TWI775729B - 具有琥珀色至紅色發光(>600nm)之III族氮化物半導體發光裝置及其製造方法 - Google Patents
具有琥珀色至紅色發光(>600nm)之III族氮化物半導體發光裝置及其製造方法 Download PDFInfo
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- TWI775729B TWI775729B TW105132658A TW105132658A TWI775729B TW I775729 B TWI775729 B TW I775729B TW 105132658 A TW105132658 A TW 105132658A TW 105132658 A TW105132658 A TW 105132658A TW I775729 B TWI775729 B TW I775729B
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- quantum well
- layer
- indium concentration
- strain compensation
- nitride semiconductor
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 63
- 238000000034 method Methods 0.000 title claims description 25
- 229910052738 indium Inorganic materials 0.000 claims abstract description 89
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 89
- 238000005253 cladding Methods 0.000 claims abstract description 20
- 230000004888 barrier function Effects 0.000 claims description 62
- 150000004767 nitrides Chemical class 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 16
- 230000003595 spectral effect Effects 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000004952 Polyamide Substances 0.000 claims 1
- 229920002647 polyamide Polymers 0.000 claims 1
- 238000005191 phase separation Methods 0.000 abstract description 8
- 229910002704 AlGaN Inorganic materials 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000001194 electroluminescence spectrum Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005424 photoluminescence Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000005701 quantum confined stark effect Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0137—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/815—Bodies having stress relaxation structures, e.g. buffer layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/816—Bodies having carrier transport control structures, e.g. highly-doped semiconductor layers or current-blocking structures
- H10H20/8162—Current-blocking structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
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Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562239122P | 2015-10-08 | 2015-10-08 | |
| US62/239,122 | 2015-10-08 | ||
| US15/287,384 US10396240B2 (en) | 2015-10-08 | 2016-10-06 | III-nitride semiconductor light emitting device having amber-to-red light emission (>600 nm) and a method for making same |
| US15/287,384 | 2016-10-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201735390A TW201735390A (zh) | 2017-10-01 |
| TWI775729B true TWI775729B (zh) | 2022-09-01 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105132658A TWI775729B (zh) | 2015-10-08 | 2016-10-07 | 具有琥珀色至紅色發光(>600nm)之III族氮化物半導體發光裝置及其製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10396240B2 (enExample) |
| EP (1) | EP3360168B1 (enExample) |
| JP (2) | JP2018531514A (enExample) |
| KR (1) | KR20180067590A (enExample) |
| CN (1) | CN108292693B (enExample) |
| TW (1) | TWI775729B (enExample) |
| WO (1) | WO2017062889A1 (enExample) |
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| KR102390624B1 (ko) | 2015-06-05 | 2022-04-26 | 오스텐도 테크놀로지스 인코포레이티드 | 다수의 활성층들로 선택적으로 캐리어를 주입한 발광 구조체 |
| US10971652B2 (en) | 2017-01-26 | 2021-04-06 | Epistar Corporation | Semiconductor device comprising electron blocking layers |
| US11056434B2 (en) * | 2017-01-26 | 2021-07-06 | Epistar Corporation | Semiconductor device having specified p-type dopant concentration profile |
| WO2019130753A1 (ja) * | 2017-12-27 | 2019-07-04 | オリンパス株式会社 | 光源装置 |
| FR3089686B1 (fr) | 2018-12-11 | 2020-11-13 | Aledia | Dispositif optoélectronique comportant des pixels émettant trois couleurs |
| US11923398B2 (en) | 2019-12-23 | 2024-03-05 | Lumileds Llc | III-nitride multi-wavelength LED arrays |
| US11404473B2 (en) | 2019-12-23 | 2022-08-02 | Lumileds Llc | III-nitride multi-wavelength LED arrays |
| WO2021226121A1 (en) * | 2020-05-04 | 2021-11-11 | Raxium, Inc. | Light emitting diodes with aluminum-containing layers integrated therein and associated methods |
| TW202201807A (zh) | 2020-05-19 | 2022-01-01 | 美商瑞克斯姆股份有限公司 | 用於發光元件之應變管理層之組合 |
| US11264535B1 (en) * | 2020-08-12 | 2022-03-01 | Jyh-Chia Chen | Pixel device and display using a monolithic blue/green LED combined with red luminescence materials |
| US11631786B2 (en) | 2020-11-12 | 2023-04-18 | Lumileds Llc | III-nitride multi-wavelength LED arrays with etch stop layer |
| JP2023178173A (ja) * | 2022-06-02 | 2023-12-14 | 豊田合成株式会社 | Iii族窒化物半導体の製造方法 |
| CN114975702B (zh) * | 2022-06-30 | 2025-07-08 | 厦门未来显示技术研究院有限公司 | 一种红光Micro LED外延结构及其制作方法 |
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2016
- 2016-10-06 US US15/287,384 patent/US10396240B2/en not_active Expired - Fee Related
- 2016-10-07 WO PCT/US2016/056157 patent/WO2017062889A1/en not_active Ceased
- 2016-10-07 CN CN201680072137.5A patent/CN108292693B/zh not_active Expired - Fee Related
- 2016-10-07 JP JP2018517812A patent/JP2018531514A/ja active Pending
- 2016-10-07 KR KR1020187013012A patent/KR20180067590A/ko not_active Ceased
- 2016-10-07 TW TW105132658A patent/TWI775729B/zh not_active IP Right Cessation
- 2016-10-07 EP EP16784685.6A patent/EP3360168B1/en not_active Not-in-force
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2022
- 2022-03-09 JP JP2022036024A patent/JP2022071179A/ja active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201735390A (zh) | 2017-10-01 |
| JP2018531514A (ja) | 2018-10-25 |
| KR20180067590A (ko) | 2018-06-20 |
| EP3360168B1 (en) | 2021-09-29 |
| JP2022071179A (ja) | 2022-05-13 |
| WO2017062889A1 (en) | 2017-04-13 |
| EP3360168A1 (en) | 2018-08-15 |
| CN108292693B (zh) | 2021-10-22 |
| US10396240B2 (en) | 2019-08-27 |
| US20170104128A1 (en) | 2017-04-13 |
| CN108292693A (zh) | 2018-07-17 |
| HK1258318A1 (zh) | 2019-11-08 |
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