected to the main gas pipe 2 at different positions. It may be connected.
- a uniformity detecting device 7 for detecting the uniformity of the mixing of the mixed gas flowing inside may be installed downstream of the homogenizing device 6 in the mixed gas pipe 4.
- FIG. 2 shows the homogenizer 6.
- This homogenizer 6 has two perforated plates 8, Has nine. A large number of through holes 10 are formed in each of the perforated plates 8 and 9.
- the arrangement pitch of the through holes 10 is not limited, but it is preferable to form the through holes 10 with the same diameter and the same pitch because the aperture ratio described later can be easily adjusted.
- One perforated plate 8 has a shape that expands to the full flow path of the mixed gas pipe 4 (a shape that closes the flow path in the pipe if there is no through hole), and the outer periphery of the perforated plate 8 is the mixed gas pipe 4 It is fixed to the inner surface. This perforated plate 8 is called a fixed perforated plate 8.
- the fixed perforated plate 8 is formed in a shape corresponding to the cross-sectional shape of the flow path of the mixed gas pipe 4.
- the other perforated plate 9 is disposed in contact with the upstream surface of the fixed perforated plate 8, and is configured to be capable of reciprocating in the surface direction.
- This perforated plate 9 is called a movable perforated plate 9.
- a perforated plate moving device including a drive cylinder 11 such as a fluid pressure cylinder disposed outside the mixed gas pipe 4.
- the movable perforated plate 9 is reciprocated by the drive cylinder 11.
- the connecting rod 12 connecting the rod 11a of the drive cylinder 11 and the movable perforated plate 9 passes through the mixed gas pipe 4.
- a seal mechanism 13 is disposed in the portion of the pipe 4 through which the connecting rod 12 passes.
- the position of the movable perforated plate 9 is not limited to the upstream side of the fixed perforated plate 8, and may be disposed on the downstream side.
- the perforated plate moving device may adopt an electric motor or the like that is not limited to the fluid pressure cylinder.
- the position of the drive cylinder 11 is not limited to the lower side of the mixed gas pipe 4 as shown in the figure, and may be moved up and down with the movable perforated plate 9 suspended. Further, it may be arranged at any other position between the upper side and the lower side where the movable perforated plate 9 may be reciprocated in the horizontal direction by being arranged on the side of the mixed gas pipe 4.
- a portion of the mixed gas pipe 4 in which the homogenizer 6 is incorporated can be configured to be detachable from the mixed gas pipe 4.
- each of the perforated plates 8 and 9 the distance between the centers of the through holes 10 is equal to or larger than the diameter of the through holes 10. It is formed to become.
- the movable perforated plate 8 reciprocates a predetermined distance and is stopped at an arbitrary position therebetween, so that all the through holes 10 of both the perforated plates 8 and 9 coincide with each other and the through hole 10 Arbitrary position between the fully open position where the aperture ratio is 100% and the fully closed position where all the through holes 10 are closed without overlapping at all and the aperture ratio is 0% (arbitrary aperture ratio) Can be set to This point is apparent with reference to FIGS. 7 (a) and 7 (c) showing a homogenizer 16 having three perforated plates, which will be described later.
- the outer shape of the movable perforated plate 9 is made smaller than the outer shape of the fixed perforated plate 8, and the arrangement of the through holes 10 of both perforated plates 8 and 9 is performed.
- the cloth is in the same position.
- the state of the maximum aperture ratio is not particularly limited to a state where the entire area of the through hole 10 is 100%.
- a state where the total opening area is less than 100% may be set as the maximum opening state.
- the state of the minimum opening ratio is not particularly limited to the state of the opening ratio of 0% in which the entire area of the through hole 10 is closed.
- the state that exceeds 0% of the total area of the through hole (slightly open or closed) may be the minimum open state!
- the distance between the centers of the through holes 10 described above need not be greater than the diameter of the through holes 10 as described above.
- the aperture ratio of the perforated plates 8 and 9 can be changed as described above is that the aperture ratio is changed in accordance with the mixing condition of the main gas and the sub-gas, so that This is to ensure optimal mixing.
- a part of the mixed gas sent through the mixed gas pipe 4 is blocked by the perforated plates 8 and 9 to generate a flow component in a direction perpendicular to the central axis of the pipe.
- the mixed gas is further mixed.
- the mixed gas that passes through the perforated plates 8 and 9 is made more uniform by mixing due to the generation of diffusion vortices caused by the jet flow downstream from the through hole 10. By such a mechanism, the mixing of the mixed gas further proceeds and the mixing becomes uniform.
- a calorie detection device that detects the distribution of gas calories on the cross section of the gas flow path in the mixed gas pipe 4 is adopted. Also good. For that purpose, a large number of detectors 7a of the calorie detector 7 may be arranged almost uniformly on the cross section of the flow path.
- the detector 7a is not limited to one cross section, As such, they may be arranged on a plurality of cross sections.
- the calorie detection device 7 a so-called calorimeter that directly measures the calorie of gas, a device that measures the content (concentration) of combustible components, and the like are used. If importance is attached to the detection speed, it is now preferable to use a combustible gas concentration detector (gas component detector). Depending on the type of combustible component contained in the low calorie gas applied and the combustible component in which the main concentration fluctuation occurs (for example, by-product gas in the direct reduction iron method, the concentration of that component is detected) A concentration detector may be used. What is used as a uniformity detector is not limited to a calorie detector. For example, various devices can be adopted as long as they are suitable devices for detecting the properties of gas, such as a density detector for detecting the distribution of the specific gravity of the gas on the cross section of the gas flow path.
- a density detector for detecting the distribution of the specific gravity of the gas on the cross section of the gas flow path.
- An opening suitable for improving the uniformity of the mixing by changing the opening ratio of the through holes 10 of the perforated plates 8 and 9 according to the mixed state of the mixed gas detected by the calorie detecting device 7 Rate can be selected.
- a position detector 32 is installed to detect the expansion / contraction position of the cylinder rod 11a.
- the control device 30 has a table that relates the mixing ratio of the secondary gas (volume ratio of the secondary gas to the primary gas) and the optimum aperture ratio of the perforated plate corresponding to the secondary gas type as a parameter. It is remembered. Further, the position of the detected portion of the cylinder rod 11a up to the fully closed position with the fully opened position of the movable perforated plate 8 as a reference is stored. In addition, the supply amount of hydraulic oil necessary for the movement of the perforated plate between the fully open position and the fully closed position is stored.
- the control device 30 selects a heat reducing gas so that the measured caloric value of the main gas does not exceed the allowable upper limit value of the combustion device, and at the same time calculates the necessary mixing amount and displays the auxiliary gas supply device (not shown). )). In addition, the control device 30 selects the heat increasing gas so that the measured caloric value of the main gas does not fall below the allowable lower limit value, and simultaneously calculates the necessary amount of mixture and issues a command to the auxiliary gas supply device. When multiple types of gas are prepared as the heat increasing gas and the heat reducing gas, an appropriate gas is selected according to a predetermined standard, and the gas The required mixing amount is calculated.
- the optimum aperture ratio of the perforated plate according to the mixing amount of the sub gas with respect to the amount of the main gas is read from the above table, and the movement amount of the movable perforated plate 9 is calculated based on the value, and correspondingly
- the target opening ratio of the perforated plate is realized by controlling the amount of hydraulic oil supplied to the cylinder. For example, if the mixing ratio of the secondary gas is small, the aperture ratio is reduced. It is preferable to set the period for measuring the difference between the force loli value of the mixed gas and the target calorie value longer than the calorie value detection time.
- this uniformity detector 7 may be used mainly as a means for monitoring uniformity.
