WO2004069893A1 - エポキシ樹脂、その製造方法、それを用いたエポキシ樹脂組成物及び硬化物 - Google Patents
エポキシ樹脂、その製造方法、それを用いたエポキシ樹脂組成物及び硬化物 Download PDFInfo
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- WO2004069893A1 WO2004069893A1 PCT/JP2004/000994 JP2004000994W WO2004069893A1 WO 2004069893 A1 WO2004069893 A1 WO 2004069893A1 JP 2004000994 W JP2004000994 W JP 2004000994W WO 2004069893 A1 WO2004069893 A1 WO 2004069893A1
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- metal hydroxide
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/063—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols with epihalohydrins
Definitions
- Epoxy resin method for producing the same, epoxy resin composition and cured product using the same Technical field
- the present invention is excellent in handling properties such as low viscosity, curing reactivity and blocking resistance, and low moisture absorption.
- the present invention relates to a production method, an epoxy resin composition using the same, and a cured product thereof.
- Background Technology Epoxy resins have been used in a wide range of industrial applications, but their required performance has been increasingly sophisticated in recent years. For example, a typical field of resin compositions containing epoxy resin as a main component is a semiconductor encapsulating material. In recent years, as the integration degree of semiconductor elements has been improved, the package size has been increased toward a larger area and thinner. At the same time, the mounting method is shifting to surface mounting, and the development of materials with better solder heat resistance is desired.
- low-viscosity epoxy resins include bisphenol A-type epoxy resin and bisphenol F-type epoxy resin.
- these epoxy resins are usually liquid at room temperature, and it is difficult to prepare a resin composition for transfer molding. Therefore, a crystalline epoxy resin having a melting point at room temperature has been proposed, and a biphenyl-based epoxy resin (Japanese Patent Publication No. 4-73665) and a diphenylmethane-based epoxy resin (JP-A-6-34) No. 5850).
- epoxy resins have excellent low-viscosity properties and excellent characteristics such as increasing the filling ratio of fillers, but on the other hand, due to their low viscosity, the melting of powder in the epoxy resin composition state There was a problem in the anti-blocking property due to easy adhesion. Also, the obtained cured product was not sufficient in terms of low moisture absorption and adhesion.
- an object of the present invention is to provide an epoxy resin, an epoxy resin composition and an epoxy resin composition which are excellent in curability, low viscosity and blocking resistance, and provide a cured product excellent in low moisture absorption and heat resistance. It is to provide a cured product.
- the epoxy resin of the present invention is synthesized by reacting 4,4'-dihydroxydiphenyl sulfides with epichlorohydrin.
- a resin is synthesized, especially when a substituent such as a tertiary butyl group exists at a position adjacent to the hydroxyl group, It was found that the obstruction hindered the progress of the epoxidation reaction, and increased the amount of the remaining monoepoxy compound in which one end group was not epoxidized in the product.
- the present inventors have found that the monoepoxy compound has a great influence on the curability, blocking resistance, heat resistance and moisture resistance of the cured product as an epoxy resin.
- the present invention relates to an epoxy resin obtained by reacting 4,4′-dihydroxydiphenyl sulfide with epichlorohydrin, comprising 4,4′_diglycidyloxydiphenyl sulfide as a main component, It is a crystalline epoxy resin with a monoepoxy content of 2 wt% or less.
- the present invention also relates to an epoxy resin composition comprising an epoxy resin and a curing agent, wherein the above-mentioned crystalline epoxy resin is used as part or all of an epoxy resin component. Further, the present invention is a cured product obtained by curing the above epoxy resin composition.
- 4,4'-dihydroxydiphenyl sulfides include 4,4'-dihydroxydiphenyl sulfide, 2,2'-dimethyl-4,4'-dihydroxydiphenyl sulfide, , 2 ', 5,5'-tetramethyl-4,4'-dihydroxydiphenyl sulfide, but preferably 1,2'-dimethyl-5,5'-ditert-butyl- 4,4'-dihydrid xidiphenyl sulfide is exemplified.
- 4,4'-diglycidyloxydiphenyl sulfides include 2,2'-dimethyl-5,5'-diquinone-butyl-4,4'-diglycidyloxydiphenyl sulfide Is exemplified.
