JP5045099B2 - 超純水製造装置及び超純水製造装置の運転方法 - Google Patents

超純水製造装置及び超純水製造装置の運転方法 Download PDF

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Publication number
JP5045099B2
JP5045099B2 JP2006511705A JP2006511705A JP5045099B2 JP 5045099 B2 JP5045099 B2 JP 5045099B2 JP 2006511705 A JP2006511705 A JP 2006511705A JP 2006511705 A JP2006511705 A JP 2006511705A JP 5045099 B2 JP5045099 B2 JP 5045099B2
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JP
Japan
Prior art keywords
ultrapure water
exchange resin
catalyst
tower
water production
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2006511705A
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English (en)
Japanese (ja)
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JPWO2005095280A1 (ja
Inventor
勝信 北見
生憲 横井
正芳 老沼
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Kurita Water Industries Ltd
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Kurita Water Industries Ltd
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Priority to JP2006511705A priority Critical patent/JP5045099B2/ja
Publication of JPWO2005095280A1 publication Critical patent/JPWO2005095280A1/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/145—Ultrafiltration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/422—Treatment of water, waste water, or sewage by ion-exchange using anionic exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/425—Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/427—Treatment of water, waste water, or sewage by ion-exchange using mixed beds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water

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  • Water Supply & Treatment (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Hydrology & Water Resources (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Water Treatments (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Removal Of Specific Substances (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Degasification And Air Bubble Elimination (AREA)
JP2006511705A 2004-03-31 2005-03-30 超純水製造装置及び超純水製造装置の運転方法 Expired - Fee Related JP5045099B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006511705A JP5045099B2 (ja) 2004-03-31 2005-03-30 超純水製造装置及び超純水製造装置の運転方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004106438 2004-03-31
JP2004106438 2004-03-31
JP2006511705A JP5045099B2 (ja) 2004-03-31 2005-03-30 超純水製造装置及び超純水製造装置の運転方法
PCT/JP2005/006028 WO2005095280A1 (ja) 2004-03-31 2005-03-30 超純水製造装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011128421A Division JP5649520B2 (ja) 2004-03-31 2011-06-08 超純水製造装置

Publications (2)

Publication Number Publication Date
JPWO2005095280A1 JPWO2005095280A1 (ja) 2008-02-21
JP5045099B2 true JP5045099B2 (ja) 2012-10-10

Family

ID=35063665

Family Applications (2)

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JP2006511705A Expired - Fee Related JP5045099B2 (ja) 2004-03-31 2005-03-30 超純水製造装置及び超純水製造装置の運転方法
JP2011128421A Expired - Fee Related JP5649520B2 (ja) 2004-03-31 2011-06-08 超純水製造装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2011128421A Expired - Fee Related JP5649520B2 (ja) 2004-03-31 2011-06-08 超純水製造装置

Country Status (4)

Country Link
US (1) US20070221581A1 (enExample)
JP (2) JP5045099B2 (enExample)
TW (1) TWI408107B (enExample)
WO (1) WO2005095280A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110225891A (zh) * 2017-02-09 2019-09-10 栗田工业株式会社 氨水溶液的制造装置及氨水溶液的制造方法

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005095280A1 (ja) * 2004-03-31 2005-10-13 Kurita Water Industries Ltd. 超純水製造装置
JP5124946B2 (ja) * 2006-01-12 2013-01-23 栗田工業株式会社 超純水製造装置における超純水中の過酸化水素の除去方法
US7851406B2 (en) * 2007-06-12 2010-12-14 Korea Institute Of Chemical Technology Nano-sized palladium-doped cation exchange resin catalyst, preparation method thereof and method of removing dissolved oxygen in water using the same
JP5280038B2 (ja) * 2007-11-06 2013-09-04 野村マイクロ・サイエンス株式会社 超純水製造装置
WO2009082008A1 (ja) * 2007-12-26 2009-07-02 Organo Corporation 過酸化水素除去方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置
JP4920019B2 (ja) * 2008-09-22 2012-04-18 オルガノ株式会社 過酸化水素低減方法、過酸化水素低減装置及び超純水製造装置並びに洗浄方法
JP5499753B2 (ja) * 2010-02-18 2014-05-21 栗田工業株式会社 水処理方法及び装置
WO2011149730A2 (en) * 2010-05-24 2011-12-01 Baxter International Inc. Systems and methods for removing hydrogen peroxide from water purification systems
US20140112999A1 (en) * 2012-08-31 2014-04-24 Water Star, Inc. Method and apparatus for increasing the concentration of dissolved oxygen in water and aqueous solutions
KR102092441B1 (ko) * 2013-10-04 2020-03-23 쿠리타 고교 가부시키가이샤 초순수 제조 장치
JP2015093226A (ja) * 2013-11-11 2015-05-18 栗田工業株式会社 純水製造方法及び装置
TWI573765B (zh) * 2014-09-17 2017-03-11 Zetech Engineering And Services Ltd Catalyst for removing hydrogen peroxide in water and its preparation method
JP6529793B2 (ja) * 2015-03-16 2019-06-12 オルガノ株式会社 被処理液の処理方法及び被処理液の処理装置
JP2016191619A (ja) * 2015-03-31 2016-11-10 株式会社荏原製作所 復水脱塩装置及び復水脱塩方法
JP6439777B2 (ja) * 2016-12-05 2018-12-19 栗田工業株式会社 超純水製造装置及び超純水製造装置の運転方法
JP7213006B2 (ja) * 2017-02-09 2023-01-26 栗田工業株式会社 導電性水溶液の製造装置及び導電性水溶液の製造方法
JP7012196B1 (ja) * 2020-06-23 2022-01-27 オルガノ株式会社 水処理装置、超純水製造装置、水処理方法及び再生型イオン交換塔
US11618702B1 (en) * 2020-06-26 2023-04-04 Kyosuke Kanno Vital water
JP2024160768A (ja) * 2023-05-02 2024-11-15 オルガノ株式会社 水処理設備及び水処理方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05300A (ja) * 1991-11-20 1993-01-08 Kurita Water Ind Ltd 純水製造装置
JPH0699197A (ja) * 1991-05-17 1994-04-12 Ebara Res Co Ltd 純水又は超純水の精製方法及び装置
JPH09192658A (ja) * 1996-01-19 1997-07-29 Nomura Micro Sci Co Ltd 超純水製造装置
JP2002210494A (ja) * 2001-01-18 2002-07-30 Kurita Water Ind Ltd 超純水製造装置
JP2004181369A (ja) * 2002-12-03 2004-07-02 Nomura Micro Sci Co Ltd 超純水製造装置

