Classifications

• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
  • H10P95/90—Thermal treatments, e.g. annealing or sintering
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
  • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
  • H10P72/04—Apparatus for manufacture or treatment
  • H10P72/0431—Apparatus for thermal treatment
  • H10P72/0434—Apparatus for thermal treatment mainly by convection

Definitions

• the present invention relates to a vertical heat treatment apparatus and a method for using the vertical heat treatment apparatus.
• various heat treatment apparatuses are used to perform various processes such as oxidation, diffusion, CVD (Chemical Vapor Deposition), etc., on a workpiece, for example, a semiconductor wafer. It is used.
• a vertical heat treatment apparatus capable of performing heat treatment on a large number of objects to be processed at one time is used.
• a vertical heat treatment apparatus generally includes a quartz processing container that accommodates an object to be processed, a main heater that is provided so as to surround the processing container and that heats the processing container and has a rapid cooling function. And an exhaust port bent at the top of the processing vessel for connecting the exhaust pipe, and an auxiliary heater provided for heating the exhaust port (for example, Japanese Patent Application Laid-Open No. 2003-209063) reference).
• An opening is formed in the lower part of the processing container, and a lid is provided so as to be able to be raised and lowered (openable and closable) so as to seal the opening.
• a quartz boat is provided that holds and holds the objects to be processed in multiple stages.
• the processing container is cooled down to a predetermined temperature, for example, room temperature by using the rapid temperature lowering function of the main heater, and a cleaning gas (for example, etching gas) is introduced into the processing container.
• a cleaning gas for example, etching gas
• the auxiliary heater does not have a rapid cooling function. For this reason, it is difficult to cool the exhaust port portion as quickly as the processing vessel (main body).
• An object of the present invention is to provide a vertical heat treatment apparatus capable of rapidly cooling the exhaust port portion in the same manner as the processing container and improving the throughput, and a method for using the vertical heat treatment apparatus.
• the present invention provides a processing container that accommodates an object to be processed, a main heater that is provided so as to surround the processing container and that heats the processing container and has a rapid cooling function, and the processing container An exhaust port portion that is bent over the upper portion of the heater, an auxiliary heater provided to heat the exhaust port portion, and retracting the auxiliary heater from the exhaust port portion during rapid cooling of the main heater And a forced exhaust mechanism for forcibly exhausting the atmosphere around the exhaust port portion.
• the temperature of the exhaust port can be lowered quickly in the same manner as in the processing container by retracting the auxiliary heater and forcibly exhausting the atmosphere around the exhaust port by the forced exhaust mechanism.
• the throughput can be improved.
• the forced exhaust mechanism covers the exhaust port portion and communicates with the interior of the auxiliary heater when the auxiliary heater is retracted, and is connected to the heat insulating cover and is connected to the heat insulating cover. And an exhaust pipe for forcibly exhausting the inside of the heat cover.
• the temperature of the exhaust port can be effectively lowered.
• adverse effects due to heat dissipation due to exhaust port force can be prevented.
• the heat insulating cover has a water cooling structure.
• the temperature of the exhaust port can be lowered more effectively.
• the main heater includes an exhaust duct for forcibly exhausting the main heater.
• the outside is connected, and the exhaust pipe of the forced exhaust mechanism is connected outside the exhaust duct.
• the forced exhaust force by the exhaust duct of the main heater can be diverted to the forced exhaust force of the forced exhaust mechanism of the auxiliary heater, and the structure can be simplified and the cost can be reduced.
• the present invention provides a processing container that accommodates an object to be processed, a main heater that is provided so as to surround the processing container and that heats the processing container and has a rapid cooling function, and the processing described above
• An exhaust port portion that is bent at the top of the container, an auxiliary heater provided to heat the exhaust port portion, and the auxiliary heater is retracted from the exhaust port portion during rapid cooling of the main heater
• a forced exhaust mechanism for forcibly exhausting the atmosphere around the exhaust port, using a vertical heat treatment apparatus, and rapidly cooling the inside of the main heater
