TWI723178B - 微型裝置的無遮罩並行取放轉印 - Google Patents
微型裝置的無遮罩並行取放轉印 Download PDFInfo
- Publication number
- TWI723178B TWI723178B TW106119234A TW106119234A TWI723178B TW I723178 B TWI723178 B TW I723178B TW 106119234 A TW106119234 A TW 106119234A TW 106119234 A TW106119234 A TW 106119234A TW I723178 B TWI723178 B TW I723178B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
- H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
- H10H29/142—Two-dimensional arrangements, e.g. asymmetric LED layout
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0015—Orientation; Alignment; Positioning
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0061—Tools for holding the circuit boards during processing; handling transport of printed circuit boards
- H05K13/0069—Holders for printed circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
- H05K13/046—Surface mounting
- H05K13/0469—Surface mounting by applying a glue or viscous material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/303—Assembling printed circuits with electric components, e.g. with resistors with surface mounted components
- H05K3/305—Affixing by adhesive
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
- H10H20/856—Reflecting means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0446—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0442—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7412—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
- H10P72/7414—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support the auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7434—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/744—Details of chemical or physical process used for separating the auxiliary support from a device or a wafer
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Electroluminescent Light Sources (AREA)
- Led Device Packages (AREA)
- Die Bonding (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Liquid Crystal (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Specific Conveyance Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662348691P | 2016-06-10 | 2016-06-10 | |
| US62/348,691 | 2016-06-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201803107A TW201803107A (zh) | 2018-01-16 |
| TWI723178B true TWI723178B (zh) | 2021-04-01 |
Family
ID=60573075
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106119234A TWI723178B (zh) | 2016-06-10 | 2017-06-09 | 微型裝置的無遮罩並行取放轉印 |
| TW110106637A TWI778528B (zh) | 2016-06-10 | 2017-06-09 | 微型裝置的無遮罩並行取放轉印 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110106637A TWI778528B (zh) | 2016-06-10 | 2017-06-09 | 微型裝置的無遮罩並行取放轉印 |
Country Status (7)
| Country | Link |
|---|---|
| US (5) | US10217793B2 (enExample) |
| EP (1) | EP3469424A4 (enExample) |
| JP (1) | JP6976972B2 (enExample) |
| KR (1) | KR102427231B1 (enExample) |
| CN (2) | CN116047871A (enExample) |
| TW (2) | TWI723178B (enExample) |
| WO (1) | WO2017214540A1 (enExample) |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6231432B2 (ja) * | 2014-05-02 | 2017-11-15 | 富士フイルム株式会社 | 導電性フイルム、それを備える表示装置及び導電性フイルムの評価方法 |
