US20020053663A1 - High density cobalt-manganese coprecipitated nickel hydroxide and process for its production - Google Patents
High density cobalt-manganese coprecipitated nickel hydroxide and process for its production Download PDFInfo
- Publication number
- US20020053663A1 US20020053663A1 US10/003,916 US391601A US2002053663A1 US 20020053663 A1 US20020053663 A1 US 20020053663A1 US 391601 A US391601 A US 391601A US 2002053663 A1 US2002053663 A1 US 2002053663A1
- Authority
- US
- United States
- Prior art keywords
- cobalt
- manganese
- nickel hydroxide
- high density
- salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 title claims abstract description 41
- MZZUATUOLXMCEY-UHFFFAOYSA-N cobalt manganese Chemical compound [Mn].[Co] MZZUATUOLXMCEY-UHFFFAOYSA-N 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims abstract description 9
- 238000010079 rubber tapping Methods 0.000 claims abstract description 16
- 239000007864 aqueous solution Substances 0.000 claims abstract description 15
- 239000013078 crystal Substances 0.000 claims abstract description 13
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 11
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims abstract description 8
- 239000012298 atmosphere Substances 0.000 claims abstract description 8
- 239000008139 complexing agent Substances 0.000 claims abstract description 8
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 150000002815 nickel Chemical class 0.000 claims abstract description 7
- 150000001868 cobalt Chemical class 0.000 claims abstract description 6
- 150000002696 manganese Chemical class 0.000 claims abstract description 6
- 239000011572 manganese Substances 0.000 claims description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 15
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 8
- 239000000243 solution Substances 0.000 description 28
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 239000002245 particle Substances 0.000 description 17
- 238000003756 stirring Methods 0.000 description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 7
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 7
- 235000002639 sodium chloride Nutrition 0.000 description 7
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 6
- 239000010941 cobalt Substances 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 5
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 5
- 229940044175 cobalt sulfate Drugs 0.000 description 5
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 5
- 229940099596 manganese sulfate Drugs 0.000 description 5
- 239000011702 manganese sulphate Substances 0.000 description 5
- 235000007079 manganese sulphate Nutrition 0.000 description 5
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 5
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 4
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 4
- 235000011130 ammonium sulphate Nutrition 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910001416 lithium ion Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- URIIGZKXFBNRAU-UHFFFAOYSA-N lithium;oxonickel Chemical compound [Li].[Ni]=O URIIGZKXFBNRAU-UHFFFAOYSA-N 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000007774 positive electrode material Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 239000007832 Na2SO4 Substances 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- KHPLPBHMTCTCHA-UHFFFAOYSA-N ammonium chlorate Chemical compound N.OCl(=O)=O KHPLPBHMTCTCHA-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000007806 chemical reaction intermediate Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910021508 nickel(II) hydroxide Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000079 presaturation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/48—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
- H01M4/52—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron
- H01M4/525—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G51/00—Compounds of cobalt
- C01G51/80—Compounds containing cobalt, with or without oxygen or hydrogen, and containing one or more other elements
- C01G51/82—Compounds containing cobalt, with or without oxygen or hydrogen, and containing two or more other elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G53/00—Compounds of nickel
- C01G53/80—Compounds containing nickel, with or without oxygen or hydrogen, and containing one or more other elements
- C01G53/82—Compounds containing nickel, with or without oxygen or hydrogen, and containing two or more other elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
- H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/48—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
- H01M4/50—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese
- H01M4/505—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/32—Thermal properties
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the present invention relates to high density cobalt-manganese coprecipitated nickel hydroxide with excellent charge/discharge cycle properties and high temperature stability, which is suitable as a positive electrode active material for a lithium ion secondary battery, and to a process for its production.
- the present inventors have completed the present invention upon finding that it is possible to obtain high density cobalt-manganese coprecipitated nickel hydroxide by continuously supplying a complexing agent and an alkali metal hydroxide to an aqueous solution of a nickel salt containing a cobalt salt and a manganese salt while adequately stirring in an aqueous solution either in an inert gas atmosphere or in the presence of an appropriate reducing agent, and accomplishing continuous crystal growth and continuous removal.
