WO2004081555A1 - 質量分析システムおよび分析方法 - Google Patents
質量分析システムおよび分析方法 Download PDFInfo
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- WO2004081555A1 WO2004081555A1 PCT/JP2004/003427 JP2004003427W WO2004081555A1 WO 2004081555 A1 WO2004081555 A1 WO 2004081555A1 JP 2004003427 W JP2004003427 W JP 2004003427W WO 2004081555 A1 WO2004081555 A1 WO 2004081555A1
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- sample
- mass spectrometry
- separation
- flow path
- mass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0409—Sample holders or containers
- H01J49/0418—Sample holders or containers for laser desorption, e.g. matrix-assisted laser desorption/ionisation [MALDI] plates or surface enhanced laser desorption/ionisation [SELDI] plates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502753—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by bulk separation arrangements on lab-on-a-chip devices, e.g. for filtration or centrifugation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/84—Preparation of the fraction to be distributed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/06—Fluid handling related problems
- B01L2200/0647—Handling flowable solids, e.g. microscopic beads, cells, particles
- B01L2200/0663—Stretching or orienting elongated molecules or particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/10—Integrating sample preparation and analysis in single entity, e.g. lab-on-a-chip concept
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/06—Auxiliary integrated devices, integrated components
- B01L2300/0681—Filter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0809—Geometry, shape and general structure rectangular shaped
- B01L2300/0816—Cards, e.g. flat sample carriers usually with flow in two horizontal directions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/16—Surface properties and coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/08—Regulating or influencing the flow resistance
- B01L2400/084—Passive control of flow resistance
- B01L2400/086—Passive control of flow resistance using baffles or other fixed flow obstructions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502746—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the means for controlling flow resistance, e.g. flow controllers, baffles
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
- G01N1/22—Devices for withdrawing samples in the gaseous state
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/84—Preparation of the fraction to be distributed
- G01N2030/8447—Nebulising, aerosol formation or ionisation
- G01N2030/8452—Generation of electrically charged aerosols or ions
Definitions
- the present invention relates to a mass spectrometry system and an analysis method.
- an operation of separating and purifying the sample in advance prior to analysis and an operation of separating the sample according to the size and charge are performed.
- mass spectrometry is usually used to analyze separated components.
- the component contained in the sample to be subjected to mass spectrometry is a biological component such as a protein, nucleic acid, or polysaccharide
- the sample was purified, separated by components by two-dimensional electrophoresis, etc., and each component was collected from the separated spots and collected.
- the components were used to prepare a sample for mass spectrometry. Therefore, the separation process and the sample preparation process need to be performed separately, and the operation is complicated.
- Patent Documents 1 and 2 For the purpose of eliminating such complexity of the operation, methods for efficiently performing separation of components in the sample and mass analysis have been studied (Patent Documents 1 and 2).
- Patent Literatures 1 and 2 an electrophoresis tube (capillary tube) for electrophoresis and an ionization unit for mass spectrometry are integrated, and mass spectrometry is performed continuously for electrophoresis and mass spectrometry.
- the device is described.
- this type of device it is necessary to perform mass analysis on each component collected from the electrophoresis tube, so there is room for improvement in terms of analysis efficiency.
- the equipment configuration was large, and there was room for improvement from the viewpoint of space saving.
- Patent Document 3 describes a mass spectrometry method using a microchip. In this method, a probe having an adsorbent bound to the bottom of a substrate is provided, and by contacting a substrate with a sample, a specific component in a sample is adsorbed onto the adsorbent to separate the components. , It is a method of performing mass spectrometry for each probe.
- Patent Document 1 Japanese Patent Application Laid-Open No. 5-1 6 7
- Patent Document 2 Patent No. 2 5 7 2 3 9 7
- Patent Document 3 Japanese Patent Application Laid-Open No. 200001-2 2 812 22 2 Disclosure of the Invention
- the present invention has been made in view of the above-described circumstances, and an object thereof is to provide a technique for efficiently performing sample separation and mass analysis with high accuracy.
- a microchip having a flow path through which a sample passes and a sample separation area provided in the flow path, and light irradiation which emits a laser beam while moving a light irradiation position along the sample separation area.
- a mass spectrometry system comprising: means; and analysis means for analyzing fragments of the sample generated by light irradiation to obtain mass spectrometry data.
- the mass spectrometry system of the present invention is configured to directly sample the sample separated in the sample separation area and analyze its fragments. Therefore, according to the mass spectrometry system of the present invention, it is possible to obtain a two-dimensional profile by two parameters of position A and molecular weight B on the microphone / mouth chip.
- Figures 8 2 (a) and 8 2 (b) are examples of such two-dimensional profiles. This example Then, as described later, the mass analysis is performed by irradiating the laser light while moving the light irradiation position along the sample separation area, and a two-dimensional profile based on the position A and the molecular weight B on the microchip is obtained. It has gained.
- Using such a profile it is possible to obtain various information by mass spectrometry without identifying components. For example, in analyzing a subject's blood and performing a certain disease screening, using a profile of a healthy person and a profile of an afflicted person as reference data and comparing a two-dimensional profile obtained from the subject's blood. Thus, screening can be performed without component analysis.
- the sample is separated in the sample separation area according to the characteristics thereof. Then, while moving the light irradiation position along the sample separation area, the separated sample can be irradiated with laser light to perform mass analysis. For this reason, it is possible to ionize and perform mass analysis without moving the separated sample from the separated position. Therefore, the process of extracting the separated sample from the separated position is unnecessary, so no loss of sample occurs, and even when the amount of sample is small, separation is reliably performed and mass analysis is performed with high accuracy. Can.
- moving the light irradiation position along the sample separation area refers to moving the relative position of the laser relative to the sample separation area, and the irradiation direction or irradiation angle of the laser light is It also includes changing.
- the sample can be ionized by direct laser light irradiation along the sample separation area, and mass analysis can be performed. Mass spectrometric spectra of each component can be obtained efficiently.
- the analysis means may include a data storage unit that associates and stores the light irradiation position and the mass spectrometry data corresponding to the light irradiation position.
- the separation position of each component and the mass spectrometric The analysis can be efficiently performed in combination with R and the spectrum characteristics of each component can be acquired comprehensively. Therefore, based on the acquired information, identification and the like of the components in the sample can be performed accurately and rapidly.
- the sample separation area separates the sample according to the molecular weight of the sample, the equipotential point, or the hydrophobicity of the surface, and the light irradiation means is in the sample separation area.
- the laser light may be irradiated while moving the light irradiation position along the separated sample.
- the sample separation area in a form suitable for mass analysis.
- the apparatus be configured such that the sample is rapidly ionized and the fragments move smoothly into the mass spectrometer when irradiated with laser light. From this point of view, in the sample separation region in which the polymer gel is filled in the flow path used conventionally, a part of the polymer gel is ionized by laser irradiation, and fragments from the sample are also obtained.
- the sample separation area of the present invention it is not always suitable for use as the sample separation area of the present invention. That is, in the present invention, it is important to design the sample separation region from the viewpoint different from the configuration used in the conventional separation device. By adopting such a sample separation area, polygonal data including two parameters of position A on the microchip for sample separation and molecular weight B for mass analysis can be accurately obtained, and a novel analysis which has never been done before. Can be realized.
- the configuration of the sample separation region suitable for mass spectrometry according to the principle of the present invention will be described below.
- the flow path may be provided on the surface of the substrate, and the sample separation area may have a plurality of columnar bodies. In this case, the gaps between adjacent columns act as sieves.
- a plurality of columnar bodies refer to a number of columnar bodies capable of exhibiting a separation function.
- the separated sample can be efficiently ionized by irradiating it with laser light.
- the liquid sample is held in the separation channel at the time of separation and drying is suppressed as compared to the conventional separation method using a filler such as gel or beads, such as electrophoresis, and drying is also suppressed at the time of laser light irradiation. Vaporization takes place smoothly.
- the measurement accuracy may be significantly reduced due to the conversion of the filler. According to the configuration using the columnar body according to the present invention, such problems can be solved, and highly accurate analysis becomes possible.
- the sample separation area includes a plurality of columnar body arrangement parts in which a plurality of columnar bodies are arranged, and a path through which the sample passes between the adjacent columnar body arrangement parts. Can be provided. As a result, the smaller the size of the substance to be separated, the more it is trapped in the columnar body in the sample separation area and passes along a long path.
- the width of the path can be larger than the average distance between the columns in the column. In this way, the large-sized substance passes smoothly through the path portion in the sample separation area, and the small-sized substance passes through the column-arranged portion, and the long path is followed depending on its size. Pass through the sample separation area.
- a plurality of the columnar body disposition portions are disposed in combination so that the planar disposition is substantially rhombic, and the planar disposition of each of the columnar body disposition portions is substantially rhombic;
- the columnar body may be disposed.
- the density of the plurality of columnar bodies may be gradually higher in the traveling direction of the sample in the flow channel.
- the density of the plurality of columnar bodies may be gradually lowered in the traveling direction of the sample in the flow channel. In this case, since clogging at the columnar body arrangement portion is suppressed, the throughput can be improved.
- the sample separation area and an adjustment area in which the columnar body is formed more sparsely than the sample separation area alternately with respect to the traveling direction of the sample in the flow path can be in the formed configuration. With such a configuration, the shape of each separated band can be made more linear. Therefore, concentration of bands becomes possible, and when mass analysis of each band is performed, accurate detection is possible.
- a metal layer is provided on the surface of the columnar body. It may be done.
- the columnar body may be made of metal.
- surface plasmon waves are generated on the surface of the columnar body, so the ionization efficiency of the sample is improved.
- a strong electric field can be generated on the surface of the columnar body. Therefore, the extraction efficiency of the ionized sample can be improved.
- the cross-sectional shape of the columnar body is preferably wider at the bottom than at the top. By so doing, the electric field can be concentrated on the top of the columnar body, and the extraction efficiency of the ionized sample can be further improved.
- the laser light may be an infrared light laser or an ultraviolet light laser.
- the sample separation area can be configured to have a plurality of recesses.
- the smaller the size of the substance to be separated the more the substance is trapped in the recess in the sample separation area and passes through a long path. That is, substances of small size are separated in such a way that they are discharged later than substances of large size. Larger materials pass through the separation region relatively smoothly, reducing clogging problems and significantly improving throughput.
- the inertial radius of the molecule is also extremely wide, so large-sized substances are clogged, and once such substances are clogged, they are released even after washing. It will be difficult to According to the present invention, since such a problem is solved, the present invention can be suitably applied to separation of nucleic acids, proteins and the like.
- the plurality of recesses means the number of recesses enough to secure the separation function.
- the maximum diameter of the second opening of the recess can be set extremely narrow. In this case, it is possible to separate and sort out various substances that could not even be predicted conventionally.
- the above-mentioned recess may have a minute opening of several hundred nanometers or less. It is desirable to have
- the shape of the opening may be, for example, circular, oval, or polygonal, and is not particularly limited.
- the maximum diameter of the opening of the recess means the length of the longest straight line among arbitrary straight lines formed by connecting one point of the opening to another point.
- the depth direction of the recess does not necessarily have to be the same as the direction of gravity.
- the recess may be provided in the horizontal direction in the channel wall surface.
- the sample separation region may be provided with a projection provided with a plurality of the concave portions.
- the recess may be formed by an anodic oxidation method. According to the anodic oxidation method, it is possible to realize the process with a small number of sample separation areas having recesses and recesses of desired size.
- the surface of the inner wall of the flow path may be configured to be hydrophilized. Further, in the mass spectrometric system of the present invention, the surface of the inner wall of the flow path can be made water repellent. By doing this, it is possible to suppress nonspecific adsorption of sample components on the inner wall of the flow path. For this reason, it is possible to suppress the loss of the sample and the decrease in the separation accuracy, and to exhibit a good separation ability. In addition, since the loss of the sample is suppressed, the accuracy of mass spectrometry can be improved.
- the inner wall of the flow path may be made hydrophilic by attaching a hydrophilic substance to the surface of the inner wall of the flow path.
- the inner wall of the flow path may be made hydrophilic by forming a silicon thermal oxide film on the surface of the flow path.
- a thermal oxide film By forming a thermal oxide film, nonspecific adsorption of the sample on the flow path wall is suppressed.
- ionization of the hydrophilic substance attached to the surface of the sample separation channel when the laser light is irradiated is suppressed. Because of this, the background of mass spectrometry It can be reduced to further improve the measurement accuracy.
- the surface of the sample separation area includes a plurality of first areas spaced apart from one another, and a second area which occupies the surface of the sample separation area excluding the first area.
- one of the first region and the second region may be a hydrophobic region, and the other may be a hydrophilic region.
- a configuration in which the first region is a hydrophobic region and a second region is a hydrophilic region (ii) any one in which the first region is a hydrophilic region and the second region is a hydrophobic region Can be adopted.
- the hydrophilic region in the present invention refers to a region having higher hydrophilicity than the hydrophobic region.
- the degree of hydrophilicity can be determined, for example, by measuring the water contact angle.
- the sample to be separated is introduced into the flow path in the state of being dissolved or dispersed in a relatively hydrophilic solvent.
- a relatively hydrophilic solvent avoids the surface of the hydrophobic region (first region) in the sample separation region and distributes only in the hydrophilic region (second region). Therefore, the gap of the hydrophobic region becomes a passage path of the sample to be separated, and as a result, the time required for the passage of the sample separation region is determined by the relationship between the spacing between the hydrophobic regions and the size of the sample. Become. Thereby, the sample is separated according to the size.
- separation according to the polarity of the sample is also performed in the present invention. That is, it is possible to separate multiple types of samples with different degrees of hydrophilicity / hydrophobicity.
- highly hydrophobic samples are easily trapped in the hydrophobic region, and the outflow time is relatively long, while highly hydrophilic samples are difficult to be trapped in the hydrophobic region, and the outflow time is relatively short.
- separation including not only sample size but also polarity is performed, and separation of a multicomponent system, which was conventionally difficult to separate, can be realized.
- the sample separation area provided on the flow path surface is used as the separation means, unlike the method in which separation is performed by the structure which becomes an obstacle.
- the sample separation area can be formed by surface treatment of the flow path, and the desired separation performance can be obtained by controlling the distance between the first areas. An appropriate configuration can be realized relatively easily.
- a mask having an opening is provided on at least a part of the surface of the flow path, and then a compound having a hydrophilic group is deposited on the flow path surface from the opening; Then, the mask may be removed to form the sample separation area in which the hydrophilic area is disposed.
