CN116047871A - 微型装置的无掩模并行取放转印 - Google Patents

微型装置的无掩模并行取放转印 Download PDF

Info

Publication number
CN116047871A
CN116047871A CN202310084142.XA CN202310084142A CN116047871A CN 116047871 A CN116047871 A CN 116047871A CN 202310084142 A CN202310084142 A CN 202310084142A CN 116047871 A CN116047871 A CN 116047871A
Authority
CN
China
Prior art keywords
microdevices
substrate
transfer
adhesive layer
target substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202310084142.XA
Other languages
English (en)
Chinese (zh)
Inventor
曼尼凡南·托塔德里
罗伯特·詹·维瑟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN116047871A publication Critical patent/CN116047871A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H10H29/14Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
    • H10H29/142Two-dimensional arrangements, e.g. asymmetric LED layout
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825Mounting of individual elements, e.g. mounts, holders or supports
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/03Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/075Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10H20/00
    • H01L25/0753Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10H20/00 the devices being arranged next to each other
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/0015Orientation; Alignment; Positioning
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/0061Tools for holding the circuit boards during processing; handling transport of printed circuit boards
    • H05K13/0069Holders for printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/04Mounting of components, e.g. of leadless components
    • H05K13/046Surface mounting
    • H05K13/0469Surface mounting by applying a glue or viscous material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/303Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
    • H05K3/305Affixing by adhesive
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/018Bonding of wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/855Optical field-shaping means, e.g. lenses
    • H10H20/856Reflecting means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • H01L2221/68322Auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68368Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/819Bodies characterised by their shape, e.g. curved or truncated substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Led Device Packages (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Liquid Crystal (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Die Bonding (AREA)
  • Specific Conveyance Elements (AREA)
CN202310084142.XA 2016-06-10 2017-06-09 微型装置的无掩模并行取放转印 Pending CN116047871A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201662348691P 2016-06-10 2016-06-10
US62/348,691 2016-06-10
CN201780032280.6A CN109196424A (zh) 2016-06-10 2017-06-09 微型装置的无掩模并行取放转印
PCT/US2017/036804 WO2017214540A1 (en) 2016-06-10 2017-06-09 Maskless parallel pick-and-place transfer of micro-devices

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201780032280.6A Division CN109196424A (zh) 2016-06-10 2017-06-09 微型装置的无掩模并行取放转印

Publications (1)

Publication Number Publication Date
CN116047871A true CN116047871A (zh) 2023-05-02

Family

ID=60573075

Family Applications (2)

Application Number Title Priority Date Filing Date
CN202310084142.XA Pending CN116047871A (zh) 2016-06-10 2017-06-09 微型装置的无掩模并行取放转印
CN201780032280.6A Pending CN109196424A (zh) 2016-06-10 2017-06-09 微型装置的无掩模并行取放转印

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201780032280.6A Pending CN109196424A (zh) 2016-06-10 2017-06-09 微型装置的无掩模并行取放转印

Country Status (7)