- the epoxy resin of the present invention includes 4,4′-dihydroxydiphenyl sulfides (hereinafter sometimes abbreviated as dihydroxy compounds) and epichlorohydridyl. The content of monoepoxy is less than 2 wt%.
- the monoepoxy compound refers to a compound in which one end group is not epoxidized.
- the main component is a chlorohydrin derivative represented by the following formula (d) formed by further adding epichlorohydrin to a hydroxyl group of the chlorohydrin derivative.
- the monoepoxy compound referred to in the present invention means the sum of the above 1) to 4).
- the following formula explains the structure of the terminal group, and does not explain the epoxy resin of the present invention.
- the epoxy resin of the present invention has a content of these monoepoxy compounds of 2 wt% or less. And preferably 1.5 wt% or less, more preferably 1.0 wt% or less.
- these compounds remain, not only does the curability and heat resistance decrease, but also the moisture resistance of the cured product decreases, and as a result, the reliability of the semiconductor encapsulant decreases.
- the physical properties are not substantially reduced, it is not always necessary to set the content to 0.1 wt% or less.
- the epoxy resin of the present invention is a crystalline solid at room temperature. However, when the amount of the monoepoxy compound remaining in the epoxy resin of the present invention increases, the melting point of the epoxy resin decreases, and the crystallinity of the epoxy resin decreases. The quality of the crystallinity of the epoxy resin is judged by the endothermic amount and the endothermic peak temperature associated with the melting of the crystal, and the preferred endothermic amount and endothermic peak temperature differ depending on the structure of the target epoxy resin.
- the endothermic amount accompanying melting of the crystal is in the range of 68 to 8 OJ / g. And more preferably in the range of 70 to 80 J / g.
- the endothermic peak temperature is in the range from 118 ° C to 124, more preferably in the range from 119 ° C to 123.
- the half width of the endothermic peak is preferably 7.5 or less, more preferably 7.0 ° C or less. Outside these ranges, the crystallinity of the epoxy resin will be low, and the blocking resistance of the epoxy resin composition will be low.
- the endothermic amount referred to here was measured from a normal temperature to 180 under a nitrogen gas flow under a condition of a temperature rise rate of 10 Z using a sample weighed approximately 10 mg by a differential thermal analyzer. It is the calorific value calculated by subtracting the calorific value based on the progress of crystallization in the process of raising the temperature from the endothermic amount accompanying the melting of the crystal.
- the half width of the endothermic peak is represented by the peak width at the midpoint between the baseline of the endothermic curve at the endothermic peak based on the melting of the crystal and the endothermic peak.
- Epoxy resins are generally synthesized by reacting the corresponding bisphenol with an excess of epichlorohydrin.
- the epoxy resin of the present invention is an epoxy resin obtained by reacting 44'-dihydroxy-diphenyl sulfides with epichlorohydrin, and has the following formula (1)
- R and R 4 independently represent hydrogen or an alkyl group having 16 carbon atoms, and n represents the number of 0 10). % Or more and the content of the monoepoxy compound is 2 wt% or less.
- This epoxy resin has the following formula (2)
- R and R 4 independently represent hydrogen or an alkyl group having 16 carbon atoms
- the resulting di (hydroxyphenyl) sulfide and epichlorohydrin are reacted in the presence of an alkali metal hydroxide to obtain a crude epoxy resin. It is obtained by reacting with a metal hydroxide.
- R and R 4 independently represent hydrogen or an alkyl group having 1 to 6 carbon atoms
- R or R 2 is preferably a bulky group such as an isopropyl group and a t-butyl group. No. However, it is not preferred that both and R 2 are t-butyl groups. More preferably, R 3 and R 4 are H or a methyl group.
- a preferred bisphenol compound is 2,2'-dimethyl-5,5'-dibutyl-4,4'-dihydridoxidiphenyl sulfide.
- the epoxy resin of the present invention can be synthesized by using such a histphenol compound and reacting it with epichlorohydrin.
- the method for producing the epoxy resin of the present invention is not particularly limited, but the bisphenol compound to be used has a sterically bulky monosaccharide group adjacent to the hydroxyl group. However, since the epoxidation reaction tends to be suppressed, it is difficult to obtain an epoxy resin having excellent crystallinity by applying the same synthesis conditions as ordinary epoxy resins.
- an epoxy resin is usually synthesized by dissolving a bisphenol compound in an excess of epichlorohydrin and then reacting it in the presence of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide (primary).