| US11756982B2 (en) | 2016-06-10 | 2023-09-12 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using mask layer |
| TWI723178B (zh) * | 2016-06-10 | 2021-04-01 | 美商應用材料股份有限公司 | 微型裝置的無遮罩並行取放轉印 |
| US11776989B2 (en) * | 2016-06-10 | 2023-10-03 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using treatment |
| CN106098697B (zh) * | 2016-06-15 | 2019-04-02 | 深圳市华星光电技术有限公司 | 微发光二极管显示面板及其制作方法 |
| US10978530B2 (en) * | 2016-11-25 | 2021-04-13 | Vuereal Inc. | Integration of microdevices into system substrate |
| TWI661533B (zh) * | 2017-06-07 | 2019-06-01 | Asti Global Inc., Taiwan | 晶片安裝系統以及晶片安裝方法 |
| US20190058081A1 (en) * | 2017-08-18 | 2019-02-21 | Khaled Ahmed | Micro light-emitting diode (led) display and assembly apparatus |
| US10511554B2 (en) | 2017-12-05 | 2019-12-17 | International Business Machines Corporation | Maintaining tribal knowledge for accelerated compliance control deployment |
| CN110120186A (zh) * | 2018-02-06 | 2019-08-13 | 南京瀚宇彩欣科技有限责任公司 | 显示模块 |
| US10593581B2 (en) * | 2018-02-26 | 2020-03-17 | Mikro Mesa Technology Co., Ltd. | Transfer head and method for transferring micro devices |
| US11637093B2 (en) * | 2018-05-24 | 2023-04-25 | Intel Corporation | Micro light-emitting diode display fabrication and assembly |
| US10985046B2 (en) * | 2018-06-22 | 2021-04-20 | Veeco Instruments Inc. | Micro-LED transfer methods using light-based debonding |
| WO2019246366A1 (en) * | 2018-06-22 | 2019-12-26 | Veeco Instruments Inc. | Micro-led transfer methods using light-based debonding |
| KR102782924B1 (ko) * | 2018-07-23 | 2025-03-19 | 삼성전자주식회사 | Led 전송 장치를 포함하는 전자 장치 및 그 제어 방법 |
| TW202008558A (zh) * | 2018-07-23 | 2020-02-16 | 飛傳科技股份有限公司 | 晶片轉移之方法及其晶片轉移系統 |
| US10761430B2 (en) * | 2018-09-13 | 2020-09-01 | Applied Materials, Inc. | Method to enhance the resolution of maskless lithography while maintaining a high image contrast |
| US10573544B1 (en) * | 2018-10-17 | 2020-02-25 | X-Celeprint Limited | Micro-transfer printing with selective component removal |
| US10796938B2 (en) | 2018-10-17 | 2020-10-06 | X Display Company Technology Limited | Micro-transfer printing with selective component removal |
| CN111129057B (zh) * | 2018-10-31 | 2023-06-20 | 成都辰显光电有限公司 | 微发光二极管阵列器件、制作方法及转移方法 |
| CN109524512B (zh) * | 2018-11-15 | 2020-07-03 | 华中科技大学 | 基于可控微反射镜阵列的微型发光二极管巨量转移方法 |
| KR102652723B1 (ko) * | 2018-11-20 | 2024-04-01 | 삼성전자주식회사 | 마이크로 led 전사 장치 및 이를 이용한 마이크로 led 전사 방법 |
| JP6911003B2 (ja) * | 2018-12-14 | 2021-07-28 | Tdk株式会社 | 素子アレイの製造方法と特定素子の除去方法 |
| JP7319044B2 (ja) * | 2018-12-14 | 2023-08-01 | Tdk株式会社 | 素子アレイの製造装置と特定素子の除去装置 |
| US11127720B2 (en) * | 2019-01-21 | 2021-09-21 | Nanosys, Inc. | Pixel repair method for a direct view display device |
| KR102895805B1 (ko) * | 2019-01-22 | 2025-12-04 | 삼성전자주식회사 | 음성 입력과 관련된 비주얼 정보를 표시하는 방법 및 이를 지원하는 전자 장치 |
| US11538786B2 (en) | 2019-03-19 | 2022-12-27 | Ordos Yuansheng Optoelectronics Co., Ltd. | Transfer printing method and transfer printing apparatus |
| EP3742477A1 (en) * | 2019-05-21 | 2020-11-25 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO | Light induced selective transfer of components using a jet of melted adhesive |