- a portion of the mixed gas pipe 4 in which the uniformity detecting device 7 is built can be configured to be detachable from the mixed gas pipe 4. This can be achieved by adopting a pipe joint such as a flange in the same manner as the attaching / detaching mechanism of the homogenizer 6 described above. This facilitates maintenance and calibration of the uniformity detector 7.
- the shape of the through hole 10 is not limited to a perfect circle, and may be an ellipse, a polygon including a square, a rectangle, or the like.
- a long through hole 20 as shown in FIG. 3 can also be employed.
- the long through-hole 20 extends in a direction perpendicular to the moving direction of the movable perforated plate 9, and a plurality of force points are formed at intervals in the moving direction of the movable perforated plate 9.
- the intervals between the through holes 20 are preferably equal.
- FIG. 3 (a) only the through hole 20 of the movable perforated plate 9 can be seen.
- the fixed perforated plate 8 is also formed with a plurality of through holes having the same size and the same shape.
- the opening area thereof is the mixed gas pipe. It becomes smaller than the cross-sectional area of 4 channels.
- the section of the mixed gas pipe 4 where the homogenizer 6 is installed has a larger cross-sectional area than the upstream and downstream portions. That is, since the mixed gas pipe 4 of this embodiment has a circular cross section, the pipe diameter is enlarged. As a result, the actual area of the perforated plates 8 and 9 is increased. Accordingly, the entire opening area of the perforated plates 8 and 9 when fully opened is widened, and can be equal to or larger than the flow path cross-sectional area of the mixed gas pipe 4 on the upstream side and the downstream side.
- the diameter of the expanded mixed gas pipe 4 is the same before and after the homogenizer 6, but it is not limited to this configuration. It is also an option to make the tube diameter immediately after (downstream) the homogenizer 6 larger than the tube diameter immediately before (upstream). In this way, since the mixed gas expands and diffuses immediately after passing through the homogenizer 6, it can be expected that the mixing effect is further improved.
- the opening area is further increased by making the perforated plates 8 and 9 into a shape that can be installed in a state of being inclined with respect to a plane perpendicular to the central axis of the mixed gas pipe 4. It can be made.
- the shape of the mixed gas pipe 4 By making the shape of the mixed gas pipe 4 to fill the entire flow path (ellipse) with the perforated plates 8 and 9 inclined, the actual area can be increased and the number of through-holes 10 formed can be increased. Because. For example, if through holes 10 of the same size and shape are formed at the same pitch, and if the perforated plates 8 and 9 are inclined by an angle ⁇ from the surface perpendicular to the central axis of the mixed gas pipe 4, the perforations are formed. Since the actual area of the plate is lZcos ⁇ times, the number of through holes 10 is almost lZcos ⁇ times, and the overall opening area is the same.
- the perforation direction of the through hole 10 with respect to the perforated plates 8 and 9 is the center axis direction (fluid flow direction) of the mixed gas pipe 4 as shown in FIG. This is preferable because the resistance is reduced.
- the machining cost will increase because the holes are drilled in a direction inclined with respect to the direction perpendicular to the surface of the punch plate. Therefore, if it is important to reduce the processing cost, it may be perforated in a direction perpendicular to the surface of the perforated plates 8 and 9.
- the fixed perforated plate 8 is provided with a guide member 14 for guiding the movement of the movable perforated plate 9.
- This guide member 14 is a member having an L-shaped cross section installed on both side portions (both ends in the moving direction of the movable perforated plate 9) on the surface of the fixed perforated plate 8 on the movable perforated plate 9 side.
- the movable perforated plate 9 has guide members 14 and fixed perforated plates on both sides. The sliding is guided by engaging between the two. Note that the fixed perforated plate 8 and the movable perforated plate 9 in FIG. 4 are shown in a state where their surfaces are arranged vertically, that is, in a state where they are arranged perpendicular to the center axis of the mixed gas pipe 4. RU
- FIG. 4 shows in detail the connecting portion between the rod 11a of the drive cylinder 11 and the movable perforated plate 9 described above.
- the connecting rod 12 is fixed to the movable perforated plate 9, and the connecting rod 12 and the cylinder rod 11a are pin-coupled. This is an example and does not exclude other coupling mechanisms.
- the sealing mechanism 13 is not shown.
- FIGS. 6 to 9 show a homogenizer 16 that also has three punching plate forces.
- a single movable perforated plate 9 is slidably disposed between two fixed perforated plates 8 arranged in parallel at a distance by interposing a spacer 15. It is a thing.
- the two fixed perforated plates 8 are spaced with the same dimension as the thickness of the movable perforated plate 9.
- the through holes 10 of the three perforated plates 8 and 9 are formed in the same size, the same shape and the same arrangement as described above.
- the two fixed perforated plates 8 may be arranged so that their through holes 10 face each other as shown. As a result, as shown in FIG.
- the spacers 15 are disposed on both sides between the two fixed perforated plates 9, and the spacing between the spacers 15 is almost the same as the movable perforated plates. It is the same as the width dimension of 9. Due to the powerful configuration, the spacer 15 and the two fixed perforated plates 8 function as a guide member for the movable perforated plate 9.
- the movable perforated plate 9 is held by the two fixed perforated plates 8 on both sides thereof, the thickness of the movable perforated plate 9 can be reduced because there is no concern about pinching. As a result, the weight of the perforated plate is reduced, the drive mechanism can be simplified, and the aperture ratio setting accuracy can be improved.
- the arrangement of the through holes is not limited to the grid pattern (Figs. 4 and 8) or the upper and lower multi-stage arrangement (Fig. 3) as described above.
- through holes arranged on a plurality of concentric and equally spaced virtual circles can also be employed.
- the movable perforated plate 8 may be configured to rotate around the center of the virtual circle. Accordingly, the through holes are arranged at equal intervals on each virtual circle, but the arrangement intervals are made smaller as the through holes are on the virtual circle closer to the center.
- FIGS. 10 to 12 in the downstream side of the perforated plates 8 and 9, a cleaning device 17 for cleaning the through holes 10 of the perforated plates 8 and 9 between the perforated plates 8 and 9 is shown.
- a homogenizer 26 with is shown.
- the cleaning device 17 of the present embodiment is provided with a plurality of cleaning liquid supply pipes 18 that are substantially opposed to the downstream surface of the movable perforated plate 9 and that extend in a substantially horizontal direction with an interval between the upper and lower sides.
- Each cleaning liquid supply pipe 18 is provided with a plurality of spray nozzles 19 at intervals.
- the cleaning liquid supply pipe 18 is split into a plurality of lines as described above.
- Each branch pipe 18 is attached to the mixed gas pipe 4 by a flange joint 27, and its downstream end is closed by a closing plug 28.
- An on-off valve 29 is installed in the upstream portion of the cleaning liquid supply pipe 18. The on-off valve 29 may be automatically opened and closed intermittently during the period when the supply of the mixed fluid is stopped. In FIG. 11, the guide member 14 and the drive cylinder 11 are not shown.
- the number of the injection nozzles 19 is preferably the same as the number of the through holes 10 and correspond to the through holes 10 on a one-to-one basis.
- the configuration is not particularly limited.
- the cleaning liquid is sprayed from each nozzle 19 over a relatively wide range, and the nozzles are arranged so that the cleaning liquid is sprayed into many through holes including the uppermost through hole 10. That's fine.
- the cleaning effect is also exhibited by the fact that the cleaning liquid flows down on the perforated plates 8 and 9. Further, it is easy to individually rotate a plurality of cleaning liquid supply pipes 18 around the central axis thereof, thereby making it possible to change the direction of the nozzle 19 in the vertical direction.
