Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
  • B01D61/14—Ultrafiltration; Microfiltration
  • B01D61/145—Ultrafiltration
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F9/00—Multistage treatment of water, waste water or sewage
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D19/00—Degasification of liquids
  • B01D19/0031—Degasification of liquids by filtration
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F1/00—Treatment of water, waste water, or sewage
  • C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F1/00—Treatment of water, waste water, or sewage
  • C02F1/30—Treatment of water, waste water, or sewage by irradiation
  • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F1/00—Treatment of water, waste water, or sewage
  • C02F1/72—Treatment of water, waste water, or sewage by oxidation
  • C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F1/00—Treatment of water, waste water, or sewage
  • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
  • C02F2001/422—Treatment of water, waste water, or sewage by ion-exchange using anionic exchangers
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F1/00—Treatment of water, waste water, or sewage
  • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
  • C02F2001/425—Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F1/00—Treatment of water, waste water, or sewage
  • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
  • C02F2001/427—Treatment of water, waste water, or sewage by ion-exchange using mixed beds
• • C—CHEMISTRY; METALLURGY
  • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
  • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
  • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
  • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water

Definitions

• the present invention relates to an ultrapure water production apparatus, and more particularly, to an ultrapure water production apparatus capable of obtaining ultrapure water having an extremely low concentration of impurities such as dissolved oxygen.
• an ultrapure water production apparatus an apparatus provided with a pretreatment system, a primary pure water system, and a secondary pure water system (or “subsystem") has been known.
• raw water such as industrial water is treated by a pretreatment system equipped with a coagulation sedimentation device, and then treated by a primary pure water system equipped with a desalination device.
• Water is obtained, and a small amount of impurities are removed from the primary pure water by a secondary pure water system to produce ultrapure water having a specific resistance of about 15 to 18 ⁇ 'cm.
• the ultrapure water produced in this way is used for cleaning semiconductor products. If ultrapure water contains impurities such as organic substances and metals, the defect of the semiconductor products such as pattern defects may occur. May be caused. Therefore, when producing ultrapure water, it is necessary to remove these impurities as much as possible.
• the demands on the water quality of ultrapure water are becoming more stringent, and the organic matter (TOC) concentration of ultrapure water is less than 1 ⁇ g / L and the metal concentration is less than IngZL. There is a demand.
• the thickness of the oxide film of the semiconductor product can be controlled. Therefore, the concentration of dissolved oxygen in the ultrapure water can be reduced as much as possible. Is required. Specifically, in recent years, the dissolved oxygen concentration of ultrapure water has been required to be less than 5 gZL.
• the ultraviolet oxidation device provided in the ultrapure water production device irradiates ultraviolet rays to oxidize and decompose a trace amount of organic substances contained in primary pure water. Carbon dioxide produced by oxidative decomposition of organic matter Element and the like are removed by an ion exchange device provided at a stage subsequent to the ultraviolet oxidation device. In the ultraviolet irradiation treatment by the ultraviolet ray oxidizing device, hydrogen peroxide, ozone, and the like may be generated due to an excessive amount of ultraviolet irradiation. Hydrogen peroxide and the like generated by the ultraviolet oxidation device are decomposed by the subsequent ion exchange device to generate oxygen, and the dissolved oxygen concentration increases.
• the operation of the ultrapure water production apparatus is stopped. While the ultrapure water production equipment is stopped, the production of semiconductor products is stopped.When restarting the operation of the ultrapure water production equipment, the secondary pure water system is sterilized and washed and then stays in the ultrapure water production equipment. It is necessary to start up the device in about 12 to 24 hours to discharge the liquid.
• the ultrapure water production apparatus is required to be capable of continuous operation for a long period of time, for example, it is required to be able to operate continuously for three years or more.
• Patent Document 1 JP-A-9-29251
• the present invention has been made in view of the above problems, and is provided at a stage subsequent to an ultraviolet oxidation apparatus. It is an object of the present invention to provide an ultrapure water production apparatus capable of continuously producing high-purity ultrapure water for a long period of time by reducing the amount of eluted substances.