• a method of using a vertical heat treatment apparatus comprising: a step of rapidly lowering the temperature of the processing vessel and the exhaust port by retracting the auxiliary heater and performing forced exhaust around the exhaust port. is there.
• the present invention provides a processing container that accommodates an object to be processed, a main heater that is provided so as to surround the processing container, and that heats the processing container and has a rapid cooling function.
• An exhaust port portion that is bent at the top of the container, an auxiliary heater provided to heat the exhaust port portion, and the auxiliary heater is retracted from the exhaust port portion during rapid cooling of the main heater
• a forced exhaust mechanism for forcibly exhausting the atmosphere around the exhaust port, using a vertical heat treatment apparatus, and rapidly cooling the inside of the main heater
• a method for using a vertical heat treatment apparatus comprising: a step of rapidly lowering the temperature of the processing vessel and the exhaust port by retracting the auxiliary heater and performing forced exhaust around the exhaust port.
• Control A computer-readable recording medium including a program.
• FIG. 1 is a schematic longitudinal sectional view of a vertical heat treatment apparatus according to an embodiment of the present invention.
• FIG. 2 is a plan view showing the upper part of the vertical heat treatment apparatus of FIG.
• FIG. 3 is a schematic side view showing a moving mechanism of the auxiliary heater.
• FIG. 4A is a plan view showing the rail arrangement of the moving mechanism of FIG. 3, and FIG. 4B is a side view showing the rail arrangement of the moving mechanism.
• FIG. 5A is a plan view for explaining the movement of the auxiliary heater
• FIG. 5B is a side view for explaining the movement of the auxiliary heater.
• FIG. 6 is a cross-sectional view of a lenore.
• FIG. 7 is a cross-sectional view showing a heating state of the auxiliary heater.
• FIG. 8 is a cross-sectional view showing a forced cooling state of the auxiliary heater.
• FIG. 1 is a schematic longitudinal sectional view of a vertical heat treatment apparatus according to an embodiment of the present invention.
• FIG. 2 is a plan view showing the upper part of the vertical heat treatment apparatus of FIG.
• Fig. 3 is a schematic side view showing the moving mechanism of the auxiliary heater.
• 4A is a plan view showing the rail arrangement of the moving mechanism of FIG. 3
• FIG. 4B is a side view showing the rail arrangement of the moving mechanism of FIG.
• FIG. 5A is a plan view for explaining the movement of the auxiliary heater
• FIG. 5B is a side view for explaining the movement of the auxiliary heater.
• FIG. 6 is a cross-sectional view of the rail.
• FIG. 7 is a cross-sectional view showing the heating state of the auxiliary heater.
• FIG. 8 is a sectional view showing a forced cooling state of the auxiliary heater.
• a vertical heat treatment apparatus 1 in FIG. 1 includes a casing (not shown) and a vertical processing container (reaction tube and a vertical processing container that is provided in the casing and accommodates an object to be processed such as a semiconductor wafer w and performs a predetermined heat treatment. 2).
• the processing container 2 is formed of quartz (quartz glass) having heat resistance and corrosion resistance.
• the upper portion of the processing vessel 2 is formed in a dome shape, specifically a reverse funnel shape, and the lower portion of the processing vessel 2 is opened as a furnace 3.
• a flange portion 4 is provided at the open end of the lower portion of the processing container 2. The flange portion 4 is fixed to the base plate via a flange presser (not shown).
• a gas guide that introduces a processing gas or an inert gas (for example, N) is disposed below the processing container 2.
• a gas inlet port for connecting the inlet pipe is provided (not shown).
• Top of processing container 2 In the center of the upper part, an exhaust port 6 for connecting the exhaust pipe 5 is formed to be bent in an L shape.
• a pressure control system capable of depressurizing the inside of the processing container 2 to a predetermined pressure, for example, approximately lOkgf.
• the pressure control system has a vacuum pump, a pressure sensor, a pressure control valve, and a controller.
• a cylindrical main heater 7 that can be heated and controlled in the processing container 2 to a predetermined temperature, for example, 300 to 1000 ° C, and has a rapid cooling function is provided.
• the main body 7a of the main heater 7 is made of a metal (for example, SUS) water-cooled jacket, and a carbon wire capable of rapid raising and lowering temperature is adopted as a heater element (not shown). Yes.
• the main heater 7 is installed on the base plate.
• the upper part of the main heater 7 is covered with a top plate 8.
• the exhaust port 6 projects through the top plate 8.
• the main heater 7 and the processing container 2 in the main heater 7 are forcibly air-cooled.
