TWI683183B - 硬化性樹脂組成物、使用其的抗反射膜及固體攝像元件 - Google Patents

硬化性樹脂組成物、使用其的抗反射膜及固體攝像元件 Download PDF

Info

Publication number
TWI683183B
TWI683183B TW104104489A TW104104489A TWI683183B TW I683183 B TWI683183 B TW I683183B TW 104104489 A TW104104489 A TW 104104489A TW 104104489 A TW104104489 A TW 104104489A TW I683183 B TWI683183 B TW I683183B
Authority
TW
Taiwan
Prior art keywords
group
resin composition
curable resin
mass
formula
Prior art date
Application number
TW104104489A
Other languages
English (en)
Chinese (zh)
Other versions
TW201546550A (zh
Inventor
山本啓之
嶋田和人
山崎和彦
増山弘太郎
日向野怜子
Original Assignee
日商富士軟片股份有限公司
日商三菱綜合材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司, 日商三菱綜合材料股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW201546550A publication Critical patent/TW201546550A/zh
Application granted granted Critical
Publication of TWI683183B publication Critical patent/TWI683183B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F292/00—Macromolecular compounds obtained by polymerising monomers on to inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polymerisation Methods In General (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW104104489A 2014-02-12 2015-02-11 硬化性樹脂組成物、使用其的抗反射膜及固體攝像元件 TWI683183B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-024830 2014-02-12
JP2014024830 2014-02-12

Publications (2)

Publication Number Publication Date
TW201546550A TW201546550A (zh) 2015-12-16
TWI683183B true TWI683183B (zh) 2020-01-21

Family

ID=53800138

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104104489A TWI683183B (zh) 2014-02-12 2015-02-11 硬化性樹脂組成物、使用其的抗反射膜及固體攝像元件

Country Status (4)

Country Link
JP (1) JP6249530B2 (ko)
KR (1) KR101830204B1 (ko)
TW (1) TWI683183B (ko)
WO (1) WO2015122395A1 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6733235B2 (ja) * 2016-03-17 2020-07-29 三菱マテリアル株式会社 低屈折率膜形成用液組成物
WO2017217474A1 (ja) 2016-06-17 2017-12-21 富士フイルム株式会社 膜形成用組成物、及び積層体の製造方法
WO2018021313A1 (ja) * 2016-07-29 2018-02-01 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
JP6853016B2 (ja) * 2016-10-31 2021-03-31 東京応化工業株式会社 低屈折率膜形成用感光性樹脂組成物、低屈折率膜、光学デバイス、及び低屈折率膜の製造方法
JP2018145339A (ja) * 2017-03-08 2018-09-20 三菱マテリアル株式会社 低屈折率膜形成用液組成物及びこれを用いた低屈折率膜の形成方法
TWI756388B (zh) * 2017-03-24 2022-03-01 日商富士軟片股份有限公司 結構體、近紅外線透射濾波層形成用組成物及光感測器
JP7129247B2 (ja) * 2018-07-02 2022-09-01 キヤノン株式会社 コーティング組成物とその製造方法、および光学部材、ならびに撮像装置
WO2020116300A1 (ja) * 2018-12-05 2020-06-11 富士フイルム株式会社 組成物および膜の製造方法
JP7212765B2 (ja) 2019-03-29 2023-01-25 富士フイルム株式会社 組成物、膜および膜の製造方法
WO2020261905A1 (ja) * 2019-06-25 2020-12-30 昭和電工株式会社 感光性樹脂組成物、樹脂硬化膜及び画像表示素子