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Publication number Priority date Publication date Assignee Title
DE3120213A1 (de) * 1981-05-21 1982-12-09 Bayer Ag, 5090 Leverkusen Verfahren zur durchfuehrung katalytischer reaktionen in waessrigen medien
JPS6071085A (ja) * 1983-09-28 1985-04-22 Kurita Water Ind Ltd 過酸化水素の除去方法
JPS60257840A (ja) * 1984-06-04 1985-12-19 Kurita Water Ind Ltd イオン交換装置
JPS61101292A (ja) * 1984-10-24 1986-05-20 Kurita Water Ind Ltd 純水製造装置
US5302356A (en) * 1992-03-04 1994-04-12 Arizona Board Of Reagents Acting On Behalf Of University Of Arizona Ultrapure water treatment system
TW446687B (en) * 1996-02-20 2001-07-21 Nomura Micro Science Kk Method and apparatus for producing ultra pure water
JP3525623B2 (ja) * 1996-05-16 2004-05-10 栗田工業株式会社 復水処理法
TW332783B (en) * 1996-12-05 1998-06-01 Organo Kk The apparatus for manufacturing ultra-pure water
JP3867944B2 (ja) * 1998-03-27 2007-01-17 オルガノ株式会社 酸化性物質を低減した純水の製造方法及び超純水製造装置
CN1192817C (zh) * 1999-04-27 2005-03-16 栗田工业株式会社 用于制造含有溶解的臭氧的水的设备
JP2000308815A (ja) * 1999-04-27 2000-11-07 Kurita Water Ind Ltd オゾン溶解水の製造装置
JP2001062454A (ja) * 1999-08-27 2001-03-13 Kurita Water Ind Ltd 電解水の製造装置
JP2001179252A (ja) * 1999-12-22 2001-07-03 Japan Organo Co Ltd 酸化性物質低減純水製造方法及び装置
JP3894788B2 (ja) * 2001-12-21 2007-03-22 オルガノ株式会社 過酸化水素含有排水処理装置
JP4109455B2 (ja) * 2002-01-15 2008-07-02 オルガノ株式会社 水素溶解水製造装置
WO2005095280A1 (ja) * 2004-03-31 2005-10-13 Kurita Water Industries Ltd. 超純水製造装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0699197A (ja) * 1991-05-17 1994-04-12 Ebara Res Co Ltd 純水又は超純水の精製方法及び装置
JPH05300A (ja) * 1991-11-20 1993-01-08 Kurita Water Ind Ltd 純水製造装置
JPH09192658A (ja) * 1996-01-19 1997-07-29 Nomura Micro Sci Co Ltd 超純水製造装置
JP2002210494A (ja) * 2001-01-18 2002-07-30 Kurita Water Ind Ltd 超純水製造装置
JP2004181369A (ja) * 2002-12-03 2004-07-02 Nomura Micro Sci Co Ltd 超純水製造装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110225891A (zh) * 2017-02-09 2019-09-10 栗田工业株式会社 氨水溶液的制造装置及氨水溶液的制造方法

Also Published As

Publication number Publication date
US20070221581A1 (en) 2007-09-27
JP5649520B2 (ja) 2015-01-07
TWI408107B (zh) 2013-09-11
WO2005095280A1 (ja) 2005-10-13
JP2011194402A (ja) 2011-10-06
TW200538401A (en) 2005-12-01
JPWO2005095280A1 (ja) 2008-02-21

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