Country Link
US (5) US10217793B2 (enExample)
EP (1) EP3469424A4 (enExample)
JP (1) JP6976972B2 (enExample)
KR (1) KR102427231B1 (enExample)
CN (2) CN116047871A (enExample)
TW (2) TWI723178B (enExample)
WO (1) WO2017214540A1 (enExample)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6231432B2 (ja) * 2014-05-02 2017-11-15 富士フイルム株式会社 導電性フイルム、それを備える表示装置及び導電性フイルムの評価方法
TWI723178B (zh) * 2016-06-10 2021-04-01 美商應用材料股份有限公司 微型裝置的無遮罩並行取放轉印
US11776989B2 (en) 2016-06-10 2023-10-03 Applied Materials, Inc. Methods of parallel transfer of micro-devices using treatment
US11756982B2 (en) 2016-06-10 2023-09-12 Applied Materials, Inc. Methods of parallel transfer of micro-devices using mask layer
CN106098697B (zh) * 2016-06-15 2019-04-02 深圳市华星光电技术有限公司 微发光二极管显示面板及其制作方法
US10978530B2 (en) * 2016-11-25 2021-04-13 Vuereal Inc. Integration of microdevices into system substrate
TWI661533B (zh) * 2017-06-07 2019-06-01 Asti Global Inc., Taiwan 晶片安裝系統以及晶片安裝方法
US20190058081A1 (en) * 2017-08-18 2019-02-21 Khaled Ahmed Micro light-emitting diode (led) display and assembly apparatus
US10511554B2 (en) 2017-12-05 2019-12-17 International Business Machines Corporation Maintaining tribal knowledge for accelerated compliance control deployment
CN110120186A (zh) * 2018-02-06 2019-08-13 南京瀚宇彩欣科技有限责任公司 显示模块
US10593581B2 (en) * 2018-02-26 2020-03-17 Mikro Mesa Technology Co., Ltd. Transfer head and method for transferring micro devices
US11637093B2 (en) * 2018-05-24 2023-04-25 Intel Corporation Micro light-emitting diode display fabrication and assembly
WO2019246366A1 (en) * 2018-06-22 2019-12-26 Veeco Instruments Inc. Micro-led transfer methods using light-based debonding
US10985046B2 (en) * 2018-06-22 2021-04-20 Veeco Instruments Inc. Micro-LED transfer methods using light-based debonding
KR102782924B1 (ko) 2018-07-23 2025-03-19 삼성전자주식회사 Led 전송 장치를 포함하는 전자 장치 및 그 제어 방법
TW202008558A (zh) * 2018-07-23 2020-02-16 飛傳科技股份有限公司 晶片轉移之方法及其晶片轉移系統
US10761430B2 (en) * 2018-09-13 2020-09-01 Applied Materials, Inc. Method to enhance the resolution of maskless lithography while maintaining a high image contrast
US10573544B1 (en) * 2018-10-17 2020-02-25 X-Celeprint Limited Micro-transfer printing with selective component removal
US10796938B2 (en) 2018-10-17 2020-10-06 X Display Company Technology Limited Micro-transfer printing with selective component removal
CN111129057B (zh) * 2018-10-31 2023-06-20 成都辰显光电有限公司 微发光二极管阵列器件、制作方法及转移方法
CN109524512B (zh) * 2018-11-15 2020-07-03 华中科技大学 基于可控微反射镜阵列的微型发光二极管巨量转移方法
KR102652723B1 (ko) * 2018-11-20 2024-04-01 삼성전자주식회사 마이크로 led 전사 장치 및 이를 이용한 마이크로 led 전사 방법
JP7319044B2 (ja) * 2018-12-14 2023-08-01 Tdk株式会社 素子アレイの製造装置と特定素子の除去装置
JP6911003B2 (ja) * 2018-12-14 2021-07-28 Tdk株式会社 素子アレイの製造方法と特定素子の除去方法
US11127720B2 (en) * 2019-01-21 2021-09-21 Nanosys, Inc. Pixel repair method for a direct view display device
EP3888083A4 (en) * 2019-01-22 2022-04-20 Samsung Electronics Co., Ltd. METHOD FOR DISPLAYING VISUAL INFORMATION LINKED TO VOICE INPUT AND ELECTRONIC DEVICE THEREFORE
US11538786B2 (en) 2019-03-19 2022-12-27 Ordos Yuansheng Optoelectronics Co., Ltd. Transfer printing method and transfer printing apparatus
EP3742477A1 (en) * 2019-05-21 2020-11-25 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO Light induced selective transfer of components using a jet of melted adhesive
KR20200135069A (ko) * 2019-05-24 2020-12-02 (주)포인트엔지니어링 마이크로 led 디스플레이 제작 방법 및 이를 이용한 마이크로 led 디스플레이
US10964582B2 (en) * 2019-06-24 2021-03-30 Palo Alto Research Center Incorporated Transfer substrate utilizing selectable surface adhesion transfer elements