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200516000A (en) * 2003-08-28 2005-05-16 Dainippon Printing Co Ltd Anti-reflection laminate
TW201402703A (zh) * 2012-06-06 2014-01-16 Mitsubishi Materials Corp 低折射率膜形成用組成物及使用此之低折射率膜之形成方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3383050B2 (ja) * 1993-12-28 2003-03-04 大日本印刷株式会社 最密充填塗膜、その製造方法及び最密充填塗膜形成フィルム
JP4032185B2 (ja) 1995-12-01 2008-01-16 日産化学工業株式会社 低屈折率及び撥水性を有する被膜
JPH11292568A (ja) * 1997-12-09 1999-10-26 Nippon Sheet Glass Co Ltd 反射防止ガラス板、その製造方法および反射防止膜用被覆組成物
JP2001262011A (ja) * 2000-03-16 2001-09-26 Nof Corp 含フッ素硬化性塗液、用途及び製造方法
JP4419422B2 (ja) * 2002-06-24 2010-02-24 三菱化学株式会社 活性エネルギー線硬化性有機無機ハイブリッド樹脂組成物
TWI238894B (en) * 2003-02-21 2005-09-01 Asahi Kasei Corp Laminate containing silica and application composition for forming porous silica layer
JP4816223B2 (ja) * 2005-04-26 2011-11-16 住友化学株式会社 反射防止積層体の製造方法
JP4726198B2 (ja) * 2005-04-27 2011-07-20 日本化薬株式会社 感光性樹脂組成物及びその硬化皮膜を有するフィルム
JP2008258202A (ja) * 2007-03-30 2008-10-23 Fujifilm Corp 固体撮像素子及び固体撮像素子の製造方法
KR20100133381A (ko) * 2008-02-29 2010-12-21 스미또모 가가꾸 가부시키가이샤 적층체의 제조 방법
DE102010025396A1 (de) * 2009-07-01 2011-04-21 Sumitomo Chemical Co., Ltd. Mehrschichtiger Gegenstand
JP2012215833A (ja) * 2011-03-31 2012-11-08 Toyo Ink Sc Holdings Co Ltd 感光性樹脂組成物およびタッチパネル用絶縁膜
KR20150037734A (ko) * 2012-07-24 2015-04-08 니폰 가야꾸 가부시끼가이샤 감광성 수지 조성물 및 반사 방지 필름

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200516000A (en) * 2003-08-28 2005-05-16 Dainippon Printing Co Ltd Anti-reflection laminate
TW201402703A (zh) * 2012-06-06 2014-01-16 Mitsubishi Materials Corp 低折射率膜形成用組成物及使用此之低折射率膜之形成方法

Also Published As

Publication number Publication date
KR20160103040A (ko) 2016-08-31
TW201546550A (zh) 2015-12-16
JP2015166449A (ja) 2015-09-24
WO2015122395A1 (ja) 2015-08-20
KR101830204B1 (ko) 2018-02-20
JP6249530B2 (ja) 2017-12-20

Similar Documents

Publication Publication Date Title
TWI683183B (zh) 硬化性樹脂組成物、使用其的抗反射膜及固體攝像元件
JP7232881B2 (ja) 着色感光性組成物、硬化膜、パターン形成方法、遮光膜付き赤外光カットフィルタ、固体撮像素子、画像表示装置および赤外線センサ
KR101891094B1 (ko) 착색 조성물, 및 이것을 이용한 경화막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치와 염료 다량체
TWI604017B (zh) 著色組成物、硬化膜、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝像元件以及圖像顯示裝置
TWI585134B (zh) 分散組成物及其製造方法、使用其的硬化性組成物、透明膜、微透鏡以及固體攝影元件
US20120262793A1 (en) Black curable composition for wafer - level lens, and wafer - level lens
TWI691460B (zh) 光學機能層形成用組成物、使用其的固體攝像元件及照相機模組、以及光學機能層的圖案形成方法、固體攝像元件及照相機模組的製造方法
TW201536871A (zh) 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、圖像顯示裝置、有機電激發光元件、色素及色素的製造方法
TWI632179B (zh) 分散組成物及其製造方法、使用其的硬化性組成物、透明膜、微透鏡以及固體攝影元件
US8975005B2 (en) Black curable composition for wafer level lens and wafer level lens
TW201802591A (zh) 硬化性組成物、遮光膜、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝像元件、紅外線感測器
TWI625365B (zh) 著色組成物、硬化膜、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
WO2014192716A1 (ja) カラーフィルタの製造方法、下地層形成用組成物、有機ｅｌ表示装置
TWI830746B (zh) 組成物、膜、透鏡、固體攝像元件、化合物
WO2012046826A1 (en) Black polymerizable composition and method for producing a black layer
TWI658326B (zh) 感放射線性組成物及其製造方法、硬化膜、彩色濾光片及其製造方法、圖案形成方法、固體攝像元件及圖像顯示裝置
JP2020024419A (ja) ネガ型硬化性着色組成物、硬化膜、カラーフィルタ、パターン形成方法及び装置