- an epoxy resin having a group such as a butyl group is obtained, it is then contacted with an alkali metal hydroxide to form a ring-closing reaction (secondary reaction) of the remaining chlorohydrin compound. Is preferably performed.
- the epichlorohydrin used in the primary reaction is a phenylphenol compound It must be used in excess with respect to the amount of the phenolic hydroxyl group. Usually, it is at least 2 mol, preferably at least 2.5 mol, more preferably at least 5 mol, per mol of the phenolic hydroxyl group. If the amount is less than this, the production amount of the multimeric epoxy increases, and the crystallinity of the epoxy resin decreases.
- the amount of the alkali metal hydroxide to be used is usually in the range of 0.80 to 1.10 mol per mol of the hydroxyl group of the bisphenol compound. And preferably in the range of 0.86 to 1.0 mol. Furthermore, the range of 0.88 to 0.99 mol is more preferable.
- the reaction temperature is usually from 20 to 120 ° C. As the reaction temperature is lower, a high-purity epoxy resin having a lower chlorine content can be obtained, but the reaction time is longer, which is not industrially preferable. Thus, the preferred reaction temperature is between 40 and 100, more preferably between 40 and 75.
- generated water is preferably removed out of the system, and can be removed out of the system by azeotropic distillation with epichlorohydrin under reduced pressure. It is preferable to keep the amount of epichlorohydrin in the system as constant as possible, and the distilled epichlorohydrin is returned to the system after separation from water.
- the reaction time is usually 1 to 10 hours.
- a solvent can be used.
- the solvent include aliphatic hydrocarbon solvents, aromatic solvents, alcohols, ethers, ketones and the like.
- a non-protonic solvent is suitably selected from the viewpoint of increasing the purity of the epoxy resin, and examples thereof include dimethyl sulfoxide and diethylene dalicol dimethyl ether.
- the amount of the solvent added is 10 to 300 wt% based on the bisphenol compound. A range is preferred. If the amount is less than this, the effect of addition is small, and if it is more than this, volumetric efficiency decreases, which is not economically preferable.
- a phase transfer catalyst such as a quaternary ammonium salt may be used.
- quaternary ammonium salts examples include tetramethylammonium chloride, tetraethylammonium chloride, benzyltriethylammonium chloride, and the like.
- the range is preferably from 1 to 2.0 wt%. If the amount is less than this, the effect of adding a quaternary ammonium salt is small, and if it is more than this, the amount of hardly hydrolyzable chlorine is increased, making it difficult to achieve high purity.
- a secondary reaction is performed in which the crude epoxy resin is reacted with the alkali metal hydroxide to cause a ring-closing reaction of the remaining chlorohydrin compound.
- This secondary reaction can be performed by dissolving the epoxy resin obtained in the primary reaction in a solvent and bringing it into contact with an alkali metal hydroxide.
- the solvent to be used ketones such as methyl isobutyl ketone, alcohols such as n-butanol, and aromatic solvents such as toluene are selected.
- the amount of the solvent used is usually in the range of 200 to 100 parts by weight based on 100 parts by weight of the epoxy resin.
- the amount of alkali metal hydroxide used in the reaction It is 1 to 30 times, preferably 1.2 to 10 times, the amount of hydrolyzable chlorine remaining in the oxy resin.
- the reaction temperature is preferably in the range of 40 to 120 ° C, and the reaction time is preferably in the range of 0.5 to 6 hours.
- the epoxy resin of the present invention can be obtained by removing salts generated by filtration or washing with water and further removing the solvent from the system by distillation.
- the obtained epoxy resin tends to be supercooled, so if it is taken out of the reactor and left at room temperature, it will remain as a viscous liquid for a long time.
- a crystallization method there is a method in which a solvent is used to lower the viscosity to promote crystallization.
- the solvent in this case, alcohols such as methanol, ethanol and isopropyl alcohol, and hydrocarbon solvents such as pentane, hexane and heptane are preferably used.
- there is a method of performing crystallization by adding a seed crystal prepared in advance to a liquid epoxy resin.
- the content of the multimeric epoxy after synthesis is high, the content of the monomer epoxy in which n is 0 in the general formula (1) can be increased by methods such as molecular distillation and recrystallization.
- a solvent for the recrystallization alcohols such as methanol, ethanol and isopropyl alcohol, esters such as ethyl acetate, hydrocarbon solvents such as pentane, hexane and heptane, and mixtures thereof are preferable.
