WO2000047796A8 - Revetements de carbure de tungstene et procede de production - Google Patents
Revetements de carbure de tungstene et procede de productionInfo
- Publication number
- WO2000047796A8 WO2000047796A8 PCT/RU1999/000037 RU9900037W WO0047796A8 WO 2000047796 A8 WO2000047796 A8 WO 2000047796A8 RU 9900037 W RU9900037 W RU 9900037W WO 0047796 A8 WO0047796 A8 WO 0047796A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- tungsten
- tungsten carbide
- producing
- same
- doped
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/44—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Ceramic Products (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating By Spraying Or Casting (AREA)
Priority Applications (24)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL99350040A PL190391B1 (pl) | 1999-02-11 | 1999-02-11 | Materiał na powłoki odporne na ścieranie, erozję i korozję, materiał obejmujący podłoże z osadzoną powłoką, powłoka zawierająca wolfram i węglik wolframu, sposób wytwarzania węglików wolframu i sposób osadzania powłok |
JP2000598688A JP4456279B2 (ja) | 1999-02-11 | 1999-02-11 | 炭化タングステン被膜およびそれの製造方法 |
US09/913,324 US6800383B1 (en) | 1999-02-11 | 1999-02-11 | Tungsten carbide coating and method for producing the same |
AT99921305T ATE408035T1 (de) | 1999-02-11 | 1999-02-11 | Wolframkarbidbeschichtungen und verfahren zu deren herstellung |
DE69939554T DE69939554D1 (de) | 1999-02-11 | 1999-02-11 | Wolframkarbidbeschichtungen und verfahren zu deren herstellung |
BRPI9917267-4A BR9917267B1 (pt) | 1999-02-11 | 1999-02-11 | processo de obtenÇço de revestimento com carbbetos de tungstÊnio, revestimento e material de construÇço obtidos por tal processo. |
KR1020017010205A KR100603554B1 (ko) | 1999-02-11 | 1999-02-11 | 텅스텐 카바이드 코팅 및 그 제조 방법 |
AU38553/99A AU747585B2 (en) | 1999-02-11 | 1999-02-11 | Tungsten carbide coatings and method for producing the same |
MXPA01008146A MXPA01008146A (es) | 1999-02-11 | 1999-02-11 | Revestimientos de carburo de tungsteno, y metodo para producir los mismos. |
UA2001096234A UA66913C2 (en) | 1999-02-11 | 1999-02-11 | Tungsten carbide coatings (variants), a method for manufacture thereof and composite material (variants) |
CA2366500A CA2366500C (en) | 1999-02-11 | 1999-02-11 | Tungsten carbide coatings and process for producing them |
ES99921305T ES2315012T3 (es) | 1999-02-11 | 1999-02-11 | Recubrimientos de carburo de tungsteno y procedimiento para producir los mismos. |
EEP200100421A EE200100421A (et) | 1999-02-11 | 1999-02-11 | Volframkarbiidist kattematerjal, seda sisaldav kate ning meetod volframkarbiidi saamiseks ja katte valmistamiseks |
SK1166-2001A SK286721B6 (sk) | 1999-02-11 | 1999-02-11 | Materiál na povlaky odolné proti opotrebovaniu, erózii a korózii z karbidu volfrámu, povlaky, substrát potiahnutý viacvrstvovým povlakom, konštrukčný materiál a postupy na ich výrobu |
EP99921305A EP1158070B1 (en) | 1999-02-11 | 1999-02-11 | Tungsten carbide coatings and method for producing the same |
TR2001/02340T TR200102340T2 (tr) | 1999-02-11 | 1999-02-11 | Tungstenli karbür kaplamalar ve bunların üretimine yönelik prosesler. |
SI9931020T SI1158070T1 (sl) | 1999-02-11 | 1999-02-11 | Prevleke volframovega karbida in postopek za njihovo pripravo |
EA200100840A EA003063B1 (ru) | 1999-02-11 | 1999-02-11 | Карбидовольфрамовые покрытия и способ их изготовления |
CNB998161462A CN1150347C (zh) | 1999-02-11 | 1999-02-11 | 碳化钨涂层及其制造方法 |
CZ20012921A CZ300250B6 (cs) | 1999-02-11 | 1999-02-11 | Povlaky karbidu wolframu a zpusob jejich výroby |
PCT/RU1999/000037 WO2000047796A1 (fr) | 1999-02-11 | 1999-02-11 | Revetements de carbure de tungstene et procede de production |
NO20013854A NO331513B1 (no) | 1999-02-11 | 2001-08-07 | Wolframkarbidbelegg og fremgangsmate for fremstilling av samme |
IS6046A IS6046A (is) | 1999-02-11 | 2001-08-09 | Þungsteinskarbíð húðunarefni og aðferð til framleiðslu þess |
HK02103775.3A HK1041908B (zh) | 1999-02-11 | 2002-05-21 | 碳化鎢塗層及其製作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/RU1999/000037 WO2000047796A1 (fr) | 1999-02-11 | 1999-02-11 | Revetements de carbure de tungstene et procede de production |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2000047796A1 WO2000047796A1 (fr) | 2000-08-17 |
WO2000047796A8 true WO2000047796A8 (fr) | 2001-04-12 |
Family
ID=20130326
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/RU1999/000037 WO2000047796A1 (fr) | 1999-02-11 | 1999-02-11 | Revetements de carbure de tungstene et procede de production |
Country Status (24)
Country | Link |
---|---|
US (1) | US6800383B1 (ru) |
EP (1) | EP1158070B1 (ru) |
JP (1) | JP4456279B2 (ru) |
KR (1) | KR100603554B1 (ru) |
CN (1) | CN1150347C (ru) |
AT (1) | ATE408035T1 (ru) |
AU (1) | AU747585B2 (ru) |
BR (1) | BR9917267B1 (ru) |
CA (1) | CA2366500C (ru) |
CZ (1) | CZ300250B6 (ru) |
DE (1) | DE69939554D1 (ru) |
EA (1) | EA003063B1 (ru) |
EE (1) | EE200100421A (ru) |
ES (1) | ES2315012T3 (ru) |
HK (1) | HK1041908B (ru) |
IS (1) | IS6046A (ru) |
MX (1) | MXPA01008146A (ru) |
NO (1) | NO331513B1 (ru) |
PL (1) | PL190391B1 (ru) |
SI (1) | SI1158070T1 (ru) |
SK (1) | SK286721B6 (ru) |
TR (1) | TR200102340T2 (ru) |
UA (1) | UA66913C2 (ru) |
WO (1) | WO2000047796A1 (ru) |
Cited By (5)
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---|---|---|---|---|
US8841182B1 (en) | 2013-03-14 | 2014-09-23 | Asm Ip Holding B.V. | Silane and borane treatments for titanium carbide films |
US8846550B1 (en) | 2013-03-14 | 2014-09-30 | Asm Ip Holding B.V. | Silane or borane treatment of metal thin films |
US8993055B2 (en) | 2005-10-27 | 2015-03-31 | Asm International N.V. | Enhanced thin film deposition |
US9139906B2 (en) | 2001-03-06 | 2015-09-22 | Asm America, Inc. | Doping with ALD technology |
US9394609B2 (en) | 2014-02-13 | 2016-07-19 | Asm Ip Holding B.V. | Atomic layer deposition of aluminum fluoride thin films |
Families Citing this family (67)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6482262B1 (en) | 1959-10-10 | 2002-11-19 | Asm Microchemistry Oy | Deposition of transition metal carbides |
US7419903B2 (en) | 2000-03-07 | 2008-09-02 | Asm International N.V. | Thin films |
KR100707405B1 (ko) * | 2000-03-15 | 2007-04-13 | 하다이드 리미티드 | 다이아몬드 및 다이아몬드-함유 재료용 접착성 복합 코팅,및 상기 코팅의 제조 방법 |
WO2002044437A2 (en) * | 2000-11-02 | 2002-06-06 | Composite Tool Company, Inc. | High strength alloys and methods for making same |
DE10063717C1 (de) | 2000-12-20 | 2002-02-21 | Infineon Technologies Ag | Verfahren zur Abscheidung dünner Schichten durch Chemical Vapor Deposition |
JP4938962B2 (ja) | 2001-09-14 | 2012-05-23 | エーエスエム インターナショナル エヌ.ヴェー. | ゲッタリング反応物を用いるaldによる金属窒化物堆積 |
GB0207375D0 (en) * | 2002-03-28 | 2002-05-08 | Hardide Ltd | Cutting tool with hard coating |
EP1652226A2 (en) | 2003-08-04 | 2006-05-03 | ASM America, Inc. | Surface preparation prior to deposition on germanium |
US7405143B2 (en) | 2004-03-25 | 2008-07-29 | Asm International N.V. | Method for fabricating a seed layer |
GB0422608D0 (en) * | 2004-10-12 | 2004-11-10 | Hardide Ltd | Alloyed tungsten produced by chemical vapour deposition |
EP1851794A1 (en) | 2005-02-22 | 2007-11-07 | ASM America, Inc. | Plasma pre-treating surfaces for atomic layer deposition |
KR100664042B1 (ko) | 2005-10-11 | 2007-01-03 | 엘지전자 주식회사 | 조리 기구 |
EP1785506A1 (en) | 2005-11-09 | 2007-05-16 | Centre de compétence de l'Ind. Techn. (CRIF) - Kenniscentrum van de Tech. Ind. (WICM) | Protective coating for casting moulds |
US20100211180A1 (en) * | 2006-03-21 | 2010-08-19 | Jet Engineering, Inc. | Tetrahedral Amorphous Carbon Coated Medical Devices |
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US8993055B2 (en) | 2005-10-27 | 2015-03-31 | Asm International N.V. | Enhanced thin film deposition |
US9127351B2 (en) | 2005-10-27 | 2015-09-08 | Asm International N.V. | Enhanced thin film deposition |
US8841182B1 (en) | 2013-03-14 | 2014-09-23 | Asm Ip Holding B.V. | Silane and borane treatments for titanium carbide films |
US8846550B1 (en) | 2013-03-14 | 2014-09-30 | Asm Ip Holding B.V. | Silane or borane treatment of metal thin films |
US9111749B2 (en) | 2013-03-14 | 2015-08-18 | Asm Ip Holdings B.V. | Silane or borane treatment of metal thin films |
US9236247B2 (en) | 2013-03-14 | 2016-01-12 | Asm Ip Holding B.V. | Silane and borane treatments for titanium carbide films |
US9394609B2 (en) | 2014-02-13 | 2016-07-19 | Asm Ip Holding B.V. | Atomic layer deposition of aluminum fluoride thin films |
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