• the ultrapure water production apparatus of the present invention is provided with at least an ultraviolet oxidizing apparatus, and treats primary pure water as a liquid to be treated to produce ultrapure water.
• An oxidizing device is characterized in that a catalyst mixing tower having a catalyst carrier having a catalyst supported on the carrier and an anion exchange resin is disposed at a subsequent stage.
• the ultraviolet oxidation apparatus and the catalyst mixing tower according to the present invention constitute a secondary pure water system of an ultrapure water production apparatus for producing ultrapure water by introducing primary pure water as a liquid to be treated.
• Primary purified water is obtained by treating filtered water, from which suspended substances and the like have been removed, with a pretreatment device, and further treating the filtered water with a primary purified water system. Liquid.
• the ultraviolet oxidation device is provided with an ultraviolet lamp and decomposes organic substances slightly contained in the primary pure water.
• an ultraviolet lamp provided in the ultraviolet irradiation apparatus, a lamp capable of irradiating an ultraviolet ray having a wavelength of about 254 ⁇ m or about 185 nm, for example, a low-pressure mercury lamp or the like is used.
• Ultraviolet light having a wavelength of about 185 nm is preferable because it has a higher ability to decompose organic substances than ultraviolet light having a wavelength of about 254 nm.
• the structure of the ultraviolet oxidation apparatus may be any structure such as a residence type or a flow type.
• the catalyst mixing column holds a catalyst carrier in which a catalyst is supported on a carrier and an anion exchange resin in the same column. It is conceivable to arrange a catalyst tower that holds only the catalyst and an ion-exchange tower that holds only the anion-exchange resin in this order downstream of the ultraviolet oxidation device. Power To simplify the secondary pure water system Preferably, the ion exchange resin and the catalyst carrier are kept in the same column. Further, the catalyst mixing column may contain, for example, a cation exchange resin in addition to the catalyst carrier and the ion exchange resin.
• the anion exchange resin and the catalyst carrier may be separated and held, or may be held in a mixed state.
• the catalyst mixing column is of a so-called multi-layer type in which the ion-exchange resin and the catalyst carrier are held in a separated state
• a catalyst carrier layer is arranged on the inflow side of the liquid to be treated, and on the outflow side. It is preferable to dispose an iron exchange resin layer. Good.
• the catalyst mixing column contains 3 to 20% by weight, particularly 8 to 1% by weight of the catalyst carrier based on the anion exchange resin.
• the aion-exchange resin to be packed in the catalyst mixing column is preferably a non-regeneration type strongly basic aion-exchange resin, but may be a weakly basic anion-exchange resin. it can.
• the type of the substrate of the ion-exchange resin there is no particular limitation on the type of the substrate of the ion-exchange resin, and for example, styrene-based, acryl-based, methacryl-based, and phenol-based resins can be used.
• the structure of the substrate of the ion exchange resin is not particularly limited, and a gel type, a porous type, a non-porous type, or the like can be used. In particular, a gel type can be suitably used.
• the catalyst supported on the carrier can be used without any particular limitation as long as it can decompose hydrogen peroxide.
• rhodium, dimanganese diacid, or ferric chloride there may be mentioned, for example, rhodium, dimanganese diacid, or ferric chloride.
• a palladium alloy containing noradium can be suitably used because the amount of eluted substances eluted from the catalyst itself is small.
• the carrier for supporting the catalyst examples include ion-exchange resin, activated carbon, alumina, and zeolite.
• the catalyst resin which is a catalyst carrier in which an anion exchange resin is used as a carrier to support a catalyst, is preferably mixed with the anion exchange resin uniformly and immediately.
• the size and shape of the catalyst carrier are not particularly limited, and any of a granular shape and a pellet shape can be used. However, since the polygonal catalyst carrier may flow out of the catalyst mixing tower and become a load on a subsequent device, a spherical catalyst carrier supported on ion exchange resin such as ion-exchange resin is used. It is preferred to use.
