US20050157157A1 - Donor sheet, color filter, organic EL element and method for producing them - Google Patents

Donor sheet, color filter, organic EL element and method for producing them Download PDF

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Publication number
US20050157157A1
US20050157157A1 US11/020,664 US2066404A US2005157157A1 US 20050157157 A1 US20050157157 A1 US 20050157157A1 US 2066404 A US2066404 A US 2066404A US 2005157157 A1 US2005157157 A1 US 2005157157A1
Authority
US
United States
Prior art keywords
substrate
donor sheet
ink
transfer layer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/020,664
Other languages
English (en)
Inventor
Yoji Tsukamoto
Masaru Iwasawa
Tatsuya Shimoda
Satoru Miyashita
Hiroshi Kiguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
3M Innovative Properties Co
Original Assignee
Seiko Epson Corp
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, 3M Innovative Properties Co filed Critical Seiko Epson Corp
Priority to US11/020,664 priority Critical patent/US20050157157A1/en
Publication of US20050157157A1 publication Critical patent/US20050157157A1/en
Priority to US11/860,400 priority patent/US7713676B2/en
Priority to US11/860,397 priority patent/US20080030568A1/en
Priority to US11/860,387 priority patent/US7704650B2/en
Abandoned legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/42Intermediate, backcoat, or covering layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/265Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used for the production of optical filters or electrical components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/38207Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • B41M5/38214Structural details, e.g. multilayer systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/421Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/392Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • B41M5/395Macromolecular additives, e.g. binders
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/17Passive-matrix OLED displays
    • H10K59/173Passive-matrix OLED displays comprising banks or shadow masks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/18Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/917Electroluminescent
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Electromagnetism (AREA)
  • Optical Filters (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
US11/020,664 1999-10-29 2004-12-22 Donor sheet, color filter, organic EL element and method for producing them Abandoned US20050157157A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US11/020,664 US20050157157A1 (en) 1999-10-29 2004-12-22 Donor sheet, color filter, organic EL element and method for producing them
US11/860,400 US7713676B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them
US11/860,397 US20080030568A1 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic el element and method for producing them
US11/860,387 US7704650B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP30884099A JP4590663B2 (ja) 1999-10-29 1999-10-29 カラーフィルタの製造方法
JP11-308840 1999-10-29
PCT/JP2000/007599 WO2001030585A1 (fr) 1999-10-29 2000-10-27 Feuille de transfert, filtre colore, dispositif el organique, et procede de production desdits elements
US11168102A 2002-04-25 2002-04-25
US11/020,664 US20050157157A1 (en) 1999-10-29 2004-12-22 Donor sheet, color filter, organic EL element and method for producing them

Related Parent Applications (3)

Application Number Title Priority Date Filing Date
PCT/JP2000/007599 Continuation WO2001030585A1 (fr) 1999-10-29 2000-10-27 Feuille de transfert, filtre colore, dispositif el organique, et procede de production desdits elements
US10111681 Continuation 2000-10-27
US11168102A Continuation 1999-10-29 2002-04-25

Related Child Applications (3)

Application Number Title Priority Date Filing Date
US11/860,400 Division US7713676B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them
US11/860,397 Division US20080030568A1 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic el element and method for producing them
US11/860,387 Division US7704650B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them

Publications (1)

Publication Number Publication Date
US20050157157A1 true US20050157157A1 (en) 2005-07-21

Family

ID=17985926

Family Applications (4)

Application Number Title Priority Date Filing Date
US11/020,664 Abandoned US20050157157A1 (en) 1999-10-29 2004-12-22 Donor sheet, color filter, organic EL element and method for producing them
US11/860,400 Expired - Fee Related US7713676B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them
US11/860,387 Expired - Fee Related US7704650B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them
US11/860,397 Abandoned US20080030568A1 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic el element and method for producing them

Family Applications After (3)

Application Number Title Priority Date Filing Date
US11/860,400 Expired - Fee Related US7713676B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them
US11/860,387 Expired - Fee Related US7704650B2 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic EL element and method for producing them
US11/860,397 Abandoned US20080030568A1 (en) 1999-10-29 2007-09-24 Donor sheet, color filter, organic el element and method for producing them

Country Status (8)

Country Link
US (4) US20050157157A1 (ja)
EP (1) EP1226974B1 (ja)
JP (1) JP4590663B2 (ja)
KR (1) KR100824098B1 (ja)
CN (1) CN1219656C (ja)
DE (1) DE60042028D1 (ja)
HK (2) HK1047416A1 (ja)
WO (1) WO2001030585A1 (ja)