- the spacing between the hydrophobic regions can be easily adjusted by adjusting the mask opening width. That is, the spacing between the hydrophobic regions can be appropriately adjusted according to the purpose of separation, and the sample separation region can be configured according to the purpose of separation.
- separation of substances of various sizes is required, from the separation of large-sized substances to the separation of nano-order substances.
- the separation size can be narrowed by narrowing the distance between the first regions. Since the spacing between the first regions can be easily realized by using the microfabrication technology, separation of a substance of nano-order and one size can be suitably realized.
- a mask having an opening is provided on at least a part of the surface of the flow path, and then a compound having a hydrophobic group is deposited on the flow path surface from the opening. Then, the mask may be removed to form the sample separation area in which the hydrophobic area is disposed.
- separation can be performed in a short time with a small amount of sample. Since the separation according to the present invention performs separation according to the surface characteristics of the sample separation region, precise separation can be realized, and since loss of the sample is small, sufficiently high resolution can be realized even with a small amount of sample. To achieve superior resolution Can. Furthermore, in the present invention, since separation is performed depending on the surface characteristics of the flow path passing through the sample, problems such as clogging are less. In addition, after use, it can be very easily cleaned by a method such as pouring a cleaning solution on the surface of the sample separation area.
- separation of various functions can be realized by the relationship between the distance between adjacent first regions and the size of the sample to be separated contained in the liquid.
- the sample separation area functions as a sample concentrator.
- the sample separation area acts as a filter, and the sample is blocked upstream of the sample separation area.
- the sample is concentrated to a high concentration on the upstream side of the sample separation area.
- the sample separation area functions as a sample separation function, and the sample is separated in the sample separation area according to the size, the degree of hydrophilicity, and the like. As a result, the separated sample flows out to the downstream side of the sample separation area.
- a plurality of the sample separation areas can be provided. In this way, rising more wide degree of freedom in designing the sample separation region, it is possible to further improve the order resolution ⁇ which can be selected an optimum shape of the sample separation region in the sample.
- the plurality of sample separation areas may be arranged in a stripe.
- the hydrophobic region may be constituted by a film containing a compound having a hydrophobic group.
- the compound having a hydrophobic group may be a silane coupling agent having a hydrophobic group. Also, it may be a silicone compound.
- a pre-hydrophobic region can be formed by bringing a polydimethylsiloxane block into contact with the surface of the hydrophilic flow path.
- the contact portion can be selectively hydrophobized. Therefore, the hydrophobic region can be formed reliably and easily.
- the hydrophobic region can be formed reliably and easily.
- silicone oil can be used as the liquid silicone compound. According to this method, it is possible to form a mixed pattern of a hydrophobic surface and a hydrophilic surface by a simple process.
- the hydrophilic region may be constituted by a film containing a compound having a hydrophilic group.
- the compound having a hydrophilic group may be a silane coupling agent having a hydrophilic group.
- a plurality of the flow paths may be provided, and a liquid sample introduction flow path intersecting with the flow paths may be provided.
- a plurality of columnar bodies may be disposed between the sample separation area and a portion where the flow path and the flow path for liquid sample introduction intersect with each other.
- molecules in the sample reach the separation area via the area where the plurality of columns are disposed. This makes it possible to limit the size of molecules flowing into the channel.
- mass spectrometry of molecules of desired size can be realized quickly and accurately.
- the mass spectrometric system of the present invention it is possible to further include a dam portion in which the columns are arranged in a row. By doing this, it is possible to accumulate the diffused sample in a certain area adjacent to the blocking portion. Prior to separation, the sample can be accumulated in a certain area, and the band of the sample can be narrowed, so that the resolution can be improved.
- the blocking portion may be disposed adjacent to the sample separation area. In this way, since the width of the sample can be narrowed before the sample passes through the separation area, the separation performance is improved. Therefore, it is possible to realize high precision separation. In addition, since the band width of the separated sample is also narrowed, the separated sample can be concentrated. For this reason, Mass spectrometric measurement can be performed more reliably.
- the sample separation area may be divided into a plurality of parts through slits.
- the slit may be single or plural.
- the sample may further include external force applying means for applying an external force to the sample to move the sample in the flow path.
- external force applying means for applying an external force to the sample to move the sample in the flow path.
- the sample can be moved using capillary action.
- separation operation can be easily performed in a chamber for mass spectrometry.
- a micro flow channel is formed in the sample separation area, and the sample is introduced into the sample separation area from the flow channel via the micro flow channel by capillary action. It may be configured as follows.
- an upper portion of the flow path may be coated with a thin film including a mass spectrometric matrix.
- drying of the sample in the flow path during separation can be suitably suppressed. Also, after separation, it is sufficient to irradiate laser light without removing the coating, and it is unnecessary to mix the matrix in advance with the sample, or to add the matrix to the sample separation area after separating the sample. It becomes.
- a substrate a sample separation region in which particles for sample adsorption are attached to the substrate and the sample is developed according to a specific property
- the sample separation It is characterized by comprising: a light irradiation means for irradiating a laser beam while moving a light irradiation position along the region; and an analysis means for analyzing fragments of the sample generated by the light irradiation to obtain a mass spectrometry data.
- a mass spectrometry system is provided.
- development means distributing the sample in the sample separation area according to the properties of the sample, and separation is an aspect of development. .
- the sample separation area in which the sample adsorption particles are attached to the substrate can be easily formed by a simpler method than in the case where the microfabrication is performed in the flow path. Then, for example, the sample can be developed according to the affinity between the sample and the developing solution for developing the sample. It is also possible to develop the sample according to the polarity. Because of this, the sample can be separated reliably. Moreover, according to the present invention, separation can be started in a state where the sample is dried to some extent. For this reason, it is possible to narrow the band width of the sample.
- the sample adsorbing particles may be silica gel.
- an analysis method of performing mass spectrometry using a microchip having a sample separation area the step of separating the sample into the sample separation area according to the specific property of the sample, the sample separation area Analysis including moving the laser irradiation position while moving the light irradiation position along and analyzing the fragments of the sample generated by the light irradiation to obtain a mass spectrometric data.
- a method is provided.
- an analysis method of performing mass spectrometry using a substrate having a sample separation area which comprises: developing the sample in the sample separation area according to a specific property of the sample; And irradiating the laser light while moving the light irradiation position along the sample separation region; and analyzing the fragments of the sample generated from the light irradiation to obtain mass spectrometry data.
- An analysis method is provided.
- each component in the separated or developed sample The analysis can be performed by combining the position of and the mass spectrometry spectrum of the component. Therefore, the spectral characteristics of each component can be efficiently and comprehensively acquired. Therefore, based on the acquired information, identification and the like of the components in the sample can be performed accurately and rapidly.
- the step of separating the sample after the step of separating the sample, the step of depolymerizing the sample, the step of obtaining first mass spectrometric data, and the step of separating the sample Performing the step of irradiating the laser light without performing the step of analyzing, analyzing the fragments of the sample generated by the light irradiation to obtain second mass spectrometry data, the first mass spectrometry data, and Performing the identification of the sample based on the second mass spectrometry data.
- the step of reducing the molecular weight of the sample is carried out to obtain first mass spectrometry data, and after the step of developing the sample. And performing the step of irradiating the laser light without performing the step of reducing the molecular weight to analyze fragments of the sample generated by the light irradiation to obtain second mass spectrometric data; Performing the identification of the sample based on mass spectrometry data and the second mass spectrometry data.
- the components in the sample are depolymerized in a mixed state, so which component in the sample is derived from the separated or developed fragment It was difficult to judge.
- the sample is separated or developed in advance, and then depolymerized without moving from the sample separation region, so the components are depolymerized for each component contained in the sample. Mass spectrometric analysis of fragments can be obtained. This enables more detailed analysis.
- the first mass spectrometric data obtained by depolymerizing each component in the separated or developed sample and the second mass spectrometric data obtained without demerization are combined to obtain a sample. Identification is made. Therefore, more accurate and detailed information about each component in the sample You can get
- the step of immobilizing the separated sample may be included in the sample separation area before the step of irradiating the laser light.
- a step of immobilizing the developed sample in the sample separation area may be included before the step of irradiating a laser beam.
- the step of separating the sample after the step of separating the sample, the step of spraying a mass spectrometry matrix on the sample separation region may be included before the step of irradiating the laser light.
- the step of spraying a matrix for mass spectrometry onto the sample separation area may be included before the step of irradiating the laser light.
- FIG. 1 is a diagram showing the configuration of a mass spectrometry system according to the present embodiment.
- FIG. 2 is a diagram showing a mass spectrometric method using the mass spectrometric system of FIG.
- FIG. 3 is a diagram showing the configuration of a microchip used in the mass spectrometry system of FIG.
- FIG. 4 is a view for explaining the structure of the liquid reservoir of the microphone port chip of FIG. 3;
- FIG. 5 is a cross-sectional view taken along the line A-A 'of FIG.
- FIG. 6 is a view showing the structure of the separation channel in FIG. 3 in detail.
- FIG. 7 is a cross-sectional view of the separation channel of FIG.
- FIG. 8 is a diagram for explaining the separation method of the sample.
- FIG. 9 is a view for explaining a method for introducing a buffer solution into a microchip.
- FIG. 10 is a cross-sectional view of a nanostructure formed on a microchip.
- Figure 11 is a diagram for explaining the method of forming the nano structure shown in Figure 10
- FIG. 12 is a figure for demonstrating the formation method of the nanostructure shown in FIG.
- FIG. 13 is a figure for demonstrating the formation method of the nanostructure shown in FIG. .
- FIG. 14 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 15 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 16 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 17 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 18 is a view for explaining a method of manufacturing a microchip.
- FIG. 19 is a diagram for explaining a method of manufacturing a microchip separation channel.
- FIG. 20 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 21 is a diagram showing the configuration of a microchip used in the mass spectrometry system of FIG.
- FIG. 22 is a diagram showing a method of applying a correction voltage to adjust the electroosmotic flow.
- FIG. 23 is a diagram showing the configuration of a microchip used for the mass spectrometry system of FIG.
- Figure 24 shows the specific structure of the joint used for the microchip.
- FIG. 25 is a diagram for explaining the separation method of the sample.
- FIG. 26 is a diagram for explaining a method of manufacturing a microchip separation channel.
- FIG. 27 is a diagram for explaining a method of manufacturing a microchip separation channel.
- Fig. 28 is a diagram showing an example of a method of arranging columns.
- FIG. 29 is a view showing an example of a method of arranging columns.
- FIG. 30 is a plan view showing the arrangement of pile patches.
- FIG. 31 is a plan view showing the arrangement of pillar patches.
- FIG. 32 is a diagram showing an example of a method of arranging columns.
- FIG. 33 is a view showing an example of a method of arranging columns.
- FIG. 34 is a diagram showing a configuration of a microchip used in the mass spectrometry system according to the present embodiment.
- FIG. 35 is a diagram showing the configuration of a microchip used in the mass spectrometric system according to this embodiment.
- FIG. 36 is a diagram showing the configuration of a microchip used in the mass spectrometry system according to the present embodiment.
- FIG. 37 is a diagram showing the configuration of a microchip used in the mass spectrometric system according to the present embodiment.
- FIG. 38 is a diagram showing the configuration of a microchip used in the mass spectrometric system according to the present embodiment.
- FIG. 39 is a diagram showing the configuration of a microchip used in the mass spectrometry system according to the present embodiment.
- FIG. 40 is a diagram showing the configuration of the microchip used in the mass spectrometric system according to the present embodiment.
- FIG. 41 is a view showing an example of a flow path structure.
- FIG. 42 is a view showing an example of a flow path structure.
- FIG. 43 is a diagram showing the structure of the separation channel in FIG. 3 in detail.
- FIG. 44 is a diagram showing the structure of the separation channel in FIG. 3 in detail.
- FIG. 45 is a diagram for explaining a method of separating a sample.
- FIG. 46 is a view showing the arrangement of the recess in the sample separation area.
- FIG. 47 is a diagram showing the arrangement of the recess in the sample separation area.
- FIG. 48 is a diagram showing the arrangement of the recess in the sample separation area.
- FIG. 49 is a diagram showing the arrangement of recesses in the sample separation area.
- FIG. 50 is a diagram showing the arrangement of recesses in the sample separation area.
- FIG. 51 is a diagram showing the arrangement of recesses in the sample separation area.
- FIG. 52 is a view showing the arrangement of the recess in the sample separation area.
- FIG. 53 is a view for explaining the shape of the concave portion of the microchip used in the mass spectrometric system according to the present embodiment.
- FIG. 54 is a diagram showing an example of the configuration of the separation channel of the microchip.
- FIG. 55 is a diagram showing an example of the configuration of the separation channel of the microchip.
- FIG. 56 is a view showing an example of the configuration of the separation channel of the microchip.
- FIG. 57 is a diagram for describing a process of manufacturing a recess in a substrate.
- FIG. 58 is a view for explaining porous alumina.
- FIG. 59 is a diagram showing a state in which the peripheral portion of the aluminum layer is covered with an insulating film.
- FIG. 60 shows in detail the structure of the separation channel in the microchip according to the present embodiment.
- FIG. 61 is a diagram showing in detail the structure of the separation channel in the microchip according to the present embodiment.
- FIG. 62 is a diagram for explaining a method of separating a sample.
- FIG. 63 is a view for explaining a method of separating a sample.
- FIG. 64 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 65 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 66 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 67 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 68 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 69 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 70 is a diagram for explaining a method of manufacturing a microchip.
- FIG. 71 is a cross-sectional view showing a schematic structure of a microchip used in the mass spectrometric system according to the present embodiment.
- FIG. 72 is a view showing an example of the configuration of the flow path of the microchip.
- FIG. 73 is a view showing an example of the configuration of the flow path of the microchip.
- FIG. 74 is a diagram showing an example of the configuration of the flow path of the microchip.
- FIG. 75 is a diagram for explaining the function of Pillar mesh.
- FIG. 76 is a diagram showing a configuration of a microchip used in the mass spectrometric system according to the present embodiment.
- FIG. 77 is a diagram showing a configuration of a mass spectrometry system according to the present embodiment.
- FIG. 78 is a diagram for explaining a control method of the mass spectrometric system of FIG.
- FIG. 79 is a diagram for explaining a mass spectrometry method according to the present embodiment.
- FIG. 80 is a diagram for explaining a mass spectrometry method according to the present embodiment.
- FIG. 81 is a diagram for explaining a method of analyzing fragment patterns obtained by mass spectrometry according to the present embodiment.
- FIG. 82 is a diagram showing a fragment pattern obtained by the mass spectrometry system according to the present embodiment.