• the flowing direction of the liquid to be treated there is no limitation on the flowing direction of the liquid to be treated.
• the specific gravity may differ between the catalyst carrier and the ion exchange resin, it is preferable to use a downward flow in order to keep the mixed state of the two proper.
• a membrane deaerator is disposed downstream of the catalyst mixing tower, and a desalination apparatus is further disposed downstream of the membrane deaerator.
• a space into which a liquid to be treated is introduced hereinafter, referred to as “liquid chamber”
• a space through which gas in the liquid to be treated is transferred hereinafter, referred to as “liquid chamber”
• the “intake chamber” is used. The pressure in the suction chamber is reduced by a vacuum pump or the like, and the gas contained in the liquid to be treated introduced into the liquid chamber is transferred to the suction chamber side through a degassing membrane to remove the gas in the liquid to be treated.
• any membrane can be used without particular limitation as long as it allows gas such as oxygen, nitrogen, and carbon dioxide to pass therethrough but does not allow liquid to permeate.
• the degassing film include hydrophobic polymer films such as silicone rubber, tetrafluoroethylene, polytetrafluoroethylene, polyolefin, and polyurethane.
• the shape of the degassing membrane include a hollow fiber membrane and a flat membrane.
• any device such as an electric desalination device or an ion-exchange resin tower can be used.
• the ion-exchange resin tower may be of a multi-layer type in which a single bed layer of an ion exchange resin and a single bed layer of a cation exchange resin are provided in the same column.
• a mixed bed type having a mixed bed in which a resin and a force thione exchange resin are mixed may be used.
• a desalination apparatus may be configured by connecting a single bed of an ion-exchange resin with an ion-exchange column and a single bed of a cation exchange resin with a cation exchange column in series.
• the non-regenerative ion exchange resin column having a mixed bed in which a strongly acidic cation exchange resin and a strongly basic ion exchange resin are mixed has a high ion removal capability. It is particularly preferable that the amount of the substance that elutes in the desalting apparatus is also small.
• organic matter is decomposed by an ultraviolet oxidizer to remove organic matter contained in primary purified water as a liquid to be treated.
• Decomposition products such as carbon dioxide generated by organic acid oxidizing decomposition are adsorbed and removed by the anion exchange resin held in the catalyst mixing column disposed in the latter stage of the organic oxidizing apparatus. You. Therefore, the ultrapure water production apparatus according to the present invention can produce high-purity ultrapure water even when the load due to the anion component is high.
• the liquid discharged from the ultraviolet oxidizer (hereinafter referred to as “oxidized water”) contains hydrogen peroxide, ozone, and the like. Hydrogen peroxide and the like contained in the oxidized water can be turned on or off. When it comes into contact with the replacement resin, it is decomposed to generate oxygen and decomposes the anion exchange resin.
• the catalyst mixing tower into which the oxidized water containing hydrogen peroxide and the like is introduced is filled with the catalyst carrier together with the ion-exchange resin, so that hydrogen peroxide and the like are supported on the carrier.
• the anion exchange resin is decomposed by reacting preferentially with the catalyst thus decomposed, thereby suppressing the decomposition of the anion exchange resin. For this reason, resin decomposition products eluted in the liquid discharged from the catalyst mixing tower (hereinafter referred to as “mixing tower effluent”) can be reduced.
• a membrane deaerator in the subsequent stage of the catalyst mixing tower, it is possible to remove gases such as oxygen generated by decomposition of hydrogen peroxide and the like in the catalyst mixing tower.
• gases such as oxygen generated by decomposition of hydrogen peroxide and the like
• a desalination device after the membrane deaerator, the ionic substances such as metal ions eluted can be removed by the membrane deaerator, and high-purity ultrapure water with a metal concentration of less than IngZL can be removed. Can be manufactured.
• FIG. 1 is a schematic view of an ultrapure water production apparatus according to one embodiment of the present invention.
