JP2019530201A - マイクロデバイスのマスクレス並列ピックアンドプレース移載 - Google Patents
マイクロデバイスのマスクレス並列ピックアンドプレース移載 Download PDFInfo
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- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
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- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
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- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0015—Orientation; Alignment; Positioning
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0061—Tools for holding the circuit boards during processing; handling transport of printed circuit boards
- H05K13/0069—Holders for printed circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
- H05K13/046—Surface mounting
- H05K13/0469—Surface mounting by applying a glue or viscous material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
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- H—ELECTRICITY
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- H01L21/67011—Apparatus for manufacture or treatment
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- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
- H01L2221/68322—Auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
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- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68368—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
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- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
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- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
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Abstract
Description
移載体は、第2の支持体から着脱可能な移載基板であってもよい。第2の支持体は、移載基板を解放可能に保持するためのエンドエフェクタを有するロボットアームを備えてもよい。
Claims (16)
- 移載先基板上にマイクロデバイスを位置決め配置するための装置であって、
移載先基板を保持するための第1の支持体と、
粘着層を受け入れる表面を有する移載体を提供又は保持するための第2の支持体と、
前記第1の支持体と前記第2の支持体との間に相対動作を提供するように構成された1つ以上のアクチュエータと、
前記移載体の前記粘着層の領域を選択的にかつマスクを使用せずに露光するように構成された照射システムと、
コントローラであって、
前記1つ以上のアクチュエータに相対動作を生じさせることで、前記粘着層に取り付けられた複数のマイクロデバイスを前記移載先基板に接触させ、
前記照射システムで選択的に前記粘着層の1つ以上の部分を露光して1つ以上の無効化された部分を作り出し、
前記1つ以上のアクチュエータに相対動作を生じさせることで、前記表面と前記移載先基板が互いに離れ、前記粘着層の前記1つ以上の無効化された部分に対応する1つ以上のマイクロデバイスが前記移載先基板上に残るように構成されたコントローラとを備える装置。 - 移載元基板を保持する第3の支持体を備え、
前記1つ以上のアクチュエータは、前記第1の支持体と前記第3の支持体の間に相対動作を提供するように構成され、
前記コントローラは、前記1つ以上のアクチュエータに前記移載元基板と前記移載体の間に相対動作を生じさせることで、前記複数のマイクロデバイスが前記移載元基板上にあるときに前記移載基板の前記表面の前記粘着層が前記複数のマイクロデバイスに接触して、前記複数のマイクロデバイスが前記移載体の前記粘着層に付着する請求項1記載の装置。 - 前記第2の支持体は、ロボットアームを備えて前記移載体を保持し、