- the mixed gas pipe 4 may be provided with an inspection window so that the cleaning device 17 and the perforated plates 8 and 9 can be visually confirmed. Thereby, as a result of confirming the cleaning state, the direction of the nozzle 19 can be changed by rotating the cleaning liquid supply pipe 18 so that the spraying angle of the cleaning liquid is optimized as necessary.
- the number of the injection nozzles 19 to be installed is not limited. Spray cleaning liquid over a wide area One nozzle that can be used may be employed. In this case, only one cleaning liquid supply pipe 18 is provided. A collecting groove 33 is formed in the bottom of the mixed gas pipe 4 in the vicinity of the cleaning device 17 to collect the cleaning liquid after cleaning. It is also possible to form.
- the installation position of the cleaning device 17 is not limited to the downstream side of the perforated plates 8, 9, and may be on the upstream side or on both the upstream and downstream sides.
- the perforated plates 8 and 9 shown in the figure are erected in the vertical direction. However, when the perforated plates 8 and 9 are inclined as shown in FIGS. 2 and 6, the cleaning device 17 is placed on the upper surface side (FIG. 2). It is preferable to install it on the right side of the perforated plate in FIG. This is because the cleaning effect is improved by the sprayed cleaning liquid flowing down on the surface of the perforated plate as compared with the case where it is installed on the lower surface side.
- the cleaning device 17 By providing the cleaning device 17, it is possible to prevent dust or the like from adhering to the perforated plate and its through-holes to increase the flow resistance or generate a so-called stick of the perforated plate. it can. Thereby, when the operation of the mixed fluid supply facility 1 is stopped, it is not necessary for an operator to enter the pipeline for cleaning the homogenizer 6, or the frequency can be greatly reduced.
- the portion of the mixed gas pipe 4 in which the cleaning device 17 is built can be attached to and detached from the other mixed gas pipe 4 by adopting a pipe joint such as a flange. Can be configured. By doing so, the maintenance of the cleaning device 17 becomes easy.
- FIG. 13 shows a mixed gas pipe 21 of another embodiment.
- the mixed gas pipe 21 is connected by a short pipe 2 lc perpendicular to the ends 21a and 21b of two pipes 21a and 21b extending in parallel.
- the reason for this configuration is to sufficiently expand the flow channel area of the mixed gas pipe 21c in the homogenizer 6 with a simple configuration.
- the two pipes 21a and 21b may be arranged in parallel in the horizontal direction. However, if the pipes 21a and 21b are arranged in parallel in the vertical direction as shown in the figure, the short pipe 21c extends in the vertical direction, and the perforated plate 8 9 is preferable because the surface is arranged to be almost horizontal.
- the mixed gas pipe 21 is a mixed fluid as shown in the figure. Is not limited to a mode in which the flow of the pressure is directed from the bottom to the top of the homogenizer 6, but the upstream pipe 21a of the homogenizer 6 is arranged above 2 lb of the downstream pipe so that the mixed fluid becomes uniform. 6 You can make it flow from top to bottom.
- the two pipes 21a and 21b are not connected to each other by the short pipe 21c perpendicular to the two pipes 21a and 21b as described above.
- the short pipe 21d that is, the short pipe 21d extending in an obtuse angle with respect to the central axis of the two pipes 21a and 21b may be connected.
- the perforated plates 8 and 9 are arranged obliquely with respect to the central axis of the inclined short pipe 21d.
- the actual area of the plates 8 and 9 increases, and the fluid resistance due to the perforated plates 8 and 9 decreases.
- the homogenizers 6, 16 described above have an excellent function other than homogenizing the mixing of the mixed gas. This function is demonstrated by installing it in a pipe that supplies fuel gas to a combustion device such as a gas turbine. When an emergency stop of the combustion device, the emergency shut-off valve installed in the fuel gas supply pipe is closed to stop the supply of fuel gas instantaneously. Then, sudden pressure fluctuations tend to propagate toward the upstream side of the fuel gas supply piping due to sudden momentum changes in the fuel gas flow. At this time, the pressure propagation is suppressed or suppressed by reducing the aperture ratio of the homogenizers 6 and 16 rapidly or to zero in a timely manner. As a result, a force that can eliminate the need for a surge tank and an atmospheric diffusion tower, at least, can be achieved with these small capacities.
- FIGS. 15 to 17 show another embodiment in which a perforated plate is used to suppress and prevent the propagation of sudden pressure fluctuations directed from the downstream side to the upstream side of the pipe.
- This embodiment comprises a single rotary perforated plate 22 that can rotate about a virtual straight line passing through its center. Since the pipe 23 shown in FIG. 15 has a circular cross section, the rotary perforated plate has a circular shape as shown in FIG. Of course, the shape is not limited to a circle, and the shape may be selected in accordance with the cross-sectional shape of the pipe, for example, a quadrangular rotating perforated plate 24 shown in FIG. However, it does not have to be the same shape as the section cut by a plane perpendicular to the central axis of the pipe.
- the surface force perpendicular to the central axis of the pipe may be the same shape as the cross-sectional shape inclined forward and backward.
- all through holes 10 In order to increase the opening area of the pipe 23, the diameter of the pipe 23 may be enlarged at the portion where the rotary perforated plate 22 is installed.
- the shape of the through hole 10 is not limited to a perfect circle, but may be an ellipse, a polygon including a square, a rectangle, or the like, as in the homogenizers 6 and 16 described above.
- a rotary shaft 25 that protrudes in the lateral direction through the pipe passes through the centers of the rotary perforated plates 22 and 24.
- the rotary shaft 25 is connected to a rotary drive machine (not shown) installed outside the pipe 23.
- a rotary drive machine for example, an electric motor, a fluid pressure cylinder, or the like can be adopted as the rotary drive machine.
- the position that closes the flow path which is called the fully closed position, and the position whose surface is along the central axis of the pipe (the position indicated by the two-dot chain line in FIG. Can be rotated between. And configure it to stop at the fully open position, the fully closed position, and any angular position between them.
- the rotary perforated plates 22 and 24 are configured to rotate around a horizontal axis, but are not limited thereto. For example, it may be rotated around an arbitrary rotation axis between horizontal and vertical, which may be rotated around the vertical axis.
- a rotation position detection device for detecting the stop position of the rotating perforated plates 22 and 24 may be installed so that the rotating perforated plate can stop at an appropriate position to check whether the force is sufficient. .
- the rotary perforated plates 22 and 24 are fully opened when the combustion apparatus is operating normally so as not to give a large resistance to the flow of fuel gas.
- the rotary perforated plates 22, 24 rotate rapidly and are fully closed. To the position.
- the fluid flow path finally becomes only the through hole 10 of the rotary perforated plate, the flow resistance in the pipe 23 suddenly increases, pressure fluctuation is attenuated, and its propagation is suppressed.
- the rotating perforated plates 22 and 24 can be used as a mixing and homogenizing device for a mixed fluid other than the above purpose.
- a gas turbine is exemplified as the combustion equipment.
- the application of the present invention is not particularly limited to the gas turbine.
- a thermal boiler as a combustion facility
- An internal combustion engine such as a diesel engine or a gas engine may be used.
- the homogenizing device of the present invention can be applied to a combustion facility that can maintain combustion if fluctuations in heat input are within a certain range.
- the uniformity of the fluid mixture supplied can be improved regardless of whether or not the existing mixer is installed.
- gas is exemplified as the application target fluid of the homogenizer, it is not limited to only the gas that is generated. It can also be applied to liquid supply facilities. Furthermore, it can be applied to supply equipment for powders and slurries.