KR20210023375A (ko) * 2019-08-23 2021-03-04 삼성전자주식회사 레이저 전사 장치 및 이를 이용한 전사 방법
USD966207S1 (en) * 2019-09-23 2022-10-11 Star Co Scientific Technologies Advanced Research Co, Llc Light-emitting diode array
CN112701076A (zh) * 2019-10-23 2021-04-23 北京小米移动软件有限公司 显示屏的制作方法及系统
US11302561B2 (en) 2019-11-12 2022-04-12 Palo Alto Research Center Incorporated Transfer elements that selectably hold and release objects based on changes in stiffness
CN113228243A (zh) * 2019-12-03 2021-08-06 重庆康佳光电技术研究院有限公司 一种半导体装置巨量转移方法和系统
CN110993749B (zh) * 2019-12-09 2021-02-23 深圳市华星光电半导体显示技术有限公司 微型发光二极管的巨量转移方法及显示面板
EP3840030A1 (en) * 2019-12-16 2021-06-23 FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. Massive parallel assembly method
KR102820198B1 (ko) 2019-12-26 2025-06-13 삼성전자주식회사 엘이디 전사시스템 및 이의 제어 방법
CN111128813B (zh) * 2020-01-20 2022-10-28 福州大学 一种μLED巨量转移方法
WO2021164855A1 (de) * 2020-02-18 2021-08-26 Ev Group E. Thallner Gmbh Verfahren und vorrichtung zur übertragung von bauteilen
US11348905B2 (en) * 2020-03-02 2022-05-31 Palo Alto Research Center Incorporated Method and system for assembly of micro-LEDs onto a substrate
CN114902388A (zh) * 2020-03-09 2022-08-12 积水化学工业株式会社 电子部件的制造方法、及显示装置的制造方法
KR102754349B1 (ko) * 2020-03-20 2025-01-14 삼성전자주식회사 디스플레이 모듈 및 디스플레이 모듈의 리페어 방법
US11199774B2 (en) * 2020-03-30 2021-12-14 Canon Kabushiki Kaisha Method and apparatus to improve frame cure imaging resolution for extrusion control
US12381104B2 (en) * 2020-03-30 2025-08-05 Vuereal Inc. Offset alignment and repair in micro device transfer
EP4158683B1 (de) * 2020-05-29 2024-04-10 Erich Thallner Verfahren zum bonden und debonden zweier substrate
US11343888B1 (en) * 2020-12-15 2022-05-24 Lumileds Llc MicroLED power considering outlier pixel dynamic resistance
CN112768399B (zh) * 2021-01-11 2022-10-04 深圳市华星光电半导体显示技术有限公司 转移基板及转移装置
CN112968084A (zh) * 2021-02-04 2021-06-15 深圳市华星光电半导体显示技术有限公司 显示面板及其制作方法
JP7387666B2 (ja) * 2021-03-15 2023-11-28 東レエンジニアリング株式会社 チップ部品除去装置
TWI831363B (zh) * 2021-09-20 2024-02-01 美商應用材料股份有限公司 使用處理來並行轉移微型設備的方法
TWI836592B (zh) * 2021-09-20 2024-03-21 美商應用材料股份有限公司 使用掩模層來並行轉移微型設備的方法
EP4430657A1 (en) * 2021-11-11 2024-09-18 Terecircuits Corporation Photochemical and thermal release layer processes and uses in device manufacturing
CN114170922A (zh) * 2021-12-08 2022-03-11 Tcl华星光电技术有限公司 显示面板及其制造方法
WO2023108450A1 (zh) * 2021-12-15 2023-06-22 厦门市芯颖显示科技有限公司 寻址转移设备
US20240036363A1 (en) * 2022-07-28 2024-02-01 Palo Alto Research Center Incorporated Optically activated object mass transfer apparatus
CN115356794A (zh) * 2022-09-15 2022-11-18 苏州晶方光电科技有限公司 晶圆级微透镜阵列的压印固化设备、制造方法及应用
JP2025099629A (ja) 2023-12-22 2025-07-03 エルジー ディスプレイ カンパニー リミテッド 表示装置および表示装置の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030087476A1 (en) * 2001-09-06 2003-05-08 Toyoharu Oohata Method of transferring devices, method of arranging devices using the same, and method of manufacturing an image display system
WO2006063652A1 (en) * 2004-12-16 2006-06-22 Smart Res S.R.L. System for multiple removal of microchips from a wafer consisting of a plurality of microchips
CN1963672A (zh) * 2005-11-07 2007-05-16 中芯国际集成电路制造(上海)有限公司 利用微机电系统制造集成电路的可重构掩模的方法和器件
CN101859714A (zh) * 2009-04-10 2010-10-13 索尼公司 显示器制造方法和显示器
GB201520072D0 (en) * 2015-11-13 2015-12-30 Infiniled Ltd A method and apparatus for use in the manufacture of a display element
CN105493297A (zh) * 2015-05-21 2016-04-13 歌尔声学股份有限公司 微发光二极管的转移方法、制造方法、装置和电子设备