- the present invention relates to high density cobalt-manganese coprecipitated nickel hydroxide with a tapping density of 1.5 g/cc or greater.
- the invention further relates to high density cobalt-manganese coprecipitated nickel hydroxide characterized in that, where the cobalt-manganese coprecipitated nickel hydroxide is represented as (Ni (1-x-y) Co x Mn y )(OH) 2 , 1/10 ⁇ x ⁇ 1/3 and 1/20 ⁇ y ⁇ 1/3.
- the invention still further relates to a process for production of high density cobalt-manganese coprecipitated nickel hydroxide, characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal. It particularly relates to this process wherein the reducing agent is hydrazine.
- the invention also includes Li(Ni (1-x-y) Co x Mn y )O 2 obtained by calcining a cobalt-manganese coprecipitated nickel hydroxide according to the invention with an appropriate lithium salt.
- FIG. 1 is an electron micrograph of high density cobalt-manganese coprecipitated nickel hydroxide according to the invention.
- the cobalt-manganese coprecipitated nickel hydroxide of the invention is characterized by having high density, and specifically, a density of 1.5 g/cc or greater.
- the specific surface area of the cobalt-manganese coprecipitated nickel hydroxide of the invention is in the range of 8-20 m 2 /g, and as shown in FIG. 1 it is spherical with a mean particle size in the range of 5-20 ⁇ m.
- the content of the cobalt and manganese as additional components is not particularly restricted, if represented by (Ni (1-x-y) Co x Mn y )(OH) 2 the ranges are preferably 1/10 ⁇ x ⁇ 1/3 and 1/20 ⁇ y ⁇ 1/3.
- the production process for the cobalt-manganese coprecipitated nickel hydroxide of the invention accomplishes production of nickel hydroxide with high density of coprecipitated cobalt and manganese by continuous supply of an aqueous solution of a nickel salt containing a cobalt salt (cobalt (II) ion) and a manganese salt (manganese (II) ion), of a complexing agent and of an alkali metal hydroxide, to a reactor with adequate stirring either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal of the resulting precipitate.
- a nickel salt containing a cobalt salt (cobalt (II) ion) and a manganese salt (manganese (II) ion) manganese salt
- the salt concentration, complexing agent concentration, pH and temperature in the reactor are kept within a fixed range to satisfactorily control the powder properties, such as the crystallinity, tapping density, specific surface area, particle size, etc.
- the salt concentration in the vessel is preferably kept in the range of 50-200 mS/cm ⁇ 5 mS/cm and the ammonium ion concentration is preferably kept in the range of 1-10 g/L ⁇ 0.5 g/L.
- the reaction pH is preferably kept in the range of 11.0-13.0 ⁇ 0.05, and the reaction temperature is preferably kept in the range of 25-80° C. ⁇ 0.5° C.
- salt concentration adjustors there may be mentioned sodium chloride, potassium chloride, sodium sulfate, potassium sulfate, ammonium chlorate, ammonium sulfate and the like.
- calcium salts there may be used nitrate, acetate or oxalate salts.
- the production process of the invention is based on the high density nickel hydroxide production process described in JP-A 10-97856 but is characterized by further adding an appropriate reducing agent. That is, while adequate stirring is usually necessary, this results in inclusion of air, etc. which causes partial oxidation of the unstable cobalt (II) ion or manganese (II) ion and prevents a product with sufficient density from being obtained.
- the production process is carried out either in an inert gas atmosphere or in the presence of a reducing agent.
- the added reducing agent is not particularly restricted, but hydrazine is preferred.
- the ammonium ion source for the reaction as a complexing agent according to the invention is used as a reaction intermediate, as represented by reaction formulas (1) and (2).
- the nickel salt, ammonium ion source and alkali metal hydroxide are nickel sulfate, ammonia and sodium hydroxide, respectively.
- Cobalt and manganese are omitted in order to simplify the formulas, but they likewise progress through ammonium complex salts.