前記ロボットアームは、前記第3の支持体と前記第1の支持体との間で前記移載体を移動させるように動作可能である請求項2記載の装置。 - 前記移載体は、前記第2の支持体から着脱可能である移載基板を備える請求項1記載の装置。
- 前記照射システムは、個別に作動可能なミラーのアレイを有するデジタルミラーデバイスを備える請求項1記載の装置。
- 前記デジタルミラーデバイスは、ミラーの二次元アレイを備える請求項5記載の装置。
- 前記照射システムの視野は前記移載体の一部にしか及ばず、アクチュエータが前記二次元アレイと前記1つ以上の支持体の間に相対動作を生じさせる請求項6記載の装置。
- 前記デジタルミラーデバイスは、ミラーの直線アレイと、前記直線アレイ及び前記1つ以上の支持体の間に相対動作を生じさせるアクチュエータとを備える請求項5記載の装置。
- 移載元基板上の複数のマイクロデバイスを、粘着層を有する移載面に付着させる工程と、
前記複数のマイクロデバイスが前記移載面に付着した状態を維持すると共に、前記移載元基板から前記複数のマイクロデバイスを取り除く工程と、
移載先基板に対して前記移載面を位置決め配置して、前記移載面の前記複数のマイクロデバイスの少なくとも一部を前記移載先基板上の複数の収容位置の少なくとも一部に当接させる工程と、
マイクロデバイスのサブセットに対応する前記移載面の前記粘着層の複数の領域を選択的にかつマスクを使用せずに光に露光して、前記マイクロデバイスのサブセットを前記粘着層から取り外す工程であって、前記マイクロデバイスのサブセットは2つ以上のマイクロデバイスを含むが、前記複数のマイクロデバイスの全マイクロデバイスよりは少ないマイクロデバイスを含む工程と、
前記移載面を前記移載先基板から引き離して、前記マイクロデバイスのサブセットを前記移載先基板上に残す工程を含むマイクロデバイスの表面実装方法。 - 前記複数のマイクロデバイスは、前記移載元基板上の前記マイクロデバイスの全てを含む請求項9記載の方法。
- 前記複数のマイクロデバイスは、前記移載面に第1のアレイ状に配置されており、前記複数の収容位置は、前記移載先基板上に第2のアレイ状に配置されている請求項9記載の方法。
- 前記第1のアレイの空間密度は、前記第2のアレイの空間密度より大きい請求項11記載の方法。
- 前記マイクロデバイスは、マイクロLEDを含む請求項9記載の方法。
- 前記複数の領域の選択的な露光には、デジタルミラーデバイスに光を向ける工程と、前記デジタルミラーデバイスの選択されたミラーを作動させて、前記複数の領域へ向けて光を反射させる工程を含む請求項9記載の方法。
- 移載先基板上にマイクロデバイスを位置決め配置するための装置であって、
移載先基板を保持するための第1の支持体と、
粘着層を受け入れる表面を有する移載体を提供又は保持するための第2の支持体と、
前記移載体と前記第1の支持体の間に相対動作を提供するように構成された1つ以上のアクチュエータと、
光ビームを発生させる光源と、
前記光ビームを前記移載体の前記粘着層に調節可能に当てるように構成されたミラーと、
コントローラであって、
前記1つ以上のアクチュエータに相対動作を生じさせることで、前記移載体の前記粘着層に取り付けられた複数のマイクロデバイスを前記移載先基板に接触させ、
前記光源に前記光ビームを発生させて前記ミラーを調整して前記光ビームを前記粘着層に当てることで、選択的に前記粘着層の1つ以上の部分を露光して1つ以上の無効化された部分を作り出し、
前記1つ以上のアクチュエータに相対動作を生じさせることで、前記表面と前記移載先基板が互いに離れ、前記粘着層の前記1つ以上の無効化された部分に対応する1つ以上のマイクロデバイスが前記移載先基板上に残るように構成されたコントローラとを備える装置。 - 前記光源はレーザ装置を含み、前記光ビームはレーザビームを含む請求項15記載の装置。
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US20200203423A1 (en) | 2020-06-25 |
US20190103439A1 (en) | 2019-04-04 |
US20170358623A1 (en) | 2017-12-14 |
CN116047871A (zh) | 2023-05-02 |
TW201803107A (zh) | 2018-01-16 |
US20190189685A1 (en) | 2019-06-20 |
US10153325B2 (en) | 2018-12-11 |
US20170358478A1 (en) | 2017-12-14 |
TWI778528B (zh) | 2022-09-21 |
TW202129960A (zh) | 2021-08-01 |
US11127781B2 (en) | 2021-09-21 |
CN109196424A (zh) | 2019-01-11 |
KR102427231B1 (ko) | 2022-07-28 |
WO2017214540A1 (en) | 2017-12-14 |
EP3469424A1 (en) | 2019-04-17 |
US10580826B2 (en) | 2020-03-03 |
TWI723178B (zh) | 2021-04-01 |
US10319782B2 (en) | 2019-06-11 |
EP3469424A4 (en) | 2020-01-15 |
KR20190008423A (ko) | 2019-01-23 |
JP6976972B2 (ja) | 2021-12-08 |
US10217793B2 (en) | 2019-02-26 |
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