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5467146A (en) * 1994-03-31 1995-11-14 Texas Instruments Incorporated Illumination control unit for display system with spatial light modulator
JP2001305664A (ja) * 2000-04-20 2001-11-02 Fuji Photo Film Co Ltd プリンタ
JP4491948B2 (ja) * 2000-10-06 2010-06-30 ソニー株式会社 素子実装方法および画像表示装置の製造方法
JP2003005100A (ja) * 2001-06-26 2003-01-08 Canon Inc 光変調器およびそれを用いた投射装置
JP2004299814A (ja) * 2003-03-28 2004-10-28 Takasago Thermal Eng Co Ltd 除電された絶縁体基板の製造方法及び製造装置
JP4463537B2 (ja) * 2003-12-12 2010-05-19 財団法人国際科学振興財団 パターン露光装置
US7744770B2 (en) * 2004-06-23 2010-06-29 Sony Corporation Device transfer method
JP4588428B2 (ja) * 2004-12-09 2010-12-01 富士フイルム株式会社 画像露光方法および装置
JP4686753B2 (ja) * 2004-12-14 2011-05-25 独立行政法人産業技術総合研究所 露光方法及び露光装置
US9401298B2 (en) * 2005-04-08 2016-07-26 PAC Tech—Packaging Technologies GmbH Method and device for transferring a chip to a contact substrate
JP2007025085A (ja) * 2005-07-14 2007-02-01 Nikon Corp 露光装置、光学素子アレー及びマルチスポットビームジェネレータ、並びにデバイス製造方法
US20080122119A1 (en) * 2006-08-31 2008-05-29 Avery Dennison Corporation Method and apparatus for creating rfid devices using masking techniques
JP2008122681A (ja) * 2006-11-13 2008-05-29 Sony Corp 物品の実装方法、発光ダイオード表示装置の製造方法、及び、物品中間物の仮固定用基板への仮固定方法
JP2010014797A (ja) * 2008-07-01 2010-01-21 Nsk Ltd マスクレス露光装置
WO2010059781A1 (en) * 2008-11-19 2010-05-27 Semprius, Inc. Printing semiconductor elements by shear-assisted elastomeric stamp transfer
US20120025182A1 (en) 2009-04-03 2012-02-02 Sharp Kabushiki Kaisha Donor substrate, process for production of transfer film, and process for production of organic electroluminescent element
JP5444798B2 (ja) * 2009-04-10 2014-03-19 ソニー株式会社 素子の移載方法
US8865489B2 (en) * 2009-05-12 2014-10-21 The Board Of Trustees Of The University Of Illinois Printed assemblies of ultrathin, microscale inorganic light emitting diodes for deformable and semitransparent displays
JP6053756B2 (ja) * 2011-04-11 2016-12-27 エヌディーエスユー リサーチ ファウンデーション レーザで促進される、分離した部品の選択的な転写
WO2013010113A1 (en) 2011-07-14 2013-01-17 The Board Of Trustees Of The University Of Illinois Non-contact transfer printing
US20130207544A1 (en) 2011-09-30 2013-08-15 Pinebrook Imaging Technology, Ltd. Illumination system
US8518204B2 (en) * 2011-11-18 2013-08-27 LuxVue Technology Corporation Method of fabricating and transferring a micro device and an array of micro devices utilizing an intermediate electrically conductive bonding layer
JP2015521303A (ja) 2012-03-30 2015-07-27 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシ 表面への形状適合可能な付属物装着可能電子デバイス
US9250509B2 (en) 2012-06-04 2016-02-02 Applied Materials, Inc. Optical projection array exposure system
US9331230B2 (en) * 2012-10-30 2016-05-03 Cbrite Inc. LED die dispersal in displays and light panels with preserving neighboring relationship
JP6306603B2 (ja) * 2012-11-08 2018-04-04 ディーディーエム システムズ, インコーポレイテッド 3次元オブジェクトを加工するためのシステムおよび方法
CN113437054B (zh) * 2014-06-18 2025-01-28 艾克斯展示公司技术有限公司 微组装led显示器
US9927723B2 (en) 2015-03-24 2018-03-27 Applied Materials, Inc. Apparatus and methods for on-the-fly digital exposure image data modification
TWI723178B (zh) 2016-06-10 2021-04-01 美商應用材料股份有限公司 微型裝置的無遮罩並行取放轉印