- FIG. 83 is a diagram showing the configuration of a mass spectrometry system according to the present embodiment.
- FIG. 84 is a view showing a method of spraying a matrix solution into a channel.
- FIG. 85 is a diagram for explaining the sample pretreatment method.
- FIG. 86 is a view showing an example of the configuration of a columnar body.
- FIG. 87 is a diagram showing a state in which the peripheral portion of the aluminum layer is covered with a conductive layer.
- the overall configuration of the microchip may be any of the configurations shown in the drawings such as FIG. 3, FIG. 21, FIG. 22, FIG. 22, FIG. 23, FIG. 35, FIG. 37 or FIG. It may be adopted.
- pillar is a form of a columnar body, and refers to a minute columnar body having a shape of a cylinder or an elliptic cylinder.
- pillar patch and “patch area” are shown as one form of the columnar body arrangement portion, and refer to an area where a large number of pillars are formed in a group.
- FIG. 1 is a diagram showing the configuration of a mass spectrometry system according to the present embodiment.
- the flow path (not shown) formed in the microchip 3 5 3 on the sample stage 3 5 5 is irradiated with a laser beam from the laser 3 1
- the sample separated therein is ionized.
- the laser light emitted from the laser transmitter 3 6 1 is collected by the laser light collecting mechanism 3 5 9 and irradiated along the flow path on the microchip 3 5 3. Ru.
- the separated fractions are sequentially ionized by irradiating the flow path along the separation direction with the laser light. be able to.
- the ionized fragments are detected by the mass analysis unit 363 through the ion extraction electrode 3 8 1.
- the microphone When irradiating laser light along the flow path, the microphone is driven by the drive mechanism 3 5 7 that adjusts the position of the sample stage 3 5 5 on which the microchip 3 5 3 is placed. Move the position of the flow path on the mouth tip 353.
- the operation of the drive mechanism 3 57 is controlled by a drive mechanism control unit 367.
- the drive mechanism control unit 367 may input the drive method from the key board 379.
- the laser light irradiation from the laser transmitter 36 1 is controlled by a laser control unit 373. Further, the signal detected by the mass analysis unit 363 is analyzed by the analysis result analysis unit 371.
- the analysis results in the analysis unit 371 are stored in the storage unit 369 in association with the positional information in the drive mechanism control unit 367 and the information on the laser light irradiation conditions in the laser control unit 373 and are imaged Imaged in Part 37-5.
- the imaged analysis results are displayed on the display 37 7.
- the drive mechanism control unit 367, the analysis result analysis unit 37 1, the laser control unit 3 73, the storage unit 369, and the imaging unit 375 are included in the control unit 3605 that controls the mass spectrometry system.
- FIG. 2 is a diagram showing a mass spectrometry method using the mass spectrometry system of FIG.
- the position of the sample holder on the sample stage 3 5 5 is set to the initial state by the drive mechanism 3 5 7 (S 13), and the laser light is irradiated onto the flow path (not shown) on the microchip 3 5 3 Positioning (S14). And a laser transmitter
- the flow path (not shown) on the microchip 33 is irradiated with a laser beam (S 17), mass analysis is performed (S 18), and the vector obtained by the analysis result analysis unit 3 71 Are stored in the storage unit 369 (S 19). Then, the sample stage 35 5 is moved by a small amount sequentially in the X and Y directions (S 21, S 22), SI Repeat steps 7 to 19 until the end point (NO in S20).
- the ionization method is a method by laser irradiation, even if it is LD (laser-elimination ionization), MA
- the separation method of the ionized sample is not particularly limited, and can be separated by TOF (time-of-flight type) or other predetermined method.
- MS / MS may be used instead of mass spectrometry (MS). More detailed information can be obtained with MS ZMS.
- a substance used as a matrix may be introduced into the flow path at a predetermined timing, or may be added in advance to a mobile phase such as a buffer solution.
- the matrix solution may be applied to the flow path by spraying or the like.
- Figs. 84 (a) to 84 (c) show a method of spraying a matrix solution into a flow path.
- the microchip on the metal plate 383 Install 3 5 3 and spray the Matrix Solution 3 8 7 by electrospray from the sprayer 3 8 5.
- the electrospray method is a spray method utilizing the phenomenon that when a high voltage is applied to a thin metal tube, the liquid in the tube is sprayed as very fine particles.
- a voltage of 500 V to 5 kV is applied between the sprayer 385 and the metal plate 383, and the flow path on the microchip 3 5 3 (not shown in FIG. 8 4 (a))
- the amount of spraying at this time can be, for example, several L / min.
- Figure 8 4 (b) shows a method of spraying the matrix solution 3 8 7 from the sprayer 3 8 9 by the pressure of the nebulizer gas.
- the nebulizer gas for example, an inert gas such as N 2 or Ar can be used.
- FIG. 8 4 (c) is a view showing a sprayer 3 9 which can be used by combining the electrospray method and the pressure of the nebulizer gas.
- the electrospray method can be obtained by applying a voltage between the sprayer 3 9 9 and the metal plate 3 8 3, and without applying a voltage, as shown in FIG.
- the pressure of the nebuliser gas is also adapted to spray the matrix solution 3 8 7. Furthermore, voltage and gas pressure can be simultaneously applied and sprayed.
- the matrix may be formed into a sheet to cover the flow path. In this way, drying of the sample during separation is suppressed. And, after separation, there is no need to remove the sheet in the upper part of the flow path. Furthermore, when the sheet is provided and laser light is irradiated, the sample and the matrix are mixed, so that the operation of adding the matrix to the separated sample becomes unnecessary.
- the channel and sample separation region can be formed on the surface of a silicon substrate, a glass substrate such as quartz, or a resin substrate such as silicon resin.
- substrate A groove can be provided on the surface of the plate, and this can be sealed by a surface member to form a channel or sample separation region in the space surrounded by these.
- the columnar body can be formed, for example, by etching the substrate into a predetermined pattern, but the method of manufacturing the same is not particularly limited.
- the shape of the columnar body includes cylinders, oval cylinders, pseudo cylinder shapes; cones such as conical cones, elliptical cones, triangular pyramids, etc., prisms such as triangular prisms and square prisms, stripes, and various other shapes.
- the size of the columnar body can be, for example, about 10 nm to 1 mm in width and about 10 nm to 1 mm in height.
- the distance between adjacent columns is appropriately set according to the purpose of separation. For example, (i) separation and concentration of cells and other components
- the columnar body disposition portion includes a columnar body group.
- Columnar body groups in each columnar body arrangement portion can be arbitrarily arranged at mutually different sizes and intervals.
- the columnar bodies may be regularly formed at substantially equal intervals with the same size.
- FIG. 3 is a view showing the configuration of the microchip 3 07 installed as the microchip 3 5 3 on the sample stage 3 5 5 of the mass spectrometer 3 5 1.
- a separation channel 112 is formed on the substrate 110, and a reservoir 101a and a reservoir 101b are formed at both ends of the separation channel 112, respectively.
- a plurality of columnar bodies (not shown) are disposed in the separation channel 112 to separate the sample.
- Electrodes are provided in the liquid reservoir 101 a and the liquid reservoir 101 b, and a voltage can be applied to both ends of the separation channel 112 using this.
- the external dimensions of the microphone chip 3 0 7 may be selected depending on the application. For example, as shown in the drawing, the value shall be 5 mm to 5 cm long and 3 mm to 3 cm wide.
- FIGS. 4 and 5 the structure of the liquid reservoir provided with the electrodes will be described with reference to FIGS. 4 and 5 by taking the liquid reservoir 101 a as an example.
- FIG. 4 is an enlarged view of the vicinity of the liquid reservoir 101 a in FIG.
- FIG. 5 is a cross-sectional view of FIG. 4 in the direction of AA ′. As shown in FIGS.
- a coating 801 provided with 8002 is provided.
- the coating 801 does not cover the reservoir 101 a, the reservoir 101 b and the separation channel 112, and the top of these is open.
- a conductive path 800 is provided on the cover 801 so that it can be connected to an external power supply.
- the electrode plate 8004 is disposed along the wall surface of the liquid reservoir 101a and the conduction path 8003. The electrode plate 800 and the conduction path 800 are crimped and electrically connected. The same structure can be applied to the liquid reservoir 101 b.
- a liquid such as a buffer solution is introduced from the liquid reservoir 101 a into the separation channel 112. Then, inject the sample into the reservoir 101 a. Then, a voltage is applied between the fluid reservoir 101 a and the fluid reservoir 101 b so that the sample flows in the direction of the fluid reservoir 101 b. As a result, the sample passes through the separation channel 112. During this time, the separation channel is processed at a speed according to the size of the molecule and the strength of the charge, and the size of the gap between the columns. 1 1 2 2 As a result, in the sample Different molecular groups are separated into bands moving at different speeds.
- FIG. 6 shows the structure of the separation channel 112 in FIG. 3 in detail.
- the structure shown in FIG. 6 can also be applied to the drawings after FIG.
- grooves having a width W and a depth D are formed in the substrate 110, and in this, cylindrical pillars 125 having a diameter ⁇ and a height d are regularly formed at equal intervals.
- the sample passes through the gap between the pillars 125.
- the average distance between adjacent PIL1 1 2 5 is P.
- Each dimension can be, for example, in the range shown in FIG.
- FIG. 7 is a cross-sectional view of the separation channel 112 of FIG.
- a large number of pillars 125 are formed in the space formed by the grooves formed in the substrate 110.
- the gap between the pillars 125 is the separation channel 112.
- the filter 125 By using a filter 125, multiple components in a sample can be reliably separated. Therefore, after separating the sample by using the microchip 3 07 as the microchip 3 5 3 in FIG. 1, the sample is placed on the sample stage 3 5 5 of the mass spectrometry system 3 5 1 of FIG. By irradiating the laser light from the laser light transmitter 3 61 along the light waves 112, the separated pandions are ionized. Alternatively, the separation operation may be performed on the sample stage 355, and mass analysis may be performed continuously to the separation operation.
- extraction, drying, and structural analysis of a target component can be performed on a single microchip 30.
- the microchip 37 and the mass spectrometry system 351 are also useful, for example, for proteome analysis.
- a coating (not shown) may be provided on the upper side of the separation channel 112.
- the material used as a coating can be, for example, a film of P D M S (polydimethylsiloxane). Since the PDSMS film is easy to attach and detach and has excellent sealing performance, drying of the sample during separation can be suitably suppressed by using this. In addition, it is possible to easily peel it off from the substrate 110 after completion of separation, and after the completion of separation, the sample can be dried quickly and mass spectrometry can be performed.
- the matrix may be formed into a sheet and may be coated.
- the columnar bodies can be disposed at different intervals in the columnar body disposition portion. In this way, molecules, ions of multiple sizes, such as large, medium, and small, can be separated more efficiently.
- the microchip 37 can exhibit good separation performance.
- the coating material for example, a substance having a structure similar to the phospholipid constituting the cell membrane can be mentioned. Examples of such substances include Lipizyua (registered trademark, manufactured by NOF Corporation). In case of using Lipizyuar®, dissolve it in buffer such as TBE (Trisporate + EDTA) buffer so that it becomes 0.5 wt%, fill this solution in the separation channel 112, The channel wall can be coated by leaving it for a minute.
- the flow path wall can be made of water-repellent resin such as fluorine resin, or bovine serum albumin Coating with a hydrophilic substance can also prevent molecules such as DNA from sticking to the channel wall.
- the microchip 3 0 7 is preferably used with a buffer introduced therein.
- a buffer solution is introduced into the tip 150 by performing centrifugation while the tip 150 is fixed in the holder 135 of the centrifuge tube 151.
- a hydrophilic film such as a silicon oxide film on the surface of the separation channel 112 as a method of introducing the buffer solution into the channel more reliably.
- the buffer solution can be introduced smoothly without applying any external force. This point will be described later with reference to FIG. 17 (silicon thermal oxide film 2 0 9 formed in the step of FIG. 1 7 (d)).
- the coating substance when mass spectrometry is performed using the microchip 37 with the channel wall coated as described above, the coating substance may be detected as a background, but a silicon thermal oxide film is formed.
- the flow path surface is hydrophilized, the background in mass spectrometry can be reduced as described later, and the measurement accuracy can be further improved.
- the columnar body provided in the separation channel 1 1 2 2 has a shape in which the diameter of the top is smaller than the diameter of the bottom. That is, it is preferable that the columnar body has a pyramidal or quasi-pyramidal shape, and the cross section is divergent.
- a hydrophilic film such as a silicon oxide film is formed on the surface of the columnar body in particular, the effect of such a shape is remarkable.
- oxidation proceeds near the bottom of the columnar body, and the height of the columnar body may be reduced to reduce the aspect ratio. Ru.
- FIG. 10 shows an example of a columnar body adopting such a structure.
- a conical columnar body is provided on the surface of the substrate 110, and the surface is covered with a silicon oxide film 104.
- the columnar bodies are formed so close to each other that the side faces of adjacent columnar bodies contact each other at the bottom of the columnar bodies.
- the film thickness of the silicon oxide film 104 at the bottom of the columnar body becomes thin, and the columnar body Good aspect ratio can be maintained.
- the reason for this is not necessarily clear, but because the side surfaces of the conical columnar bodies are in contact with each other, when oxidation progresses in the vicinity of the bottom of the columnar bodies, compressive stress occurs and further oxidation occurs. It is guessed that it is because it becomes difficult to advance.
- the sample is exposed by irradiating a laser beam onto the separation channel 112 having the columnar body.
- a laser beam In the case of ionization, an ultraviolet light laser having a wavelength of about 200 to 400 nm or an infrared light laser having a wavelength of 800 to 110 nm may be used as the laser light. preferable.
- the irradiation conditions at this time may be, for example, the intensity of the 0.1 to 500 J pulse and the pulse width of 1 to 500 n s.
- the spot diameter can be, for example, 50 m or less in the case of an ultraviolet light laser, and can be 500 m or less in the case of an infrared light laser.
- FIG. 1 1 (a) a silicon oxide film 105 and a resist film 107 are formed in this order on a substrate 110.
- the resist film 107 is patterned by electron beam exposure or the like to form a pattern having a predetermined opening (FIG. 11 (b)).
- the silicon oxide film 105 is dry etched or the like using the resist film 107 to form a hard mask made of the silicon oxide film 105 (FIG. 11 (c)).
- dry etching of the substrate 110 (FIG. 12 (e)) provides a columnar body with a high aspect ratio.
- the surface is oxidized at a high temperature of, for example, 850 to form a silicon oxide film 104 (FIG. 12 (g)).