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Abstract
Description
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Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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PCT/JP2005/013665 WO2007013143A1 (ja) | 2005-07-26 | 2005-07-26 | 混合流体の均一化装置および混合流体供給設備 |
BRPI0520522A BRPI0520522B1 (pt) | 2005-07-26 | 2005-07-26 | dispositivo misto para uniformizar um fluido . |
JP2007526769A JP4684295B2 (ja) | 2005-07-26 | 2005-07-26 | 混合流体の均一化装置および混合流体供給設備 |
CN2005800491106A CN101142012B (zh) | 2005-07-26 | 2005-07-26 | 混合流体的均匀化装置以及混合流体供给设备 |
KR1020077021473A KR100961016B1 (ko) | 2005-07-26 | 2005-07-26 | 혼합유체의 균일화장치 및 혼합유체 공급설비 |
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KR (1) | KR100961016B1 (ja) |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US10269558B2 (en) | 2016-12-22 | 2019-04-23 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
US10867788B2 (en) | 2016-12-28 | 2020-12-15 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
US11390950B2 (en) | 2017-01-10 | 2022-07-19 | Asm Ip Holding B.V. | Reactor system and method to reduce residue buildup during a film deposition process |
US10468261B2 (en) | 2017-02-15 | 2019-11-05 | Asm Ip Holding B.V. | Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures |
US10529563B2 (en) | 2017-03-29 | 2020-01-07 | Asm Ip Holdings B.V. | Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures |
KR102457289B1 (ko) | 2017-04-25 | 2022-10-21 | 에이에스엠 아이피 홀딩 비.브이. | 박막 증착 방법 및 반도체 장치의 제조 방법 |
US10892156B2 (en) | 2017-05-08 | 2021-01-12 | Asm Ip Holding B.V. | Methods for forming a silicon nitride film on a substrate and related semiconductor device structures |
US10770286B2 (en) | 2017-05-08 | 2020-09-08 | Asm Ip Holdings B.V. | Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures |
US10886123B2 (en) | 2017-06-02 | 2021-01-05 | Asm Ip Holding B.V. | Methods for forming low temperature semiconductor layers and related semiconductor device structures |
US12040200B2 (en) | 2017-06-20 | 2024-07-16 | Asm Ip Holding B.V. | Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus |
US11306395B2 (en) | 2017-06-28 | 2022-04-19 | Asm Ip Holding B.V. | Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus |
KR20190009245A (ko) | 2017-07-18 | 2019-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 소자 구조물 형성 방법 및 관련된 반도체 소자 구조물 |
US11374112B2 (en) | 2017-07-19 | 2022-06-28 | Asm Ip Holding B.V. | Method for depositing a group IV semiconductor and related semiconductor device structures |
US11018002B2 (en) | 2017-07-19 | 2021-05-25 | Asm Ip Holding B.V. | Method for selectively depositing a Group IV semiconductor and related semiconductor device structures |
US10541333B2 (en) | 2017-07-19 | 2020-01-21 | Asm Ip Holding B.V. | Method for depositing a group IV semiconductor and related semiconductor device structures |
JP7120802B2 (ja) * | 2017-07-20 | 2022-08-17 | 株式会社神戸製鋼所 | 流体流通装置及びその流通異常検知方法 |
US10590535B2 (en) | 2017-07-26 | 2020-03-17 | Asm Ip Holdings B.V. | Chemical treatment, deposition and/or infiltration apparatus and method for using the same |
US10692741B2 (en) | 2017-08-08 | 2020-06-23 | Asm Ip Holdings B.V. | Radiation shield |
US10770336B2 (en) | 2017-08-08 | 2020-09-08 | Asm Ip Holding B.V. | Substrate lift mechanism and reactor including same |
US11769682B2 (en) | 2017-08-09 | 2023-09-26 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
US11139191B2 (en) | 2017-08-09 | 2021-10-05 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
US11830730B2 (en) | 2017-08-29 | 2023-11-28 | Asm Ip Holding B.V. | Layer forming method and apparatus |
US11056344B2 (en) | 2017-08-30 | 2021-07-06 | Asm Ip Holding B.V. | Layer forming method |
US11295980B2 (en) | 2017-08-30 | 2022-04-05 | Asm Ip Holding B.V. | Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures |
KR102491945B1 (ko) | 2017-08-30 | 2023-01-26 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR102401446B1 (ko) | 2017-08-31 | 2022-05-24 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR102630301B1 (ko) | 2017-09-21 | 2024-01-29 | 에이에스엠 아이피 홀딩 비.브이. | 침투성 재료의 순차 침투 합성 방법 처리 및 이를 이용하여 형성된 구조물 및 장치 |
US10844484B2 (en) | 2017-09-22 | 2020-11-24 | Asm Ip Holding B.V. | Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods |
US10658205B2 (en) | 2017-09-28 | 2020-05-19 | Asm Ip Holdings B.V. | Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber |
US10403504B2 (en) | 2017-10-05 | 2019-09-03 | Asm Ip Holding B.V. | Method for selectively depositing a metallic film on a substrate |
US10923344B2 (en) | 2017-10-30 | 2021-02-16 | Asm Ip Holding B.V. | Methods for forming a semiconductor structure and related semiconductor structures |
US10910262B2 (en) | 2017-11-16 | 2021-02-02 | Asm Ip Holding B.V. | Method of selectively depositing a capping layer structure on a semiconductor device structure |
US11022879B2 (en) | 2017-11-24 | 2021-06-01 | Asm Ip Holding B.V. | Method of forming an enhanced unexposed photoresist layer |
JP7206265B2 (ja) | 2017-11-27 | 2023-01-17 | エーエスエム アイピー ホールディング ビー.ブイ. | クリーン・ミニエンバイロメントを備える装置 |
WO2019103613A1 (en) | 2017-11-27 | 2019-05-31 | Asm Ip Holding B.V. | A storage device for storing wafer cassettes for use with a batch furnace |
US10872771B2 (en) | 2018-01-16 | 2020-12-22 | Asm Ip Holding B. V. | Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures |
KR102695659B1 (ko) | 2018-01-19 | 2024-08-14 | 에이에스엠 아이피 홀딩 비.브이. | 플라즈마 보조 증착에 의해 갭 충진 층을 증착하는 방법 |
