KR100961016B1 - 혼합유체의 균일화장치 및 혼합유체 공급설비 - Google Patents
혼합유체의 균일화장치 및 혼합유체 공급설비 Download PDFInfo
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- KR100961016B1 KR100961016B1 KR1020077021473A KR20077021473A KR100961016B1 KR 100961016 B1 KR100961016 B1 KR 100961016B1 KR 1020077021473 A KR1020077021473 A KR 1020077021473A KR 20077021473 A KR20077021473 A KR 20077021473A KR 100961016 B1 KR100961016 B1 KR 100961016B1
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- 239000012530 fluid Substances 0.000 title claims abstract description 118
- 238000002156 mixing Methods 0.000 claims abstract description 48
- 238000004140 cleaning Methods 0.000 claims description 40
- 238000001514 detection method Methods 0.000 claims description 26
- 239000007788 liquid Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 19
- 125000006850 spacer group Chemical group 0.000 claims description 10
- 230000008859 change Effects 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 7
- 238000006073 displacement reaction Methods 0.000 claims description 5
- 238000000265 homogenisation Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 187
- 238000011144 upstream manufacturing Methods 0.000 description 16
- 238000002485 combustion reaction Methods 0.000 description 15
- 239000006227 byproduct Substances 0.000 description 9
- 239000002737 fuel gas Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 7
- 230000000875 corresponding effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000446 fuel Substances 0.000 description 6
- 238000009628 steelmaking Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004080 punching Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910000805 Pig iron Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
- F16K3/0209—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor the valve having a particular passage, e.g. provided with a filter, throttle or safety device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/21—Mixing gases with liquids by introducing liquids into gaseous media
- B01F23/213—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids
- B01F23/2132—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids using nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
- B01F25/3132—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
- B01F25/3132—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices
- B01F25/31322—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices used simultaneously
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
- B01F25/3133—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit characterised by the specific design of the injector
- B01F25/31331—Perforated, multi-opening, with a plurality of holes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
- B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
- B01F25/4521—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
- B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
- B01F25/4521—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube
- B01F25/45212—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube the elements comprising means for adjusting the orifices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
- B01F35/71805—Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings
- B01F35/718051—Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings being adjustable
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
- F16K3/0218—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with only one sealing face
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/30—Details
- F16K3/32—Means for additional adjustment of the rate of flow
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K2200/00—Details of valves
Abstract
Description
Claims (14)
