UY23528A1 - Composicion de revestimiento para vidrios - Google Patents

Composicion de revestimiento para vidrios

Info

Publication number
UY23528A1
UY23528A1 UY23528A UY23528A UY23528A1 UY 23528 A1 UY23528 A1 UY 23528A1 UY 23528 A UY23528 A UY 23528A UY 23528 A UY23528 A UY 23528A UY 23528 A1 UY23528 A1 UY 23528A1
Authority
UY
Uruguay
Prior art keywords
precursor
silicon oxide
composition
tin oxide
chosen
Prior art date
Application number
UY23528A
Other languages
English (en)
Inventor
David A Russo
Ryan R Dirkx
Glenn P Florczak
Original Assignee
Atofina Chem Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27123834&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=UY23528(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atofina Chem Inc filed Critical Atofina Chem Inc
Publication of UY23528A1 publication Critical patent/UY23528A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2453—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD

Abstract

La presente invención se refiere a una composición gaseosa a una temperatura inferior a 200ºC a la presión atmosférica, adaptada para depositar por lo menos una primera capa de óxido de estaño, y óxido de silicio sobre un vidrio a un régimen de depósito mayor de 350 A/seg a una temperatura inferior a 200ºC, a la presión atmosférica, donde la composición está caracterizada por comprender un precursor de óxido de estaño, un precursor de óxido de silicio, un acelerador elegido del grupo consistente en fosfitos orgánicos, boratos orgánicos y agua, y mezclas de los mismos y una fuente de oxígeno. La composición se caracteriza porque el sustrato es vidrio plano transparente a una temperatura de 450ºC hasta 650ºC. Produce un artículo de vidrio sin esencialmente ningún color reflejado a la luz del día. El precursor de óxido de estaño incluye aquellos descritos por la fórmula general RnSnX4-n donde R se elige independientemente de alquilo cadena recta, ramificada o cíclica con uno a seis átomos de carbono, entre otros; o R'CH2CH2, donde R' es, por ejemplo MeO2C-; X se elige de halógeno, entre otros. Como ejemplo no limitante de dicho precursor: haluro de alquilestaño. El precursor para óxido de silicio incluye los descritos por la fórmula general ROnSip, donde R se elige independientemente de hidrógeno y acilo, o alquilo de cadena recta, ramificada o cíclica con uno hasta 6 átomos de carbono, entre otros. Como ejemplo no limitante de dicho precursor: tetraetilortosilicato.
UY23528A 1991-12-26 1992-12-28 Composicion de revestimiento para vidrios UY23528A1 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US81436691A 1991-12-26 1991-12-26
US81435291A 1991-12-27 1991-12-27
PCT/US1992/010872 WO1993012892A1 (en) 1991-12-26 1992-12-21 Method for coating glass substrates

Publications (1)

Publication Number Publication Date
UY23528A1 true UY23528A1 (es) 1993-02-18

Family

ID=27123834

Family Applications (3)

Application Number Title Priority Date Filing Date
UY23528A UY23528A1 (es) 1991-12-26 1992-12-28 Composicion de revestimiento para vidrios
UY23527A UY23527A1 (es) 1991-12-26 1992-12-28 Metodo para revestir sustratos de vidrio
UY23526A UY23526A1 (es) 1991-12-26 1992-12-28 Articulo revestido

Family Applications After (2)

Application Number Title Priority Date Filing Date
UY23527A UY23527A1 (es) 1991-12-26 1992-12-28 Metodo para revestir sustratos de vidrio
UY23526A UY23526A1 (es) 1991-12-26 1992-12-28 Articulo revestido

Country Status (26)

