TWI775729B - 具有琥珀色至紅色發光(>600nm)之III族氮化物半導體發光裝置及其製造方法 - Google Patents

具有琥珀色至紅色發光(>600nm)之III族氮化物半導體發光裝置及其製造方法 Download PDF

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TWI775729B
TWI775729B TW105132658A TW105132658A TWI775729B TW I775729 B TWI775729 B TW I775729B TW 105132658 A TW105132658 A TW 105132658A TW 105132658 A TW105132658 A TW 105132658A TW I775729 B TWI775729 B TW I775729B
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quantum well
layer
indium concentration
strain compensation
nitride semiconductor
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TW105132658A
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TW201735390A (zh
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亞權 米爾頓 葉
哈森 S 艾爾-葛洛力
李星
季嘉 陳
奇理 莊
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美商傲思丹度科技公司
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0137Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/811Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/815Bodies having stress relaxation structures, e.g. buffer layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/816Bodies having carrier transport control structures, e.g. highly-doped semiconductor layers or current-blocking structures
    • H10H20/8162Current-blocking structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP

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TW105132658A 2015-10-08 2016-10-07 具有琥珀色至紅色發光(>600nm)之III族氮化物半導體發光裝置及其製造方法 TWI775729B (zh)

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US201562239122P 2015-10-08 2015-10-08
US62/239,122 2015-10-08
US15/287,384 US10396240B2 (en) 2015-10-08 2016-10-06 III-nitride semiconductor light emitting device having amber-to-red light emission (>600 nm) and a method for making same
US15/287,384 2016-10-06

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TW201735390A TW201735390A (zh) 2017-10-01
TWI775729B true TWI775729B (zh) 2022-09-01

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US (1) US10396240B2 (enExample)
EP (1) EP3360168B1 (enExample)
JP (2) JP2018531514A (enExample)
KR (1) KR20180067590A (enExample)
CN (1) CN108292693B (enExample)
TW (1) TWI775729B (enExample)
WO (1) WO2017062889A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102390624B1 (ko) 2015-06-05 2022-04-26 오스텐도 테크놀로지스 인코포레이티드 다수의 활성층들로 선택적으로 캐리어를 주입한 발광 구조체
US10971652B2 (en) 2017-01-26 2021-04-06 Epistar Corporation Semiconductor device comprising electron blocking layers
US11056434B2 (en) * 2017-01-26 2021-07-06 Epistar Corporation Semiconductor device having specified p-type dopant concentration profile
WO2019130753A1 (ja) * 2017-12-27 2019-07-04 オリンパス株式会社 光源装置
FR3089686B1 (fr) 2018-12-11 2020-11-13 Aledia Dispositif optoélectronique comportant des pixels émettant trois couleurs
US11923398B2 (en) 2019-12-23 2024-03-05 Lumileds Llc III-nitride multi-wavelength LED arrays
US11404473B2 (en) 2019-12-23 2022-08-02 Lumileds Llc III-nitride multi-wavelength LED arrays
WO2021226121A1 (en) * 2020-05-04 2021-11-11 Raxium, Inc. Light emitting diodes with aluminum-containing layers integrated therein and associated methods
TW202201807A (zh) 2020-05-19 2022-01-01 美商瑞克斯姆股份有限公司 用於發光元件之應變管理層之組合
US11264535B1 (en) * 2020-08-12 2022-03-01 Jyh-Chia Chen Pixel device and display using a monolithic blue/green LED combined with red luminescence materials
US11631786B2 (en) 2020-11-12 2023-04-18 Lumileds Llc III-nitride multi-wavelength LED arrays with etch stop layer
JP2023178173A (ja) * 2022-06-02 2023-12-14 豊田合成株式会社 Iii族窒化物半導体の製造方法
CN114975702B (zh) * 2022-06-30 2025-07-08 厦门未来显示技术研究院有限公司 一种红光Micro LED外延结构及其制作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040161006A1 (en) * 2003-02-18 2004-08-19 Ying-Lan Chang Method and apparatus for improving wavelength stability for InGaAsN devices
US20120008660A1 (en) * 2009-02-17 2012-01-12 Sumitomo Electric Industries, Ltd. Iii-nitride semiconductor laser, and method for fabricating iii-nitride semiconductor laser
US20130075696A1 (en) * 2011-07-12 2013-03-28 Epistar Corporation Light-emitting element with multiple light-emtting stacked layers
US20130250986A1 (en) * 2012-03-22 2013-09-26 Palo Alto Research Center Incorporated Optically pumped surface emitting lasers incorporating high reflectivity/ bandwidth limited reflector