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US20060210707A1 (en) * 2005-03-18 2006-09-21 Ga-Lane Chen Method for manufacturing color filters
GB2437328A (en) * 2006-04-10 2007-10-24 Cambridge Display Tech Ltd Electric devices and methods of manufacture
US20080062119A1 (en) * 2006-09-12 2008-03-13 Jae-Byung Park Electrophoretic display and method of manufacture
US20080096124A1 (en) * 2006-10-20 2008-04-24 3M Innovative Properties Company Structured thermal transfer donors
US20080233404A1 (en) * 2007-03-22 2008-09-25 3M Innovative Properties Company Microreplication tools and patterns using laser induced thermal embossing
US20080237614A1 (en) * 2007-03-29 2008-10-02 Takuro Ishikura Semiconductor light-emitting device
US20080314273A1 (en) * 2007-06-20 2008-12-25 Toppan Printing Co., Ltd Bank formed substrate and color pattern formed substrate
US20090181478A1 (en) * 2006-04-07 2009-07-16 Marshall Cox Methods of depositing nanomaterial & methods of making a device
US20090221107A1 (en) * 2008-02-29 2009-09-03 Semiconductor Energy Laboratory Co., Ltd. Deposition Method and Manufacturing Method of Light-Emitting Device
US20090218219A1 (en) * 2008-02-29 2009-09-03 Semiconductor Energy Laboratory Co., Ltd. Manufacturing Apparatus
US20090226637A1 (en) * 2008-03-07 2009-09-10 Semiconductor Energy Laboratory Co., Ltd. Deposition Method and Method for Manufacturing Light-Emitting Device
US20090233006A1 (en) * 2008-03-17 2009-09-17 Semiconductor Energy Laboratory Co., Ltd. Deposition Method and Manufacturing Method of Light-Emitting Device
US20090269509A1 (en) * 2008-04-24 2009-10-29 Semiconductor Energy Laboratory Co., Ltd. Method of Manufacturing Evaporation Donor Substrate and Method of Manufacturing Light-Emitting Device
US20090283743A1 (en) * 2006-09-12 2009-11-19 Seth Coe-Sullivan Composite including nanoparticles, methods, and products including a composite
US20090286338A1 (en) * 2006-06-24 2009-11-19 Seth Coe-Sullivan Methods for depositing nanomaterial, methods for fabricating a device, methods for fabricating an array of devices and compositions
US20090297694A1 (en) * 2008-05-29 2009-12-03 Semiconductor Energy Laboratory Co., Ltd. Deposition Method and Method for Manufacturing Light-Emitting Device
US20100157235A1 (en) * 2008-12-23 2010-06-24 Samsung Electronics Co., Ltd. Liquid crystal display
US8080811B2 (en) 2007-12-28 2011-12-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing evaporation donor substrate and light-emitting device
US8277902B2 (en) 2008-03-07 2012-10-02 Semiconductor Energy Laboratory Co., Ltd. Method for forming film and method for manufacturing light emitting device
US8618561B2 (en) 2006-06-24 2013-12-31 Qd Vision, Inc. Methods for depositing nanomaterial, methods for fabricating a device, and methods for fabricating an array of devices
US8734915B2 (en) 2008-02-29 2014-05-27 Semiconductor Energy Laboratory Co., Ltd. Film-formation method and manufacturing method of light-emitting device
US9120149B2 (en) 2006-06-24 2015-09-01 Qd Vision, Inc. Methods and articles including nanomaterial
US20160300889A1 (en) * 2015-04-13 2016-10-13 Samsung Display Co., Ltd. Display device and method of manufacturing same
US20170075168A1 (en) * 2007-06-28 2017-03-16 E Ink Corporation Process for the production of electro-optic displays, and color filters for use therein
US20170102611A1 (en) * 2011-10-31 2017-04-13 Applied Materials, Inc. Method of fabricating a color filter array using a multilevel structure
US20170162638A1 (en) * 2014-06-25 2017-06-08 Joled Inc. Method for manufacturing organic el display panel
JPWO2016121856A1 (ja) * 2015-01-30 2017-11-09 日本ゼオン株式会社 複層フィルム、その用途、及び製造方法
US20180033609A1 (en) * 2016-07-28 2018-02-01 QMAT, Inc. Removal of non-cleaved/non-transferred material from donor substrate
US20180275453A1 (en) * 2017-03-24 2018-09-27 Boe Technology Group Co., Ltd. Method for manufacturing color filter substrate, color filter substrate and display panel
US20190384096A1 (en) * 2017-12-29 2019-12-19 Huizhou China Star Optoelectronics Technology Co., Ltd. Display panel and the manufacturing method thereof, and display device
US20220276535A1 (en) * 2017-08-01 2022-09-01 Innolux Corporation Display device

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KR100630587B1 (ko) 2001-06-01 2006-10-04 세이코 엡슨 가부시키가이샤 컬러 필터의 제조 방법, 표시 장치의 제조 방법과 그 제조 장치, 및 전자 기기의 제조 방법
JP4682475B2 (ja) * 2001-08-01 2011-05-11 凸版印刷株式会社 表示装置用カラーフィルタの製造方法
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US6855636B2 (en) 2002-10-31 2005-02-15 3M Innovative Properties Company Electrode fabrication methods for organic electroluminscent devices
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JP2005013985A (ja) * 2003-05-30 2005-01-20 Seiko Epson Corp 膜パターン形成方法、デバイス及びその製造方法、電気光学装置、並びに電子機器、アクティブマトリクス基板の製造方法、アクティブマトリクス基板
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JP4400138B2 (ja) 2003-08-08 2010-01-20 セイコーエプソン株式会社 配線パターンの形成方法
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CN100433352C (zh) * 2003-09-25 2008-11-12 友达光电股份有限公司 顶部发光型有机电致发光显示器及其制造方法
KR100611156B1 (ko) 2003-11-29 2006-08-09 삼성에스디아이 주식회사 레이저 전사용 도너 기판 및 그 기판을 사용하여 제조되는유기 전계 발광 소자
US20050196530A1 (en) 2004-02-06 2005-09-08 Caspar Jonathan V. Thermal imaging process and products made therefrom
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US20080020318A1 (en) 2008-01-24
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US20080026303A1 (en) 2008-01-31
US7713676B2 (en) 2010-05-11
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US7704650B2 (en) 2010-04-27
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EP1226974A1 (en) 2002-07-31
KR20020064302A (ko) 2002-08-07

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