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030087476A1 (en) * 2001-09-06 2003-05-08 Toyoharu Oohata Method of transferring devices, method of arranging devices using the same, and method of manufacturing an image display system
WO2006063652A1 (en) * 2004-12-16 2006-06-22 Smart Res S.R.L. System for multiple removal of microchips from a wafer consisting of a plurality of microchips
CN1963672A (zh) * 2005-11-07 2007-05-16 中芯国际集成电路制造(上海)有限公司 利用微机电系统制造集成电路的可重构掩模的方法和器件
CN101859714A (zh) * 2009-04-10 2010-10-13 索尼公司 显示器制造方法和显示器
CN105493297A (zh) * 2015-05-21 2016-04-13 歌尔声学股份有限公司 微发光二极管的转移方法、制造方法、装置和电子设备
GB201520072D0 (en) * 2015-11-13 2015-12-30 Infiniled Ltd A method and apparatus for use in the manufacture of a display element

Also Published As

Publication number Publication date
JP6976972B2 (ja) 2021-12-08
US10319782B2 (en) 2019-06-11
JP2019530201A (ja) 2019-10-17
KR102427231B1 (ko) 2022-07-28
CN109196424A (zh) 2019-01-11
TW202129960A (zh) 2021-08-01
EP3469424A1 (en) 2019-04-17
TW201803107A (zh) 2018-01-16
US20190103439A1 (en) 2019-04-04
TWI778528B (zh) 2022-09-21
US20170358623A1 (en) 2017-12-14
US10217793B2 (en) 2019-02-26
KR20190008423A (ko) 2019-01-23
US10580826B2 (en) 2020-03-03
WO2017214540A1 (en) 2017-12-14
US20190189685A1 (en) 2019-06-20
US11127781B2 (en) 2021-09-21
US20170358478A1 (en) 2017-12-14
US10153325B2 (en) 2018-12-11
EP3469424A4 (en) 2020-01-15
US20200203423A1 (en) 2020-06-25
TWI723178B (zh) 2021-04-01

Similar Documents

Publication Publication Date Title
TWI723178B (zh) 微型裝置的無遮罩並行取放轉印
US12176239B2 (en) Parallel assembly of discrete components onto a substrate
US12176384B2 (en) Methods of parallel transfer of micro-devices using treatment
US11201077B2 (en) Parallel assembly of discrete components onto a substrate
US8361268B2 (en) Method of transferring device
US11756982B2 (en) Methods of parallel transfer of micro-devices using mask layer
TW201834194A (zh) 用於在基板間轉移電子元件的方法及設備
TWI831363B (zh) 使用處理來並行轉移微型設備的方法
TWI836592B (zh) 使用掩模層來並行轉移微型設備的方法
JP4674467B2 (ja) 基板搬送方法、基板搬送装置、露光方法、露光装置及びマイクロデバイスの製造方法
US12471427B2 (en) Display module and method for manufacturing display module

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination