TWI626439B - 缺陷檢查系統 - Google Patents

缺陷檢查系統 Download PDF

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Publication number
TWI626439B
TWI626439B TW103120087A TW103120087A TWI626439B TW I626439 B TWI626439 B TW I626439B TW 103120087 A TW103120087 A TW 103120087A TW 103120087 A TW103120087 A TW 103120087A TW I626439 B TWI626439 B TW I626439B
Authority
TW
Taiwan
Prior art keywords
film
defect inspection
mask
defect
inspection system
Prior art date
Application number
TW103120087A
Other languages
English (en)
Chinese (zh)
Other versions
TW201502495A (zh
Inventor
末松綾子
井村圭太
Original Assignee
日商住友化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友化學股份有限公司 filed Critical 日商住友化學股份有限公司
Publication of TW201502495A publication Critical patent/TW201502495A/zh
Application granted granted Critical
Publication of TWI626439B publication Critical patent/TWI626439B/zh

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8914Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the material examined
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/02Mechanical

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)
TW103120087A 2013-06-12 2014-06-10 缺陷檢查系統 TWI626439B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013124040A JP6177017B2 (ja) 2013-06-12 2013-06-12 欠陥検査システム
JPJP2013-124040 2013-06-12

Publications (2)

Publication Number Publication Date
TW201502495A TW201502495A (zh) 2015-01-16
TWI626439B true TWI626439B (zh) 2018-06-11

Family

ID=52022245

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103120087A TWI626439B (zh) 2013-06-12 2014-06-10 缺陷檢查系統

Country Status (5)

Country Link
JP (1) JP6177017B2 (ko)
KR (2) KR102369758B1 (ko)
CN (1) CN105247351B (ko)
TW (1) TWI626439B (ko)
WO (1) WO2014199952A1 (ko)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6641093B2 (ja) * 2015-03-20 2020-02-05 住友化学株式会社 光学フィルム及び積層光学フィルムの欠陥検査方法
JP6704230B2 (ja) * 2015-09-30 2020-06-03 日東電工株式会社 長尺状偏光子の検査方法、検査システムおよび製造方法
KR101748208B1 (ko) * 2016-03-07 2017-06-19 동우 화인켐 주식회사 편광판, 시트상 제품 검사 시스템 및 방법
JP6774803B2 (ja) * 2016-07-14 2020-10-28 東京エレクトロン株式会社 液滴吐出装置及び吐出検査方法
KR102438892B1 (ko) * 2017-03-03 2022-08-31 스미또모 가가꾸 가부시키가이샤 결함 검사 시스템, 필름 제조 장치, 필름 제조 방법, 인자 장치 및 인자 방법
JP6934733B2 (ja) * 2017-03-03 2021-09-15 住友化学株式会社 マーキング装置、欠陥検査システム及びフィルム製造方法
JP6978842B2 (ja) * 2017-03-03 2021-12-08 住友化学株式会社 マーキング装置、欠陥検査システム及びフィルム製造方法
KR102475056B1 (ko) * 2017-03-03 2022-12-06 스미또모 가가꾸 가부시키가이샤 결함 마킹 방법 및 결함 마킹 장치, 원반의 제조 방법 및 원반, 그리고 시트의 제조 방법 및 시트
KR102469408B1 (ko) * 2017-03-03 2022-11-22 스미또모 가가꾸 가부시키가이샤 결함 검사 시스템, 필름 제조 장치, 필름 제조 방법, 인자 장치 및 인자 방법
JP6991721B2 (ja) * 2017-03-03 2022-01-12 住友化学株式会社 マーキング装置、欠陥検査システム及びフィルム製造方法
JP6408654B1 (ja) * 2017-06-16 2018-10-17 株式会社オプトン 検査装置
KR102603009B1 (ko) * 2017-09-05 2023-11-15 스미또모 가가꾸 가부시키가이샤 결함 기록 시스템 및 필름 제조 시스템, 그리고 필름의 제조 방법
CN107703152A (zh) * 2017-10-27 2018-02-16 深圳精创视觉科技有限公司 光学膜缺点自动标示装置
JP7044583B2 (ja) 2018-02-22 2022-03-30 住友化学株式会社 フィルムの製造方法、フィルム捲回装置
CN108982530A (zh) * 2018-05-24 2018-12-11 京东方科技集团股份有限公司 一种背光卷料的检测系统
JP2019215371A (ja) * 2019-08-26 2019-12-19 住友化学株式会社 光学フィルム及び積層光学フィルムの欠陥検査方法
CN112874163A (zh) * 2021-01-14 2021-06-01 恒美光电股份有限公司 一种光学膜缺点喷印装置
CN113466256B (zh) * 2021-06-29 2022-04-15 深圳市楠轩光电科技有限公司 一种光学薄膜缺陷批量式检测设备
US11867639B2 (en) * 2021-09-15 2024-01-09 Te Connectivity Solutions Gmbh Method and apparatus for flattening and imaging a printed thin film product
CN113978139B (zh) * 2021-11-23 2023-01-10 深圳市盛波光电科技有限公司 一种薄膜缺陷喷码补喷处理方法及处理系统

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001059821A (ja) * 1999-08-24 2001-03-06 Fuji Photo Film Co Ltd 表面検査方法及び装置
JP2008093849A (ja) * 2006-10-06 2008-04-24 Canon Inc 液滴吐出ヘッド及び液滴吐出装置
TW201040515A (en) * 2009-04-10 2010-11-16 Nitto Denko Corp Optical film raw roll
CN101981438A (zh) * 2008-03-31 2011-02-23 住友化学株式会社 偏光薄膜的检查方法
JP2011167941A (ja) * 2010-02-18 2011-09-01 Seiko Epson Corp 液体噴射ヘッド、液体噴射ヘッドユニット及び液体噴射装置
JP2011218712A (ja) * 2010-04-13 2011-11-04 Seiko Epson Corp インクジェット印刷装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000062166A (ja) * 1998-08-18 2000-02-29 Dainippon Screen Mfg Co Ltd 描画ヘッド装置
JP2002292853A (ja) * 2001-03-29 2002-10-09 Tomoegawa Paper Co Ltd マーキングシステム、マーキング方法およびマーキング装置
KR20050013491A (ko) * 2003-07-28 2005-02-04 닛토덴코 가부시키가이샤 시트형상 제품의 검사 방법 및 검사 시스템
GB2432837B (en) * 2004-07-30 2008-08-20 Sumitomo Chemical Co Polymeric compound, thin polymer film, and thin polymer film element including the same
JP4671773B2 (ja) * 2005-06-10 2011-04-20 株式会社Isowa 印刷装置
JP4514059B2 (ja) 2006-12-11 2010-07-28 日東電工株式会社 シート状成形体の検査結果記録方法及び検査結果記録システム
JP2010030768A (ja) * 2008-07-30 2010-02-12 Seiko Epson Corp 給送装置及び記録装置
JP5588223B2 (ja) 2009-05-26 2014-09-10 旭化成イーマテリアルズ株式会社 ワイヤグリッド偏光フィルム用欠陥マーキング装置及び欠陥マーキング方法
JP2013016398A (ja) * 2011-07-05 2013-01-24 Sumitomo Chemical Co Ltd 光学シートの製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001059821A (ja) * 1999-08-24 2001-03-06 Fuji Photo Film Co Ltd 表面検査方法及び装置
JP2008093849A (ja) * 2006-10-06 2008-04-24 Canon Inc 液滴吐出ヘッド及び液滴吐出装置
CN101981438A (zh) * 2008-03-31 2011-02-23 住友化学株式会社 偏光薄膜的检查方法
TW201040515A (en) * 2009-04-10 2010-11-16 Nitto Denko Corp Optical film raw roll
JP2011167941A (ja) * 2010-02-18 2011-09-01 Seiko Epson Corp 液体噴射ヘッド、液体噴射ヘッドユニット及び液体噴射装置
JP2011218712A (ja) * 2010-04-13 2011-11-04 Seiko Epson Corp インクジェット印刷装置

Also Published As

Publication number Publication date
KR20210043007A (ko) 2021-04-20
CN105247351A (zh) 2016-01-13
JP2014240816A (ja) 2014-12-25
KR102369758B1 (ko) 2022-03-03
KR20160018510A (ko) 2016-02-17
TW201502495A (zh) 2015-01-16
WO2014199952A1 (ja) 2014-12-18
CN105247351B (zh) 2019-12-24
JP6177017B2 (ja) 2017-08-09

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