- 4 equivalents of ammonia are not necessary, as about 0.5 equivalent at most is sufficient.
- Tapping density (B ⁇ A)/D g/ml
- the tapping density was 1.71 g/cc.
- the tapping density was 1.82 g/cc.
- the tapping density was 1.40 g/cc.
- the tapping density was 1.33 g/cc.
- the present invention it is possible to obtain high density cobalt-manganese coprecipitated nickel hydroxide having high density, and particularly a tapping density of 1.5 g/cc or greater, by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.
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- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/985,778 US7585432B2 (en) | 2000-11-06 | 2004-11-10 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
| US11/243,820 US7585435B2 (en) | 2000-11-06 | 2005-10-05 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-337873 | 2000-11-06 | ||
| JP2000337873 | 2000-11-06 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/985,778 Division US7585432B2 (en) | 2000-11-06 | 2004-11-10 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
| US11/243,820 Continuation-In-Part US7585435B2 (en) | 2000-11-06 | 2005-10-05 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20020053663A1 true US20020053663A1 (en) | 2002-05-09 |
Family
ID=18813185
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/003,916 Abandoned US20020053663A1 (en) | 2000-11-06 | 2001-11-02 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
| US10/985,778 Expired - Lifetime US7585432B2 (en) | 2000-11-06 | 2004-11-10 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/985,778 Expired - Lifetime US7585432B2 (en) | 2000-11-06 | 2004-11-10 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US20020053663A1 (enExample) |
| JP (1) | JP4848384B2 (enExample) |
Cited By (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030054251A1 (en) * | 2001-09-13 | 2003-03-20 | Matsushita Electric Industrial Co., Ltd. | Positive electrode active material, production method thereof and non-aqueous electrolyte secondary battery |
| US20040121234A1 (en) * | 2002-12-23 | 2004-06-24 | 3M Innovative Properties Company | Cathode composition for rechargeable lithium battery |
| US20060147798A1 (en) * | 2001-04-27 | 2006-07-06 | 3M Innovative Properties Company | Cathode compositions for lithium-ion batteries |
| US20060159994A1 (en) * | 2001-08-07 | 2006-07-20 | Dahn Jeffrey R | Cathode compositions for lithium ion batteries |
| WO2007019986A1 (de) * | 2005-08-12 | 2007-02-22 | Toda Kogyo Europe Gmbh | Anorganische verbindungen |
| US7211237B2 (en) | 2003-11-26 | 2007-05-01 | 3M Innovative Properties Company | Solid state synthesis of lithium ion battery cathode material |
| WO2008043559A1 (en) * | 2006-10-13 | 2008-04-17 | Toda Kogyo Europe Gmbh | Pulverulent compounds, processes for the preparation thereof and the use thereof in electrochemical applications |
| US20080121841A1 (en) * | 2000-11-16 | 2008-05-29 | Hitachi Maxell, Ltd. | Lithium-containing complex oxide, non-aqueous secondary battery using the lithium-containing complex oxide, and method for producing the lithium-containing complex oxide |
| DE102007039471A1 (de) | 2007-08-21 | 2009-02-26 | H.C. Starck Gmbh | Pulverförmige Verbindungen, Verfahren zu deren Herstellung sowie deren Verwendung in Lithium-Sekundärbatterien |
| DE102007049108A1 (de) | 2007-10-12 | 2009-04-16 | H.C. Starck Gmbh | Pulverförmige Verbindungen, Verfahren zu deren Herstellung sowie deren Verwendung in Batterien |
| KR101217453B1 (ko) * | 2009-12-24 | 2013-01-02 | 제이에이치화학공업(주) | 리튬이차전지 양극활물질용 전구체인 니켈계 복합금속수산화물 및 그 제조방법 |
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Also Published As
| Publication number | Publication date |
|---|---|
| US20050089756A1 (en) | 2005-04-28 |
| JP2008195608A (ja) | 2008-08-28 |
| US7585432B2 (en) | 2009-09-08 |
| JP4848384B2 (ja) | 2011-12-28 |
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