• a blower nozzle 10 connected to a blower 9 for sending air at room temperature into the main heater 7 is provided at the lower part of the main heater 7, and an exhaust gas is provided at the upper part of the main heater 7.
• An exhaust duct 12 connected to the fan 11 is provided.
• the exhaust duct 12 is mainly composed of a first duct 12a disposed on the top plate 8, a second duct 12b connecting the first duct 12a and the factory exhaust system, and a main force.
• the second duct 12b is provided with a heat exchanger 13 for lowering the exhaust temperature.
• a lid body 14 that seals an opening (furnace port) 3 at the lower part of the processing container 2 is provided so as to be able to be raised and lowered (openable and closable) by a lifting mechanism (not shown).
• a quartz boat (holding tool) 15 for mounting and holding a plurality of, for example, about 25 to 50 wafers w in multiple stages at a predetermined interval in the vertical direction.
• the boat 15 has a column 16 at the center on the lower surface side.
• the support column 16 is connected to a rotation introducing mechanism 17 provided at the center of the lid body 14.
• thermo plug 18 provided with a planar heater or a heat shield is provided so as not to interfere with the support column 16. It is provided.
• An auxiliary heater 20 for heating the exhaust port 6 is provided on the upper portion of the main heater 7.
• the auxiliary heater 20 is provided with a moving mechanism for retracting (disengaging) the auxiliary heater 20 from the exhaust port 6 when the main heater 7 is rapidly cooled. 21 is provided.
• a forced exhaust mechanism 22 for forcibly exhausting the atmosphere around the exhaust port 6 is provided.
• the forced exhaust mechanism 22 is arranged so as to cover the exhaust port 6 when the auxiliary heater 20 is retracted, and a heat shielding force bar 23 communicating with the interior of the retracted auxiliary heater 20,
• An exhaust pipe 24 that is connected to the heat shield cover 23 and forcibly exhausts the inside of the heat shield cover 23, and the force are mainly configured.
• the atmosphere around the exhaust port 6 in the heat shield cover 23 and the atmosphere in the auxiliary heater 20 can be forcibly exhausted.
• the temperature of the exhaust port 6 can be lowered efficiently.
• the exhaust pipe 24 can be connected to an upstream portion of the heat exchanger 13 outside the exhaust duct 12. Further, it is preferable that the heat insulating cover 23 is made of metal (for example, made of SUS), and a cooling water circulation passage 25 is provided on the surface thereof to form a water cooling structure.
• a heat insulating block 26 for insulating the periphery of the vertical rising portion of the exhaust port 6 is installed.
• a mounting plate 27 made of metal (for example, made of SUS) for mounting the auxiliary heater 20 so as to be movable in the horizontal direction is provided.
• the auxiliary heater 20 has a shape that covers the exhaust port 6 so as to be slidable from the back side (the right side in FIG. 7), that is, the lower surface side and the front side (the left side in FIG. 7).
• the heat insulating material 28 having an open substantially cubic shape, the resistance heating wire 29 disposed (embedded) on the inner surface of the heat insulating material 28, and the force are also mainly configured.
• the auxiliary heater 20 is provided with a temperature sensor (thermocouple) 30. It is preferable that a water cooling jacket 32 having a cooling water circulation passage 31 is provided on the outer surface of the auxiliary heater 20.
• the moving mechanism 21 includes a pair of left and right front guide rails 33 and a rear guide rail that extend in the horizontal movement direction to guide the auxiliary heater 20 so as to be horizontally movable. 34, guide rollers 37 and 38, which are arranged at approximately four corners of the auxiliary heater 20 via the arm portions 35 and 36 and are guided along the guide rails 33 and 34, and an air cylinder for sliding the auxiliary heater 20 39 (See Fig. 1) and force is also mainly composed.
• each guide rail 33, 34 has a structure in which a guide groove 42 for guiding a guide roller is provided on one side surface of a metal plate 41.
• the heat exchanger 13 is provided with a horizontal support member 43 via a horizontal mounting bar 43. 44 is attached with screws (see Fig. 4A and Fig. 4B).
• the mounting bar 43 is screwed using an existing screw hole (tap) provided in the heat exchanger ⁇ 13.
• a mounting member 45 for the air cylinder 39 is attached to the upper part of the heat exchanger 13 via a mounting bar 43.
• the base end of the air cylinder 39 is attached to the attachment member 45 via a bracket 46.
• the tip of the piston rod 39 a of the air cylinder 39 is connected to the back surface of the auxiliary heater 20 via a bracket 47.
• the auxiliary heater 20 is in a position that covers the exhaust port 6 during heating. Specifically, as shown in FIG. 7, the auxiliary heater 20 is placed on the heat insulation block 26 and is in a position accommodated in the heat shield cover 23.
• the auxiliary heater 20 is moved away from the exhaust port 6. Specifically, as shown in FIG. 8, the tip of the auxiliary heater 20 is positioned at the opening end of the heat shield cover 23 so that the heat shield cover 23 and the auxiliary heater 20 communicate with each other.
• the heat shield cover 23 is formed in a cross-sectional gate shape or an inverted U shape, and its both leg portions are mounted on a plate member 41 of a pair of left and right front guide rails 33.
• the front surface portion of the heat shield cover 23 is covered with a front cover portion 23a, leaving a portion through which the exhaust port portion 6 passes.
• the rear surface of the heat shield cover 23 is opened to allow the auxiliary heater 20 to retreat.
• L a predetermined amount
• the auxiliary heater 20 is placed immediately after the movement from the placement position (heating position) on the heat insulation block 26 is started.
• inclined portions 33a and 34b are provided on the front end sides of the respective guide rails 33 and 34 (see FIG. 4B).
• the piping connecting the cooling water circulation passage 31 (see Fig. 7) of the water cooling jacket 32 of the auxiliary heater 20 and the cooling water circulation supply unit (not shown) has a flexible pipe force.
• a heat shield plate 48 for suppressing heat release of the downward force of the auxiliary heater 20 is disposed so as to cover the exposed portion of the lower surface of the auxiliary heater 20.
• the heat shield plate 48 is preferably water-cooled, for example, provided with a cooling water circulation passage 49.
• the heat shield plate 48 is attached to the upper part of the first duct 12a.
• the temperature of the exhaust port 6 can be lowered quickly in the same manner as the processing vessel 2 at the time of process temperature drop or maintenance such as dry cleaning. For this reason, the waiting time for operation of the apparatus or the downtime during maintenance can be shortened, and throughput can be improved or productivity can be improved.
• the temperature of the exhaust port 6 can be lowered quickly in the same manner as the processing vessel 2, the film residue on the inner surface of the exhaust port 6 is eliminated, and the problem of particle generation caused by the film residue is also eliminated. Can do.
• the forced exhaust mechanism 22 covers the exhaust port 6 when the auxiliary heater 20 is retracted (covers the periphery of the exhaust port 6) and a heat shield cover 23 that communicates with the interior of the retracted auxiliary heater 20, Since the exhaust pipe 24 is connected to the heat shield cover 23 and forcibly exhausts the inside of the heat shield cover 23, the temperature of the exhaust port 6 can be lowered effectively, and the exhaust port 6 It is possible to prevent the thermal effect due to heat dissipation.
• the heat shield cover 23 has a water cooling structure, the temperature of the exhaust port 6 can be lowered more effectively.
• an exhaust duct 12 for forcibly exhausting the inside of the main heater 7 is connected to the main heater 7, and an exhaust pipe 24 of the forcible exhaust mechanism 22 of the auxiliary heater 20 is connected to the outside 12 of the exhaust heater. Therefore, the forced exhaust force by the exhaust duct 12 of the main heater 7 can be diverted to the forced exhaust force of the forced exhaust mechanism 22 of the auxiliary heater 20, and the structure can be simplified and the cost can be reduced.
• the inner surface of the processing container 2 and the inner surface of the exhaust port 6 can be dry-cleaned quickly and uniformly. Is possible. As a result, the generation of particles due to the remaining film can be prevented and the throughput can be improved.
• Each process performed in the above vertical heat treatment apparatus can be controlled by the computer apparatus 80.
• a program executed in the computer device 80 for the control and a computer-readable recording medium including the program are also subject to protection in this case.

Priority Applications (2)

Applications Claiming Priority (2)

Publications (1)

Family

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Family Applications (1)

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Citations (4)

Family Cites Families (7)

• 2004
  • 2004-08-26 JP JP2004246578A patent/JP4503397B2/ja not_active Expired - Fee Related
• 2005
  • 2005-08-24 CN CNB200580000806XA patent/CN100474525C/zh not_active Expired - Fee Related
  • 2005-08-24 US US11/660,898 patent/US7935188B2/en not_active Expired - Fee Related
  • 2005-08-24 WO PCT/JP2005/015367 patent/WO2006022303A1/ja not_active Ceased
  • 2005-08-24 EP EP05775200A patent/EP1801862A4/en not_active Withdrawn
  • 2005-08-24 KR KR1020067014057A patent/KR100958766B1/ko not_active Expired - Fee Related
  • 2005-08-26 TW TW094129403A patent/TW200623262A/zh not_active IP Right Cessation

Patent Citations (4)

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