- the curing agent used in the resin composition of the present invention all those generally known as curing agents for epoxy resins can be used. For example, dicyandiamide, polyhydric phenols, acid anhydrides, aromatic and aliphatic amines, etc. is there.
- polyphenols include, for example, a) bisphenol A, bisphenol F, bisphenol S, fluorenebisphenol, 4,4, -biphenol, 2,2'-biphenol, There are divalent phenols such as quinone, quinone, resorcinol, naphthalene diol, etc. b) tris- (4-hydroxyphenyl) methane, 1,1,2,2-tetrakis (4-hi) There are trivalent or higher phenols represented by droxyphenyl) ethane, phenol nopolak, o-cresol nopolak, naphthol nopolak, polyvinyl phenol, etc., and c) phenols and naphthols.
- Examples of the acid anhydrides include fluoric anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrohydrofluoric anhydride, methylhymic anhydride, and methyl anhydride. There are nadic acid and trimellitic anhydride.
- Amines include 4,4, diaminodiphenylmethane, 4,4 'diaminodiphenylpropane, 4,4, diaminodiphenylsulfone, m-phenylenediamine, p-xylylenediamine and the like.
- Aromatic amines ethylenediamine, hexamethylenediamine, diethylenetriamine And aliphatic amines such as triethylenetetramine.
- one or more of these curing agents can be used in combination.
- a normal epoxy resin having two or more epoxy groups in the molecule may be used in combination with the resin composition of the present invention.
- Examples include: a) Bivalent phenols such as bisphenol A, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hide-mouth quinone, resorcinol, etc.
- epoxy resins can be used singly or in combination of two or more.
- the amount of the epoxy resin according to the present invention is 5 to: L 00 wt%, preferably 30%, in the whole epoxy resin.
- L 0 wt% more preferably in the range of 50 to 100 ⁇ %.
- an oligomer or a high molecular compound such as a polyester, a polyamide, a polyimide, a polyether, a polyurethane, a petroleum resin, an indkmalone resin, and a phenoxy resin may be appropriately compounded.
- the resin composition of the present invention may contain additives such as an inorganic filler, a pigment, a repellent, a thixotropic agent, a coupling agent, and a fluidity improver.
- the inorganic filler for example, spherical or crushed powders such as molten silica powder, crystal powder, alumina powder, glass powder, or my powder, talc, calcium carbonate, alumina, hydrated alumina, etc.
- a pigment are organic or inorganic extenders, flaky pigments and the like.
- the thixotropic agent include a silicone type, a castor oil type, an aliphatic amide wax, a polyethylene oxide wax, and an organic bentonite type.
- a known curing accelerator can be used in the resin composition of the present invention, if necessary.
- examples include amines, imidazoles, organic phosphines, Lewis acids, and the like.
- the amount of addition is usually in the range of 0.2 to 5 parts by weight based on 100 parts by weight of the epoxy resin.
- the resin composition of the present invention may contain a releasing agent such as carnauba wax and OPEX, a force coupling agent such as r-dalicidoxypropyltrimethoxysilane, a coloring agent such as carbon black, and the like.
- Flame retardants such as antimony oxide, low stress agents such as silicone oil, and lubricants such as calcium stearate can be used.
- the epoxy resin of the present invention is suitably used for semiconductor encapsulation.
- a high-purity epoxy resin to be used in the present invention is preferably used, and the amount of hydrolyzable chlorine is preferably at most 1,000 ppm.
- the amount of the inorganic filler used in the epoxy resin composition used for this application is usually 75 wt% or more, but from the viewpoint of low moisture absorption and high solder heat resistance, it should be 80 wt% or more. Is preferred.
- the epoxy resin cured product of the present invention can be obtained by heating the above epoxy resin composition, which is excellent in low moisture absorption, high solder heat resistance and the like.
- a method for obtaining a cured product transfer molding, compression molding, casting, and the like are suitably used, and the temperature at that time is usually in the range of 140 to 230 ° C. It is. BEST MODE FOR CARRYING OUT THE INVENTION
- the present invention will be described more specifically with reference to examples.
- the measurement of hydrolyzable chlorine in the following examples was performed according to the following method.
- the purity analysis of the epoxy resin was performed by GPC measurement.