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4839899A (en) 1988-03-09 1989-06-13 Xerox Corporation Wavelength tuning of multiple quantum well (MQW) heterostructure lasers
JPH04350988A (ja) * 1991-05-29 1992-12-04 Nec Kansai Ltd 量子井戸構造発光素子
US5422898A (en) 1993-10-29 1995-06-06 International Business Machines Corporation Tapered Fabry-Perot multi-wavelength optical source
US5386428A (en) 1993-11-02 1995-01-31 Xerox Corporation Stacked active region laser array for multicolor emissions
US5737353A (en) 1993-11-26 1998-04-07 Nec Corporation Multiquantum-well semiconductor laser
JP2682474B2 (ja) * 1993-11-26 1997-11-26 日本電気株式会社 半導体レーザ装置
JPH08316588A (ja) 1995-05-23 1996-11-29 Furukawa Electric Co Ltd:The 歪量子井戸構造を有する半導体光素子
US5684309A (en) 1996-07-11 1997-11-04 North Carolina State University Stacked quantum well aluminum indium gallium nitride light emitting diodes
JPH1187773A (ja) * 1997-09-08 1999-03-30 Toshiba Corp 発光素子
TW412889B (en) 1997-09-24 2000-11-21 Nippon Oxygen Co Ltd Semiconductor laser
CN1347581A (zh) 1999-03-26 2002-05-01 松下电器产业株式会社 带有应变补偿层的半导体结构及其制备方法
US7202506B1 (en) 1999-11-19 2007-04-10 Cree, Inc. Multi element, multi color solid state LED/laser
NL1015860C2 (nl) * 2000-08-02 2002-02-05 Wavin Bv Werkwijzen en inrichtingen voor het vervaardigen van een buis van biaxiaal georiÙnteerd thermo-plastisch kunststofmateriaal met een integrale mof.
US6469358B1 (en) 2000-09-21 2002-10-22 Lockheed Martin Corporation Three color quantum well focal plane arrays
JP2002176198A (ja) * 2000-12-11 2002-06-21 Mitsubishi Cable Ind Ltd 多波長発光素子
MY129352A (en) 2001-03-28 2007-03-30 Nichia Corp Nitride semiconductor device
JP2004146498A (ja) 2002-10-23 2004-05-20 Stanley Electric Co Ltd 半導体発光装置
CA2427559A1 (en) 2002-05-15 2003-11-15 Sumitomo Electric Industries, Ltd. White color light emitting device
US7058105B2 (en) 2002-10-17 2006-06-06 Samsung Electro-Mechanics Co., Ltd. Semiconductor optoelectronic device
US6927412B2 (en) 2002-11-21 2005-08-09 Ricoh Company, Ltd. Semiconductor light emitter
JP4571372B2 (ja) * 2002-11-27 2010-10-27 ローム株式会社 半導体発光素子
US6919584B2 (en) 2003-06-19 2005-07-19 Harvatek Corporation White light source
KR100482511B1 (ko) 2004-02-05 2005-04-14 에피밸리 주식회사 Ⅲ-질화물계 반도체 발광소자
US7323721B2 (en) 2004-09-09 2008-01-29 Blue Photonics Inc. Monolithic multi-color, multi-quantum well semiconductor LED
US8148713B2 (en) 2008-04-04 2012-04-03 The Regents Of The University Of California Method for fabrication of semipolar (Al, In, Ga, B)N based light emitting diodes
KR100649749B1 (ko) * 2005-10-25 2006-11-27 삼성전기주식회사 질화물 반도체 발광 소자
KR100665364B1 (ko) * 2005-12-28 2007-01-09 삼성전기주식회사 질화물 반도체 발광 소자
KR20070080696A (ko) 2006-02-08 2007-08-13 삼성전자주식회사 질화물계 반도체 레이저 다이오드
KR100774200B1 (ko) 2006-04-13 2007-11-08 엘지전자 주식회사 유기 el 소자 및 그 제조방법
US7593436B2 (en) 2006-06-16 2009-09-22 Vi Systems Gmbh Electrooptically Bragg-reflector stopband-tunable optoelectronic device for high-speed data transfer
KR20080035865A (ko) * 2006-10-20 2008-04-24 삼성전자주식회사 반도체 발광 소자
TWI338382B (en) 2006-11-29 2011-03-01 Univ Nat Taiwan Method and structure for manufacturing long-wavelength light-emitting diode using prestrain effect
KR100862497B1 (ko) 2006-12-26 2008-10-08 삼성전기주식회사 질화물 반도체 소자
JP2008235606A (ja) 2007-03-20 2008-10-02 Sony Corp 半導体発光素子、半導体発光素子の製造方法、バックライト、表示装置、電子機器および発光装置
US7649195B2 (en) * 2007-06-12 2010-01-19 Seoul Opto Device Co., Ltd. Light emitting diode having active region of multi quantum well structure
US7623560B2 (en) 2007-09-27 2009-11-24 Ostendo Technologies, Inc. Quantum photonic imagers and methods of fabrication thereof
GB2456756A (en) 2008-01-16 2009-07-29 Sharp Kk AlInGaN Light-Emitting devices
JP4720834B2 (ja) 2008-02-25 2011-07-13 住友電気工業株式会社 Iii族窒化物半導体レーザ
JP2009224370A (ja) * 2008-03-13 2009-10-01 Rohm Co Ltd 窒化物半導体デバイス