Country Link
US (2) US5401305A (es)
EP (4) EP0573639B1 (es)
JP (3) JP3485918B2 (es)
KR (3) KR100238740B1 (es)
CN (3) CN1041815C (es)
AR (1) AR248263A1 (es)
AT (2) ATE186039T1 (es)
AU (3) AU663559B2 (es)
BR (3) BR9205673A (es)
CA (3) CA2104592A1 (es)
CZ (3) CZ286855B6 (es)
DE (2) DE69230219T2 (es)
DK (2) DK0927706T3 (es)
ES (2) ES2221257T3 (es)
GR (1) GR3031624T3 (es)
HU (3) HU214047B (es)
MX (2) MX9207592A (es)
MY (1) MY110355A (es)
NO (3) NO316683B1 (es)
NZ (1) NZ246459A (es)
PL (1) PL169649B1 (es)
PT (4) PT927706E (es)
RU (2) RU2091340C1 (es)
SK (3) SK282141B6 (es)
UY (3) UY23528A1 (es)
WO (3) WO1993013393A1 (es)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HU214047B (en) * 1991-12-26 1997-12-29 Atochem North America Elf Coating composition for glass
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5395698A (en) * 1993-06-04 1995-03-07 Ppg Industries, Inc. Neutral, low emissivity coated glass articles and method for making
DE4433206A1 (de) * 1994-09-17 1996-03-21 Goldschmidt Ag Th Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten
DE19504906A1 (de) * 1995-02-15 1996-08-22 Goldschmidt Ag Th Verfahren zur Heißendvergütung von Hohlglaskörpern durch Aufbringen von Metallverbindungen auf die heiße äußere Glasoberfläche
CO4560356A1 (es) * 1995-02-22 1998-02-10 Elf Atochem Vlissingen Bv Proceso para la produccion de un recubrimiento de proteccion sobre la superficie de un articulo de vidrio o ceramica
US5648175A (en) * 1996-02-14 1997-07-15 Applied Materials, Inc. Chemical vapor deposition reactor system and integrated circuit
GB9616983D0 (en) * 1996-08-13 1996-09-25 Pilkington Plc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
GB9710547D0 (en) * 1997-05-23 1997-07-16 Pilkington Plc Coating method
FR2780054B1 (fr) 1998-06-19 2000-07-21 Saint Gobain Vitrage Procede de depot d'une couche a base d'oxyde metallique sur un substrat verrier, substrat verrier ainsi revetu
FR2789698B1 (fr) * 1999-02-11 2002-03-29 Air Liquide Procede et installation pour former un depot d'une couche sur un substrat
US6797388B1 (en) * 1999-03-18 2004-09-28 Ppg Industries Ohio, Inc. Methods of making low haze coatings and the coatings and coated articles made thereby
JP3227449B2 (ja) * 1999-05-28 2001-11-12 日本板硝子株式会社 光電変換装置用基板とその製造方法、およびこれを用いた光電変換装置
LU90432B1 (fr) * 1999-09-01 2001-03-02 Glaverbel Couche pyrolytique phosphostannate ou borostannate et vitrage comportant cette couche
US6399208B1 (en) * 1999-10-07 2002-06-04 Advanced Technology Materials Inc. Source reagent composition and method for chemical vapor deposition formation or ZR/HF silicate gate dielectric thin films
WO2003065386A1 (fr) * 2002-01-28 2003-08-07 Nippon Sheet Glass Company, Limited Procede permettant de former un film conducteur transparent, ledit film conducteur transparent, substrat de verre comportant ledit film conducteur transparent et unite de transduction photoelectrique comprenant ledit substrat de verre
US6784049B2 (en) * 2002-08-28 2004-08-31 Micron Technology, Inc. Method for forming refractory metal oxide layers with tetramethyldisiloxane
US7030042B2 (en) 2002-08-28 2006-04-18 Micron Technology, Inc. Systems and methods for forming tantalum oxide layers and tantalum precursor compounds
US20050196623A1 (en) * 2004-03-03 2005-09-08 Mckown Clem S.Jr. Solar control coated glass composition
US20050221003A1 (en) * 2004-03-31 2005-10-06 Remington Michael P Jr Enhancement of SiO2 deposition using phosphorus (V) compounds
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
US8258690B2 (en) 2005-10-11 2012-09-04 Kuraray Co., Ltd. High brightness inorganic electroluminescence device driven by direct current
CA2625768A1 (en) 2005-10-11 2007-04-19 Kuraray Luminas Co., Ltd. A luminous body
RU2445340C2 (ru) * 2005-10-11 2012-03-20 Курарей Ко, ЛТД., Светящееся тело
US20090002809A1 (en) * 2006-01-16 2009-01-01 Nippon Sheet Glass Company Limited Glass Plate Having Thin Film Formed Thereon
US8158262B2 (en) * 2006-06-05 2012-04-17 Pilkington Group Limited Glass article having a zinc oxide coating and method for making same
MY148663A (en) * 2006-06-05 2013-05-31 Pilkington Group Ltd Glass article having a zinc oxide coating and method for making same
US20080152804A1 (en) * 2006-07-28 2008-06-26 Gulbrandsen Chemicals, Inc. Method for depositing a metal-containing coating on a substrate