- FIGS. 11 and 12 although the substrate 110 is etched by means of the mask formed by using a resist mask, the substrate 110 can be etched directly by using a resist mask.
- Figure 13 illustrates this method. In the process shown in FIG. 13, after forming a resist 900 on the substrate 110 (FIG. 13 (a)), patterning (FIG. 13 (b)), the substrate 110 is used as a mask. Etching forms pillars (Fig. 13 (c)).
- FIGS. 14 to 18 the right side is a top view and the left side is a cross-sectional view.
- a silicon oxide film 202 and a calixarene electron beam negative resist 203 are formed in this order on a silicon substrate 201.
- the film thickness of the silicon oxide film 202 and the calixarene electron beam negative resist 203 are set to 35 nm and 55 nm, respectively.
- an array area to be a flow path of the sample is exposed using an electron beam (EB). Development is with xylene and rinsed with isopropyl alcohol. By this process, as shown in Figure 14 (b), the patterned resist 204 is obtained.
- EB electron beam
- the calixarene electron beam negative resist 203 having the structure shown below is used as a resist for electron beam exposure and can be suitably used as a resist for nano processing.
- a positive photoresist 205 is applied to the entire surface (FIG. 14 (c)).
- the film thickness is 1.8 m.
- mask exposure is performed so that the array area is exposed and development is performed (Fig. 14 (d) :).
- RIE etching is performed on the silicon oxide film 202 using a mixed gas of CF 4 and CHF 3 .
- the film thickness after etching is set to 35 nm (Fig. 15 (a)).
- the resin layer 204 is removed by organic washing with a mixture of acetone-.alcohol. Water, and then oxidized plasma treatment is performed (Fig. 15 (b)).
- the silicon substrate 201 is ECR etched using HBr gas.
- the film thickness of silicon substrate 201 after etching is 400 nm (FIG. 15 (c)).
- wet etching is performed with BHF buffered hydrofluoric acid to remove the silicon oxide film 202 (FIG. 15 (d)).
- a CVD silicon oxide film 206 is deposited on the silicon substrate 201 (FIG. 16 (a)).
- the film thickness is 100 nm.
- a positive photo resist 207 is applied to the entire surface (Fig. 16 (b)).
- the film thickness is 1.8.
- the CVD silicon oxide film 206 is wet etched with buffered hydrofluoric acid (FIG. 16 (d)).
- the organic cleaning was positive photo
- the resist 2 07 is removed (FIG. 17 (a)), and the silicon substrate 21 is wet etched using TMAH (tetramethyl ammonium hydroxide) (FIG. 1 7 (b)).
- the CVD silicon oxide film 206 is removed by wet etching with buffered hydrofluoric acid (FIG. 17 (c)).
- the silicon substrate 201 in this state is placed in a furnace to form a silicon thermal oxide film 209 (FIG. 17 (d)).
- heat treatment conditions are selected so that the film thickness of the silicon thermal oxide film 2 0 9 becomes, for example, 2 0 nm.
- the surface of the flow path can be made hydrophilic and the difficulty in introducing the buffer solution into the flow path can be eliminated.
- a coating 210 may be provided on the flow path (Fig. 18).
- a channel having a columnar body can be obtained.
- the substrate 110 as the silicon substrate 201 it is possible to form a fine columnar array structure accurately and reliably.
- FIG. 19 is a process cross-sectional view showing a method of manufacturing the separation channel 1 12.
- a substrate 110 made of silicon having a resin film 160 formed on its surface and a mold 106 having a molding surface processed into a predetermined concavo-convex shape are prepared.
- the material of the resin film 160 is a polymethyl methacrylate material, and the thickness thereof is about 200 nm.
- the material of the mold 1 0 6 can be used S i, S i 0 2, S i C , and the like.
- pressure is applied while heating while the molding surface of the mold 106 is in contact with the resin film 160 surface.
- the pressure is set to about 600 to 1900 psi and the temperature is set to about 140 to 180.
- the substrate 110 is removed, oxygen plasma ashing is performed, and the resin film 160 is patterned (FIG. 19 (c)).
- the substrate 110 is dry etched using the resin film 160 as a mask (FIG. 19 (d)).
- the etching gas is, for example, a halogen-based gas.
- the etching depth is about 0.4 ⁇ m, and the distance between the columns formed by etching is about 100 nm.
- the aspect ratio (aspect ratio) of etching is about 4: 1.
- the progress of etching slows down due to the microphone opening loading effect, and the tip of the recess narrows and becomes a curved surface.
- the columnar body becomes flared and its cross-sectional shape becomes wider at the bottom than at the top.
- the side surfaces of the adjacent columns are formed close to each other so that they contact each other at the bottom of the columns.
- thermal oxidation is performed with a furnace annealing temperature of 800 to 900 to form a silicon thermal oxide film (not shown in Fig. 19) on the side wall of the columnar body.
- a furnace annealing temperature 800 to 900 to form a silicon thermal oxide film (not shown in Fig. 19) on the side wall of the columnar body.
- a mold was used when patterning the resin film 160 to be a mask, it is also possible to form a columnar body directly using this mold.
- a predetermined plastic material is coated on a substrate, it can be processed and formed by the same process as described above.
- the plastic material to be coated on the substrate those having good moldability and appropriate hydrophilicity are preferably used.
- polypinyl alcohol resins in particular ethylene-vinyl alcohol resin (E V OH), polyethylene terephthalate and the like are preferably used. Even if it is a hydrophobic resin, if the above coating is carried out after molding, the channel surface can be made hydrophilic, so that it can be used.
- a silicon oxide film 202 is formed by thermally oxidizing a silicon substrate 201 as shown in FIG. Thereafter, polycrystalline silicon is deposited on the silicon oxide film 202 to form a polycrystalline silicon film 707. Subsequently, the polycrystalline silicon film 7 0 7 is thermally oxidized to form an oxide film 7 0 8.
- a calixarene electron beam negative resist is formed on the oxide film 78, and the resist is patterned by exposing the liquid reservoir and the flow path of the sample with the electron beam (EB).
- the oxide film 708 is RIE-etched, the resist is removed, and the state shown in FIG. 20 (b) is obtained.
- the polycrystalline silicon film 707 is ECR etched using the etched oxide film 70 as a protective film.
- the oxide film 708 is removed, and the state shown in FIG. 2 0 (c) is obtained.
- the etched polycrystalline silicon film 700 is thermally oxidized to be integrated with the silicon oxide film 202, thereby obtaining the state shown in FIG. 20 (d).
- the separation channel processed as described above is completely insulated from the silicon substrate 201. Therefore, when the substrate 110 is a silicon substrate 201, when the sample is separated by applying an electric field, the electric field can be reliably secured.
- the silicon substrate 201 and the silicon oxide film 202 may be replaced with a quartz substrate.
- a S O I (S i i on ln on i s u 1 a t o r) substrate can be used.
- FIG. 86 is a diagram showing another configuration of the columnar body.
- the substrate 1 10 and the columns are made of metal.
- a metal film 3 9 7 is formed on the surface of the columnar body.
- the configuration shown in FIG. 8 6 (a) can be formed, for example, by etching a metal substrate 110. Further, the configuration shown in FIG. 8 6 (b) is formed, for example, by performing the steps up to FIG. 1 2 (f) by the method described above using FIG. 1 1 and FIG. It can form by vapor-depositing metals, such as silver, on the surface of the columnar body obtained.
- mass spectrometry system of the present embodiment when a human serum is separated as a sample using the microchip having the sample separation unit 112 having the configuration shown in FIG. 3, mass spectrometry is performed. From the mass spectrometry results, it was confirmed that albumin was present in the sample.
- FIG. 21 is a view showing the configuration of a microchip 3 07 applicable to the mass spectrometry system 3 5 1.
- the separation channel 1 1 2 is formed on the substrate 1 10. And, the input channel 111 is formed to intersect with this. At both ends of the inlet channel 11 1 and the separating channel 1 1 2, a reservoir 1 0 1 a and a reservoir 1 0 1 b, a reservoir 1 0 2 a and a reservoir 1, respectively. 0 2 b is formed. Each reservoir is provided with an electrode (not shown), and a voltage can be applied to both ends of the separation channel 112, for example, in the same manner as the method described in the first embodiment.
- the external dimensions of the microchip 3 0 7 may be selected according to the application, but usually, as shown in the drawing, the values are 5 mm to 5 cm long and 3 mm to 3 cm wide.
- the sample When separation is performed using the microchip 3 07 shown in Fig. 1, the sample is injected into the reservoir 1 0 2 0a or 0 1 2 0 b.
- a voltage is applied so that the sample flows in the direction of the reservoir 102b, and when injected into the reservoir 102b, the reservoir 100a Apply a voltage so that the sample flows in the direction of.
- the sample flows into the input channel 11 1, and as a result, it is input.
- the separation channel 112 the sample is present only at the intersection with the input channel 111, and a narrow band about the width of the input channel 111 is formed. .
- a voltage for suppressing the electroosmotic flow may be applied.
- a temperature correction voltage is applied to the substrate for this purpose. In this way, the electroosmotic flow is suppressed, and the broadening of the measurement peak can be effectively prevented.
- the separation channel 112 and the input channel 111 are orthogonal to each other, the present invention is not limited to this.
- the same effect as described above can be obtained by adopting a configuration in which the separation channel 112 and the input channel 111 intersect at an angle of 45 degrees.
- the laser light is emitted along the extending direction of the separation channel 1 12 in the same manner as the first embodiment.
- the separated bands are ionized.
- the microchip 3 07 described in the first embodiment and the second embodiment adopts the method of moving the sample by applying a voltage. However, instead of the voltage, a method of applying pressure is used. It can also be adopted.
- Figure 23 shows an example of such a microchip.
- the separation chip input flow A joint knife is fixed to the reservoir at the end of the passage 19 and the separation passage 20. Connect the joint hoses with hollow tubes 1 3, tubes 1 4, tubes 1 5 and tubes 1 6 connected to each joint female. The reason for using such a joint 17 is to prevent leakage.
- the concrete structure of joint 17 is as shown in Fig. 24 for example.
- the respective tubes connected to the joint are joined to the solenoid valve 10, the solenoid valve 4, the solenoid valve 5, and the solenoid valve 11, respectively.
- the solenoid valve 10 is supplied with a buffer solution from a reservoir 7 via a separation pump 8 and a constant velocity injection device 9. Further, the sample sent from the separation flow path 20 is supplied to the solenoid valve 11 and is led to the waste liquid reservoir 12.
- the sample is supplied from the sample reservoir 1 to the solenoid valve 4 via the feed pump 2 and the constant speed injection device 3.
- the solenoid valve 5 is supplied with the sample sent through the input flow path 19 and is led to the waste reservoir 6.
- the control unit 2 1 operates the solenoid valve 4, the solenoid valve 5, the solenoid valve 10, the solenoid valve 11, and the separation pump 8, the feed pump 2, the constant speed injection device 9, and the constant speed injection device 3. Control the point in time.
- the separation procedure using this device is as follows. First, close solenoid valve 1 0 and solenoid valve 1 1. This can prevent the sample from flowing into the separation channel 20 from the input channel 19. Then open the solenoid valve 4 and the solenoid valve 5. Then, put the sample into the sample reservoir 1.
- the sample is pressurized by the feeding pump 2, and the sample is introduced to the feeding flow path 19 via the constant velocity injection device 3, the solenoid valve 4, and the tube 14.
- the sample leaked through the inlet flow path 19 is led to the waste reservoir 6 through the tube 15 and the solenoid valve 5.
- the buffer solution is pressurized by the separation pump 8, and the sample is introduced to the separation flow path 20 via the constant speed injection device 9, the solenoid valve 10 and the tube 13.
- the separation operation is performed.
- microchip of this embodiment can also be suitably applied to the mass spectrometric system 351 shown in FIG. 1 as the microchip 353.
- the present embodiment relates to another configuration of the microchip 353 used in the mass spectrometry system 351 of FIG.
- the separation channel 112 when configured as shown in FIG. 8, clogging may occur when the sample contains a substance of a huge size. It is generally difficult to eliminate the clogging once it occurs.
- the separation method shown in FIG. 25 eliminates such a problem.
- a plurality of columnar body disposition portions (pillar patches 12 1) are formed apart from each other in the separation channel 1 1 2.
- pillars 125 of the same size are arranged at equal intervals.
- this separation channel 112 large molecules pass before small ones. The smaller the molecular size, the longer it will be trapped in the separation region and the longer path, while the larger sized material will smoothly pass the path between adjacent pillar patches 121.
- FIG. 26 and FIG. 27 are diagrams showing steps of producing a flow path of the microchip according to the present embodiment.
- the silicon substrate 201 in these figures is applied to the substrate 110.
- a silicon oxide film 202 with a film thickness of 35 nm is formed on a silicon substrate 201.
- a calixarene electron beam negative resist with a film thickness of 55 nm is formed, and the array area to be the sample flow path is exposed using an electron beam (EB).
- EB electron beam
- Development can be performed using xylene.
- rinsing can be performed with isopropyl alcohol.
- RIE etching is performed on the silicon oxide film 202 using a mixed gas of CF 4 and CHF 3 (FIG. 26 (c)). Then, the resist is removed by organic cleaning using a mixed solution of acetone, alcohol and water, and then oxidative plasma treatment is performed, and the silicon substrate 201 is ECR etched using HBr gas and oxygen gas (FIG. 27 (FIG. 27 d)). Thereafter, wet etching is performed with BHF buffered hydrofluoric acid to remove the silicon oxide film 202. The substrate thus obtained is placed in a furnace to form a silicon thermal oxide film 209 (FIG. 27 (e)). Thus, a flow channel having a plurality of columnar body disposed portions can be obtained.
- the pillars can be arranged at different intervals in the pillar arrangement portion.
- Fig. 28 (a) it is possible to adopt a columnar body arrangement portion in which the distance between the pillars is reduced according to the flow direction.
- the accumulation density of the columns increases at the downstream side of the flow path, and the moving speed decreases as the molecules entering the column arrangement portion move, so that the particles can not enter the column arrangement portion.
- the retention time difference with the target molecule becomes remarkable.
- Fig. 28 (b) it is also possible to adopt a column-arranged portion where the distance between the pillars is increased according to the flow direction.
- interval of a pillar small according to the direction of a flow is applicable also to the isolation
- a plurality of columnar body disposition portions are collectively made into a larger columnar body disposition portion, and the distance between the large columnar body disposition portions is made wider than the distance between the original columnar body disposition portions.