TW200950162A (en) * 2008-04-04 2009-12-01 Univ California Method for fabrication of semipolar (Al, In, Ga, B)N based light emitting diodes
KR20100134089A (ko) * 2008-04-04 2010-12-22 더 리전츠 오브 더 유니버시티 오브 캘리포니아 평면의 반극성 (Al, In, Ga, B)N계 발광 다이오드들에 대한 MOCVD 성장 기술
US20100006873A1 (en) 2008-06-25 2010-01-14 Soraa, Inc. HIGHLY POLARIZED WHITE LIGHT SOURCE BY COMBINING BLUE LED ON SEMIPOLAR OR NONPOLAR GaN WITH YELLOW LED ON SEMIPOLAR OR NONPOLAR GaN
WO2010020065A1 (en) 2008-08-19 2010-02-25 Lattice Power (Jiangxi) Corporation Method for fabricating ingan-based multi-quantum well layers
JP5394717B2 (ja) * 2008-12-15 2014-01-22 日本オクラロ株式会社 窒化物半導体光素子の製造方法
US9153790B2 (en) 2009-05-22 2015-10-06 Idemitsu Kosan Co., Ltd. Organic electroluminescent device
US8296624B2 (en) * 2009-06-30 2012-10-23 Comcast Cable Communications, Llc Variable interleave data transmission
JP2013502731A (ja) * 2009-08-21 2013-01-24 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア ミスフィット転位を有する部分的または完全に弛緩したAlInGaN層による半極性窒化物量子井戸の異方性ひずみ制御
US8314429B1 (en) 2009-09-14 2012-11-20 Soraa, Inc. Multi color active regions for white light emitting diode
US9484197B2 (en) 2009-10-23 2016-11-01 The Royal Institution For The Advancement Of Learning/Mcgill University Lateral growth semiconductor method and devices
KR100993085B1 (ko) * 2009-12-07 2010-11-08 엘지이노텍 주식회사 발광 소자, 발광 소자 패키지 및 라이트 유닛
JP5060656B2 (ja) 2009-12-21 2012-10-31 株式会社東芝 窒化物半導体発光素子およびその製造方法
TWI508621B (zh) 2010-02-03 2015-11-11 Innolux Corp 影像顯示系統
US20110188528A1 (en) 2010-02-04 2011-08-04 Ostendo Technologies, Inc. High Injection Efficiency Polar and Non-Polar III-Nitrides Light Emitters
JP4940317B2 (ja) * 2010-02-25 2012-05-30 株式会社東芝 半導体発光素子及びその製造方法
US8451877B1 (en) 2010-03-23 2013-05-28 Sandia Corporation High efficiency III-nitride light-emitting diodes
US20110237011A1 (en) 2010-03-29 2011-09-29 Nanjing University Method for Forming a GaN-Based Quantum-Well LED with Red Light
JP5533744B2 (ja) * 2010-03-31 2014-06-25 豊田合成株式会社 Iii族窒化物半導体発光素子
US20120000866A1 (en) * 2010-06-30 2012-01-05 Randal Huszczo Glass Storage and Transport Rack with Pivoting Arms
JP5372045B2 (ja) 2011-02-25 2013-12-18 株式会社東芝 半導体発光素子
JP5737111B2 (ja) * 2011-03-30 2015-06-17 豊田合成株式会社 Iii族窒化物半導体発光素子
EP2718988A2 (en) 2011-06-10 2014-04-16 The Regents of the University of California Low droop light emitting diode structure on gallium nitride semipolar substrates
GB201112792D0 (en) * 2011-07-26 2011-09-07 Smith Michael A ratchet buckle use for the tightening of straps
US9070613B2 (en) 2011-09-07 2015-06-30 Lg Innotek Co., Ltd. Light emitting device
TWI562396B (en) 2011-09-29 2016-12-11 Epistar Corp Light-emitting device
KR20130078345A (ko) 2011-12-30 2013-07-10 일진엘이디(주) 스트레인 완충층을 이용하여 발광효율이 우수한 질화물계 발광소자
JP6136284B2 (ja) * 2012-03-13 2017-05-31 株式会社リコー 半導体積層体及び面発光レーザ素子
KR101936305B1 (ko) 2012-09-24 2019-01-08 엘지이노텍 주식회사 발광소자
JP2014067893A (ja) * 2012-09-26 2014-04-17 Toyoda Gosei Co Ltd Iii族窒化物半導体発光素子
US9978904B2 (en) * 2012-10-16 2018-05-22 Soraa, Inc. Indium gallium nitride light emitting devices
US8890114B2 (en) 2012-10-16 2014-11-18 Epistar Corporation Light-emitting device
US9847444B2 (en) 2012-11-06 2017-12-19 Canon Kabushiki Kaisha Photonic device and optical coherence tomography apparatus including the photonic device as light source
DE102013108782B4 (de) * 2012-11-21 2024-05-08 Epistar Corp. Lichtemittierende Vorrichtung mit mehreren lichtemittierenden Stapelschichten
US8941111B2 (en) 2012-12-21 2015-01-27 Invensas Corporation Non-crystalline inorganic light emitting diode
WO2014138904A1 (en) 2013-03-14 2014-09-18 The Royal Institution For The Advancement Of Learning/Mcgill University Methods and devices for solid state nanowire devices
US10839734B2 (en) 2013-12-23 2020-11-17 Universal Display Corporation OLED color tuning by driving mode variation
KR102390624B1 (ko) 2015-06-05 2022-04-26 오스텐도 테크놀로지스 인코포레이티드 다수의 활성층들로 선택적으로 캐리어를 주입한 발광 구조체