US20080026147A1 (en) * 2006-07-28 2008-01-31 Gulbrandsen Chemicals, Inc. Method and formulation for depositing a metal-containing coating on a substrate
EP2059488A1 (en) * 2006-08-29 2009-05-20 Pilkington Group Limited Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby
US8163342B2 (en) * 2006-08-29 2012-04-24 Pilkington Group Limited Method of making low resisitivity doped zinc oxide coatings and the articles formed thereby
US8470434B2 (en) 2007-01-15 2013-06-25 Saint-Gobain Glass France Glass substrate coated with layers having an improved mechanical strength
FR2913973B1 (fr) * 2007-03-21 2011-02-18 Saint Gobain Substrat verrier revetu de couches a tenue mecanique amelioree
US8133599B2 (en) 2008-11-19 2012-03-13 Ppg Industries Ohio, Inc Undercoating layers providing improved photoactive topcoat functionality
US7998586B2 (en) 2008-11-19 2011-08-16 Ppg Industries Ohio, Inc. Undercoating layers providing improved topcoat functionality
WO2010059507A1 (en) * 2008-11-19 2010-05-27 Ppg Industries Ohio, Inc. Undercoating layers providing improved topcoat functionality
US20100124642A1 (en) * 2008-11-19 2010-05-20 Ppg Industries Ohio, Inc. Undercoating layers providing improved conductive topcoat functionality
DE102008060923B4 (de) 2008-12-06 2012-09-27 Innovent E.V. Verwendung einer Schicht
CN102484220A (zh) * 2009-07-06 2012-05-30 阿科玛股份有限公司 由透明的导电氧化物(tco)和防晕光底漆组成的oled基片
US9224892B2 (en) 2009-12-21 2015-12-29 Ppg Industries Ohio, Inc. Silicon thin film solar cell having improved haze and methods of making the same
US9366783B2 (en) * 2009-12-21 2016-06-14 Ppg Industries Ohio, Inc. Silicon thin film solar cell having improved underlayer coating
US20110146768A1 (en) * 2009-12-21 2011-06-23 Ppg Industries Ohio, Inc. Silicon thin film solar cell having improved underlayer coating
FR2956659B1 (fr) 2010-02-22 2014-10-10 Saint Gobain Substrat verrier revetu de couches a tenue mecanique amelioree
EP2441860A1 (en) * 2010-10-13 2012-04-18 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Apparatus and method for atomic layer deposition on a surface
US8557099B2 (en) 2010-10-25 2013-10-15 Ppg Industries Ohio, Inc. Electrocurtain coating process for coating solar mirrors
RU2477711C1 (ru) * 2011-08-12 2013-03-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Уральский федеральный университет имени первого Президента России Б.Н. Ельцина" Легированное кварцевое стекло с тетраэдрической координацией атомов титана
US8734903B2 (en) 2011-09-19 2014-05-27 Pilkington Group Limited Process for forming a silica coating on a glass substrate
EP2761054B1 (en) * 2011-09-30 2019-08-14 Arkema, Inc. Deposition of silicon oxide by atmospheric pressure chemical vapor deposition
CN102584025B (zh) * 2012-01-19 2014-06-11 江苏秀强玻璃工艺股份有限公司 具有宽带隙折射率可调隔离层玻璃的制备方法
US20130334089A1 (en) * 2012-06-15 2013-12-19 Michael P. Remington, Jr. Glass Container Insulative Coating
US20140261663A1 (en) * 2013-03-12 2014-09-18 Ppg Industries Ohio, Inc. High Haze Underlayer For Solar Cell
TW201716245A (zh) * 2015-08-05 2017-05-16 康寧公司 用於將片材與載體鍵結之物件及方法
WO2017082541A1 (ko) * 2015-11-11 2017-05-18 한국화학연구원 금속 전구체, 이의 제조방법, 및 이를 이용하여 박막을 형성하는 방법
EP3173507A1 (de) * 2015-11-25 2017-05-31 Umicore AG & Co. KG Verfahren zur metallorganischen gasphasenabscheidung unter verwendung von lösungen von indiumalkylverbindungen in kohlenwasserstoffen
GB201523156D0 (en) * 2015-12-31 2016-02-17 Pilkington Group Ltd High strength glass containers
CA2920646A1 (en) * 2016-02-12 2017-08-12 Seastar Chemicals Inc. Organometallic compound and method
CN106217968A (zh) * 2016-07-15 2016-12-14 常熟市赛蒂镶嵌玻璃制品有限公司 一种高耐磨防爆玻璃
JP7376470B2 (ja) 2017-08-31 2023-11-08 ピルキントン グループ リミテッド 酸化ケイ素コーティングを形成するための化学気相堆積プロセス
EP3676231A1 (en) 2017-08-31 2020-07-08 Pilkington Group Limited Coated glass article, method of making the same, and photovoltaic cell made therewith
JP6993394B2 (ja) * 2019-08-06 2022-02-21 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー ケイ素化合物及びケイ素化合物を使用してフィルムを堆積する方法
JP2023522993A (ja) * 2020-04-23 2023-06-01 ピルキントン グループ リミテッド コーティングされたガラス物品の製造方法
TR202010598A2 (tr) * 2020-07-03 2022-01-21 Tuerkiye Sise Ve Cam Fabrikalari Anonim Sirketi Cam yüzeyler için geliştirilmiş antimikrobiyel kaplama çözeltisi, antimikrobiyel kaplamalı cam ve bunun uygulama prosesi