TWI799494B (zh) | 2018-01-19 | 2023-04-21 | 荷蘭商Asm 智慧財產控股公司 | 沈積方法 |
US11018047B2 (en) | 2018-01-25 | 2021-05-25 | Asm Ip Holding B.V. | Hybrid lift pin |
USD880437S1 (en) | 2018-02-01 | 2020-04-07 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
US11081345B2 (en) | 2018-02-06 | 2021-08-03 | Asm Ip Holding B.V. | Method of post-deposition treatment for silicon oxide film |
US10896820B2 (en) | 2018-02-14 | 2021-01-19 | Asm Ip Holding B.V. | Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process |
WO2019158960A1 (en) | 2018-02-14 | 2019-08-22 | Asm Ip Holding B.V. | A method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process |
KR102636427B1 (ko) | 2018-02-20 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 및 장치 |
US10975470B2 (en) * | 2018-02-23 | 2021-04-13 | Asm Ip Holding B.V. | Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment |
US11473195B2 (en) | 2018-03-01 | 2022-10-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus and a method for processing a substrate |
US11629406B2 (en) | 2018-03-09 | 2023-04-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate |
US11114283B2 (en) | 2018-03-16 | 2021-09-07 | Asm Ip Holding B.V. | Reactor, system including the reactor, and methods of manufacturing and using same |
KR102646467B1 (ko) | 2018-03-27 | 2024-03-11 | 에이에스엠 아이피 홀딩 비.브이. | 기판 상에 전극을 형성하는 방법 및 전극을 포함하는 반도체 소자 구조 |
US11088002B2 (en) | 2018-03-29 | 2021-08-10 | Asm Ip Holding B.V. | Substrate rack and a substrate processing system and method |
US11230766B2 (en) | 2018-03-29 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR102501472B1 (ko) | 2018-03-30 | 2023-02-20 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 |
TWI843623B (zh) | 2018-05-08 | 2024-05-21 | 荷蘭商Asm Ip私人控股有限公司 | 藉由循環沉積製程於基板上沉積氧化物膜之方法及相關裝置結構 |
US12025484B2 (en) | 2018-05-08 | 2024-07-02 | Asm Ip Holding B.V. | Thin film forming method |
TW202349473A (zh) | 2018-05-11 | 2023-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 用於基板上形成摻雜金屬碳化物薄膜之方法及相關半導體元件結構 |
KR102596988B1 (ko) | 2018-05-28 | 2023-10-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 및 그에 의해 제조된 장치 |
US11718913B2 (en) | 2018-06-04 | 2023-08-08 | Asm Ip Holding B.V. | Gas distribution system and reactor system including same |
TWI840362B (zh) | 2018-06-04 | 2024-05-01 | 荷蘭商Asm Ip私人控股有限公司 | 水氣降低的晶圓處置腔室 |
US11286562B2 (en) | 2018-06-08 | 2022-03-29 | Asm Ip Holding B.V. | Gas-phase chemical reactor and method of using same |
US10797133B2 (en) | 2018-06-21 | 2020-10-06 | Asm Ip Holding B.V. | Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures |
KR102568797B1 (ko) | 2018-06-21 | 2023-08-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 시스템 |
US11499222B2 (en) | 2018-06-27 | 2022-11-15 | Asm Ip Holding B.V. | Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material |
TW202409324A (zh) | 2018-06-27 | 2024-03-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於形成含金屬材料之循環沉積製程 |
US10612136B2 (en) | 2018-06-29 | 2020-04-07 | ASM IP Holding, B.V. | Temperature-controlled flange and reactor system including same |
KR102686758B1 (ko) | 2018-06-29 | 2024-07-18 | 에이에스엠 아이피 홀딩 비.브이. | 박막 증착 방법 및 반도체 장치의 제조 방법 |
US10388513B1 (en) | 2018-07-03 | 2019-08-20 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US10755922B2 (en) | 2018-07-03 | 2020-08-25 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US11053591B2 (en) | 2018-08-06 | 2021-07-06 | Asm Ip Holding B.V. | Multi-port gas injection system and reactor system including same |
US10883175B2 (en) | 2018-08-09 | 2021-01-05 | Asm Ip Holding B.V. | Vertical furnace for processing substrates and a liner for use therein |
US11430674B2 (en) | 2018-08-22 | 2022-08-30 | Asm Ip Holding B.V. | Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods |
US11024523B2 (en) | 2018-09-11 | 2021-06-01 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
TWI728456B (zh) | 2018-09-11 | 2021-05-21 | 荷蘭商Asm Ip私人控股有限公司 | 相對於基板的薄膜沉積方法 |
US11049751B2 (en) | 2018-09-14 | 2021-06-29 | Asm Ip Holding B.V. | Cassette supply system to store and handle cassettes and processing apparatus equipped therewith |
CN110970344A (zh) | 2018-10-01 | 2020-04-07 | Asm Ip控股有限公司 | 衬底保持设备、包含所述设备的系统及其使用方法 |
US11232963B2 (en) | 2018-10-03 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR102592699B1 (ko) | 2018-10-08 | 2023-10-23 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 유닛 및 이를 포함하는 박막 증착 장치와 기판 처리 장치 |
CN109098028B (zh) * | 2018-10-15 | 2019-08-16 | 维达纸业(浙江)有限公司 | 一种纸机真空吸水箱面板及其改造方法 |
KR102546322B1 (ko) | 2018-10-19 | 2023-06-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 및 기판 처리 방법 |
KR102605121B1 (ko) | 2018-10-19 | 2023-11-23 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 및 기판 처리 방법 |
USD948463S1 (en) | 2018-10-24 | 2022-04-12 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate supporting apparatus |
US11087997B2 (en) | 2018-10-31 | 2021-08-10 | Asm Ip Holding B.V. | Substrate processing apparatus for processing substrates |
KR20200051105A (ko) | 2018-11-02 | 2020-05-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 유닛 및 이를 포함하는 기판 처리 장치 |
US11572620B2 (en) | 2018-11-06 | 2023-02-07 | Asm Ip Holding B.V. | Methods for selectively depositing an amorphous silicon film on a substrate |
US11031242B2 (en) | 2018-11-07 | 2021-06-08 | Asm Ip Holding B.V. | Methods for depositing a boron doped silicon germanium film |
CN109448507A (zh) * | 2018-11-15 | 2019-03-08 | 安徽徽煌教育科技有限公司 | 一种地理教学用洋流演示装置 |