- Hierarchical arrangement is also possible. An example is shown in Figure 29. A group of seven small pillar patches 7 1 2 forms a medium pillar patch 7 1 3 and a medium pillar patch 7 1 3 forms a large pillar patch 7 1 It forms four.
- this sample separation area has a structure in which pillar patches 121 are arranged at equal intervals in the space surrounded by the walls 1 2 9 of the flow path.
- Each of the pillar patches 121 is composed of a large number of leaflets.
- the width R of the pillar patch 1 2 1 is 10 m or less.
- the spacing Q between the pillar patches 121 should be 20 m or less.
- the pillar patches 121 where the pillars are densely formed are formed as a circular area as viewed from the top, but the shape is not limited to a circular shape, and may be another shape.
- the patch area 130 is formed in a striped area as viewed from the top.
- the width R of patch area 1 3 0 is 1 0
- the interval Q between patch areas 130 is set to 1 0 to 100 m.
- FIG. 32 shows an example in which a rhombic pillar patch 1 2 1 is adopted, and a plurality of pillar patches 1 2 1 are further arranged so as to become a rhombic shape.
- the path and the flow direction form a certain angle, and the contact frequency between the molecule and the pillar patch 1 2 1 is increased, so it is smaller than the distance between the pillars constituting the 1st patch 1 2 1
- the probability that a molecule is captured by the pillar patch 1 2 1 is increased.
- the retention time difference between the molecule captured by the Pillar patch 12 1 and the larger molecule that is not captured becomes remarkable, so that the resolution can be improved.
- the distance h between the pillar patches 1 2 1, the diagonals D and d of the patches 1 2 1 1 and the distance p of the dots forming the pillar patch are as follows It is preferable to satisfy the condition. By doing this, it is possible to separate target molecules with high precision.
- a patch area is not limited to a pillar.
- patch areas in which plates are arranged at regular intervals.
- An example is shown in Fig.33.
- Fig. 3 3 (a) is a top view, and Fig. 3 3 (b) shows the A–A 'cross section in the figure. Arrange this patch area as shown in Fig. 33 (c).
- the molecules once captured in the patch area 130 will stay in the patch area 130 until they escape to the separation channel 112. Therefore, the difference in retention time between the molecules captured in the patch area and the molecules not captured is remarkable, so the separation ability is improved.
- the diameter of the molecule to be separated is R
- the following condition is satisfied for the interval ⁇ ⁇ ⁇ between patch regions 130 and the interval ⁇ between plates forming patch region 130.
- the top of the columnar body or plate-like body described above may be in contact with or separated from the upper surface of the flow path.
- a gap is present between the columnar body or plate and the upper surface of the flow path, which increases the chance of passing large molecules. For this reason, it is possible to eliminate further clogging.
- the separation effect is further enhanced because the chance to enter the patch area from above through this gap is increased.
- Such a form can be obtained by providing a groove in advance in a member (such as a cover glass) which is the upper surface of the flow path, or by making the height of the columnar body or plate-like body smaller than the depth of the flow path. It can be easily realized.
- the width of the path between the pillars and the distance between the pillars in the pillars are the components to be separated, for example, organic molecules such as nucleic acids, amino acids, peptides and proteins, chelated metal ions, etc. It is appropriately selected according to the size of the molecule or ion of
- the distance between the columns is preferably about the same as, or slightly smaller or larger than, the radius of inertia corresponding to the median size of the molecules to be separated.
- the difference between the radius of inertia corresponding to the above-mentioned median value and the distance between the columns is within 10 m, more preferably within 10 m, and most preferably within 1 m.
- the distance (pass width) between adjacent columnar body disposition parts be equal to, or slightly smaller or larger than the inertial radius of the maximum size molecule contained in the sample. .
- the difference between the radius of inertia of the largest-sized molecule contained in the sample and the distance between the columns provided with columns should be within 10%, more preferably within 5%, of the inertial radius of the molecule. Preferably, it is within 1%. If the spacing between the columns is too large, small molecules may not be separated sufficiently. If the spacing between the columns is too narrow, clogging may easily occur. May be
- FIG. 3 4 (a) a row of pillars 7 1 0 1 is provided immediately before the separation area 7 1 1 provided on the flow path. It is preferable that the spacing between the pillars in the pillar row 710 be approximately the same as the smallest-sized molecule included in the molecular group 709 to be separated. By adopting such a configuration, the effects described below can be obtained.
- the separation region 71 1 may be provided with the patch region or the columnar body disposition portion as described above, or may be a separation region in which the columnar bodies are disposed without being full. Good.
- a weak driving force for example, a weak electric field
- the molecule group 7 0 9 to be separated widely diffused moves in the flow path. Because it is stopped when reaching Pila row 7 1 0, a thin pand is formed in the narrow band adjacent to the pilar row 7 1 0 (figure
- a strong driving force for example, a strong electric field
- the molecule group passes through a line of columns while maintaining a narrow band state (Fig. 3 4 (c)).
- a strong driving force for example, a strong electric field
- FIG. 34 (d) After the molecule group to be separated has passed through one row, it can be separated effectively by applying a driving force suitable for separation to the molecule group (Fig. 34 (d)). As described above, since the molecule group maintains a narrow band state, the overlapping of peaks after separation is reduced, thereby achieving high-precision separation.
- FIG. A configuration may also be provided to provide a row of leaflets 7 1 0 shown.
- FIG. 35 is a diagram showing the configuration of the microchip according to the present embodiment.
- a separation pillar (not shown) is disposed in the separation flow path 540 formed on the substrate 550.
- the material of the substrate 50 and the configuration of the separation pillars can be similar to, for example, the first to fifth embodiments.
- An air hole 560 is provided at one end of the separation flow path 540, and a buffer inlet 510 for injecting a buffer solution at the time of separation is provided at the other end.
- the separation flow path 540 is sealed at parts other than the buffer 1 inlet 5 1 0 and the air hole 560. Separation channel 5
- a sample metering tube 530 is connected to the beginning of the 40, and the other end of the sample metering tube 530 is provided with a sample inlet 520.
- a sample metering tube (not shown) is disposed in the sample metering tube 530.
- the quantification pillars are arranged more sparsely than the separation pillars, where no separation of the sample occurs.
- the portion other than the sample inlet 520 of the sample metering tube 530 is sealed.
- FIG. 36 is an enlarged view of the vicinity of the sample metering tube 530 shown in FIG.
- a measuring slit in the inside of the sample measuring tube 530 and the sample holding unit 50 3 are separated by a stop slit 52.
- a more compact bill (not shown) is installed than in the case of the piler installed in the buffer introducing unit 504 and the separating unit 506.
- Buffer introducer
- a leaflet (not shown) of approximately the same level as the separation pillars is installed at the 554.
- the sample holding unit 503, the buffer introduction unit 504, and the separation unit 506 are separated by a temporary stop slit 505 and a temporary stop slit 507.
- the void volume of the sample holder 53 is approximately equal to the sum of the void volume of the sample metering tube 530 and the volume of the temporary stop slit 502.
- the width of the stop slit 5 0 5 is smaller than the width of the stop slit 5 0 2.
- the sample is held between the sample metering plates placed in the sample metering tube 530 shown in FIG. After the sample metering tube 530 is filled with sample, the sample gradually bleeds into the stop slit 502.
- the sample inside the temporary stop slit 502 and the sample metering tube 530 has a larger capillary effect, the sample All sucked out to the holding unit 5 0 3.
- the reason for the larger capillary effect of the sample holding portion 503 than the sample metering tube 530 is because the pillars are formed more densely and the surface area is larger in the sample holding portion 500.
- there is a temporary stop slit 505 so there is no possibility that the sample flows into the buffer introduction unit 504 or the separation unit 506.
- a buffer for separation is injected into the puffer inlet 5 10.
- the injected buffer solution is temporarily filled in the buffer introducing unit 504, so that the interface with the sample holding unit 500 becomes linear.
- the buffer solution is further filled, it flows out to the temporary stop slit 500, flows into the sample holding unit 500, and further, while dragging the sample, the temporary stop slit 50 is exceeded and the separation unit 5 passes. Go to 06.
- the width of the stop slit 502 is larger than the width of the stop slits 505 and 500, even if the buffer solution flows back to the stop slit 502, the sample has already been made. Since the sample holder 5 0 3 is ahead of the sample holder, there is almost no back flow of the sample
- the buffer for separation is capillary action, and the separation part .5 0 6 is further directed to the air hole 5 6 0, and in this process, the sample is separated.
- sample injection using the principle of quantitative injection of sample using capillary phenomenon Another example is described with reference to FIGS. 3 7 and 3 8.
- a sample input pipe 570 is provided in place of the sample metering pipe 530 in FIG.
- a sample inlet 520 and an outlet 520 are provided at both ends of the sample feeding tube 570. No pillars were installed inside the sample input tube 570.
- the sample feeding pipe 570 is opened to the sample holder 5 0 3 through the feeding hole 5 0 9.
- sample inlet 520 is introduced into sample inlet 520 and filled up to outlet 560. During this time, the sample is absorbed into the sample holder 50 3 through the injection hole 5 0 9.
- a buffer for migration is introduced from a reservoir corresponding to buffer inlet 510 and a reservoir corresponding to air hole 560 prior to sample injection. Buffer solution does not flow into the sample holder 5 0 3 because there are widely made temporary stop slits 5 0 5 and 5 0 7.
- a small amount of migration buffer is added to the reservoir at one end of the separation channel, or lightly vibrated around the sample holding unit 53.
- the buffer for migration is made continuous by applying, and voltage is applied to separate.
- the microchip of this embodiment it is possible to separate the sample by capillary action. For this reason, it is not necessary to form an electrode on the substrate, and the device configuration can be made simpler.
- the present embodiment relates to another configuration of the microchip applicable to the mass spectrometry system 51 of FIG.
- the separation is performed using a microchip in which a separation area divided into a plurality of parts via a slit is provided in the flow path.
- FIG. 39 is a view showing the configuration of the flow path of the microchip according to the present embodiment. Figure 3-9.
- a sample separation area 601 is formed to close the flow path.
- the sample separation area 601 is divided into a plurality of parts via the slits 602. There is no gap between the wall 603 and the sample separation area 601.
- the shape of the band of the separated sample is suitable, and the resolution is improved. This point will be described with reference to FIG.
- the liquid level of the sample flowing from the top to the bottom in the left figure of FIG. 40 is a curved surface. This is because the movement of the sample is promoted by the capillary action in the portion along the wall, while the effect of the capillary action is small in the central portion of the channel cross section. In the vicinity of the wall, the flow of the sample is accelerated, and as a result, a band as illustrated is formed.
- the sample separation area 601 is divided into a plurality of parts through the slit 602
- the liquid being separated is once held in the sample separation area above the slit due to the presence of the slit.
- the pressure of the sample present in the sample separation area above the slit exceeds the pressure derived from the air in the slit, the liquid from the sample separation area to the slit is not formed. Movement starts.
- the sample separation area 601 can adopt any configuration described in the first to fourth embodiments. For example, a patch area or a columnar body arrangement portion as described above may be provided, or a sample separation area in which columnar bodies are arranged without being full may be used.
- FIGS. 4 1 and 4 2 are diagrams showing the difference in the shape of the sample in the shape of a capillary due to the above-mentioned capillary action.
- FIG. 41 in the case where a single artificial gel conventionally used as a sample separation area is provided, the sandwich shape becomes a shape bent in the sample traveling direction.
- Fig. 42 the area where the pillars are formed sparsely A configuration in which the densely formed regions are alternately formed is adopted.
- the sparsely formed areas of the pillars play the same role as the slits in Figures 39 and 40.
- the liquid containing the sample stops once before the area where the pillars are formed sparsely, and the difference in the movement distance of the liquid generated in the area where the pillars are formed densely is eliminated.
- the band shape is almost flat with respect to the sample traveling direction.
- microchip having the separation channel 112 in which the recess is formed will be described.
- the microchip having the separation channel 112 in which the recess is formed can also be applied to the mass spectrometry system 351 of FIG.
- the basic configuration of the microchip can be the same as that of the above-described embodiment, and therefore, the following description will focus on the difference in the configuration.
- a cylinder, an elliptic cylinder, a cone, or an elliptical cone is suitably used, but various shapes such as a rectangular parallelepiped, a triangular pyramid, etc. can be adopted.
- the size of the recess is appropriately set according to the purpose of separation. For example,
- the depth of the recess can also be appropriately set according to the application, but can be, for example, 5 to 2000 nm.
- the average distance between adjacent recesses is preferably 200 nm or less, more preferably 100 nm or less, and still more preferably 70 nm.
- the lower limit is not particularly limited, but can be, for example, 5 nm or more.
- the interval of the recess means the distance between the center points of the recess.
- FIG. 43 shows the structure of the separation channel 112 for separation of the microchip according to the present embodiment in detail.
- a groove having a width W and a depth D is formed on the substrate 110, and cylindrical holes having a diameter and a depth d are regularly formed at equal intervals p at the bottom of the groove.
- the width W of the flow channel, the depth D of the flow channel, the diameter ⁇ of the hole, the depth d of the hole, and the distance p between the holes can be, for example, the illustrated sizes.
- W, D, ⁇ , d, and p can have the same size.
- This flow path may be covered by a covering at the time of separation as shown in FIG.
- the flow path formed in the substrate is sealed by the covering portion to form a space, and the sample moves in the space.
- This coating has a role of preventing evaporation of water contained in the sample.
- the covering portion having the transparent electrode since it is necessary to dispose the electrode above the flow path, it is essential that the covering portion having the transparent electrode as a part of the component at the time of sample separation. Become.
- a plurality of holes are formed at predetermined intervals in the sample separation area.
- FIG. 46 In this sample separation area, concave portions with the maximum diameter ⁇ of the opening are regularly formed at intervals P.
- Figure 47 is an example of another sample separation area. In this example, the recesses are arranged in an orderly manner.
- Figure 48 is an example of another sample separation area.
- large concave portions are arranged as the flow path advances.
- FIG. 49 is an example of another sample separation area.
- the recesses having different opening diameters are randomly arranged.
- FIG. 50 is an example of another sample separation area.
- the recess is formed in a stripe shape. That is, the recess is not a hole but a groove.
- ⁇ and ⁇ represent the width of the groove and the distance between the groove and the groove, respectively.
- FIG. 51 is an example of another sample separation area.
- a groove is provided in the flow channel, the width of which becomes wider as the flow channel is advanced.
- FIG. 52 is an example of another sample separation area.
- the recesses are formed in stripes, but the direction of the stripes relative to the sample flow direction is It is parallel in Fig. 52, whereas it is parallel at 0.