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3378396A (en) * 1967-03-27 1968-04-16 Zaromb Solomon Conductive oxide-coated articles
US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
US3949146A (en) * 1973-08-24 1976-04-06 Rca Corporation Process for depositing transparent electrically conductive tin oxide coatings on a substrate
DE2454657A1 (de) * 1974-11-18 1976-05-20 Jenaer Glaswerk Schott & Gen Beschichtung zum verhindern des beschlagens von oberflaechen
US4227929A (en) * 1976-08-26 1980-10-14 Ameron, Inc. Siloxane-tin coatings
US4308316A (en) * 1977-04-04 1981-12-29 Gordon Roy G Non-iridescent glass structures
US4187336A (en) * 1977-04-04 1980-02-05 Gordon Roy G Non-iridescent glass structures
US4206252A (en) * 1977-04-04 1980-06-03 Gordon Roy G Deposition method for coating glass and the like
SU833649A1 (ru) * 1979-02-12 1981-05-30 Северо-Западный Заочный Политехническийинститут Пленкообразующий раствор дл стекл н-НыХ издЕлий
JPS5734164A (en) * 1980-08-06 1982-02-24 Kansai Paint Co Ltd Film-forming composition
US4386117A (en) * 1981-11-20 1983-05-31 Gordon Roy G Coating process using alkoxy substituted silicon-bearing reactant
JPS58189263A (ja) * 1982-04-28 1983-11-04 Hitachi Chem Co Ltd ＳｉＯ↓２膜形成用塗布液
JPS59125433A (ja) * 1982-12-30 1984-07-19 Fujitsu Ltd 音声応答方式
US4590096A (en) * 1984-12-28 1986-05-20 M&T Chemicals Inc. Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass
JPS61181253A (ja) * 1985-02-06 1986-08-13 Keihachirou Shikakura 電話機
JPS62263754A (ja) * 1986-05-09 1987-11-16 Iwatsu Electric Co Ltd デ−タ入力装置
US5028566A (en) * 1987-04-10 1991-07-02 Air Products And Chemicals, Inc. Method of forming silicon dioxide glass films
US4880664A (en) * 1987-08-31 1989-11-14 Solarex Corporation Method of depositing textured tin oxide
AU616736B2 (en) * 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
EP0486475B1 (en) * 1988-03-03 1997-12-03 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
EP0423337B1 (en) * 1988-08-24 1995-06-07 CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. Coating fluid for forming transparent conductive ceramic coating, base material coated with transparent conductive ceramic and production thereof, and application of base material coated with transparent conductive ceramic
JP2856754B2 (ja) * 1989-02-17 1999-02-10 株式会社東芝 紫外線抑制発光源、紫外線抑制発光源用塗布剤、及び紫外線抑制発光源の製造方法
EP0386341B1 (en) * 1989-03-07 1995-03-15 Asahi Glass Company Ltd. Laminated glass structure
JPH0717407B2 (ja) * 1989-10-09 1995-03-01 旭硝子株式会社 機能薄膜付ガラスの製造方法
US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
HU214047B (en) * 1991-12-26 1997-12-29 Atochem North America Elf Coating composition for glass