US10847366B2 (en) | 2018-11-16 | 2020-11-24 | Asm Ip Holding B.V. | Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process |
US10818758B2 (en) | 2018-11-16 | 2020-10-27 | Asm Ip Holding B.V. | Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures |
US12040199B2 (en) | 2018-11-28 | 2024-07-16 | Asm Ip Holding B.V. | Substrate processing apparatus for processing substrates |
US11217444B2 (en) | 2018-11-30 | 2022-01-04 | Asm Ip Holding B.V. | Method for forming an ultraviolet radiation responsive metal oxide-containing film |
KR102636428B1 (ko) | 2018-12-04 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치를 세정하는 방법 |
US11158513B2 (en) | 2018-12-13 | 2021-10-26 | Asm Ip Holding B.V. | Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures |
JP7504584B2 (ja) | 2018-12-14 | 2024-06-24 | エーエスエム・アイピー・ホールディング・ベー・フェー | 窒化ガリウムの選択的堆積を用いてデバイス構造体を形成する方法及びそのためのシステム |
TWI819180B (zh) | 2019-01-17 | 2023-10-21 | 荷蘭商Asm 智慧財產控股公司 | 藉由循環沈積製程於基板上形成含過渡金屬膜之方法 |
KR20200091543A (ko) | 2019-01-22 | 2020-07-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
CN111524788B (zh) | 2019-02-01 | 2023-11-24 | Asm Ip私人控股有限公司 | 氧化硅的拓扑选择性膜形成的方法 |
TWI845607B (zh) | 2019-02-20 | 2024-06-21 | 荷蘭商Asm Ip私人控股有限公司 | 用來填充形成於基材表面內之凹部的循環沉積方法及設備 |
KR102626263B1 (ko) | 2019-02-20 | 2024-01-16 | 에이에스엠 아이피 홀딩 비.브이. | 처리 단계를 포함하는 주기적 증착 방법 및 이를 위한 장치 |
TW202044325A (zh) | 2019-02-20 | 2020-12-01 | 荷蘭商Asm Ip私人控股有限公司 | 填充一基板之一表面內所形成的一凹槽的方法、根據其所形成之半導體結構、及半導體處理設備 |
TWI838458B (zh) | 2019-02-20 | 2024-04-11 | 荷蘭商Asm Ip私人控股有限公司 | 用於3d nand應用中之插塞填充沉積之設備及方法 |
TWI842826B (zh) | 2019-02-22 | 2024-05-21 | 荷蘭商Asm Ip私人控股有限公司 | 基材處理設備及處理基材之方法 |
KR20200108243A (ko) | 2019-03-08 | 2020-09-17 | 에이에스엠 아이피 홀딩 비.브이. | SiOC 층을 포함한 구조체 및 이의 형성 방법 |
KR20200108242A (ko) | 2019-03-08 | 2020-09-17 | 에이에스엠 아이피 홀딩 비.브이. | 실리콘 질화물 층을 선택적으로 증착하는 방법, 및 선택적으로 증착된 실리콘 질화물 층을 포함하는 구조체 |
US11742198B2 (en) | 2019-03-08 | 2023-08-29 | Asm Ip Holding B.V. | Structure including SiOCN layer and method of forming same |
KR20200116033A (ko) | 2019-03-28 | 2020-10-08 | 에이에스엠 아이피 홀딩 비.브이. | 도어 개방기 및 이를 구비한 기판 처리 장치 |
KR20200116855A (ko) | 2019-04-01 | 2020-10-13 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 소자를 제조하는 방법 |
KR20200123380A (ko) | 2019-04-19 | 2020-10-29 | 에이에스엠 아이피 홀딩 비.브이. | 층 형성 방법 및 장치 |
KR20200125453A (ko) | 2019-04-24 | 2020-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 기상 반응기 시스템 및 이를 사용하는 방법 |
CN109991302B (zh) * | 2019-04-30 | 2022-02-08 | 广东赛能科技股份有限公司 | 一种水体氧化还原电位在线测定装置与方法 |
KR20200130118A (ko) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 비정질 탄소 중합체 막을 개질하는 방법 |
KR20200130121A (ko) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 딥 튜브가 있는 화학물질 공급원 용기 |
KR20200130652A (ko) | 2019-05-10 | 2020-11-19 | 에이에스엠 아이피 홀딩 비.브이. | 표면 상에 재료를 증착하는 방법 및 본 방법에 따라 형성된 구조 |
JP2020188255A (ja) | 2019-05-16 | 2020-11-19 | エーエスエム アイピー ホールディング ビー.ブイ. | ウェハボートハンドリング装置、縦型バッチ炉および方法 |
JP2020188254A (ja) | 2019-05-16 | 2020-11-19 | エーエスエム アイピー ホールディング ビー.ブイ. | ウェハボートハンドリング装置、縦型バッチ炉および方法 |
USD975665S1 (en) | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
USD947913S1 (en) | 2019-05-17 | 2022-04-05 | Asm Ip Holding B.V. | Susceptor shaft |
USD935572S1 (en) | 2019-05-24 | 2021-11-09 | Asm Ip Holding B.V. | Gas channel plate |
USD922229S1 (en) | 2019-06-05 | 2021-06-15 | Asm Ip Holding B.V. | Device for controlling a temperature of a gas supply unit |
KR20200141002A (ko) | 2019-06-06 | 2020-12-17 | 에이에스엠 아이피 홀딩 비.브이. | 배기 가스 분석을 포함한 기상 반응기 시스템을 사용하는 방법 |
KR20200143254A (ko) | 2019-06-11 | 2020-12-23 | 에이에스엠 아이피 홀딩 비.브이. | 개질 가스를 사용하여 전자 구조를 형성하는 방법, 상기 방법을 수행하기 위한 시스템, 및 상기 방법을 사용하여 형성되는 구조 |
USD944946S1 (en) | 2019-06-14 | 2022-03-01 | Asm Ip Holding B.V. | Shower plate |
USD931978S1 (en) | 2019-06-27 | 2021-09-28 | Asm Ip Holding B.V. | Showerhead vacuum transport |
KR20210005515A (ko) | 2019-07-03 | 2021-01-14 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치용 온도 제어 조립체 및 이를 사용하는 방법 |
JP7499079B2 (ja) | 2019-07-09 | 2024-06-13 | エーエスエム・アイピー・ホールディング・ベー・フェー | 同軸導波管を用いたプラズマ装置、基板処理方法 |
CN112216646A (zh) | 2019-07-10 | 2021-01-12 | Asm Ip私人控股有限公司 | 基板支撑组件及包括其的基板处理装置 |
KR20210010307A (ko) | 2019-07-16 | 2021-01-27 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR20210010816A (ko) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 라디칼 보조 점화 플라즈마 시스템 및 방법 |
KR20210010820A (ko) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 실리콘 게르마늄 구조를 형성하는 방법 |
US11643724B2 (en) | 2019-07-18 | 2023-05-09 | Asm Ip Holding B.V. | Method of forming structures using a neutral beam |
TWI839544B (zh) | 2019-07-19 | 2024-04-21 | 荷蘭商Asm Ip私人控股有限公司 | 形成形貌受控的非晶碳聚合物膜之方法 |
KR102083387B1 (ko) * | 2019-07-29 | 2020-03-04 | (주)화인테크워터 | 내구성이 향상된 토양미생물 활성용 충진제 |
CN112309843A (zh) | 2019-07-29 | 2021-02-02 | Asm Ip私人控股有限公司 | 实现高掺杂剂掺入的选择性沉积方法 |
CN112309899A (zh) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112309900A (zh) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | 基板处理设备 |
US11587814B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11227782B2 (en) | 2019-07-31 | 2022-01-18 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11587815B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
CN118422165A (zh) | 2019-08-05 | 2024-08-02 | Asm Ip私人控股有限公司 | 用于化学源容器的液位传感器 |
USD965044S1 (en) | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
USD965524S1 (en) | 2019-08-19 | 2022-10-04 | Asm Ip Holding B.V. | Susceptor support |
JP2021031769A (ja) | 2019-08-21 | 2021-03-01 | エーエスエム アイピー ホールディング ビー.ブイ. | 成膜原料混合ガス生成装置及び成膜装置 |