- the measurement conditions were as follows: an apparatus: HLC-82A (manufactured by Tohso-I) and a force ram; three TSK-GEL2000 and one TSK-GEL4000 (both from Tohso-I); a solvent; Flow rate: 1 ml / min, Temperature: 38 ° C, Detector: RI.
- HLC-82A manufactured by Tohso-I
- TSK-GEL2000 and one TSK-GEL4000 both from Tohso-I
- a solvent Flow rate: 1 ml / min
- Temperature 38 ° C
- Detector RI
- Example 1 100 g of the epoxy resin obtained in Example 1 was recrystallized from methanol to obtain 88 g of a white crystalline epoxy resin (Epoxy resin B).
- the epoxy equivalent was 236, the hydrolyzable chlorine was 90 ppm, the purity of DGS in the resin was 98.2 wt%, and the content of dimer epoxy was 1.5 wt%.
- the content of the monoepoxy compound was 0.3 wt%.
- the peak temperature of the melting point of the obtained crystal in DSC measurement was 122.2 ° C, the endothermic amount was 77.2 J / g, and the half width of the endothermic peak was 5.6 ° C.
- Example 3 100 g of the epoxy resin obtained in Example 1 was recrystallized from methanol to obtain 88 g of a white crystalline epoxy resin (Epoxy resin B).
- the epoxy equivalent was 236, the hydrolyzable chlorine was 90 ppm, the purity of DGS in the resin was 98.2 wt%, and the
- Example 2 240 g of DHS, 240 g of DEGDME, 900 g of epichlorohydrin, and 107.Og of a 48% aqueous sodium hydroxide solution were reacted in the same manner as in Example 1 to obtain 298 g of a liquid crude epoxy resin.
- Epoxy equivalent was 253 and hydrolyzable chlorine was 4600 ⁇ 1.
- the DGS purity in the resin was 88.5 wt%, and the dimer epoxy content was 8.4 wt%.
- the content of the epoxy resin was 3.1%.
- 100 g of the obtained crude epoxy resin was dissolved in 800 g of MIBK, and at 80, a 10% -NaOH aqueous solution and 10.3 g were added and reacted for 2 hours.
- the mixture was filtered and washed with water, and MIBK was distilled off to obtain 94 g of a single yellow liquid epoxy resin.
- the epoxy equivalent of the obtained epoxy resin is 242
- the hydrolyzable chlorine is 240PP1H
- the purity of DGS in the resin is 92.6 wt%
- the content of the dimer of the bisphenol compound is 6. 2 wt%.
- the content of the monoepoxy compound was 1.4 wt%.
- Example 2 The same reaction as in Example 1 was carried out using 120 g of DHS, 240 g of DEGME, 340 g of epichlorohydrin, and 52.Og of a 48% aqueous sodium hydroxide solution to obtain 149 g of a liquid crude epoxy resin.
- Epoxy equivalent was 255 and hydrolysable chlorine was 5300 ppm.
- the purity of DGS in the resin was 87.6 wt%, and the content of dimer epoxy was 8.6 wt%.
- the content of the monoepoxy compound was 3.8 wt%.
- Example 2 The crude epoxy resin obtained in Example 1 was allowed to stand at room temperature for 3 days to precipitate crystals to obtain a solid epoxy resin (Epoxy resin E).
- Epoxy resin E The peak temperature of the melting point of the obtained crystal in DSC measurement was 119.1 ° C, the endothermic amount was 53.2 j / g, and the half-width of the endothermic peak was 7.4 ° C. Comparative Example 2
- Example 3 The crude epoxy resin obtained in Example 3 was allowed to stand at room temperature for 3 days to precipitate crystals to obtain a solid epoxy resin (Epoxy resin F).
- the peak temperature of the melting point in the DSC measurement of the obtained crystal was 118.6 ° C
- the endothermic amount was 61.6 j / g
- the half width of the endothermic peak was 7.2 ° C. Comparative Example 3
- Epoxy equivalent was 244 and hydrolyzable chlorine was 450 ppm.
- the DGS purity in the resin was 89.6 wt%, and the dimer epoxy content was 7.6 wt%. Also, the content of the monoepoxy compound is 2.8 wt%.
- Epoxy resins A to G obtained in Examples 1 to 4 and Comparative Examples 1 to 3 were used as epoxy resin components, phenol nopolak resin (softening point 71 ° C, OH equivalent 107) as a curing agent, and a filler. Crushed silica (average particle size, 16 xm) or spherical silica force (average particle size, 22 / xm), triphenylphosphine as a hardening accelerator, glycidoxypropyltrimethoxysilane as a silane coupling agent, And other additives shown in Table 1 in the proportions (parts by weight) shown in Table 1, and then heated and kneaded to obtain an epoxy resin composition.
- This epoxy resin composition was molded at 175, and subjected to stoichiometry at 175 ° C. for 12 hours to obtain a cured product test piece, which was then subjected to various physical property measurements.
- the glass transition point was determined with a thermomechanical measuring device at a heating rate of 10 under the same conditions.
- the flexural strength and flexural modulus were measured at two levels: normal temperature (25) and high temperature (260 ° C).
- the adhesive strength was evaluated by the shear strength after compression molding at 175 ° C between two substrates with a thickness of 0.5 band and performing 175-hour post-storage at 175.
- the water absorption is the value obtained when a disk having a diameter of 50 ⁇ and a thickness of 3 mm is formed using the epoxy resin composition, and after absorbing the boss for 24 hours and 100 hours at 85 ° C and 85% RH.
- the element failure rate was determined by using a package obtained by subjecting a test chip having aluminum wiring to a copper frame to transfer molding at 175 ° C for 2 minutes, and then post-curing at 175 ° C for 12 hours.
- 85 ° C, 85% RH After absorbing moisture for the specified time shown in Table 2 and further immersing in a solder bath at 260 ° C for 10 seconds, a PCT test was performed at 121 ° C and 2 atm, and the aluminum wiring of the package used for the test was broken.
- the weight of the agglomerated composition was ⁇ 1 ratio.
- the storage stability was defined as the retention of the finely ground epoxy resin composition relative to the initial value of the spiral flow after standing at 25 ° C for 7 days (leaving for 0 days).
- Example 5 Example 6 Example 7 Example 8 Example 4 Example 5 Example 6
- the epoxy resin of the present invention has excellent curability and high crystallinity. Because of this, it has excellent blocking resistance during storage when used as an epoxy resin composition. Furthermore, since the cured product has high heat resistance, moisture resistance, and high adhesiveness, when applied to a resin composition for semiconductor encapsulation, the reliability of the package obtained by encapsulating the semiconductor element is significantly increased. improves.
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KR1020057014311A KR101116921B1 (ko) | 2003-02-03 | 2004-02-02 | 에폭시 수지, 그 제조방법, 그것을 사용한 에폭시 수지조성물 및 경화물 |
CN2004800029790A CN1816580B (zh) | 2003-02-03 | 2004-02-02 | 环氧树脂、其制造方法、使用该环氧树脂的环氧树脂组合物以及固化物 |
JP2005504813A JP4675777B2 (ja) | 2003-02-03 | 2004-02-02 | エポキシ樹脂、その製造方法、それを用いたエポキシ樹脂組成物及び硬化物 |
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Cited By (4)
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JP2007251138A (ja) * | 2006-02-16 | 2007-09-27 | Toray Ind Inc | 電子材料用接着剤シート |
CN102408422A (zh) * | 2011-09-14 | 2012-04-11 | 深圳市飞世尔实业有限公司 | 一种含硫光学环氧树脂及其制备方法 |
