TWI772527B - 撥水撥油構件及撥水撥油構件的製造方法 - Google Patents
撥水撥油構件及撥水撥油構件的製造方法 Download PDFInfo
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- TWI772527B TWI772527B TW107134240A TW107134240A TWI772527B TW I772527 B TWI772527 B TW I772527B TW 107134240 A TW107134240 A TW 107134240A TW 107134240 A TW107134240 A TW 107134240A TW I772527 B TWI772527 B TW I772527B
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- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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Abstract
對各種基材以下述方法設置以具有多個矽醇基之有機矽化合物為主成分的特定厚度之底塗層後，於該底塗層上設置以含氟化合物之硬化物為主成分的特定厚度之撥水撥油層而成的撥水撥油構件，係可穩定且簡便地對各種基材賦予耐磨耗性優良的撥水撥油被膜，而且底塗層及撥水撥油層，在室溫(25℃)製程下亦可塗敷而成；該撥水撥油構件係藉由具有以下步驟的方法等而得：對基材表面濕式塗佈包含具有多個矽醇基之有機矽化合物與溶劑的溶液之步驟；使該溶劑乾燥而形成底塗層之步驟；於該底塗層上濕式塗佈包含含氟化合物與溶劑的溶液後，使該溶劑乾燥，或者乾式塗佈由該溶液使溶劑蒸發而得的含氟化合物之步驟；及使含氟化合物硬化而形成撥水撥油層之步驟。
Description
本發明係有關於一種撥水撥油構件及撥水撥油構件的製造方法，詳而言之，係有關於一種在基材與撥水撥油層之間使用具有多個矽醇基之有機矽化合物形成底塗層的撥水撥油構件及該撥水撥油構件的製造方法。
近年來，為改良外觀或辨視性，對不易使髒污附著之技術或容易卸除髒污之技術的要求逐年提高，尤其是眼鏡鏡片、智慧型手機、穿戴式終端、汽車導航、電子設備之殼體、廚台或運輸設備之機體的表面由於容易附著皮脂或油污，而期望設置撥水撥油層。然而，作為撥水撥油劑使用之具有氟基的化合物，由於其表面自由能極小而具有對各種基材的非黏著性、非密接性，因此不易使撥水撥油劑直接密接於基材。
為解決此種問題，作為可對玻璃等的基材表面實施撥水撥油處理之處理劑，例如日本特開
2011-116947號公報(專利文獻1)中揭示一種下述平均組成式所示之含有氟氧伸烷基之聚合物組成物：
(式中Rf1
為包含5～100個-Cd
F2d
O-(d為1～6之整數，可隨重複單元而異)之重複單元的二價直鏈型氟氧伸烷基，A及B彼此獨立地為選自Rf2
基或下述式
所示之基的基，Rf2
為F、H、末端為-CF3
基或-CF2
H基之一價含氟基，Q為二價有機基，Z為具有矽氧烷鍵之二～七價有機聚矽氧烷殘基，R為碳數1～4之烷基或苯基，X為水解性基，a為2或3，b為1～6，c為1～5之整數，β為0或1之整數)。
然而，專利文獻1所提出之處理劑，在以玻璃等為代表之存在大量矽醇基的基板上雖顯示較優良的耐久性，但對於金屬、金屬氧化物或樹脂等則不易獲得優良的密接性。
作為提升密接性之方法，有人揭示一種以乾式法(蒸鍍法或濺鍍法)設置SiO2
層作為底塗層的方法(國際公開第2014/097388號：專利文獻2)。其中指出若採用此方法，則可形成耐久性優良的撥水撥油層，但由於必需在真空中進行處理，而且要塗敷於大型基板時則需要大型裝置，因此就生產性、生產成本方面，應用範圍有限。
另一方面，有人揭示一種能以濕式法設置底塗層的聚矽氮烷溶液(國際公開第2010/038648號：專利文獻3)。其係利用塗佈聚矽氮烷溶液後，與水分反應而轉化為二氧化矽玻璃。此方法在未採用真空製程方面較乾式法更為優異，但要使撥水撥油層的密接性更穩定，則需要長時間的高溫加熱或加濕，因此在生產性、成本方面存有問題，由耐熱性觀點而言有可應用之基材受限的問題。
此外，作為與本發明相關之習知技術，可與上述文獻共同舉出下述文獻。
[先前技術文獻]
[專利文獻]
[專利文獻1] 日本特開2011-116947號公報
[專利文獻2] 國際公開第2014/097388號
[專利文獻3] 國際公開第2010/038648號
[專利文獻4] 日本特開2007-197425號公報
[專利文獻5] 日本特開2007-297589號公報
[專利文獻6] 日本特開2007-297543號公報
[專利文獻7] 日本特開2008-088412號公報
[專利文獻8] 日本特開2008-144144號公報
[專利文獻9] 日本特開2010-031184號公報
[專利文獻10] 日本特開2010-047516號公報
