TWI732921B - 半導體裝置的製造方法 - Google Patents
半導體裝置的製造方法 Download PDFInfo
- Publication number
- TWI732921B TWI732921B TW106127072A TW106127072A TWI732921B TW I732921 B TWI732921 B TW I732921B TW 106127072 A TW106127072 A TW 106127072A TW 106127072 A TW106127072 A TW 106127072A TW I732921 B TWI732921 B TW I732921B
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- Prior art keywords
- sealing body
- protective film
- semiconductor
- manufacturing
- layer
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 173
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 66
- 238000000034 method Methods 0.000 claims abstract description 190
- 238000007789 sealing Methods 0.000 claims abstract description 177
- 239000000758 substrate Substances 0.000 claims abstract description 90
- 239000010410 layer Substances 0.000 claims abstract description 78
- 230000001681 protective effect Effects 0.000 claims abstract description 77
- 239000012790 adhesive layer Substances 0.000 claims abstract description 60
- 235000012431 wafers Nutrition 0.000 description 48
- 239000000853 adhesive Substances 0.000 description 45
- 230000001070 adhesive effect Effects 0.000 description 45
- 239000013256 coordination polymer Substances 0.000 description 43
- 229920005989 resin Polymers 0.000 description 18
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- 230000015572 biosynthetic process Effects 0.000 description 8
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- 238000012986 modification Methods 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 238000000227 grinding Methods 0.000 description 6
- 238000007648 laser printing Methods 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 238000001723 curing Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 239000002390 adhesive tape Substances 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000004088 foaming agent Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- -1 and for example Polymers 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
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- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
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- 238000004806 packaging method and process Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Dicing (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Bipolar Transistors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016169152 | 2016-08-31 | ||
JP2016-169152 | 2016-08-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201826405A TW201826405A (zh) | 2018-07-16 |
TWI732921B true TWI732921B (zh) | 2021-07-11 |
Family
ID=61301917
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106127072A TWI732921B (zh) | 2016-08-31 | 2017-08-10 | 半導體裝置的製造方法 |
TW110119011A TWI773341B (zh) | 2016-08-31 | 2017-08-10 | 半導體裝置的製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110119011A TWI773341B (zh) | 2016-08-31 | 2017-08-10 | 半導體裝置的製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP7096766B2 (fr) |
KR (2) | KR102487681B1 (fr) |
CN (1) | CN109463007B (fr) |
TW (2) | TWI732921B (fr) |
WO (1) | WO2018043008A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7238301B2 (ja) * | 2018-09-05 | 2023-03-14 | 株式会社レゾナック | 材料の選定方法及びパネルの製造方法 |
JP7395898B2 (ja) * | 2019-09-18 | 2023-12-12 | 大日本印刷株式会社 | 半導体多面付け基板用部材、半導体多面付け基板、および半導体部材 |