WO2013183736A1 (ja) * | 2012-06-07 | 2013-12-12 | 日本化薬株式会社 | エポキシ樹脂組成物、およびその硬化物、並びに、硬化性樹脂組成物 |
WO2013183735A1 (ja) * | 2012-06-07 | 2013-12-12 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物および硬化物 |
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JP5462559B2 (ja) * | 2009-09-08 | 2014-04-02 | 新日鉄住金化学株式会社 | 多価ヒドロキシ化合物、それらの製造方法及びエポキシ樹脂組成物並びにその硬化物 |
CN111735738A (zh) * | 2020-07-01 | 2020-10-02 | 道生天合材料科技(上海)股份有限公司 | 一种液体环氧树脂结晶倾向性的测定方法 |
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JPH06145300A (ja) * | 1992-11-05 | 1994-05-24 | Nippon Steel Chem Co Ltd | 電子部品封止用エポキシ樹脂組成物 |
JPH06199990A (ja) * | 1992-11-10 | 1994-07-19 | Sumitomo Chem Co Ltd | エポキシ樹脂組成物および樹脂封止型半導体装置 |
JPH06220409A (ja) * | 1993-01-25 | 1994-08-09 | Nippon Steel Chem Co Ltd | 熱硬化性接着シート |
JPH107762A (ja) * | 1996-06-26 | 1998-01-13 | Nippon Steel Chem Co Ltd | 固形エポキシ樹脂の製造方法 |
JPH11305430A (ja) * | 1998-04-22 | 1999-11-05 | Nippon Steel Chem Co Ltd | アルカリ現像型感光性樹脂組成物 |
JP2001139658A (ja) * | 1999-11-18 | 2001-05-22 | Nippon Steel Chem Co Ltd | 高純度低粘性エポキシ樹脂およびその製造方法 |
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2004
- 2004-02-02 KR KR1020057014311A patent/KR101116921B1/ko active IP Right Grant
- 2004-02-02 WO PCT/JP2004/000994 patent/WO2004069893A1/ja active Application Filing
- 2004-02-02 JP JP2005504813A patent/JP4675777B2/ja not_active Expired - Lifetime
- 2004-02-02 CN CN2004800029790A patent/CN1816580B/zh not_active Expired - Lifetime
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JPS5731922A (en) * | 1980-08-01 | 1982-02-20 | Dainippon Ink & Chem Inc | Aftertreatment of crude epoxy compound |
JPS62256821A (ja) * | 1986-04-30 | 1987-11-09 | Asahi Chem Ind Co Ltd | 含有ハロゲン量の少ないエポキシ樹脂の製造方法 |
JPH01207317A (ja) * | 1988-02-15 | 1989-08-21 | Mitsui Petrochem Ind Ltd | エポキシ樹脂の精製方法 |
JPH0517463A (ja) * | 1991-07-08 | 1993-01-26 | Toto Kasei Kk | 高純度エポキシ樹脂の製造方法 |
JPH06145300A (ja) * | 1992-11-05 | 1994-05-24 | Nippon Steel Chem Co Ltd | 電子部品封止用エポキシ樹脂組成物 |
JPH06199990A (ja) * | 1992-11-10 | 1994-07-19 | Sumitomo Chem Co Ltd | エポキシ樹脂組成物および樹脂封止型半導体装置 |
JPH06220409A (ja) * | 1993-01-25 | 1994-08-09 | Nippon Steel Chem Co Ltd | 熱硬化性接着シート |
JPH107762A (ja) * | 1996-06-26 | 1998-01-13 | Nippon Steel Chem Co Ltd | 固形エポキシ樹脂の製造方法 |
JPH11305430A (ja) * | 1998-04-22 | 1999-11-05 | Nippon Steel Chem Co Ltd | アルカリ現像型感光性樹脂組成物 |
JP2001139658A (ja) * | 1999-11-18 | 2001-05-22 | Nippon Steel Chem Co Ltd | 高純度低粘性エポキシ樹脂およびその製造方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007251138A (ja) * | 2006-02-16 | 2007-09-27 | Toray Ind Inc | 電子材料用接着剤シート |
CN102408422A (zh) * | 2011-09-14 | 2012-04-11 | 深圳市飞世尔实业有限公司 | 一种含硫光学环氧树脂及其制备方法 |
WO2013183736A1 (ja) * | 2012-06-07 | 2013-12-12 | 日本化薬株式会社 | エポキシ樹脂組成物、およびその硬化物、並びに、硬化性樹脂組成物 |
WO2013183735A1 (ja) * | 2012-06-07 | 2013-12-12 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物および硬化物 |
JPWO2013183736A1 (ja) * | 2012-06-07 | 2016-02-01 | 日本化薬株式会社 | エポキシ樹脂組成物、およびその硬化物、並びに、硬化性樹脂組成物 |
JPWO2013183735A1 (ja) * | 2012-06-07 | 2016-02-01 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物および硬化物 |
Also Published As
Publication number | Publication date |
---|---|
CN1816580B (zh) | 2010-04-28 |
JP4675777B2 (ja) | 2011-04-27 |
KR101116921B1 (ko) | 2012-03-13 |
JPWO2004069893A1 (ja) | 2006-05-25 |
KR20050095783A (ko) | 2005-09-30 |
CN1816580A (zh) | 2006-08-09 |
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