[專利文獻11] 日本特開2011-178835號公報
[專利文獻12] 日本特開2014-084405號公報
[專利文獻13] 日本特開2014-105235號公報
[專利文獻14] 日本特開2013-253228號公報
[專利文獻15] 日本特開2014-218639號公報
[專利文獻16] 國際公開第2013/121984號
[發明所欲解決之課題]
本發明係有鑑於上述實情而完成者，茲以提供一種耐磨耗性優良的撥水撥油構件，及於各種基材以濕式法或乾式法形成耐磨耗性優良的撥水撥油層之撥水撥油構件的製造方法為目的。
[解決課題之手段]
本案發明人等為達成上述目的而致力重複多次研究的結果發現，對各種基材以下述方法設置以具有多個矽醇基之有機矽化合物為主成分的特定厚度之底塗層後，於該底塗層上設置以含氟化合物之硬化物為主成分的特定厚度之撥水撥油層而成的撥水撥油構件，係可穩定且簡便地對各種基材賦予耐磨耗性優良的撥水撥油被膜，而且底塗層及撥水撥油層，在室溫(25℃)製程下亦可塗敷而成，終至完成本發明；該撥水撥油構件係藉由具有以下步驟的方法等而得：對基材表面濕式塗佈包含具有多個矽醇基之有機矽化合物與溶劑的溶液之步驟；使該溶劑乾燥而形成底塗層之步驟；於該底塗層上濕式塗佈包含含氟化合物與溶劑的溶液後，使該溶劑乾燥，或者乾式塗佈由該溶液使溶劑蒸發而得的含氟化合物之步驟；及使含氟化合物硬化而形成撥水撥油層之步驟。
亦即，本發明係提供下述之撥水撥油構件及撥水撥油構件的製造方法。
[1] 一種撥水撥油構件，其為依序在基材的至少單面層合作為第1層之底塗層，並進一步於其上層合作為第2層之撥水撥油層的撥水撥油構件，其中，底塗層係由以具有多個矽醇基之有機矽化合物為主成分之膜厚0.5～500nm的層所構成，且撥水撥油層係由以含氟化合物之硬化物為主成分之膜厚0.5～30nm的層所構成。
[2] 如[1]之撥水撥油構件，其中具有多個矽醇基之有機矽化合物為四乙氧基矽烷之水解･脫水縮合化合物。
[3] 如[1]或[2]之撥水撥油構件，其中含氟化合物係於至少1個末端具有至少1個水解性基，該水解性基為選自碳數1～12之烷氧基、碳數1～12之烷氧烷氧基、碳數1～10之醯氧基、碳數2～10之烯氧基、鹵基、胺基及矽氮烷基的基。
[4] 如[1]～[3]中任一項之撥水撥油構件，其中含氟化合物係於分子中具有-(CF2
)d
-O-(CF2
O)p
(CF2
CF2
O)q
(CF2
CF2
CF2
O)r
(CF2
CF2
CF2
CF2
O)s
(CF(CF3
)CF2
O)t
-(CF2
)d
-(
式中，p、q、r、s、t各自獨立地為0～200之整數，且p+q
+r+s+t=3～500，括弧內所示之各單元可隨機地鍵結，d為0～8之整數，該單元可為直鏈狀或分支狀)，且於至少1個末端具有至少1個水解性基的含氟氧伸烷基之有機矽化合物。
[5] 如[1]～[4]中任一項之撥水撥油構件，其中含氟化合物為選自下述通式(1)、(2)、(3)、(4)及(5)所示之含氟水解性有機矽化合物的至少1種；
[式中，Rf為-(CF2
)d
-O-(CF2
O)p
(CF2
CF2
O)q
(CF2
CF2
CF2
O)r
(CF2
CF2
CF2
CF2
O)s
(CF(CF3
)CF2
O)t
-(CF2
)d
-，p、q、r、s、t各自獨立地為0～200之整數，且p+q+r+s+t=3～500，括弧內所示之各單元可隨機地鍵結，d為0～8之整數，該單元可為直鏈狀或分支狀；A為氟原子、氫原子，或末端為
-CF3
基、-CF2
H基或者-CH2
F基之一價含氟基，Z、Z’獨立地為單鍵或可包含氮原子、氧原子、矽原子、磷原子或者硫原子，且可經氟取代之二～八價有機基，W為末端具有水解性基之一價有機基；α、β各自獨立地為1～7之整數，且α+β=2～8；γ為2～8之整數]
(式中，Rf、A係與前述相同，Q為單鍵或二價有機基，δ為1～10之整數，Y為具有水解性基之二價有機基，B為氫原子、碳數1～4之烷基或鹵素原子)。
[6] 如[5]之撥水撥油構件，其中式(1)～(5)所示之含氟水解性有機矽化合物為下述所示者：
\
(式中，Me為甲基，p1、q1、r1、s1、t1各自獨立地為1～200之整數，且p1、q1、r1、s1、t1之合計為3～500，括弧內所示之各單元可隨機地鍵結)。
[7] 如[1]～[6]中任一項之撥水撥油構件，其中基材為金屬氧化物、金屬、樹脂、陶瓷、石英、玻璃、藍寶石或鑽石。
[8] 一種如[1]～[7]中任一項之撥水撥油構件的製造方法，其包含：對基材表面濕式塗佈包含具有多個矽醇基之有機矽化合物與溶劑的溶液之步驟；使該溶劑乾燥而形成底塗層之步驟；於該底塗層上濕式塗佈包含含氟化合物與溶劑的溶液後，使該溶劑乾燥，或者乾式塗佈由該溶液使溶劑蒸發而得的含氟化合物之步驟；及使含氟化合物硬化而形成撥水撥油層之步驟。
[發明之效果]