| KR20200135069A (ko) * | 2019-05-24 | 2020-12-02 | (주)포인트엔지니어링 | 마이크로 led 디스플레이 제작 방법 및 이를 이용한 마이크로 led 디스플레이 |
| US10964582B2 (en) * | 2019-06-24 | 2021-03-30 | Palo Alto Research Center Incorporated | Transfer substrate utilizing selectable surface adhesion transfer elements |
| KR20210023375A (ko) * | 2019-08-23 | 2021-03-04 | 삼성전자주식회사 | 레이저 전사 장치 및 이를 이용한 전사 방법 |
| USD966207S1 (en) * | 2019-09-23 | 2022-10-11 | Star Co Scientific Technologies Advanced Research Co, Llc | Light-emitting diode array |
| CN112701076A (zh) * | 2019-10-23 | 2021-04-23 | 北京小米移动软件有限公司 | 显示屏的制作方法及系统 |
| US11302561B2 (en) | 2019-11-12 | 2022-04-12 | Palo Alto Research Center Incorporated | Transfer elements that selectably hold and release objects based on changes in stiffness |
| WO2021109010A1 (zh) * | 2019-12-03 | 2021-06-10 | 重庆康佳光电技术研究院有限公司 | 一种半导体装置巨量转移方法和系统 |
| CN110993749B (zh) * | 2019-12-09 | 2021-02-23 | 深圳市华星光电半导体显示技术有限公司 | 微型发光二极管的巨量转移方法及显示面板 |
| EP3840030A1 (en) * | 2019-12-16 | 2021-06-23 | FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. | Massive parallel assembly method |
| KR102820198B1 (ko) | 2019-12-26 | 2025-06-13 | 삼성전자주식회사 | 엘이디 전사시스템 및 이의 제어 방법 |
| CN111128813B (zh) * | 2020-01-20 | 2022-10-28 | 福州大学 | 一种μLED巨量转移方法 |
| CN115039213A (zh) * | 2020-02-18 | 2022-09-09 | Ev 集团 E·索尔纳有限责任公司 | 用于传递构件的方法和装置 |
| US11348905B2 (en) * | 2020-03-02 | 2022-05-31 | Palo Alto Research Center Incorporated | Method and system for assembly of micro-LEDs onto a substrate |
| WO2021182318A1 (ja) * | 2020-03-09 | 2021-09-16 | 積水化学工業株式会社 | 電子部品の製造方法、及び、表示装置の製造方法 |
| KR102754349B1 (ko) * | 2020-03-20 | 2025-01-14 | 삼성전자주식회사 | 디스플레이 모듈 및 디스플레이 모듈의 리페어 방법 |
| KR102877471B1 (ko) * | 2020-03-30 | 2025-10-27 | 뷰리얼 인크. | 마이크로 디바이스 이송에서의 오프셋 정렬 및 보수 |
| US11199774B2 (en) * | 2020-03-30 | 2021-12-14 | Canon Kabushiki Kaisha | Method and apparatus to improve frame cure imaging resolution for extrusion control |
| EP4158683B1 (de) * | 2020-05-29 | 2024-04-10 | Erich Thallner | Verfahren zum bonden und debonden zweier substrate |
| US11343888B1 (en) * | 2020-12-15 | 2022-05-24 | Lumileds Llc | MicroLED power considering outlier pixel dynamic resistance |
| CN112768399B (zh) * | 2021-01-11 | 2022-10-04 | 深圳市华星光电半导体显示技术有限公司 | 转移基板及转移装置 |
| CN112968084A (zh) * | 2021-02-04 | 2021-06-15 | 深圳市华星光电半导体显示技术有限公司 | 显示面板及其制作方法 |
| JP7387666B2 (ja) * | 2021-03-15 | 2023-11-28 | 東レエンジニアリング株式会社 | チップ部品除去装置 |
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| TWI831363B (zh) * | 2021-09-20 | 2024-02-01 | 美商應用材料股份有限公司 | 使用處理來並行轉移微型設備的方法 |
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| US20170358478A1 (en) | 2017-12-14 |
| TW202129960A (zh) | 2021-08-01 |
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| TW201803107A (zh) | 2018-01-16 |
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| US20170358623A1 (en) | 2017-12-14 |
| CN116047871A (zh) | 2023-05-02 |
| US10153325B2 (en) | 2018-12-11 |
| US10319782B2 (en) | 2019-06-11 |
| US20200203423A1 (en) | 2020-06-25 |
| US10217793B2 (en) | 2019-02-26 |
| CN109196424A (zh) | 2019-01-11 |
| US10580826B2 (en) | 2020-03-03 |
| JP6976972B2 (ja) | 2021-12-08 |
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