• FIG. 2 is a view showing test results of Example 2 and Comparative Example 3.
• FIG. 1 is a schematic diagram of an ultrapure water production apparatus 1 according to the first embodiment of the present invention.
• the ultrapure water production device 1 includes a storage tank 2, an ultraviolet oxidation device 3, a catalyst mixing tower 4, a membrane deaerator 5, a desalination device 6, and a membrane filtration device 7 having an ultrafiltration membrane.
• a pretreatment system not shown
• a primary pure water system is stored in the storage tank 2.
• the pretreatment system includes a coagulation sedimentation device and a filtration device, and removes a part of suspended substances and organic substances contained in raw water such as industrial water.
• the primary pure water system removes impurities in the liquid (filtration water) supplied from the pretreatment system, and has a specific resistance of 10 ⁇ ⁇ 'cm or more, dissolved oxygen concentration of 0 to: L000 ⁇ gZL, and organic matter concentration of 0 to 20. This is a system for producing primary pure water with ⁇ gZL and a metal concentration of about 0-1 ⁇ g ZL.
• the primary pure water system includes, for example, a desalination unit, a reverse osmosis membrane filtration unit, and a deaeration unit.
• the ultraviolet oxidation device 3, the catalyst mixing tower 4, the membrane degassing device 5, the desalination device 6, and the membrane filtration device 7 use primary pure water as a liquid to be treated and remove trace impurities contained in the primary pure water. It is removed to produce ultrapure water, also called a secondary pure water system, or subsystem.
• the ultraviolet irradiation apparatus 3 includes a low-pressure mercury lamp (140 W, 10 lamps) for irradiating ultraviolet rays having wavelengths around 185 nm and around 254 nm.
• a low-pressure mercury lamp 140 W, 10 lamps
• the catalyst mixing tower 4 is a catalyst mixing bed in which a strongly basic a-on exchange resin and a catalyst resin which is a catalyst carrier having palladium supported on the a-on exchange resin as a carrier are mixed. I have it.
• the catalyst resin was prepared by bringing an acidic solution of palladium chloride into contact with an ion exchange resin.
• the catalyst mixing bed is constituted by mixing the catalyst resin so as to be 5 to 10% by weight based on the strongly basic ion exchange resin.
• the membrane deaerator 5 includes a gas separation membrane in which a polypropylene-based polymer membrane is formed in a hollow fiber shape, and is provided so that the liquid chamber and the suction chamber face each other via the gas separation membrane. hand Yes.
• the liquid to be treated is introduced into the liquid chamber and the pressure in the suction chamber is reduced to transfer the gas contained in the liquid to be treated to the suction chamber side, and the dissolved oxygen concentration is less than 1 ⁇ g ZL. Reduce the dissolved gas concentration to less than 3000 ng ZL.
• the desalination unit 6 is a mixed bed type ion exchange resin column having a mixed bed in which a strongly basic cation exchange resin and a strongly acidic ion exchange resin are mixed at a ratio of 1 to 1. . Further, a membrane filtration device 7 equipped with an ultrafiltration membrane is provided downstream of the desalination device 6.
• the storage tank 2, the ultraviolet oxidation device 3, the catalyst mixing tower 4, the membrane deaerator 5, the desalination device 6, and the membrane filtration device 7 are arranged in this order, and adjacent devices are connected in series by piping. It is connected to the.
• the ultrapure water production apparatus 1 may include a device other than these devices. For example, heat exchange can be provided in front of the ultraviolet irradiation device 3.
• the primary pure water temporarily stored in the storage tank 2 is supplied to the storage tank 2 by a liquid supply means such as a liquid supply pump (not shown). From the furnace to UV oxidation equipment 3. In the ultraviolet oxidation device 3, organic substances contained in primary pure water as a liquid to be treated are decomposed, and hydrogen peroxide and the like are generated. Further, the primary pure water is sterilized by the ultraviolet irradiation in the ultraviolet oxidizing device 3, and the growth of bacteria and the like is suppressed.