USD930782S1 (en) | 2019-08-22 | 2021-09-14 | Asm Ip Holding B.V. | Gas distributor |
USD979506S1 (en) | 2019-08-22 | 2023-02-28 | Asm Ip Holding B.V. | Insulator |
USD949319S1 (en) | 2019-08-22 | 2022-04-19 | Asm Ip Holding B.V. | Exhaust duct |
USD940837S1 (en) | 2019-08-22 | 2022-01-11 | Asm Ip Holding B.V. | Electrode |
KR20210024423A (ko) | 2019-08-22 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 홀을 구비한 구조체를 형성하기 위한 방법 |
KR20210024420A (ko) | 2019-08-23 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 비스(디에틸아미노)실란을 사용하여 peald에 의해 개선된 품질을 갖는 실리콘 산화물 막을 증착하기 위한 방법 |
US11286558B2 (en) | 2019-08-23 | 2022-03-29 | Asm Ip Holding B.V. | Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film |
KR20210029090A (ko) | 2019-09-04 | 2021-03-15 | 에이에스엠 아이피 홀딩 비.브이. | 희생 캡핑 층을 이용한 선택적 증착 방법 |
KR20210029663A (ko) | 2019-09-05 | 2021-03-16 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US11562901B2 (en) | 2019-09-25 | 2023-01-24 | Asm Ip Holding B.V. | Substrate processing method |
CN112593212B (zh) | 2019-10-02 | 2023-12-22 | Asm Ip私人控股有限公司 | 通过循环等离子体增强沉积工艺形成拓扑选择性氧化硅膜的方法 |
KR20210042810A (ko) | 2019-10-08 | 2021-04-20 | 에이에스엠 아이피 홀딩 비.브이. | 활성 종을 이용하기 위한 가스 분배 어셈블리를 포함한 반응기 시스템 및 이를 사용하는 방법 |
CN112635282A (zh) | 2019-10-08 | 2021-04-09 | Asm Ip私人控股有限公司 | 具有连接板的基板处理装置、基板处理方法 |
KR20210043460A (ko) | 2019-10-10 | 2021-04-21 | 에이에스엠 아이피 홀딩 비.브이. | 포토레지스트 하부층을 형성하기 위한 방법 및 이를 포함한 구조체 |
US12009241B2 (en) | 2019-10-14 | 2024-06-11 | Asm Ip Holding B.V. | Vertical batch furnace assembly with detector to detect cassette |
TWI834919B (zh) | 2019-10-16 | 2024-03-11 | 荷蘭商Asm Ip私人控股有限公司 | 氧化矽之拓撲選擇性膜形成之方法 |
US11637014B2 (en) | 2019-10-17 | 2023-04-25 | Asm Ip Holding B.V. | Methods for selective deposition of doped semiconductor material |
KR20210047808A (ko) | 2019-10-21 | 2021-04-30 | 에이에스엠 아이피 홀딩 비.브이. | 막을 선택적으로 에칭하기 위한 장치 및 방법 |
KR20210050453A (ko) | 2019-10-25 | 2021-05-07 | 에이에스엠 아이피 홀딩 비.브이. | 기판 표면 상의 갭 피처를 충진하는 방법 및 이와 관련된 반도체 소자 구조 |
US11646205B2 (en) | 2019-10-29 | 2023-05-09 | Asm Ip Holding B.V. | Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same |
KR20210054983A (ko) | 2019-11-05 | 2021-05-14 | 에이에스엠 아이피 홀딩 비.브이. | 도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템 |
US11501968B2 (en) | 2019-11-15 | 2022-11-15 | Asm Ip Holding B.V. | Method for providing a semiconductor device with silicon filled gaps |
KR20210062561A (ko) | 2019-11-20 | 2021-05-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판의 표면 상에 탄소 함유 물질을 증착하는 방법, 상기 방법을 사용하여 형성된 구조물, 및 상기 구조물을 형성하기 위한 시스템 |
CN112951697A (zh) | 2019-11-26 | 2021-06-11 | Asm Ip私人控股有限公司 | 基板处理设备 |
KR20210065848A (ko) | 2019-11-26 | 2021-06-04 | 에이에스엠 아이피 홀딩 비.브이. | 제1 유전체 표면과 제2 금속성 표면을 포함한 기판 상에 타겟 막을 선택적으로 형성하기 위한 방법 |
CN112885692A (zh) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112885693A (zh) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | 基板处理设备 |
JP7527928B2 (ja) | 2019-12-02 | 2024-08-05 | エーエスエム・アイピー・ホールディング・ベー・フェー | 基板処理装置、基板処理方法 |
KR20210070898A (ko) | 2019-12-04 | 2021-06-15 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
TW202125596A (zh) | 2019-12-17 | 2021-07-01 | 荷蘭商Asm Ip私人控股有限公司 | 形成氮化釩層之方法以及包括該氮化釩層之結構 |
KR20210080214A (ko) | 2019-12-19 | 2021-06-30 | 에이에스엠 아이피 홀딩 비.브이. | 기판 상의 갭 피처를 충진하는 방법 및 이와 관련된 반도체 소자 구조 |
TW202140135A (zh) | 2020-01-06 | 2021-11-01 | 荷蘭商Asm Ip私人控股有限公司 | 氣體供應總成以及閥板總成 |
JP2021111783A (ja) | 2020-01-06 | 2021-08-02 | エーエスエム・アイピー・ホールディング・ベー・フェー | チャネル付きリフトピン |
US11993847B2 (en) | 2020-01-08 | 2024-05-28 | Asm Ip Holding B.V. | Injector |
KR102675856B1 (ko) | 2020-01-20 | 2024-06-17 | 에이에스엠 아이피 홀딩 비.브이. | 박막 형성 방법 및 박막 표면 개질 방법 |
TW202130846A (zh) | 2020-02-03 | 2021-08-16 | 荷蘭商Asm Ip私人控股有限公司 | 形成包括釩或銦層的結構之方法 |
TW202146882A (zh) | 2020-02-04 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 驗證一物品之方法、用於驗證一物品之設備、及用於驗證一反應室之系統 |
US11776846B2 (en) | 2020-02-07 | 2023-10-03 | Asm Ip Holding B.V. | Methods for depositing gap filling fluids and related systems and devices |
US11781243B2 (en) | 2020-02-17 | 2023-10-10 | Asm Ip Holding B.V. | Method for depositing low temperature phosphorous-doped silicon |
TW202203344A (zh) | 2020-02-28 | 2022-01-16 | 荷蘭商Asm Ip控股公司 | 專用於零件清潔的系統 |
KR20210116240A (ko) | 2020-03-11 | 2021-09-27 | 에이에스엠 아이피 홀딩 비.브이. | 조절성 접합부를 갖는 기판 핸들링 장치 |
KR20210116249A (ko) | 2020-03-11 | 2021-09-27 | 에이에스엠 아이피 홀딩 비.브이. | 록아웃 태그아웃 어셈블리 및 시스템 그리고 이의 사용 방법 |
CN113394086A (zh) | 2020-03-12 | 2021-09-14 | Asm Ip私人控股有限公司 | 用于制造具有目标拓扑轮廓的层结构的方法 |
KR20210124042A (ko) | 2020-04-02 | 2021-10-14 | 에이에스엠 아이피 홀딩 비.브이. | 박막 형성 방법 |
TW202146689A (zh) | 2020-04-03 | 2021-12-16 | 荷蘭商Asm Ip控股公司 | 阻障層形成方法及半導體裝置的製造方法 |
TW202145344A (zh) | 2020-04-08 | 2021-12-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於選擇性蝕刻氧化矽膜之設備及方法 |
US11821078B2 (en) | 2020-04-15 | 2023-11-21 | Asm Ip Holding B.V. | Method for forming precoat film and method for forming silicon-containing film |
KR20210128343A (ko) | 2020-04-15 | 2021-10-26 | 에이에스엠 아이피 홀딩 비.브이. | 크롬 나이트라이드 층을 형성하는 방법 및 크롬 나이트라이드 층을 포함하는 구조 |
US11996289B2 (en) | 2020-04-16 | 2024-05-28 | Asm Ip Holding B.V. | Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods |
TW202146831A (zh) | 2020-04-24 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 垂直批式熔爐總成、及用於冷卻垂直批式熔爐之方法 |
KR20210132600A (ko) | 2020-04-24 | 2021-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 바나듐, 질소 및 추가 원소를 포함한 층을 증착하기 위한 방법 및 시스템 |
KR20210132576A (ko) | 2020-04-24 | 2021-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 바나듐 나이트라이드 함유 층을 형성하는 방법 및 이를 포함하는 구조 |
