TWI608114B - Sputtering target containing Co or Fe - Google Patents
Sputtering target containing Co or Fe Download PDFInfo
- Publication number
- TWI608114B TWI608114B TW103103460A TW103103460A TWI608114B TW I608114 B TWI608114 B TW I608114B TW 103103460 A TW103103460 A TW 103103460A TW 103103460 A TW103103460 A TW 103103460A TW I608114 B TWI608114 B TW I608114B
- Authority
- TW
- Taiwan
- Prior art keywords
- particles
- mol
- powder
- magnetic material
- diameter
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
- C22C32/001—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides
- C22C32/0015—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides with only single oxides as main non-metallic constituents
- C22C32/0026—Matrix based on Ni, Co, Cr or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013028388 | 2013-02-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201443262A TW201443262A (zh) | 2014-11-16 |
TWI608114B true TWI608114B (zh) | 2017-12-11 |
Family
ID=51353907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103103460A TWI608114B (zh) | 2013-02-15 | 2014-01-29 | Sputtering target containing Co or Fe |
Country Status (6)
Country | Link |
---|---|
JP (2) | JP6332869B2 (fr) |
CN (1) | CN104903488B (fr) |
MY (2) | MY185389A (fr) |
SG (1) | SG11201503676WA (fr) |
TW (1) | TWI608114B (fr) |
WO (1) | WO2014125897A1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105056926A (zh) * | 2015-07-24 | 2015-11-18 | 武汉纺织大学 | 一种新型TiO2/WO3包覆的磁性纳米复合粒子及其制备方法和用途 |
JP6660130B2 (ja) * | 2015-09-18 | 2020-03-04 | 山陽特殊製鋼株式会社 | CoFeB系合金ターゲット材 |
CN108884557B (zh) * | 2016-03-31 | 2020-12-08 | 捷客斯金属株式会社 | 强磁性材料溅射靶 |
TWI702294B (zh) * | 2018-07-31 | 2020-08-21 | 日商田中貴金屬工業股份有限公司 | 磁氣記錄媒體用濺鍍靶 |
JPWO2021085410A1 (fr) * | 2019-11-01 | 2021-05-06 | ||
JP7317741B2 (ja) * | 2020-02-07 | 2023-07-31 | Jx金属株式会社 | スパッタリングターゲット、磁性膜、及びスパッタリングターゲット作製用の原料混合粉末 |
JP2024010347A (ja) * | 2022-07-12 | 2024-01-24 | 田中貴金属工業株式会社 | Co-Cr-Pt-酸化物系スパッタリングターゲット |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201229279A (en) * | 2010-12-22 | 2012-07-16 | Jx Nippon Mining & Metals Corp | Sintered body sputtering target |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000234168A (ja) * | 1998-12-07 | 2000-08-29 | Japan Energy Corp | 光ディスク保護膜形成用スパッタリングターゲット |
JP2009001860A (ja) * | 2007-06-21 | 2009-01-08 | Mitsubishi Materials Corp | 比透磁率の低い垂直磁気記録媒体膜形成用スパッタリングターゲット |
JP5204460B2 (ja) * | 2007-10-24 | 2013-06-05 | 三井金属鉱業株式会社 | 磁気記録膜用スパッタリングターゲットおよびその製造方法 |
SG172295A1 (en) * | 2009-03-27 | 2011-07-28 | Jx Nippon Mining & Metals Corp | Nonmagnetic material particle-dispersed ferromagnetic material sputtering target |
MY149640A (en) * | 2009-12-11 | 2013-09-13 | Jx Nippon Mining & Metals Corp | Sputtering target comprising oxide phase dispersed in co or co alloy phase, magnetic thin film made of co or co alloy phase and oxide phase, and magnetic recording medium using the said thin film |
SG185768A1 (en) * | 2010-07-20 | 2013-01-30 | Jx Nippon Mining & Metals Corp | Sputtering target of ferromagnetic material with low generation of particles |
WO2012029498A1 (fr) * | 2010-08-31 | 2012-03-08 | Jx日鉱日石金属株式会社 | Cible de pulvérisation à base de matériau ferromagnétique de type fe-pt |
JP5888664B2 (ja) * | 2010-12-20 | 2016-03-22 | Jx金属株式会社 | 強磁性材スパッタリングターゲット |
WO2012086578A1 (fr) * | 2010-12-20 | 2012-06-28 | Jx日鉱日石金属株式会社 | Cible de pulvérisation ferromagnétique de fe-pt et procédé de production de celle-ci |
-
2014
- 2014-01-24 JP JP2015500172A patent/JP6332869B2/ja active Active
- 2014-01-24 WO PCT/JP2014/051494 patent/WO2014125897A1/fr active Application Filing
- 2014-01-24 CN CN201480003726.9A patent/CN104903488B/zh active Active
- 2014-01-24 MY MYPI2018703713A patent/MY185389A/en unknown
- 2014-01-24 SG SG11201503676WA patent/SG11201503676WA/en unknown
- 2014-01-24 MY MYPI2015702204A patent/MY178171A/en unknown
- 2014-01-29 TW TW103103460A patent/TWI608114B/zh active
-
2016
- 2016-12-28 JP JP2016254632A patent/JP6359622B2/ja active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201229279A (en) * | 2010-12-22 | 2012-07-16 | Jx Nippon Mining & Metals Corp | Sintered body sputtering target |
Also Published As
Publication number | Publication date |
---|---|
SG11201503676WA (en) | 2015-06-29 |
JP6332869B2 (ja) | 2018-05-30 |
JPWO2014125897A1 (ja) | 2017-02-02 |
MY185389A (en) | 2021-05-17 |
CN104903488B (zh) | 2018-02-16 |
JP2017137570A (ja) | 2017-08-10 |
WO2014125897A1 (fr) | 2014-08-21 |
TW201443262A (zh) | 2014-11-16 |
JP6359622B2 (ja) | 2018-07-18 |
CN104903488A (zh) | 2015-09-09 |
MY178171A (en) | 2020-10-06 |
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