• a liquid supply means such as a liquid supply pump (not shown).
• the liquid treated by the ultraviolet oxidizer 3 is discharged from the ultraviolet oxidizer 3 as oxidized water.
• the oxidized water introduced into the catalyst mixing tower 4 comes into contact with the catalyst resin that constitutes the catalyst mixing bed, decomposes and removes hydrogen peroxide, etc., and contacts the strongly basic ion exchange resin. Thereby, carbonate ions and the like are removed.
• the liquid treated in the catalyst mixing tower 4 is discharged from the catalyst mixing tower 4 as mixing tower effluent, and supplied to the membrane deaerator 5.
• the membrane deaerator 5 uses the effluent of the mixing tower as a liquid to be treated, and removes gas such as dissolved oxygen contained in the effluent of the mixing tower.
• the liquid obtained by the deaeration treatment in the membrane deaerator 5 (hereinafter referred to as “deaeration water”) contains a trace amount of impurities flowing out of the catalyst mixing tower 4 and the membrane deaerator 5.
• the degassed water is further supplied to the desalination device 6 to remove dissolved ions.
• the desalination unit 6 is a non-regeneration type ion exchange resin tower, and when the adsorption amount of the ion exchange resin reaches the saturation point, the ion exchange resin is replaced.
• the catalyst mixing column containing the catalyst carrier and the ion-exchange resin is provided between the ultraviolet irradiation device 3 and the desalination device 6, the desalination is carried out.
• the load on device 6 is low. For this reason, the size of the desalination unit 6 can be reduced, or the frequency of replacement of the ion exchange resin filled in the desalination unit 6 can be reduced, and a long-term continuous operation of three years or more can be performed.
• the liquid (hereinafter, referred to as "desalted water”) treated in the desalination apparatus 6 is supplied to the membrane separation apparatus 7, and the insoluble matter such as fine metal particles that are not removed in the desalination apparatus 6 is removed.
• the components are removed.
• the liquid discharged from the membrane separation device 7 is ultrapure water having an extremely low impurity concentration.
• the specific resistance is about 18 to 18.25 ⁇ 'cm
• the organic substance concentration (TOC) is less than 1 ⁇ gZL
• the dissolved oxygen concentration is less than 5 ⁇ gZL
• the metal concentration is Ultrapure water less than IngZL can be obtained.
• the ultrapure water discharged from the membrane filtration device 7 is supplied through a pipe to a use point 8 provided with a semiconductor product cleaning device (not shown) and the like.
• the ultrapure water used at the use point 8 is circulated to the storage tank 2 through a pipe.
• the ultrapure water production system 1 is constantly operated to prevent stagnation of ultrapure water in pipes and the like, and prevent the propagation of bacteria and the deterioration of water quality due to the elution of substances such as metal components of the system components. .
• raw water was treated with a pretreatment device and a primary pure water system, and the primary pure water obtained was treated as a liquid to be treated to produce ultrapure water.
• a pretreatment device a device equipped with a coagulation sedimentation device and a sand filtration device was used.
• the primary pure water system a system equipped with a two-bed, three-column ion exchange resin tower, a reverse osmosis membrane device, and a vacuum deaerator was used.
• Raw water quality is as follows: electric conductivity 20mSZm, TOC concentration 700 ⁇ 1200 ⁇ g / dissolved oxygen concentration 6 ⁇ 8mgZL, metal concentration 0 ⁇ 20mgZL, primary pure water has specific resistance of 17.8M ⁇ cm , TOC concentration 1 to 5 ⁇ g / dissolved oxygen concentration 10 to 50 ⁇ g Metal concentration 10 to: LO OngZL.
• a mixed-bed ion exchange resin column consisting of a strongly basic ion exchange resin and a strong acid cation exchange resin is installed, and desalination is further performed.
• the ultrapure water production unit was configured by removing unit 6. That is, in Comparative Example 1, primary pure water was passed through an ultraviolet ray oxidizing device, a mixed-bed ion exchange resin tower, a membrane deaerator, and an ultrafiltration device to produce ultrapure water. did.
• the mixed-bed ion exchange resin tower had the same configuration as that of Example 1 except that it did not contain the catalyst resin.
• the configurations of the ultraviolet oxidation device, the membrane deaerator, and the ultrafiltration device were the same as those of Example 1. Same as.
• Comparative Example 2 the same ion exchange device as the ion exchange device used in Example 1 was disposed downstream of the membrane deaerator in the ultrapure water production device of Comparative Example 1. That is, in Comparative Example 2, primary pure water was passed through an ultraviolet oxidizer, a mixed-bed ion-exchange resin tower, a membrane deaerator, a mixed-bed ion-exchange resin tower, and an ultra-membrane filtration device in this order. To produce ultrapure water.
• Table 1 shows the concentration of hydrogen peroxide in the liquid collected at the outlet of each device in Examples and Comparative Examples.
• UV is an ultraviolet oxidizer
• ADI is a catalyst mixing tower
• MD is a membrane deaerator
• DI1 is a mixed-bed ion exchange resin tower
• DI2 is a mixed tower.
• UF means ultrafiltration device.
• the numerical unit is gZL except for the metal concentration.
• Table 2 shows the concentration of dissolved oxygen in the liquid collected at the outlet of each device in Examples and Comparative Examples.
• Table 3 shows the TOC concentration in the liquid collected at the outlet of each device in the examples and comparative examples. [0062] [Table 3]
• Table 4 shows the metal (Fe) concentration in the liquid collected at the outlet of each device in the examples and comparative examples.
• the unit of the numerical value is ngZL.
• the dissolved oxygen concentration, the TOC concentration, or the metal concentration of the ultrafiltration membrane outlet water was increased.
• the concentration of hydrogen peroxide, the concentration of dissolved oxygen, and the concentration of TOC were all less than 1 wgZL, and the metal concentration was less than IngZL, and high-purity ultrapure water could be produced.
• FIG. 2 shows the test results of Example 2 and Comparative Example 3.
• the vertical axis represents the concentration of hydrogen peroxide in the liquid at the outlet of the catalyst mixing tower 4 with respect to the concentration of hydrogen peroxide in the liquid at the outlet of the ultraviolet oxidizing device 3.
• the horizontal axis shows the flow rate (sv) through the catalyst resin.
• the decomposition rate (%) of hydrogen peroxide is indicated by ire
• the result of Example 2 is indicated by a square point indicated by PE2
• the result of Comparative Example 3 is indicated by a triangle point indicated by CE3.
• the catalyst mixing column 4 was filled with an anion exchange resin and a catalyst resin, and the proportion of the catalyst resin was 5% by weight based on the ion exchange resin.
• Comparative Example 3 in which the catalyst resin was treated alone, the decomposition rate of hydrogen peroxide decreased as the flow rate increased, and the relationship between the decomposition rate of hydrogen peroxide and the flow rate is shown in FIG. It was shown to be linear.
• the results of Example 2 treated with a mixed bed of a catalyst resin and an ion-exchange resin show that the test results of Comparative Example 3 indicate that the linear force derived is much higher than the assumed hydrogen peroxide hydrogen decomposition rate. It was shown to be high.
• the present invention can be applied to an ultrapure water production apparatus used for manufacturing semiconductor products such as LSIs and wafers and for manufacturing pharmaceuticals.

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• Engineering & Computer Science (AREA)
• Water Supply & Treatment (AREA)
• Chemical & Material Sciences (AREA)
• Environmental & Geological Engineering (AREA)
• Life Sciences & Earth Sciences (AREA)
• Hydrology & Water Resources (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Organic Chemistry (AREA)
• Physical Water Treatments (AREA)
• Treatment Of Water By Ion Exchange (AREA)
• Removal Of Specific Substances (AREA)
• Separation Using Semi-Permeable Membranes (AREA)
• Degasification And Air Bubble Elimination (AREA)

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• 2005
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