Also Published As

Publication number Publication date
DE69233396T2 (de) 2005-01-13
BR9205674A (pt) 1994-05-24
EP0582691A1 (en) 1994-02-16
CN1074890A (zh) 1993-08-04
CZ173393A3 (en) 1994-05-18
SK91393A3 (en) 1994-01-12
AU651754B2 (en) 1994-07-28
AU3323093A (en) 1993-07-28
CZ286854B6 (cs) 2000-07-12
CA2104592A1 (en) 1993-06-27
NO933029D0 (no) 1993-08-25
MY110355A (en) 1998-04-30
CN1074891A (zh) 1993-08-04
CA2104590A1 (en) 1993-06-27
NO933030L (no) 1993-10-22
CN1074889A (zh) 1993-08-04
PT101161A (pt) 1994-03-31
DE69230219T2 (de) 2000-02-10
HUT67686A (en) 1995-04-28
DE69230219D1 (de) 1999-12-02
SK281638B6 (sk) 2001-06-11
KR930703087A (ko) 1993-11-29
KR100238740B1 (ko) 2000-01-15
AR248263A1 (es) 1995-07-12
ATE186039T1 (de) 1999-11-15
CA2104590C (en) 2007-05-08
CN1041814C (zh) 1999-01-27
HU214047B (en) 1997-12-29
PT101159A (pt) 1994-02-28
UY23526A1 (es) 1993-02-18
SK282141B6 (sk) 2001-11-06
MX9207591A (es) 1994-06-30
UY23527A1 (es) 1993-02-18
EP0927706A3 (en) 1999-12-29
EP0573639A4 (en) 1995-01-04
EP0573640A4 (en) 1995-01-04
HU9302412D0 (en) 1993-12-28
AU3322893A (en) 1993-07-28
PT101159B (pt) 1999-09-30
AU3322993A (en) 1993-07-28
NZ246459A (en) 1995-12-21
JPH06505695A (ja) 1994-06-30
BR9205673A (pt) 1994-08-02
DK0927706T3 (da) 2004-12-06
KR100243801B1 (ko) 2000-03-02
EP0573640A1 (en) 1993-12-15
CA2104591C (en) 2000-03-14
CN1041815C (zh) 1999-01-27
ES2221257T3 (es) 2004-12-16
PT101160B (pt) 1999-09-30
CA2104591A1 (en) 1993-06-27
RU2091340C1 (ru) 1997-09-27
EP0582691A4 (en) 1995-01-04
KR100238920B1 (ko) 2000-01-15
SK91493A3 (en) 1994-01-12
AU663559B2 (en) 1995-10-12
PT101161B (pt) 1999-09-30
NO316683B1 (no) 2004-03-26
EP0573639A1 (en) 1993-12-15
JP3485919B2 (ja) 2004-01-13
JP3485918B2 (ja) 2004-01-13
CZ173593A3 (en) 1994-05-18
PL169649B1 (pl) 1996-08-30
NO933031L (no) 1993-10-22
USRE41799E1 (en) 2010-10-05
NO933029L (no) 1993-10-22
NO933031D0 (no) 1993-08-25
ATE272582T1 (de) 2004-08-15
JPH06505696A (ja) 1994-06-30
JP3485920B2 (ja) 2004-01-13
NO933030D0 (no) 1993-08-25
SK91593A3 (en) 1994-01-12
HU9302413D0 (en) 1994-03-28
HU9302411D0 (en) 1994-03-28
HUT67158A (en) 1995-02-28
PT927706E (pt) 2004-11-30
HUT67335A (en) 1995-03-28
EP0927706A2 (en) 1999-07-07
RU2102347C1 (ru) 1998-01-20
MX9207592A (es) 1994-06-30
CZ286855B6 (cs) 2000-07-12
BR9205672A (pt) 1994-08-02
GR3031624T3 (en) 2000-01-31
DK0573639T3 (da) 2000-02-07
CZ289572B6 (cs) 2002-02-13
JPH06505957A (ja) 1994-07-07
EP0573639B1 (en) 1999-10-27
ES2137984T3 (es) 2000-01-01
NO316642B1 (no) 2004-03-22
SK282993B6 (sk) 2003-01-09
CZ173493A3 (en) 1994-05-18
NO316641B1 (no) 2004-03-22
EP0927706B1 (en) 2004-08-04
WO1993012892A1 (en) 1993-07-08
DE69233396D1 (de) 2004-09-09
US5401305A (en) 1995-03-28
PT101160A (pt) 1994-05-31
KR930703589A (ko) 1993-11-30
CN1043988C (zh) 1999-07-07
WO1993012934A1 (en) 1993-07-08
WO1993013393A1 (en) 1993-07-08