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040161006A1 (en) * 2003-02-18 2004-08-19 Ying-Lan Chang Method and apparatus for improving wavelength stability for InGaAsN devices
US20120008660A1 (en) * 2009-02-17 2012-01-12 Sumitomo Electric Industries, Ltd. Iii-nitride semiconductor laser, and method for fabricating iii-nitride semiconductor laser
US20130075696A1 (en) * 2011-07-12 2013-03-28 Epistar Corporation Light-emitting element with multiple light-emtting stacked layers
US20130250986A1 (en) * 2012-03-22 2013-09-26 Palo Alto Research Center Incorporated Optically pumped surface emitting lasers incorporating high reflectivity/ bandwidth limited reflector

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Publication number Publication date
TW201735390A (zh) 2017-10-01
JP2018531514A (ja) 2018-10-25
KR20180067590A (ko) 2018-06-20
EP3360168B1 (en) 2021-09-29
JP2022071179A (ja) 2022-05-13
WO2017062889A1 (en) 2017-04-13
EP3360168A1 (en) 2018-08-15
CN108292693B (zh) 2021-10-22
US10396240B2 (en) 2019-08-27
US20170104128A1 (en) 2017-04-13
CN108292693A (zh) 2018-07-17
HK1258318A1 (zh) 2019-11-08

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