- ⁇ and ⁇ represent the width of the groove and the distance between the groove and the groove, respectively.
- the maximum diameter of the opening of the recess is appropriately selected according to the size of the component to be separated. For example, it may be about the same as, or slightly smaller or larger than the radius of identity corresponding to the median size of the group of molecules to be separated. Specifically, the difference between the radius of inertia corresponding to the above-mentioned median value and the maximum diameter of the opening of the recess is within 10 0 n m, more preferably within 1 0 n m, and most preferably within 1 n m. By setting the maximum diameter of the opening of the recess appropriately, the separation performance is further improved.
- the recesses can be arranged at different intervals in the sample separation area.
- large-, medium-, and small-sized molecules and ions of different sizes can be separated efficiently.
- it is effective to adopt a method of arranging the recesses alternately in the direction of movement of the sample, as shown in FIG. By this, the chance of encountering the recess with the molecule is increased, so that the target component can be efficiently separated while the clogging is effectively prevented.
- the shape of the recess is not limited to this.
- the inner diameter of the recess gets closer to the bottom, It is also possible to adopt a tapered form. Specifically, for example, as shown in FIG. 5 3 (a), the inner diameter of the recess gradually decreases, or the recess as shown in FIG. 5 3 (b) or (c).
- the inner diameter of is continuously decreasing. In these cases, the smaller the molecule is, the longer it is possible to stay in the recess since it can move deeper into the recess. As a result, the resolution is further improved.
- Such a tapered recess can be provided by various methods. For example, when providing a recess by the above-described anodic oxidation method, a tapered recess can be provided by gradually reducing the voltage.
- a tapered recess by etching.
- a vertical hole having an inner diameter substantially equal to the inner diameter of the bottom surface of the recess to be provided is provided by dry etching.
- wet etching using an isotropic etching solution is performed on the vertical holes.
- the exchange rate of the etching solution in the vertical hole is smallest at the bottom of the vertical hole, and increases from the bottom of the vertical hole toward the opening. Therefore, there is almost no side etching near the bottom of the vertical hole, and the inner diameter hardly expands.
- the degree of side etching increases from the bottom to the opening, the inner diameter also increases accordingly.
- the example in which the recess is disposed on a plane is shown, but it is also possible to arrange the recess three-dimensionally.
- the flow path can be divided into two layers, and a recess can be provided in the separation plate and the flow path wall.
- the smaller the molecule the slower the outflow.
- the above-mentioned separator with a through-hole with the same diameter as the size of the target molecule. In this way, the target small molecule can bypass the channel provided with the recess. Therefore, small molecules with the same speed as large ones Can be separated, and separation of other molecules can be realized.
- FIG. 54 is a view showing an example of a form in which the channel is divided into two layers.
- Figure 5 4 (a) is a cross-sectional view perpendicular to the flow direction.
- a flow path 4 0 9 provided in the silicon substrate 4 1 7 is divided into two layers by a separation plate 4 1 9.
- Fig. 5 4 (b) is a cross-sectional view in the A-A 'plane in Fig. 5 4 (a).
- the separation plate 4 1 9 is partially provided with a through hole 4 20 and a recess 4 2 1, and molecules capable of passing through the through hole 4 20 move to the lower flow path 4 0 9 in the figure. .
- the buffer solution can be reliably introduced into the flow path by the method described with reference to FIG.
- a voltage may be applied by the method described with reference to FIG.
- the means for applying an external force to the sample is not limited to the voltage.
- this buffer solution automatically flows into the channel by capillary action. It is also possible to realize separation in this process.
- the depth of the channel should be set deep.
- the frequency of contact between the molecule to be separated and the recess is small, a sufficient separation effect may not be expected. Therefore, in such a case, it is preferable to actively guide the molecules to the recess by applying a voltage between the upper and lower surfaces of the channel. I'm sorry.
- FIG. 56 is an example of such an embodiment.
- a covering portion 4 41 provided above the flow path 4 4 2 is composed of a cover glass 4 40 and a transparent electrode 4 3 9 disposed below it.
- the molecule to be separated flows while receiving external force in the direction from the transparent electrode 4 3 9 to the gold electrode 4 3 7 I will move on the road.
- the contact frequency between the molecule and the recess can be increased, so that the separation performance is improved.
- the voltage although an example using a DC voltage is shown above, both DC voltage and AC voltage can be applied.
- FIG. 57 is a diagram for describing a process of manufacturing a recess in a substrate.
- a silicon substrate 2 0 1 is prepared, and force-based electron beam negative resist 2 0 3 3 is applied thereon (Fig. 5 7 (b)).
- E B electron beam
- a patterned resist 204 is obtained as shown in FIG. 5 7 (c).
- the silicon substrate 201 is etched (see FIG.
- a positive photoresist 2 0 5 is applied to the entire surface again (Fig. 5 7 (f)). After that, the channel part is exposed Perform mask exposure and develop (Fig. 57 (g)).
- the positive photoresist 205 is patterned so that the desired recess (hole) is formed in the silicon substrate 201.
- the silicon substrate 201 is RIE-etched using a mixed gas of CF 4 and CHF 3 (FIG. 5 7 (h)). After the resist is removed by organic washing with a mixture of acetone, alcohol and water (Fig. 57 (i)), a coating 210 is provided as necessary to complete the recess (Fig. 57 (j)).
- the recess can also be formed by anodic oxidation.
- Anodic oxidation is a process in which a metal to be oxidized in an electrolytic solution (eg, aluminum, titanium, zirconium, niobium, hafnium, tantalum, etc.) is applied as an anode to conduct oxidation.
- an electrolytic solution eg, aluminum, titanium, zirconium, niobium, hafnium, tantalum, etc.
- hydrogen is generated at the cathode by the electrolysis of water using an acidic electrolyte and electricity is generated at the cathode, but oxygen is not generated at the anode, and an oxide film layer is formed on the metal surface.
- this oxide coating layer is called porous alumina, and as shown in FIG.
- the porous alumina layer 4 16 has a periodic structure having a pore 430 at the center of each cell 43 1. Do. Since these structures are formed in a self-organizing manner, they do not require patterning, and nanostructures can be easily obtained.
- the cell spacing is proportional to the oxidation voltage (2.5 nm / V) and, in the case of aluminum, according to the oxidation voltage sulfuric acid ( ⁇ 30 V), oxalic acid ( ⁇ 50 V;), phosphoric acid ( ⁇ 20 0 V) ) Is used as an acidic electrolyte.
- the size of the pores depends on the oxidation conditions and the surface treatment after oxidation.
- the diameter of the pores increases as the oxidation voltage increases. For example, when the oxidation voltage is 5 V, 25 V, 80 V, 120 V, the opening has a circular or elliptical opening diameter of about 10 nm, 20 nm, 100 nm, 150 nm, respectively.
- the pore of the also, after porous alumina is formed, surface treatment is performed to etch the surface with, for example, 3 W t% phosphoric acid, but as the time of this surface treatment is longer, the diameter of the pores will be expanded.
- FIG. 59 is a top view showing a state in which the peripheral portion of the aluminum layer 402 formed on the insulating substrate is covered with the insulating film 41.
- the insulating film 411 for example, an insulating resin such as photosensitive polyimide can be used. In this way, the anodic oxidation reaction proceeds fast only in the vicinity of the electrode attachment portion 412, and it is possible to suppress the formation of a region which is not oxidized in the part far from the anode. It becomes possible to set it homogeneously.
- FIG. 87 is a view showing a state in which the peripheral portion of the aluminum layer 402 is covered with the conductive layer 413.
- Fig. 8 7 (a) is a top view and Fig. 87 (b) is a cross-sectional view.
- a conductive layer (such as gold) which is not anodized can be deposited on the aluminum layer 402 provided on the slide glass 401 to form a conductive layer 4 1
- a hydrophilization treatment such as coating the channel wall.
- the coating material for example, a substance having a structure similar to a phospholipid constituting cell membrane can be mentioned. Examples of such substances include Lipizia (registered trademark, manufactured by NOF Corporation). In case of using Lipizyuar (registered trademark), dissolve in a buffer solution such as TBE buffer to 0.5 wt%, fill this solution in the channel, and leave it for several minutes to coat the channel wall. can do.
- the channel wall by coating the channel wall with a water-repellent resin such as a fluorine resin or a hydrophilic substance such as bovine serum albumin, it is possible to prevent molecules such as DNA from adhering to the channel wall.
- a water-repellent resin such as a fluorine resin or a hydrophilic substance such as bovine serum albumin
- the microchip used in the mass spectrometry system 351 of FIG. 1 may have hydrophilic and hydrophobic regions formed on the surface of the channel.
- a sample separation area may be provided in which hydrophilic and hydrophobic areas are formed.
- the surface of the sample separation area is composed of a plurality of hydrophobic areas arranged in two dimensions substantially at equal intervals, and a hydrophilic area occupying the surface of the sample separation part excluding the hydrophobic area.
- FIG. 60 shows in detail the structure of the separation channel 1 1 2 or the separation channel 5 4 0 in FIG. 3, FIG. 2 1, FIG. 2 2, FIG. 35 or FIG.
- a groove having a depth D is formed in the substrate 701, and in this groove, hydrophobic regions 75 of diameter ⁇ are regularly formed at equal intervals.
- the hydrophobic region 700 is formed by attaching or bonding a coupling agent having a hydrophobic group to the surface of the substrate 701.
- a coating may be provided on the top of the flow path during separation. This suppresses the evaporation of the solvent.
- each part in FIG. 60 are as follows, for example.
- each part is appropriately set according to the purpose of separation. For example, for p
- the size of the depth D is an important factor governing the separation performance, and is preferably about 1 to 10 times the radius of inertia of the sample to be separated, and about 1 to 5 times Is more preferred.
- Figure 61 is a top view ( Figure 61 (a)) and a side view ( Figure 61 (b)) of the structure of Figure 60.
- the hydrophobic region 75 usually has a film thickness of about 0.1 to 100 nm.
- the surface of the substrate 701 is exposed in the portion other than the hydrophobic region 705.
- a hydrophilic material such as a glass substrate as the substrate 701
- a hydrophobic surface is formed with a predetermined pattern on the hydrophilic surface, and the sample separation function is expressed. . That is, when a hydrophilic buffer or the like is used as a carrier solvent, the sample is only on the hydrophilic surface. It does not pass on the hydrophobic surface. For this reason, the hydrophobic region 700 functions as an obstacle for sample passage and the sample separation function is expressed.
- the separation method by pattern formation of the hydrophobic region 75 will be described focusing on the molecular size.
- Fig. 63 shows that the large molecule is fast and the small molecule is late.
- the sample contains a substance of huge size, such substance clogs the interval of the hydrophobic area 75 5, and the separation efficiency May decrease.
- a problem is solved.
- a plurality of sample separators 706 are formed separately in the separation channel 112.
- hydrophobic regions 700 of substantially the same size are arranged at equal intervals. Contrary to Fig.
- the width of the path between the adjacent sample separation sections 706 is preferably about 2 to 200 times the gap between the hydrophobic regions 700 More preferably, it is 5 to about L 00.
- hydrophobic regions 75 of the same size and spacing are formed in each sample separation portion, but different hydrophobic regions 70 of different sizes and spacing are formed in each sample separation portion. 5 may be formed.
- the width of the path between sample separation parts and the distance between hydrophobic regions 75 in the sample separation part are the components to be separated (nucleic acid, amino acids, peptides, proteins, etc.). It is appropriately selected according to the size of organic molecules, molecules such as chelated metal ions, and ions.
- the spacing of the hydrophobic regions 75 is preferably about the same as, or slightly smaller or larger than the radius of inertia of the smallest-sized molecule contained in the sample.
- the difference between the radius of inertia of the molecule of the smallest size contained in the sample and the distance between the hydrophobic regions 75 is within 100 nm, more preferably within 50 nm, most preferably 1 It shall be within 0 nm.
- the distance (pass width) between the adjacent sample separation portions 706 is preferably as small as or slightly larger than the radius of inertia of the largest-sized molecule contained in the sample. Specifically, the difference between the radius of inertia of the largest size molecule contained in the sample and the spacing between sample separations is within 10%, more preferably within 5%, and most preferably within 10% of the radius of inertia of the molecule. Is within 1%. If the distance between the sample separators 706 is too wide, small molecules may not be separated sufficiently. If the distance between the sample separators 706 is too narrow, clogging may occur. It may be easier.
- the hydrophobic regions are arranged at regular intervals.
- the hydrophobic regions may be arranged at different intervals in the sample separation unit 706.
- it is also effective to adopt a method of arranging hydrophobic regions alternately in the direction of movement of the sample. By doing this, it is possible to efficiently separate the target component.
- a voltage is applied to both ends of the separation channel 112, whereby the sample is separated from the separation channel. 1 Move through 1 2.
- a voltage for suppressing the electroosmotic flow may be applied.
- a temperature correction voltage is applied to the substrate for this purpose. In this way, the electroosmotic flow is suppressed, and the broadening of the measurement peak can be effectively prevented.
- the flow path shape in FIG. 2 1 first provides a groove 7 3 0 on the surface of the substrate 7 0 1, and then makes the groove 7 3 0 as shown in FIG. It is obtained by forming a sample separation area 71 in a predetermined place in the inside.
- the process of forming the groove portion 730 on the substrate 701 of FIG. 64 (a) will be described with reference to FIG. In this embodiment, an example using a glass substrate as the substrate 71 will be described.
- a hard mask 7 70 and a resist mask 7 7 1 are sequentially formed on the substrate 71 (Fig. 6 5 (a)).
- a predetermined opening is provided in the resist mask 71 (Fig. 65 (b)).
- dry etching is performed using the resist mask 771 having the opening as a mask to obtain the state shown in FIG. 6 (c).
- the etching gas SF 6 or the like is used.
- the substrate 701 is wet etched using an etchant such as buffered hydrofluoric acid. Usually, the X-toching depth is about 1 m.
- Figure 6 (d) shows the state where this etching is finished.
- the hard mask 720 and the resist mask 71 are removed (Fig. 65 (e)). Through the above-described steps, a groove portion 730 as shown in FIG. 6 4 (a) is formed.
- the surface of the groove portion 730 in FIG. 6 4 (a) can be made hydrophilic, and the surface of the other substrate 7 0 1 can be made a hydrophobic surface.
- a hydrophobic surface treatment film 720 is formed on the entire surface of the structure obtained in Fig. 65 (e) (Fig. 66 (a)).
- a material which comprises the hydrophobic surface treatment film 720 3-thiolpropyl triethoxysilane is illustrated, for example.
- a resist 721 is applied on the substrate surface by spin coating and dried (FIG. 66 (b)).
- an opening is provided in the resist 721 corresponding to the groove (FIG. 66 (c)).
- dry etching is performed using the resist 721 provided with the opening as a mask (FIG. 66 (d)).
- the resist 721 is removed by ashing and stripping solution treatment.
- FIG. 67 (a) a resist 702 for electron beam exposure is formed on a substrate 701.
- the resist 702 for electron beam exposure is pattern exposed to a predetermined shape (FIG. 67 (b)).
- FIG. 67 (c) By dissolving and removing the exposed portion, an opening patterned in a predetermined shape is formed as shown in FIG. 67 (c).
- FIG. 67 (d) After that, perform oxygen plasma ashing as shown in Fig. 67 (d). Note that oxygen plasma ashing is required when forming a pattern in the order of sub-Mixing. This is because if oxygen plasma doping is performed, the substrate to which the coupling agent is attached is activated, and a surface suitable for precise pattern formation can be obtained. On the other hand, when forming a large pattern of micron order or more, the necessity is small.
- Fig. 68 (a) After the atsing is completed, the state shown in Fig. 68 (a) is obtained.
- the hydrophilic region 70 3 is formed by deposition of resist residues and contaminants.
- a hydrophobic region 705 is formed (Fig. 68 (b.)).
- a vapor phase method can be used as a film forming method of the film forming the hydrophobic region 705.
- the substrate 700 and a liquid containing a coupling agent having a hydrophobic group are disposed in a closed container. Form a film by leaving for a predetermined time. According to this method, since a solvent or the like does not adhere to the surface of the substrate 7, it is possible to obtain a processed film having a precise pattern as desired.
- Spin coating can also be used as another film forming method.
- a coupling agent solution having a hydrophobic group is applied to perform surface treatment to form a hydrophobic region 75.
- a coupling agent having a hydrophobic group 3-thiolpropyltriethoxysilane can be used.
- a dip method or the like can be used as a film forming method. Since the hydrophobic region 700 is not deposited on top of the hydrophilic region 703, but only on the exposed portion of the substrate 701, as shown in FIG. A surface structure is obtained in which 5 are formed apart.
- the same surface structure as described above can also be obtained by the following method.
- this method after forming the unexposed portion 70 2 a patterned as shown in FIG. 6 7 (c), the resist opening portion is formed as shown in FIG. 6 9 (a) without performing oxygen plasma ashing. Deposit 3-thiolpropyltriethoxysilane to form hydrophobic region 75. 'After that, wet etching is performed using a solvent which can selectively remove the unexposed area 70 2 a to obtain the structure of FIG. 6 9 (b). At this time, it is important to select a solvent which does not damage the membrane constituting the hydrophobic region 75. As such a solvent, for example, acetone can be exemplified.
- the hydrophobic region is formed in the channel groove, but the following method may be adopted other than this.
- the substrate shown in FIG. 7 (a) has a structure in which a hydrophobic film 93 made of a compound having a hydrophobic group such as 3-thiolpropyltriethoxysilane is formed on a glass substrate 901.
- the hydrophobic film 93 is formed in a predetermined patterning shape.
- the portion where the hydrophobic membrane 93 is provided is a sample separation portion.
- the substrate shown in FIG. 7 0 0 (b) has a configuration in which a stripe-shaped groove is provided on the surface of a glass substrate 902.
- the part of this groove becomes the sample channel.
- the method of forming the hydrophobic membrane 93 is as described above. Glass substrate Stripe grooves can also be easily formed on the surface by wet etching using a mask as described above. By bonding them as shown in FIG. 71, the configuration of this embodiment can be obtained. A space 900 formed by the two substrates serves as a sample flow channel. According to this method, the hydrophobic film 93 is formed on the flat surface, so that the production is easy and the production stability is good.
- a method of producing the pulling agent film for example, a method of forming a film made of a silane coupling agent on the entire surface of the substrate by an LB film pulling method, and forming a hydrophilic / hydrophobic microphone opening pattern can be used.
- only one hydrophobic region can be provided in the sample separation region.
- one hydrophobic region extending in the flow direction of the sample may be formed in the separation channel having a hydrophilic surface.
- the sample when the sample passes through the separation channel, the sample can be separated according to the surface characteristics of the sample separation area.
- the channel itself can be formed by the hydrophobic treatment and the hydrophilic treatment described above.
- a hydrophilic substrate such as a glass substrate is used to form a portion corresponding to the wall of the channel as a hydrophobic region.
- the buffer solution which is hydrophilic, forms a flow path between the wall portions because it enters avoiding the hydrophobic region.
- the channel may or may not be covered, but in the case of covering, it is preferable to have a gap of several meters from the substrate.
- a gap can be realized by bonding a viscous resin such as PDSMS or PMM A as a paste to the substrate with the coating near the stump of the coating. Even in the case of adhesion only near the stump, the introduction of the buffer causes the hydrophobic region to repel water, thus forming a flow path.
- a hydrophilic flow path is formed on a hydrophobic substrate or on the surface of a substrate that has been made hydrophobic by a cleansing treatment or the like. Also in this case, since the buffer solution enters only the hydrophilic region, the hydrophilic region can be used as a flow path. Furthermore, this hydrophobic treatment or hydrophilic treatment can also be performed using a printing technique such as a stamp or ink jet printing.
- the stamp method uses PDMS resin. The PDMS resin polymerizes silicone oil and resinifies it, but even after resinification, the molecular gap is filled with silicone oil.
- the contact portion becomes strongly hydrophobic and repels water.
- the PDMS block in which the recess is formed at the position corresponding to the flow path portion as a spring, the flow path can be easily manufactured by the above-mentioned hydrophobic treatment by bringing it into contact with a hydrophilic substrate. .
- silicone oil of a low viscosity type is used as a ink for ink jet printing, and a hydrophilic resin thin film as printing paper, for example, polyethylene, PET, cellulose acetate, cellulose thin film (cellophane) And so on.
- a hydrophilic resin thin film as printing paper, for example, polyethylene, PET, cellulose acetate, cellulose thin film (cellophane) And so on.
- the same effect can be obtained by printing in such a pattern that silicone oil adheres to the flow path wall portion.
- hydrophobic and hydrophilic treatments form a shaped patch of hydrophobic or hydrophilic patch that allows substances smaller than a certain size to pass through, and filters that do not allow passage of substances of a certain size or more.
- the evening can also be formed in the channel.
- the spacing between hydrophobic patches should be greater than the size of the material you want to pass through and smaller than the size of the material you do not want to pass through.
- the distance between hydrophobic patches is set narrower than l O O ⁇ m, for example, 50 m.
- the filter can be realized by integrally forming the hydrophobic region pattern for forming the flow path and the pattern of the hydrophobic patch formed in the broken line shape.
- the formation method the method by the above-mentioned photolithography and SAM film formation, the method by the stamp, the method by the ink jet, etc. can be appropriately used. Ru.
- a filter surface When a filter is formed in the flow path, a filter surface may be provided perpendicularly to the flow direction, or may be provided parallel to the flow direction. When the filter surface is provided parallel to the flow direction, the material is less likely to be clogged, and the area of the filter can be increased, as compared to the case where it is provided vertically. In this case, the width of the flow path portion is increased, for example, 100 m in the middle, and 50 m ⁇ 50 m square hydrophobic patches are flown in the central portion so as to have a clearance of 50 z m.
- the flow passage By forming in the flow direction of the passage, the flow passage can be divided into two parallel to the flow direction. When a liquid containing a substance to be separated is introduced from one side of the divided flow path, the filtrate from which the substance larger than 50 m contained in the liquid is removed flows out to the other flow path. This allows concentration of material on one side of the flow path.
- a plurality of flow paths provided with separation regions are provided, and a flow path for sample introduction intended to introduce a sample into the separation regions is provided to intersect the flow paths. Can also be adopted.
- the channel configuration shown in FIG. 7 is an example. In this flow channel configuration, a plurality of flow channels 4 0 9 having a separation region 4 2 3 provided with a columnar body, a recess, or a hydrophilic / hydrophobic region are provided. The sample to be separated is introduced from the sample inlet 4 24 and diffuses toward the reservoir 4 25.
- the flow path 4 2 6 between the sample inlet 4 2 4 and the reservoir 4 2 5 5 is not provided with separation ability, and is for transporting the sample to a plurality of separation paths 4 0 9 having separation ability. It is a thing. Since separation can be performed at the same time by migrating the sample from the reservoir 4 2 7 to the reservoir 4 2 8 after the sample is filled in the flow path 4 2 6, separation efficiency is improved. . Also, by providing separation regions 4 2 3 with different characteristics in each flow channel 4 0 9, it becomes possible to simultaneously separate the sample according to various characteristics. Furthermore, as shown in Fig. 73, it is also possible to adopt a form in which the reservoir 4 2 7 is one. In this example, buffer can be injected from reservoir 4 2 7 into all channels 4 0 9 Because it is efficient.
- FIG. 72 or FIG. 73 can be employed when the form of the sample separation unit is any of the first to ninth embodiments described above. Furthermore, in the embodiment shown in FIG. 72 or FIG. 73, the pillar mesh is placed at the intersection of the flow path provided with the separation region and the flow path for introducing the sample as described in the fifth embodiment. It can also be arranged.
- FIG. 74 shows an example. At the intersection of the flow path 4 0 9 and the flow path 4 2 6, a plurality of small pillars are disposed on the pillar mesh 4 2 9.
- the Pila 1 mesh 4 2 9 has a filtering function, and by controlling the pi 1 pitch, only molecules in the desired size range can be passed to the separation region 4 2 3. The desired analysis can be performed quickly and accurately.
- FIG. 74 shows an example in which the flow path provided with the separation region and the flow path for sample introduction are orthogonal to each other, the present invention is not limited thereto. You can get the effect.
- a weak driving force for example, a weak electric field
- a strong driving force for example, a strong electric field
- the molecule group passes through the column while maintaining its concentrated state. This is because, particularly in the case of a large molecule such as DNA or protein, even if the molecular size is larger than the distance between the pyrans, the molecule extends as long as it has one or several rows of pils.
- FIGS. 74 and 75 show an example in which the flow path provided with the separation region and the flow path for sample introduction are orthogonal to each other, the present invention is not limited thereto. The above effects can be obtained as well.
- the sample separation portion may be configured by adhering fine particles for adsorbing the sample to the substrate.
- Fig. 7 6 (a) is a top view of the microchip according to the present embodiment, and Fig. 7 6 (b) is a cross section in the E-E 'direction of the sample separator 347 of Fig. 7 6 (a). It is a figure explaining a mode.
- a separation channel 1 1 2 is provided on the substrate 1 1 0 1, and reservoirs 1 0 1 a and 1 0 1 b are formed at both ends thereof.
- a sample separation unit 347 filled with fine particles is provided in the separation channel 112, a sample separation unit 347 filled with fine particles is provided.
- materials or the like used as an adsorbent in T L C can be used.
- materials or the like used as an adsorbent in T L C can be used.
- silica gel, alumina, cellulose or the like can be used, and the particle size can be made 5 to 40 nm, for example.
- silica gel powder is packed into the sample separation portion 347 by providing a blocking member on the downstream side of the separation flow path 112, silica gel powder, binder, It can be carried out by pouring a mixture of water and water into a channel, and then drying and solidifying the mixture. Separation using such a microchip having a sample separation unit 347 is performed as follows. First, in the dry state of the microchip, the sample is spotted from the upper surface at the end of the sample separation unit 347 on the liquid reservoir 101a side. The spot volume of the sample is, for example, about 1 L to 10 0 ⁇ L. This will ensure a sufficient amount of sample for mass spectrometry.
- the spot width is set to a suitable narrowness, a suitable resolution can be exhibited.
- the sample has dried to some extent, introduce a predetermined amount of developing solution into the reservoir 101a.
- the introduced developing solution is introduced into the separation channel 112 by capillary action.
- the separation channel 1 1 2. Penetration of the fine particles of the sample separation portion 347 by capillary action from 2 to
- the sample spotted in the sample separation unit 347 is moved by the flow of the developing solution which penetrates in the sample separation unit 347 toward the downstream side, ie, the reservoir 101 b side.
- the component having high affinity with the developing solution moves more rapidly and is developed according to the affinity.
- the separation channel 112 is filled with the fine particles, but an adsorbent may be attached to the surface of the substrate, and it is not particularly limited to the configuration in which the channel is provided.
- the present embodiment relates to another configuration of the mass spectrometry system.
- the mass spectrometric system of this embodiment may have any configuration of the microchips described in the first to eleventh embodiments.
- the case of using the microchip in which the pillars 125 shown in FIG. 6 are disposed in the separation channel 112 in the flow channel configuration of the microchip 307 in FIG. 21 will be described as an example. .
- the separation flow path 12 formed with the pillar patch described in the fourth embodiment may be used.
- FIG. 77 is a schematic view showing the configuration of a mass spectrometry system according to the present embodiment.
- the mass spectrometric system 3 1 9 shown in FIG. 7 is a mass spectrometric apparatus 301, a microchip 3 0 7, a converter 3 2 1, an arithmetic processing unit 3 3 3, and a system control unit that manages and controls these. Including 3 0 9
- the mass spectrometer 301 has a laser light source 305, a light source support unit 315, a mounting table 325, a cover 341, a packing 34 45, a gear 34 3 and a detector 3 2 7 Prepare.
- the microchip 3 0 7 is placed on the mounting table 3 2 5.
- Mass spectrometry using a mass spectrometry system 319 is performed as follows. First, The sample is separated on the microchip flow path (not shown in FIG. 77) by the method described later using the microchip 37.
- the microchip 3 0 7 is set on the mounting table 3 2 5, the gear 3 4 3 is adjusted, and the mounting table 3 2 5 is inserted into the chamber of the mass spectrometer 3 0 1.
- the vacuum in the chamber can be suitably secured at the time of analysis by bringing the cover 34 1 into close contact with the packing 3 4 5 provided on the wall of the chamber.
- adjust the position of the microchip 3 07 or the laser 1 light source 3 0 5 by adjusting the mounting table 3 25 or the light source support portion 3 15.
- Laser light is scanned from the laser light source 305 under vacuum along the flow path where the sample is separated, and mass analysis is performed for each component in the separated sample.
- Each component of the sample separated in the flow path of the microchip 37 is vaporized.
- the mounting table 325 is an electrode, and by applying a voltage to it, the vaporized sample flies in vacuum and is detected by the detection unit 327. After the detected value is A / D converted by the conversion unit 321, predetermined analysis and analysis are performed by the operation processing unit 333.
- a metal film may be formed on the bottom of the microchip to allow connection to an external power supply. This makes it possible to apply a voltage to the microchip.
- the samples separated in the flow path on the microchip 37 in this manner are continuously analyzed on the flow path. For this reason, after separating a sample containing a plurality of components, mass analysis can be performed efficiently for each component.
- FIG. 78 is a diagram for explaining a control method of the mass spectrometry system.
- the measurement condition control unit 31 1 and the analysis condition setting unit 3 31 are managed by the system control unit 3 0 9.
- Measurement condition control unit 31 1 controls various conditions of mass spectrometric measurement, and, for example, laser 1 light source control unit 3 1 3, microchip control unit 3 1 7, detection unit 3 2 7 Control the converter 3 2 1.
- the laser light source control unit 3 13 controls the irradiation angle and the irradiation intensity of the laser light. Here, the intensity of the light emitted from the laser light source 305 and the angle or position of the light source support portion 35 supporting the laser light source 305 are adjusted.
- the microchip control unit 3 1 7 adjusts the position of the mounting table 3 2 5 on which the microchip 3 0 7 is installed. By so doing, it is possible to reliably irradiate the laser light from the laser light source 305 to the separation flow path 112 of the microchip 307. It is preferable to provide an alignment mark (not shown in FIGS. 7 7 and 21) at a predetermined position of the microchip 3 07 in order to improve the alignment accuracy of the light irradiation.
- the detection unit 327 detects a fragment of the component ionized by the irradiation of the laser light. At this time, detection starts, for example, with the start point of laser light irradiation as the origin of time. By doing this, the scanning of the laser light along the separation flow path 112 and the ion detection signal corresponding to the scanning position are acquired.
- the ion detection signal detected by the detection unit 3 2 7 is A D (analog to digital) converted by the conversion unit 3 2 1.
- the data converted by the conversion unit 321 is sent to the calculation processing unit 333, and data analysis is performed. Also, the data is stored in the measurement data storage unit 329.
- the arithmetic processing unit 33 3 is controlled by the analysis condition setting unit 3 31 and performs predetermined analysis. This information may be referred to information in the reference data storage unit 3 3 9 in which comparison data and the like are stored.
- the analysis result is stored in the measurement data storage unit 229. Also, the analysis result can be output from the output unit 33 5 or can be displayed on the display unit 3 3 7.
- FIG. 79 is a diagram for explaining the flow of analysis using a mass spectrometry system.
- crude purification S101
- S102 pre-treatment
- the sample is separated (S103), and laser light is irradiated along the separation channel 112.
- Component of the laser irradiation position band
- Ionize and perform mass spectrometry S104
- the fragment pattern is analyzed from the fragments obtained for each component (S 105), and the obtained data are analyzed (S 106).
- reference is made to the database stored in the reference data storage unit 339.
- a reductive reaction may be performed in a solvent such as acetonitrile containing a reducing reagent such as D T T (dithiothreitol).
- a solvent such as acetonitrile containing a reducing reagent such as D T T (dithiothreitol).
- D T T dithiothreitol
- the component in the sample is higher in molecular weight than the molecular weight suitable for the mass spectrometer 301 analysis method, depolymerization of the protein molecule reduced using a protein hydrolase such as trypsin is achieved. You may process. Since depolymerization is carried out in a buffer such as phosphate buffer, desalting and removal of the polymer fraction, ie, trypsin may be performed after the reaction. Also, in the case of molecular weight reduction, it is preferable to carry out reduction treatment in advance. In this way, more accurate measurement is possible.
- a protein hydrolase such as trypsin
- trypsinization may be performed after separating the sample.
- the sample When trypsinization is performed after separating the sample, the sample may be immobilized at the separated position. By immobilizing, the diffusion of the separated sample is effectively suppressed, so that it is possible to preferably suppress the expansion of the band width and the like even when the molecular weight is reduced.
- FIG. 85 is a diagram showing an example of a trypsin treatment method. As shown in FIG. 8 5 (a), the immobilizing layer 3 9 1 is formed on the surface of the pillar 1 2 5 formed on the substrate 1 10.
- the materials described in the first embodiment can be used, for example, silicon or metal.
- the fixing layer 31 is formed, for example, by applying a silane coupling agent having an epoxy group.
- the sample 4 51 is separated using the bill 1 125 having the immobilizing layer 3 9 1 and the separation channel 1 1 2 is dried, the sample 4 5 1 is an epoxy of the immobilizing layer 3 9 1 It is immobilized by groups.
- the enzyme solution 395 in the incubation path 3 When immersed and subjected to the enzyme treatment at a predetermined temperature, the sample 451 is reduced in molecular weight at the separated position. As a result, mass spectrometry results of fragments can be obtained for each separated component.
- the same sample 451 is separated using two separation channels 1 1 2 of the same configuration, and the sample 4 5 1 separated by one separation channel 1 1 2 is shown in FIG.
- the laser beam is irradiated, and the sample 451 separated in the other separation channel 112 is subjected to the laser irradiation without the molecular weight reduction.
- the fragment pattern of the component itself in the sample 41 and the fragment pattern of the depolymerized fragment can be obtained for each component. Since the bands detected at the same position in the two separation channels 112 are considered to be the same component, by combining and analyzing these two types of information, it is possible to ensure that the component is more accurate. It becomes possible to perform identification.
- the two separation channels 112 may be formed on the same microchip or may be formed on different microchips.
- Step 103 The separation in step 103 is performed by the method described above. Note that Step 102 and Step 103 may be performed in the mass spectrometry chamber of mass spectrometer 301, or may be performed outside mass spectrometer 301 or in the antechamber. It may be performed outside the mass spectrometer 301 as appropriate.
- step 104 The procedure for mass spectrometry in step 104 will be described with reference to FIGS. 7-8. If the steps up to step 1 0 3 (Fig. 7 9) are performed outside the mass spectrometry chamber of the mass spectrometer 301, mass spectrometry of the mounting table 3 25 on which the microchip 3 0 7 is set Move to the chamber and place in the mass spectrometry chamber (S 21 in Figure 80).
- laser light is emitted from the laser light source 305 along the separation flow path 112 of the microchip 307 (S 2 02 in FIG. 80).
- the mounting table 3 25 is used as a substrate for forming an electric field. Specific charge of ionized sample component
- the load (mZ z) is detected by the detector 3 2 7 (S 2 0 3).
- the data detected by the detection unit 3 2 7 is subjected to predetermined conversion such as AD conversion by the conversion unit 3 2 1 (S 2 0 4). Then, the converted date is stored in the measurement data storage unit 3 2 9 (S 2 0 5).
- step 1 0 2 pre-processing
- step 1 0 4 mass analysis
- the components in each band obtained by separating the sample in the separation channel 112 may be separated into the separation channels 11.
- Mass spectrometry can be performed without moving from 2. Therefore, even if the amount of sample is small, it is possible to efficiently perform each step from separation to mass analysis with high accuracy.
- the sample is separated using the separator 125 in the separation channel 112 since the sample is separated using the separator 125 in the separation channel 112, it is not necessary to use a filler such as gel or beads conventionally used for electrophoresis. Therefore, the liquid sample is held in the separation channel 112 at the time of separation to suppress the drying, and the vaporization is smoothly performed at the time of the laser light irradiation.
- a filler When a filler is used, the background may rise during measurement due to the ionization of the filler. However, in the separation channel 12 using the pillars 125, the Ground rise is suppressed.
- silicon heat is applied to hydrophilization of the flow path for separation 112. It is preferable to use an oxide film.
- mass spectrometry may be performed by a method using a matrix.
- the matrix is appropriately selected depending on the substance to be measured, for example, the first embodiment
- the substances described in can be used.
- FIG. 81 is a diagram showing a fragment pattern of mass spectrometry obtained for each component separated in the separation channel 1 12. Also, Fig. 8 2 (a) and Fig. 8 2 (b) are fragment patterns obtained for samples extracted from different specimens.
- FIG. 81 when the sample is separated based on the molecular weight, a two-dimensional map can be created and analyzed for each component in the sample with respect to the position on the separation channel 112 and the molecular weight. . That is, in FIG. 8 2 (a) and FIG. 8 2 (b), a map in which the position on the chip is taken as the horizontal axis and the molecular weight is taken as the vertical axis is shown two-dimensionally. On the vertical axis, among the fragment patterns of each component, the mZ z with the maximum (peak) detection intensity is shown in black. In this way, it is possible to easily identify different components and different sites between specimens by using the difference in fragment patterns between Fig. 8 2 (a) and Fig.
- the fragment that becomes a peak changes in the fragment pattern when mass analyzing the component.
- analysis of the fragment pattern also makes it possible to identify the component where the mutation has occurred and its site. Such analysis results can be provided as useful guidance, for example, for diagnosis. It can also be applied to screening of useful substances.
- the mass spectrometry system 319 realizes the steps from the separation of the sample to the identification of each component quickly and accurately. Even if the amount of sample is small, each component can be detected with high sensitivity. In addition, it is possible to efficiently acquire the fragment patterns of each component and analyze the results, and a wide range of information can be obtained.
- the separation is performed outside the mass spectrometer 301.
- the mass spectrometer 301 may have a front chamber.
- FIG. 83 is a diagram showing another configuration of the mass spectrometry system.
- an anteroom adjacent to the mass analysis chamber is provided, and the sample separation by the microchip is performed outside the apparatus or in the anteroom. Therefore, the inside of the mass spectrometry chamber can be depressurized in advance.
- the front chamber After separation, depressurize the antechamber having the mounting table on which the microchip is set. Because the front chamber is small in mass spectrometry chamber, it quickly reaches a predetermined degree of vacuum. Then, the mounting table is moved from the front chamber to the mass spectrometry chamber by the moving mechanism, and set at a predetermined position.
- the ionization of the components in the flow path is performed by irradiating the laser light from the laser light source along the flow path (not shown), as in the mass analysis system 319 (Fig. 7 7).
- the ionized fragments reach the detection unit and are detected.
- the detected value is analyzed by the analysis unit.
- the mounting table, the light source support unit, the laser light source, the detection unit, and the analysis unit are controlled by the control unit.
- the mass spectrometry system shown in FIG. 83 includes the front chamber, so separation and mass spectrometry can be performed efficiently and continuously.
- the aspect in which the sample is separated according to the molecular weight of the component in the separation channel 112 is described.
- separation may be performed using the isoelectric point of the sample.
- the buffer is a solution which forms a pH gradient when an electric field is applied, and examples thereof include a solution containing Amhopine or Pharmalyte from Marshall Biosciences.
- Figure 21 When separation is carried out using the microchip 3700, this solution is introduced into the reservoir 101a or the reservoir 101b and is led to the separation channel 112.
- the sample may be introduced from the side with respect to the direction of the electric field formed in the separation channel 112. That is, it is also possible to introduce a sample containing an isoelectric point electrolyte from the reservoir 102 a or the reservoir 102 b. Since the sample contains an isoelectric point electrolyte, a pH gradient is formed in the separation channel 112 under the influence of the electric field. Therefore, the introduced sample converges to a band in the separation channel 112 according to the isoelectric point of each component.
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Abstract
Description
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JP (1) | JP4074921B2 (ja) |
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WO (1) | WO2004081555A1 (ja) |
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JP4512745B2 (ja) * | 2004-10-29 | 2010-07-28 | 独立行政法人産業技術総合研究所 | 細胞の分離、同定装置及び方法 |
JP2006126039A (ja) * | 2004-10-29 | 2006-05-18 | National Institute Of Advanced Industrial & Technology | 細胞の分離、同定装置及び方法 |
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JP2012177708A (ja) * | 2005-05-27 | 2012-09-13 | Intel Corp | 線形弁結合型二次元分離装置、及び方法 |
JP2008542727A (ja) * | 2005-05-27 | 2008-11-27 | インテル・コーポレーション | 線形弁結合型二次元分離装置、分離マトリクス、及び方法 |
US20090297406A1 (en) * | 2005-06-22 | 2009-12-03 | Tokyo Institute Of Technology | Liquid Introducing Plasma System |
JP4885142B2 (ja) * | 2005-10-20 | 2012-02-29 | 独立行政法人科学技術振興機構 | 質量分析法に用いられる試料ターゲットおよびその製造方法、並びに当該試料ターゲットを用いた質量分析装置 |
US8237114B2 (en) * | 2005-10-20 | 2012-08-07 | Japan Science & Technology Agency | Sample target used in mass spectrometry, method for producing the same, and mass spectrometer using the sample target |
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JP4900245B2 (ja) * | 2005-11-14 | 2012-03-21 | 日本電気株式会社 | マイクロチップおよびその使用方法、ならびに質量分析システム |
WO2007055293A1 (ja) * | 2005-11-14 | 2007-05-18 | Nec Corporation | マイクロチップおよびその使用方法、ならびに質量分析システム |
JP2008045966A (ja) * | 2006-08-14 | 2008-02-28 | Tokyo Electron Ltd | クロマトグラフィ用のカラム及びその製造方法 |
WO2008020593A1 (fr) * | 2006-08-14 | 2008-02-21 | Tokyo Electron Limited | colonne pour chromatographie et son procédé de fabrication |
JP2009270963A (ja) * | 2008-05-08 | 2009-11-19 | Toppan Printing Co Ltd | 電気泳動用カセット |
JP2010078482A (ja) * | 2008-09-26 | 2010-04-08 | Fujifilm Corp | 質量分析用基板および質量分析方法 |
JP2016114400A (ja) * | 2014-12-12 | 2016-06-23 | 株式会社島津製作所 | マトリックス膜形成装置 |
WO2018207879A1 (ja) * | 2017-05-10 | 2018-11-15 | 株式会社ユーグレナ | 硫黄化合物含有物質の評価方法及び揮発性低分子硫黄化合物の定量方法 |
JP6426329B1 (ja) * | 2017-05-10 | 2018-11-21 | 株式会社ユーグレナ | 硫黄化合物含有物質の評価方法及び揮発性低分子硫黄化合物の定量方法 |
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US11491458B2 (en) | 2017-09-04 | 2022-11-08 | Pharmafluidics Nv | Method for producing chemical reactor |
Also Published As
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US7586091B2 (en) | 2009-09-08 |
CN1774626A (zh) | 2006-05-17 |
JPWO2004081555A1 (ja) | 2006-06-15 |
JP4074921B2 (ja) | 2008-04-16 |
US20060214101A1 (en) | 2006-09-28 |
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