- 가스가 흐르는 유로(4)와,상기 유로 내에 설치된 혼합유체의 균일화장치와,상기 유로에서의 혼합유체의 균일화장치의 하류측에 설치된 가스의 성질과 상태를 검출하는 가스성상 검출장치(7)와,천공판의 관통공의 개구율을 제어하기 위한 제어장치(30)를 구비하고,상기 혼합유체의 균일화장치가,가스의 유로(4)내에 설치되고, 서로 중첩하여 접하면서 상대변위 가능한 복수 개의 천공판(8, 9)을 구비하고, 각 천공판에는 복수 개의 관통공(10)이 형성되며, 상기 복수 개의 천공판이 중첩된 상태로 서로의 면방향으로 상대변위함에 따라 각 천공판의 관통공의 겹친 정도가 변화하여 전체 관통공의 개구율이 변화하도록 되어 있으며, 상기 가스성상 검출장치가 상기 유로의 단면상의 가스성분의 분포를 검출하도록 구성되며,상기 제어장치가 상기 가스성상 검출장치에 의한 가스성분의 분포의 검출결과에 따라 상기 개구율을 제어하도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 가스가 흐르는 유로(4)와,상기 유로내에 설치된 혼합유체의 균일화장치와,천공판의 관통공의 개구율을 제어하기 위한 제어장치(30)를 구비하며,상기 혼합유체의 균일화장치가,가스의 유로(4)내에 설치되고, 서로 중첩하여 접하면서 상대변위 가능한 복수 개의 천공판(8, 9)를 구비하고, 각 천공판에는 복수 개의 관통공(10)이 형성되며, 상기 복수 개의 천공판이 중첩된 상태로 서로의 면방향으로 상대변위함에 따라 각 천공판의 관통공의 겹친 정도가 변화하여 전체 관통공의 개구율이 변화하도록 되어 있으며,상기 유로를 흐르는 가스가 주 가스 및 상기 주 가스에 혼합되는 부 가스이며,상기 제어장치가 상기 부 가스의 종류와 부 가스의 주 가스에 대한 혼합비에 따라 상기 개구율을 결정하도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 1 또는 2에 있어서,상기 혼합유체의 균일화장치가 상기 유로(4)의 외부에 설치되고, 상기 천공판을 이동시키기 위한 천공판 이동장치(11)를 더 포함하고,상기 복수 개의 천공판(8, 9)이, 유로 내부에 고정된 고정 천공판(8)과 고정되지 않고 이동가능한 가동 천공판(9)을 구비하며, 상기 가동 천공판이 상기 천공판 이동장치에 의해 왕복 운동하도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 1 또는 2에 있어서,상기 관통공(10)의 개구율이 최대일 때의 개구 면적이, 상기 유로(4)의 단면적과 동일 또는 그 이상으로 형성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 1 또는 2에 있어서,상기 천공판(8, 9)이, 상기 유로(4)의 중심축에 대하여 수직한 방향으로부터 경사지게 배치되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 3에 있어서,상기 고정 천공판(8)에 이동 안내 부재(14)가 결합되고, 상기 이동 안내 부재가, 상기 가동 천공판의 왕복 운동방향에 수직한 방향의 양측 부분에 결합하여 그 이동을 안내하도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 3에 있어서,1개의 가동 천공판(9)이 2개의 고정 천공판(8)의 사이에 배치되고, 상기 2개의 고정 천공판의 사이에, 상기 가동 천공판이 슬라이딩 이동가능한 간격을 지지하는 스페이서(15)가 배치되며,상기 2개의 고정 천공판 및 스페이서가 상기 가동 천공판의 이동을 안내하는 기능을 하는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 3에 있어서,상기 관통공(10)이, 상기 가동 천공판(9)의 이동방향에 수직한 방향으로 연장되는 장공(長孔)형으로 형성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 1 또는 2에 있어서,상기 유로(4) 내에 설치되며, 상기 관통공(10)을 세정하기 위한 세정장치(17)를 더 포함하고, 상기 세정장치가 세정용 액체를 분출하는 복수 개의 노즐(19)을 가지도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 3에 있어서,상기 가동 천공판(9)을 이동함으로써 전체 관통공(10)이 폐쇄되도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 1 또는 2에 있어서,천공판(22)이, 천공판의 면내에 있으며 천공판의 중심을 통과하는 회전축(25)에 연결되고, 상기 회전축은 회전 구동기에 접속되어 상기 천공판을 회동시키도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 청구항 11에 있어서,상기 천공판(22)이, 그 면이 유로(4)의 중심축을 따르는 방향으로 되는 전체 개방 위치와, 상기 유로를 폐쇄하는 전체 폐쇄 위치와의 사이를 회동하도록 구성되는 것을 특징으로 하는 혼합유체의 공급설비(1).
- 혼합유체의 균일화장치의 제어방법에 있어서,상기 혼합유체의 균일화장치가, 가스의 유로(4)내에 설치되고, 서로 중첩하여 접하면서 상대변위 가능한 복수 개의 천공판(8, 9)을 구비하고, 각 천공판에는 복수 개의 관통공(10)이 형성되며, 상기 복수 개의 천공판이 중첩된 상태로 서로의 면방향으로 상대변위함에 따라 각 천공판의 관통공의 겹친 정도가 변화하여 전체 관통공의 개구율이 변화하도록 되어 있으며,상기 제어방법이,상기 혼합유체의 균일화장치의 하류측에 있어서, 상기 유로의 단면상의 가스성분의 분포를 검출하는 혼합상태 검출단계와,상기 혼합상태 검출단계에서 검출된 가스의 혼합상태에 따라 상기 천공판의 관통공의 개구율을 변화시키는 단계를 포함하는 것을 특징으로 하는 혼합유체 균일화장치의 제어방법.
- 혼합유체의 균일화장치의 제어방법에 있어서,상기 혼합유체의 균일화장치가, 가스의 유로(4)내에 설치되고, 서로 중첩하여 접하면서 상대변위 가능한 복수 개의 천공판(8, 9)을 구비하고, 각 천공판에는 복수 개의 관통공(10)이 형성되며, 상기 복수 개의 천공판이 중첩된 상태로 서로의 면방향으로 상대변위함에 따라 각 천공판의 관통공의 겹친 정도가 변화하여 전체 관통공의 개구율이 변화하도록 되어 있으며,상기 혼합유체가 주 가스와 상기 주 가스에 혼합되는 부 가스로 이루어지며,상기 제어방법이,상기 부 가스의 종류와 부 가스의 주 가스에 대한 혼합비에 대응한 최적의 개구율을 미리 설정해 놓는 단계와,상기 주 가스가 흐르는 유로에 혼입되는 부 가스의 종류 및 상기 부 가스의 주 가스에 대한 혼합비에 따라, 상기 설정되어 있는 개구율을 실현하도록 각 천공판의 관통공의 겹친 정도를 변화시키는 단계를 포함하는 것을 특징으로 하는 혼합유체 균일화장치의 제어방법.
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JPS60122068U (ja) * | 1984-01-27 | 1985-08-17 | 三菱重工業株式会社 | 仕切弁 |
JPH0828718A (ja) * | 1994-07-12 | 1996-02-02 | Kubota Corp | オリフィス弁 |
JPH10314563A (ja) * | 1997-05-19 | 1998-12-02 | Toshiba Mach Co Ltd | 粉体混合気体生成装置 |
JP2000297864A (ja) * | 1999-04-15 | 2000-10-24 | Kubota Corp | 多孔可変オリフィス弁 |
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2005
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Also Published As
Publication number | Publication date |
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JPWO2007013143A1 (ja) | 2009-02-05 |
BRPI0520522B1 (pt) | 2016-07-26 |
JP4684295B2 (ja) | 2011-05-18 |
CN101142012B (zh) | 2011-08-24 |
CN101142012A (zh) | 2008-03-12 |
BRPI0520522A2 (pt) | 2009-08-25 |
KR20070116826A (ko) | 2007-12-11 |
WO2007013143A1 (ja) | 2007-02-01 |
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