WO2022185489A1 (fr) * | 2021-03-04 | 2022-09-09 | 昭和電工マテリアルズ株式会社 | Procédé de fabrication de dispositif à semi-conducteur |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006222164A (ja) * | 2005-02-08 | 2006-08-24 | Shinko Electric Ind Co Ltd | 半導体装置及びその製造方法 |
US20130078770A1 (en) * | 2011-09-28 | 2013-03-28 | Nitto Denko Corporation | Method for producing semiconductor device |
US20130157419A1 (en) * | 2011-12-19 | 2013-06-20 | Nitto Denko Corporation | Method of manufacturing semiconductor device |
US20140191406A1 (en) * | 2011-10-19 | 2014-07-10 | Panasonic Corporation | Manufacturing method for semiconductor package, semiconductor package, and semiconductor device |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3456462B2 (ja) * | 2000-02-28 | 2003-10-14 | 日本電気株式会社 | 半導体装置及びその製造方法 |
JP3455948B2 (ja) | 2000-05-19 | 2003-10-14 | カシオ計算機株式会社 | 半導体装置およびその製造方法 |
JP4719042B2 (ja) * | 2006-03-16 | 2011-07-06 | 株式会社東芝 | 半導体装置の製造方法 |
JP2009032929A (ja) * | 2007-07-27 | 2009-02-12 | Sanyo Electric Co Ltd | 半導体装置及びその製造方法 |
JP5456440B2 (ja) * | 2009-01-30 | 2014-03-26 | 日東電工株式会社 | ダイシングテープ一体型ウエハ裏面保護フィルム |
JP5718005B2 (ja) | 2010-09-14 | 2015-05-13 | 日東電工株式会社 | 半導体装置製造用耐熱性粘着テープ及びそのテープを用いた半導体装置の製造方法。 |
JP2014197568A (ja) * | 2011-10-19 | 2014-10-16 | パナソニック株式会社 | 半導体パッケージの製造方法、半導体パッケージ、及び半導体装置 |
US9385102B2 (en) * | 2012-09-28 | 2016-07-05 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming supporting layer over semiconductor die in thin fan-out wafer level chip scale package |
CN103887251B (zh) * | 2014-04-02 | 2016-08-24 | 华进半导体封装先导技术研发中心有限公司 | 扇出型晶圆级封装结构及制造工艺 |
CN104103528A (zh) * | 2014-07-22 | 2014-10-15 | 华进半导体封装先导技术研发中心有限公司 | 一种扇出型方片级半导体芯片封装工艺 |
JP6417142B2 (ja) | 2014-07-23 | 2018-10-31 | 株式会社ジェイデバイス | 半導体装置及びその製造方法 |
CN204497228U (zh) * | 2015-03-16 | 2015-07-22 | 苏州晶方半导体科技股份有限公司 | 芯片封装结构 |
-
2017
- 2017-08-02 JP JP2018537054A patent/JP7096766B2/ja active Active
- 2017-08-02 WO PCT/JP2017/027956 patent/WO2018043008A1/fr active Application Filing
- 2017-08-02 KR KR1020227010945A patent/KR102487681B1/ko active IP Right Grant
- 2017-08-02 KR KR1020187035416A patent/KR102385965B1/ko active IP Right Grant
- 2017-08-02 CN CN201780037693.3A patent/CN109463007B/zh active Active
- 2017-08-10 TW TW106127072A patent/TWI732921B/zh active
- 2017-08-10 TW TW110119011A patent/TWI773341B/zh active
-
2022
- 2022-06-15 JP JP2022096710A patent/JP7317187B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006222164A (ja) * | 2005-02-08 | 2006-08-24 | Shinko Electric Ind Co Ltd | 半導体装置及びその製造方法 |
US20130078770A1 (en) * | 2011-09-28 | 2013-03-28 | Nitto Denko Corporation | Method for producing semiconductor device |
US20140191406A1 (en) * | 2011-10-19 | 2014-07-10 | Panasonic Corporation | Manufacturing method for semiconductor package, semiconductor package, and semiconductor device |
US20130157419A1 (en) * | 2011-12-19 | 2013-06-20 | Nitto Denko Corporation | Method of manufacturing semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPWO2018043008A1 (ja) | 2019-06-24 |
CN109463007A (zh) | 2019-03-12 |
JP7096766B2 (ja) | 2022-07-06 |
TW202137340A (zh) | 2021-10-01 |
CN109463007B (zh) | 2022-11-08 |
JP7317187B2 (ja) | 2023-07-28 |
TWI773341B (zh) | 2022-08-01 |
KR20220045255A (ko) | 2022-04-12 |
JP2022123045A (ja) | 2022-08-23 |
TW201826405A (zh) | 2018-07-16 |
KR20190045091A (ko) | 2019-05-02 |
WO2018043008A1 (fr) | 2018-03-08 |
KR102487681B1 (ko) | 2023-01-11 |
KR102385965B1 (ko) | 2022-04-12 |
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