根據本發明，可形成撥水撥油性優良之防污層表面強固地密接的撥水撥油構件。該撥水撥油構件的製造方法，無需真空製程或高溫之加熱製程，即能以濕式(毛刷塗佈、旋轉塗佈、噴霧塗裝、凹版塗佈、模塗佈、棒塗佈、狹縫塗佈)製程形成，而能夠適用於各種用途。例如，係有用於表面具有防污性之物品，尤為電子設備之殼體、穿戴式終端、廚房用品及衛浴用品、運輸用設備之機體、觸控面板顯示器、保護膜等。
[實施發明之形態]
以下，就本發明更詳細地加以說明。
本發明係提供一種撥水撥油構件，其係藉由對各種基材的表面(至少單面)濕式塗佈包含具有多個矽醇基之有機矽化合物與溶劑的溶液後，使該溶劑乾燥而形成底塗層，進一步於該底塗層上濕式塗佈包含含氟化合物與溶劑的溶液(撥水撥油劑)後，使該溶劑乾燥，或者乾式塗佈由該溶液使溶劑蒸發而得的含氟化合物，並與此同時使含氟化合物硬化而形成撥水撥油層的方法等，而於各種基材上具有以具有多個矽醇基之有機矽化合物為主成分之膜厚0.5～500nm的底塗層，並進一步於其上具有以含氟有機化合物之硬化物為主成分之膜厚0.5～30nm的撥水撥油層。
作為本發明中適用之基材，不特別限制，特佳為金屬氧化物、金屬、樹脂、陶瓷、石英、玻璃、藍寶石、鑽石。
於此，作為基材之金屬氧化物，可舉出SiO、SiO2
、Al2
O3
、ITO、In2
O3
、SnO2
、ZrO2
、TiO2
、Ti2
O3
、Ti4
O7
、Ti3
O5
、Nb2
O5
、Ta2
O5
、Y2
O3
、WO3
、HfO2
、La2
Ti2
O7
等。
又，作為基材之金屬，可舉出鎂、鎂合金、鈦、鈦合金、鉻、鐵、鎳、鈷、銅、鋅、釔、鋯、鈮、鉬、釕、銠、鈀、銀、鎢、鉑、金、不鏽鋼、鋁、鋁合金、杜拉鋁、赫史特合金等。
再者，作為基材之樹脂，可舉出熱塑性樹脂或熱硬化性樹脂，具體而言宜為以下者。可舉出賽璐璐、纖維素乙酸酯、纖維素丙酸酯、纖維素丁酸酯、6-尼龍、6,6-尼龍、12-尼龍等脂肪族聚醯胺、芳香族聚醯胺、(甲基)丙烯酸樹脂、ABS樹脂、AS樹脂、聚苯乙烯、聚乙烯(低密度或高密度)、聚丙烯等聚烯烴、聚氯乙烯、聚偏二氯乙烯、乙烯-乙酸乙烯酯共聚物、聚乙烯醇、聚縮醛、聚碳酸酯、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯等飽和聚酯、芳香族聚酯、聚醚酮、聚醚醚酮、聚碸、聚醚碸、聚醚醯亞胺、聚芳酯、聚甲基戊烯、離子聚合物、液晶聚合物、聚醯亞胺、聚醯胺醯亞胺、氟樹脂、聚苯硫醚、(改性)聚苯醚、熱塑性聚胺基甲酸酯等熱塑性樹脂，或者環氧樹脂、不飽和聚酯、熱硬化性聚胺基甲酸酯、聚醯亞胺、二乙二醇雙碳酸烯丙酯(通稱CR-39)之聚合物、(鹵化)雙酚A之二(甲基)丙烯酸酯之(共)聚合物、(鹵化)雙酚A之胺基甲酸酯改性二(甲基)丙烯酸酯之(共)聚合物、二丙烯酸酯化合物或乙烯基苯甲醇與不飽和硫醇化合物等之共聚物等熱硬化性樹脂。
形成於上述基材上之底塗層係以具有多個矽醇基之有機矽化合物為主成分，較佳為含有50質量%以上的該有機矽化合物且膜厚為0.5～500nm者。該底塗層可藉由對各種基材的表面濕式塗佈包含具有多個矽醇基之有機矽化合物與溶劑的溶液後，再乾燥去除該溶劑而形成。
具有多個矽醇基之有機矽化合物為1分子中較佳具有2個以上，更佳具有3個以上，再更佳具有4個以上矽醇基者。矽醇基過少的話，被膜本身會變弱。此外，具有多個矽醇基之有機矽化合物中的矽醇基量係以0.0001～0.05mol/g，特別是0.001～0.04mol/g，尤其是0.005～0.03mol/g為佳。
具有多個矽醇基之有機矽化合物可藉由將具有多個水解性基之有機矽化合物水解來製備。
於此，作為具有多個水解性基之有機矽化合物，可舉出甲基三甲氧基矽烷、二甲基二甲氧基矽烷、苯基三甲氧基矽烷、二甲氧基二苯基矽烷、四乙氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、苯基三乙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、己基三甲氧基矽烷、己基三乙氧基矽烷、癸基三甲氧基矽烷、1,6-雙(三甲氧基矽烷基)己烷、三氟丙基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧丙基三甲氧基矽烷、3-甲基丙烯醯氧丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧丙基三乙氧基矽烷、3-丙烯醯氧丙基三甲氧基矽烷、參-(三甲氧基矽烷基丙基)異三聚氰酸酯、三氯矽烷、二氯矽烷等，可混合使用此等。
此外，於本發明中，作為具有多個矽醇基之有機矽化合物，較佳使用將上述具有多個水解性基之有機矽化合物水解後，使其進行脫水縮合而達高分子量者。
上述中，水解･脫水縮合物其重量平均分子量較佳為300～100,000，更佳為5,000～50,000。此外，於本發明中，重量平均分子量能以例如以甲苯為展開溶媒之凝膠滲透層析(GPC)分析的聚苯乙烯換算值求得(下同)。
就本發明所使用之具有多個矽醇基之有機矽化合物而言，特佳為四乙氧基矽烷之水解･脫水縮合化合物。
具有多個矽醇基之有機矽化合物係以使用溶劑加以稀釋為宜。作為供溶解具有多個矽醇基之有機矽化合物的溶劑，較佳為甲醇、乙醇、異丙醇、丁醇等醇類、丙二醇單甲醚或聚乙二醇單丙醚等醚類，惟不特別限定，只要基於與基材的潤濕性或沸點而適宜選擇即可。包含具有多個矽醇基之有機矽化合物與溶劑的溶液中之具有多個矽醇基之有機矽化合物的濃度較佳為0.01～10質量%，更佳為0.1～2質量%。濃度過低的話，未塗敷部分會增加；濃度過高的話，則矽醇基彼此可能發生二次凝聚。
又，包含具有多個矽醇基之有機矽化合物與溶劑的溶液中，亦可視需求使用紫外線吸收劑、光安定劑、抗氧化劑、調平劑、消泡劑、顏料、染料、分散劑、抗靜電劑、防霧劑等界面活性劑類。
上述包含具有多個矽醇基之有機矽化合物與溶劑的溶液可藉由濕式塗佈，尤為浸漬、毛刷塗佈、旋轉塗佈、噴霧塗裝、凹版塗佈、模塗佈、棒塗佈、狹縫塗佈、流動塗佈等方法塗佈於基材表面，並使溶劑乾燥而形成以具有多個矽醇基之有機矽化合物為主成分的底塗層。此外，亦可在不對基材造成影響的溫度範圍內以例如40～500℃加熱1分鐘～24小時。
形成於基材表面之底塗層的膜厚係隨基材的種類而適宜選定，通常為0.5～500nm，較佳為3～200nm，尤為10～100nm。此外，於本發明中，膜厚可藉由光譜式橢圓偏光儀或X射線反射率法等周知之方法來測定。
其次，於形成之底塗層表面塗佈撥水撥油劑並使其硬化，而形成防污表面層(撥水撥油層)。作為撥水撥油劑，係以含氟有機矽化合物為主成分者。作為該含氟有機矽化合物，可使用日本特開2007-197425號公報、日本特開2007-297589號公報、日本特開2007-297543號公報、日本特開2008-088412號公報、日本特開2008-144144號公報、日本特開2010-031184號公報、日本特開
2010-047516號公報、日本特開2011-116947號公報、日本特開2011-178835號公報、日本特開2014-084405號公報、日本特開2014-105235號公報、日本特開2013-253228號公報、日本特開2014-218639號公報、國際公開第
2013/121984號(專利文獻1、4～16)所記載之含氟有機矽化合物。
茲就含氟有機矽化合物(或含氟化合物)更具體地加以說明。
本發明之含氟化合物較佳為於至少1個末端具有至少1個水解性基的含氟化合物，該化合物更佳為於1分子中具有甲氧基、乙氧基、丙氧基、丁氧基等碳數1～12，尤為碳數1～10之烷氧基、甲氧甲氧基、甲氧乙氧基等碳數2～12，尤為碳數2～10之烷氧烷氧基、乙醯氧基等碳數1～10之醯氧基、異丙烯氧基等碳數2～10之烯氧基、氯基、溴基、碘基等鹵基、胺基及矽氮烷基等水解性基且具有氟原子的有機矽化合物。作為含氟化合物，較佳以具有氟氧伸烷基之化合物為宜。氟氧伸烷基係指具有
-Cj
F2j
O-所示之重複單元多個鍵結而成之(聚)氟氧伸烷基結構的化合物(該結構中j為1以上，較佳為1～6，更佳為1～4之整數)。尤以具有3～500個，較佳為15～200個，更佳為20～100個，再更佳為25～80個該重複單元為宜。
上述重複單元-Cj
F2j
O-可為直鏈型及分支型任一種。可舉出例如下述之單元，此等重複單元的2種以上可鍵結而成。
上述(聚)氟氧伸烷基結構，尤為-(CF2
)d
-O-(CF2
O)p
(CF2
CF2
O)q
(CF2
CF2
CF2
O)r
(CF2
CF2
CF2
CF2
O)s
(CF(CF3
)CF2
O)t
-(CF2
)d
-，p、q、r、s、t各自獨立地為0～200之整數，較佳的是p為5～100之整數，q為5～100之整數，r為0～100之整數，s為0～50之整數，t為0～100之整數，且p+q+r+s+t=3～500之整數，較佳為10～105之整數。此外，括弧內所示之各單元可隨機地鍵結。d獨立地為0～8之整數，較佳為0～5之整數，更佳為0～2之整數，該單元可為直鏈狀或分支狀。尤其能以下述結構表示：
(式中，p’、q’、r’、s’、t’各自獨立地為1～200之整數，且p’、q’、r’、s’、t’之合計為3～500。括弧內所示之各單元可隨機地鍵結。d’獨立地為0～5之整數，該單元可為直鏈狀或分支狀)。
本發明之含氟化合物更佳為下述通式(1)～(5)之任一者所示之含氟水解性有機矽化合物(或含氟水解性有機矽化合物)。此等可單獨使用1種，亦可併用2種以上。
式(1)～(5)中，Rf為-(CF2
)d
-O-(CF2
O)p
(CF2
CF2
O)q
(CF2
CF2
CF2
O)r
(CF2
CF2
CF2
CF2
O)s
(CF(CF3
)
CF2
O)t
-(CF2
)d
-，p、q、r、s、t各自獨立地為0～200之整數，且p+q+r+s+t=3～500，括弧內所示之各單元可隨機地鍵結，d為0～8之整數，該單元可為直鏈狀或分支狀。A為氟原子、氫原子，或末端為-CF3
基、-CF2
H基或者-CH2
F基之一價含氟基，Z、Z’獨立地為單鍵或可包含氮原子、氧原子、矽原子、磷原子或者硫原子，且可經氟取代之二～八價有機基，W為末端具有水解性基之一價有機基。α、β各自獨立地為1～7之整數，較佳的是α為1～3之整數，更佳為1，β為1～3之整數，且α+β=2～8之整數，較佳為2～4之整數。γ為2～8之整數，較佳為2或3。
又，Q為單鍵或二價有機基，δ各自獨立地為1～10之整數，Y為具有水解性基之二價有機基，B為氫原子、碳數1～4之烷基或鹵素原子。
上述式(1)～(5)中，Rf為上述(聚)氟氧伸烷基結構之-(CF2
)d
-O-(CF2
O)p
(CF2
CF2
O)q
(CF2
CF2
CF2
O)r
(CF2
CF2
CF2
CF2
O)s
(CF(CF3
)CF2
O)t
-(CF2
)d
-，可例示與上述相同者。
上述式(1)及(4)中，A為氟原子、氫原子，或末端為-CF3
基、-CF2
H基或者-CH2
F基之一價含氟基。其中，較佳為-CF3
基、-CF2
CF3
基、-CF2
CF2
CF3
基。
上述式(1)～(3)中，Z、Z’獨立地為單鍵或可包含氮原子、氧原子、矽原子、磷原子或者硫原子，且可經氟取代之二～八價有機基。該有機基能以(L)e
-M(e為1～7之整數，較佳為1～3之整數)表示。
於此，L為單鍵或氧原子、硫原子，或者二價有機基，上述式(1)～(3)中，Z之L皆為Rf基與M基(或W基)之連結基，Z’之L為M(或Rf基)與Rf基之連結基。作為二價有機基，較佳為可包含選自由醯胺鍵、醚鍵、酯鍵或二甲基亞矽烷基等二有機亞矽烷基、
-Si[OH][(CH2
)f
Si(CH3
)3
]-(f為2～4之整數)所示之基所成群組的1種或2種以上之未取代或經取代之碳數2～12之二價有機基，更佳為可包含前述結構之未取代或經取代之碳數2～12之二價烴基。
作為前述未取代或經取代之碳數2～12之二價烴基，可舉出例如伸乙基、伸丙基(伸三甲基、甲基伸乙基)、伸丁基(伸四甲基、甲基伸丙基)、伸己基、伸八甲基等伸烷基、伸苯基等伸芳基，或此等基之2種以上之組合(伸烷基･伸芳基等)。再者，亦可為將鍵結於此等基的碳原子之氫原子的一部分或全部以氟、碘等鹵素原子取代的基。其中，較佳為未取代或經取代之碳數2～4之伸烷基或伸苯基。
作為L之二價有機基，可舉出例如下述結構所示之基或此等2種以上鍵結而成之基。
(式中，f為2～4之整數，b為2～6之整數，較佳為2～4之整數，u、v為1～4之整數，g為2～4之整數，Me為甲基)。
此外，M為單鍵或氮原子、矽原子、碳原子、磷原子或者包含此等之基，或者二～八價有機基。具體而言為選自單鍵、-R1 2
C-所示之二價基、-R3 2
Si-所示之二價基、-NR4
-所示之二價基、-N=所示之三價基、-P=所示之三價基、-PO=所示之三價基、-R1
C=所示之三價基、
-R3
Si=所示之三價基、-C≡所示之四價基、-O-C≡所示之四價基及-Si≡所示之四價基的基，或二～八價矽氧烷殘基，上述式(1)～(3)中，Z之M皆為L(或Rf基)與W基之連結基，Z’之M為經由L而與Rf基連結之基。
上述中，R1
彼此獨立地較佳為具有可中介存在碳數1～3之烷基、羥基、矽原子數2～51個二有機矽氧烷結構的碳數1～3之氧伸烷基之重複單元的基，或R2 3
SiO-所示之矽醚基，R2
彼此獨立地為氫原子，較佳為碳數1～3之烷基、苯基等芳基，或碳數1～3之烷氧基。R3
彼此獨立地較佳為碳數1～3之烷基、碳數2或3之烯基、碳數1～3之烷氧基，或氯基。R4
為碳數1～3之烷基、苯基等碳數6～10之芳基。當M為矽氧烷殘基時，較佳具有矽原子數2～51個，較佳為矽原子數2～13個，更佳為矽原子數2～11個，再更佳為矽原子數2～5個的直鏈狀、分支狀或環狀有機聚矽氧烷結構。該有機聚矽氧烷宜為具有碳數1～8，更佳為碳數1～4之甲基、乙基、丙基、丁基及C3
F7
-C3
H6
-等未取代或者氟取代烷基或苯基者。又，亦可包含2個矽原子以伸烷基鍵結之矽伸烷基結構，即Si-(CH2
)n
-Si。前述式中n為2～6之整數，較佳為2～4之整數。
作為此種M，可舉出下述所示者：
(式中，i為1～20之整數，c為1～50之整數，Me為甲基)。
上述式(1)～(3)中，W為末端具有水解性基之一價有機基，較佳為以下述式表示：
(式中，R為碳數1～4之烷基或苯基，X為水解性基，a為2或3，m為0～10之整數)。
上述式中，作為X之水解性基，可舉出甲氧基、乙氧基、丙氧基、丁氧基等碳數1～12，尤為碳數1～10之烷氧基、甲氧甲氧基、甲氧乙氧基等碳數2～12，尤為碳數2～10之烷氧烷氧基、乙醯氧基等碳數1～10之醯氧基、異丙烯氧基等碳數2～10之烯氧基、氯基、溴基、碘基等鹵基、胺基等。其中較佳為甲氧基及乙氧基。
又，R為碳數1～4之甲基、乙基等烷基或苯基，其中較佳為甲基。
a為2或3，基於反應性、對基材的密接性之觀點，較佳為3。m為0～10之整數，較佳為2～8之整數，更佳為2或3。
式(1)～(3)中，作為(-)α
ZWβ
、-ZWβ
所示之結構，可舉出下述結構：
(式中，L、R、X、f、c及a諸如上述，m1為0～10之整數，較佳為2～8之整數，m2為1～10之整數，較佳為2～8之整數，Me為甲基)。
上述式(4)及(5)中，Q為單鍵或二價有機基，係Rf基與Y基之連結基。作為該Q之二價有機基，較佳為可包含選自由醯胺鍵、醚鍵、酯鍵或二甲基亞矽烷基等二有機亞矽烷基、-Si[OH][(CH2
)f
Si(CH3
)3
]-(f為2～4之整數)所示之基所成群組的1種或2種以上之未取代或經取代之碳數2～12之二價有機基，更佳為可包含前述結構之未取代或經取代之碳數2～12之二價烴基。
作為前述未取代或經取代之碳數2～12之二價烴基，可例示與上述L所例示之未取代或經取代之碳數2～12之二價烴基相同者。
作為Q之二價有機基，可舉出例如下述結構所示之基：
(式中，f為2～4之整數，b為2～6之整數，較佳為2～4之整數，u、v為1～4之整數，g為2～4之整數，Me為甲基)。
上述式(4)及(5)中，Y彼此獨立地為具有水解性基之二價有機基，較佳為下述式所示之結構者：
(式中，R、X及a諸如上述。k為0～10之整數，較佳為1～10之整數，更佳為2～8之整數，再更佳為2～6之整數。h為1～6之整數，較佳為1或2，M’為未取代或經取代之三～八價，較佳為三價或四價烴基，該烴基中之碳原子的一部分或全部可經矽原子取代，且鍵結於該碳原子之氫原子的一部分或全部可經氟原子等鹵素原子取代)。
作為M’，較佳為下述結構所示之基：
(上述中，M1
為單鍵、碳數1～6之未取代或者取代之二價烴基或二甲基亞矽烷基等二有機亞矽烷基，M2
為-R1
C=所示之三價基或-R3
Si=所示之三價基，R1
、R3
係與上述相同。R5
為氫原子或碳數1～6之甲基、乙基、丙基等烷基等之一價烴基)。
作為M1
，可例示單鍵、伸苯基、二甲基亞矽烷基、伸四氟乙基等。又，作為M2
，可舉出下述所示者：
(式中，Me為甲基)。
作為此種Y，可舉出例如下述基：
上述式(4)及(5)中，δ為1～10之整數，較佳為1～4之整數。
又，B彼此獨立地為氫原子、碳數1～4之甲基、乙基、丙基及丁基等烷基，或氟原子、氯原子、溴原子及碘原子等鹵素原子。
作為上述式(1)～(5)所示之含氟水解性有機矽化合物(含氟水解性有機矽化合物)，可舉出例如下述結構：
(式中，Me為甲基，p1、q1、r1、s1、t1各自獨立地為1～200之整數，且p1、q1、r1、s1、t1之合計為3～500，括弧內所示之各單元可隨機地鍵結)。
此外，本發明之通式(1)～(5)所示之含氟水解性有機矽化合物(含氟水解性有機矽化合物)可包含上述水解性基(X)的一部分或全部經水解的化合物(X為OH基之化合物)，亦可包含此等OH基的一部分或全部經縮合的化合物。
含氟化合物係以預先藉由溶劑稀釋為宜；就此種溶劑而言，只要是可使上述含氟化合物均勻地溶解者則不特別限定。可舉出例如氟改性脂肪族烴系溶劑(全氟庚烷、全氟辛烷等)、氟改性芳香族烴系溶劑(1,3-三氟甲基苯等)、氟改性醚系溶劑(甲基全氟丁基醚、乙基全氟丁基醚、全氟(2-丁基四氫呋喃)等)、氟改性烷基胺系溶劑(全氟三丁胺、全氟三戊胺等)、烴系溶劑(石油精、甲苯、二甲苯等)、酮系溶劑(丙酮、甲基乙基酮、甲基異丁基酮等)。此等當中，由溶解性及穩定性等而言，宜為經氟改性之溶劑，尤以氟改性醚系溶劑、氟改性芳香族烴系溶劑為佳。
上述溶劑可單獨使用1種或混合2種以上使用。
溶劑較佳以撥水撥油劑(包含含氟化合物與溶劑的溶液)中之含氟化合物的質量%為0.01～50質量%，較佳為0.03～10質量%，更佳為0.05～1質量%的方式含有。
含有含氟化合物之撥水撥油劑可藉由濕式塗敷法(浸漬法、毛刷塗佈、旋轉塗佈、噴霧、凹版塗佈、模塗佈、棒塗佈、狹縫塗佈)、蒸鍍法等周知之方法實施於基材。塗敷條件等只要依循向來周知之方法即可；由以濕式塗敷法(濕式法)塗敷、形成底塗層而言，含有含氟化合物之撥水撥油劑亦以濕式塗敷法(濕式法)塗敷係較為有效率。
含氟化合物可於室溫(25℃)下以1～24小時使其硬化；而為了以更短時間使其硬化，亦能以30～200℃加熱1分鐘～1小時。以促進水解方面而言，硬化係以在加濕下(50～90%RH)進行為佳。
此外，於塗敷含有含氟化合物之撥水撥油劑前，亦可對基材上的底塗層表面實施電漿處理、UV處理、臭氧處理等的洗淨或使表面活化之處理。
本發明之撥水撥油構件的氟層(撥水撥油層)的膜厚為0.5～30nm，特佳為1～20nm。其膜厚過厚的話，處理劑會凝聚而導致辨認性惡化；過薄的話則表面特性、耐磨耗性不足。
作為如此所得知本發明之撥水撥油構件，可舉出汽車導航、平板電腦、智慧型手機、數位相機、數位視訊攝影機、PDA、攜帶型音訊播放機、汽車音響、遊戲機器等之殼體、攝影機鏡頭、眼鏡鏡片、太陽眼鏡、AR鏡片、VR鏡片等的鏡片、內視鏡、手術刀、血壓計、X光CT、MRI等醫療用設備、液晶顯示器、有機EL顯示器、可撓性裝置等的觸控面板表面、保護膜、抗反射膜、光碟、DVD、藍光光碟等光學物品、如浴缸、盥洗台之衛浴用品、如廚台之廚房用品、汽車、電車、航空器等的窗玻璃、頭燈蓋等、外壁用建材、廚房用建材、候車室、美術品、運輸用設備之機體、鋁圈、鏡子、毫米波感測器用罩蓋等。
[實施例]
以下示出實施例及比較例對本發明具體地加以說明，惟本發明不受此等所限定。
[實施例1及比較例1～5]
[底塗層的形成]
以下述所示方法分別將底塗層1～5形成於丙烯酸樹脂基材(Engineering Test Service股份有限公司製
Acrylderaglass A，厚2mm、寬50mm、長100mm之試片基板)。
[底塗層1的形成]
使用將四乙氧基矽烷之水解・脫水縮合化合物(重量平均分子量：25,000、矽醇基量：0.01mol/g)以丁醇稀釋成固含量0.5質量%的處理液浸漬塗敷上述基材後，於室溫(25℃)下乾燥1小時，而於上述基材上形成厚度20nm的底塗層1。浸漬塗敷係將基材浸漬於處理液30秒後，以150mm/min往上提。
[底塗層2的形成]
使用將四乙氧基矽烷以乙醇稀釋成固含量0.5質量%的處理液浸漬塗敷上述基材後，以80℃/80%RH進行硬化24小時，而於上述基材上形成厚度20nm的底塗層2。浸漬塗敷係將基材浸漬於處理液30秒後，以150mm/min往上提。
[底塗層3的形成]
使用將四乙氧基矽烷之5重量體物以丁醇稀釋成固含量0.5質量%的處理液浸漬塗敷上述基材後，以80℃/80%RH進行硬化24小時，而於上述基材上形成厚度18nm的底塗層3。浸漬塗敷係將基材浸漬於處理液30秒後，以150mm/min往上提。
[底塗層4的形成]
使用將全氫聚矽氮烷以二丁醚稀釋成固含量0.5質量%的處理液浸漬塗敷上述基材後，以80℃/80%RH進行硬化24小時，而於上述基材上形成厚度23nm的底塗層4。浸漬塗敷係將基材浸漬於處理液30秒後，以150mm/min往上提。
[底塗層5的形成]
於上述基材上以濺鍍法塗敷SiO2
層成20nm，而於上述基材上形成厚度20nm的底塗層5。
進而，基於下述方法在形成有底塗層1～5之基材的底塗層上形成撥水撥油層。
[撥水撥油層的形成]
將下述所示化合物1以氟系溶劑(Novec7200(3M公司製))稀釋成固含量為0.1質量%後，以噴霧塗敷裝置(T&K股份有限公司製NST-51)噴霧塗敷於上述基材的底塗層上。其後，以80℃進行硬化30分鐘而形成硬化被膜(撥水撥油層)，而製成試驗體。由根據螢光X射線裝置(Rigaku股份有限公司製ZSXmini2)之F檢測量所算出之撥水撥油層的平均膜厚為約10nm。
[化合物1]
此外，實施例1係使用形成有底塗層1、比較例1係使用形成有底塗層2、比較例2係使用形成有底塗層3、比較例3係使用形成有底塗層4、比較例4係使用形成有底塗層5的基板。又，比較例5則未形成底塗層，而是以上述方法直接將撥水撥油層形成於丙烯酸樹脂基材。使用上述所得之試驗體，根據以下方法進行各種評定。將此等結果示於表1。
[撥水撥油性]
使用接觸角計(DropMaster，協和界面科學公司製)，測定硬化被膜(撥水撥油層)對水的接觸角及對油酸的接觸角。
[動摩擦係數]
使用新東科學公司製表面性試驗機，依下述條件測定硬化被膜(撥水撥油層)對Bemcot(旭化成公司製)的動摩擦係數。
接觸面積：10mm×30mm
荷重：100g
[皮脂污垢擦拭性]
請7位官能檢查員將額頭的皮脂用手指轉印於硬化被膜(撥水撥油層)的表面，並根據下述評定基準評定以Bemcot(旭化成公司製)擦拭時的擦拭性。
A：2次以內即可完全拭除
B：3～5次以內可完全拭除
C：擦拭5次，有一部分無法拭除的部分殘留
D：擦拭5次仍幾乎無法拭除
[耐磨耗試驗]
使用往復磨耗試驗機(HEIDON 30S，新東科學公司製)，依以下條件實施硬化被膜(撥水撥油層)的耐磨耗試驗。使用接觸角計(DropMaster，協和界面科學公司製)測定耐磨耗試驗後硬化被膜(撥水撥油層)對水的接觸角。
評定環境條件：25℃、濕度40%
摩擦材料：以8片不織布疊合包覆與試料接觸之試驗機的前端部(10mm×10mm)，並以橡皮筋固定。
負載：1kg
摩擦距離(單程)：30mm
摩擦速度：3,600mm/min
往復次數：5,000往復
由表1之結果可知，實施例1由於撥水撥油性優良且動摩擦係數較低，結果皮脂污垢擦拭性優異。而且，於磨耗試驗前後均顯示水接觸角100°以上之優良的撥水撥油性。另一方面，就使用未經水解之(不具有矽醇基)有機矽化合物的比較例1、2，初始特性不充分且耐磨耗性亦較差。就比較例3，係使用二氧化矽膜之濕式塗敷中代表性的全氫聚矽氮烷，初始特性雖優良，但耐磨耗性不足。就比較例4，係使用二氧化矽膜之乾式塗敷中代表性的SiO2
濺鍍膜，初期特性雖優良，但耐磨耗性不足。就比較例5，係未使用底塗，結果無法發揮充分的性能。矽醇基由於與基材的密接性良好，而且與具有水解性基之含氟化合物的反應性亦優良，故可形成耐磨耗性優良的防污膜。
[產業上可利用性]
根據本發明，可僅以濕式塗敷，依室溫製程形成具有撥水撥油性優良的硬化被膜(撥水撥油層)之撥水撥油構件。儘管不需要加熱硬化、真空製程，但仍可達成高於習知技術的耐磨耗性。再者，本發明為亦可對大面積進行塗敷之技術。因此，本發明之撥水撥油構件可作成以捲筒狀生產的機能性薄膜，對於電子設備之殼體或廚房周邊等經常日常使用、接觸的物品，經過長時間仍可維持良好的防污表面。
Claims (7)
- 一種撥水撥油構件，其為依序在基材的至少單面層合作為第1層之底塗層，並進一步於其上層合作為第2層之撥水撥油層的撥水撥油構件，其中，底塗層係由以具有多個矽醇基之有機矽化合物為主成分之膜厚0.5~500nm的層所構成，且撥水撥油層係由以含氟化合物之硬化物為主成分之膜厚0.5~30nm的層所構成，前述具有多個矽醇基之有機矽化合物係重量平均分子量為5,000~100,000，且具有0.005~0.05mol/g之矽醇基量的四乙氧基矽烷之水解‧脫水縮合化合物。
- 如請求項1之撥水撥油構件，其中含氟化合物係於至少1個末端具有至少1個水解性基，該水解性基為選自碳數1~12之烷氧基、碳數1~12之烷氧烷氧基、碳數1~10之醯氧基、碳數2~10之烯氧基、鹵基、胺基及矽氮烷基的基。
- 如請求項1或2之撥水撥油構件，其中含氟化合物係於分子中具有-(CF2)d-O-(CF2O)p(CF2CF2O)q(CF2CF2CF2O)r(CF2CF2CF2CF2O)s(CF(CF3)CF2O)t-(CF2)d-(式中，p、q、r、s、t各自獨立地為0~200之整數，且p+q+r+s+t=3~500，括弧內所示之各單元可隨機地鍵結，d為0~8之整數，該單元可為直鏈狀或分支狀)，且於至少 1個末端具有至少1個水解性基的含氟氧伸烷基之有機矽化合物。
- 如請求項1或2之撥水撥油構件，其中含氟化合物為選自下述通式(1)、(2)、(3)、(4)及(5)所示之含氟水解性有機矽化合物的至少1種；(A-Rf) α -ZW β (1) Rf-(ZW β )2 (2) Z’-(Rf-ZW β ) γ (3)[式中，Rf為-(CF2)d-O-(CF2O)p(CF2CF2O)q(CF2CF2CF2O)r(CF2CF2CF2CF2O)s(CF(CF3)CF2O)t-(CF2)d-，p、q、r、s、t各自獨立地為0~200之整數，且p+q+r+s+t=3~500，括弧內所示之各單元可隨機地鍵結，d為0~8之整數，該單元可為直鏈狀或分支狀；A為氟原子、氫原子，或末端為-CF3基、-CF2H基或者-CH2F基之一價含氟基，Z、Z’獨立地為單鍵或可包含氮原子、氧原子、矽原子、磷原子或者硫原子，且可經氟取代之二~八價有機基，W為末端具有水解性基之一價有機基；α、β各自獨立地為1~7之整數，且α+β=2~8；γ為2~8之整數]A-Rf-Q-(Y) δ -B (4) Rf-(Q-(Y) δ -B)2 (5)(式中，Rf、A係與前述相同，Q為單鍵或二價有機基，δ為1~10之整數，Y為具有水解性基之二價有機基，B為氫原子、碳數1~4之烷基或鹵素原子)。
- 如請求項4之撥水撥油構件，其中式(1)~(5)所示之含氟水解性有機矽化合物為下述所示者：
- 如請求項1或2之撥水撥油構件，其中基材為金屬氧化物、金屬、樹脂、陶瓷、石英、玻璃、藍寶石或鑽石。
- 一種如請求項1~6中任一項之撥水撥油構件的製造方法，其包含：對基材表面濕式塗佈包含具有多個矽醇基之有機矽化合物與溶劑的溶液之步驟；使該溶劑乾燥而形成底塗層之步驟；於該底塗層上濕式塗佈包含含氟化合物與溶劑的溶液後，使該溶劑乾燥，或者乾式塗佈由該溶液使溶劑蒸發而得的含氟化合物之步驟；及使含氟化合物硬化而形成撥水撥油層之步驟，前述具有多個矽醇基之有機矽化合物係重量平均分子量為5,000~100,000，且具有0.005~0.05mol/g之矽醇基量 的四乙氧基矽烷之水解‧脫水縮合化合物。
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| JP7272359B2 (ja) * | 2018-06-13 | 2023-05-12 | Ａｇｃ株式会社 | 防汚性物品およびその製造方法 |
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| TW201923021A (zh) | 2019-06-16 |
| US20200254482A1 (en) | 2020-08-13 |
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| EP3693160A4 (en) | 2021-07-07 |
| WO2019069642A1 (ja) | 2019-04-11 |
| KR102602479B1 (ko) | 2023-11-16 |
| EP3693160A1 (en) | 2020-08-12 |
| JPWO2019069642A1 (ja) | 2020-11-05 |
| KR20200062294A (ko) | 2020-06-03 |
| JP6988905B2 (ja) | 2022-01-05 |
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