KR20210134226A (ko) | 2020-04-29 | 2021-11-09 | 에이에스엠 아이피 홀딩 비.브이. | 고체 소스 전구체 용기 |
KR20210134869A (ko) | 2020-05-01 | 2021-11-11 | 에이에스엠 아이피 홀딩 비.브이. | Foup 핸들러를 이용한 foup의 빠른 교환 |
KR20210141379A (ko) | 2020-05-13 | 2021-11-23 | 에이에스엠 아이피 홀딩 비.브이. | 반응기 시스템용 레이저 정렬 고정구 |
TW202146699A (zh) | 2020-05-15 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 形成矽鍺層之方法、半導體結構、半導體裝置、形成沉積層之方法、及沉積系統 |
TW202147383A (zh) | 2020-05-19 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 基材處理設備 |
KR20210145078A (ko) | 2020-05-21 | 2021-12-01 | 에이에스엠 아이피 홀딩 비.브이. | 다수의 탄소 층을 포함한 구조체 및 이를 형성하고 사용하는 방법 |
TW202200837A (zh) | 2020-05-22 | 2022-01-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於在基材上形成薄膜之反應系統 |
TW202201602A (zh) | 2020-05-29 | 2022-01-01 | 荷蘭商Asm Ip私人控股有限公司 | 基板處理方法 |
CN113834901A (zh) * | 2020-06-23 | 2021-12-24 | 拓荆科技股份有限公司 | 气体混合效果检测装置及检测方法 |
TW202218133A (zh) | 2020-06-24 | 2022-05-01 | 荷蘭商Asm Ip私人控股有限公司 | 形成含矽層之方法 |
TW202217953A (zh) | 2020-06-30 | 2022-05-01 | 荷蘭商Asm Ip私人控股有限公司 | 基板處理方法 |
TW202202649A (zh) | 2020-07-08 | 2022-01-16 | 荷蘭商Asm Ip私人控股有限公司 | 基板處理方法 |
KR20220010438A (ko) | 2020-07-17 | 2022-01-25 | 에이에스엠 아이피 홀딩 비.브이. | 포토리소그래피에 사용하기 위한 구조체 및 방법 |
TW202204662A (zh) | 2020-07-20 | 2022-02-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於沉積鉬層之方法及系統 |
US12040177B2 (en) | 2020-08-18 | 2024-07-16 | Asm Ip Holding B.V. | Methods for forming a laminate film by cyclical plasma-enhanced deposition processes |
KR20220027026A (ko) | 2020-08-26 | 2022-03-07 | 에이에스엠 아이피 홀딩 비.브이. | 금속 실리콘 산화물 및 금속 실리콘 산질화물 층을 형성하기 위한 방법 및 시스템 |
TW202229601A (zh) | 2020-08-27 | 2022-08-01 | 荷蘭商Asm Ip私人控股有限公司 | 形成圖案化結構的方法、操控機械特性的方法、裝置結構、及基板處理系統 |
USD990534S1 (en) | 2020-09-11 | 2023-06-27 | Asm Ip Holding B.V. | Weighted lift pin |
USD1012873S1 (en) | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
US12009224B2 (en) | 2020-09-29 | 2024-06-11 | Asm Ip Holding B.V. | Apparatus and method for etching metal nitrides |
CN114293174A (zh) | 2020-10-07 | 2022-04-08 | Asm Ip私人控股有限公司 | 气体供应单元和包括气体供应单元的衬底处理设备 |
TW202229613A (zh) | 2020-10-14 | 2022-08-01 | 荷蘭商Asm Ip私人控股有限公司 | 於階梯式結構上沉積材料的方法 |
TW202217037A (zh) | 2020-10-22 | 2022-05-01 | 荷蘭商Asm Ip私人控股有限公司 | 沉積釩金屬的方法、結構、裝置及沉積總成 |
TW202223136A (zh) | 2020-10-28 | 2022-06-16 | 荷蘭商Asm Ip私人控股有限公司 | 用於在基板上形成層之方法、及半導體處理系統 |
TW202235649A (zh) | 2020-11-24 | 2022-09-16 | 荷蘭商Asm Ip私人控股有限公司 | 填充間隙之方法與相關之系統及裝置 |
KR20220076343A (ko) | 2020-11-30 | 2022-06-08 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치의 반응 챔버 내에 배열되도록 구성된 인젝터 |
US11946137B2 (en) | 2020-12-16 | 2024-04-02 | Asm Ip Holding B.V. | Runout and wobble measurement fixtures |
TW202231903A (zh) | 2020-12-22 | 2022-08-16 | 荷蘭商Asm Ip私人控股有限公司 | 過渡金屬沉積方法、過渡金屬層、用於沉積過渡金屬於基板上的沉積總成 |
USD981973S1 (en) | 2021-05-11 | 2023-03-28 | Asm Ip Holding B.V. | Reactor wall for substrate processing apparatus |
USD980813S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD980814S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
USD990441S1 (en) | 2021-09-07 | 2023-06-27 | Asm Ip Holding B.V. | Gas flow control plate |
CN114917732B (zh) * | 2022-05-18 | 2024-06-21 | 成都天田医疗电器科技有限公司 | 一种艾灸熏蒸废气处理工艺 |
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CN115875162B (zh) * | 2023-03-08 | 2023-05-12 | 山东赛马力发电设备有限公司 | 一种提高燃气混合均匀性的混合器 |
CN117046333B (zh) * | 2023-10-11 | 2024-01-05 | 杭州贝斯特气体有限公司 | 一种环氧乙烷与二氧化碳混合杀菌气的生产装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60122068U (ja) * | 1984-01-27 | 1985-08-17 | 三菱重工業株式会社 | 仕切弁 |
JPH0828718A (ja) * | 1994-07-12 | 1996-02-02 | Kubota Corp | オリフィス弁 |
JPH10314563A (ja) * | 1997-05-19 | 1998-12-02 | Toshiba Mach Co Ltd | 粉体混合気体生成装置 |
JP2000297864A (ja) * | 1999-04-15 | 2000-10-24 | Kubota Corp | 多孔可変オリフィス弁 |
-
2005
- 2005-07-26 JP JP2007526769A patent/JP4684295B2/ja not_active Expired - Fee Related
- 2005-07-26 BR BRPI0520522A patent/BRPI0520522B1/pt not_active IP Right Cessation
- 2005-07-26 KR KR1020077021473A patent/KR100961016B1/ko not_active IP Right Cessation
- 2005-07-26 WO PCT/JP2005/013665 patent/WO2007013143A1/ja active Application Filing
- 2005-07-26 CN CN2005800491106A patent/CN101142012B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60122068U (ja) * | 1984-01-27 | 1985-08-17 | 三菱重工業株式会社 | 仕切弁 |
JPH0828718A (ja) * | 1994-07-12 | 1996-02-02 | Kubota Corp | オリフィス弁 |
JPH10314563A (ja) * | 1997-05-19 | 1998-12-02 | Toshiba Mach Co Ltd | 粉体混合気体生成装置 |
JP2000297864A (ja) * | 1999-04-15 | 2000-10-24 | Kubota Corp | 多孔可変オリフィス弁 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009018251A (ja) * | 2007-07-11 | 2009-01-29 | Reika Kogyo Kk | 均質化装置 |
JP2011516804A (ja) * | 2008-04-10 | 2011-05-26 | インペリアル イノベーションズ リミテッド | 流体の流れ改変装置 |
EP2189212A1 (en) | 2008-11-25 | 2010-05-26 | I-Fu Yang | Emulsifier system |
JP2011258795A (ja) * | 2010-06-10 | 2011-12-22 | Mitsubishi Electric Corp | 変圧器 |
JP2014051939A (ja) * | 2012-09-07 | 2014-03-20 | Ihi Corp | 過給機 |
CN113368716A (zh) * | 2021-04-29 | 2021-09-10 | 中冶长天国际工程有限责任公司 | 一种富氧点火用空氧混合器及其控制方法 |
CN113368716B (zh) * | 2021-04-29 | 2022-08-16 | 中冶长天国际工程有限责任公司 | 一种富氧点火用空氧混合器及其控制方法 |
Also Published As
Publication number | Publication date |
---|---|
BRPI0520522A2 (pt) | 2009-08-25 |
BRPI0520522B1 (pt) | 2016-07-26 |
KR20070116826A (ko) | 2007-12-11 |
CN101142012A (zh) | 2008-03-12 |
JPWO2007013143A1 (ja) | 2009-02-05 |
CN101142012B (zh) | 2011-08-24 |
KR100961016B1 (ko) | 2010-06-01 |
JP4684295B2 (ja) | 2011-05-18 |
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