JP6249530B2 - 硬化性樹脂組成物、これを用いた反射防止膜、固体撮像素子およびカメラモジュール - Google Patents

硬化性樹脂組成物、これを用いた反射防止膜、固体撮像素子およびカメラモジュール Download PDF

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JP6249530B2
JP6249530B2 JP2015022810A JP2015022810A JP6249530B2 JP 6249530 B2 JP6249530 B2 JP 6249530B2 JP 2015022810 A JP2015022810 A JP 2015022810A JP 2015022810 A JP2015022810 A JP 2015022810A JP 6249530 B2 JP6249530 B2 JP 6249530B2
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resin composition
curable resin
mass
preferable
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JP2015166449A (ja
Inventor
啓之 山本
啓之 山本
嶋田　和人
和人 嶋田
山崎　和彦
和彦 山崎
弘太郎 増山
弘太郎 増山
怜子 日向野
怜子 日向野
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Mitsubishi Materials Corp
Fujifilm Corp
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Mitsubishi Materials Corp
Fujifilm Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F292/00—Macromolecular compounds obtained by polymerising monomers on to inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
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    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
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    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polymerisation Methods In General (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2015022810A 2014-02-12 2015-02-09 硬化性樹脂組成物、これを用いた反射防止膜、固体撮像素子およびカメラモジュール Active JP6249530B2 (ja)

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JP2015022810A JP6249530B2 (ja) 2014-02-12 2015-02-09 硬化性樹脂組成物、これを用いた反射防止膜、固体撮像素子およびカメラモジュール

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JP2014024830 2014-02-12
JP2014024830 2014-02-12
JP2015022810A JP6249530B2 (ja) 2014-02-12 2015-02-09 硬化性樹脂組成物、これを用いた反射防止膜、固体撮像素子およびカメラモジュール

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JP2015166449A JP2015166449A (ja) 2015-09-24
JP6249530B2 true JP6249530B2 (ja) 2017-12-20

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JP (1) JP6249530B2 (ko)
KR (1) KR101830204B1 (ko)
TW (1) TWI683183B (ko)
WO (1) WO2015122395A1 (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6733235B2 (ja) * 2016-03-17 2020-07-29 三菱マテリアル株式会社 低屈折率膜形成用液組成物
WO2017217474A1 (ja) 2016-06-17 2017-12-21 富士フイルム株式会社 膜形成用組成物、及び積層体の製造方法
WO2018021313A1 (ja) * 2016-07-29 2018-02-01 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
JP6853016B2 (ja) * 2016-10-31 2021-03-31 東京応化工業株式会社 低屈折率膜形成用感光性樹脂組成物、低屈折率膜、光学デバイス、及び低屈折率膜の製造方法
JP2018145339A (ja) * 2017-03-08 2018-09-20 三菱マテリアル株式会社 低屈折率膜形成用液組成物及びこれを用いた低屈折率膜の形成方法
TWI756388B (zh) * 2017-03-24 2022-03-01 日商富士軟片股份有限公司 結構體、近紅外線透射濾波層形成用組成物及光感測器
JP7129247B2 (ja) * 2018-07-02 2022-09-01 キヤノン株式会社 コーティング組成物とその製造方法、および光学部材、ならびに撮像装置
WO2020116300A1 (ja) * 2018-12-05 2020-06-11 富士フイルム株式会社 組成物および膜の製造方法
JP7212765B2 (ja) 2019-03-29 2023-01-25 富士フイルム株式会社 組成物、膜および膜の製造方法
WO2020261905A1 (ja) * 2019-06-25 2020-12-30 昭和電工株式会社 感光性樹脂組成物、樹脂硬化膜及び画像表示素子

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JP3383050B2 (ja) * 1993-12-28 2003-03-04 大日本印刷株式会社 最密充填塗膜、その製造方法及び最密充填塗膜形成フィルム
JP4032185B2 (ja) 1995-12-01 2008-01-16 日産化学工業株式会社 低屈折率及び撥水性を有する被膜
JPH11292568A (ja) * 1997-12-09 1999-10-26 Nippon Sheet Glass Co Ltd 反射防止ガラス板、その製造方法および反射防止膜用被覆組成物
JP2001262011A (ja) * 2000-03-16 2001-09-26 Nof Corp 含フッ素硬化性塗液、用途及び製造方法
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KR20160103040A (ko) 2016-08-31
TW201546550A (zh) 2015-12-16
JP2015166449A (ja) 2015-09-24
WO2015122395A1 (ja) 2015-08-20
TWI683183B (zh) 2020-01-21
KR101830204B1 (ko) 2018-02-20

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