Similar Documents

Publication Publication Date Title
UY23528A1 (es) Composicion de revestimiento para vidrios
SE7609029L (sv) Sett att forbettra hallbarheten for skyddsskikt, som bestar av kiseloxider
KR950034857A (ko) 광전자 장치 제조방법
KR20000049201A (ko) 산화알루미늄의 화학 증착법
ES2096619T3 (es) Recubrimientos para substratos y dispositivos electronicos.
ES456248A1 (es) Un metodo mejorado para reducir el coeficiente de friccion mostrado por las superficies de vidrio.
GB1475347A (en) Process for depositing transparent electrically conductive tin oxide coatings on a substrate
EP0174743A3 (en) Process for transition metal nitrides thin film deposition
DE3865004D1 (de) Cyclische oder bicyclische aluminium-, gallium-, oder indium-organische verbindungen und ihre verwendung zur gasphasenabscheidung des metalls auf substraten.
UY23792A1 (es) Un metodo para reforzar un sustrato de oxido fragil de compuestos de base de silano y un sustrato de oxido fragil polimerizado, recubierto por siloxano eslabonado.
JPS6466276A (en) Prevention of adhesion of organism
MX173790B (es) Metodo mejorado para revestir un substrato de acero mediante plasma a baja temperatura
DE60111077D1 (de) Abscheidungsverfahren mit verschiedenen quellen
ES2204080T3 (es) Procedimiento de deposito de una capa a base de oxido metalico sobre un sustrato de vidrio, y sustrato de vidrio asi revestido.
GB1398952A (en) Diffusion of arsenic ito silicon substrates
ES2045275T3 (es) Un metodo para formar un revestimiento de oxido de bismuto.
BRPI0711292A2 (pt) processo de deposição quìmica em fase de vapor para deposição de um revestimento de óxido de zinco sobre um substrato contìnuo de vidro aquecido durante um processo de fabricação de vidro float
Nomura et al. Sulfur‐Doped Indium Oxide Thin Films as a New Transparent and Conductive Layer Prepared by OMCVD Process Using Butylindium Thiolate.
GB969361A (en) A process for the production of thin semi-conducting layers from semi-conducting compounds
BR8707749A (pt) Compostos de organoestanho contendo fluor utilizaveis na formacao de revestimento de oxido de estanho dopado com fluor
PE61596A1 (es) Proceso para la produccion de un recubrimiento de proteccion sobre la superficie de un articulo de vidrio o ceramica
KR910015503A (ko) 유리상에 옥시탄화규소 층을형성시키는 방법, 이로부터 수득된 유리 및 반도체 층을 포함하는 글레이징에서의 이의 용도.
GB1366330A (en) Glass vapour deposition
ES2083889T3 (es) Precursor liquido para la produccion de revestimientos de oxido de estaño dopado con fluor y procedimiento de revestimiento correspondiente.
ES360497A1 (es) Un procedimiento para la difusion del boro en una superfi- cie dada de un cuerpo semiconductor de silicio.

Legal Events

Date Code Title Description
VENC Patent expired

Effective date: 20131015